CN107176588A - A kind of preparation method of hollow MCA - Google Patents
A kind of preparation method of hollow MCA Download PDFInfo
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- CN107176588A CN107176588A CN201710462649.9A CN201710462649A CN107176588A CN 107176588 A CN107176588 A CN 107176588A CN 201710462649 A CN201710462649 A CN 201710462649A CN 107176588 A CN107176588 A CN 107176588A
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- microchannel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00055—Grooves
- B81C1/00071—Channels
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00523—Etching material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0156—Lithographic techniques
Abstract
The invention discloses a kind of preparation method of hollow MCA, and in particular to micro processing field.This method makes the microchannel mother matrix of micron-scale using photoetching technique and hot technique of backflow, and make PDMS Flexible formwork assemblies using this motherboard, the Flexible formwork assembly of acquisition has the patterning complementary with microchannel mother matrix, PDMS Flexible formwork assemblies are adhered tightly to substrate surface formation microchannel cavity, and in side instillation S1813 photoresists, photoresist fills microchannel cavity in the presence of capillary force, heated after the filling long period, photoresist in microcavity flows back, and be will be attached to the photoresist that microcavity inwall is in contact on inwall, cool and solidify and take off after PDMS Flexible formwork assemblies, hollow MCA has just been obtained over the substrate surface.The present invention is compared with other methods for preparing hollow microchannel, with low cost, the advantages of technique is simple.The present invention is applied to the application fields such as microfabrication, micro-fluidic chip, biological medicine.
Description
Technical field
The present invention relates to the application fields such as microfabrication, micro-fluidic chip, biological medicine, and in particular to a kind of hollow micro- logical
The preparation method of road structure.
Background technology
Pipeline, all kinds of coil various radiator passages till now studied already since most of the people to passage
And the cavity of analog cell living environment, and correspondingly, its dimension scale is also from rice, millimeter, again to micron.With micro Process
The development of technology, from the sixties in last century five, scientists begin to microchannel being applied to various heat exchangers, reactor
And medically simulate the various aspects such as circulatory condition of blood in human vas.
Capillarity is a kind of common physical phenomenon in nature, it is known that when being contacted between liquid and body surface
Surface tension can be produced, liquid can be moved along contact surface in the presence of this surface tension.If what is contacted with liquid is one
Root tubule or microchannel, liquid will be moved along thin tube inner wall or microchannel internal chamber wall in the presence of surface tension.Capillary shows
As can be used for preparing micro-nano structure, its principle and operation are relatively simple, it is easy to develop to industrialization direction.
At present, for the existing certain methods of preparation of microchannel, mainly including coaxial extrusion molding method, electrostatic induction method,
Reactive ion etching method etc., these methods respectively have advantage and disadvantage, using when be often limited to that complex process, cost be higher and essence
Degree such as is difficult to control at the factor.
Application of the hollow microchannel in fields such as microfabrication, micro-fluidic chip, biological medicines is relatively broad.
The content of the invention
The present invention can solve it is existing prepare that hollow microchannel method technological requirement is high, microchannel size is difficult to control to, into
There is provided a kind of novel processing step of hollow MCA for the problems such as this is higher.
The technical scheme is that：
A kind of preparation method of hollow MCA, comprises the following steps：
（1）The preparation of microchannel mother matrix, step is as follows：By substrate for use（Conventional sheet glass or silicon chip or other materials substrate）Clearly
Wash clean and in rotary coating photoresist thereon（By taking AZ9260 photoresists as an example）；65 DEG C of hot plates are placed on after standing ten minutes
Upper heating 10 minutes, then moves on 95 DEG C of hot plates and heats 30 minutes；Then by the photo etched mask with strip micron pattern
Plate is in close contact with AZ9260 photoresist coatings, and carries out photolithographic exposure；Substrate after overexposure, which is developed, just can obtain
To with reticle pattern lightproof part size identical strip micron box structure；By this micro-structural be placed in hot plate it
On, 140 DEG C are slowly warming up to, heating is removed after 30 minutes makes it naturally cool to room temperature；AZ9260 photoresists at 140 DEG C are
Through in molten condition, it flows in the presence of surface tension and gravity, the cross-sectional morphology of micro-structural is by corner angle point
Bright rectangle is changed into the more smooth circle in surface, thus obtains required microchannel master structure；
（2）The preparation of PDMS flexibilities microchannel template, step is as follows：A beaker being of moderate size is taken, is cleaned up, then will
PDMS bulk materials and curing agent are according to volume ratio 10:1 ratio is mixed and stirred in beaker, makes mixed liquor in sky
Two hours are stood in gas fully to remove bubble removing, will not have alveolate mixed liquor to be poured into step（1）Obtained in it is micro- logical
On road mother matrix, and ensure that mixed liquor can cover all MCA, then be integrally placed on 90 DEG C of hot plates and heat 1h
Mixed liquor is fully cured；Naturally cool to the PDMS material being cured after room temperature from step（1）In microchannel mother matrix on
Take off, the flexible microchannel templates of PDMS have just been made；
（3）The preparation of hollow MCA, step is as follows：By step（2）In the flexible microchannel templates of obtained PDMS with it is clear
The substrate tight adhesion of wash clean together, in order to ensure PDMS Flexible formwork assemblies and substrate can all the time together with tight adhesion,
Suitably balancing weight can be added in its upper surface；So strip and cross section are formed between substrate and PDMS Flexible formwork assemblies
For the microchannel cavity of class semicircle；Then S1813 photoresists are instilled in PDMS Flexible formwork assemblies side, photoresist will be in capillary force
In the presence of flow into microchannel cavity；Standing 3 hours makes photoresist liquid have sufficient time to fill microchannel cavity；So
Afterwards, it is integrally heated on hot plate, is first heated at 65 DEG C 10 minutes, hot plate is then warming up to 90 DEG C and continues to add
Heat 90 minutes；In the process, solvent volatilizees in S1813 photoresists in the cavity of microchannel, and it is existing that heat backflow integrally occurs for photoresist
As being originally photo-etched the region that glue fills up and slowly having been flowed back since foremost, due to PDMS microchannels cavity wall and photoresist
Between have adhesion（Surface tension）, photoresist can not be completely free of the adhesion of microchannel cavity wall when intracavitary flows back,
Resulting result is exactly the photoresist total reflux of microcavity center section, and the photoresist being in contact with microcavity inwall will be stagnant
Stay on cavity inner wall, the photoresist after heating 90 minutes on the cavity wall of PDMS microchannels will be fully cured, now stop heating
And substrate is integrally cooled to room temperature, then the flexible microchannel templates of PDMS are taken off, just obtain soft with PDMS in substrate surface
Property shape of template same hollow MCA.
Beneficial effects of the present invention：Technical scheme operates simple and easy to apply, and hollow microchannel size is easy
Accurate control, made PDMS Flexible formwork assemblies are with low cost, and may be reused with microchannel mother matrix, used in each step
Material is readily available, therefore whole cost of manufacture is extremely low, with larger application prospect.
Brief description of the drawings
The preparation technology flow chart of the hollow MCAs of Fig. 1
Embodiment
Embodiment：A kind of preparation method of hollow MCA, is completed by following steps：
Step 1: the preparation of microchannel mother matrix, substrate for use is cleaned up and in rotary coating photoresist thereon；Stand very
It is placed on 65 DEG C of hot plates and heats 10 minutes after clock, then moves on 95 DEG C of hot plates and heat 30 minutes；Then there will be strip
The mask blank of shape micron pattern is in close contact with photoresist coating, and carries out photolithographic exposure；To the substrate after overexposure
Developed and just can obtain and lightproof part size identical strip micron box structure in reticle pattern；By this micro- knot
Set up on hot plate, be slowly warming up to 140 DEG C, heating is removed after 30 minutes makes it naturally cool to room temperature；Light at 140 DEG C
Photoresist is in molten condition, and it flows in the presence of surface tension and gravity, the cross-sectional morphology of micro-structural by
Sharp-featured rectangle is changed into the more smooth circle in surface, thus obtains required microchannel master structure.
Step 2: the preparation of PDMS flexibilities microchannel template, takes a beaker being of moderate size, cleans up, then will
PDMS bulk materials and curing agent are mixed and stirred in beaker according to certain volume ratio, make mixed liquor in air
Two hours of middle standing, fully to remove bubble removing, will not have alveolate mixed liquor to be poured into step（1）Obtained in microchannel
On mother matrix, and ensure that mixed liquor can cover all MCA, then be integrally placed on 90 DEG C of hot plates and heat 1h and make
Mixed liquor is fully cured；Naturally cool to the PDMS material being cured after room temperature from step（1）In microchannel mother matrix on take off
Under, the flexible microchannel templates of PDMS have just been made.
Step 3: the preparation of hollow MCA, the first step, by step（2）In the flexible microchannel moulds of obtained PDMS
Plate is together with the substrate tight adhesion cleaned up, in order to ensure that PDMS Flexible formwork assemblies can be adhered tightly to all the time with substrate
Together, balancing weight suitably can be added in its upper surface；So be formed between substrate and PDMS Flexible formwork assemblies strip and
Cross section is the microchannel cavity of class semicircle；Second step, photoresist is instilled in PDMS Flexible formwork assemblies side, and colloid is matched somebody with somebody with diluent
Than for 2:1, photoresist will flow into microchannel cavity in the presence of capillary force；Standing 3 hours makes photoresist liquid have foot
The enough time fills microchannel cavity；3rd step, it is integrally heated on hot plate, and 10 points are first heated at 65 DEG C
Clock, is then warming up to 90 DEG C by hot plate and continues to heat 90 minutes；In the process, the solvent in the cavity of microchannel in virgin rubber is waved
Hair, hot backflow phenomenon integrally occurs for photoresist, has originally been photo-etched the region that glue fills up and has slowly been flowed back since foremost, due to
There is adhesion between PDMS microchannels cavity wall and photoresist（Surface tension）, photoresist can not put completely when intracavitary flows back
The adhesion of de- microchannel cavity wall, resulting result is exactly the photoresist total reflux of microcavity center section, and with it is micro-
The photoresist that cavity wall is in contact will be trapped on cavity inner wall, the photoresist after heating 90 minutes on the cavity wall of PDMS microchannels
It will be fully cured, and now stop heating and substrate is integrally cooled to room temperature；4th step, then the flexible microchannel templates of PDMS are taken off
Fall, just obtained and PDMS Flexible formwork assembly shape same hollow MCAs in substrate surface.
Photoresist in present embodiment described in step one be with AZ9260 photoresists, by the resin with adhesive effect,
The emulsion for sensing illumination and the solvent composition for being able to maintain that liquid solution, also can select other colloids.
In present embodiment described in step one to used in substrate rotary coating photoresist spin coating machine speed low speed at a high speed
It is respectively set as rotating 10 seconds during 500r/min, rotates 40 seconds, rotated 10 seconds during 500r/min during 3500r/min.
Photolithography exposure energy in present embodiment described in step one is 600mJ/cm2, can be entered according to actual process situation
Row adjustment.
Developer solution model AZ400K used in being developed to substrate described in step one in present embodiment, developer solution with
Deionized water volume ratio is 1:3, developing time be 1 point 30 seconds.
Substrate in present embodiment described in step one often uses sheet glass or silicon chip or other materials.
PDMS in present embodiment described in step 2 is according to volume ratio 10 by bulk material and curing agent:1 ratio
Mix and stir in beaker.
The shape of obtained Flexible formwork assembly in present embodiment described in step 2 and the microchannel mother matrix described in step one
Planform is complementary.
Colloid in present embodiment described in step 3 is S1813 photoresists, and colloid is 2 with diluent proportioning:1, it is matched somebody with somebody
Than that can also be adjusted according to being actually needed.
Both are integrally placed in heating plate by the 3rd step in present embodiment described in step 3 first heats 10 at 65 DEG C
Minute, hot plate is then warming up to 90 DEG C and continues to heat 90 minutes, its acid extraction can be carried out according to actual conditions
Adjustment.
Described above is only embodiments of the present invention, it is noted that for those skilled in the art, do not departing from this
On the premise of inventive concept, some improvement can also be made, for example, changes the material of substrate, use different chemical materials replacements instead
Photoresist improves the specific implementation details that hollow MCA is prepared in the present invention, and these improvement also should be regarded as the present invention
Protection domain in.
Claims (7)
1. a kind of preparation method of hollow MCA, it is characterised in that comprise the following steps：
（1）The preparation of microchannel mother matrix, step is as follows：By substrate for use（Conventional sheet glass or silicon chip or other materials substrate）Clearly
Wash clean and in rotary coating photoresist thereon（By taking AZ9260 photoresists as an example）；65 DEG C of hot plates are placed on after standing ten minutes
Upper heating 10 minutes, then moves on 95 DEG C of hot plates and heats 30 minutes；Then by the photo etched mask with strip micron pattern
Plate is in close contact with AZ9260 photoresist coatings, and carries out photolithographic exposure；Substrate after overexposure, which is developed, just can obtain
To with reticle pattern lightproof part size identical strip micron box structure；By this micro-structural be placed in hot plate it
On, 140 DEG C are slowly warming up to, heating is removed after 30 minutes makes it naturally cool to room temperature；AZ9260 photoresists at 140 DEG C are
Through in molten condition, it flows in the presence of surface tension and gravity, the cross-sectional morphology of micro-structural is by corner angle point
Bright rectangle is changed into the more smooth circle in surface, thus obtains required microchannel master structure；
（2）The preparation of PDMS flexibilities microchannel template, step is as follows：A beaker being of moderate size is taken, is cleaned up, then will
PDMS bulk materials and curing agent are according to volume ratio 10:1 ratio is mixed and stirred in beaker, makes mixed liquor in sky
Two hours are stood in gas fully to remove bubble removing, will not have alveolate mixed liquor to be poured into step（1）Obtained in it is micro- logical
On road mother matrix, and ensure that mixed liquor can cover all MCA, then be integrally placed on 90 DEG C of hot plates and heat 1h
Mixed liquor is fully cured；Naturally cool to the PDMS material being cured after room temperature from step（1）In microchannel mother matrix on
Take off, the flexible microchannel templates of PDMS have just been made；
（3）The preparation of hollow MCA, step is as follows：By step（2）In the flexible microchannel templates of obtained PDMS with it is clear
The substrate tight adhesion of wash clean together, in order to ensure PDMS Flexible formwork assemblies and substrate can all the time together with tight adhesion,
Suitably balancing weight can be added in its upper surface；So strip and cross section are formed between substrate and PDMS Flexible formwork assemblies
For the microchannel cavity of class semicircle；Then S1813 photoresists are instilled in PDMS Flexible formwork assemblies side, photoresist will be in capillary force
In the presence of flow into microchannel cavity；Standing 3 hours makes photoresist liquid have sufficient time to fill microchannel cavity；So
Afterwards, it is integrally heated on hot plate, is first heated at 65 DEG C 10 minutes, hot plate is then warming up to 90 DEG C and continues to add
Heat 90 minutes；In the process, solvent volatilizees in S1813 photoresists in the cavity of microchannel, and it is existing that heat backflow integrally occurs for photoresist
As being originally photo-etched the region that glue fills up and slowly having been flowed back since foremost, due to PDMS microchannels cavity wall and photoresist
Between have adhesion（Surface tension）, photoresist can not be completely free of the adhesion of microchannel cavity wall when intracavitary flows back,
Resulting result is exactly the photoresist total reflux of microcavity center section, and the photoresist being in contact with microcavity inwall will be stagnant
Stay on cavity inner wall, the photoresist after heating 90 minutes on the cavity wall of PDMS microchannels will be fully cured, now stop heating
And substrate is integrally cooled to room temperature, then the flexible microchannel templates of PDMS are taken off, just obtain soft with PDMS in substrate surface
Property shape of template same hollow MCA.
2. the preparation method according to claims 1, it is characterised in that the step（1）In be used to preparing microchannel it is female
The material of version is photoresist, and the present invention is only not limited solely to this by taking AZ9260 photoresists as an example.
3. the preparation method according to claims 1, it is characterised in that the step（1）The middle substrate material used for
Glass or silicon or other materials.
4. the preparation method according to claims 1, it is characterised in that the step（1）In thermal reflux be order
AZ9260 photoresists micro-structural is heated 30 minutes at 140 DEG C, and it is semicircular strip to be then cooled to room temperature and obtain cross section
Shape micro-structural mother matrix.
5. the preparation method according to claims 1, it is characterised in that the step（2）Middle PDMS bulk materials and solid
Agent is according to volume ratio 10:1 proportions, for preparing the flexible microchannel templates of PDMS.
6. the preparation method according to claims 1, it is characterised in that the step（3）In in PDMS Flexible formwork assemblies one
Side instills S1813 photoresists, and colloid can have a variety of proportionings with diluent, and photoresist will flow into micro- in the presence of capillary force
Channel cavity, step（3）Middle material therefor can also select other materials, be not limited solely to S1813 photoresists.
7. the preparation method according to claims 1, it is characterised in that the step（3）In to the photoetching in microchannel
Occurs hot backflow phenomenon after glue heating, because photoresist nevertheless suffers from microchannel cavity inner wall adhesion when microchannel intracavitary flows back
The effect of power, the photoresist being in contact with microcavity inwall will be trapped on cavity inner wall, after heating on the cavity wall of PDMS microchannels
Photoresist will be fully cured, now stop heating and substrate be integrally cooled to room temperature, then by the flexible microchannel templates of PDMS
Take off, just obtained and the hollow MCA of PDMS Flexible formwork assembly shape identicals in substrate surface.
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Cited By (13)
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| CN109231151A (en) * | 2018-09-26 | 2019-01-18 | 天津大学 | A kind of device and application for making self-assembly structure |
| CN109445248A (en) * | 2018-12-29 | 2019-03-08 | 吉林大学 | Utilize the method and application of capillarity coining metal nanometer line |
| CN110579182A (en) * | 2019-09-18 | 2019-12-17 | 吉林大学 | PDMS-rhodamine-assisted nanochannel morphology characterization method |
| CN110713168A (en) * | 2018-07-13 | 2020-01-21 | 浙江清华柔性电子技术研究院 | Method for preparing microfluid device |
| CN110860320A (en) * | 2019-11-19 | 2020-03-06 | 鲁东大学 | Micro-fluidic chip for simultaneously detecting multiple antibiotic residues in drinking water and application thereof |
| CN111029895A (en) * | 2019-12-12 | 2020-04-17 | 上海交通大学 | Micro-channel radiator and manufacturing method thereof |
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| CN112121874A (en) * | 2020-09-27 | 2020-12-25 | 南京南智先进光电集成技术研究院有限公司 | Preparation method of micro-channel structure chip and micro-channel structure chip |
| CN112782795A (en) * | 2021-01-29 | 2021-05-11 | 鲁东大学 | Method for preparing submicron grating with half period |
| CN113649097A (en) * | 2021-09-17 | 2021-11-16 | 鲁东大学 | Method for preparing two-channel structure on microfluidic chip by using single-channel PDMS (polydimethylsiloxane) induced template |
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| CN111257206A (en) * | 2018-11-30 | 2020-06-09 | 山东大学 | Method for manufacturing cell distribution analysis device |
| CN109445248A (en) * | 2018-12-29 | 2019-03-08 | 吉林大学 | Utilize the method and application of capillarity coining metal nanometer line |
| CN110579182A (en) * | 2019-09-18 | 2019-12-17 | 吉林大学 | PDMS-rhodamine-assisted nanochannel morphology characterization method |
| CN110860320A (en) * | 2019-11-19 | 2020-03-06 | 鲁东大学 | Micro-fluidic chip for simultaneously detecting multiple antibiotic residues in drinking water and application thereof |
| CN111029895A (en) * | 2019-12-12 | 2020-04-17 | 上海交通大学 | Micro-channel radiator and manufacturing method thereof |
| CN112121874A (en) * | 2020-09-27 | 2020-12-25 | 南京南智先进光电集成技术研究院有限公司 | Preparation method of micro-channel structure chip and micro-channel structure chip |
| WO2022068191A1 (en) * | 2020-09-29 | 2022-04-07 | 江苏大学 | Method for preparing microstructure array surface with smooth inclined bottom face on basis of air molding method |
| US11655144B2 (en) | 2020-09-29 | 2023-05-23 | Jiangsu University | Method for preparing micro-cavity array surface product with inclined smooth bottom surface based on air molding method |
| CN112782795A (en) * | 2021-01-29 | 2021-05-11 | 鲁东大学 | Method for preparing submicron grating with half period |
| CN112782795B (en) * | 2021-01-29 | 2022-06-07 | 鲁东大学 | Method for preparing submicron grating with half period |
| CN113856776B (en) * | 2021-07-16 | 2022-05-27 | 南京鼓楼医院 | Preparation method and application of responsive structural color micro-pipeline |
| CN113856776A (en) * | 2021-07-16 | 2021-12-31 | 南京鼓楼医院 | Preparation method and application of responsive structural color micro-pipeline |
| CN113649097A (en) * | 2021-09-17 | 2021-11-16 | 鲁东大学 | Method for preparing two-channel structure on microfluidic chip by using single-channel PDMS (polydimethylsiloxane) induced template |
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