CN107224790B - Wet processing device with built-in gas-liquid separation unit - Google Patents
Wet processing device with built-in gas-liquid separation unit Download PDFInfo
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- CN107224790B CN107224790B CN201610168065.6A CN201610168065A CN107224790B CN 107224790 B CN107224790 B CN 107224790B CN 201610168065 A CN201610168065 A CN 201610168065A CN 107224790 B CN107224790 B CN 107224790B
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- Prior art keywords
- gas
- liquid separation
- separation unit
- process cavity
- processing device
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- 239000007788 liquid Substances 0.000 title claims abstract description 121
- 238000000926 separation method Methods 0.000 title claims abstract description 71
- 238000012545 processing Methods 0.000 title claims abstract description 69
- 238000000034 method Methods 0.000 claims abstract description 61
- 230000008569 process Effects 0.000 claims abstract description 59
- 238000006243 chemical reaction Methods 0.000 claims abstract description 35
- 230000005540 biological transmission Effects 0.000 claims abstract description 30
- 239000000126 substance Substances 0.000 claims abstract description 28
- 238000013459 approach Methods 0.000 claims abstract description 25
- 239000000203 mixture Substances 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims description 18
- 239000012530 fluid Substances 0.000 claims description 7
- 238000010586 diagram Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000004148 unit process Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
- Treating Waste Gases (AREA)
Abstract
The present invention provides a kind of wet processing device with built-in gas-liquid separation unit, includes: a process cavity；One air processing unit；An and gas-liquid separation unit, it is connected between the process cavity and the air processing unit, comprising a transmission pipeline and a filter element, the transmission pipeline includes: an approach section, for by the process cavity intracorporal one, chemically gas-liquid mixture to be inputted in the gas-liquid separation unit；One conversion zone, for accommodating the filter element, so that the chemically gas-liquid mixture by the filter element is separated into a chemical liquid and an exhaust gas；And an exhaust section, for the exhaust gas to be discharged into the air processing unit, wherein the inside of the process cavity is arranged in the approach section of the gas-liquid separation unit and the conversion zone.
Description
Technical field
The present invention relates to a kind of wet processing devices, and gas-liquid separation unit is set to process cavity more particularly to a kind of
Internal wet processing device.
Background technique
Wet processing device is widely used in the manufacture of semiconductor element.Wet processing device must be using big in wet processing
The chemical liquid of amount is mostly with corrosive substances such as acid or alkalinity.Therefore, it is extracted out out of wet processing device
Chemically often entrainment has corrosive chemical liquid in gas-liquid mixture.It is considered based on environmental protection and safe, it is necessary to
First the chemically gas-liquid mixture in wet processing device is handled with by the chemical liquid in chemically gas-liquid mixture
Separation, then can just carry out subsequent processing.
Fig. 1 is please referred to, shows a kind of schematic diagram of existing wet processing device 10.The wet processing device 10 wraps
Containing process cavity 20, gas-liquid separation unit 30 and air processing unit 40.The gas-liquid separation unit 30 is arranged in process cavity
20 outside, and it is located at the top position of the process cavity 20.Specifically, the gas-liquid separation unit 30 is and is located at institute
The gas vent 21 for stating the top of process cavity 20 is connected to, and then by the gas vent 21 by the change inside the process cavity 20
The property learned gas-liquid mixture imports in the gas-liquid separation unit 30.Then described chemically by the gas-liquid separation unit 30 general
After gas-liquid mixture carries out gas-liquid separation, the exhaust gas isolated can be discharged into the air processing unit 40.Finally pass through institute
After the processing for stating air processing unit 40, nontoxic gas can just be discharged.
As shown in Figure 1, the gas-liquid separation unit 30 includes a transmission pipeline 31 and a filter element 32, wherein the biography
Defeated pipeline 31 is connected between the gas vent 21 and the air processing unit 40 of the process cavity 20, and the mistake
Filtering element 32 is arranged in the transmission pipeline 31.When the chemically gas-liquid mixture passes through the filter element 32, institute
Stating the chemical liquid in chemically gas-liquid mixture can condense and be attached on the filter element 32, and remaining exhaust gas can then lead to
The filter element 32 is crossed to advance towards the direction of the air processing unit 40.
However, since the transmission pipeline 31 of the gas-liquid separation unit 30 not uses integrally formed structure, and
It is to use the mode that multistage pipeline interconnects forming the transmission pipeline 31 to assemble.Therefore, in the transmission pipeline 31
Tube wall on be formed with multiple tracks seam so that partial chemical liquid can flow to the transmission pipeline 31 by the multiple tracks seam
Outside, and then the wet processing device 10 is caused to damage because of the corrosion of chemical liquid.The chemical liquid of this leakage
The safety of operator can be impacted.On the other hand, since the gas-liquid separation unit 30 is equipped in the process cavity
The top of body 20, not only occupied space also has certain height, no matter so that operator is in maintenance, maintenance and replacement institute
It states 32 Shi Jiehui of filter element and brings inconvenience.
In view of this, it is necessary to provide a kind of wet processing device, to solve the problems of prior art.
Summary of the invention
In order to solve the above technical problems, the purpose of the present invention is to provide a kind of wet processing device, the wet processing
The gas-liquid separation unit of equipment is arranged in process cavity, and be after first carrying out gas-liquid separation in the process cavity again
Exhaust gas after separation is discharged into the air processing unit being arranged in outside the process cavity, and then can avoid due in the work
Skill containment portion carries out gas-liquid separation, and the chemical liquid after leading to separation flows to the outside of the wet processing device, especially
On the outer member for dropping onto the process cavity, the problem of process cavity damages is in turn resulted in.
To reach above-mentioned purpose, the present invention provides a kind of wet processing device with built-in gas-liquid separation unit, packet
Contain: a process cavity；One air processing unit；And a gas-liquid separation unit, it is connected to the process cavity and the gas
It include a transmission pipeline and a filter element between processing unit, the transmission pipeline includes: an approach section, and being used for will be described
Chemically gas-liquid mixture inputs in the gas-liquid separation unit process cavity intracorporal one；One conversion zone, for accommodating the mistake
Filtering element, so that the chemically gas-liquid mixture by the filter element is separated into a chemical liquid and an exhaust gas；With
And an exhaust section, for the exhaust gas to be discharged into the air processing unit, wherein the transmission of the gas-liquid separation unit
The inside of the process cavity is arranged in the approach section and the conversion zone of pipeline.
In one of them preferred embodiment of the present invention, the process cavity includes a gas vent being located above, described
The exhaust section of gas-liquid separation unit is connected to by the gas vent with the air processing unit.
In one of them preferred embodiment of the present invention, the conversion zone of the gas-liquid separation unit is in the process cavity
The inside of body extends along a direction, and the both ends of the conversion zone include a pair of of approach section.
In one of them preferred embodiment of the present invention, the wet processing device also includes a transmission unit, for passing
A substrate is sent, wherein the direction of travel of the substrate is identical as the extending direction of the conversion zone of the gas-liquid separation unit.
In one of them preferred embodiment of the present invention, the gas-liquid separation unit and the substrate at a distance of one laterally away from
From.
In one of them preferred embodiment of the present invention, the conversion zone of the gas-liquid separation unit is with respect to a horizontal plane
Inclination, so that the chemical liquid flow to the bottom of the process cavity by the leakage fluid dram below the approach section.
In one of them preferred embodiment of the present invention, the both ends of the conversion zone of the gas-liquid separation unit relatively in
Centre tilts down, and the both ends are connect respectively with a pair of of approach section and the center is connect with the exhaust section.
The present invention also provides a kind of wet processing devices with built-in gas-liquid separation unit, include: a process cavity,
Its bottom can receive a substrate to be processed；One air processing unit position is except the process cavity；An and gas-liquid separation
Unit is connected between the process cavity and the air processing unit, described comprising a transmission pipeline and a filter element
Transmission pipeline includes: an approach section, for by the process cavity intracorporal one, chemically gas-liquid mixture to input the gas-liquid point
From in unit；One conversion zone, for accommodating the filter element, so that the chemically gas-liquid by the filter element is mixed
It closes object and is separated into a chemical liquid and an exhaust gas；And an exhaust section, for the exhaust gas to be discharged into the air processing unit,
Wherein the approach section of the transmission pipeline of the gas-liquid separation unit and the conversion zone are arranged in the process cavity
Inside.
In one of them preferred embodiment of the present invention, the transmission pipeline substantially has the shape of " Y " shape.
In one of them preferred embodiment of the present invention, the chemical liquid isolated is from position at two end of conversion zone
Leakage fluid dram drop to the bottom of the process cavity, the transmission pipeline and the substrate distance have a sufficient distance to make institute
The chemical liquid for stating drippage will not drip on the substrate.
Detailed description of the invention
Fig. 1 shows a kind of schematic diagram of existing wet processing device；
Fig. 2 shows a kind of schematic diagram of the wet processing device of the preferred embodiment of the present invention；And
Fig. 3 shows the side view of the wet processing device of Fig. 2.
Specific embodiment
In order to which above-mentioned and other purposes of the invention, feature, advantage can be clearer and more comprehensible, it is excellent that spy is hereafter lifted into the present invention
Embodiment is selected, and cooperates attached drawing, is described in detail below.
Referring to figure 2., a kind of schematic diagram of the wet processing device 100 of the preferred embodiment of the present invention is shown.It is described
Wet processing device 100 includes process cavity 200, gas-liquid separation unit 300, air processing unit 400 and transmission unit 500.
The gas-liquid separation unit 300 is connected between the process cavity 200 and the air processing unit 400, and being used for will be described
Chemically gas-liquid mixture 610 in process cavity 200 carries out gas-liquid separation.The air processing unit 400 is arranged described
The top of process cavity 200, for handling the exhaust gas 630 after gas-liquid separation.The transmission unit 500 is arranged in the process cavity
Lower section inside 200, for transmitting substrate 700 to be processed towards Y-direction.The substrate 700 can be such as semiconductor base
Plate seems thin film transistor base (thin film transistor substrate), and being will be in the process cavity 200
It is interior as handled by the wet processing device 100.
As shown in Fig. 2, the gas-liquid separation unit 300 includes transmission pipeline 310 and is arranged in the transmission pipeline 310
The filter element 320 in portion.The transmission pipeline 310 substantially has the shape of " Y " shape, and it includes a pair of of approach section 311, one is anti-
Section 312 and an exhaust section 313 are answered, wherein described to the opposite of approach section 311, the conversion zone 312 and the exhaust section 313
Height sequentially increases upwards along a longitudinal direction (Z-direction), so that the exhaust section 313 is located at a relatively high position,
And described a relatively low position is located to approach section 311.In addition, the conversion zone 312 of the transmission pipeline 310 is big
It causes to tilt along the 700 direction of travel Y of substrate and extend.
As shown in Fig. 2, both ends and the exhaust section 313 for approach section 311 being arranged in the conversion zone 312
The center of the conversion zone 312 is set.The chemically gas that approach section 311 is used to generate the process cavity 200
Liquid mixture 610 inputs in the conversion zone 312 of the gas-liquid separation unit 300.The conversion zone 312 is for accommodating
Filter element 320 is stated to make by the way that chemically gas-liquid mixture 610 is separated into chemical liquid described in the filter element 320
620 and exhaust gas 630, wherein the condensation of the chemical liquid 620 in the chemically gas-liquid mixture 610 and being attached to the mistake
In filtering element 320.The exhaust section 313 passes through gas vent 210 of the position above the process cavity 200 and extends to the technique
The outside of cavity 200.The exhaust section 313 is used to the exhaust gas 630 after gas-liquid separation being discharged into the gas communicated therewith
In body processing unit 400.
As shown in Fig. 2, the described of the gas-liquid separation unit 300 is all setting to approach section 311 and the conversion zone 312
In the inside of the process cavity 200.Furthermore the conversion zone 312 is designed as two sides and inclines with respect to a horizontal plane (i.e. X/Y plane)
Oblique structure, that is, the center of the conversion zone 312 is arranged relative to its both ends in higher position, so that after gas-liquid separation
The chemical liquid 620 can be along inclined tube wall, by position in the conversion zone 312 opposite two ends and the approach section 311
The leakage fluid dram 314 of lower section flows back into the inside of the process cavity 200, is then connected to the process cavity 200 by one
The liquid recovery unit (not being illustrated in figure) of bottom collect the chemical liquid 620 to carry out recycling and reusing, and then drop
Low production cost.On the other hand, compared to prior art, gas-liquid separation reaction of the invention is in the process cavity 200
Portion completes, so that the chemical liquid 620 after gas-liquid separation will not flow to the outside of the process cavity 200, and then avoids
It causes the damage of the process cavity 200 and jeopardizes the safety of operator.Further, since the gas-liquid separation unit
300 most of element is the inside that the process cavity 200 is arranged in, so that personnel are repairing and maintaining the gas-liquid separation
It is more convenient when unit 300.
Referring to figure 3., the side view of the wet processing device 100 of Fig. 2 is shown.Regarded from side when, the gas-liquid point
It is kept at from unit 300 and the substrate 700 at a distance of the position of a lateral distance L1, so that from the gas-liquid separation unit
The chemical liquid 620 of 300 drippages does not interfere with the progress of wet processing, that is, can avoid 620 pairs of institutes of the chemical liquid
The reaction liquid for stating substrate 700 pollutes.
Although the present invention has used preferred embodiment disclosed above, however, it is not to limit the invention, skill belonging to the present invention
Have usually intellectual in art field, without departing from the spirit and scope of the present invention, when can be used for a variety of modifications and variations, because
This protection scope of the present invention is subject to view appended claims institute defender.
Claims (9)
1. a kind of wet processing device with built-in gas-liquid separation unit, which is characterized in that the wet processing device packet
Contain:
One process cavity；
One air processing unit；And
One gas-liquid separation unit is connected between the process cavity and the air processing unit, comprising a transmission pipeline and
One filter element, the transmission pipeline substantially has the shape of " Y " shape, and the transmission pipeline includes:
One approach section, for chemically gas-liquid mixture to input in the gas-liquid separation unit by the process cavity intracorporal one；
One conversion zone, for accommodating the filter element, so that passing through the chemically gas-liquid mixture of the filter element
It is separated into a chemical liquid and an exhaust gas；And
One exhaust section, for the exhaust gas to be discharged into the air processing unit, wherein the biography of the gas-liquid separation unit
The inside of the process cavity, and the wherein institute after gas-liquid separation is arranged in the approach section and the conversion zone of defeated pipeline
Chemical liquid is stated along inclined tube wall, by position in the conversion zone with respect to the leakage fluid dram stream below two ends and the approach section
It is back to the inside of the process cavity.
2. the wet processing device with built-in gas-liquid separation unit as described in claim the 1, which is characterized in that institute
Stating process cavity includes a gas vent being located above, the exhaust section of the gas-liquid separation unit by the gas vent with
The air processing unit connection.
3. the wet processing device with built-in gas-liquid separation unit as described in claim the 1, which is characterized in that institute
The conversion zone for stating gas-liquid separation unit extends in the inside of the process cavity along a direction, and the both ends of the conversion zone
Include a pair of of approach section.
4. the wet processing device with built-in gas-liquid separation unit as described in claim the 3, which is characterized in that institute
Stating wet processing device also includes a transmission unit, for transmitting a substrate, wherein the direction of travel of the substrate and the gas
The extending direction of the conversion zone of liquid separative unit is identical.
5. the wet processing device with built-in gas-liquid separation unit as described in claim the 4, which is characterized in that institute
Gas-liquid separation unit and the substrate are stated at a distance of a lateral distance.
6. the wet processing device with built-in gas-liquid separation unit as described in claim the 1, which is characterized in that institute
The conversion zone for stating gas-liquid separation unit is tilted with respect to a horizontal plane, so that the chemical liquid passes through the approach section lower section
Leakage fluid dram flow to the bottom of the process cavity.
7. the wet processing device with built-in gas-liquid separation unit as described in claim the 1, which is characterized in that institute
The both ends opposite central for stating the conversion zone of gas-liquid separation unit tilts down, and the both ends connect with a pair of of approach section respectively
It connects and the center is connect with the exhaust section.
8. a kind of wet processing device with built-in gas-liquid separation unit, which is characterized in that the wet processing device packet
Contain:
One process cavity, bottom can receive a substrate to be processed；
One air processing unit position is except the process cavity；And
One gas-liquid separation unit is connected between the process cavity and the air processing unit, comprising a transmission pipeline and
One filter element, the transmission pipeline substantially has the shape of " Y " shape, and the transmission pipeline includes:
One approach section, for chemically gas-liquid mixture to input in the gas-liquid separation unit by the process cavity intracorporal one；
One conversion zone, for accommodating the filter element, so that passing through the chemically gas-liquid mixture of the filter element
It is separated into a chemical liquid and an exhaust gas；And
One exhaust section, for the exhaust gas to be discharged into the air processing unit, wherein the biography of the gas-liquid separation unit
The inside of the process cavity, and the wherein institute after gas-liquid separation is arranged in the approach section and the conversion zone of defeated pipeline
Chemical liquid is stated along inclined tube wall, by position in the conversion zone with respect to the leakage fluid dram stream below two ends and the approach section
It is back to the inside of the process cavity.
9. the wet processing device with built-in gas-liquid separation unit as described in claim the 8, which is characterized in that institute
State the bottom that leakage fluid dram of the chemical liquid isolated from position at two end of conversion zone drops to the process cavity, the biography
The chemical liquid that defeated pipeline and the substrate distance have a sufficient distance to make the drippage will not drip on the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610168065.6A CN107224790B (en) | 2016-03-23 | 2016-03-23 | Wet processing device with built-in gas-liquid separation unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610168065.6A CN107224790B (en) | 2016-03-23 | 2016-03-23 | Wet processing device with built-in gas-liquid separation unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107224790A CN107224790A (en) | 2017-10-03 |
| CN107224790B true CN107224790B (en) | 2019-05-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610168065.6A Expired - Fee Related CN107224790B (en) | 2016-03-23 | 2016-03-23 | Wet processing device with built-in gas-liquid separation unit |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101130191A (en) * | 2006-08-24 | 2008-02-27 | 宝山钢铁股份有限公司 | Equipment for collecting and processing acidity mist |
| CN204337931U (en) * | 2014-12-26 | 2015-05-20 | 苏州晶洲装备科技有限公司 | Wet method equipment moisture separation device |
| CN104667559A (en) * | 2013-12-03 | 2015-06-03 | 昆山国显光电有限公司 | Etching acid mist dissociating device |
| CN205435230U (en) * | 2016-03-23 | 2016-08-10 | 盟立自动化股份有限公司 | Wet process manufacturing equipment with built -in gas -liquid separation unit |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5705723B2 (en) * | 2008-05-09 | 2015-04-22 | テル エフエスアイ インコーポレイテッド | Tools and methods for processing microelectronic workpieces using a processing chamber design that easily switches between open and closed modes in operation |
-
2016
- 2016-03-23 CN CN201610168065.6A patent/CN107224790B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101130191A (en) * | 2006-08-24 | 2008-02-27 | 宝山钢铁股份有限公司 | Equipment for collecting and processing acidity mist |
| CN104667559A (en) * | 2013-12-03 | 2015-06-03 | 昆山国显光电有限公司 | Etching acid mist dissociating device |
| CN204337931U (en) * | 2014-12-26 | 2015-05-20 | 苏州晶洲装备科技有限公司 | Wet method equipment moisture separation device |
| CN205435230U (en) * | 2016-03-23 | 2016-08-10 | 盟立自动化股份有限公司 | Wet process manufacturing equipment with built -in gas -liquid separation unit |
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| CN107224790A (en) | 2017-10-03 |
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