CN107475682B - Workpiece homopotential temperature measuring device of plasma vacuum coating chamber - Google Patents
Workpiece homopotential temperature measuring device of plasma vacuum coating chamber Download PDFInfo
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- CN107475682B CN107475682B CN201710695439.4A CN201710695439A CN107475682B CN 107475682 B CN107475682 B CN 107475682B CN 201710695439 A CN201710695439 A CN 201710695439A CN 107475682 B CN107475682 B CN 107475682B
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- coating chamber
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- tank body
- conducting plate
- temperature measuring
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Abstract
The invention discloses a workpiece homopotential temperature measuring device of a plasma vacuum coating chamber, which comprises a coating chamber tank body and a temperature measuring thermocouple; a coating chamber cavity is formed inside the coating chamber tank body; a workpiece frame and a rotary table are arranged in the coating chamber cavity, and the workpiece frame is fixed on the rotary table; the tank body of the coating chamber is provided with an opening; the measuring end of the temperature thermocouple penetrates through the opening from the outside of the tank body of the coating chamber and extends into the cavity of the coating chamber; the device is characterized in that an annular heat-conducting plate which is synchronous with a workpiece frame and rotates horizontally is arranged in the coating chamber; the annular heat conducting plate is fixed on the workpiece frame; and the measuring end of the temperature measuring thermocouple is in contact with the annular heat conducting plate. The invention has the advantages of more accurately measuring the actual temperature of the potential of the workpiece, shortening the time of debugging process, improving production efficiency, reducing cost and the like.
Description
Technical Field
The invention relates to an online temperature measuring device, in particular to a workpiece equipotential temperature measuring device of a plasma vacuum coating chamber.
Background
It is known that the accuracy of workpiece temperature measurement in plasma plays an important role in the formulation of the tool plating process, because the workpiece is usually in a moving state in the vacuum plating process and is added with negative bias of tens of volts to hundreds of volts, the requirements of insulation, sealing, transmission and the like are met, the temperature of the area is affected differently due to different positions of heaters arranged in the vacuum chamber, the plasma and the peripheral temperature distribution in the plating process are also uneven, the temperature measurement in the vacuum chamber is only used for measuring the space temperature at a fixed position, the actual temperature of the workpiece cannot be accurately reflected, the workpiece material plated by the tool is very sensitive to the temperature, and therefore, the control of the actual temperature of the actual workpiece material is very important for the adjustment of the plating process.
For this reason, a new measuring device needs to be developed.
Disclosure of Invention
The invention aims to provide the potential temperature measuring device which can more accurately measure the actual temperature of the potential of a workpiece, shorten the time of a debugging process, improve the production efficiency and reduce the cost.
In order to achieve the purpose, the invention adopts the following technical scheme:
a workpiece homopotential temperature measuring device of a plasma vacuum coating chamber comprises a coating chamber tank body and a temperature measuring thermocouple; a coating chamber cavity is formed inside the coating chamber tank body; a workpiece frame and a rotary table are arranged in the coating chamber cavity, and the rotary table is arranged at the bottom of the coating chamber cavity and can rotate horizontally; the workpiece frame is fixed on the turntable and can synchronously rotate along with the turntable; the tank body of the coating chamber is provided with an opening; the measuring end of the temperature thermocouple penetrates through the opening from the outside of the tank body of the coating chamber and extends into the cavity of the coating chamber; in particular: an annular heat-conducting plate arranged along the periphery of the workpiece frame is also arranged in the coating chamber cavity; the annular heat conducting plate is fixed on the workpiece frame and can synchronously rotate with the workpiece frame; and the measuring end of the temperature measuring thermocouple is in contact with the annular heat conducting plate.
The principle of the invention is as follows:
the device for online real-time measurement of workpiece equipotential temperature in plasma in vacuum environment introduces a temperature thermocouple from outside of vacuum chamber through a fixing hole, the temperature thermocouple directly contacts an annular heat conducting plate on a workpiece frame in a measuring furnace in the furnace, the annular heat conducting plate keeps horizontal rotation in the vacuum chamber along with the workpiece and is always in contact with the temperature thermocouple, and simultaneously has the same potential with a rotating frame on the annular heat conducting plate and is connected with negative bias, and a circular ring is arranged in a plasma region.
In order to ensure uniform and efficient coating of the workpiece, the workpiece rack preferably comprises a workpiece rack fixing disc and a base; a plurality of uniformly distributed round holes are formed in the workpiece frame fixing disc; a plurality of workpiece supporting rods are arranged between the workpiece frame fixing disc and the base; the workpiece supporting rod is sleeved in the round hole of the workpiece frame fixing disc.
In order to ensure that each measuring point is in a completely consistent measuring condition, the outer contour of the annular heat conducting plate is preferably circular.
Drawings
FIG. 1 is a schematic perspective view of a temperature measuring device according to an embodiment of the present invention.
Description of reference numerals: 1-coating chamber tank body; 2-temperature thermocouple; 3-a workpiece holder; 4, opening holes; 5-annular heat conducting plate; 6-workpiece holder fixing disc; 7-a turntable; 8-a workpiece support bar; 9-a workpiece; 10-coating chamber.
Detailed Description
As shown in figure 1, a workpiece isopotential temperature measuring device of a plasma vacuum coating chamber comprises a coating chamber tank body 1 and a temperature measuring thermocouple 2; a coating chamber cavity 10 is formed inside the coating chamber tank body 1; a workpiece frame 3 and a turntable are arranged in the coating chamber 10, and the workpiece frame 3 is fixed on the turntable 7 and can rotate synchronously with the turntable; the coating chamber tank body 1 is provided with an opening 4; the measuring end of the temperature thermocouple 2 passes through the opening 4 from the outside of the coating chamber tank body 1 and extends into the coating chamber cavity 2; the coating chamber cavity 10 is also internally provided with an annular heat conducting plate 5 which is horizontally arranged along the circumferential direction of the workpiece frame 3; the annular heat conducting plate 5 is also fixed on the workpiece frame 3 and can synchronously rotate along with the turntable; the measuring end of the temperature measuring thermocouple 2 is contacted with the annular heat conducting plate 5; the outer contour of the annular heat conducting plate 5 is circular.
The workpiece frame 3 comprises a workpiece frame fixing disc 6 and a base 7; a plurality of uniformly distributed round holes are arranged on the workpiece frame fixing disc 6; a plurality of workpiece supporting rods 8 are arranged between the workpiece frame fixing disc 6 and the base 7; the workpiece support rod 8 is sleeved in the round hole of the workpiece frame fixing disc 6.
The device for online real-time measurement of the temperature of the workpiece 9 in the plasma in the vacuum environment introduces a temperature thermocouple 2 from the outside of a vacuum chamber through an opening 4, the temperature thermocouple 2 directly contacts an annular heat conducting plate 5 on a workpiece rack in a measuring furnace in the furnace, namely, a contact point is close to the actual position of the workpiece 9 as much as possible, the annular heat conducting plate 5 keeps horizontal rotation in the vacuum chamber along with the workpiece 9 and is always in contact with the temperature thermocouple 2, the annular heat conducting plate 5 has the same potential as the rotating rack and is connected with negative bias, and the circular ring is arranged in a plasma region.
While the invention has been described with reference to specific embodiments, it will be understood by those skilled in the art that various changes may be made and equivalents may be substituted without departing from the scope of the invention. In addition, many modifications may be made to adapt a particular situation or application to the teachings of the invention without departing from its scope. Therefore, it is intended that the invention not be limited to the particular embodiment disclosed, but that the invention will include all embodiments falling within the scope of the appended claims.
Claims (3)
1. A workpiece homopotential temperature measuring device of a plasma vacuum coating chamber comprises a coating chamber tank body and a temperature measuring thermocouple; a coating chamber cavity is formed inside the coating chamber tank body; a workpiece frame and a rotary table are arranged in the coating chamber cavity, and the rotary table is arranged at the bottom of the coating chamber cavity and can rotate horizontally; the workpiece frame is fixed on the turntable and can synchronously rotate along with the turntable; the tank body of the coating chamber is provided with an opening; the measuring end of the temperature thermocouple penetrates through the opening from the outside of the tank body of the coating chamber and extends into the cavity of the coating chamber; the device is characterized in that an annular heat-conducting plate arranged along the periphery of the workpiece frame is also arranged in the coating chamber; the annular heat conducting plate is fixed on the workpiece frame and can synchronously rotate with the workpiece frame; and the measuring end of the temperature measuring thermocouple is in contact with the annular heat conducting plate.
2. The apparatus of claim 1, wherein the workpiece holder comprises a holder mounting plate and a base; a plurality of uniformly distributed round holes are formed in the workpiece frame fixing disc; a plurality of workpiece supporting rods are arranged between the workpiece frame fixing disc and the base; the workpiece supporting rod is sleeved in the round hole of the workpiece frame fixing disc.
3. The workpiece isopotential temperature measuring device of the plasma vacuum coating chamber as claimed in claim 1, wherein the outer contour of the annular heat conducting plate is circular.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710695439.4A CN107475682B (en) | 2017-08-15 | 2017-08-15 | Workpiece homopotential temperature measuring device of plasma vacuum coating chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710695439.4A CN107475682B (en) | 2017-08-15 | 2017-08-15 | Workpiece homopotential temperature measuring device of plasma vacuum coating chamber |
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| Publication Number | Publication Date |
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| CN107475682A CN107475682A (en) | 2017-12-15 |
| CN107475682B true CN107475682B (en) | 2020-04-03 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710695439.4A Active CN107475682B (en) | 2017-08-15 | 2017-08-15 | Workpiece homopotential temperature measuring device of plasma vacuum coating chamber |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108225593A (en) * | 2018-03-14 | 2018-06-29 | 嘉兴岱源真空科技有限公司 | A kind of workpiece temperature detection device and nano material making apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204982037U (en) * | 2015-09-02 | 2016-01-20 | 浙江星星瑞金科技股份有限公司 | Rotation type coating machine |
| CN205152326U (en) * | 2015-11-28 | 2016-04-13 | 西北有色金属研究院 | Vacuum deposition is temperature measurement mechanism for device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090095422A1 (en) * | 2007-09-06 | 2009-04-16 | Hitachi Kokusai Electric Inc. | Semiconductor manufacturing apparatus and substrate processing method |
| DE102013216258B4 (en) * | 2013-08-15 | 2015-03-12 | E.G.O. Elektro-Gerätebau GmbH | hob |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204982037U (en) * | 2015-09-02 | 2016-01-20 | 浙江星星瑞金科技股份有限公司 | Rotation type coating machine |
| CN205152326U (en) * | 2015-11-28 | 2016-04-13 | 西北有色金属研究院 | Vacuum deposition is temperature measurement mechanism for device |
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| CN107475682A (en) | 2017-12-15 |
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Address after: 528200 Becky Science and Technology Industrial Park, Shishan Town, Nanhai District, Foshan City, Guangdong Province, No. 1 Applicant after: Foshan Nanhai Jingding Tai Intelligent Technology Co.,Ltd. Address before: 528200 Factory Building No. 1 of Liang Jinping, Shizhong Village West Industrial Zone, Shishan Town, Nanhai District, Foshan City, Guangdong Province Applicant before: FOSHAN NANHAI JINGDINGTAI MACHINERY EQUIPMENT Co.,Ltd. |
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Denomination of invention: A device for measuring temperature of workpiece with the same potential in plasma vacuum coating chamber Effective date of registration: 20220926 Granted publication date: 20200403 Pledgee: Guangdong Nanhai rural commercial bank Limited by Share Ltd. Guicheng branch Pledgor: Foshan Nanhai Jingding Tai Intelligent Technology Co.,Ltd. Registration number: Y2022980016451 |