CN107045258B - Photomask and method for manufacturing date code on surface of product by using photomask - Google Patents
Photomask and method for manufacturing date code on surface of product by using photomask Download PDFInfo
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- CN107045258B CN107045258B CN201710117404.2A CN201710117404A CN107045258B CN 107045258 B CN107045258 B CN 107045258B CN 201710117404 A CN201710117404 A CN 201710117404A CN 107045258 B CN107045258 B CN 107045258B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
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- General Physics & Mathematics (AREA)
- Surface Treatment Of Glass (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention provides a light shield, which comprises a glass substrate and a pattern layer arranged on the glass substrate, wherein the pattern layer comprises a date pattern area for representing a date, the date pattern area is provided with a plurality of transparent nine-grid checks, and each nine-grid check represents a number corresponding to the date by filling a light shielding material into small grids. The invention also provides a method for manufacturing the date code on the surface of the product by adopting the photomask.
Description
Technical Field
The invention relates to the field of optical etching, in particular to a photomask and a method for manufacturing a date code on the surface of a product by using the photomask.
Background
The PHOTOMASK is also called PHOTOMASK plate, English name MASK or PHOTOMASK in the light shield industry), which is characterized in that quartz glass is used as a substrate, a layer of metal chromium and photosensitive resist are plated on the substrate to form a photosensitive material, designed circuit patterns are exposed on the photosensitive resist through electronic laser equipment, exposed areas can be developed, circuit patterns are formed on the metal chromium to form a PHOTOMASK plate similar to an exposed negative film, then the PHOTOMASK plate is applied to projection positioning of an integrated circuit, and photoetching is performed on the projected circuit through an integrated circuit photoetching machine.
In conventional photolithography, Ultraviolet (UV) exposure of a photoresist layer by a mask can be mainly classified into contact photolithography and double reduction photolithography.
In some photomask manufacturing processes, the model and date of a product need to be etched on the surface of an end product, and because the pattern on the photomask is formed in one step and cannot be changed at a later stage, when the same product is produced at different dates, the photomask needs to be manufactured again, a new date is etched on the surface of the product, and a large amount of material and labor cost is consumed for manufacturing the new photomask.
Disclosure of Invention
In order to solve the above problems in the prior art, it is necessary to provide a mask that can change the date code.
The invention also provides a method for modifying the date code of the photomask.
The technical scheme provided by the invention for solving the technical problem is as follows:
a light shield comprises a glass substrate and a pattern layer arranged on the glass substrate, wherein a date pattern area for representing dates is arranged on the pattern layer, a plurality of transparent nine-grid checks are arranged on the date pattern area, and each nine-grid check represents a number corresponding to the date by filling light shielding materials into small grids.
In the embodiment of the invention, in each nine-square grid, the number of transparent small squares represents corresponding numbers.
In the embodiment of the invention, the light shielding material is ink.
In the embodiment of the invention, the date pattern area comprises 6 Sudoku grids which are sequentially arranged and respectively represent a tens digit corresponding to a year, a units digit corresponding to the year, a tens digit corresponding to a month, a units digit corresponding to the month, a tens digit corresponding to a day and a units digit corresponding to the day.
In the embodiment of the invention, the date pattern area comprises 4 nine-square grids which are sequentially arranged and respectively represent a tens digit corresponding to the year, a units digit corresponding to the year, a tens digit corresponding to the week and a units digit corresponding to the week.
In the embodiment of the invention, the date pattern area comprises 4 nine-palace lattices arranged in two lines in each line, the two nine-palace lattices in the first line sequentially and respectively represent tens corresponding to the year and units corresponding to the year, and the two nine-palace lattices in the second line sequentially and respectively represent tens corresponding to the week and units corresponding to the week.
In the embodiment of the invention, the date pattern area is arranged at the edge of the pattern layer.
The invention also provides a method for manufacturing date codes on the surface of a product by adopting the photomask, which comprises the following steps:
providing a photomask, wherein the photomask comprises a glass substrate and a pattern layer arranged on the glass substrate, the pattern layer comprises a date pattern area for representing date, and the date pattern area is provided with a plurality of transparent nine grids;
filling the nine grids with a shading material;
and developing the nine-square grid pattern on the surface of the product by adopting the photomask to perform a photomask manufacturing process.
Compared with the prior art, the photomask and the method for manufacturing the date code on the surface of the product by adopting the photomask can develop nine-square lattices on the surface of the product, represent different numbers according to the number of the solid small lattices of the nine-square lattices, and further represent the date of manufacturing the product, when the date changes, the nine-square lattices of the photomask only need to be refilled, the date can be changed under the condition that the photomask is not re-manufactured, the loss caused by re-manufacturing the photomask is avoided, and the cost is saved.
Drawings
Fig. 1 is a schematic structural diagram of a mask according to embodiment 1 of the present invention.
Fig. 2 is a schematic diagram of the nine-square grid in fig. 1 representing numbers.
FIG. 3 is a schematic structural diagram of a mask according to embodiment 2 of the present invention.
FIG. 4 is a schematic structural diagram of a mask according to embodiment 3 of the present invention.
FIG. 5 is a flowchart of a method for manufacturing a date code on a surface of a product using a mask according to embodiment 4 of the present invention.
Detailed Description
As shown in fig. 1, an optical mask provided in embodiment 1 of the present invention includes a glass substrate 10 and a pattern layer 20 disposed on the glass substrate, wherein the pattern layer 20 includes a date pattern area 21 for indicating a date, and the date pattern area 21 is disposed at an edge of the pattern layer 20. The date pattern area 21 is internally provided with 4 transparent nine-grid checks 22, each nine-grid check 22 represents a number corresponding to the date by filling a shading material into the small grid 23, and the shading material is ink.
In the date pattern area 21, 4 of the nine-palace lattices 22 are sequentially arranged and sequentially represent a tens figure corresponding to the year, a units figure corresponding to the year, a tens figure corresponding to the week and a units figure corresponding to the week.
As shown in fig. 2, in each of the squared marquee cells 22, the number of transparent small cells 23 represents a corresponding number from 0 to 9.
As shown in fig. 3, in embodiment 2 of the present invention, the date pattern area 21 includes 6 squared boxes 22 arranged in sequence, and sequentially and respectively represents a tens number corresponding to a year, a units number corresponding to a year, a tens number corresponding to a month, a units number corresponding to a month, a tens number corresponding to a day, and a units number corresponding to a day.
As shown in fig. 4, in embodiment 3 of the present invention, the date pattern area 21 includes two rows of 4 nine-palace lattices 22, the two nine-palace lattices 22 in the first row sequentially represent a tens number corresponding to a year and a units number corresponding to the year, respectively, and the two nine-palace lattices 22 in the second row sequentially represent a tens number corresponding to a week and a units number corresponding to a week, respectively.
As shown in fig. 5, embodiment 4 of the present invention provides a method for manufacturing a date code on a surface of a product by using a photomask, which includes the steps of:
step S1: providing a photomask, wherein the photomask comprises a glass substrate and a pattern layer arranged on the glass substrate, the pattern layer comprises a date pattern area for representing date, and the date pattern area is provided with a plurality of transparent nine grids;
step S2: filling the nine-grid palaces with a light shielding material, wherein the light shielding material can adopt printing ink, the number of transparent small grids in each nine-grid palace grid represents corresponding numbers, and the nine-grid palace grids are filled according to dates represented by actual needs;
step S3: and developing the nine-square grid pattern on the surface of the product by adopting the photomask to perform a photomask manufacturing process.
In summary, by using the photomask and the method for manufacturing the date code on the surface of the product by using the photomask provided by the invention, nine-square grids can be developed on the surface of the product, different numbers are represented according to the number of the solid small grids of the nine-square grids, and the date of manufacturing the product is further represented.
The foregoing is a more detailed description of the invention in connection with specific preferred embodiments and it is not intended that the invention be limited to these specific details. For those skilled in the art to which the invention pertains, several simple deductions or substitutions can be made without departing from the spirit of the invention, and all shall be considered as belonging to the protection scope of the invention.
Claims (5)
1. A light shield is characterized by comprising a glass substrate and a pattern layer arranged on the glass substrate, wherein the pattern layer comprises a date pattern area for representing a date, the date pattern area is provided with a plurality of transparent nine-grid checks, and each nine-grid check represents a number corresponding to the date by filling a light shielding material into small grids;
in each nine-square grid, the number of transparent small grids represents corresponding numbers;
the shading material is printing ink; when the date changes, the date can be changed without manufacturing the photomask again only by refilling the Sudoku of the photomask;
the date pattern area is arranged at the edge of the pattern layer.
2. The mask according to claim 1, wherein the date pattern area comprises 6 squared boxes arranged in sequence, and the 6 squared boxes respectively represent a decade corresponding to a year, a unit digit corresponding to a year, a decade corresponding to a month, a unit digit corresponding to a month, a tens digit corresponding to a day and a unit digit corresponding to a day.
3. The mask according to claim 1, wherein the date pattern area comprises 4 squared boxes arranged in sequence, and the ten boxes, the ones, the tens and the ones respectively represent the tens and the ones respectively.
4. The mask according to claim 1, wherein the date pattern area comprises two rows of 4 nine squares, the two nine squares in the first row sequentially represent tens of digits corresponding to the year and ones corresponding to the year, and the two nine squares in the second row sequentially represent tens of digits corresponding to the week and ones corresponding to the week.
5. A method for producing a date code on a surface of a product using a photomask, comprising:
providing a photomask, wherein the photomask comprises a glass substrate and a pattern layer arranged on the glass substrate, the pattern layer comprises a date pattern area for representing date, and the date pattern area is provided with a plurality of transparent nine grids;
filling the nine grids with a shading material;
developing the squared figure on the surface of the product by using the photomask to perform a photomask process;
in each nine-square grid, the number of transparent small grids represents corresponding numbers;
the shading material is printing ink; when the date changes, the date can be changed without manufacturing the photomask again only by refilling the Sudoku of the photomask;
the date pattern area is arranged at the edge of the pattern layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710117404.2A CN107045258B (en) | 2017-03-01 | 2017-03-01 | Photomask and method for manufacturing date code on surface of product by using photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710117404.2A CN107045258B (en) | 2017-03-01 | 2017-03-01 | Photomask and method for manufacturing date code on surface of product by using photomask |
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| Publication Number | Publication Date |
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| CN107045258A CN107045258A (en) | 2017-08-15 |
| CN107045258B true CN107045258B (en) | 2021-01-29 |
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| CN114051344A (en) * | 2021-11-05 | 2022-02-15 | Oppo广东移动通信有限公司 | Shell, preparation method thereof and electronic equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2003121982A (en) * | 2001-10-11 | 2003-04-23 | Nikon Corp | Mask, method for exposure, aligner, and device manufacturing method |
| CN2769964Y (en) * | 2005-02-04 | 2006-04-05 | 彭石飞 | Electronic clock and watch |
| JP2009151109A (en) * | 2007-12-20 | 2009-07-09 | Toshiba Corp | Photomask, method of forming the same, and method of manufacturing semiconductor device |
| CN105093812A (en) * | 2015-08-11 | 2015-11-25 | 京东方科技集团股份有限公司 | Array substrate mother plate and manufacturing method therefor, and mask plate |
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