CN107224790A - Wet processing device with built-in gas-liquid separation unit - Google Patents
Wet processing device with built-in gas-liquid separation unit Download PDFInfo
- Publication number
- CN107224790A CN107224790A CN201610168065.6A CN201610168065A CN107224790A CN 107224790 A CN107224790 A CN 107224790A CN 201610168065 A CN201610168065 A CN 201610168065A CN 107224790 A CN107224790 A CN 107224790A
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- CN
- China
- Prior art keywords
- gas
- liquid separation
- separation unit
- process cavity
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 117
- 238000000926 separation method Methods 0.000 title claims abstract description 73
- 238000012545 processing Methods 0.000 title claims abstract description 60
- 238000000034 method Methods 0.000 claims abstract description 62
- 238000006243 chemical reaction Methods 0.000 claims abstract description 34
- 230000005540 biological transmission Effects 0.000 claims abstract description 28
- 238000013459 approach Methods 0.000 claims abstract description 23
- 239000000126 substance Substances 0.000 claims abstract description 23
- 239000000203 mixture Substances 0.000 claims abstract description 21
- 239000002912 waste gas Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims description 18
- 239000012530 fluid Substances 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
Abstract
The present invention provides a kind of wet processing device with built-in gas-liquid separation unit, comprising：One process cavity；One air processing unit；And a gas-liquid separation unit, it is connected between the process cavity and the air processing unit, comprising a transmission pipeline and a filter element, the transmission pipeline includes：One approach section, for chemically gas-liquid mixture to be inputted in the gas-liquid separation unit by one in the process cavity；One conversion zone, for housing the filter element so that by the way that chemically gas-liquid mixture is separated into a chemical liquid and a waste gas described in the filter element；And an exhaust section, for the waste gas to be discharged into the air processing unit, wherein the approach section of the gas-liquid separation unit is arranged on the inside of the process cavity with the conversion zone.
Description
Technical field
The present invention relates to a kind of wet processing device, gas-liquid separation unit is arranged at work by more particularly to one kind
The wet processing device of skill inside cavity.
Background technology
Wet processing device is widely used in the manufacture of semiconductor element.The wet processing device palpus in wet processing
Using substantial amounts of chemical liquid, it is mostly with corrosive materials such as acid or alkalescence.Therefore, from wet
Often entrainment has corrosive chemical liquid in the chemically gas-liquid mixture extracted out in method process equipment.Base
Considered in environmental protection with safe, it is necessary to first carry out the chemically gas-liquid mixture in wet processing device
Handle so that the chemical liquid in chemically gas-liquid mixture to be separated, then can just carry out subsequent treatment.
Fig. 1 is refer to, it shows a kind of schematic diagram of existing wet processing device 10.The wet processing
Equipment 10 includes process cavity 20, gas-liquid separation unit 30 and air processing unit 40.The gas-liquid separation list
Member 30 is arranged on the outside of process cavity 20, and positioned at the top position of the process cavity 20.Specifically,
The gas-liquid separation unit 30 is connected with the steam vent 21 positioned at the top of the process cavity 20, Jin Ertong
Cross the steam vent 21 and the chemically gas-liquid mixture inside the process cavity 20 is imported into the gas-liquid point
From in unit 30.Then by the gas-liquid separation unit 30, chemically gas-liquid mixture carries out gas-liquid by described in
After separation, the waste gas isolated can be discharged into the air processing unit 40.Eventually pass at the gas
After the processing for managing unit 40, nontoxic gas can just be discharged.
As shown in figure 1, the gas-liquid separation unit 30 includes a transmission pipeline 31 and a filter element 32, its
Described in transmission pipeline 31 be connected to the steam vent 21 of the process cavity 20 and the gas treatment list
Between member 40, and the filter element 32 is arranged in the transmission pipeline 31.When the chemically gas-liquid
When mixture is by the filter element 32, the chemical liquid in the chemically gas-liquid mixture can condense with
It is attached on the filter element 32, remaining waste gas then can be by the filter element 32 towards at the gas
Advance in the direction for managing unit 40.
However, because the transmission pipeline 31 of the gas-liquid separation unit 30 not uses integrally formed knot
Structure, but use the mode for interconnecting multistage pipeline to form the transmission pipeline 31 to assemble.Therefore,
Multiple tracks seam is formed with the tube wall of the transmission pipeline 31 so that the chemical liquid of part can be by described
Multiple tracks seam is flow to outside the transmission pipeline 31, and then causes the wet processing device 10 because of chemical liquid
Corrode and cause to damage.The chemical liquid of this leakage can also be impacted to the safety of operating personnel.It is another
Aspect, because the gas-liquid separation unit 30 is equipped with the top of the process cavity 20, not only takes empty
Between also there is certain height so that though operating personnel in maintenance, maintain and change the filter element
Inconvenience can be all brought when 32.
In view of this, it is necessary to provide a kind of wet processing device, to solve the problems of prior art.
The content of the invention
In order to solve the above technical problems, it is an object of the invention to provide a kind of wet processing device, it is described wet
The gas-liquid separation unit of method process equipment is arranged in process cavity, and is first to enter in the process cavity
Waste gas after separation is discharged into the gas treatment being arranged on outside the process cavity again after row gas-liquid separation
Unit, and then can avoid, due to carrying out gas-liquid separation outside the process cavity, causing the chemistry after separation
Liquid flows to the outside of the wet processing device, especially drops onto the outer member of the process cavity
On, in turn result in the problem of process cavity is damaged.
To reach above-mentioned purpose, the present invention provides a kind of wet processing with built-in gas-liquid separation unit and set
It is standby, comprising：One process cavity；One air processing unit；And a gas-liquid separation unit, it is connected to described
Between process cavity and the air processing unit, a transmission pipeline and a filter element, the transmission are included
Pipeline includes：One approach section, described in chemically gas-liquid mixture is inputted by one in the process cavity
In gas-liquid separation unit；One conversion zone, for housing the filter element so that pass through the filter element
The chemically gas-liquid mixture be separated into a chemical liquid and a waste gas；And an exhaust section, for will
The waste gas is discharged into the air processing unit, wherein the institute of the transmission pipeline of the gas-liquid separation unit
State approach section and be arranged on the inside of the process cavity with the conversion zone.
In one of present invention preferred embodiment, the process cavity includes an exhaust above
Hole, the exhaust section of the gas-liquid separation unit is connected by the steam vent and the air processing unit
It is logical.
In one of present invention preferred embodiment, the conversion zone of the gas-liquid separation unit is described
The inside of process cavity extends along a direction, and the two ends of the conversion zone include a pair of approach sections.
In one of present invention preferred embodiment, the wet processing device also includes a delivery unit,
For transmitting a substrate, wherein the direct of travel of the substrate and the conversion zone of the gas-liquid separation unit
Bearing of trend it is identical.
In one of present invention preferred embodiment, the gas-liquid separation unit is horizontal at a distance of one with the substrate
To distance.
In one of present invention preferred embodiment, the conversion zone of the gas-liquid separation unit is with respect to one
Horizontal plane so that the chemical liquid flow to the technique by the leakage fluid dram below the approach section
The bottom of cavity.
In one of present invention preferred embodiment, the two ends of the conversion zone of the gas-liquid separation unit
Opposite central is tilted down, and the two ends are connected with a pair of approach sections respectively, and it is described it is central with it is described
Exhaust section is connected.
The present invention also provides a kind of wet processing device with built-in gas-liquid separation unit, comprising：One work
Skill cavity, its bottom can receive a pending substrate；One air processing unit position the process cavity it
Outside；And a gas-liquid separation unit, it is connected between the process cavity and the air processing unit, wraps
Containing a transmission pipeline and a filter element, the transmission pipeline includes：One approach section, for by the technique
In cavity one chemically gas-liquid mixture input in the gas-liquid separation unit；One conversion zone, for housing
The filter element so that by the way that chemically gas-liquid mixture is separated into a chemistry described in the filter element
Liquid and a waste gas；And an exhaust section, for the waste gas to be discharged into the air processing unit, wherein
The approach section of the transmission pipeline of the gas-liquid separation unit is arranged on the work with the conversion zone
The inside of skill cavity.
In the present invention one of them preferred embodiment, the transmission pipeline substantially has one and " falls the shapes of Y " shapes
Shape.
In one of present invention preferred embodiment, the chemical liquid isolated is from position in the reaction
Duan Erduan leakage fluid dram drops to the bottom of the process cavity, and the transmission pipeline and the substrate distance have
One sufficient distance makes the chemical liquid of the drippage not drip on the substrate.
Brief description of the drawings
Fig. 1 shows a kind of schematic diagram of existing wet processing device；
Fig. 2 shows a kind of schematic diagram of the wet processing device of the preferred embodiments of the present invention；And
Fig. 3 shows the side view of Fig. 2 wet processing device.
Embodiment
, hereafter will be especially exemplified by order to which the above-mentioned and other purpose of the present invention, feature, advantage can be become apparent
The preferred embodiment of the present invention, and coordinate accompanying drawing, it is described in detail below.
Fig. 2 is refer to, it shows a kind of signal of the wet processing device 100 of the preferred embodiments of the present invention
Figure.The wet processing device 100 includes process cavity 200, gas-liquid separation unit 300, gas treatment list
Member 400 and delivery unit 500.The gas-liquid separation unit 300 is connected to the process cavity 200 and the gas
Between body processing unit 400, for the chemically gas-liquid mixture 610 in the process cavity 200 to be carried out
Gas-liquid separation.The air processing unit 400 is arranged on the top of process cavity 200, for handling gas-liquid
Waste gas 630 after separation.The delivery unit 500 is arranged on the lower section inside the process cavity 200, uses
Transmitted in by pending substrate 700 towards Y-direction.The substrate 700 can be such as semiconductor substrate, as
It is thin film transistor base (thin film transistor substrate), it is will be in the process cavity
In body 200 as handled by the wet processing device 100.
As shown in Fig. 2 the gas-liquid separation unit 300 is comprising transmission pipeline 310 and is arranged on the transfer tube
Filter element 320 inside road 310.The transmission pipeline 310 substantially has one and " falls the shapes of Y " shapes, it is wrapped
Containing a pair of approach sections 311, a conversion zone 312 and an exhaust section 313, wherein described to approach section 311, institute
The relative altitude for stating conversion zone 312 and the exhaust section 313 is sequentially upward along a longitudinal direction (Z-direction)
Increase so that the exhaust section 313 is located at an of a relatively high position, and described is located to approach section 311
One relatively low position.In addition, the conversion zone 312 of the transmission pipeline 310 is approximately along the base
The direct of travel Y of plate 700 tilts extension.
As shown in Fig. 2 the two ends that the conversion zone 312 is arranged on to approach section 311, and the row
Gas section 313 is arranged on the center of the conversion zone 312.It is described that approach section 311 is used for the process cavity
The 200 chemically gas-liquid mixtures 610 produced input the conversion zone 312 of the gas-liquid separation unit 300
It is interior.The conversion zone 312 is to cause for housing the filter element 320 by the filter element 320
The chemically gas-liquid mixture 610 is separated into chemical liquid 620 and waste gas 630, wherein the chemically gas
The chemical liquid 620 in liquid mixture 610 condenses and is attached on the filter element 320.The row
Gas section 313 extends to the process cavity 200 through steam vent 210 of the position in the top of process cavity 200
Outside.Described in the exhaust section 313 is used to being discharged into the waste gas 630 after gas-liquid separation and communicate therewith
In air processing unit 400.
As shown in Fig. 2 the gas-liquid separation unit 300 it is described to approach section 311 and the conversion zone 312 all
It is provided in the inside of the process cavity 200.Furthermore, the conversion zone 312 is designed as both sides with respect to a water
Plane (i.e. X/Y plane) inclined structure, i.e. the center of the conversion zone 312 is arranged on relative to its two ends
Higher position so that the chemical liquid 620 after gas-liquid separation can be along inclined tube wall, by position
The work is flow back into respect to the leakage fluid dram 314 below two ends and the approach section 311 in the conversion zone 312
The inside of skill cavity 200, then passes through the liquid recovery unit of a bottom for being communicated to the process cavity 200
(not being illustrated in figure) collects the chemical liquid 620 to carry out recycling, and then reduces production cost.
On the other hand, compared to prior art, gas-liquid separation reaction of the invention is in the process cavity 200
Portion is completed so that the chemical liquid 620 after gas-liquid separation will not flow to the outer of the process cavity 200
Portion, and then avoid the damage for causing the process cavity 200 and the safety for jeopardizing operating personnel.In addition,
Because most of element of the gas-liquid separation unit 300 is provided in the inside of the process cavity 200, make
The personnel of obtaining are more convenient when repairing and maintaining the gas-liquid separation unit 300.
Fig. 3 is refer to, it shows the side view of Fig. 2 wet processing device 100.From side regard when, institute
Gas-liquid separation unit 300 is stated to be kept at a distance of the position of a lateral separation L1 with the substrate 700 so that
The chemical liquid 620 dripped from the gas-liquid separation unit 300 does not interfere with the progress of wet processing,
That is, the reaction liquid of 620 pairs of the chemical liquid substrate 700 can be avoided to pollute.
Although the present invention is disclosed above with preferred embodiment, so it is not limited to the present invention, the present invention
Those of ordinary skill in the art, it is without departing from the spirit and scope of the present invention, each when that can make
Kind change and retouching, therefore protection scope of the present invention depending on the appended claims person of defining when being defined.
Claims (10)
1. a kind of wet processing device with built-in gas-liquid separation unit, it is characterised in that the wet method work
Skill equipment is included：
One process cavity；
One air processing unit；And
One gas-liquid separation unit, is connected between the process cavity and the air processing unit, bag
Containing a transmission pipeline and a filter element, the transmission pipeline includes：
One approach section, for chemically gas-liquid mixture to be inputted by one in the process cavity
In the gas-liquid separation unit；
One conversion zone, for housing the filter element so that pass through the filter element
The chemically gas-liquid mixture is separated into a chemical liquid and a waste gas；And
One exhaust section, for the waste gas to be discharged into the air processing unit, wherein described
The approach section of the transmission pipeline of gas-liquid separation unit is arranged on institute with the conversion zone
State the inside of process cavity.
2. the wet processing device with built-in gas-liquid separation unit as described in claim the 1, it is special
Levy and be, the process cavity includes a steam vent above, the institute of the gas-liquid separation unit
Exhaust section is stated to connect with the air processing unit by the steam vent.
3. the wet processing device with built-in gas-liquid separation unit as described in claim the 1, it is special
Levy and be, the conversion zone of the gas-liquid separation unit is in the inside of the process cavity along a direction
Extension, and the two ends of the conversion zone include a pair of approach sections.
4. the wet processing device with built-in gas-liquid separation unit as described in claim the 3, it is special
Levy and be, the wet processing device also includes a delivery unit, for transmitting a substrate, wherein institute
The bearing of trend for stating the direct of travel of substrate and the conversion zone of the gas-liquid separation unit is identical.
5. the wet processing device with built-in gas-liquid separation unit as described in claim the 4, it is special
Levy and be, the gas-liquid separation unit is with the substrate at a distance of a lateral separation.
6. the wet processing device with built-in gas-liquid separation unit as described in claim the 1, it is special
Levy and be, the conversion zone of the gas-liquid separation unit is with respect to a horizontal plane so that describedization
Learn the bottom that liquid flow to the process cavity by the leakage fluid dram below the approach section.
7. the wet processing device with built-in gas-liquid separation unit as described in claim the 1, it is special
Levy and be, the two ends opposite central of the conversion zone of the gas-liquid separation unit is tilted down, and institute
State two ends to be connected with a pair of approach sections respectively, and described central be connected with the exhaust section.
8. a kind of wet processing device with built-in gas-liquid separation unit, it is characterised in that the wet method work
Skill equipment is included：
One process cavity, its bottom can receive a pending substrate；
One air processing unit position is outside the process cavity；And
One gas-liquid separation unit, is connected between the process cavity and the air processing unit, bag
Containing a transmission pipeline and a filter element, the transmission pipeline includes：
One approach section, for chemically gas-liquid mixture to be inputted by one in the process cavity
In the gas-liquid separation unit；
One conversion zone, for housing the filter element so that pass through the filter element
The chemically gas-liquid mixture is separated into a chemical liquid and a waste gas；And
One exhaust section, for the waste gas to be discharged into the air processing unit, wherein described
The approach section of the transmission pipeline of gas-liquid separation unit is arranged on institute with the conversion zone
State the inside of process cavity.
9. the wet processing device with built-in gas-liquid separation unit as described in claim the 8, it is special
Levy and be, the transmission pipeline substantially has one and " falls the shapes of Y " shapes.
10. the wet processing device with built-in gas-liquid separation unit as described in claim the 8, it is special
Levy and be, the chemical liquid isolated drops to institute from leakage fluid dram of the position at the end of conversion zone two
The bottom of process cavity is stated, it is described that the transmission pipeline and the substrate distance have a sufficient distance to make
The chemical liquid of drippage will not drip on the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610168065.6A CN107224790B (en) | 2016-03-23 | 2016-03-23 | Wet processing device with built-in gas-liquid separation unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610168065.6A CN107224790B (en) | 2016-03-23 | 2016-03-23 | Wet processing device with built-in gas-liquid separation unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107224790A true CN107224790A (en) | 2017-10-03 |
| CN107224790B CN107224790B (en) | 2019-05-21 |
Family
ID=59932964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610168065.6A Expired - Fee Related CN107224790B (en) | 2016-03-23 | 2016-03-23 | Wet processing device with built-in gas-liquid separation unit |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107224790B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101130191A (en) * | 2006-08-24 | 2008-02-27 | 宝山钢铁股份有限公司 | Equipment for collecting and processing acidity mist |
| US20090280235A1 (en) * | 2008-05-09 | 2009-11-12 | Lauerhaas Jeffrey M | Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation |
| CN204337931U (en) * | 2014-12-26 | 2015-05-20 | 苏州晶洲装备科技有限公司 | Wet method equipment moisture separation device |
| CN104667559A (en) * | 2013-12-03 | 2015-06-03 | 昆山国显光电有限公司 | Etching acid mist dissociating device |
| CN205435230U (en) * | 2016-03-23 | 2016-08-10 | 盟立自动化股份有限公司 | Wet process manufacturing equipment with built -in gas -liquid separation unit |
-
2016
- 2016-03-23 CN CN201610168065.6A patent/CN107224790B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101130191A (en) * | 2006-08-24 | 2008-02-27 | 宝山钢铁股份有限公司 | Equipment for collecting and processing acidity mist |
| US20090280235A1 (en) * | 2008-05-09 | 2009-11-12 | Lauerhaas Jeffrey M | Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation |
| CN104667559A (en) * | 2013-12-03 | 2015-06-03 | 昆山国显光电有限公司 | Etching acid mist dissociating device |
| CN204337931U (en) * | 2014-12-26 | 2015-05-20 | 苏州晶洲装备科技有限公司 | Wet method equipment moisture separation device |
| CN205435230U (en) * | 2016-03-23 | 2016-08-10 | 盟立自动化股份有限公司 | Wet process manufacturing equipment with built -in gas -liquid separation unit |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107224790B (en) | 2019-05-21 |
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