CN106977685A - 一种湿式硬质精抛轮抛光材料及其制备方法 - Google Patents
一种湿式硬质精抛轮抛光材料及其制备方法 Download PDFInfo
- Publication number
- CN106977685A CN106977685A CN201710255763.4A CN201710255763A CN106977685A CN 106977685 A CN106977685 A CN 106977685A CN 201710255763 A CN201710255763 A CN 201710255763A CN 106977685 A CN106977685 A CN 106977685A
- Authority
- CN
- China
- Prior art keywords
- parts
- wet type
- type hard
- polishing wheel
- precision polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/48—Polyethers
- C08G18/4804—Two or more polyethers of different physical or chemical nature
- C08G18/4812—Mixtures of polyetherdiols with polyetherpolyols having at least three hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
- C08G18/12—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step using two or more compounds having active hydrogen in the first polymerisation step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/04—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent
- C08J9/06—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a chemical blowing agent
- C08J9/08—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a chemical blowing agent developing carbon dioxide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/04—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent
- C08J9/12—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent
- C08J9/14—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent organic
- C08J9/141—Hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2101/00—Manufacture of cellular products
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2203/00—Foams characterized by the expanding agent
- C08J2203/02—CO2-releasing, e.g. NaHCO3 and citric acid
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2203/00—Foams characterized by the expanding agent
- C08J2203/14—Saturated hydrocarbons, e.g. butane; Unspecified hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2203/00—Foams characterized by the expanding agent
- C08J2203/18—Binary blends of expanding agents
- C08J2203/184—Binary blends of expanding agents of chemical foaming agent and physical blowing agent, e.g. azodicarbonamide and fluorocarbon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2375/00—Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
- C08J2375/04—Polyurethanes
- C08J2375/08—Polyurethanes from polyethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/221—Oxides; Hydroxides of metals of rare earth metal
- C08K2003/2213—Oxides; Hydroxides of metals of rare earth metal of cerium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2244—Oxides; Hydroxides of metals of zirconium
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
本发明涉及一种湿式硬质精抛轮抛光材料,包括以下重量份的组分:聚醚多元醇90~100份、多异氰酸酯40~60份、磨料30~40份、偶联剂6~10份、扩链剂8~10份、发泡剂3~6份、催化剂0.1~0.5份和水1~2份。本发明通过两步法,先分别制备聚氨酯预聚体和改性磨料,然后将两者混合进行发泡反应,避免了一次性集中反应严重放热导致的泡孔分布差异大、抛光材料性质变脆的问题,本发明制得的湿式硬质精抛轮抛光材料的泡孔分布均匀,且质地柔软有弹性,能实现物体细小间隙打磨,增加磨料与工件的接触面积,提高磨削效率,同时具有良好的散热性。
Description
技术领域
本发明涉及磨削抛光技术领域,特别是涉及一种湿式硬质精抛轮抛光材料及其制备方法。
背景技术
砂纸等片状柔性基体的抛光研磨材料由于形状不固定,通常只能手工抛光或者用手动工具进行抛光,而且片状抛光研磨材料散热不良,摩擦产生的热量可能会导致抛光产品灼伤变色而影响整体抛光效果。现有的抛光材料在一定程度上可以减少摩擦热量,但是其一般体积都比较大,在用手握持的时候使用不方便,而且握持时需要挤压抛光材料形状,使抛光面与工件之间的接触面积变小,抛光材料无法得到有效利用。
发明内容
基于此,本发明的目的在于,提供一种湿式硬质精抛轮抛光材料及其制备方法,通过本发明制得的湿式硬质精抛轮抛光材料在打磨过程中能实现物体细小间隙打磨,增加磨料与工件的接触面积,提高磨削效率。
本发明的目的是通过以下技术方案实现的:
一种湿式硬质精抛轮抛光材料,包括以下重量份的组分:聚醚多元醇90~100份、多异氰酸酯40~60份、磨料30~40份、偶联剂6~10份、扩链剂8~10份、发泡剂3~6份、催化剂0.1~0.5份和水1~2份。
相对于现有技术,本发明采用聚醚多元醇与多异氰酸酯合成的聚氨酯材料具有微孔结构,且质地柔软有弹性,有利于磨料分散其中,增加磨料与工件的接触面积;并且通过偶联剂对磨料表面进行改性,使得磨料更容易与聚氨酯材料复合,从而提高抛光材料的抛光性能。
进一步,所述聚醚多元醇为分子量2000~3000的聚醚二元醇和分子量500~1000的聚醚三元醇的混合物,且所述聚醚二元醇和聚醚三元醇的摩尔比为2:1~2.5:1。聚醚二元醇和聚醚三元醇分子量低、含有活泼基团,混合后根据所含不同活性原子的数目可制得不同官能度的聚醚多元醇,控制聚醚二元醇和聚醚三元醇的摩尔比为2:1~2.5:1,能兼顾合成材料低粘度、高韧性的性能。
进一步,所述聚醚多元醇的官能度为2~5。官能度过小,则参与化学反应的基团数目少,交联度不够,导致合成材料较软,抛光效果差;官能度过大,则导致合成材料的硬度和脆性过大,抛光时易造成工件表面划伤。
进一步,所述磨料为碳化硅、氧化铈或氧化锆,所述磨料的粒径为1~5μm。碳化硅、氧化铈和氧化锆由于良好的耐磨性、导热性和化学稳定性,适于用作磨料;磨料的粒径大小会影响抛光效果,若磨料粒径小于1μm,颗粒较小,切削作用下降,抛光效率低;若磨料粒径大于5μm,颗粒较大,抛光时易造成工件表面划伤。
进一步,所述多异氰酸酯为甲苯二异氰酸酯、二苯基甲烷二异氰酸酯、三苯基甲烷三异氰酸酯中的一种或两种。甲苯二异氰酸酯、二苯基甲烷二异氰酸酯和三苯基甲烷三异氰酸酯中的NCO基团易与多元醇的OH基团作用,生成带有NCO端基的聚氨酯预聚体。
进一步,所述偶联剂为硅烷偶联剂或钛酸酯偶联剂。硅烷偶联剂和钛酸酯偶联剂含有两种不同化学性质的反应基团,能够同时和无机质材料、有机质材料进行化学结合,因此用于表面处理,可提高聚氨酯材料与磨料的复合性能,有利于将磨料分散于聚氨酯中,增加磨料与工件的接触面积。
进一步,所述扩链剂为丙三醇或乙二胺。丙三醇和乙二胺含有活性氢,带有NCO端基的聚氨酯预聚体与丙三醇和乙二胺反应,可以拓展分子链,增加分子量,提高聚氨酯的力学性能。
进一步,所述发泡剂为正戊烷、异丁烷、四氢呋喃或二氯二氟甲烷。正戊烷、异丁烷、四氢呋喃和二氯二氟甲烷具有较高的表面活性,经加热分解后能释放出气体,并在聚氨酯中形成细孔,增加吸附能力。
进一步,所述催化剂为辛酸亚锡、油酸亚锡或二月桂酸二丁基锡的一种或两种。辛酸亚锡、油酸亚锡和二月桂酸二丁基锡的活性高,极易被氧化,能够促进聚氨酯合成。
一种所述湿式硬质精抛轮抛光材料的制备方法,包括以下步骤:
S1:将聚醚多元醇与多异氰酸酯混合,在60~90℃下反应3~5h,制得聚氨酯预聚体;
S2:将磨料与偶联剂混合,在100~200℃下反应1~2h,制得改性磨料;
S3:将步骤S1所得聚氨酯预聚体与步骤S2所得改性磨料混合均匀浇入模具,并加入扩链剂、发泡剂、催化剂和水进行发泡,在100~150℃下反应2~3h,冷却后即得所述湿式硬质精抛轮抛光材料。
相对于现有技术,本发明的制备方法具有如下有益效果:
(1)通过两步法,先分别制备聚氨酯预聚体和改性磨料,然后将两者混合进行发泡反应,避免了一次性集中反应严重放热导致的泡孔分布差异大、抛光材料性质变脆的问题;
(2)通过聚醚多元醇和多异氰酸酯的预聚反应,并控制反应温度和反应速度,制得的聚氨酯质地柔软有弹性,泡孔分布均匀,有利于磨料均匀分散其中,增加磨料与工件的接触面积,实现物体细小间隙打磨,同时增大散热面积,提高散热性;
(3)通过偶联剂对磨料表面进行改性,使得磨料更容易与聚氨酯复合,大大提高磨削锋利度和磨削效率,改善抛光材料的抛光性能,同时有效降低研磨抛光的工作强度。
为了更好地理解和实施,下面详细说明本发明。
具体实施方式
本发明公开了一种湿式硬质精抛轮抛光材料,包括以下重量份的组分:聚醚多元醇90~100份、多异氰酸酯40~60份、磨料30~40份、偶联剂6~10份、扩链剂8~10份、发泡剂3~6份、催化剂0.1~0.5份和水1~2份。
具体的,所述聚醚多元醇为分子量2000~3000的聚醚二元醇和分子量500~1000的聚醚三元醇的混合物,且所述聚醚二元醇和聚醚三元醇的摩尔比为2:1~2.5:1。
具体的,所述聚醚多元醇的官能度为2~5。
具体的,所述磨料为碳化硅、氧化铈或氧化锆,所述磨料的粒径为1~5μm。
具体的,所述多异氰酸酯为甲苯二异氰酸酯、二苯基甲烷二异氰酸酯、三苯基甲烷三异氰酸酯中的一种或两种。
具体的,所述偶联剂为硅烷偶联剂或钛酸酯偶联剂。
具体的,所述扩链剂为丙三醇或乙二胺。
具体的,所述发泡剂为正戊烷、异丁烷、四氢呋喃或二氯二氟甲烷。
具体的,所述催化剂为辛酸亚锡、油酸亚锡或二月桂酸二丁基锡的一种或两种。
本发明还公开了一种一种湿式硬质精抛轮抛光材料的制备方法,包括以下步骤:
S1:将聚醚多元醇与多异氰酸酯混合,在60~90℃下反应3~5h,制得聚氨酯预聚体;
S2:将磨料与偶联剂混合,在100~200℃下反应1~2h,制得改性磨料;
S3:将步骤S1所得聚氨酯预聚体与步骤S2所得改性磨料混合均匀浇入模具,并加入扩链剂、发泡剂、催化剂和水进行发泡,在100~150℃下反应2~3h,冷却后即得所述湿式硬质精抛轮抛光材料。
实施例1
本实施例的湿式硬质精抛轮抛光材料,包括以下重量份的原料:聚醚多元醇100份、甲苯二异氰酸酯60份、碳化硅40份、硅烷偶联剂10份、丙三醇10份、正戊烷5份、辛酸亚锡0.5份、水1份。其中,所述聚醚多元醇为分子量2000的聚醚二元醇和分子量500的聚醚三元醇以2:1的摩尔比混合所得的混合物;所述聚醚多元醇的官能度为3;所述碳化硅的粒径为1μm。
所述湿式硬质精抛轮材料的制备方法,包括以下步骤:
(1)按摩尔比为2:1取分子量2000的聚醚二元醇和分子量500的聚醚三元醇,置于反应容器中搅拌混合均匀,制得聚醚多元醇。
(2)取步骤(1)所得聚醚多元醇100g与甲苯二异氰酸酯60g,加入到反应釜中混合,并通入氮气,在90℃下反应3h,制得聚氨酯预聚体。
(3)取碳化硅40g置于研磨机中研磨,得到平均粒径为1μm的碳化硅微粒,然后将所得碳化硅微粒与硅烷偶联剂10g加入到密炼机中混合,在100℃下反应2h,制得改性碳化硅。
(4)将步骤(2)所得聚氨酯预聚体与步骤(3)所得改性碳化硅混合均匀浇入金属模具,并加入丙三醇10g、正戊烷5g、辛酸亚锡0.5g和水1g进行发泡,在100℃下反应3h,冷却后即得所述湿式硬质精抛轮抛光材料。
实施例2
本实施例的湿式硬质精抛轮抛光材料,包括以下重量份的原料:聚醚多元醇90份、二苯基甲烷二异氰酸酯40份、碳化硅30份、硅烷偶联剂6份、乙二胺8份、四氢呋喃3份、二月桂酸二丁基锡0.1份、水2份。其中,所述聚醚多元醇为分子量3000的聚醚二元醇和分子量1000的聚醚三元醇以2.5:1的摩尔比混合所得的混合物;所述聚醚多元醇的官能度为5;所述碳化硅的粒径为2μm。
所述湿式硬质精抛轮抛光材料的制备方法,包括以下步骤:
(1)按摩尔比为2.5:1取分子量3000的聚醚二元醇和分子量1000的聚醚三元醇,置于反应容器中搅拌混合均匀,制得聚醚多元醇。
(2)取步骤(1)所得聚醚多元醇90g与二苯基甲烷二异氰酸酯40g加入到反应釜中混合,并通入氮气,在60℃下反应5h,制得聚氨酯预聚体。
(3)取碳化硅30g置于研磨机中研磨,得到平均粒径为2μm的碳化硅微粒,然后将所得碳化硅微粒与硅烷偶联剂6g加入到密炼机中混合,在200℃下反应1h,制得改性碳化硅。
(4)将步骤(2)所得聚氨酯预聚体与步骤(3)所得改性碳化硅混合均匀浇入金属模具,并加入乙二胺8g、四氢呋喃3g、二月桂酸二丁基锡0.1g和水2g进行发泡,在150℃下反应2h,冷却后即得所述湿式硬质精抛轮抛光材料。
相对于现有技术,本发明采用聚醚多元醇和多异氰酸酯制备得到的聚氨酯材料具有微孔结构,且质地柔软有弹性,有利于磨料分散其中,增加磨料与工件的接触面积;并且通过偶联剂对磨料表面进行改性,使得磨料更容易与聚氨酯材料复合,从而提高抛光材料的抛光性能。本发明通过两步法,先分别制备聚氨酯预聚体和改性磨料,然后将两者混合进行发泡反应,避免了一次性集中反应严重放热导致的泡孔分布差异大、抛光材料性质变脆的问题,本发明制得的湿式硬质精抛轮抛光材料的泡孔分布均匀,且质地柔软有弹性,能实现物体细小间隙打磨,增加磨料与工件的接触面积,提高磨削效率,同时具有良好的散热性。
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。
Claims (10)
1.一种湿式硬质精抛轮抛光材料,其特征在于:包括以下重量份的组分:聚醚多元醇90~100份、多异氰酸酯40~60份、磨料30~40份、偶联剂6~10份、扩链剂8~10份、发泡剂3~6份、催化剂0.1~0.5份和水1~2份。
2.根据权利要求1所述的湿式硬质精抛轮抛光材料,其特征在于:所述聚醚多元醇为分子量2000~3000的聚醚二元醇和分子量500~1000的聚醚三元醇的混合物,且所述聚醚二元醇和聚醚三元醇的摩尔比为2:1~2.5:1。
3.根据权利要求2所述的湿式硬质精抛轮抛光材料,其特征在于:所述聚醚多元醇的官能度为2~5。
4.根据权利要求1所述的湿式硬质精抛轮抛光材料,其特征在于:所述磨料为碳化硅、氧化铈或氧化锆,所述磨料的粒径为1~5μm。
5.根据权利要求1所述的湿式硬质精抛轮抛光材料,其特征在于:所述多异氰酸酯为甲苯二异氰酸酯、二苯基甲烷二异氰酸酯、三苯基甲烷三异氰酸酯中的一种或两种。
6.根据权利要求1所述的湿式硬质精抛轮抛光材料,其特征在于:所述偶联剂为硅烷偶联剂或钛酸酯偶联剂。
7.根据权利要求1所述的湿式硬质精抛轮抛光材料,其特征在于:所述扩链剂为丙三醇或乙二胺。
8.根据权利要求1所述的湿式硬质精抛轮抛光材料,其特征在于:所述发泡剂为正戊烷、异丁烷、四氢呋喃或二氯二氟甲烷。
9.根据权利要求1所述的湿式硬质精抛轮抛光材料,其特征在于:所述催化剂为辛酸亚锡、油酸亚锡或二月桂酸二丁基锡的一种或两种。
10.权利要求1~9中的任一权利要求所述的湿式硬质精抛轮抛光材料的制备方法,其特征在于:包括以下步骤:
S1:将聚醚多元醇与多异氰酸酯混合,在60~90℃下反应3~5h,制得聚氨酯预聚体;
S2:将磨料与偶联剂混合,在100~200℃下反应1~2h,制得改性磨料;
S3:将步骤S1所得聚氨酯预聚体与步骤S2所得改性磨料混合均匀浇入模具,并加入扩链剂、发泡剂、催化剂和水进行发泡,在100~150℃下反应2~3h,冷却后即得所述湿式硬质精抛轮抛光材料。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710255763.4A CN106977685A (zh) | 2017-04-19 | 2017-04-19 | 一种湿式硬质精抛轮抛光材料及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710255763.4A CN106977685A (zh) | 2017-04-19 | 2017-04-19 | 一种湿式硬质精抛轮抛光材料及其制备方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN106977685A true CN106977685A (zh) | 2017-07-25 |
Family
ID=59345636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710255763.4A Pending CN106977685A (zh) | 2017-04-19 | 2017-04-19 | 一种湿式硬质精抛轮抛光材料及其制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106977685A (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109517527A (zh) * | 2018-12-04 | 2019-03-26 | 长春安旨科技有限公司 | 一种耐磨抛光材料 |
CN109679326A (zh) * | 2018-12-04 | 2019-04-26 | 长春安旨科技有限公司 | 一种光学抛光材料 |
CN111533870A (zh) * | 2020-04-15 | 2020-08-14 | 上海抚佳精细化工有限公司 | 一种双组份聚氨酯结合剂及应用其的砂轮 |
CN113787468A (zh) * | 2021-09-15 | 2021-12-14 | 王文婷 | 一种聚氨酯基体耐磨石材抛光材料及其制备方法 |
CN115572577A (zh) * | 2022-01-27 | 2023-01-06 | 淄博理研泰山涂附磨具有限公司 | 一种高流动性磨料及其制备方法 |
CN117024701A (zh) * | 2023-08-14 | 2023-11-10 | 旭川化学(苏州)有限公司 | 一种聚氨酯发泡抛光材料及其制备方法和应用 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1047093A (zh) * | 1990-06-13 | 1990-11-21 | 机械电子工业部济南第五三研究所 | 研磨用聚氨酯泡沫抛光片及其制造方法 |
CN101899207A (zh) * | 2010-06-12 | 2010-12-01 | 张海龙 | 一种聚氨酯抛光片的制作方法 |
CN102172901A (zh) * | 2011-01-26 | 2011-09-07 | 华南理工大学 | 一种不织布抛光磨具及其制备方法 |
-
2017
- 2017-04-19 CN CN201710255763.4A patent/CN106977685A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1047093A (zh) * | 1990-06-13 | 1990-11-21 | 机械电子工业部济南第五三研究所 | 研磨用聚氨酯泡沫抛光片及其制造方法 |
CN101899207A (zh) * | 2010-06-12 | 2010-12-01 | 张海龙 | 一种聚氨酯抛光片的制作方法 |
CN102172901A (zh) * | 2011-01-26 | 2011-09-07 | 华南理工大学 | 一种不织布抛光磨具及其制备方法 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109517527A (zh) * | 2018-12-04 | 2019-03-26 | 长春安旨科技有限公司 | 一种耐磨抛光材料 |
CN109679326A (zh) * | 2018-12-04 | 2019-04-26 | 长春安旨科技有限公司 | 一种光学抛光材料 |
CN111533870A (zh) * | 2020-04-15 | 2020-08-14 | 上海抚佳精细化工有限公司 | 一种双组份聚氨酯结合剂及应用其的砂轮 |
CN113787468A (zh) * | 2021-09-15 | 2021-12-14 | 王文婷 | 一种聚氨酯基体耐磨石材抛光材料及其制备方法 |
CN115572577A (zh) * | 2022-01-27 | 2023-01-06 | 淄博理研泰山涂附磨具有限公司 | 一种高流动性磨料及其制备方法 |
CN115572577B (zh) * | 2022-01-27 | 2024-02-27 | 淄博三共泰山涂附磨具有限公司 | 一种高流动性磨料及其制备方法 |
CN117024701A (zh) * | 2023-08-14 | 2023-11-10 | 旭川化学(苏州)有限公司 | 一种聚氨酯发泡抛光材料及其制备方法和应用 |
CN117024701B (zh) * | 2023-08-14 | 2024-04-09 | 旭川化学(苏州)有限公司 | 一种聚氨酯发泡抛光材料及其制备方法和应用 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106977685A (zh) | 一种湿式硬质精抛轮抛光材料及其制备方法 | |
US4613345A (en) | Fixed abrasive polishing media | |
EP1339531B1 (en) | Composite abrasive particles and method of manufacture | |
US7378454B2 (en) | Polyurethane composition and polishing pad | |
CN101039876B (zh) | 用于化学机械抛光的二氧化铈粉末的制备方法及使用该粉末制备化学机械抛光浆料的方法 | |
CN100406200C (zh) | 含有磨粒和聚合反应产物的磨具 | |
CN101642897B (zh) | 化学机械抛光垫 | |
JPS5959777A (ja) | 研摩研削材 | |
CN107553313A (zh) | 一种抛光垫、聚氨酯抛光层及其制备方法 | |
CN1628138A (zh) | 具有高硬度和极好的耐磨性的聚氨酯弹性体用组合物 | |
CN110385641A (zh) | 多孔性研磨垫及其制备方法 | |
EP2049304A1 (en) | Chemical mechanical polishing pads comprising liquid organic material core encapsulated in polymer shell and methods for producing the same | |
TWI291910B (en) | Abrasive articles with resin control additives | |
WO2002034469A1 (fr) | Outil de polissage et composition destinee a sa fabrication | |
CN110871404B (zh) | 用于抛光硬表面的抛光材料、包括所述材料的介质及其形成和使用方法 | |
JP2009531472A5 (zh) | ||
CN103958125A (zh) | 抛光垫 | |
CN108453619A (zh) | 蓝宝石衬底用减薄砂轮 | |
CN110465836B (zh) | 一种清水研磨抛光工艺 | |
EP0192047A2 (en) | Fixed abrasive polyurethane grinding media | |
CN101853671A (zh) | 磁盘用基板的制造方法 | |
JP6078631B2 (ja) | セルフコンディショニング研磨パッドおよびその作製方法 | |
Chen et al. | Structural regulation and polishing performance of dendritic mesoporous silica (D-mSiO2) supported with samarium-doped cerium oxide composites | |
CN108369908A (zh) | 双面研磨方法及双面研磨装置 | |
EP4098400A1 (en) | Polishing pad and method for preparing a semiconductor device using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170725 |