CN100559270C - Gray tone mask - Google Patents
Gray tone mask Download PDFInfo
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- CN100559270C CN100559270C CNB2005101128855A CN200510112885A CN100559270C CN 100559270 C CN100559270 C CN 100559270C CN B2005101128855 A CNB2005101128855 A CN B2005101128855A CN 200510112885 A CN200510112885 A CN 200510112885A CN 100559270 C CN100559270 C CN 100559270C
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- light shielding
- shielding part
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- tone
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Abstract
The invention provides a kind of gray tone mask.Purpose is to make the graph transfer printing operation practicability of utilizing the gray tone mask with tone portion, and wherein this tone portion is made of the little shading graph below the resolving limit with the exposure machine that uses gray tone mask.In this gray tone mask, for example,, form contour pattern (30) in tone portion (3) one sides along the contour shape of the shading graph (1) of joining with tone portion (3).
Description
The application be that June 25, application number in 2002 are 02124776.5 the applying date, denomination of invention divides an application for the Chinese invention patent application of " gray tone mask and manufacture method thereof ".
Technical field
The present invention relates to have the gray tone mask of the tone portion that is used to the transmission amount between light shielding part and transmissive portions that obtains etc.
Background technology
In recent years, use in the mask field, attempting utilizing gray tone mask to reduce the sheet number (monthly magazine FPD Intelligence, in May, 1999) of mask at large LCD (liquid crystal indicator).
At this, gray tone mask shown in Fig. 8 (1), has light shielding part 1, transmissive portions 2 and tone portion 3.Tone portion 3 is for arranging the zone of little shading graph 3a, this little shading graph 3a has the following dimension of picture of resolving limit that the large LCD that uses gray tone mask is used exposure machine, the formation purpose of tone portion is: equally reduce the optical transmission amount that transmission should the zone and promptly reduce by this regional exposure, other zones change the film thickness that be transferred photoresist substrate on corresponding with this zone alternatively and equally relatively.Usually light shielding part 1 and little shading graph 3a are the film formation of the same thickness of same materials formations such as Cr or chromium compound.
The large LCD that uses gray tone mask with the resolving limit of exposure machine is, is about 3 μ m when using the exposure machine of step-by-step system, is about 4 μ m during the exposure machine of use face projection pattern.Therefore, for example, in Fig. 8 (1), the space width of little transmissive portions 3b is less than 3 μ m in the tone portion, and the live width of little shading graph 3a with the following dimension of picture of the resolving limit of exposure machine is less than 3 μ m.When using above-mentioned large LCD to expose with exposure machine, because of as the exposure light overall exposing quantity not sufficient by tone portion 3, the positive light anti-etching agent by these tone portion 3 exposures only film thickness attenuation remains in (this phenomenon is called the tone effect) on the substrate.Promptly, because resist produces deliquescent difference to developer solution in the part corresponding with light shielding part 1 with tone portion 3 corresponding part usually according to different exposures, so shape of the resist after developing, shown in Fig. 8 (2), for example, the part 11 corresponding with common light shielding part 1 is about 1.3 μ m, and the part 13 (thin resist zone) corresponding with tone portion 3 is about 0.3 μ m, and the part corresponding with transmissive portions 2 becomes no resist part 12.Then, carry out the 1st etching of processed substrate in no resist part 12, the resist of thin part 13 that will be corresponding with tone portion 3 is removed to grind to wait, by carry out the 2nd etching in this part, carry out the operation of original two films with a slice film, reduced the sheet number of film.
But, when using above-mentioned gray tone mask reality on resist, to carry out graph transfer printing, because the influence of the little shading graph that forms in the tone portion of joining with light shielding part or transmissive portions (following be fit to be called this figure), as with this figure--the edge crumple of the resist figure that light shielding part or transmissive portions are corresponding (becomes zigzag, perhaps soft edge), thereby the deterioration in accuracy of the geomery of the resist figure corresponding with this figure, so can't obtain the precision of this graphics shape size of wishing, hinder practicability.
Below specify this problem.
Fig. 9 (1) is the partial plan of the existing gray tone mask of expression, at this figure--between the light shielding part 1,1 ', formed the tone portion 3 that constitutes with trickle line and space diagram 3 ' (the width less than 3 μ m of line 3a, the width less than 3 μ m of space 3b).
Fig. 9 (2) is that expression utilizes the gray tone mask reality shown in Fig. 9 (1) to carry out the result of graph transfer printing on resist.
Shown in Fig. 9 (2), correspondence tone portion 3 has formed thin resist zone 13, but the resist figure 11,11 ' corresponding with this figure, shown in Fig. 9 (1), be subjected to and the trickle line that forms in vertical direction of light shielding part 1,1 ' adjacency and the influence of space diagram 3 ', the edge of resist figure 11 (graphics shape that contains sweep), 11 ' (graphics shape of linearity) all can crumple, the deterioration in accuracy of resist figure 11,11 ' geomery hinders the practicability of the graph transfer printing technology of using gray tone mask.
Summary of the invention
First purpose of the present invention provides a kind of mask, when the gray tone mask that has a tone portion (shading graph by the dimension of picture below the resolving limit with the exposure machine that uses gray tone mask constitutes) in use carries out graph transfer printing on resist, not crumple of edge, the edge clear of the resist figure corresponding with this figure, can obtain the precision of the resist figure desirable geomery corresponding with this figure, and, for tone portion, also can in its whole zone, obtain the film thickness of the resist in the design specification.
In addition, second purpose is: the practicability that realizes utilizing the graph transfer printing technology of the gray tone mask with the tone portion that constitutes with the little shading graph below the resolving limit of exposure machine.
The present invention has following formation.
(constituting 1) a kind of gray tone mask, have light shielding part, transmissive portions and tone portion, wherein tone portion is the zone of arranging the shading graph with the dimension of picture below the exposure machine resolving limit that uses mask, and the transmission amount that makes transmission cross this regional exposure light reduces, it is characterized in that
Described gray tone mask has the adjacent boundary member of light shielding part and tone portion at least;
With the shading graph in the described tone portion of described light shielding part adjacency, have line and space diagram with the contour shape almost parallel of described light shielding part;
And the shading graph of the most close light shielding part border one side and the interval between the described light shielding part in the described tone portion of described light shielding part adjacency are greater than the space interval of described line and space diagram.
According to gray tone mask of the present invention, form contour pattern by contour shape along light shielding part and/or light transmission department (this figure), when on resist, carrying out graph transfer printing, not crumple of edge, the edge clear of the resist figure of corresponding this figure, can obtain the desirable shape and size precision of resist figure of corresponding this figure, and, for tone portion, also can in its whole zone, obtain the film thickness of the resist in the design specification.
In addition, according to gray tone mask of the present invention, but practicability is used the graph transfer printing of the gray tone mask that forms the following trickle graph style of exposure machine resolving limit.The gray tone mask of the type is compared with the gray tone mask that uses the semi-transmissive film type, low price, therefore, gray tone mask of the present invention and graph transfer printing method are essential aspect the practicability of the low price method for making of the large-scale gray tone mask of large-scale gray tone mask of LCD (liquid crystal indicator) usefulness (coloured filter and thin film transistor (TFT) (TFT) make use etc.) and PDP (plasma display panel) usefulness etc.
Description of drawings
Fig. 1 is the figure of explanation an embodiment of the invention, Fig. 1 (1) is the partial plan of the gray tone mask of expression one embodiment of the present invention, and Fig. 1 (2) is that expression utilizes the gray tone mask reality shown in Fig. 1 (1) to carry out the result's of graph transfer printing partial plan on resist.
Fig. 2 is the partial plan of the gray tone mask of expression another embodiment of the invention.
Fig. 3 is the figure of explanation another embodiment of the invention, Fig. 3 (1) is the partial plan of the gray tone mask of another embodiment of expression the present invention, and Fig. 3 (2) is that expression utilizes the gray tone mask reality shown in Fig. 3 (1) to carry out the result's of graph transfer printing partial plan on resist.
Fig. 4 is the figure of another embodiment of explanation the present invention, Fig. 4 (1) is the partial plan of the gray tone mask of another embodiment of expression the present invention, and Fig. 4 (2) is that expression utilizes the gray tone mask reality shown in Fig. 4 (1) to carry out the result's of graph transfer printing partial plan on resist.
Fig. 5 is the figure of another embodiment of explanation the present invention, Fig. 5 (1) is the partial plan of the gray tone mask of another embodiment of expression the present invention, and Fig. 5 (2) is that expression utilizes the gray tone mask reality shown in Fig. 5 (1) to carry out the result's of graph transfer printing partial plan on resist.
Fig. 6 is the partial plan of the gray tone mask of another embodiment of expression the present invention.
Fig. 7 is the partial plan of other form of the tone figure of explanation in removing the tone portion of contour pattern.
Fig. 8 is the figure of explanation gray tone mask, and (1) is partial plan, and (2) are fragmentary cross-sectional views.
Fig. 9 is the figure of explanation prior art, and Fig. 9 (1) is the partial plan of the existing gray tone mask of expression, and Fig. 9 (2) is that expression utilizes the gray tone mask reality shown in Fig. 9 (1) to carry out the result's of graph transfer printing partial plan on resist.
Embodiment
Below, describe the present invention in detail.
The gray tone mask of one embodiment of the present invention is characterised in that, along the contour shape formation contour pattern of this figure (light shielding part and/or light transmission department).
Fig. 1 (1) is the partial plan of gray tone mask of expression one embodiment of the present invention, at this figure--and tone portion 3 places between the light shielding part 1,1 ' form line and space diagram 3 ' (the width less than 3 μ m of line 3a, the width less than 3 μ m of space 3b).Line and space diagram 3 ' are to form along the line bearing of trend with light shielding part 1,1 ' profile approximate vertical direction.Under this form, light shielding part 1,1 ' and the boundary member that joins of tone portion 3 in, in this boundary member tone portion 3 one sides nearby, form wire contour pattern 30,30 ' along light shielding part 1,1 ' contour shape.That is, relatively light shielding part 1,1 ' profile are reserved the interval of regulation and are formed contour pattern 30,30 '.And light shielding part 1 is the graphics shape that contains sweep 1a, forms transmissive portions 2 in light shielding part 1.Along the contour shape of the sweep 1a of light shielding part 1, contour pattern 30 also contains sweep.
And in the above-mentioned form, comprising two forms of the present invention, one of them is, and is irrelevant with the graphics shape of the tone portion 3 of removing contour pattern, along the contour shape of the light shielding part 1 with sweep 1a, forms the form (form 1) of contour pattern 30.Another one is, under the situation of the light shielding part 1 ' of no sweep, the shading graph of removing contour pattern in tone portion is line and the space diagram that extends by along the directional ray with the profile approximate vertical of light shielding part or transmissive portions, perhaps under the situation that the figure beyond line and the space constitutes, along the contour shape of light shielding part 1 ' or transmissive portions, form the form (form 2) of contour pattern 30 '.
Fig. 1 (2) expression uses the gray tone mask reality shown in Fig. 1 (1) to carry out the result of graph transfer printing on resist.
By forming the contour pattern 30,30 ' shown in Fig. 1 (1), shown in Fig. 1 (2), can make the resist figure 11 of this figure correspondence, the both sides of 11 ' (graphics shape and the linearity graphics shape that contain sweep) form the precision of good geomery.That is, shown in Fig. 9 (1), can avoid because be subjected to and light shielding part 1,1 ' in abutting connection with and the trickle line that forms of quadrature and the influence of space diagram 3 ', the deterioration in accuracy of resist figure 11,11 ' edge crumple, resist figure 11,11 ' geomery.In addition, by forming contour pattern 30,30 ', shown in Fig. 1 (2), and, for tone portion 3, also can in its whole zone, obtain having the thin resist zone 13 of the film thickness in the design specification.
In the present invention, contour pattern has: the function that improves the precision of the resist graphics shape size corresponding with this figure; Improve the inhomogeneity function of resist film thickness in the whole zone of tone portion by the interaction between other figure in contour pattern and this figure and contour pattern and the tone portion.
The following describes another kind of form of the present invention.
The feature of this form (form 3) is, as shown in Figure 2, with shading graph in the tone portion 3 of light shielding part 1 adjacency when constituting with the line of the contour shape almost parallel of light shielding part 1 and space diagram 3 ', and the tone portion 3 of light shielding part 1 adjacency in the shading graph 3c of border one side of the most close light shielding part 1 and the interval b between the light shielding part 1 greater than the space interval a of line and space diagram 3 ' (b＞a).
According to this form 3, compare during with b=a, but shape and size precision forms the resist figure corresponding with light shielding part 1 well.That is, compare during with b=a, under the situation of b＞a, by shading graph 3c, shape and size precision forms the increased functionality of the resist figure of corresponding this figure well.Specifically, the most desirable when a＜b≤1.6a, for example, during a=1.2～1.5 μ m, b is made as greater than 1.2～1.5 μ m, less than 2.4 μ m.
In this form 3, shading graph 3c has: the function that improves the shape and size precision of the resist figure corresponding with this figure; Improve the inhomogeneity function of resist film thickness in the whole zone of tone portion by the interaction between shading graph 3c and this figure and shading graph 3c and other line and the space diagram.
The following describes another kind of form of the present invention.
This form (form 4), for example, shown in Fig. 3 (1), when being sandwiched at least two light shielding parts 1,1, along two light shielding parts, 1,1 both sides' profile formation wire contour pattern 30 in tone portion 3.This form 4 also is the form that forms both common contour patterns 30 between two light shielding parts 1,1.
According to this form 4, shown in Fig. 3 (2), but shape and size precision forms the resist figure 11,11 corresponding with light shielding part 1,1 well, and the interaction by light shielding part 1,1 and contour pattern 30 simultaneously can form thin resist zone 13.
And in this form, shown in Fig. 4 (1), can only form tone portion necessary part top ground formation contour pattern 30.In this case shown in Fig. 4 (2), but shape and size precision forms the sweep of the resist figure 11,11 corresponding with light shielding part 1,1 well, and the interaction by light shielding part 1,1 and contour pattern 30 simultaneously can only form thin resist zone 13 at sweep.
The following describes another kind of form of the present invention.
Shown in Fig. 5 (1), this form relates to and is comprising this figure--near the zone of the boundary member of transmissive portions 2 and tone portion or the boundary member, form the form (form 1 ') of contour pattern 30.In this form 1 ', can cross over transmissive portions 2 and form contour pattern 30, perhaps, also can form contour pattern 30 in tone portion 3 one sides or transmissive portions 2 one sides with 3 both sides of tone portion.
In addition, this form relates to along this figure--and the boundary line of light shielding part 1 and tone portion 3 only forms the form (form 6) of contour pattern.In this form 6, with interval b greater than the most desirable (b＞a) of interval a.Compare during with b=a, but shape and size precision forms the resist figure corresponding with light shielding part 1 well.That is, when b＞a,, can strengthen the function that shape and size precision forms this figure well according to contour pattern.Be specially, when a＜b≤1.6a for the most desirable.
And among Fig. 5 (1), the contour pattern 30 that contains sweep is a layer line, and contour pattern 30 ' is two layer lines of linearity.Contour pattern 30,30 ' shown in Fig. 5 (1) has: shape and size precision forms the function of the resist figure of corresponding this figure well; Be formed on the function in the thin resist zone that has the film thickness in the design specification in the whole zone of tone portion by interaction with this figure.
Fig. 5 (2) expression uses the gray tone mask reality shown in Fig. 5 (1) to carry out the result of graph transfer printing on resist.Shown in Fig. 5 (2), but shape and size precision forms the resist figure corresponding with this figure 11,11 well, and the interaction by this figure and contour pattern simultaneously can form thin resist zone 13.
In above-mentioned each form, contour pattern normally forms with the wire (including the wire of sweep) of fixed line width, but be not limited only to this, for example, also can be made as the wire of on-fixed live width, wire (including the wire of sweep) etc. and also can form with part off-position.
And in above-mentioned each form, contour pattern can be provided with one deck or two layers along the boundary line, and is perhaps more multi-layered.
Among the present invention, with the interval (gap) of live width, contour pattern and this figure of contour pattern, the resolving limit same degree of exposure machine that is set as and uses gray tone mask is for the most desirable.Can suitably select the size of associated gap by the aligner that uses, less than 3 μ m are for suitable, and 1.0～2.0 μ m be ideal, and are the most desirable when being 1.2～1.5 μ m degree.
Among the present invention, whether the gap of each figure all can be provided with in contour pattern and the tone portion.Among Fig. 6, expression not contour pattern 30,30 ' and tone portion and line and space diagram 3 ' between the example in gap is set.As shown in Figure 6, contour pattern 30,30 ' and line and space diagram between 3 ' direction during for staggered state, the gap is not set for the most desirable.This be because, light shielding part 1,1 ' and contour pattern 30,30 ' interval, consider the influence that the light to tone portion and light shielding part detours, predetermined distance must be set, if but not contour pattern 30,30 ' and tone portion in figure 3 ' between the gap is set, then can enlarge light shielding part 1,1 ' and contour pattern 30,30 ' between the range of choice of predetermined distance.
When between the various figures in contour pattern and tone portion the gap being set, the interval in gap can suitably be selected by the aligner that uses, and is desirable greater than 0 to 2.0 μ m, and is the most desirable greater than the degree of 0 to 1.5 μ m.If make the interval in gap wide, then little transmissive portions of gap portion can not be differentiated, and in gap portion, can't obtain the film thickness (intermediate transmission rate) in the design specification.
Among the present invention, remove the various figures of contour pattern in the tone portion, be not limited to trickle line and space diagram, can be by the figure of rectangle (for example Fig. 7), point (containing check check) arrangement, perhaps netted and grid etc. can play the arbitrary graphic that reduces the transmissivity effect and constitute.
Removing the tone figure of contour pattern in the tone portion, is ideal with trickle line and space diagram, from conveniently describing the viewpoint of data, with the trickle line of contour pattern quadrature and space diagram for the most desirable.
And in a tone portion or different tone portion, but also the live width and the space width of the trickle line of appropriate change and space diagram are arranged, and a plurality of tones zone of different transmission light quantities is set.
If constitute the live width of the trickle line of tone figure and space diagram and resolving limit that space width is aligner when following, be not particularly limited, but with less than 3 μ m for suitable, 1.0～2.0 μ m are ideal, 1.2～1.5 μ m are the most desirable.
Among the present invention, the film thickness in transmissive portions is 0%, and the film thickness in the light shielding part is 100% o'clock, and the film thickness in the thin resist zone on the corresponding available transfer printing body with tone portion is an ideal with 20～60%, and 30～40% is the most desirable.
The deviate of the zone of corresponding available thin resist with tone portion film thickness, 10% to be ideal with in, 5% with interior the most desirable.
Constituent material (photomask constituent material) as contour pattern can exemplify: chromium mesenterys such as chromium oxide film, chromium film; Molybdenum silicide mesenterys such as molybdenum silicide, molybdenum silicide oxide film, molybdenum silicide nitrogen oxidation film; With tantalum silicide, tungsten silicide etc. are the metal silicide mesentery of representative; Also have silicon mesenterys such as silicon nitride film.
The constituent material of contour pattern can be a same material with the constituent material of other figure in the tone portion, also can be foreign material, but constitute the most desirable with same material.Like this, can form other figure in contour pattern and the tone portion simultaneously by same offset printing operation.
The constituent material of other figure in contour pattern and the tone portion can be same material with the structured material of light shielding part, also can be foreign material, but the most desirable with same material.Because of by using same material,, can form them simultaneously by same operation.
[embodiment]
The following describes embodiment.
On the glass substrate of precise finiss, make the Cr film, on this Cr film, apply resist.Resist is described (exposure), resist is developed, carry out the etching of Cr film, peel off resist after, make the LCD gray tone mask.
Above-mentioned describing in the operation in the operation of the graphic depiction data in making tone portion, made contour pattern along this figure and described data etc.Specifically,,, make contour pattern respectively and describe data the data of describing of this figure for the form shown in Fig. 1,3～6, and other graphic depiction data in the tone portion.In addition, for form shown in Figure 2,, make the graphic depiction data in the tone portion that comprises shading graph 3c to the data of describing of this figure.
Utilize the above-mentioned gray tone mask of making, implementing graph transfer printing with on the substrate of resist.Specifically, use large LCD with exposure machine (Canon produces MPA-1500), with exposure each 7 kinds of conditions (Just, Just+10% of 10% of changing in Just ± 30%, Just-10%, Just+20%, Just-20%, Just+30% Just-30%), implements the exposure test.
Its result, affirmation can obtain the geomery of the resist figure of the corresponding light shielding part in the specification, and, can obtain the film thickness in the corresponding tone portion obtainable thin resist zone in the specification.
And, in Fig. 1 (1), do not form contour pattern among Fig. 6 and when shown in Fig. 9 (1), forming line and space diagram, confirm the edge crumple of the resist figure of corresponding shading graph, can not obtain the geomery in the specification.In addition, in Fig. 1～Fig. 6, do not form contour pattern or shading graph 3c, and when in the whole zone of tone portion, forming dot pattern, check figure (dot pattern is attenuated), confirm the edge crumple of the resist figure of corresponding light shielding part, can not obtain the geomery in the specification.And, in Fig. 2, Fig. 5 (1), during a=b, confirm the edge crumple of the resist figure of corresponding light shielding part, can not obtain the geomery in the specification.
And the present invention is not limited to above-mentioned embodiment etc.
For example, this figure and the forms such as contour pattern corresponding with it are not limited to the form shown in Fig. 1～6 grades.
As mentioned above, according to the present invention, when the gray tone mask that use has a tone portion that constitutes with the little shading graph below the resolving limit of exposure machine carries out graph transfer printing on resist, the not crumple of edge of resist figure, edge clear, the graphics shape dimensional accuracy that can obtain wishing is for tone portion, in its whole zone, can obtain the film thickness in the design specification.
In addition, according to gray tone mask of the present invention, can the practicability utilization form the graph transfer printing of the gray tone mask of the following little shading graph type of the resolving limit of exposure machine.Because the gray tone mask of the type is compared with the gray tone mask that uses the half transmitting type, price is low, so gray tone mask of the present invention and graph transfer printing method are being must be obligato aspect the practicability of LCD transfer printing process at a low price and manufacture method.
Claims (2)
1. gray tone mask, have light shielding part, transmissive portions and tone portion, wherein tone portion is the zone of arranging the shading graph with the dimension of picture below the exposure machine resolving limit that uses mask, and the transmission amount that makes transmission cross this regional exposure light reduces, it is characterized in that
Described gray tone mask has the adjacent boundary member of light shielding part and tone portion at least;
Shading graph with in the described tone portion of described light shielding part adjacency has line parallel with the contour shape of described light shielding part and space diagram;
And the shading graph of the most close light shielding part border one side and the interval between the described light shielding part in the described tone portion of described light shielding part adjacency are greater than the space interval of described line and space diagram.
2. gray tone mask according to claim 1 is characterized in that,
The space interval of described line and space diagram is a,
And in the described tone portion of described light shielding part adjacency between the shading graph of the most close light shielding part border one side and the described light shielding part be spaced apart b the time,
A and b satisfy the relation of a＜b≤1.6a.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02124776 CN1231813C (en) | 2002-06-25 | 2002-06-25 | Grey mask and method for making same |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02124776 Division CN1231813C (en) | 2002-06-25 | 2002-06-25 | Grey mask and method for making same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1755520A CN1755520A (en) | 2006-04-05 |
| CN100559270C true CN100559270C (en) | 2009-11-11 |
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005101128855A Expired - Fee Related CN100559270C (en) | 2002-06-25 | 2002-06-25 | Gray tone mask |
| CN 02124776 Expired - Fee Related CN1231813C (en) | 2002-06-25 | 2002-06-25 | Grey mask and method for making same |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02124776 Expired - Fee Related CN1231813C (en) | 2002-06-25 | 2002-06-25 | Grey mask and method for making same |
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| CN (2) | CN100559270C (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4614696B2 (en) * | 2004-06-24 | 2011-01-19 | Ｈｏｙａ株式会社 | Manufacturing method of gray tone mask |
| WO2007017947A1 (en) * | 2005-08-11 | 2007-02-15 | Fujitsu Limited | Exposure mask, method for producing same, and method for transferring pattern |
| JP5036328B2 (en) * | 2007-01-24 | 2012-09-26 | Ｈｏｙａ株式会社 | Gray tone mask and pattern transfer method |
| US8730473B2 (en) * | 2010-09-28 | 2014-05-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multiple edge enabled patterning |
| KR101785044B1 (en) * | 2011-04-21 | 2017-10-13 | 엘지디스플레이 주식회사 | Mask for black matrix |
| CN103033975B (en) * | 2012-12-12 | 2015-09-23 | 京东方科技集团股份有限公司 | A kind of mask plate and utilize the method for mask plate composition |
-
2002
- 2002-06-25 CN CNB2005101128855A patent/CN100559270C/en not_active Expired - Fee Related
- 2002-06-25 CN CN 02124776 patent/CN1231813C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1755520A (en) | 2006-04-05 |
| CN1231813C (en) | 2005-12-14 |
| CN1464337A (en) | 2003-12-31 |
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Granted publication date: 20091111 Termination date: 20100625 |