CN107459266A - Cover-plate glass and preparation method thereof - Google Patents
Cover-plate glass and preparation method thereof Download PDFInfo
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- CN107459266A CN107459266A CN201710676693.XA CN201710676693A CN107459266A CN 107459266 A CN107459266 A CN 107459266A CN 201710676693 A CN201710676693 A CN 201710676693A CN 107459266 A CN107459266 A CN 107459266A
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- Prior art keywords
- metal level
- cover
- preparation
- grain pattern
- plate glass
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Abstract
The present invention relates to a kind of cover-plate glass and preparation method thereof.The preparation method comprises the following steps：Glass substrate is taken, the surface of the glass substrate is provided with grain pattern region；Metal level and photoresist layer are sequentially depositing on the surface of the glass substrate：The thickness of the metal level is 30~200nm, and material is the one or more in silver, molybdenum, chromium；The metal level treats windowed regions provided with corresponding with the grain pattern region first；0~15 μm of the thickness of the photoresist layer, windowed regions are treated provided with corresponding with the grain pattern region second；Described first metal level for treating windowed regions is removed by laser engraving and second treats the photoresist layer of windowed regions, exposes the grain pattern region, obtains plate to be etched；The plate to be etched is etched；Remove remaining metal level and photoresist layer, you can.Above-mentioned preparation method avoids the increase of cover-plate glass thickness, improves visual and grain pattern stereoeffect.
Description
Technical field
The present invention relates to touch-control field of sensing technologies, more particularly to cover-plate glass and preparation method thereof.
Background technology
With the fast development of the communication technology, touch-control sensing (Touch Sensor) class products application is more and more extensive, together
Shi Zuowei collocation Touch Sensor staple product --- cover-plate glass (Cover Lens) has also obtained significant progress.
At present, Cover Lens' is better gorgeous to make, and designer would generally stick on Cover Lens surface
One layer of PET film for carrying grain pattern (such as CD lines).Be referred to as Deco-film in this layer of PET film industry, be by
First coating UV glue in PET film, grain pattern is extruded by mould, then colour film and printing process making is electroplated by PVD,
Aberration is formed, various gorgeous patterns is made, is finally bonded Deco-film with Cover lens, imitates whole Cover lens
Fruit is more gorgeous.
But above method process is grown, and consumable material is more, and because being bonded one layer of Deco-film, Cover lens' is whole
Body thickness increase, reduces transmitance, influences Cover lens visuality.
The content of the invention
Based on this, it is necessary to provide one kind on the premise of thickness is not increased, grain pattern can be formed, ensure cover plate glass
The visual effect of glass, and the preparation method of visual good cover-plate glass.
A kind of preparation method of cover-plate glass, comprises the following steps：
Glass substrate is taken, the surface of the glass substrate is provided with grain pattern region；
Metal level and photoresist layer are sequentially depositing on the surface of the glass substrate：
The thickness of the metal level is 30~200nm, and material is the one or more in silver, molybdenum, chromium；The metal level is set
There is first corresponding with the grain pattern region to treat windowed regions；
0~15 μm of the thickness of the photoresist layer, provided with second the to be opened a window area corresponding with the grain pattern region
Domain；
Described first metal level for treating windowed regions is removed by laser engraving and second treats the photoresist of windowed regions
Layer, exposes the grain pattern region, obtains plate to be etched；
The plate to be etched is etched, grain pattern is formed in the surface of the glass substrate；
Remove remaining metal level and photoresist layer, you can.
In one of the embodiments, the thickness of the metal level is 105~150nm.
In one of the embodiments, the metal level is deposited by the way of physical vapour deposition (PVD) (PVD)；The metal
When the material of layer is silver-colored, technological parameter is as follows：Pressure in vacuum tank：1~5 × 10-5Pa；Metal arc target current：150~180A；Partially
Pressure：6000~8000V；Optimizing technology parameters are as follows：Pressure in vacuum tank：1~3 × 10-5Pa；Silver-colored arc target current：150~180A；
Bias：7000~8000V；
When the material of the metal level is molybdenum or chromium, technological parameter is as follows：Pressure in vacuum tank：1~5 × 10-5Pa；Electron gun
Evaporation current：400~600mA；Bias：6000~8000V.
In one of the embodiments, the laser engraving is etches using infrared laser, infrared laser power be 3W~
6W, etching speed are 1000~3000mm/s；Or, etched using Ultra-Violet Laser, Ultra-Violet Laser energy is 1.1~1.5uj, etching
Speed is 1000~1500mm/s.Using infrared and ultraviolet different spot size, the lines of different linewidth requirements is carried out respectively
Pattern etches, and if line width is more than 20um, is etched using infrared laser, line width is 10~20um, is etched using Ultra-Violet Laser.
In one of the embodiments, the laser engraving is etches using infrared laser, infrared laser power be 3W~
5W, etching speed are 1500~2500mm/s；Or, etched using Ultra-Violet Laser, Ultra-Violet Laser energy is 1.2~1.4uj, etching
Speed is 1000~1300mm/s.
In one of the embodiments, it is described to etch the aqueous solution of the etching solution that uses for HF, wherein HF volumetric concentration
For 1%~30%.It is preferred that HF volumetric concentration is 15~30% in the aqueous solution of the HF.
In one of the embodiments, the time of the etching is 1~15min.It is preferred that 1~10min.
In one of the embodiments, when the material of the metal level is silver-colored, the technique for removing remaining metal level
It is as follows：It is that 1~30% aqueous solution of nitric acid is used as removal liquid to use volumetric concentration, and 1~20min is handled under the conditions of 20~60 DEG C；
When the material of the metal level is molybdenum, chromium, the technique of the remaining metal level of removal is as follows：Using volumetric concentration
It is that 1~30% acid potassium permanganate aqueous solution is used as removal liquid, 0.5~20min is handled under the conditions of 20~60 DEG C.
In one of the embodiments, when the material of the metal level is silver-colored, the technique for removing remaining metal level
It is as follows：It is that 20~30% aqueous solution of nitric acid are used as removal liquid to use volumetric concentration, and 8~12min is handled under the conditions of 20~60 DEG C；
When the material of the metal level is molybdenum, chromium, the technique of the remaining metal level of removal is as follows：Using volumetric concentration
It is that 5~20% acid potassium permanganate aqueous solution are used as removal liquid, 1~5min is handled under the conditions of 20~60 DEG C.
In one of the embodiments, the technique of the remaining photoresist layer of removal is as follows：Use volumetric concentration for 1~
20% sodium hydrate aqueous solution handles 1~20min as liquid is removed under the conditions of 20~60 DEG C.
Preferably, the technique for removing remaining photoresist is as follows：Volumetric concentration is used as 5~10% sodium hydrate aqueous solutions
As liquid is removed, 1~10min is handled under the conditions of 20~60 DEG C.
In one of the embodiments, after removing remaining metal level, in addition to polishing process, the polishing process are to adopt
It is polished with Twp-sided polishing machine or the carpet machine of clearing off.
The preparation method that the present invention also provides described cover-plate glass makes obtained cover-plate glass.
Compared with prior art, the invention has the advantages that：
The preparation method of the cover-plate glass of the present invention, innovative combination laser engraving and etching technique, directly in cover plate
Made on glass and form pattern lines.Wherein, laser engraving work is easy to as the base material of laser engraving using specific metal material
The progress of skill, the operability of technique, while the rationally deposit thickness of control metal level are improved, is made between base material and glass substrate
It is tightly combined, in post laser engraving and etching process, to be formed to the glass substrate in non-grain pattern region good
Protection, ensure the precision of grain pattern.Further it is engaged using certain thickness photoresist with metal level, to cover-plate glass
When carrying out the etching compared with depth, protecting effect can be optimized, improve the precision of grain pattern.
Thus, above-mentioned preparation method has both reached the purpose of optimization cover-plate glass visual effect, has evaded conventional method again
In PET film making, avoid the increase of cover-plate glass thickness, improve visual and grain pattern stereoeffect, and
Simple operation, technological process is short, and cost is low, can be applied to the making of complicated grain pattern.
Further, the depositing operation of physical vapour deposition (PVD) is rationally controlled, is carved mutually with reference to specific laser engraving technique
Carve, and etching solution is etched, and can optimize the compactness of metal film forming, improves the adhesive force of metal level, is obtained higher
Engraving and etching accuracy, and then improve the precision of grain pattern.In addition, using specific technique remove remaining metal level and
Photoresist layer, the metal and photoresist on cover-plate glass surface more can be completely removed, effectively avoids the residual of material to glass
The influence of glass transmitance, ensure that it is visual.
Embodiment
Cover-plate glass of the present invention and preparation method thereof is described in further detail below in conjunction with specific embodiment.
Embodiment 1
A kind of preparation method of cover-plate glass of the present embodiment, comprises the following steps：
The first step：Big sheet glass former material is cut into small sheet glass, obtains glass substrate, the glass substrate is provided with lines figure
Case region；
Second step：In the single sided deposition metallic silver layer of glass substrate, thickness 110nm；The metallic silver layer is provided with and institute
State the corresponding windowed regions in grain pattern region；Wherein, the technique of the deposition is as follows：Gold is electroplated using PVD filming equipments
Belong to silver layer, pressure in vacuum tank：3×10-5Pa；Silver-colored arc target current：150~180A；Bias：8000V；
3rd step：Grain pattern to be processed is fabricated to electronic drawings and archives (such as CAD, Corldraw, Pro/E etc.), and led
Enter into the software of laser engraving machine connection, be converted into laser engraving formula；
4th step：Laser engraving machine is debugged, sets and carves parameter, concrete technology is as follows：For line width it is wider (20um with
On) grain pattern, etched using infrared laser, infrared laser power 6W, etching speed 2000mm/s；For line width compared with
The grain pattern of narrow (10~20um), is etched using Ultra-Violet Laser, and Ultra-Violet Laser energy is 1.3uj, etching speed 1200mm/
s；
5th step：The glass substrate of plating metal silver is placed on laser engraving machine processing platform, existed using laser machine
Grain pattern is processed on plating silver layer, the metallic silver layer in the windowed regions is removed, exposes the grain pattern region, must treat
Etched plate；
6th step：Plate to be etched is immersed in the aqueous solution containing HF and is etched, wherein HF volumetric concentration is
15%；Etching period is 10min, etches to form grain pattern on glass；
7th step：It is in 20% aqueous solution of nitric acid, in 20 that glass substrate with grain pattern is immersed in into volumetric concentration
10min is handled under the conditions of~60 DEG C, takes off the argent that surface is fallen in plating, forms the Coverlens with grain pattern.
8th step：By CNC, side is thrown, and the process such as polishing, forms final Cover lens profiles；.
Embodiment 2
A kind of preparation method of cover-plate glass of the present embodiment, comprises the following steps：
The first step：Big sheet glass former material is cut into small sheet glass, obtains glass substrate, the glass substrate is provided with lines figure
Case region；
Second step：In the single sided deposition metallic silver layer of glass substrate, thickness 30nm；The metallic silver layer be provided with it is described
The corresponding windowed regions in grain pattern region；Wherein, the technique of the deposition is as follows：Using PVD filming equipment plating metals
Silver layer, pressure in vacuum tank：5×10-5Pa；Silver-colored arc target current：150~180A；Bias：8000V；
3rd step：Grain pattern to be processed is fabricated to electronic drawings and archives (such as CAD, Corldraw, Pro/E etc.), and led
Enter into the software of laser engraving machine connection, be converted into laser engraving formula；
4th step：Laser engraving machine is debugged, sets and carves parameter, concrete technology is as follows：For the wider lines figure of line width
Case, etched using infrared laser, infrared laser power 6W, etching speed 1000mm/s；For the narrower lines figure of line width
Case, etched using Ultra-Violet Laser, Ultra-Violet Laser energy is 1.1uj, etching speed 1500mm/s；
5th step：The glass substrate of plating metal silver is placed on laser engraving machine processing platform, existed using laser machine
Grain pattern is processed on plating silver layer, the metallic silver layer in the windowed regions is removed, exposes the grain pattern region, must treat
Etched plate；
6th step：Plate to be etched is immersed in the aqueous solution containing HF and is etched, wherein HF volumetric concentration is 1%
Between, etching period 15min, etch to form grain pattern on glass；
7th step：Glass substrate with grain pattern is immersed in volumetric concentration as in 3% aqueous solution of nitric acid, in 20~
20min is handled under the conditions of 60 DEG C, takes off the argent that surface is fallen in plating, forms the Coverlens with grain pattern.
8th step：By CNC, side is thrown, and the process such as polishing, forms final Cover lens profiles；.
Embodiment 3
A kind of preparation method of cover-plate glass of the present embodiment, comprises the following steps：
The first step：Big sheet glass former material is cut into small sheet glass, obtains glass substrate, the glass substrate is provided with lines figure
Case region；
Second step：In the single sided deposition metallic silver layer of glass substrate, thickness 105nm；The metallic silver layer is provided with and institute
State the corresponding windowed regions in grain pattern region；Wherein, the technique of the deposition is as follows：Gold is electroplated using PVD filming equipments
Belong to silver layer, pressure in vacuum tank：1×10-5Pa；Silver-colored arc target current：150~180A；Bias：7500V；
3rd step：Grain pattern to be processed is fabricated to electronic drawings and archives (such as CAD, Corldraw, Pro/E etc.), and led
Enter into the software of laser engraving machine connection, be converted into laser engraving formula；
4th step：Laser engraving machine is debugged, sets and carves parameter, concrete technology is as follows：For the wider lines figure of line width
Case, etched using infrared laser, infrared laser power 3W, etching speed 1800mm/s；For the narrower lines figure of line width
Case, etched using Ultra-Violet Laser, Ultra-Violet Laser energy is 1.3uj, etching speed 1300mm/s；
5th step：The glass substrate of plating metal silver is placed on laser engraving machine processing platform, existed using laser machine
Grain pattern is processed on plating silver layer, the metallic silver layer in the windowed regions is removed, exposes the grain pattern region, must treat
Etched plate；
6th step：It is 30% that plate to be etched, which is immersed in containing HF,；Etching period is 1min, etches to be formed on glass
Grain pattern；
7th step：It is in 30% aqueous solution of nitric acid, in 20 that glass substrate with grain pattern is immersed in into volumetric concentration
Handled under the conditions of~30 DEG C in 10min, take off the argent that surface is fallen in plating, form the Cover lens with grain pattern.
8th step：By CNC, side is thrown, and the process such as polishing, forms final Cover lens profiles；.
Embodiment 4
A kind of preparation method of cover-plate glass of the present embodiment, comprises the following steps：
The first step：Big sheet glass former material is cut into small sheet glass, obtains glass substrate, the glass substrate is provided with lines figure
Case region；
Second step：In the single sided deposition metallic silver layer of glass substrate, thickness 110nm；The metallic silver layer is provided with and institute
State the first corresponding windowed regions of grain pattern region；Wherein, the technique of the deposition is as follows：Using PVD filming equipments electricity
Plate metallic silver layer, pressure in vacuum tank：3×10-5Pa；Silver-colored arc target current：150~180A；Bias：8000V；Meanwhile in the gold
The surface for belonging to silver layer coats one layer of photoresist layer, 3 μm of the thickness of the photoresist layer, provided with relative with the grain pattern region
Second answered treats windowed regions；
3rd step：Grain pattern to be processed is fabricated to electronic drawings and archives (such as CAD, Corldraw, Pro/E etc.), and led
Enter into the software of laser engraving machine connection, be converted into laser engraving formula；
4th step：Laser engraving machine is debugged, sets and carves parameter, concrete technology is as follows：For the wider lines figure of line width
Case, etched using infrared laser, infrared laser power 6W, etching speed 2000mm/s；For the narrower lines figure of line width
Case, etched using Ultra-Violet Laser, Ultra-Violet Laser energy is 1.3uj, etching speed 1200mm/s；
5th step：The glass substrate of plating metal silver is placed on laser engraving machine processing platform, existed using laser machine
Grain pattern is processed on plating silver layer, removes the photoetching in the metallic silver layer and the second windowed regions in first windowed regions
Glue-line, expose the grain pattern region, obtain plate to be etched；
6th step：Plate to be etched is immersed in the aqueous solution containing HF and is etched, wherein HF volumetric concentration is
15%；Etching period is 10min, etches to form grain pattern on glass；
7th step：Then it is 5% sodium hydrate aqueous solution the glass substrate with grain pattern to be immersed in into volumetric concentration
As liquid is removed, 5min is handled under the conditions of 20~60 DEG C, takes off the photoresist that surface is fallen in plating；Volume is immersed in after rinsing well again
Concentration is in 20% aqueous solution of nitric acid, and 10min is handled under the conditions of 20~60 DEG C, takes off the argent that surface is fallen in plating, and formation carries
The Cover lens of grain pattern.
8th step：By CNC, side is thrown, and the process such as polishing, forms final Cover lens profiles；.
Embodiment 5
A kind of preparation method of cover-plate glass of the present embodiment, comprises the following steps：
The first step：Big sheet glass former material is cut into small sheet glass, obtains glass substrate, the glass substrate is provided with lines figure
Case region；
Second step：Metal molybdenum layer, metallic silver layer and metallic chromium layer, total metal thickness are sequentially depositing in the one side of glass substrate
Spend for 150nm；The metal level is provided with the windowed regions corresponding with the grain pattern region；Wherein, it is sequentially depositing each layer
Technique it is as follows：
Using PVD filming equipment plating metal silver layers, the pattern of resistance heating evaporation, pressure in vacuum tank：3×10-5Pa；Gold
Belong to silver-colored arc target current：150~180A, bias：8000V；
Using PVD filming equipment plating metal molybdenum layers and metallic chromium layer, the pattern of high-pressure electronic rifle evaporation, vacuum chamber pressure
By force：3×10-5Pa；Metal (molybdenum/chromium) electron gun current：400~600mA, bias：8000V；
3rd step：Grain pattern to be processed is fabricated to electronic drawings and archives (such as CAD, Corldraw, Pro/E etc.), and led
Enter into the software of laser engraving machine connection, be converted into laser engraving formula；
4th step：Laser engraving machine is debugged, sets and carves parameter, concrete technology is as follows：For the wider lines figure of line width
Case, etched using infrared laser, infrared laser power 6W, etching speed 2000mm/s；For the narrower lines figure of line width
Case, etched using Ultra-Violet Laser, Ultra-Violet Laser energy is 1.3uj, etching speed 1200mm/s；
5th step：The glass substrate of plating metal silver is placed on laser engraving machine processing platform, existed using laser machine
Grain pattern is processed on plating silver layer, the metallic silver layer in the windowed regions is removed, exposes the grain pattern region, must treat
Etched plate；
6th step：Plate to be etched is immersed in the aqueous solution containing HF and is etched, wherein HF volumetric concentration is
15%；Etching period is 10min, etches to form grain pattern on glass；
7th step：It is the 5% acid potassium permanganate aqueous solution that glass substrate with grain pattern is immersed in into volumetric concentration
As liquid is removed, 3min is handled under the conditions of 20~60 DEG C, and (metallic silver layer is located at interlayer position, to metal molybdenum layer and metallic chromium layer
When being removed, can synchronously remove, without extra process), form the Cover lens with grain pattern.
8th step：By CNC, side is thrown, and the process such as polishing, forms final Cover lens profiles；.
Comparative example 1
A kind of preparation method of cover-plate glass of this comparative example, its step similar embodiment 1, difference is：With metal tungsten layer
Substitute the metallic silver layer.For the metal tungsten layer after laser engraving, edge condition is poor, and film layer occur in chemical etching comes off,
Final products effect is influenceed, it is infeasible.
Comparative example 2
A kind of preparation method of cover-plate glass of this comparative example, its step similar embodiment 1, difference is：The argent
Thickness degree is 20nm.Occur film layer corrosion during chemical etching, lead to not to form final grain pattern, it is infeasible.
Properties of product test is carried out to the cover-plate glass of embodiment and comparative example, it is as a result as shown in the table：
Each technical characteristic of embodiment described above can be combined arbitrarily, to make description succinct, not to above-mentioned reality
Apply all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, the scope that this specification is recorded all is considered to be.
Embodiment described above only expresses the several embodiments of the present invention, and its description is more specific and detailed, but simultaneously
Can not therefore it be construed as limiting the scope of the patent.It should be pointed out that come for one of ordinary skill in the art
Say, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection of the present invention
Scope.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (10)
1. a kind of preparation method of cover-plate glass, it is characterised in that comprise the following steps：
Glass substrate is taken, the surface of the glass substrate is provided with grain pattern region；
Metal level and photoresist layer are sequentially depositing on the surface of the glass substrate：
The thickness of the metal level is 30~200nm, and material is the one or more in silver, molybdenum, chromium；The metal level be provided with
The grain pattern region it is corresponding first treat windowed regions；
The thickness of the photoresist layer is 0~15 μm, and windowed regions are treated provided with corresponding with the grain pattern region second；
Described first metal level for treating windowed regions is removed by laser engraving and second treats the photoresist layer of windowed regions, is revealed
Go out the grain pattern region, obtain plate to be etched；
The plate to be etched is etched, grain pattern is formed in the surface of the glass substrate；
Remove remaining metal level and photoresist layer, you can.
2. the preparation method of cover-plate glass according to claim 1, it is characterised in that the thickness of the metal level is 105
~150nm.
3. the preparation method of cover-plate glass according to claim 1, it is characterised in that by the way of physical vapour deposition (PVD)
Deposit the metal level；When the material of the metal level is silver-colored, technological parameter is as follows：
Pressure in vacuum tank：1~5 × 10-5Pa；Metal arc target current：150~180A；Bias：6000~8000V；
When the material of the metal level is molybdenum or chromium, technological parameter is as follows：Pressure in vacuum tank：1~5 × 10-5Pa；Electron gun evaporation
Electric current：400~600mA；Bias：6000~8000V.
4. the preparation method of cover-plate glass according to claim 1, it is characterised in that the laser engraving is using infrared
Laser-induced thermal etching, infrared laser power are 3W~6W, and etching speed is 1000~3000mm/s；Or, etched using Ultra-Violet Laser, it is purple
Outer laser energy is 1.1~1.5uj, and etching speed is 1000~1500mm/s.
5. the preparation method of cover-plate glass according to claim 4, it is characterised in that the laser engraving is using infrared
Laser-induced thermal etching, infrared laser power are 3W~5W, and etching speed is 1500~2500mm/s；Or, etched using Ultra-Violet Laser, it is purple
Outer laser energy is 1.2~1.4uj, and etching speed is 1000~1300mm/s.
6. the preparation method of cover-plate glass according to claim 1, it is characterised in that it is described etch the etching solution that uses for
The volumetric concentration of the HF aqueous solution, wherein HF is 1%~30%.
7. the preparation method of the cover-plate glass according to claim any one of 1-6, it is characterised in that the material of the metal level
Expect for it is silver-colored when, it is described remove remaining metal level technique it is as follows：Use volumetric concentration to be used as 1~30% aqueous solution of nitric acid to go
Except liquid, 1~20min is handled under the conditions of 20~60 DEG C；
When the material of the metal level is molybdenum or chromium, the technique of the remaining metal level of removal is as follows：Volumetric concentration is used as 1
~30% acid potassium permanganate aqueous solution handles 0.5~20min as liquid is removed under the conditions of 20~60 DEG C.
8. the preparation method of cover-plate glass according to claim 7, it is characterised in that the material of the metal level is silver
When, the technique of the remaining metal level of removal is as follows：Use volumetric concentration to be used as 20~30% aqueous solution of nitric acid and remove liquid,
8~12min is handled under the conditions of 20~60 DEG C；
When the material of the metal level is molybdenum, chromium, the technique of the remaining metal level of removal is as follows：Volumetric concentration is used as 5
~20% acid potassium permanganate aqueous solution handles 1~5min as liquid is removed under the conditions of 20~60 DEG C.
9. the preparation method of the cover-plate glass according to claim any one of 1-6, it is characterised in that the removal is remaining
The technique of photoresist layer is as follows：It is that 1~20% sodium hydrate aqueous solution is used as removal liquid to use volumetric concentration, in 20~60 DEG C of bars
1~20min is handled under part.
10. the preparation method of the cover-plate glass described in claim any one of 1-9 makes obtained cover-plate glass.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108453392A (en) * | 2018-05-23 | 2018-08-28 | 中国电子科技集团公司第三十八研究所 | A kind of direct processing molding method of microwave substrate cavity laser |
| CN110183113A (en) * | 2019-05-22 | 2019-08-30 | 湖南天羿领航科技有限公司 | The preparation method of glare proof glass |
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