CN107076548A - 利用衍射光栅的三维形状测量装置 - Google Patents
利用衍射光栅的三维形状测量装置 Download PDFInfo
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- CN107076548A CN107076548A CN201580059588.0A CN201580059588A CN107076548A CN 107076548 A CN107076548 A CN 107076548A CN 201580059588 A CN201580059588 A CN 201580059588A CN 107076548 A CN107076548 A CN 107076548A
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- light
- measurement object
- diffraction grating
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2513—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object with several lines being projected in more than one direction, e.g. grids, patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02025—Interference between three or more discrete surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02041—Interferometers characterised by particular imaging or detection techniques
- G01B9/02044—Imaging in the frequency domain, e.g. by using a spectrometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
- G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/20—Dispersive element for generating dispersion
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
Claims (8)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2014-0157805 | 2014-11-13 | ||
KR1020140157805A KR101658982B1 (ko) | 2014-11-13 | 2014-11-13 | 회절 격자를 이용한 3차원 형상 측정 장치 |
PCT/KR2015/012109 WO2016076626A1 (ko) | 2014-11-13 | 2015-11-11 | 회절 격자를 이용한 3차원 형상 측정 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107076548A true CN107076548A (zh) | 2017-08-18 |
CN107076548B CN107076548B (zh) | 2020-07-28 |
Family
ID=55954638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201580059588.0A Active CN107076548B (zh) | 2014-11-13 | 2015-11-11 | 利用衍射光栅的三维形状测量装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10533844B2 (zh) |
EP (1) | EP3220100B1 (zh) |
KR (1) | KR101658982B1 (zh) |
CN (1) | CN107076548B (zh) |
WO (1) | WO2016076626A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109141254A (zh) * | 2018-10-15 | 2019-01-04 | 西安交通大学 | 一种集成衍射光栅式高稳定性激光位移传感器 |
CN110208287A (zh) * | 2019-07-03 | 2019-09-06 | 东莞创视自动化科技有限公司 | Oled屏偏光型同轴结构光检测法与oled屏偏光检测装置 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10451401B2 (en) * | 2017-05-23 | 2019-10-22 | Dmg Mori Co., Ltd. | Displacement detecting device with controlled heat generation |
JP6786442B2 (ja) * | 2017-05-23 | 2020-11-18 | Dmg森精機株式会社 | 変位検出装置 |
KR102091045B1 (ko) * | 2018-12-24 | 2020-03-19 | 주식회사 킨엑스 | 3차원 정보 획득 장치 및 그 방법 |
DE102019103814B3 (de) * | 2019-02-14 | 2020-07-02 | Hochschule Trier - Trier University of Applied Sciences | Vorrichtung zum optischen Messen einer Oberfläche |
KR102547049B1 (ko) * | 2021-02-05 | 2023-06-26 | 경북대학교 산학협력단 | 광 시야각 플래시 라이다 장치 |
CN116165202A (zh) * | 2023-02-16 | 2023-05-26 | 中南大学 | 一种材料纹理测量设备及图像处理方法 |
CN118010757A (zh) * | 2024-01-31 | 2024-05-10 | 四川深瑞视科技有限公司 | 一种3d aoi检测装置及检测方法 |
Citations (4)
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---|---|---|---|---|
JP2000097622A (ja) * | 1998-09-22 | 2000-04-07 | Nikon Corp | 干渉計 |
US20050128488A1 (en) * | 2003-11-28 | 2005-06-16 | Dvir Yelin | Method and apparatus for three-dimensional spectrally encoded imaging |
JP2006116028A (ja) * | 2004-10-20 | 2006-05-11 | Univ Of Tsukuba | 線集光型フーリエドメイン干渉形状計測装置 |
CN104034279A (zh) * | 2014-06-14 | 2014-09-10 | 中国科学院光电技术研究所 | 一种利用小孔衍射波面拼接测量面形的检测装置及方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19626261A1 (de) | 1995-06-30 | 1997-01-02 | Nikon Corp | Beobachtungsvorrichtung |
JPH09145330A (ja) | 1995-11-20 | 1997-06-06 | Nikon Corp | 段差測定装置 |
JP5649286B2 (ja) * | 2008-12-26 | 2015-01-07 | キヤノン株式会社 | 光断層撮像装置、被検査物の画像を撮る撮像装置、光断層撮像装置の制御方法及びそのコンピュータプログラム |
WO2010087337A1 (ja) * | 2009-02-02 | 2010-08-05 | 株式会社神戸製鋼所 | 形状測定装置 |
WO2011162566A2 (ko) | 2010-06-24 | 2011-12-29 | 한국표준과학연구원 | 실리콘 웨이퍼의 비아홀 측정 장치 및 방법 |
KR101242470B1 (ko) | 2011-06-24 | 2013-03-12 | 한국표준과학연구원 | 실리콘 웨이퍼의 비아홀 측정 장치 및 방법 |
KR101407482B1 (ko) | 2012-07-03 | 2014-06-16 | 한국표준과학연구원 | 홀 형상 및 깊이 측정 장치 및 방법 |
CN102944176B (zh) * | 2012-11-09 | 2015-06-17 | 清华大学 | 一种外差光栅干涉仪位移测量系统 |
KR101414255B1 (ko) | 2013-03-29 | 2014-07-01 | 에스엔유 프리시젼 주식회사 | Tsv 측정장치 및 측정방법 |
JP2015156422A (ja) * | 2014-02-20 | 2015-08-27 | 株式会社東芝 | パターン検査方法、パターン形成制御方法およびパターン検査装置 |
-
2014
- 2014-11-13 KR KR1020140157805A patent/KR101658982B1/ko active IP Right Grant
-
2015
- 2015-11-11 EP EP15859393.9A patent/EP3220100B1/en active Active
- 2015-11-11 WO PCT/KR2015/012109 patent/WO2016076626A1/ko active Application Filing
- 2015-11-11 US US15/526,538 patent/US10533844B2/en active Active
- 2015-11-11 CN CN201580059588.0A patent/CN107076548B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000097622A (ja) * | 1998-09-22 | 2000-04-07 | Nikon Corp | 干渉計 |
US20050128488A1 (en) * | 2003-11-28 | 2005-06-16 | Dvir Yelin | Method and apparatus for three-dimensional spectrally encoded imaging |
JP2006116028A (ja) * | 2004-10-20 | 2006-05-11 | Univ Of Tsukuba | 線集光型フーリエドメイン干渉形状計測装置 |
CN104034279A (zh) * | 2014-06-14 | 2014-09-10 | 中国科学院光电技术研究所 | 一种利用小孔衍射波面拼接测量面形的检测装置及方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109141254A (zh) * | 2018-10-15 | 2019-01-04 | 西安交通大学 | 一种集成衍射光栅式高稳定性激光位移传感器 |
CN110208287A (zh) * | 2019-07-03 | 2019-09-06 | 东莞创视自动化科技有限公司 | Oled屏偏光型同轴结构光检测法与oled屏偏光检测装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20160057510A (ko) | 2016-05-24 |
EP3220100B1 (en) | 2019-03-20 |
KR101658982B1 (ko) | 2016-09-26 |
CN107076548B (zh) | 2020-07-28 |
US10533844B2 (en) | 2020-01-14 |
EP3220100A1 (en) | 2017-09-20 |
WO2016076626A1 (ko) | 2016-05-19 |
US20180283852A1 (en) | 2018-10-04 |
EP3220100A4 (en) | 2017-09-20 |
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Address after: 15 / F, 14 / F, No.53, Jiashan digital 2 Road, Jinchuan District, Seoul, Korea Applicant after: Gaoying Technology Co.,Ltd. Address before: 15 / F, 14 / F, No.53, Jiashan digital 2 Road, Jinchuan District, Seoul, Korea Applicant before: KOH YOUNG TECHNOLOGY Inc. |
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Address after: Han Guoshouershi Applicant after: Gaoying Technology Co.,Ltd. Address before: 15 / F, 14 / F, No.53, Jiashan digital 2 Road, Jinchuan District, Seoul, Korea Applicant before: Gaoying Technology Co.,Ltd. |
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