CN107013440B - Micro-droplet active preparation device and method embedded with piezoelectric stack disturbance - Google Patents

Micro-droplet active preparation device and method embedded with piezoelectric stack disturbance Download PDF

Info

Publication number
CN107013440B
CN107013440B CN201710370198.6A CN201710370198A CN107013440B CN 107013440 B CN107013440 B CN 107013440B CN 201710370198 A CN201710370198 A CN 201710370198A CN 107013440 B CN107013440 B CN 107013440B
Authority
CN
China
Prior art keywords
needle tube
micro
phase needle
piezoelectric stack
shell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201710370198.6A
Other languages
Chinese (zh)
Other versions
CN107013440A (en
Inventor
司廷
黄芳胜
吴强
朱志强
杨超宇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Science and Technology of China USTC
Original Assignee
University of Science and Technology of China USTC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Science and Technology of China USTC filed Critical University of Science and Technology of China USTC
Priority to CN201710370198.6A priority Critical patent/CN107013440B/en
Publication of CN107013440A publication Critical patent/CN107013440A/en
Application granted granted Critical
Publication of CN107013440B publication Critical patent/CN107013440B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00Machines, pumps, or pumping installations having flexible working members
    • F04B43/02Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
    • F04B43/04Pumps having electric drive
    • F04B43/043Micropumps
    • F04B43/046Micropumps with piezoelectric drive

Abstract

The invention discloses a micro-droplet active preparation device and a method embedded with piezoelectric stack disturbance, belonging to the technical field of microfluidics, wherein the device is mainly characterized in that a vibrating piezoelectric stack is embedded into a flowing and focusing pipeline through a small hole on a needle tube, one end of the piezoelectric stack is bonded with the needle tube through a base, and the other end of the piezoelectric stack is contacted with fluid in the pipeline through an insulating film; for a liquid-driven flowing focusing system, driving liquid flows through a round hole from a driving liquid inlet, shearing force is provided for micro-droplet phases introduced through a pipeline to form a stable cone, the micro-droplet phases further penetrate through the round hole to form a jet flow column, and liquid in a container flows out through an outlet. When the pressure electric stack is disturbed, vibration energy is transferred to fluid in the pipeline through the insulating film, and the vibration energy realizes the effect of disturbance in the process of forming the cone and the jet column.

Description

Micro-droplet active preparation device and method embedded with piezoelectric stack disturbance
Technical Field
The invention relates to the technical field of microfluidics, in particular to a micro-droplet active preparation device and method embedded with piezoelectric stack disturbance.
Background
The formation of droplets is illustrative of the complexity of microfluidic processing. The relatively small forces associated with surface tension create a high degree of non-linearity in the droplet formation process and are exceptionally sensitive to external disturbances. The formation of droplets from a continuous liquid phase requires the introduction of energy that is converted to surface energy upon droplet formation. When the energy is only from the fluid pressure and no external energy is input, the passive control is performed; in contrast, in the droplet generation process, external energy input is active control. The classical structure of passive control is: t-type and flow-focusing type. Passive control of both structures is achieved primarily by varying flow or pressure. The biggest problems of passive control are: the response time is too long, typically a few seconds or even minutes. The longer response time is mainly limited by the relatively large fluid resistance. At preset flow rates and pressures, the only way to obtain a droplet of a specific size is to adjust the liquid properties and the shape of the channel. According to different types of external input energy, the active control generation of droplets is mainly divided into: thermal control, magnetic control, gas/liquid drive control, piezoelectric control, and the like. Since the piezoelectric drive has a fast response, which can reach 200 μ s in general, the research on the preparation of micro-droplets by piezoelectric active excitation is receiving more and more attention, and the introduction of the piezoelectric perturbation is mainly directed to the micro-fluidic chip, such as the vibration of a piezoelectric wafer, a piezoelectric bimorph or a piezoelectric stack, on an inlet pipeline to control the volume or frequency of the formation of the micro-droplets. Compared with the micro-droplet preparation of a micro-fluidic chip, the micro-droplet preparation utilizing liquid-driven flow focusing has many advantages, such as low cost, high encapsulation efficiency, high yield and the like. However, at present, micro-droplets generated by a two-dimensional planar microfluidic chip technology often contact with a cavity wall to deform, and micro-droplets generated by a three-dimensional device based on liquid-driven flow focusing have little influence on external disturbance in a liquid environment, and the wettability problem is further improved.
Disclosure of Invention
Based on the problems existing in the prior art, the invention aims to provide a micro-droplet active preparation device and a method embedded in piezoelectric stack disturbance, which can actively control the preparation of micro-droplets in a piezoelectric disturbance mode.
The purpose of the invention is realized by the following technical scheme:
the embodiment of the invention provides a micro-droplet active preparation device embedded in perturbation of a piezoelectric stack, which comprises:
a piezoelectric stack, an insulating film, and a base; wherein the content of the first and second substances,
the front end of the piezoelectric stack is embedded into a through hole in the side wall of the needle tube provided with the insulating film and is in contact with fluid in the pipeline through the insulating film;
the rear end of the piezoelectric stack is connected with the base, and the base is arranged on the outer wall of the needle tube.
The embodiment of the invention also provides a micro-droplet active preparation method embedded with piezoelectric stack disturbance, and the micro-droplet active preparation device embedded with piezoelectric stack disturbance comprises the following steps:
the size and the generation frequency of the micro-droplets generated by the jet column crushing are controlled by controlling the driving voltage, the driving frequency or the driving waveform of the piezoelectric stack of the micro-droplet active preparation device, wherein the driving voltage is less than the breakdown voltage of the piezoelectric stack, and the driving waveform is any one of sine waves, square waves or sawtooth waves.
According to the technical scheme provided by the invention, the device and the method for actively preparing the micro-droplets embedded with the disturbance of the piezoelectric stack, which are provided by the embodiment of the invention, have the beneficial effects that:
through setting up the piezoelectric stack in the through-hole of needle tubing lateral wall, through the vibration energy transmission of piezoelectric stack to the fluid in the pipeline through the insulating film, the vibration energy realizes the disturbance in the process of formation toper and efflux post, and then prepares out the micro-droplet, can control the micro-droplet size and the frequency of generating that the efflux post was broken to produce through control piezoelectric stack's drive voltage, drive frequency or drive waveform moreover.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on the drawings without creative efforts.
FIG. 1 is a schematic structural diagram of an active micro-droplet preparation apparatus provided in an embodiment of the present invention;
FIG. 2 is a schematic diagram of a flow focusing apparatus embedded in a perturbation of a piezoelectric stack according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a structure for in-line flow focusing perturbed by an embedded piezoelectric stack provided by an embodiment of the present invention;
FIG. 4 is a schematic view of a core phase syringe and a shell phase syringe aligned according to an embodiment of the present invention.
In the figure: 1-needle tube, 2-insulating film, 3-through hole, 4-base, 5-piezoelectric stack, 6-pipeline, 7-micro-droplet phase, 8-taper, 9-jet column, 10-outlet, 11-container body, 12-round hole, 13-driving liquid inlet, 14-rubber plug, 15-nuclear phase needle tube, 16-shell phase needle tube, 17-nuclear phase needle tube outer wall and 18-shell phase needle tube inner wall.
Detailed Description
The technical solutions in the embodiments of the present invention are clearly and completely described below with reference to the specific contents of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without making any creative effort, shall fall within the protection scope of the present invention.
As shown in fig. 1, an embodiment of the present invention provides an active micro-droplet preparation device embedded in a perturbation of a piezoelectric stack, including:
a piezoelectric stack, an insulating film, and a base; wherein the content of the first and second substances,
the front end of the piezoelectric stack is embedded into a through hole in the side wall of the needle tube provided with the insulating film and is in contact with fluid in the pipeline through the insulating film;
the rear end of the piezoelectric stack is connected with the base, and the base is arranged on the outer wall of the needle tube.
The device is mainly characterized in that a vibrating piezoelectric stack is embedded into a flowing and focusing pipeline through a small hole in a needle tube, one end of the piezoelectric stack is bonded with the needle tube through a base, the other end of the piezoelectric stack is in contact with fluid in the pipeline through an insulating film, vibration energy of the piezoelectric stack is transmitted to the fluid in the pipeline through the insulating film, and the vibration energy achieves the disturbance effect in the process of forming a cone and a jet column.
In the preparation device, the insulating film is embedded in the through hole in the side wall of the needle tube and is blocked between the front end of the piezoelectric stack and the fluid in the pipeline.
In the above preparation apparatus, the base has a lateral dimension larger than a diameter of the through hole in the sidewall of the needle tube.
In the above preparation apparatus, as shown in FIG. 2, the needle tube is mounted on a liquid-driven flow focusing device. For the liquid-driven flow focusing device, driving liquid flows through the round hole from the driving liquid inlet, shearing force is provided for micro-droplet phases introduced through the pipeline to form a stable cone, the micro-droplet phases further penetrate through the round hole to form a jet flow column, and liquid in the container flows out through the outlet.
In the preparation device, the needle tube is of a coaxial structure consisting of a nuclear phase needle tube and a shell phase needle tube, the coaxiality of the nuclear phase needle tube and the shell phase needle tube is centered through welding points, and three welding points randomly welded on the outer wall of the nuclear phase needle tube are in contact with the inner wall of the shell phase needle tube;
the piezoelectric stack, the insulating film and the base are arranged on the through hole in the side wall of the shell phase needle tube;
further comprising: and the other group of piezoelectric stacks, the insulating film and the base are arranged on the through hole in the side wall of the nuclear phase needle tube.
The embodiment of the invention also provides a micro-droplet active preparation method embedded with piezoelectric stack disturbance, which is characterized in that the micro-droplet active preparation device embedded with piezoelectric stack disturbance comprises the following steps:
and controlling the size and the generation frequency of the micro-droplets generated by the jet column crushing by controlling the driving voltage, the driving frequency or the driving waveform of the piezoelectric stack of the micro-droplet active preparation device.
In the above preparation method, used in coaxial flow focusing having a core-phase needle tube and a shell-phase needle tube, the core-phase needle tube and the shell-phase needle tube are connected by a rubber stopper, that is, a micro-droplet phase formed by such a needle tube may be constituted by a core phase and a shell phase, the method comprising: two groups of micro-droplet active preparation devices embedded in piezoelectric stack disturbance are respectively arranged on a nuclear phase needle tube and a shell phase needle tube, and the size and the generation frequency of micro-droplets generated by jet column crushing are controlled by respectively controlling the driving voltage, the driving frequency or the driving waveform of the piezoelectric stacks of the micro-droplet active preparation devices.
In the preparation method, the coaxiality of the nuclear phase needle tube and the shell phase needle tube is centered through the welding points, and the three welding points randomly welded on the outer wall of the nuclear phase needle tube are in contact with the inner wall of the shell phase needle tube.
According to the preparation device disclosed by the invention, when the electric stack is not pressurized to be disturbed, the jet flow column is prolonged under a liquid environment and is further broken due to surface tension, the size of broken liquid drops can be controlled only according to flow, the response time is long, usually several seconds, and the generated droplets are uneven in size and are often accompanied with the appearance of satellite liquid drops; when the electric stack is pressurized to be disturbed, vibration energy is transmitted to fluid in the pipeline through the insulating film, the vibration energy achieves the disturbing effect in the process of forming the cone and the jet column.
The embodiments of the present invention are described in further detail below.
As shown in fig. 1, the present embodiment provides a micro-droplet active preparation device embedded with perturbation of piezoelectric stack, which is mainly embedded into a flow focusing pipe 6 by a vibrating piezoelectric stack 5 through a through hole 3 on a needle tube 1, wherein the piezoelectric stack 5 is bonded to the needle tube 1 through a base 4 at one end, and contacts fluid in the pipe 6 through an insulating film 2 at the other end.
As shown in fig. 2, for the liquid-driven flow focusing device, the driving liquid flows through the circular hole 12 from the driving liquid inlet 13, the shearing force is provided to the micro-droplet phase 7 introduced from the pipeline 6 to form a stable cone 8, the micro-droplet phase 7 further passes through the circular hole 12 to form a jet column 9, and the liquid in the container 11 flows out through the outlet 10.
When the electric stack 5 is not pressurized to be disturbed, the jet liquid column 9 is broken due to surface tension under the liquid environment, the size of the broken liquid drop can only be controlled according to the flow, the response time is long and is usually a few seconds, and the generated micro-drop is not uniform in size and is often accompanied by the occurrence of satellite liquid drops; when the electric stack 5 is pressurized to be disturbed, vibration energy is transmitted to fluid in the pipeline 6 through the insulating film 2, and the vibration energy achieves the disturbing effect in the process of forming the cone 8 and the jet column 9.
As shown in fig. 3, the perturbation of the embedded piezoelectric stack can also be used in coaxial flow focusing, the core phase needle tube 15 and the shell phase needle tube 16 are connected through the rubber plug 14, that is, the micro-droplet phase 7 can be formed by a core phase and a shell phase, so as to form a jet column with a core-shell structure, and the perturbation of the piezoelectric stack forms micro-droplets with the core-shell structure.
As shown in FIG. 4, the coaxiality of the nuclear phase needle tube 15 and the shell phase needle tube 16 is centered through the welding points 19, and the three welding points 19 randomly welded on the outer wall 17 of the nuclear phase needle tube are in contact with the inner wall 18 of the shell phase needle tube to form a precise automatic coaxial structure, which is beneficial to forming a stable coaxial cone.
Aiming at the liquid-driven flow focusing device, the invention introduces the vibration energy of the piezoelectric stack before the jet flow column is formed, and prepares micro-droplets with required size and generation frequency by active control.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.

Claims (6)

1. An active micro-droplet preparation device embedded in perturbation of a piezoelectric stack, comprising:
a set of piezoelectric stacks, insulating films, and pedestals; wherein the content of the first and second substances,
the front end of the piezoelectric stack is embedded into a through hole in the side wall of the needle tube provided with the insulating film and is in contact with fluid in the pipeline through the insulating film;
the rear end of the piezoelectric stack is connected with the base, and the base is arranged on the outer wall of the needle tube;
the needle tube is arranged on the liquid-driven flowing focusing device;
the needle tube is of a coaxial structure consisting of a nuclear phase needle tube and a shell phase needle tube, the coaxiality of the nuclear phase needle tube and the shell phase needle tube is centered through welding points, and three welding points randomly welded on the outer wall of the nuclear phase needle tube are in contact with the inner wall of the shell phase needle tube;
the group of piezoelectric stacks, the insulating film and the base are arranged on the through hole in the side wall of the shell phase needle tube;
further comprising: and the other group of piezoelectric stacks, the insulating film and the base are arranged on the through hole in the side wall of the nuclear phase needle tube.
2. The device for actively preparing microdroplets embedded in perturbation of a piezoelectric stack as claimed in claim 1, wherein the insulating film arranged on the shell-phase needle tube is embedded in the through hole arranged on the side wall of the shell-phase needle tube to block the fluid in the pipeline from the front end of the piezoelectric stack arranged on the shell-phase needle tube.
3. The active micro-droplet generation device with embedded piezoelectric stack perturbation as claimed in claim 1 or 2, wherein the lateral dimension of the base arranged on the shell phase needle tube is larger than the diameter of the through hole on the side wall of the shell phase needle tube.
4. A method for actively preparing micro-droplets embedded with perturbation of a piezoelectric stack, which is characterized by adopting the device for actively preparing micro-droplets embedded with perturbation of a piezoelectric stack according to any one of claims 1 to 3, and comprises the following steps:
the size and the generation frequency of micro-droplets generated by the broken jet column are controlled by controlling the driving voltage, the driving frequency or the driving waveform of a piezoelectric stack arranged on a shell-phase needle tube of a micro-droplet active preparation device, wherein the driving voltage is less than the breakdown voltage of the piezoelectric stack arranged on the shell-phase needle tube, and the driving waveform is any one of sine waves, square waves or sawtooth waves.
5. The method for actively preparing micro-droplets disturbed by embedded piezoelectric stacks according to claim 4, which is used in coaxial flow focusing with a nuclear phase needle tube and a shell phase needle tube, wherein the nuclear phase needle tube and the shell phase needle tube are connected through a rubber plug, and the method comprises the following steps: two groups of piezoelectric stacks, insulating films and bases are adopted, one group of piezoelectric stacks, insulating films and bases are arranged on a nuclear phase needle tube, the other group of piezoelectric stacks, insulating films and bases are arranged on a shell phase needle tube, and the size and the generation frequency of micro-droplets generated by the broken jet column are controlled by respectively controlling the driving voltage, the driving frequency or the driving waveform of the piezoelectric stacks arranged on the shell phase needle tube and the nuclear phase needle tube.
6. The method for actively preparing micro-droplets by disturbance of an embedded piezoelectric stack according to claim 5, wherein the coaxiality of the nuclear phase needle tube and the shell phase needle tube is centered by welding points, and three welding points randomly welded on the outer wall of the nuclear phase needle tube are in contact with the inner wall of the shell phase needle tube.
CN201710370198.6A 2017-05-23 2017-05-23 Micro-droplet active preparation device and method embedded with piezoelectric stack disturbance Active CN107013440B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710370198.6A CN107013440B (en) 2017-05-23 2017-05-23 Micro-droplet active preparation device and method embedded with piezoelectric stack disturbance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710370198.6A CN107013440B (en) 2017-05-23 2017-05-23 Micro-droplet active preparation device and method embedded with piezoelectric stack disturbance

Publications (2)

Publication Number Publication Date
CN107013440A CN107013440A (en) 2017-08-04
CN107013440B true CN107013440B (en) 2020-06-26

Family

ID=59450788

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710370198.6A Active CN107013440B (en) 2017-05-23 2017-05-23 Micro-droplet active preparation device and method embedded with piezoelectric stack disturbance

Country Status (1)

Country Link
CN (1) CN107013440B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108940145B (en) * 2018-09-20 2024-02-23 中国科学技术大学 Mixed pesticide microcapsule mixes preparation facilities
CN111821913A (en) * 2020-08-19 2020-10-27 中国科学技术大学 Device and method for preparing uniform double emulsion drops in high flux
CN111841439A (en) * 2020-08-19 2020-10-30 中国科学技术大学 Device and method for preparing uniform single emulsion drops in high flux
CN112406096B (en) * 2020-11-23 2022-02-15 华中科技大学 Active wettability adjusting device and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09126136A (en) * 1995-11-07 1997-05-13 Citizen Watch Co Ltd Method of discharging fluid and device therefor
CN204870075U (en) * 2015-06-18 2015-12-16 北京派和科技股份有限公司 Liquid drop of extrusion formula piezoceramics actuator disk sprays unit and injection apparatus
CN105579829A (en) * 2013-08-16 2016-05-11 生物辐射实验室股份有限公司 Timing and/or phase adjustment of the separation and/or charging of drops from a fluid stream in a flow cytometer
CN106687221A (en) * 2014-07-25 2017-05-17 拜奥多特公司 Piezoelectric dispenser with a longitudinal transducer and replaceable capillary tube
CN206785601U (en) * 2017-05-23 2017-12-22 中国科学技术大学 The microlayer model active preparation facilities of embedded piezoelectric stack disturbance

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105414084A (en) * 2015-12-10 2016-03-23 北京七星华创电子股份有限公司 Ultrasonic or mega-sonic oscillatory two-phase-flow atomization washing device and ultrasonic or mega-sonic oscillatory two-phase-flow atomization washing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09126136A (en) * 1995-11-07 1997-05-13 Citizen Watch Co Ltd Method of discharging fluid and device therefor
CN105579829A (en) * 2013-08-16 2016-05-11 生物辐射实验室股份有限公司 Timing and/or phase adjustment of the separation and/or charging of drops from a fluid stream in a flow cytometer
CN106687221A (en) * 2014-07-25 2017-05-17 拜奥多特公司 Piezoelectric dispenser with a longitudinal transducer and replaceable capillary tube
CN204870075U (en) * 2015-06-18 2015-12-16 北京派和科技股份有限公司 Liquid drop of extrusion formula piezoceramics actuator disk sprays unit and injection apparatus
CN206785601U (en) * 2017-05-23 2017-12-22 中国科学技术大学 The microlayer model active preparation facilities of embedded piezoelectric stack disturbance

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
20μm单微液滴的产生和特性研究;李汉明;《物理学报》;20071015;第56卷(第10期);第5926-5927页 *

Also Published As

Publication number Publication date
CN107013440A (en) 2017-08-04

Similar Documents

Publication Publication Date Title
CN107013440B (en) Micro-droplet active preparation device and method embedded with piezoelectric stack disturbance
Chong et al. Active droplet generation in microfluidics
CN107070293A (en) The microlayer model active preparation facilities and method disturbed based on piezoelectricity singing piece
US11559809B2 (en) Enhanced cell/bead encapsulation methods and apparatuses
Lu et al. Nozzle and needle during high viscosity adhesive jetting based on piezoelectric jet dispensing
Tang et al. High-throughput, off-chip microdroplet generator enabled by a spinning conical frustum
CN105688721A (en) Micro-fluidic chip for generating spherical microbubbles
CN107029640B (en) Micro-droplet active preparation device and method based on liquid-driven flow focusing jet disturbance
CN206935332U (en) The microlayer model active preparation facilities of flow focusing jet disturbing type is driven based on liquid
CN108499500A (en) A method of vibration pipeline control flow focusing type micro-fluidic chip generates microlayer model
CN107100831A (en) The microlayer model active preparation facilities and method disturbed based on piezoelectric circular
Iwasa et al. Controlled generation of double emulsions for laser fusion target fabrication using a glass capillary microfluidic device
CN206785601U (en) The microlayer model active preparation facilities of embedded piezoelectric stack disturbance
US10385893B2 (en) Electropermanent magnet activated microfluidic droplet size modulation
CN206790371U (en) Microlayer model active preparation facilities based on piezoelectricity singing piece disturbance
Pan et al. Droplets containing large solid particle inside formation and breakup dynamics in a flow-focusing microfluidic device
CN105413546A (en) Micro-fluidic mixing process and device
Hou et al. Research on a large power thermal bubble micro-ejector with induction heating
AU2020380721B2 (en) Droplet deformation-based method of transferring material into cells and chip for same
CN207212639U (en) Microlayer model active preparation facilities based on piezoelectric circular disturbance
CN101855088A (en) Droplet break-up device
CN208161617U (en) A kind of controllable microlayer model generating means
CN202983712U (en) Controllable constant-speed solution adding device
CN112547150A (en) Device for preparing micro-droplets and method for preparing chitosan microspheres
Zhang et al. Self-Sustained Coalescence–Breakup Cycles of Ferrodrops under a Magnetic Field

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB03 Change of inventor or designer information

Inventor after: Si Ting

Inventor after: Huang Fangsheng

Inventor after: Wu Qiang

Inventor after: Zhu Zhiqiang

Inventor after: Yang Chaoyu

Inventor before: Si Ting

Inventor before: Huang Fangsheng

Inventor before: Wu Qiang

Inventor before: Zhu Zhiqiang

Inventor before: Yang Chaoyu

Inventor before: Xu Xiaorong

CB03 Change of inventor or designer information
GR01 Patent grant
GR01 Patent grant