CN107287557A - 一种新型防指纹硬质复合膜及其生产工艺 - Google Patents
一种新型防指纹硬质复合膜及其生产工艺 Download PDFInfo
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Abstract
本发明公开了一种新型防指纹硬质复合膜及其生产工艺。本发明的技术方案是:包括基材层,所述基材层上设置有碳化钨纳米晶薄膜层,所述碳化钨纳米晶薄膜层上设置有防指纹薄膜层,碳化钨纳米晶薄膜,采用中频磁控溅射,采用碳化钨靶材,反应腔体内通入C2H2气体和Ar气后沉积而形成。防指纹薄膜层,采用中频磁控溅射,磁控溅射的靶材采用聚四氟乙烯和氟化镁的混合物而成。所述靶材中的聚四氟乙烯和氟化镁的摩尔比为1:(0.55~0.75)。基材层为常见的材料,为塑料或者金属,整个方案具有耐划伤、硬度高、高耐磨性、耐腐蚀性和防手印的效果。
Description
技术领域
本发明涉及薄膜材料制备技术领域,特别涉及一种新型防指纹硬质复合膜。
背景技术
在目前电子产品日新月异的时代,人们手指日益频繁的接触到电子产品的外壳(金属材质/合金材质),导致外壳产生指纹,有时碰到尖锐的物品,会导致产品的划伤。汗液、污垢和划伤不仅影响电子产品的外观,产品的使用效用也会受到影响。现有技术中有在电子产品的表面贴附薄膜的方式,但是现有技术的用于电子产品的薄膜存在的缺点是不具有防指纹的功能并且随着使用时间的延长容易产生刮花。
发明内容
针对现有技术存在的不足,本发明的主要目的在于提供一种具有防指纹功能的硬质复合膜及其生产工艺。
为实现上述目的,本发明提供了如下技术方案:一种新型防指纹硬质复合膜,包括基材层,所述基材层上设置有碳化钨纳米晶薄膜层,所述碳化钨纳米晶薄膜层上设置有防指纹薄膜层。
优选的,所述基材层为PMMA或者玻璃或者不锈钢或者铝合金。
一种新型防指纹硬质复合膜的生产工艺,包括如下生产步骤,
1)、由碳钨靶中频溅射沉积在基材层上形成碳化钨纳米晶薄膜层:将真空腔体抽真空到3×10-3Pa以下,采用碳钨靶充入气体,直至气压为0.5-3Pa,调整偏压100-550V,占空比为20%-85%,以400-2000W的功率溅射40-180min;
2)、将氟化镁和聚四氟乙烯颗粒按照比例混合均匀,拌油加热熟化后倒入靶材的模具中,冷却后烧结并细微车削成型,得到靶材;
3)、在反应气氛中采用磁控溅射在碳化钨纳米晶薄膜层表面形成防指纹薄膜层:磁控溅射的靶材为步骤2)中所制的靶材,将真空腔体抽真空到4×10-3Pa以下,充入反应气氛气体,直至气压为0.5-3Pa,调整偏压100-550V,占空比为20%-85%,以400-2000W的功率溅射10-20min。
优选的,所述步骤1)中充入的气体为C2H2气体和Ar气。
优选的,所述步骤2)中聚四氟乙烯和氟化镁的摩尔比为1:0.55~1:0.75。
优选的,所述步骤3)中反应气氛为保护气体和反应气体的混合物,所述反应气体为CF4,所述保护气体为氮气或者惰性气体。
优选的,所述保护气体与反应气体的流量比为1: 0.5~1:1。
优选的,所述保护气体的体积流量为300-450sccm,反应气体的体积流量为100-250sccm。
本发明相对于现有技术具有如下优点,具有耐划伤、硬度高、高耐磨性、耐腐蚀性和防手印的效果。
附图说明
图1为本发明的一种新型防指纹硬质复合膜的结构示意图。
图中:1、基材层;2、碳化钨纳米晶薄膜层;3、防指纹薄膜层。
具体实施方式
下面结合附图对本发明作进一步说明。
一种新型防指纹硬质复合膜,包括基材层1,所述基材层1上设置有碳化钨纳米晶薄膜层2,所述碳化钨纳米晶薄膜层2上设置有防指纹薄膜层3。所述基材层1为PMMA或者玻璃或者不锈钢或者铝合金。碳化钨纳米晶薄膜层2,采用中频磁控溅射,采用碳化钨靶材,反应腔体内通入C2H2气体和Ar气后沉积而形成。防指纹薄膜层3,采用中频磁控溅射,磁控溅射的靶材采用聚四氟乙烯和氟化镁的混合物而成。所述靶材中的聚四氟乙烯和氟化镁的摩尔比为1:(0.55~0.75)。基材层1为常见的材料,为塑料或者金属,整个方案具有耐划伤、硬度高、高耐磨性、耐腐蚀性和防手印的效果。
实施例一
基材层1采用铝合金,具体生产工艺如下:
碳化钨纳米晶薄膜层2生产工艺:将真空腔体抽真空到3×10-3Pa,采用碳钨靶充入C2H2与Ar气,直至气压为0.5Pa,调整偏压100V,占空比为20%,以400-2000W的功率溅射40min。采用X射线膜厚仪测量膜厚为1.2um(测算沉积速率0.5nm/s)。
防指纹薄膜层3生产工艺:采用中频磁控反应溅射,采用氟化镁和聚四氟乙烯颗粒按照比例1:0.55摩尔比混合制作的靶材;将真空腔体抽真空到4×10-3Pa,充入Ar气体的体积流量为300sccm,反应气体CF4,直至气压为0.5Pa,调整偏压100V,占空比为20%,以400W的功率溅射10min。X射线膜厚仪测量膜厚0.6um(测算沉积速率1nm/s)。
实施例二
基材层1为不锈钢,具体生产工艺如下:
碳化钨纳米晶薄膜层2的生产工艺:将真空腔体抽真空到1×10-3Pa,采用碳钨靶充入C2H2与Ar气,直至气压为3Pa,调整偏压200V,占空比为50%,以1000W的功率溅射100min。X射线膜厚仪测量膜厚3.6um(测算沉积速率1nm/s)。
防指纹薄膜层3的生产工艺:中频磁控反应溅射,采用氟化镁和聚四氟乙烯颗粒按照比例1:1摩尔比混合制作的靶材;将真空腔体抽真空到3×10-3Pa,充入Ar气体的体积流量为400sccm,反应气体CF4,直至气压为0.5Pa,调整偏压200V,占空比为50%,以1000W的功率溅射20min。X射线膜厚仪测量膜厚1.8um(测算沉积速率1.5nm/s)。
实施例三
基材层1为PMMA,具体生产工艺如下:
碳化钨纳米晶薄膜层2生产工艺:将真空腔体抽真空到2×10-3Pa,采用碳钨靶充入C2H2与Ar气,直至气压为2Pa,调整偏压550V,占空比为85%,以800W的功率溅射180min。X射线膜厚仪测量膜厚1.2um(测算沉积速率0.5nm/s)。
防指纹薄膜层3的生产工艺:中频磁控反应溅射,采用氟化镁和聚四氟乙烯颗粒按照比例1:0.8摩尔比混合制作的靶材;将真空腔体抽真空到2×10-3Pa,充入Ar气体的体积流量为200sccm,再充入反应气体CF4,直至气压为0.5Pa,调整偏压550V,占空比为50%,以400W的功率溅射20min。X射线膜厚仪测量膜厚0.6um(测算沉积速率1nm/s)。
测量检测装置与方法:
1、膜厚测量:采用X射线膜厚测量仪进行测量,
实施例一中:碳化钨纳米晶薄膜层2:X射线膜厚仪测量膜厚1.2um(测算沉积速率0.5nm/s);
防指纹薄膜层3:X射线膜厚仪测量膜厚0.6um(测算沉积速率1nm/s)。
实施例二中:碳化钨纳米晶薄膜层2:X射线膜厚仪测量膜厚3.6um(测算沉积速率1nm/s);
防指纹薄膜层3:X射线膜厚仪测量膜厚1.8um(测算沉积速率1.5nm/s)。
实施例三中:碳化钨纳米晶薄膜层2:X射线膜厚仪测量膜厚1.2um(测算沉积速率0.5nm/s);
防指纹薄膜层3:X射线膜厚仪测量膜厚0.6um(测算沉积速率1nm/s)。
2、硬度测量:
测量方式:采用维氏硬度计;
实施例一中:碳化钨硬度:800HV;
实施例二中:碳化钨硬度:1100HV;
实施例二中:碳化钨硬度:1000HV。
3、防指纹测量:
方法1:使用人工汗液,人工汗液的配置:
氯化钠 7g
尿素 1g
乳酸(85%) 4g
甲醇 500ml
水 500ml
将人工汗液滴加或沾到防指纹薄膜层3上,等水挥发后,看是否有印迹留下,并且印迹是否容易擦去。
试验结果表明:实施例一至三中均有少许印迹留下,使用无纺布很容易就可以擦拭掉印迹。
方法2:使用色差仪;
测试防指纹薄膜层3涂白色凡士林前后的L a b,并计算△E值。
△E=(△L2+△a2+△b2)1/2;
根据△E来判断涂层的防指纹性能;性能评价指标:△E<3.0可以具有防指纹的性能。
试验结果表明:
实施例一中:△E=1.6±0.2,具有防指纹性能;
实施例二中: △E=0.8±0.2,具有防指纹性能;
实施例三中:△E=1.3±0.2,具有防指纹性能。
以上所述仅是本发明的优选实施方式,本发明的保护范围并不仅局限于上述实施例,凡属于本发明思路下的技术方案均属于本发明的保护范围。应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理前提下的若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。
Claims (8)
1.一种新型防指纹硬质复合膜,其特征在于:包括基材层,所述基材层上设置有碳化钨纳米晶薄膜层,所述碳化钨纳米晶薄膜层上设置有防指纹薄膜层。
2.根据权利要求1所述的一种新型防指纹硬质复合膜,其特征在于:所述基材层为PMMA或者玻璃或者不锈钢或者铝合金。
3.一种新型防指纹硬质复合膜的生产工艺,其特征在于:包括如下生产步骤,
1)、由碳钨靶中频溅射沉积在基材层上形成碳化钨纳米晶薄膜层:将真空腔体抽真空到3×10-3Pa以下,采用碳钨靶充入气体,直至气压为0.5-3Pa,调整偏压100-550V,占空比为20%-85%,以400-2000W的功率溅射40-180min;
2)、将氟化镁和聚四氟乙烯颗粒按照比例混合均匀,拌油加热熟化后倒入靶材的模具中,冷却后烧结并细微车削成型,得到靶材;
3)、在反应气氛中采用磁控溅射在碳化钨纳米晶薄膜层表面形成防指纹薄膜层:磁控溅射的靶材为步骤2)中所制的靶材,将真空腔体抽真空到4×10-3Pa以下,充入反应气氛气体,直至气压为0.5-3Pa,调整偏压100-550V,占空比为20%-85%,以400-2000W的功率溅射10-20min。
4.根据权利要求3所述的一种新型防指纹硬质复合膜的生产工艺,其特征在于:所述步骤1)中充入的气体为C2H2气体和Ar气。
5.根据权利要求3所述的一种新型防指纹硬质复合膜的生产工艺,其特征在于:所述步骤2)中聚四氟乙烯和氟化镁的摩尔比为1:0.55~1:0.75。
6.根据权利要求3所述的一种新型防指纹硬质复合膜的生产工艺,其特征在于:所述步骤3)中反应气氛为保护气体和反应气体的混合物,所述反应气体为CF4,所述保护气体为氮气或者惰性气体。
7. 根据权利要求6所述的一种新型防指纹硬质复合膜的生产工艺,其特征在于:所述保护气体与反应气体的流量比为1: 0.5~1:1。
8.根据权利要求6或7所述的一种新型防指纹硬质复合膜的生产工艺,其特征在于:所述保护气体的体积流量为300-450sccm,反应气体的体积流量为100-250sccm。
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CN115449111A (zh) * | 2022-09-15 | 2022-12-09 | 江苏潮启新材料科技有限公司 | 一种提高耐磨性的类肤装饰薄膜制备方法 |
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CN115449111A (zh) * | 2022-09-15 | 2022-12-09 | 江苏潮启新材料科技有限公司 | 一种提高耐磨性的类肤装饰薄膜制备方法 |
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