CN110703489A - Mask plate, display panel and preparation method of display panel - Google Patents
Mask plate, display panel and preparation method of display panel Download PDFInfo
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- CN110703489A CN110703489A CN201910989534.4A CN201910989534A CN110703489A CN 110703489 A CN110703489 A CN 110703489A CN 201910989534 A CN201910989534 A CN 201910989534A CN 110703489 A CN110703489 A CN 110703489A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
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Abstract
The embodiment of the invention discloses a mask plate, a display panel and a preparation method of the mask plate. The embodiment of the invention is different from the prior art, and the mask is provided with three different light transmittance areas, so that in the process of preparing the color resistor by using the mask, because the light transmittance of the second area is greater than that of the first area, the light transmittance of the second area is less than that of the third area, and the second area corresponds to different color resistor overlapping areas, the intensity of light penetrating through the second area is lower than that of light penetrating through the first area, the film thickness of the color resistor area part corresponding to the second area is reduced, the bulges of the different color resistor overlapping areas are reduced, and the generation of oxhorn is avoided.
Description
Technical Field
The invention relates to the technical field of display, in particular to a mask, a display panel and a preparation method of the mask and the display panel.
Background
Currently, Liquid Crystal Displays (LCDs) are very important in the field of display technology and are widely used in the market. A liquid crystal display panel generally used for fabricating a liquid crystal display includes an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate. The color film substrate comprises a color resistance layer for forming colored light, but the liquid crystal display panel with the structure needs to ensure that the array substrate and the color film substrate have good alignment when being assembled so as to prevent poor display caused by position offset of the color resistance layer.
The coa (color Filter on array) technology is to directly prepare the color resist layer on the array substrate, so that the alignment problem between the array substrate and the color Filter substrate does not exist. In the liquid crystal display panel structure based on the COA technology, the color resistors are disposed on the array substrate, and in order to prevent light leakage between two adjacent color resistors or two adjacent pixels, the two adjacent color resistors or two adjacent pixels are close to each other, which may result in a large thickness of the color resistor or pixel interface region and a protrusion, i.e., a so-called ox horn region. The electrode covered above the ox horn area also generates a protrusion, and the formed electric field can not well shield the interference of the peripheral electric field, thereby causing display abnormality and influencing the quality of the panel.
Disclosure of Invention
The embodiment of the invention provides a mask, a display panel and a preparation method thereof, wherein the mask is provided with three areas with different light transmittance, so that in the process of preparing a color resistor by using the mask, the light transmittance of a second area is greater than that of a first area, the light transmittance of the second area is less than that of a third area, and the second area corresponds to different color resistor overlapping areas, so that the intensity of light penetrating through the second area is lower compared with that of light penetrating through the first area, the thickness of a film layer of the color resistor area part corresponding to the second area is reduced, the bulges of different color resistor overlapping areas are reduced, and the generation of oxhorn is avoided.
In order to solve the above problem, in one aspect, the present application provides a mask blank, including a first region, a second region and a third region sequentially arranged along a first direction, wherein a light transmittance of the second region is greater than a light transmittance of the first region, and the light transmittance of the second region is less than the light transmittance of the third region.
Further, the second region includes at least two light shielding portions distributed at intervals.
Further, the light shielding portions are arranged along a second direction, wherein the second direction is perpendicular to the first direction.
Further, the pitch between the adjacent two light shielding portions is equal.
Further, the distance between two adjacent shading parts ranges from 5um to 15 um.
Further, the length range of the shading part along the first direction is 5um to 10 um.
Further, the length range of the shading part along the second direction is 5um to 15 um.
In one aspect, the present application further provides a method for manufacturing a display panel, where the method includes:
providing an array substrate;
coating a color resistance material on the array substrate;
processing the color resistance material by adopting a mask plate to obtain a color resistance layer;
wherein the mask is the mask described above
Further, the processing of the color resist material by the mask to obtain the color resist layer includes:
exposing the first color resistance material by using the mask to prepare a second color resistance material;
and developing the second color resistance material to prepare the color resistance layer.
On one hand, the application also provides a display panel, and the display panel is prepared by adopting the preparation method of the display panel.
Has the advantages that: in an embodiment of the invention, a mask includes a first region, a second region and a third region arranged in sequence along a first direction, wherein, the light transmittance of the second area is larger than that of the first area, the light transmittance of the second area is smaller than that of the third area, different from the prior art, the mask is provided with three areas with different light transmittances, therefore, in the process of preparing the color resistance by using the mask, since the light transmittance of the second region is greater than that of the first region, the light transmittance of the second region is less than that of the third region, the second region corresponds to the overlapping region of different color resistances, so that the intensity of the light penetrating the second region is lower than that of the light penetrating the first region, the thickness of the film layer of the color resistance area part corresponding to the second area is reduced, so that the protrusion of different color resistance overlapping areas is reduced, and the generation of the ox horn is avoided.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic structural view of one embodiment of a reticle in an embodiment of the invention;
FIG. 2 is a schematic structural view of another embodiment of a reticle in an embodiment of the invention;
FIG. 3 is a schematic structural view of another embodiment of a reticle in an embodiment of the invention;
FIG. 4 is a schematic structural view of another embodiment of a reticle in an embodiment of the invention;
FIG. 5 is a schematic flow chart illustrating an embodiment of a method for manufacturing a display panel according to an embodiment of the present invention;
fig. 6 is a schematic flow chart of another embodiment of a method for manufacturing a display panel according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the liquid crystal display panel structure based on the COA technology, the color resistors are disposed on the array substrate, and in order to prevent light leakage between two adjacent color resistors or two adjacent pixels, the two adjacent color resistors or two adjacent pixels are close to each other, which may result in a large thickness of the color resistor or pixel interface region and a protrusion, i.e., a so-called ox horn region. The electrode covered above the ox horn area also generates a protrusion, and the formed electric field can not well shield the interference of the peripheral electric field, thereby causing display abnormality and influencing the quality of the panel.
Accordingly, embodiments of the present invention provide a mask, a display panel and a method for manufacturing the same, which are described in detail below.
First, an embodiment of the present invention provides a mask, including a first region, a second region, and a third region sequentially arranged along a first direction, where a light transmittance of the second region is greater than a light transmittance of the first region, and a light transmittance of the second region is less than a light transmittance of the third region.
Referring to fig. 1, a schematic structural diagram of an embodiment of a mask according to an embodiment of the present invention is shown, wherein the mask includes a first region 101, a second region 102, and a third region 103 sequentially arranged along a first direction 100, wherein a light transmittance of the second region 102 is greater than a light transmittance of the first region 101, and a light transmittance of the second region 102 is less than a light transmittance of the third region 103A Mask plate (also called Mask plate, Mask Reticle for short) is a graphic master plate used in a common Photolithography process of micro-nano processing technology, and is a Mask graphic formed on a transparent substrate by a lightproof light-shielding thin film (metal chromium), and the graphic is transferred to the thin film of a glass substrate by Photolithography process (Photolithography). The mask plate graph and the exposure graph in the panel manufacturing industry adopt the proportion of 1:1, and a transparent substrate forming the mask plate is usually synthetic quartz glass and has the characteristics of low thermal expansion coefficient and high ultraviolet spectrum transmission and filtration. The coefficient of thermal expansion of conventional soda glass is 8.1X10-6m/C, the coefficient of thermal expansion of the synthetic quartz glass is 5X10-7m/C, their densities are 2.49g/cm and 2.20g/cm, respectively. The light-shielding film is usually a metal chromium film, and the surface of the chromium film is covered with anti-reflection chromium sesquioxide. In order to prevent the graph from being scratched and the pollution of dust particles, the mask plate of the array engineering is stuck with a layer of extremely thin transparent protective film (Pellicle) on the outer frame of the graph surface. The method comprises the steps of forming a mask graph structure on a transparent substrate through an opaque shading film, and transferring graph information to a product substrate through an exposure process, wherein the mask is adopted to prepare a color resistance layer in the embodiment, the first direction is the horizontal direction relative to the mask, the left direction is the right direction, and the first area 101, the second area 102 and the third area 103 sequentially can be a shading area, a semi-transparent area and a transparent area.
In the embodiment of the invention, the mask comprises a first area, a second area and a third area which are sequentially arranged along a first direction, wherein the light transmittance of the second area is greater than that of the first area, the light transmittance of the second area is less than that of the third area, and the mask is different from the prior art in that three areas with different light transmittances are distributed on the mask, so that in the process of preparing the color resistor by using the mask, because the light transmittance of the second area is greater than that of the first area, the light transmittance of the second area is less than that of the third area, and the second area corresponds to different color resistor overlapping areas, the intensity of light penetrating through the second area is lower than that of light penetrating through the first area, the thickness of a film layer of the color resistor area part corresponding to the second area is reduced, so that the protrusions of the different color resistor overlapping areas are reduced, and the generation of ox horn is avoided.
Referring to fig. 2, fig. 2 is a schematic structural diagram of another embodiment of a reticle according to an embodiment of the invention.
On the basis of the above embodiments, in a specific embodiment of the present application, the second region 102 includes at least two light shielding portions 201 distributed at intervals, and the light shielding portions 201 are arranged along the second direction 200, where the second direction 200 is perpendicular to the first direction 100, in this embodiment, the second direction is perpendicular to the first direction with respect to the mask, and is vertically downward, the second region includes at least two light shielding portions 201 distributed at intervals, and a slit is formed between two adjacent light shielding portions 201, and the slit can achieve a semi-transparent effect through an interference effect of light, so that a light transmittance of the second region is between the first region and the third region.
In this embodiment, the distances between two adjacent light shielding portions 201 may be equal, the distance range between two adjacent light shielding portions 201 is 5um to 15um, the length range of the light shielding portion 201 along the first direction is 5um to 10um, and the length range of the light shielding portion 201 along the second direction is 5um to 15um, for example, in a specific embodiment, the distance between two adjacent light shielding portions 201 is 10um, the length of the light shielding portion 201 along the first direction is 5um, and the length of the light shielding portion 201 along the second direction is 10um, which is not limited by the present application, and is specifically determined according to the actual situation.
In order to better implement the mask in the embodiment of the present invention, on the basis of the mask, the embodiment of the present invention further provides a method for manufacturing a display panel, which includes: providing an array substrate; coating a color resistance material on the array substrate; processing the color resistance material by adopting a mask plate to obtain a color resistance layer; wherein, the mask is the mask of the above embodiment.
Referring to fig. 5, fig. 5 is a schematic flow chart illustrating an embodiment of a method for manufacturing a display panel according to an embodiment of the present invention, wherein the method includes:
301. an array substrate is provided.
In this embodiment, the array substrate is formed by arranging a plurality of Thin Film Transistors (TFTs) in an array, the TFTs are one of the types of field effect transistors, and the manufacturing method is to deposit various films on the substrate, such as a semiconductor active layer, a dielectric layer, and a metal electrode layer. The thin film transistor has a very important role in the operation performance of the display device.
302. And coating a color resistance material on the array substrate.
In this embodiment, the color resist layer can absorb a part of the spectrum of the natural light, and only transmits the matched monochromatic spectrum to form the primary color in the mixed color, wherein the color resist material includes a red resist material, a green resist material and a blue resist material.
303. Processing the color resistance material by adopting a mask plate to obtain a color resistance layer;
wherein, the mask is the mask of the above embodiment.
In this embodiment, the color resist layer includes a red resist layer, a green resist layer, and a blue resist layer, and the mask may be made of different materials according to different color resists, for example, the red resist layer, the green resist layer, and the blue resist layer may respectively correspond to a red resist mask, a green resist mask, and a blue resist mask, and specifically, in the process of exposing the resist layer by using the mask, the mask includes a first region 101, a second region 102, and a third region 103. The first region 101, the second region 102, and the third region 103 may be a light-shielding region, a semi-light-transmitting region, and a light-transmitting region in sequence. The second region 102 includes light shielding portions 201 arranged at intervals; and developing the exposed color resistance layer to obtain a color resistance pattern, wherein the thickness of the color resistance pattern in the area corresponding to the second area of the mask plate is reduced towards the edge of the color resistance pattern, the patterned red color resistance is sequentially prepared, and the operations are repeated to prepare the green color resistance and the blue color resistance.
Referring to fig. 2 to 4, fig. 2 is a top view of a red color resist mask covered on a red color resist layer when a green color resist layer is prepared, fig. 3 and 4 are top views of a blue color resist layer and a red color resist layer, respectively, in fig. 4, when a red color resist layer is prepared, a red color resist mask is used, a first region 101 of the mask is a light-shielding region which shields a green color resist layer region and a blue color resist layer region corresponding to the mask, a second region and a third region are red color resist layer regions, as can be seen from fig. 2 and 4, a second region is a junction of the red color resist layer and the green color resist layer adjacent to each other and is semi-transparent to light, and the second region is a junction of the red color resist layer and the green color resist layer corresponding to each other, during exposure preparation, due to interference of light, the color resist layer of the region becomes thinner relative to the color resist layer of the transparent region corresponding to the third region, therefore, the protrusion of the overlapping area of the red and green resist layers is reduced, and the generation of the horn is prevented.
It should be noted that, in the above embodiment of the display panel, only the above structure is described, and it is understood that, in addition to the above structure, the display panel according to the embodiment of the present invention may further include any other necessary structure as needed, for example, a substrate, a buffer layer, an interlayer dielectric layer (ILD), and the like, and the specific description is not limited herein.
By employing the manufacturing method of the display panel as described in the above embodiment, the manufacturing method includes: providing an array substrate; coating a color resistance material on the array substrate; processing the color resistance material by adopting a mask plate to obtain a color resistance layer; the mask comprises a first area, a second area and a third area which are sequentially arranged along a first direction, wherein the light transmittance of the second area is greater than that of the first area, the light transmittance of the second area is less than that of the third area, the mask is different from the prior art, three different light transmittance areas are distributed on the mask, therefore, in the process of preparing the color resistor by using the mask, because the light transmittance of the second area is greater than that of the first area, the light transmittance of the second area is less than that of the third area, and the second area corresponds to different color resistor overlapping areas, the intensity of light penetrating through the second area is lower than that of light penetrating through the first area, the thickness of a film layer of the color resistor area part corresponding to the second area is reduced, the protrusion of the different color resistor overlapping areas is reduced, and the generation of oxhorn is avoided.
On the basis of the above embodiment, in another specific embodiment of the present application, processing a color resist material with a reticle to obtain a color resist layer includes: exposing the first color resistance material by using a mask to prepare a second color resistance material; and developing the second color resistance material to prepare the color resistance layer.
Referring to fig. 6, fig. 6 is a schematic flow chart of another embodiment of a method for manufacturing a display panel according to an embodiment of the present invention, in which a color resist layer is obtained by processing a color resist material with a mask, including:
401. and carrying out exposure treatment on the first color resistance material by adopting a mask plate to prepare a second color resistance material.
In this embodiment, a mask is used to expose the first color resist material, and the pattern of the mask is printed on the second color resist material, wherein an exposure machine used in the exposure process is composed of an illumination system, an alignment system, a mask stage, a glass substrate stage, and an optical system. The light source is emitted by a high-pressure mercury lamp, after light rays in the light source pass through a lens and a filter, g lines of 436nm wave crests of a visible light region, h lines of 405nm wave crests and i lines of 365nm wave crests of an ultraviolet region enter an illumination system to serve as exposure light sources, and other d lines of 578nm wave crests and e lines of 546nm wave crests enter an alignment system to serve as parts of alignment light sources. In this way, the requirements on the optical system are low. The main parameters of exposure that affect the accuracy of the pattern are the distance between the reticle and the glass substrate and the ultraviolet wavelength. The smaller the spacing is, the higher the pattern precision is, but the spacing is too small, and if dust particles exist, the mask plate can be scratched; the shorter the ultraviolet wavelength is, the higher the pattern accuracy is.
402. And developing the second color resistance material to prepare the color resistance layer.
In this embodiment, the excess portion of the pattern on the second resist material is removed by a developing process to obtain a patterned color resist layer.
In order to better implement the mask in the embodiment of the invention, on the basis of the mask, the embodiment of the invention also provides a display panel, and the display panel is prepared by adopting the preparation method of the display panel in the embodiment.
Compared with the traditional display panel, the display panel provided by the invention is prepared by adopting the method, and the method comprises the following steps: providing an array substrate; coating a color resistance material on the array substrate; processing the color resistance material by adopting a mask plate to obtain a color resistance layer; wherein the mask comprises a first area, a second area and a third area which are arranged in sequence along a first direction, wherein, the light transmittance of the second area is larger than that of the first area, the light transmittance of the second area is smaller than that of the third area, different from the prior art, the mask is provided with three areas with different light transmittances, therefore, in the process of preparing the color resistance by using the mask, since the light transmittance of the second region is greater than that of the first region, the light transmittance of the second region is less than that of the third region, the second area corresponds to the overlapping area of different color resistances, so that the intensity of the light penetrating the second area is lower than that of the light penetrating the first area, the thickness of the film layer of the color resistance area corresponding to the second area is reduced, thereby reduce the protrusion in different colour resistance overlap regions, avoid the production of ox horn, consequently make display panel's display effect more stable.
In the above embodiments, the descriptions of the respective embodiments have respective emphasis, and a part which is not described in detail in a certain embodiment may refer to the detailed descriptions in the other embodiments, and is not described herein again.
In a specific implementation, each unit or structure may be implemented as an independent entity, or may be combined arbitrarily to be implemented as one or several entities, and the specific implementation of each unit or structure may refer to the foregoing method embodiment, which is not described herein again.
The above operations can be implemented in the foregoing embodiments, and are not described in detail herein.
The mask and the display panel provided by the embodiment of the invention and the preparation method thereof are described in detail, the principle and the embodiment of the invention are explained by applying specific examples, and the description of the embodiment is only used for helping to understand the method and the core idea of the invention; meanwhile, for those skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (10)
1. The mask is characterized by comprising a first area, a second area and a third area which are sequentially arranged along a first direction, wherein the light transmittance of the second area is greater than that of the first area, and the light transmittance of the second area is less than that of the third area.
2. The reticle of claim 1, wherein the second region comprises at least two spaced-apart light shields.
3. The reticle of claim 2, wherein the light blocking portions are arranged along a second direction, wherein the second direction is perpendicular to the first direction.
4. The mask according to claim 3, wherein the adjacent two light shielding portions have equal spacing.
5. The mask according to claim 4, wherein the pitch between two adjacent light-shielding portions is in a range of 5um to 15 um.
6. The reticle of claim 2, wherein the length of the light blocking portion along the first direction is in a range of 5um to 10 um.
7. The reticle of claim 3, wherein the length of the light blocking portion along the second direction is in a range of 5um to 15 um.
8. A method for manufacturing a display panel, the method comprising:
providing an array substrate;
coating a color resistance material on the array substrate;
processing the color resistance material by adopting a mask plate to obtain a color resistance layer;
wherein the reticle is the reticle of any one of claims 1 to 7.
9. The method for manufacturing a display panel according to claim 8, wherein the processing of the color resist material by the mask to obtain the color resist layer comprises:
exposing the first color resistance material by using the mask to prepare a second color resistance material;
and developing the second color resistance material to prepare the color resistance layer.
10. A display panel produced by the production method for a display panel according to claim 8.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910989534.4A CN110703489A (en) | 2019-10-17 | 2019-10-17 | Mask plate, display panel and preparation method of display panel |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910989534.4A CN110703489A (en) | 2019-10-17 | 2019-10-17 | Mask plate, display panel and preparation method of display panel |
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| CN110703489A true CN110703489A (en) | 2020-01-17 |
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| CN201910989534.4A Pending CN110703489A (en) | 2019-10-17 | 2019-10-17 | Mask plate, display panel and preparation method of display panel |
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| CN113703281A (en) * | 2021-07-30 | 2021-11-26 | 惠科股份有限公司 | Mask, manufacturing method of array substrate and array substrate |
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Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
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Application publication date: 20200117 |