CN107105621A - Culture apparatus and cultural method - Google Patents

Culture apparatus and cultural method Download PDF

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Publication number
CN107105621A
CN107105621A CN201580068837.2A CN201580068837A CN107105621A CN 107105621 A CN107105621 A CN 107105621A CN 201580068837 A CN201580068837 A CN 201580068837A CN 107105621 A CN107105621 A CN 107105621A
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CN
China
Prior art keywords
cultivation
cultivation solution
base portion
temperature
culture
Prior art date
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Pending
Application number
CN201580068837.2A
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Chinese (zh)
Inventor
马场将人
池口直树
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Yanmar Green System Co Ltd
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Sumitomo Electric Industries Ltd
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Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of CN107105621A publication Critical patent/CN107105621A/en
Pending legal-status Critical Current

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Classifications

    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01G—HORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G27/00—Self-acting watering devices, e.g. for flower-pots
    • A01G27/04—Self-acting watering devices, e.g. for flower-pots using wicks or the like
    • A01G27/06—Self-acting watering devices, e.g. for flower-pots using wicks or the like having a water reservoir, the main part thereof being located wholly around or directly beside the growth substrate
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01G—HORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G31/00—Soilless cultivation, e.g. hydroponics
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A40/00—Adaptation technologies in agriculture, forestry, livestock or agroalimentary production
    • Y02A40/10—Adaptation technologies in agriculture, forestry, livestock or agroalimentary production in agriculture

Abstract

Present invention offer is a kind of can to control the culture apparatus of ground temperature with low cost and relative good accuracy.Culture apparatus according to embodiments of the present invention includes：Cultivate long-term cropping in base portion, the culture base portion；And cultivation solution feed mechanism, the cultivation solution feed mechanism is to culture base portion supply cultivation solution, wherein culture base portion includes being supplied to the region of cultivation solution by capillarity phenomenon；And the culture apparatus also includes temperature control device, the temperature control device control is supplied to the temperature of the cultivation solution of culture base portion.Preferably：Cultivation solution feed mechanism includes being used to store cultivating liquid bath, storing the holding tank of the cultivation solution from cultivation liquid bath supply for first for cultivation solution, and the cultivation solution from holding tank is supplied to the feed flow portion for cultivating base portion；And temperature control device is attached to cultivation liquid bath or feed flow portion.Preferably, the culture apparatus also includes supplying the cultivation solution auxiliary feed mechanism of the cultivation solution in cultivating liquid bath from upper direction culture medium portion；Temperature control device is attached to cultivation liquid bath；And the cultivation solution for aiding in feed mechanism to be supplied to culture base portion by cultivation solution by holding tank is recycled to cultivation liquid bath.

Description

Culture apparatus and cultural method
Technical field
The present invention relates to culture apparatus and cultural method.
Background technology
Respectively have be suitable for growth temperature crop cultivation during, these be suitable for growth temperature often through Temperature is controlled to provide.Especially, in order that the aerial part successful growth of crop, root needs extensively and in depth grown.By In this reason, therefore, to assure that be suitable for the ground temperature of root growth.In current agricultural, it is however generally that, by using air-conditioning or heat Water pipe controls temperature to perform this temperature control of ground temperature.
In this control of temperature, in order to improve the cooling effectiveness and the efficiency of heating surface in greenhouse, designed heating and Cooling system, in the heating and cooling system, sets roof and below roof in top in top in greenhouse Roof in bottom, to form airspace between roof in the roof in top and bottom (with reference to Japanese Unexamined Patent Shen No.2001-211757 please be disclose).This heating and cooling system form the airspace so that below the airspace Cultivation space will not be influenceed by extraneous air, so as to improve the cooling effectiveness and heating effect for the air-conditioning being arranged in cultivation space Rate.
Prior art literature
Patent document
Patent document 1：Japanese Unexamined Patent Application Publication 2001-211757
The content of the invention
Technical problem
However, in these conventional cultivation devices of temperature to control ground temperature are controlled by using air-conditioning or hot-water line, making Forming apparatus cost is high, and also quite high due to being illuminated caused by the control to temperature and heating expense.This causes crop The increased shortcoming of cultivation cost.In addition, when as usual by the control to temperature to control ground temperature, temperature change with There is the delayed of special time between the change of caused ground temperature.In addition, it is also difficult to which preferred temperature is arrived into ground temperature control.
The present invention is made in these cases.One purpose is to provide for making it possible to inexpensive and relatively high The culture apparatus and cultural method of precision controlling ground temperature.
The solution of problem
Inventor how to realize the research of above-mentioned purpose.As a result, they have been found that culture base portion ground temperature with The temperature ratio of cultivation solution is more closely related to warm indoor air temperature.This is possible, because compared with air, being used as the cultivation of liquid Training liquid has high-termal conductivity.In other words, it was found by the inventors that with based on controlling showing for warm indoor air temperature using air-conditioning etc. There is ground temperature control method to compare, control ground temperature if based on the temperature control of the cultivation solution to being supplied to culture base portion, then can Realize the efficient control of the ground temperature to cultivating base portion.
Based on these discoveries, the present invention has been made.Culture apparatus includes according to an embodiment of the invention：Culture medium Planted in portion, the culture base portion and be implanted with crop；And cultivation solution feed mechanism, the cultivation solution feed mechanism is configured to institute Culture base portion supply cultivation solution is stated, wherein, the culture base portion includes following region：The cultivation solution is supplied by capillarity phenomenon To the extremely region, and the culture apparatus also includes temperature control device, and the temperature control device is configured to supplying Temperature to the cultivation solution to the culture base portion is controlled.
Cultural method includes planting the culture base portion supply cultivation solution for being implanted with crop thereto according to an embodiment of the invention, Wherein, the culture base portion includes following region：The cultivation solution is supplied to the region by capillarity phenomenon, and to quilt The temperature for being supplied to the cultivation solution of the culture base portion is controlled.
Invention effect
The culture apparatus and the cultural method make it possible to control the ground temperature with low cost and relative good accuracy.
Brief description of the drawings
[Fig. 1] Fig. 1 is the schematic diagram of the culture apparatus according to the first embodiment of the present invention.
[Fig. 2] Fig. 2 is the schematic plan view of the example of the construction of the culture apparatus in pictorial image 1.
[Fig. 3] Fig. 3 is the schematic diagram of culture apparatus according to the second embodiment of the present invention.
[Fig. 4] Fig. 4 is the schematic diagram of culture apparatus according to the third embodiment of the invention.
[Fig. 5] Fig. 5 be represent warm indoor air temperature, in holding tank liquid temperature and cultivate base temperature temperature change curve Figure.
[Fig. 6] Fig. 6 is to represent the relation in sunshine amount and warm indoor air temperature, holding tank between liquid temperature and culture base temperature Curve map.
[Fig. 7] Fig. 7 is the curve map for representing the relation between the water absorption of crop and the cooling effect to cultivating base portion.
Embodiment
[descriptions of embodiments of the invention]
Culture apparatus includes according to an embodiment of the invention：Cultivate to plant in base portion, the culture base portion and be implanted with crop；With And cultivation solution feed mechanism, the cultivation solution feed mechanism be configured to it is described culture base portion supply cultivation solution, wherein, it is described Cultivating base portion includes following region：The cultivation solution is supplied to the region, and the culture apparatus by capillarity phenomenon Also include temperature control device, the temperature control device is configured to the temperature to supplying the cultivation solution to the culture base portion It is controlled.
The culture apparatus includes being used to be fed into the temperature control device of the cultivation solution of culture base portion, to pass through hollow billet Phenomenon is via above-mentioned zone to culture base portion supply through temperature controlled cultivation solution.Compared with outside air temperature, the ground of base portion is cultivated The change of temperature and the temperature of cultivation solution are more close.For this reason, it is configured to control the cultivation of the temperature of cultivation solution Training device can control to cultivate the temperature of base portion relative good accuracy.In addition, the culture apparatus is configured to use cultivation solution Heat is transmitted, the cultivation solution is such fluid：Its heat release and diffusion are respectively less than air and compared.With utilizing the control such as air-conditioning The regular situation of temperature is compared, and this can realize the efficient control of the temperature of culture base portion, so as to reduce the temperature of control culture base portion The equipment cost and operating cost of degree.
In addition, in the culture apparatus, planting the culture base portion for being implanted with crop including supplying cultivation solution by capillarity phenomenon Region.As a result, the glut of cultivation solution can be avoided so that can stably apply the appropriate moisture side of body to the root of crop Compel (water stress).In addition, the region for being fed with cultivation solution by capillarity phenomenon has the gas phase bigger than liquid phase, therefore tool There is highly-breathable.For this reason,, also can be effective in the case of oxygen supply structure is lacked in the culture apparatus Ground suppresses due to root rot caused by anoxic.This can reduce equipment cost and operation cost.Herein, " water stress " Mean for example because crop is exposed to drought stress caused by low humidity, and by the high salinity environment around crop is drawn Osmotic stress caused by the Thief zone pressure risen.
The cultivation solution feed mechanism is preferably included：Liquid bath is cultivated, the cultivation liquid bath is configured to store the cultivation Train liquid；Holding tank, the holding tank is configured to being stored for the first time from the cultivation solution of the cultivation liquid bath supply；With And feed flow portion, the feed flow portion is configured to from the holding tank supply the cultivation solution to the culture base portion, and institute Temperature control device is stated to be disposed at the cultivation liquid bath or at the feed flow portion.In this case, it is described to plant Training liquid feed mechanism includes holding tank and feed flow portion so that, i.e., when convenient culture medium portion and holding tank are isolated from each other, it will can also plant Training liquid is easy and is definitely supplied in culture base portion.In addition, when the temperature control device is disposed at cultivation liquid bath, For example, the cultivation solution for being supplied to multiple holding tanks from cultivation liquid bath can be while be temperature controlled.Alternatively, when the temperature When controlling organization is disposed at feed flow portion, in the above-mentioned zone and the temperature controller of the culture base portion for being fed with cultivation solution There is small distance between structure.As a result, culture base portion is supplied in the short time through temperature controlled cultivation solution, so as to reduce training Support the time lag of the temperature change in base portion.
Preferably, in addition to cultivation solution auxiliary feed mechanism, cultivation solution auxiliary feed mechanism is configured to：Will be described The top of the cultivation solution from the culture base portion in cultivation liquid bath is supplied to the culture base portion；The temperature control device It is disposed at cultivation liquid bath；And it is supplied to the cultivation of culture base portion always by cultivation solution auxiliary feed mechanism Liquid is preferably recycled to cultivation liquid bath by holding tank.In this case, included cultivation solution aids in feed mechanism by structure Cause to supply the cultivation solution in being provided with the cultivation liquid bath of temperature control device from upper direction culture medium portion.This, which can increase, flows through training The flow velocity through temperature controlled cultivation solution of base portion is supported, so as to strengthen the temperature control effect to cultivating base portion.As a result, i.e., it is convenient When the water absorption of crop is few, for example, in the starting stage of cultivation or during night, also can more definitely control culture medium The temperature in portion.In addition, the cultivation solution for aiding in feed mechanism to be supplied to culture base portion always by the cultivation solution is recycled to cultivation solution Groove.As a result, culture base portion is without excessive cultivation solution, so as to maintain to put on the appropriate water stress of the root of crop.
The cultivation solution feed mechanism can include cultivation liquid bath, and the cultivation liquid bath is configured to store the cultivation Liquid；And holding tank, the holding tank is configured to store the cultivation solution that is supplied of cultivation liquid bath, and The temperature control device is disposed at the cultivation liquid bath.In this case, the temperature control device is disposed in It is configured to cultivation solution being supplied at the cultivation liquid bath of holding tank.As a result, for example, being supplied when from cultivation liquid bath to multiple holding tanks During to cultivation solution, the cultivation solution for being supplied to the multiple holding tank can be while be temperature controlled.In addition, with for holding tank list Solely perform temperature controlled situation to compare, the energy required for the temperature control of cultivation solution can be reduced, this can further be reduced Operating cost.
The cultivation solution feed mechanism be preferably constructed for：So that it is described cultivation liquid bath in the cultivation solution with it is described The temperature difference within 5 DEG C is realized between the cultivation solution in culture base portion.In this case, the cultivation solution feed mechanism quilt The temperature less than or equal to this upper limit is realized between the cultivation solution in cultivation solution and culture base portion for being configured to cultivate in liquid bath Difference.This can be more accurately by the temperature control of culture medium to preferred temperature.
Preferably, it further comprises the mechanism for the liquid level for being configured to measure the cultivation solution in holding tank.In this case, The included mechanism is configured to measure the liquid level of the cultivation solution in holding tank.Liquid level based on actual measurement, it may be determined that put on The water stress of the root of crop.The control of the liquid level of cultivation solution in holding tank enables appropriate water stress to be applied in In the root of crop.As a result, the sugared content of crop to be harvested can further be increased.
The temperature control device preferably includes thermostat and heater.In this case, using including thermostat With the temperature control device of heater, further to reduce equipment cost, and the temperature of cultivation solution is realized using simple structure Control.
Culture base portion preferably includes multiple filler particles in framework and the framework.Filled up in the framework of culture base portion Grain in this case, further raising gas phase and liquid phase in the above-mentioned zone of cultivation solution can be fed with by capillarity phenomenon Ratio, so as to effectively improve oxygen delivery capacity.The usage amount of the particle (such as soil) of fill frame causes have in this region There is capillarity phenomenon.Therefore, compared with conventional soil cultivation, amount of soil used can be significantly decreased, this causes reduction culture base portion Weight.Therefore, arable land, and the regulation of stand can be built on the stand that the cheap material as such as pitch tube is formed The difference of height in arable land can easily be solved.
Filler particles preferably have more than 3cm and below 300cm hollow billet lifting height.Raised using on this hollow billet Degree, can improve the free degree of device design, and can also improve the workability of farm work.
The particle preferably include particle diameter be more than 0.1mm and below 1mm, mass percent be more than 50% it is multiple Simple grain.When particle has these features, culture base portion can more effectively have the gas phase in capillarity phenomenon, and above-mentioned zone Further increase with the ratio of liquid phase, this can more effectively suppress due to root rot caused by anoxic.Herein, " grain Footpath " is the average-size of the particle determined as follows：Using the sieve defined in JIS-Z8801-1 (2006), according to sieve The order of hole from big to small, sequentially screens particle, and number and slot size of each sieve according to oversized particle is entered Row is calculated.
The particle preferably has 1.00g/cm3Above and 3.00g/cm3Following tap density.When particle has this During tap density in the range of kind, the particle in culture base portion more effectively can have in capillarity phenomenon, and above-mentioned zone The ratio of gas phase and liquid phase further increases, so as to more effectively suppress due to root rot caused by anoxic.Herein, " tap density " means the bulk density of powder, and is the value measured according to JIS-Z2512 (2012).
Cultural method according to another embodiment of the present invention includes planting the culture base portion supply cultivation for being implanted with crop thereto Liquid is trained, wherein, the culture base portion includes following region：The cultivation solution is supplied to the region by capillarity phenomenon, and And the temperature of the cultivation solution to being fed into the culture base portion is controlled.
According to the cultural method, the cultivation solution for being supplied to culture base portion is temperature controlled so that through temperature controlled Cultivation solution is fed into culture base portion by capillarity phenomenon via above-mentioned zone.Compared with outside air temperature, the ground temperature of base portion is cultivated Change it is more related to the temperature of cultivation solution.For this reason, using this temperature controlled cultivation of cultivation solution Method can control to cultivate the temperature of base portion relative good accuracy.In addition, in the cultural method, being realized by cultivation solution Heat transfer, the cultivation solution is such fluid：Compared with air, its heat release and diffusion are less.With utilizing the control such as air-conditioning The regular situation of temperature is compared, and this can efficiently control the temperature for cultivating base portion, so as to reduce the temperature control institute of culture base portion The equipment cost and operating cost caused.
In addition, according to the cultural method, planting the culture base portion for being implanted with crop including being fed with cultivation by capillarity phenomenon The region of liquid.As a result, the glut of cultivation solution can be avoided so that can stably apply appropriate moisture to the root of crop Stress.In addition, the above-mentioned zone for being fed with cultivation solution by capillarity phenomenon has the gas phase bigger than liquid phase, therefore with high ventilative Property.For this reason, according to the cultural method, in the case of oxygen supply structure is lacked, also can effectively suppress by The root rot caused by anoxic.This can reduce equipment cost and operation cost.
[details of embodiments of the invention]
Hereinafter, culture apparatus according to an embodiment of the invention and cultural method will be described with reference to the drawings.
[first embodiment]
Illustrated culture apparatus 1 mainly includes in Fig. 1：Base portion 2 is cultivated, crop Q is implanted with wherein planting；Cultivation solution supplies machine Structure 3, it is configured to the culture supply cultivation solution of base portion 2 R；And temperature control device 4, it is configured to being supplied to culture The cultivation solution R of base portion 2 temperature is controlled.Culture base portion 2 includes：Framework 5；Filler particles 6, its fill frame 5；And it is logical Cross due to the cultivation solution supply area 7 of capillarity phenomenon supply cultivation solution R caused by filler particles 6.Cultivation solution feed mechanism 3 is wrapped Include the cultivation liquid bath 8 for being configured to store cultivation solution R；It is configured to perform and the cultivation solution R supplied from cultivation liquid bath 8 is carried out just The holding tank 9 of secondary storage；And it is configured to cultivation solution R being supplied to the feed flow portion 10 of culture base portion 2 from holding tank 9.Temperature Controlling organization 4 includes being disposed in the thermostat 11 and heater 12 at cultivation liquid bath 8.Culture apparatus 1 includes hiding permeable of root Material 16, the first waterproof sheet 17a and the second waterproof sheet 17b.
<Cultivate base portion>
Culture base portion 2 includes：Framework 5；The filler particles 6 of fill frame 5；And by fill up filler particles 6 and shape Into layer in, pass through the cultivation solution supply area 7 that capillarity phenomenon supplies cultivation solution R.Culture base portion 2 is kind of the portion for being implanted with crop Q Point.
(framework)
Framework 5 keeps the filler particles 6 of fill frame 5, and is also prevented from outside crop Q root arrival framework 5.
Framework 5 is bottomed tube body.The flat shape of framework 5 is not particularly limited；From the viewpoint of transport, flat shape It is preferably capable of realizing the shape stacked, more preferably circle.The bottom of framework 5 is made up of the permeable sheet material 16 of screening root.Therefore, At least the bottom of framework 5 is made up of the permeable sheet material 16 of screening root so that prevent from cultivating the root immersion storage of the crop Q in base portion 2 In groove 9.
Furthermore, in addition to the bottom of framework 5, the sidepiece of framework 5 and top can also be made up of the permeable sheet material 16 of screening root.So And, only it is that bottom surface is preferably made up of the permeable sheet material 16 of screening root from the viewpoint of the water-retaining property for improving culture base portion 2.
The lower limit of the mean inside diameter of framework 5 is preferably 6cm, more preferably 9cm.On the other hand, the mean inside diameter of framework 5 The upper limit is preferably 23cm, more preferably 15cm.When the mean inside diameter of framework 5 is less than lower limit, crop Q root possibly can not be filled Divide and stretch out, so as to cause bad growth.On the contrary, when the mean inside diameter of framework 5 exceedes the upper limit, cultivating the quality of base portion 2 May be excessive.Furthermore, " mean inside diameter " is referred in the short transverse of framework 5, and the inner surface configuration with framework 5 is (in plane In see) have diameter of a circle of the same area (positive round conversion diameter) average value.
Framework 5 is not particularly limited in the material for forming the part in addition to bottom (hiding the permeable sheet material 16 of root)；Material Example includes：Paper with gas permeability and water penetration；And resin sheet.Resin sheet can be braided fiber or non-woven fibre Dimension；In particular it is preferred to be porous resin film, more preferably by fluorine resin film as stretching such as polytetrafluoroethylene (PTFE) The porous resin film of generation.
The permeable sheet material 16 of root is hidden to be arranged only in the bottom surface portions of framework 5；In addition, as shown in fig. 1, sheet material 16 It can also be arranged in region in plan view in addition to framework 5.The permeable sheet material 16 of screening root with water penetration is with such as lower section Formula is arranged：So that in the case where cultivation solution need not be forbidden to transmit, there is provided the function of such as waterproof and shading.Furthermore, framework 5 Bottom can be incorporated into the screening permeable sheet material 16 of root；Alternatively, framework 5 can be placed on the screening permeable sheet material 16 of root.
The material for hiding the permeable sheet material 16 of root is not particularly limited；The example of material includes paper and braided fiber.
The lower limit for hiding the average thickness of the permeable sheet material 16 of root is preferably 0.1mm, more preferably 0.2mm.On the other hand, root is hidden The upper limit of the average thickness of permeable sheet material 16 is preferably 5mm, more preferably 3mm.When the average thickness for hiding the permeable sheet material 16 of root is small When lower limit, possibly it can not fully stop root.On the contrary, when the average thickness for hiding the permeable sheet material 16 of root exceedes the upper limit, hiding root saturating The cost of water sheet material 16 can become too high.
(filler particles)
The middle level portion of the filler particles 6 of fill frame 5 and lower layer part are included in the cultivation solution supply with capillarity phenomenon In region 7.Filler particles 6 are not particularly limited, as long as the particle after filling has capillarity phenomenon.Filler particles 6 Example includes soil, the thin float stone of such as pumice sand, the powdered granule of porous volcanic rock, granular rock wool, coral sand, coral and wood Charcoal；And two or more therefrom selected may be used as mixture.In these materials, from substantially ensure that capillarity phenomenon with And from the viewpoint of the soil not used can be returned as natural soils, filler particles 6 are preferably soil.
The example of soil is native, red including the ridging of commercially available gardening, vermiculite, bentonite, zeolite, sand, deer natural pond Beautiful soil and thin sand and soil.It is preferably husky in these materials.Sand is used as soil can further increase the ratio of gas phase and liquid phase Rate, this effectively improves oxygen delivery capacity.As a result, or even in the case where lacking oxygen supply structure, also can effectively it suppress due to lacking Root rot caused by oxygen.In addition, compared with common ridging, sand is with the low content of organic matter and a small amount of micro- life survived wherein Thing so that be unlikely to occur root disease.
On the simple grain of filler particles 6, the lower limit of particle diameter is preferably 0.1mm, more preferably 0.15mm.On the other hand, grain The upper limit in footpath is preferably 1mm, more preferably 0.6mm.When particle diameter is less than lower limit, cultivation solution supply area 7 may have very few The gap of amount, this may cause excess water and very likely grow harmful microorganism.On the contrary, when particle diameter exceedes the upper limit When, cultivation solution supply area 7 may have excessive space, and this may cause capillarity phenomenon not enough so that the cultivation of scheduled volume Liquid R may be not supplied with to root.
In filler particles 6, the lower limit of the content of the simple grain of the particle diameter with more than 0.1mm and below 1mm is preferably matter Measure percentage 50%, more preferably mass percent 80%.When the content of simple grain is less than lower limit, cultivation solution supply area 7 There may be not enough capillarity phenomenon so that the cultivation solution R of scheduled volume may be not supplied with to root.
On the particle of filler particles 6, the lower limit of tap density is preferably 1.00g/cm3, more preferably 1.65g/cm3, more Preferably 1.70g/cm3.On the other hand, the upper limit of the tap density of particle is preferably 3.00g/cm3, more preferably 1.85g/ cm3, more preferably 1.83g/cm3.When the tap density of particle is less than lower limit, cultivation solution supply area 7 may have excessive Space, this may cause capillarity phenomenon not enough so that the cultivation solution R of scheduled volume may be not supplied with to root.On the contrary, working as particle Tap density exceed the upper limit when, cultivation solution supply area 7 may have very few gap, this can cause excess water Very likely grow harmful microorganism.
On filler particles 6, the lower limit of hollow billet lifting height is preferably 3cm, more preferably 10cm, more preferably 20cm. On the other hand, on filler particles 6, the upper limit of hollow billet lifting height is preferably 300cm, more preferably 200cm, more preferably 40cm.Filler particles 6 are prepared as so that hollow billet lifting height meets this scope, so that the free degree of device design is improved, And also improve the workability of farm work.When filler particles 6 have the hollow billet lifting height less than lower limit, cultivation solution R may nothing Method is fed into thing Q root, and this causes crop Q bad growth.On the contrary, when filler particles 6 have the hollow billet more than the upper limit During lifting height, water stress is likely difficult to put on root.
Furthermore, hollow billet lifting height [m] h is determined by below equation (1), wherein cultivation solution R surface tension [N/m] Represented by T, cultivation solution R contact angle [°] is represented by θ, cultivation solution R density [kg/m3] represented by ρ, weight Power [m/s2] represented by g, and 10 mass % particle diameters [m] of filler particles 6 are represented by r.Herein, " 10 matter Amount % particle diameters " are referred to and read according to the particle-size accumulation curve in JIS-A1204 (2009) " the granularity test method of soil " , by granular mass percentage be 10% when particle diameter D (10% particle diameter D10)。
H=2Tcos θ/ρ gr (1)
In single framework 5, the bottom surface relative to framework 5 in cultivation solution supply area 7 is located at the position at 0cm height Place is put, the lower limit of cultivation solution R mean flow rate is preferably 0.2L/hr, more preferably 0.3L/hr.When cultivation solution R mean flow rate During less than lower limit, the water absorption rate required for crop Q may be unsatisfactory for, crop Q may be dead because of water shortage.Furthermore, mean flow rate is The survey of the cultivation solution R of its cultivation solution supply area 7 throughput [L] is reached by the bottom surface of five or more separate frames 5 The average value of value.
Under the conditions of the mean flow rate of cultivation solution R in cultivation solution supply area 7 is sufficiently high, there is crop Q water suction The place for the mean flow rate that rate is less than or equal in cultivation solution supply area 7.Therefore, crop Q unrestrictedly absorbs water (this In the case of water absorption be referred to as daily maximum water absorption).From this state, with the liquid table of holding tank 9 described below The liquid level in face is slowly reduced, and water supply rate is gradually reduced, and this produces limitation to water suction, and (water absorption in this case is referred to as often Day limitation water absorption).In culture apparatus 1, crop Q daily water absorption can be approx calculated according to daily water absorption, and The water absorption can be restricted to desired ratio.I.e. convenient cultivation solution R mean flow rate is by limited time, and the supply of water is also persistently carried out. Therefore, compared with limiting the situation of output, culture base portion 2 is unlikely dried so that the destroyed possibility in root is relatively low. Also the guarantor for causing to cultivate base portion 2 due to the limitation of water supply rate can be measured on the basis of the reduction of the weight of culture base portion 2 The decline of water.Therefore, custodian can manage moisture in the case of without expensive moisture transducer.
The lower limit of the packed height of filler particles 6 is preferably 1cm, more preferably 3cm, is further preferably 5cm.On the other hand, The upper limit of the packed height of filler particles 6 is preferably 50cm, more preferably 30cm, is further preferably 15cm.When filling out for filler particles 6 When filling height less than lower limit, crop Q root may destroy the hollow billet structure of cultivation solution supply area 7, and this may cause bad life It is long.On the contrary, when the packed height of filler particles 6 exceedes the upper limit, the quality for cultivating base portion 2 may be excessive.
The lower limit of the moisture-holding capacity of cultivation solution R in cultivation solution supply area 7 is preferably 0.04L, more preferably 0.05L, then Preferably 0.10L.On the other hand, the upper limit of the moisture-holding capacity of the cultivation solution R in cultivation solution supply area 7 is preferably 2L, more preferably It is further preferably 0.6L for 1.5L.When the moisture-holding capacity of the cultivation solution R in cultivation solution supply area 7 is less than lower limit, due to for example planting Train the failure of device 1 and cause the water loss that (by cultivation solution feed mechanism 3) is supplied to culture base portion 2 very likely to cause crop Q is all impaired.On the contrary, when cultivation solution R moisture-holding capacity exceedes the upper limit, the quality for cultivating base portion 2 may be larger, or moisture-holding capacity It is likely difficult to control.Furthermore, moisture-holding capacity is by the way that the quality of the culture base portion 2 in water conservation state is subtracted in dry state Cultivate the quality of base portion 2 and determined by being changed by volume to end value.
<Cultivation solution feed mechanism>
Cultivation solution feed mechanism 3 includes：It is configured to store cultivation solution R cultivation liquid bath 8；It is configured to perform from cultivation The holding tank 9 of the first storage for the cultivation solution R that liquid bath 8 is supplied；And be configured to cultivation solution R being supplied to training from holding tank 9 Support the feed flow portion 10 of base portion 2.
(feed flow portion)
Feed flow portion 10 is sheet material part.Feed flow portion 10 is disposed between culture base portion 2 and holding tank 9 so that the feed flow portion 10 part is immersed in holding tank 9 described below.Feed flow portion 10 raises the cultivation in holding tank 9 by capillarity phenomenon Liquid R, cultivation solution R is supplied to by hiding the permeable sheet material 16 of root the bottom of culture base portion 2.Cultivation solution feed mechanism 3 includes supplying Liquid portion 10；So as to which when that is, convenient culture medium portion 2 and holding tank 9 are isolated from each other, also cultivation solution R can be supplied easily and definitely Into culture base portion 2.
Feed flow portion 10 is not particularly limited, as long as it can raise cultivation solution R, so that cultivation solution R to be supplied by capillarity phenomenon It is given to the bottom of culture base portion 2.The example in feed flow portion 10 includes non-woven fiber, rock wool sheet material, mat sheet and polyurethane Sheet material.It is preferably non-from appropriate capillarity phenomenon and from the viewpoint of realizing appropriate water absorption rate among these materials Braided fiber.
The lower limit of the water penetration in feed flow portion 10 is preferably 0.01%, and more preferably 1%.On the other hand, feed flow portion 10 is saturating The aqueous upper limit is preferably 40%, and more preferably 30%., can be to culture base portion 2 when the water penetration in feed flow portion 10 is less than lower limit Bottom supply insufficient amount of cultivation solution R.On the contrary, when the water penetration in feed flow portion 10 exceedes the upper limit, for feed flow portion 10 and institute The cost of the culture apparatus 1 of formation may become too high.Herein, refer to as " permeability rate " in the feed flow portion 10 of flat part It is the ratio for the water for being delivered to the water at the back side and being dispersed on front.
The lower limit of the average thickness in feed flow portion 10 is preferably 0.5mm, more preferably 0.7mm.On the other hand, feed flow portion 10 The upper limit of average thickness is preferably 2mm, more preferably 1.5mm.When the average thickness in feed flow portion 10 is less than lower limit, feed flow portion 10 Intensity may it is relatively low, this may cause rupture.On the contrary, when the average thickness in feed flow portion 10 exceedes the upper limit, for feed flow portion 10 cost may be uprised.
Lower limit by the elevated liquid level in feed flow portion 10 is preferably 3cm, and more preferably 10cm is further preferably 20cm.The opposing party Face, the upper limit by the elevated liquid level in feed flow portion 10 is preferably 300cm, and more preferably 200cm is further preferably 40cm.When by feed flow When the elevated liquid level in portion 10 is less than lower limit, the cultivation solution R supplied to the bottom of culture base portion 2 may be not enough, and this may cause to lack Water.On the contrary, when exceeding the upper limit by the elevated liquid level in feed flow portion 10, the cost for feed flow portion 10 may be uprised.Herein, Elevated liquid level is measured in such a way.Feed flow portion 10 is cut into wide 4cm and long 120cm sheet material first.This sheet material is had Have 0.03mm average thickness polyethylene film covering (film by hot binding with pouch-shaped；Sheet material is inserted in thin In film, with by the film around and over), to prepare measurement sample.The measurement sample is set on pallet, to hang vertically Hang.At this moment, 5cm is exposed in the upper and lower part of sample respectively, and sample is arranged to contact with the surface of liquid.Passing through 24 After hour, to relative to the elevated level gauging of liquid level five times, and the average value of measured value is defined as elevated liquid level.
(holding tank)
Holding tank 9 is configured for performing the groove of the first storage for the cultivation solution R for being supplied to culture base portion 2.Holding tank 9 by Impermeable material is formed.Holding tank 9 is arranged to separate with culture base portion 2.Specifically as shown in Fig. 2 holding tank 9 is disposed in training The lower section of base portion 2 is supported, and in plan view, holding tank 9 is located in region not overlapping with culture base portion 2.Holding tank 9 is by cloth Put in such region so that can more definitely prevent crop Q root from entering in holding tank 9, equally, single holding tank 9 It can be shared by multiple culture base portions 2.Furthermore, the open-top of holding tank 9, to facilitate cultivation solution R supply；And the second waterproof Sheet material 17b is disposed on the bottom surface and side of groove, to prevent cultivation solution R from leaking.First waterproof sheet 17a and second prevents Water sheet material 17b can be formed by single sheet material.
The part in feed flow portion 10 is immersed in holding tank 9, and cultivation solution R is fed into culture medium by feed flow portion 10 The bottom in portion 2.Cultivation solution R is communicated up from holding tank 9 to a side of culture base portion 2, so as to prevent in hydroponics , horizontal transmission by storing the disease caused by water.
The top of holding tank 9 is preferably by light obstructing member from illumination.The example of light obstructing member includes hiding the permeable sheet material of root The 16 and first waterproof sheet 17a.Therefore holding tank 9 is from illumination, so as to suppress propagation of the algae in holding tank 9.In addition, In culture apparatus 1, the cultivation solution R being maintained in holding tank 9 is not contacted directly with crop Q root.These features to deposit jointly Storage tank 9 can be kept in the cleaning condition.Therefore, even if without filtration treatment, can also suppress harmful microorganism in cultivation solution R In propagation.
<Waterproof sheet>
In the region being disposed with beyond the region of culture base portion 2, the first waterproof sheet 17a is disposed in permeable of root of screening Material 16 and the upper surface side in feed flow portion 10.For example, the first waterproof sheet 17a prevents cultivation solution R from evaporating, and prevent leakage is cultivated Liquid R is entered in holding tank 9.As described above, the first waterproof sheet 17a also acts as light obstructing member.
Second waterproof sheet 17b is disposed in the lower face side for hiding the permeable sheet material 16 of root and feed flow portion 10 or holding tank 9.Example Such as, sheet material 17b makes culture apparatus 1 isolate with ground, so that prevent leakage cultivation solution R penetrates into underground.
First waterproof sheet 17a and the second waterproof sheet 17b are not particularly limited, as long as they stop water and crop Q's Root.The example of these sheet materials includes polyolefin film, fluorine resin film and biodegradable plastic film.
(cultivation liquid bath)
Cultivation liquid bath 8 is configured for storage to be supplied to the cultivation solution R of holding tank 9 groove.The controlling pump 14 of controller 13, So that the cultivation solution R being stored in cultivation liquid bath 8 is fed into holding tank 9 by supply pipe 15.
The cultivation solution R being stored in cultivation liquid bath 8 preferably comprises fertilizer.From harmful microorganism can be suppressed in holding tank 9 From the viewpoint of middle propagation, the fertilizer preferably comprises chemical fertilizer.Furthermore, fertilizer can be added to cultivation solution R, and It can be directly supplied into culture base portion 2.
<Temperature control device>
Temperature control device 4 includes thermostat 11 and heater 12.Thermostat 11 is configured to measurement and is stored in cultivation solution The temperature of cultivation solution R in groove 8.Heater 12 is disposed in cultivation liquid bath 8 or outside cultivation liquid bath 8, to heat storage Cultivation solution R in cultivation liquid bath 8.
When the temperature for the cultivation solution R being stored in cultivation liquid bath 8 is less than the predetermined lower bound temperature set at thermostat 11, Controller 13 controls heater 12, so that heater 12 is heated to cultivation solution R, until cultivation solution R temperature reaches constant temperature Untill the predetermined upper limit temperature set at device 11.Such as daytime and night, the ground temperature for being suitable for crop Q are usually different from each other.By In this reason, for example, controller 13 changes over time the temperature set at thermostat 11 so that be fed with cultivation solution R training The temperature for supporting base portion 2 is controlled as being suitable for crop Q ground temperature.
Furthermore, in the case of reduction cultivation solution R temperature, the control heater 12 of controller 13, to stop to cultivation solution R Heating.As a result, under the influence of environment temperature, the temperature reduction of the cultivation solution R in cultivation liquid bath 8.Controller 13 can also be by It is configured to control for example to be supplied to the cultivation at low temperature liquid R in cultivation liquid bath 8, so as to reduce the cultivation solution R's in cultivation liquid bath 8 Temperature.
In culture apparatus 1, cultivation solution feed mechanism 3 is preferably constructed into：So that the cultivation solution R in cultivation liquid bath 8 The temperature difference in 5 DEG C is realized between the cultivation solution R in culture base portion 2；It is highly preferred that the temperature difference is in 3 DEG C.When the temperature When degree difference exceedes the upper limit, the temperature of culture base portion 2 may be accurately controlled so that possibly can not produce the work of sufficient amount Thing Q.
The example of the connecting structure between cultivation liquid bath 8, holding tank 9 and culture base portion 2 in Fig. 2 diagram culture apparatus 1. In Fig. 2 culture apparatus, single holding tank 91 be connected to via feed flow portion 10 given number (m) culture base portion 21, And 2m 22 ... so that single holding tank 91 by cultivation solution R be supplied to the multiple culture base portion 21,22 ... and 2m.In addition, Single cultivation liquid bath 8 by cultivation solution R by supply pipe 15 supply given number (n) holding tank 91,92 ... and 9n.This structure Make and make it possible to be mounted to cultivate substantial amounts of crop Q originally with low, and can also control various crop Q ground temperature simultaneously.
Cultivation liquid bath 8 store to be supplied to the multiple holding tank 91,92 ... and 9n cultivation solution R.Because this is former Cause, cultivation liquid bath 8 volume be preferably set to be more than holding tank 91,92 ... and 9n volume.Keep cultivation solution R groove Volume it is bigger, the cultivation solution R remained at by external temperature influenceed just it is smaller.Therefore, when cultivation liquid bath 8 is as in Fig. 2 It is bigger than holding tank 9 as shown, and during using controlling to cultivate the construction of the temperature of the cultivation solution R in liquid bath 8 shown in Fig. 1, The energy required for the temperature for heating and maintaining cultivation solution R can be reduced, so as to reduce for being transported needed for temperature control Row cost.
For example, in construction in fig. 2,120 culture base portions of tomato seedling are implanted with along depositing wherein being planted in each Storage tank is arranged at substantially regular intervals in 24m length.In other words, 5 culture base portions of every meter of arrangement.In this feelings Under condition, the distance from farthest one (it be holding tank 91) of the cultivation liquid bath 8 into holding tank is about 10m.In such case Under, each holding tank keeps the cultivation solution R of capacity to be fed into corresponding culture base portion in 1 hour.In this hour Interior, the cultivation solution R supplied from cultivation liquid bath 8 to holding tank total amount is about 20L.In this case, from cultivation liquid bath 8 to The cultivation solution R of holding tank supply flow velocity is higher than the flow velocity for the cultivation solution R for flowing through feed flow portion 10.For this reason, cultivation solution R Unlikely by extraneous thermal effect during its supply to holding tank, and temperature control is constantly subjected in cultivation liquid bath 8 The cultivation solution R of system temperature unlikely changes during the supply to holding tank.
The component for constituting cultivation solution R feed path is preferably the component for suppressing temperature change.Specifically, base portion is cultivated 2nd, cultivation liquid bath 8 and holding tank 9 are heat-insulated for example, by being coated with heat insulation sheet.In addition, feed flow portion 10 is for example, by quilt It is clipped between heat insulation sheet and heat-insulated；And supply pipe 15 is heat-insulated using the heat-barrier material for winding supply pipe 15.These Component is heat-insulated, so as to suppress to change from the temperature of the cultivation solution R in cultivation liquid bath 8 to the feed path for cultivating base portion 2. This is easy to the temperature control for cultivating base portion 2, and also reduces the operating cost caused by cultivation solution R temperature control.Furthermore, Because the cost of plastic foam is relatively low, so heat insulation sheet and heat-barrier material are preferably formed by plastic foam.
Cultivation liquid bath 8 and holding tank 9 are preferably installed into embedment underground.Because cultivation liquid bath 8 and holding tank 9 are embedded in ground Under, so as to improve the temperature change inhibition for cultivation solution R, therefore reduce for the temperature controlled of cultivation solution R Energy.On daytime and at night, the ground temperature for being suitable for raise crop Q is different from each other；The ground temperature on daytime can be configured to be higher than It is suitable for the ground temperature at the night of crop Q cultivation.On the other hand, under field conditions (factors), subsurface temperature becomes to turn to compares night on daytime It is high.Therefore, the variation tendency of the subsurface temperature at daytime and night and the changing suitable for the ground temperature of crop Q cultivation on daytime and night The trend of change matches；Also, subsurface temperature changes in daytime and night, with close to the ground for the cultivation for being suitable for crop Q Temperature.For this reason, when cultivating liquid bath 8 and holding tank 9 is installed to be embedment underground, it is possible to reduce cultivation solution R temperature Controlled quentity controlled variable, this advantageously reduces cost of energy.
When cultivation liquid bath 8 and holding tank 9 are arranged on the ground, during to expose in the sunlight, liquid bath 8 and storage are cultivated The outer surface of groove 9 is preferably dyed to dead color, such as black.Outer surface is dyed to dead color, so that during with solar radiation, tool There are heating cultivation liquid bath 8 and the effect of the cultivation solution R in holding tank 9.
Furthermore, in Fig. 1 culture apparatus 1, temperature control device 4 is disposed at cultivation liquid bath 4.Alternatively, only Control the temperature of cultivation solution R to be supplied to crop Q, it is possible to temperature control device 4 is arranged in remove cultivate liquid bath 8 with At outer position.For example, in Fig. 1 culture apparatus 1, heater as such as heater strip can be arranged as along feed flow Portion 10 extends to constitute temperature control device.In this case, than cultivation liquid bath 8 closer to culture base portion 2 position at The temperature of cultivation solution is controlled, this can more accurately control the temperature for cultivating the cultivation solution R in base portion 2.Alternatively, for example, Can be using following other constructions：The heater for constituting temperature control device is disposed at holding tank 9, so as to control the storage The temperature of cultivation solution R in groove.
[cultural method]
The cultural method can be performed using the cultivation liquid device 1 in Fig. 1.The cultural method includes supplying cultivation solution R Crop Q culture base portion 2 is implanted with to kind, wherein culture base portion 2 includes following cultivation solution supply area 7：Cultivation solution R passes through hollow billet Phenomenon is supplied to the cultivation solution supply area 7, and the cultural method includes the cultivation solution R's to being supplied to culture base portion 2 Temperature is controlled.
More specifically, the step of cultural method includes cultivation solution is supplied into culture base portion 2 by cultivation solution feed mechanism 3 (cultivation solution supplying step), and by temperature control device 4 control to be supplied to culture base portion 2 cultivation solution R temperature step Suddenly (temperature controlling step).
<Cultivation solution supplying step>
In the cultivation solution supplying step, the cultivation solution R stored for the first time in holding tank 9 is supplied to by feed flow portion 10 Cultivate the bottom of base portion 2.By due to capillarity phenomenon caused by the filler particles 6 in framework 5, so that this cultivation solution R is supplied It is given to the cultivation solution supply area 7 in culture base portion 2.Specifically, by due to capillarity phenomenon caused by feed flow portion 10, so that Cultivation solution R is raised from holding tank 9, and by hide the permeable sheet material 16 of root be fed into culture base portion 2 bottom.By due to filling out Fill capillarity phenomenon caused by particle 6, from and the cultivation solution R of bottom that has been fed into culture base portion 2 is supplied via cultivation solution Region 7 is fed into crop Q root.
In the cultivation solution supplying step, according to the supply condition for the cultivation solution R for being supplied to culture base portion 2, work is supplied to The cultivation solution R of thing Q appropriate amount is added to holding tank 9 from cultivation liquid bath 8.Specifically, it is configured to measurement culture for example, setting The moisture transducer (not shown) of moisture in base portion 2；Based on measured result, controller 13 operates pump 14, so as to plant Training liquid R is additionally supplied to holding tank 9.By this way, cultivation solution R can be continuously fed to crop Q.Alternatively, may be used For example to arrange the mechanism for the liquid level for being configured to measure the cultivation solution R in holding tank 9 in holding tank 9.In this case, The cultivation solution R that changes determine additionally supply holding tank 9 of the controller 13 based on the liquid level in holding tank 9 amount, and will Cultivation solution R is supplied to holding tank 9.
<Temperature controlling step>
In the temperature controlling step, to entering in cultivation liquid bath 8, by the temperature additionally supplied to the cultivation solution R of holding tank 9 Row control.Specifically, the temperature for the cultivation solution R being stored in cultivation liquid bath 8 is measured using thermostat 11.Controller 13 is based on The temperature survey of thermostat 11 operates to control heater 12, so as to control to cultivate the temperature of the cultivation solution R in liquid bath 8.At this moment, Cultivation solution R control targe temperature is set as following temperature：So that the temperature of culture base portion 2 turns into the ground for being suitable for crop Q Temperature.For example, under conditions of being than being suitable for high t DEG C of crop Q ground temperature when the temperature of the cultivation solution R in cultivation liquid bath 8, culture When the temperature of base portion 2 is controlled to be suitable for crop Q ground temperature, control targe temperature is arranged to than being suitable for crop Q's The temperature of high t DEG C of ground temperature.
<Advantage>
In the culture apparatus, temperature controlled cultivation solution is carried out via passing through capillarity phenomenon by temperature control device The region for being fed with cultivation solution is fed into culture base portion.Compared with outside air temperature, the change and cultivation of the ground temperature of base portion are cultivated The relation of the temperature of liquid is more close.For this reason, the culture apparatus is configured to control the temperature of cultivation solution, so that phase Temperature to accurately controlling culture base portion.
In addition, the culture apparatus is configured to use cultivation solution to transmit heat, the cultivation solution is such fluid：With Air is compared, and its heat release and diffusion are smaller.This can realize the efficient control of the temperature for cultivating base portion.In addition, with profit The regular situation for controlling temperature with air-conditioning etc. is compared, and the culture apparatus can be reduced for being made to the temperature control for cultivating base portion Into equipment cost and operating cost.
In addition, in the culture apparatus, planting the culture base portion for being implanted with crop including being fed with cultivation solution by capillarity phenomenon Cultivation solution supply area.As a result, the glut of cultivation solution can be avoided so that appropriate water stress can stably be applied In the root of crop.In addition, cultivation solution supply area has the gas phase bigger than liquid phase, therefore with highly-breathable.Therefore, even if In the case where lacking oxygen supply structure, the culture apparatus also can effectively suppress due to root rot caused by anoxic.This energy Enough reduce equipment cost and operation cost.
In addition, in the culture apparatus, framework is filled with particle as such as soil measured as follows：So that cultivation solution is supplied To in region have capillarity phenomenon.Therefore, compared with conventional soil cultivation, the amount of soil used can be significantly decreased, this can The weight of reduction culture base portion.Therefore, the culture apparatus can on the stand formed by the cheap material of such as pitch tube structure Build arable land.The regulation of stand can easily solve the difference of height in arable land.
In addition, the culture apparatus uses sub-irrigation, this being capable of using water wisely compared with surface is irrigated.Because, training Supporting the upper strata of base portion has relatively low moisture-holding capacity, and is unlikely to occur evaporation.Because being unlikely to occur evaporation, The interference between moisture management and irrigation management unlikely occurs in greenhouse.In the culture apparatus, holding tank is impermeable Water, this being capable of further using water wisely；And the totally-enclosed culture apparatus of no draining can be built.In addition, because by steaming The amount of moisture for sending out loss is considerably less, so consumed cultivation liquid measure can substantially accurately be measured, so as to based on water absorption To quantify plant growth.In addition, because the evaporation capacity from culture base portion is few, salinity, which is added to, is maintained at culture base portion In moisture in.This is favourable, and reason is, compared with being irrigated with surface with hollow billet hydroponics, will not occur salt accumulation.This Outside, culture base portion is easily rinsed.
In addition, the minimum of the culture base unit weight in the culture apparatus makes it possible to increase the cultivation being maintained in culture base portion The consumption rate of liquid.Therefore, the cultivation solution in holding tank is substantially the same with the cultivation solution in culture base portion.As a result, with other agricultures Industry is compared, can effect caused by the immediately obtained change due to cultivation solution, pH in this convenient such as regulation culture base portion Value.
[second embodiment]
Culture apparatus 31 shown in Fig. 3 mainly includes：Base portion 32 is cultivated, wherein having planted crop Q；Cultivation solution feed mechanism 33, it is configured to the culture supply cultivation solution of base portion 32 R；And temperature control device 34, it is to be supplied that it is configured to control To the cultivation solution R of culture base portion 32 temperature.Cultivating base portion 32 includes framework 35 and filler particles 36, and the filler particles 36 are filled out Fill framework 35；And including cultivation solution supply area 37, cultivation solution R by due to caused by filler particles 36 capillarity phenomenon come Supply to the cultivation solution supply area 37.Cultivation solution feed mechanism 33 includes：It is configured to store cultivation solution R cultivation liquid bath 38；And it is configured to keep the holding tank 39 of the cultivation solution R from the cultivation supply of liquid bath 38.Temperature control device 34 is included by cloth Put the thermostat 41 and heater 42 at cultivation liquid bath 38.In addition, culture apparatus 31 includes being configured to measure holding tank 39 The level gauging mechanism of interior cultivation solution R liquid level.
In the culture apparatus 1 of first embodiment, holding tank 9 and culture base portion 2 are isolated from each other.By contrast, in cultivation In device 31, holding tank 39 and culture base portion 32 are not isolated each other, and cultivation solution feed mechanism 33 does not have feed flow portion.These are With the difference of the culture apparatus 1 of first embodiment.In addition, culture apparatus 31 includes level gauging mechanism, this and first embodiment Culture apparatus 1 it is different.Furthermore, because culture apparatus 31 does not have feed flow portion, it does not have permeable of the screening root of culture apparatus 1 Material 16, the first waterproof sheet 17a, second waterproof sheet 17b etc..The difference with the culture apparatus 1 of first embodiment is described below It is different.
<Cultivate base portion>
Culture base portion 32 includes：Framework 35；Filler particles 36, its fill frame 35；And by filling up filler particles Cultivation solution R cultivation solution supply area 37 is supplied in layer formed by 36, by capillarity phenomenon.Culture base portion 32 is plantation There is crop Q part.
Framework 35 has bottom, and the bottom has multiple fine through holes, and cultivation solution R is by the fine through holes, still Filler particles 36 do not pass through the fine through holes.Framework 35 is placed on the multiple platforms 40 for the bottom for being arranged in holding tank 39 On.In the bottom immersion cultivation solution R of framework 35.The immersion part of filler particles 36 is the cultivation solution infiltration that cultivation solution R has permeated Layer.The whole of the top of cultivation solution permeable formation in filler particles 36 is partly cultivation solution supply area 37.In culture apparatus 31 In, often occur anoxic in cultivation solution permeable formation so that crop Q root can not be elongated in cultivation solution permeable formation.
Furthermore, the material of framework 35 is not particularly limited.This material is identical with the framework 5 of first embodiment.Specifically, material The example of material includes paper and resin sheet with gas permeability and water penetration.Resin sheet can be braided fiber or non-woven fibre Dimension；In particular it is preferred to be porous resin film, more preferably produced by the film for the fluororesin for stretching such as polytetrafluoroethylene (PTFE) Raw porous resin film.
<Cultivation solution feed mechanism>
Cultivation solution feed mechanism 33 includes：It is configured to store cultivation solution R cultivation liquid bath 38；And be configured to keep The cultivation solution R supplied from cultivation liquid bath 38 holding tank 39.
Holding tank 39 includes being arranged in multiple platforms 40 at bottom.Culture base portion 32 is placed on platform 40.Depositing In storage tank 39, cultivation solution R is retained as reaching predetermined fluid level；Culture base portion 32 is disposed in holding tank 39 so that framework 35 Bottom immersion cultivation solution R in.Furthermore, multiple culture base portions 32 are disposed in single holding tank 39.When multiple trainings Base portion 32 is supported when being disposed in single holding tank 39, the arid side of body on this multiple culture base portion 32 can be adjusted simultaneously and similarly Compel.
<Level gauging mechanism>
Level gauging mechanism is made up of the liquid level gauge 45 being arranged in holding tank 39.The liquid level measured based on liquid level gauge 45, Controller 43 is configured to control the amount for the cultivation solution R for being supplied to holding tank 39.
Liquid level gauge 45 is configured to measure the liquid level of the cultivation solution R in holding tank 39, and measured result is sent into control Device 43 processed.
Controller 43 is configured to determine to additionally supply to holding tank 39 based on the liquid level measured using liquid level gauge 45 Cultivation solution R amount, and run pump 44, so that cultivation solution R is fed into holding tank 39 by supply pipe 46.For example, working as The control cultivation solution of controller 43 R quantity delivered, so that when keeping specific level in holding tank 39, cultivation solution R is automatically fed. This can reduce the live load that waters of administrative staff.
Controller 43 can be used for the amount for controlling the cultivation solution R for being supplied to holding tank 39 so that the liquid level quilt of holding tank 39 It is adjusted to apply drought stress.Increasing or decreasing for the liquid level of cultivation solution R in holding tank 39 can be in culture base portion 32 Regulating liquid surface height after hollow billet rises.Therefore, the cultivation solution R of holding tank 39 amount is supplied to by control, can will be appropriate Drought stress puts on crop Q.
Controller 43 can be used for adjusting the salt component for being added to the cultivation solution R for being supplied to holding tank 39.Controller 43 can The cultivation solution R amount being maintained in holding tank 39 is determined based on the liquid level measured using liquid level gauge 45, and based on cultivation This amount of liquid, it may be determined that the salt component added, so as to which appropriate osmotic pressure is put on into crop Q.By this way, it is adjustable Osmotic pressure of the cultivation solution R for crop Q root is saved, so that appropriate osmotic pressure is put on into crop Q.
<Temperature control device>
Temperature control device 34 includes thermostat 41 and heater 42.Thermostat 41 is configured to measurement and is stored in cultivation solution The temperature of cultivation solution R in groove 38.Heater 42 is disposed in cultivation liquid bath 38 or outside cultivation liquid bath 38, and is constructed The cultivation solution R in cultivation liquid bath 38 is stored in into heating.
As the temperature control device 4 of first embodiment, for temperature control device 34, controller 43 is configured to base Heater 42 is controlled in the temperature measured using thermostat 41, so as to control the cultivation solution R being stored in cultivation liquid bath 38 Temperature.
<Advantage>
Because the culture apparatus is not as the feed flow portion of cultivation solution feed mechanism, simple structure can be realized and entered One step reduces equipment cost.In addition, the culture apparatus includes level gauging mechanism, and the liquid level of cultivation solution in holding tank The drought stress for the root for putting on crop Q can be adjusted by increasing or decreasing.
[3rd embodiment]
Culture apparatus 51 shown in Fig. 4 mainly includes：Base portion 52 is cultivated, wherein having planted crop Q；Cultivation solution feed mechanism 53, it is configured to the culture supply cultivation solution of base portion 52 R；Temperature control device 54, it is configured to control to be supplied to training Support the cultivation solution R of base portion 52 temperature；And cultivation solution auxiliary feed mechanism 66, it is configured to supply cultivation solution R from top It is given to culture base portion 52.Culture base portion 52 includes the recess of the permeable sheet material 55 for being formed as spill and the permeable sheet material 55 of filling Filler particles 56；And including cultivation solution supply area, cultivation solution R by due to caused by filler particles 56 capillarity phenomenon come It is supplied to the cultivation solution supply area.Cultivation solution feed mechanism 53 includes：It is configured to store cultivation solution R cultivation liquid bath 58；It is configured to perform the holding tank 59 of the cultivation solution R supplied from cultivation liquid bath 58 first storage；And be configured to plant Training liquid R is supplied to the feed flow portion 60 of culture base portion 52 from holding tank 59.Temperature control device 54 includes being disposed in cultivation liquid bath Thermostat 61 and heater 62 at 58.In addition, culture apparatus 51 includes pedestal 69 and agricultural vinyl material 70, base portion is cultivated 52 and holding tank 59 be placed in pedestal 69, agricultural with vinyl material 70 cover these components.It is described below with first in fact Apply the difference of the culture apparatus 1 of example.
<Cultivate base portion>
Culture base portion 52 includes：Permeable sheet material 55, it is formed as spill by bending；Filler particles 56, it fills saturating The recess of water sheet material 55；And cultivation solution supply area, cultivation solution R by due to caused by filler particles 56 capillarity phenomenon come Supply to the cultivation solution supply area.Culture base portion 52 is kind of the part for being implanted with crop Q.
(permeable sheet material)
Permeable sheet material 55 is porous and stops the strip sheet material of root.The both sides of the edge portion of permeable sheet material 55 is relaxed ground At a pair of the fix bars 72 for being hung on pedestal 69 described below, the alignment parallel to each other of fix bar 72.The permeable quilt of sheet material 55 It is bent into spill.
The material of permeable sheet material 55 is not particularly limited；The example of material includes paper, braided fiber and non-woven fiber.
The lower limit of the average thickness of permeable sheet material 55 is preferably 0.1mm, more preferably 0.2mm.On the other hand, permeable sheet material The upper limit of 55 average thickness is preferably 5mm, more preferably 3mm., may when the average thickness of permeable sheet material 55 is less than lower limit Root can not fully be stopped.On the contrary, when the average thickness of permeable sheet material 55 exceedes the upper limit, the cost of permeable sheet material 55 may become It is too high.
(filler particles)
Filler particles 56 are arranged to fill the recess of permeable sheet material 55, and the recess of permeable sheet material 55 is formed with recessed Shape.Filler particles 56 are the particles after filling with capillarity phenomenon.Filler particles 56 can with first embodiment Used filler particles 56 are identical.
<Cultivation solution feed mechanism>
Cultivation solution feed mechanism 53 includes：It is configured to store cultivation solution R cultivation liquid bath 58；It is configured to perform from cultivation Train the holding tank 59 of the first storage for the cultivation solution R that liquid bath 58 is supplied；And be configured to supply cultivation solution R from holding tank 59 To the feed flow portion 60 of culture base portion 52.In addition, cultivation solution feed mechanism 53 includes the first pump 64 and supplying drainage 65.
(cultivation liquid bath)
Cultivation liquid bath 58 is configured for storing the groove for the cultivation solution R for being used for holding tank 59 and culture base portion 52.Control Device 63 is configured to control the first pump 64 so that the cultivation solution R being stored in cultivation liquid bath 58 is supplied to by supplying drainage 65 To holding tank 59.Controller 63 is also configured to control the second pump 67 so that the cultivation solution R being stored in cultivation liquid bath 58 passes through Supply pipe 68 is supplied from above culture base portion 52.Furthermore, the first pump 64 is two-way pump.As described later, when cultivation solution aids in supplying When being used to cultivation solution R is supplied into culture base portion 52 from top to mechanism 66, the first pump 64 is by supplying drainage 65 by holding tank Cultivation solution R in 59 passes to cultivation liquid bath 58.Furthermore, as shown in Figure 4, supplying drainage 65 is preferably connected to holding tank 59 Bottom.Therefore supplying drainage 65 may be coupled to the bottom of holding tank 59, so that the cultivation solution R in holding tank 59 is more efficient Ground is delivered to cultivation liquid bath 58.
(holding tank)
Holding tank 59 is formed with gutter shape, and the support bar 72 by being arranged in pedestal 69 described below To support.Holding tank 59 is disposed at such position so that the cultivation flowed out by permeable sheet material 55 from culture base portion 52 Liquid R enters holding tank 59.In other words, as shown in Figure 4, holding tank 59 is vertically arranged below culture base portion 52.
As long as the cultivation solution R's that holding tank 59 passes through permeable sheet material 55 with reception and dripped from permeable sheet material 55 opens Mouthful, then the shape of holding tank 59 is not particularly limited.As shown in Figure 4, holding tank 59 preferably has a shape such that：Its top With banding opening, its underpart is located at below an upper section, and internal mean breadth is less than top.When bottom is configured to smaller Inside mean breadth when, holding tank 59 is easily disposed relative to crop Q water absorption and a small amount of water is stored.As a result, it is residual The cultivation solution R stayed is difficult to be maintained in holding tank 59, so that new cultivation solution R is easier to be fed into crop Q.In addition, adopting In the case of being less than this shape in top with the inside mean breadth of bottom, with the change of storage water, the liquid level hair of bottom Raw large change.As a result, the water being stored in holding tank 59 can be accurately measured, this convenient control is supplied to crop Q cultivation Train liquid R amount.Herein, " internal mean breadth " is referred to：Along the side wall that left and right directions is facing with each other on cross section Between horizontal range average value.
(feed flow portion)
Feed flow portion 60 is strip sheet element.Feed flow portion 60 is arranged to make it contact with the outer surface of permeable sheet material 55, And in the bottom of the marginal portion immersion holding tank 59 of the one end in feed flow portion 60.Feed flow portion 60 is configured to by capillarity phenomenon To raise the cultivation solution R being stored in holding tank 59, and cultivation solution R is supplied to by culture base portion 52 by permeable sheet material 55 In.Furthermore, as shown in Figure 4, feed flow portion 60 is maintained at permeable sheet material 55 and is fixed on the support bar of support holding tank 59 Between a pair of fix bars 72 on 71 so that feed flow portion 60 is contacted with permeable sheet material 55 from below.
Feed flow portion 60 is not particularly limited, as long as it can raise cultivation solution R, so that cultivation solution R to be led to by capillarity phenomenon Permeable sheet material 55 is crossed to be supplied in culture base portion 52.The example in feed flow portion 60 includes non-woven fiber, rock wool sheet material, felt Material and polyurethane sheet.Among these materials, from appropriate capillarity phenomenon and realizing the viewpoint of appropriate water absorption rate From the point of view of, preferred non-woven fiber.
The lower limit of the water penetration in feed flow portion 60 is preferably 0.01%, and more preferably 1%.On the other hand, feed flow portion 60 is saturating The aqueous upper limit is preferably 40%, and more preferably 30%.When the water penetration in feed flow portion 60 is less than lower limit, supply to culture base portion The cultivation solution R of 52 bottom may be not enough.On the contrary, when feed flow portion 60 water penetration exceed the upper limit when, for feed flow portion 60 into This may become too high.
The lower limit of the average thickness in feed flow portion 60 is preferably 0.5mm, more preferably 0.7mm.On the other hand, feed flow portion 60 The upper limit of average thickness is preferably 2mm, more preferably 1.5mm.When the average thickness in feed flow portion 60 is less than lower limit, feed flow portion 60 Intensity can be with relatively low, so as to cause rupture.On the contrary, when the average thickness in feed flow portion 60 exceedes the upper limit, for feed flow The cost in portion 60 may be uprised.
Lower limit by the elevated liquid level in feed flow portion 60 is preferably 3cm, and more preferably 10cm is further preferably 20cm.The opposing party Face, the upper limit by the elevated liquid level in feed flow portion 60 is preferably 300cm, and more preferably 200cm is further preferably 40cm.When by feed flow When the elevated liquid level in portion 60 is less than lower limit, the cultivation solution R of supply to the bottom of culture base portion 52 may be not enough, so as to cause Water shortage.On the contrary, when exceeding the upper limit by the elevated liquid level in feed flow portion 60, the cost for feed flow portion 60 may be uprised.Herein In, elevated liquid level is measured in such a way.Feed flow portion 60 is cut into wide 4cm and long 120cm sheet material first.This piece By the polyethylene film covering of the average thickness with 0.03mm, (film is subjected to hot binding with pouch-shaped to material；Sheet material is inserted Enter in the film, with by the film around and over), to prepare measurement sample.The measurement sample is set to pallet, with vertical Ground is hung.At this moment, the bottom of sample is exposed 5cm, and sample is arranged to contact with the surface of liquid.By 24 small When after, measure the elevated liquid level in five surfaces relative to liquid, and the average value of measured value is confirmed as elevated liquid Position.
On the bottom surface and the surface for the cultivation solution R being stored in holding tank 59 of the permeable sheet material 55 contacted with feed flow portion 60 The distance between, lower limit is preferably 60mm, more preferably 90mm.On the other hand, the upper limit of the distance is preferably 160mm, more Preferably 130mm.When the distance is less than lower limit, it possibly can not control what is supplied by feed flow portion 60 by controlling liquid level Water, so that appropriate water stress can not be applied.On the contrary, when the distance exceedes the upper limit, supply to culture base portion 52 cultivation solution R may be not enough.In view of the scope for the change of cultivation solution R liquid level being stored in holding tank 59, so that thoroughly Water sheet material 55 and holding tank 59 are arranged to：So that the distance between the bottom surface of permeable sheet material 55 and cultivation solution R surface are met Above range.
Furthermore, strip feed flow portion 60 can be laid out such that it is contacted with the outer surface of permeable sheet material 55, and strip In the bottom of the marginal portion immersion holding tank 59 at the two ends in feed flow portion 60.With only by the edge part sub-dip of the one end in feed flow portion 60 Situation about entering in the bottom in feed flow portion 60 is compared, by the way that the marginal portion at the two ends in feed flow portion 60 is immersed in into feed flow portion 60 In bottom, so as to improve the liter water efficiency in feed flow portion 60.
<Cultivation solution aids in feed mechanism>
Cultivation solution auxiliary feed mechanism 66 includes the second pump 67 and supply pipe 68.In cultivation solution auxiliary feed mechanism 66, Second pump 67 is controlled by controller 63 so that the cultivation solution R being stored in cultivation liquid bath 58 is supplied from above by supply pipe 68 To culture base portion 52.
The cultivation solution R that feed mechanism 66 is supplied from above is aided in be flowed downward in culture base portion 52 by cultivation solution so that The temperature of culture base portion 52 is controlled according to cultivation solution R temperature.Feed mechanism 66 is aided in be supplied to culture base portion 52 from cultivation solution The cultivation solution R given flows to the outside for cultivating base portion 52 by permeable sheet material 55.The cultivation solution R for so having flowed out culture base portion 52 leads to Cross gravity and the holding tank 59 being vertically disposed below culture base portion 52 is flowed into via feed flow portion 60.
When cultivation solution R is supplied from above culture base portion 52 by cultivation solution auxiliary feed mechanism 55, controller 63 is controlled Second pump 67 so that the cultivation solution R in holding tank 59 is delivered to cultivation liquid bath 58 by supplying drainage 65.By this way, The cultivation solution R for aiding in feed mechanism 66 to be supplied from above culture base portion 52 always by cultivation solution by holding tank 59 is recycled to cultivation Train liquid bath 58.
Furthermore, as the first pump 64, used here as two-way pump.However, this two-way pump may not be used, as long as in cultivation solution Cultivation solution R two-way flow can be realized between groove 58 and holding tank 59.The example of this construction includes two two-way pumps The construction between cultivation liquid bath 58 and holding tank 59 is disposed in, and one-way pump combines to realize cultivation with such as triple valve The construction of the change in the direction that liquid R is passed.
In supplying drainage 65 and supply pipe 68, the first pump 64 and the transmission quilt of the second pump 67 are passed through even in cultivation solution R After stopping, stream still may be kept so that the movement of water may occur by siphonage；In order to prevent this shifting of water It is dynamic, preferably arrange the magnetic valve for being configured to that stream is cut off after cultivation solution R transmission is stopped.Alternatively, plumbing Pipe 65 and supply pipe 68 can be equipped with siphon breaker and check-valves, to prevent the movement of water.First pump 65 and the second pump 67 Can be tubing pump or Berista pumps (registration mark)：These pumps do not allow to move water by siphonage in structure.With Arrangement magnetic valve or siphon breaker are compared with the situation of check-valves, and tubing pump or Berista pumps are used as into the first pump 65 and the Two pumps 67, can reduce equipment cost.
<Pedestal>
Pedestal 69 includes frame wall and multiple support bars 71, and the frame wall is arranged in the left side and the right side of holding tank 59 Longitudinal direction extension of the side along holding tank 59, the multiple support bar 71 is fixed across frame wall by level, with it is above-mentioned The perpendicular side of longitudinal direction is upwardly extended.The multiple support bar 71 is fixed on the uppermost position in fig-ure of frame wall and in framework Middle position in the short transverse of wall.In addition, pedestal 69 includes two fix bars 72, described two fix bars 72 are fixed To be erected at the top of multiple support bars 71, the multiple support bar 71 is fixed at the uppermost position in fig-ure of frame wall, and institute Fix bar 72 is stated in the top of these support bars 71 in the mode parallel with above-mentioned longitudinal direction to extend.In addition, pedestal 69 is also wrapped Two fix bars 72 are included, two fix bars 72 are fixed to be erected at multiple tops of support bar 71, and the support bar 71 is consolidated Be scheduled on the middle position of frame wall, and described two fix bars 72 these tops of support bars 71 with above-mentioned longitudinal direction Parallel mode extends.
Support bar 71 and fix bar 72 can be formed by metal or resin.Especially, due to metallic rod have high intensity and High durability, so that it is preferred that metallic rod.Further, since it is lightweight, so that it is preferred that metal tube.In metal tube, due to agricultural pipe With high availability and inexpensively, so that it is preferred that agricultural pipe.
[cultural method]
The cultural method can be performed using the cultivation liquid device 51 in Fig. 4.The cultural method includes supplying cultivation solution R Crop Q culture base portion 52 is implanted with to kind, wherein culture base portion 52 includes the cultivation solution that cultivation solution R is fed with by capillarity phenomenon Supply area, and the cultivation solution R being temperature controlled is supplied from above culture base portion 52.
More specifically, the cultural method comprises the following steps：Cultivation solution R is supplied to culture by cultivation solution feed mechanism 53 Base portion 52 (cultivation solution supplying step)；The cultivation of culture base portion 52 is supplied to using 54 pairs of temperature control device in cultivation liquid bath 58 Training liquid R temperature is controlled (temperature controlling step)；And feed mechanism 66 is aided in using cultivation solution, by cultivation liquid bath 58 Cultivation solution R be supplied to culture base portion 52 (auxiliary cultivation solution supplying step) from top auxiliary.
Cultivation solution supplying step and temperature controlling step with the process of step identical described in first embodiment by holding OK, thus will omit these steps description.
<Aid in cultivation solution supplying step>
In auxiliary cultivation solution supplying step, being temperature controlled in temperature controlling step in cultivation liquid bath 58 Cultivation solution R is supplied from above culture base portion 52.Specifically, for example, being also needed in addition to cultivation solution supplying step to training In the case that foster base portion 52 carries out further temperature control, controller 63 operates the second pump 67 so that in cultivation liquid bath 58 Cultivation solution R is supplied by supply pipe 68, and is supplied to the region cultivated above base portion 52 by the outlet of supply pipe 68.
It is described above, be necessary that carrying out further temperature controlled situation to culture base portion 52 is, for example,：Merely with logical Cross and the temperature control effects that are provided of cultivation solution R are provided in cultivation solution supplying step can not realize the temperature of culture base portion 52 Fully control, or realize that the time that the temperature control of culture base portion 52 is spent is longer.More specifically, the example bag of the situation Include：Crop Q water absorption less cultivation starting stage or night, and due to too high or too low temperature, pass through culture The temperature control of base portion 52 solves the big temperature difference.
Controller 63 operates the first pump 64 so that has flowed out the cultivation solution R that enters in holding tank 59 of culture base portion 5 and has led to Cross supplying drainage 65 and be recycled to cultivation liquid bath 58.
By this way, auxiliary cultivation solution supplying step passes through the cultivation solution R of culture base portion 52 amount increase, this increasing The strong temperature control effect to cultivating base portion 52.
<Advantage>
The culture apparatus includes being configured to the cultivation solution that the cultivation solution in cultivating liquid bath is supplied from upper direction culture medium portion Feed mechanism is aided in, this can increase the flow velocity for the cultivation solution for flowing through culture base portion, so as to strengthen the temperature control to cultivating base portion Effect processed.By this way, even if when the water absorption of crop is less for example in the starting stage of cultivation or at night, should Culture apparatus also can more definitely realize the temperature control for culture medium.Therefore, the culture apparatus being capable of appointing in seedling What growth phase and the ground temperature for controlling culture base portion the whole day and night.
In the culture apparatus, because culture base portion includes permeable sheet material, the cultivation solution being supplied from above is rapidly Outflow.Therefore, culture base portion is without excessive cultivation solution, so as to maintain appropriate water stress on the root of crop.It is general and Speech, if irrigating a large amount of water in order to control ground temperature, usually causes adverse consequences, such as root rot or cracked fruit to crop； However, in above-mentioned culture apparatus, it is suppressed that these adverse consequences.
In addition, when in the nonirrigated farmland with high content salt or the Agricultural Water in the region destroyed by salt is used for the cultivation of crop During training, it is configured to suppress the culture apparatus that cultivation solution is supplied from above culture base portion due to the stream by cultivation solution There is provided desalination is provided and (dissolves in) salt accumulation caused by effect.
[other embodiments]
The embodiments described herein in all respects in be only example, and should be understood that and be not construed as limiting. The scope of the present invention is not limited to the construction of embodiment.The scope of the present invention is characterized by claim, and is intended to include right It is required that meaning of equal value and scope in all modifications.
It is used as temperature control device, the construction so that cultivation solution is heated above embodiment described heater.However, can With using the temperature control device in addition to heater, as long as they are used for the temperature for controlling cultivation solution.For example, can be by Heat exchanger is used as temperature control device to be cooled down, so that controlling the temperature of cultivation solution quickly reduces.Entered by cooling down Capable ordinary temperature control is using misting cooling (water smoke cooling), and this causes the change of humidity, and excess water often causes Disease.By contrast, the culture apparatus can reduce the temperature of culture base portion in the case where not causing the change of humidity, so that Disease caused by excess water during the temperature reduction of culture base portion is not occurred at.By this way, cultivation solution Temperature is controlled as reduction, so as to reduce the temperature of culture base portion.So as to be higher than the land suitable for crop ground temperature even in ground temperature In, also being capable of raise crop.
Control to plant based on the temperature for the cultivation solution being stored in holding tank above embodiment described temperature control device Train the construction of the temperature of liquid.Alternatively, temperature control device can be configured to based on the temperature except the cultivation solution in holding tank Temperature beyond degree controls the temperature of cultivation solution.For example, thermometer can be arranged, to measure the filler particles in culture base portion Temperature, and temperature control device can be configured to control the temperature of cultivation solution based on the temperature of culture base portion.With this The mode of kind, can control the temperature of cultivation solution, enabling the temperature of control cultivation solution, with more based on the temperature of culture base portion Exactly by the temperature control of culture base portion to the temperature for being suitable for crop.
In the first embodiment, the arrangement of mechanism for the liquid level that can will be configured to measure the cultivation solution R in holding tank 9 exists In holding tank 9, and based on actual measurement liquid level, the water stress on crop Q can be controlled.For example, such as in the cultivation of second embodiment Train the same in device, controller can be configured to control the amount for the cultivation solution R for being supplied to holding tank 9, so as to increase or drop The liquid level of cultivation solution R in low holding tank 9, this can control the drought stress for putting on crop Q root.Controller can also It is configured to the cultivation solution R amount for determining to be maintained in holding tank 9 based on actual measurement liquid level, and this based on cultivation solution Amount, supplies the cultivation solution with the salt content for applying the osmotic stress for being suitable for crop Q, this can control to apply to holding tank 9 It is added on the osmotic stress of crop Q root.
In the first embodiment, sheet element is used as feed flow portion 10.However, feed flow portion 10 is not limited to sheet element, only Want it that the cultivation solution in holding tank 9 can be supplied to culture base portion 2.For example, feed flow portion 10 can be attached to holding tank 9 With the sheet or tubulose feed path of culture base portion 2.Feed flow portion 10 can be comprising the particle for being preferably used as filler particles 6 Structure.Specifically, for example, the thin float stone of soil, such as pumice sand, the powdered granule of porous volcanic rock, granular rock wool, coral Sand, coral or charcoal can be formed to have the shape of sheet material or pipe, or can be filled into tubular frame, so as to carry For with not because cultivation solution the shape destroyed by structure.This structure can be used for connection holding tank 9 and cultivate base portion 2 Bottom.
First embodiment description includes the cultivation for hiding the permeable sheet material 16 of root, the first waterproof sheet 17a and the second waterproof sheet 17b Train device 1.However, the culture apparatus for not including these elements is also within the scope of the invention.
In the third embodiment, in order to strengthen temperature control effect, cultivation solution is supplied from above culture base portion.It is alternative Ground, another method can be used for strengthening temperature control effect.For example, in the construction of Fig. 4 culture apparatus 51, with feed flow portion 60 Additional aperture plate together is arranged such that its one end is inserted into culture base portion 52.Additional aperture plate so arranged it is another One end is not hanging to downwards in the cultivation solution R of holding tank 59 generally；However, when temperature control effect will be enhanced, the other end It is hanging in the cultivation solution R of holding tank 59 downwards.Therefore, the other end of additional aperture plate is hanging to downwards the cultivation solution of holding tank 59 In R so that cultivation solution R flows into culture base portion 52 by additional aperture plate from holding tank 59.This increase flows through the cultivation of culture base portion 52 Liquid R amount is trained, so as to strengthen the temperature control effect to cultivating base portion 52.Alternatively, additional aperture plate can be arranged to make The other end is obtained not in the cultivation solution R of holding tank 59, and is positioned in above the water surface of holding tank 59；Also, for example, three Hour at least one times, the liquid level of the cultivation solution R to increase or reduce holding tank 59 can be controlled so that additional aperture plate it is another One end is intermittently immersed in cultivation solution R.In this case, when the liquid level increase of holding tank 59, cultivation solution R passes through additional Aperture plate is from the flow direction culture base portion 52 of holding tank 59, so as to strengthen the temperature control effect to cultivating base portion 52.
Example
Hereinafter, the present invention will more specifically be described with reference to example.However, the invention is not restricted to the example below.
Use the culture apparatus 1 of first embodiment；In the warm indoor air temperature of measurement, the temperature of culture base portion 2 and holding tank 9 Cultivation solution R temperature；And check temperature, warm indoor air temperature and the cultivation solution R in holding tank 9 of culture base portion 2 temperature Relation between degree.With the cultivated tomato seedling of culture apparatus 1.Fig. 5 show these temperature before harvest in 5.5 days over time Change.
The temperature in the result indicator medium portion 2 in Fig. 5 with cultivation solution R temperature ratio with warm indoor air temperature it is closer Ground changes.Therefore, compared with using the conventional control of the warm indoor air temperature of air-conditioning etc., to be supplied in the culture apparatus 1 in Fig. 1 Culture base portion 2 cultivation solution R temperature culture base portion easy to control temperature control.
In addition, using the culture apparatus 1 of first embodiment；The warm indoor air temperature of measurement, the temperature for cultivating base portion 2 and storage The temperature of cultivation solution R in groove 9；And it is same, at this moment, measurement sunshine amount and crop Q water absorption.Specifically, for cultivation The tomato plants of seven sections of pinching are carried out in device 1, said temperature, sunshine amount and water absorption are measured in 9 days of the beginning of June.Fig. 6 In indicate relation between sunshine amount and these temperature.In addition, control due to cultivation solution R temperature is indicated in Fig. 7 and The relation between cooling effect and water absorption for cultivating base portion 2.Furthermore, " cooling effect " in Fig. 7 is represented to pass through and will trained The temperature for supporting base portion 2 subtracts the temperature difference that warm indoor air temperature is calculated.
Even if result in Fig. 6 it is stated that cause temperature to sharply increase due to daylight during daytime, cultivates base portion 2 Temperature be also maintained to be temperature close to the cultivation solution R in holding tank 9；Therefore, it is suppressed that the increasing of the ground temperature of culture base portion 2 Plus.
Fig. 7 shows that crop Q water absorption is each plant about 1L daily.Result in Fig. 7 has been described above that there is provided most Many about -8 DEG C cooling effects, and the cooling effect depends on crop Q water absorption.In addition, Fig. 6 is it is stated that temperature The temperature difference between cultivation solution R temperature is bigger, and cooling effect is stronger.
These results using 1 pair of culture base portion 2 of culture apparatus it is stated that have very strong temperature control effect.Furthermore, The temperature control in the case of cooling culture base portion 2 has been herein illustrated；However, in the case of heating culture base portion 2, planting Train device 1 and also provide the temperature control effect to culture base portion 2.
Industrial usability
Ground temperature can be controlled with low cost and relative good accuracy according to the culture apparatus and cultural method of the present invention, so that High-quality crop is cultivated with low cost.
Reference numerals list
1st, 31 and 51 culture apparatus
2nd, base portion is cultivated in 21,22,2m and 52
3rd, 33 and 53 cultivation solution feed mechanism
4th, 34 and 54 temperature control device
5 and 35 frameworks
6th, 36 and 56 filler particles
7 and 37 cultivation solution supply areas
8th, 38 and 58 cultivation liquid bath
9th, 91,92,9n and 59 holding tanks
10 and 60 feed flow portions
11st, 41 and 61 thermostat
12nd, 42 and 62 heater
13rd, 43 and 63 controller
14 and 44 pumps
15th, 46 and 68 supply pipe
16 hide the permeable sheet material of root
The waterproof sheets of 17a first
The waterproof sheets of 17b second
32 culture base portions
39 holding tanks
40 platforms
45 liquid level gauges
55 permeable sheet materials
64 first pumps
65 supplying drainages
66 cultivation solutions aid in feed mechanism
67 second pumps
69 pedestals
70 agriculture vinyl materials
71 support bars
72 fix bars
Q crops
R cultivation solutions

Claims (12)

1. a kind of culture apparatus, the culture apparatus includes：
Cultivate to plant in base portion, the culture base portion and be implanted with crop；And
Cultivation solution feed mechanism, the cultivation solution feed mechanism is configured to the culture base portion supply cultivation solution,
Wherein, the culture base portion includes following region：The cultivation solution is supplied to the region by capillarity phenomenon, and
The culture apparatus also includes temperature control device, and the temperature control device is configured to supplying to the culture medium The temperature of the cultivation solution in portion is controlled.
2. culture apparatus according to claim 1, wherein, the cultivation solution feed mechanism includes：
Liquid bath is cultivated, the cultivation liquid bath is configured to store the cultivation solution；
Holding tank, the holding tank is configured to being stored for the first time from the cultivation solution of the cultivation liquid bath supply；With And
Feed flow portion, the feed flow portion is configured to from the holding tank supply the cultivation solution to the culture base portion, and
The temperature control device is disposed at the cultivation liquid bath or at the feed flow portion.
3. culture apparatus according to claim 2, in addition to cultivation solution auxiliary feed mechanism, the cultivation solution auxiliary supply Mechanism is configured to：The top of the cultivation solution in the cultivation liquid bath from the culture base portion is supplied to the culture medium Portion,
Wherein, the temperature control device is disposed at the cultivation liquid bath, and
The culture apparatus is configured to：So that aiding in feed mechanism to supply to the institute of the culture base portion by the cultivation solution State cultivation solution and the cultivation liquid bath is recycled to via the holding tank.
4. culture apparatus according to claim 1, wherein, the cultivation solution feed mechanism includes：
Liquid bath is cultivated, the cultivation liquid bath is configured to store the cultivation solution；And
Holding tank, the holding tank is configured to store the cultivation solution that the cultivation liquid bath is supplied, and
The temperature control device is disposed at the cultivation liquid bath.
5. the culture apparatus according to claim 2, claim 3 or claim 4, wherein, the cultivation solution supplies machine Structure is configured to：So that it is described cultivation liquid bath in the cultivation solution and the culture base portion in the cultivation solution between realize The temperature difference within 5 DEG C.
6. the culture apparatus according to any one of claim 2 to claim 5, in addition to be configured to described in measurement The mechanism of the liquid level of the cultivation solution in holding tank.
7. the culture apparatus according to any one of claim 1 to claim 6, wherein, the temperature control device Including thermostat and heater.
8. the culture apparatus according to any one of claim 1 to claim 7, wherein, the culture base portion includes Framework and multiple filler particles in the framework.
9. culture apparatus according to claim 8, wherein, the multiple filler particles have more than 3cm and below 300cm Hollow billet lifting height.
10. the culture apparatus according to claim 8 or claim 9, wherein, the multiple particle is including particle diameter Multiple simple grains that more than 0.1mm and below 1mm, mass percent are more than 50%.
11. the culture apparatus according to claim 8, claim 9 or claim 10, wherein, the particle has 1.00g/cm3Above and 3.00g/cm3Following tap density.
12. a kind of cultural method, the cultural method includes planting the culture base portion supply cultivation solution for being implanted with crop thereto,
Wherein, the culture base portion includes following region：The cultivation solution is supplied to the region by capillarity phenomenon, and
The temperature of the cultivation solution to being fed into the culture base portion is controlled.
CN201580068837.2A 2014-12-18 2015-09-24 Culture apparatus and cultural method Pending CN107105621A (en)

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JP2018121527A (en) * 2017-01-23 2018-08-09 ユニテック株式会社 Hydroponic device for fruits and vegetables
JP7083465B2 (en) * 2017-08-14 2022-06-13 ヤンマーグリーンシステム株式会社 Cultivation equipment and cultivation method
CN110419364A (en) * 2019-08-02 2019-11-08 襄阳金美科林农业开发有限公司 A kind of strawberry cultivating ground temperature controlling system
JP7345017B1 (en) 2022-06-10 2023-09-14 博 桜井 How to water plant products

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