A kind of light etching ground glass and preparation method thereof
Technical field
The invention belongs to field of light industry technology, ground glass and preparation method thereof is etched more particularly, to a kind of light.
Background technology
Ground glass is called frosted glass, dark glass, is usually used in bathroom, the door and window and cut-off of office.The one of ground glass
Individual important feature is dim sense, and surface is fine and smooth, printing opacity is opaque, with good beautifying and decorating effect and artistic effect, due to
Its is impermeable to be regarded, and individual privacy can be protected to a certain extent.Ground glass be manually ground with ordinary plate glass, machinery
The method such as sandblasting or hydrofluoric acid etch will be surface-treated into even roughness surface and be made.Ground glass table obtained by hand lapping
Face is relatively rough.Though mechanical sandblasting can obtain more fine and smooth surface, the glass is set to be in because glass surface crystalline solid is destroyed
The glass effects of existing white.In addition, mechanical sandblasting will also tend to produce impression of the hand, it is difficult to adapt to high-grade house decoration and handled official business with high-grade
The requirement of furniture.
Glass is etched using hydrofluoric acid and is to try to retain glass surface crystalline solid, a kind of light etching frosted is realized
The important method of glass, it is excessively strong to the etching of glass yet with hydrofluoric acid, glass is etched using hydrofluoric acid
It is still the technical barrier for failing to break through always that method, which prepares light etching ground glass,.In addition, the by-product that hydrofluoric acid loses to glass
Thing, i.e. silicon tetrafluoride gas still fail effectively to be reclaimed.
The content of the invention
It is difficult to prepare for current light etching ground glass, the problem of silicon tetrafluoride gas fails effective reclaim, this hair
It is bright to provide a kind of light etching ground glass and preparation method thereof.
The present invention is realized by following technology:
A kind of light etches ground glass, and the reflecting rate of the light etching ground glass is 30%~80%, the light erosion
Carve the etching layer that there is ground glass thickness to be 50~200nm.
According to different purposes, the ground glass of 50~200nm thickness etching layers can be made in the present invention, and matte surface is fine and smooth,
Its reflecting rate is 30%~80%, and substantial amounts of crystalline solid is distributed with glass surface, forms a kind of light effect.It is of the invention obtained
Light etching ground glass give out the gloss of diamond under sunlight irradiation.
A kind of light etches the preparation method of ground glass, and this method comprises the following steps:
1) glass cleaning and drying:Glassware to be etched is cleaned and dried, it is stand-by;
2) pre-process:By step 1) obtained by glassware to be etched immersion alkaline aqueous solution in, dipping is finished, take out and with water
The alkaline aqueous solution of the glass article surface is washed away, is dried;
3) etching process:By step 2) in gained glassware to be etched immersion etching solution, etching is finished, and is taken out, is produced etching
Glassware first product;
4) post-process:By step 3) acid-base neutralization is carried out in gained etching glassware first product immersion cleaning fluid, acid-base neutralization is complete
Finish, after being eluted with water to the glass article surface, dry, produce light etching ground glass.
In the present invention, whether clean pretreatment, the etching process that will affect rear road of glass article surface cleaning.Hair
A person of good sense is cleaned under industrial cleaning agent auxiliary, the debris such as oil, the wax of glass surface is removed.
It is that plate glass is directly immersed in hydrofluoric acid etch liquid to complete traditionally to prepare ground glass using etching layer, erosion
Quarter, process was without directionality, it is difficult to larger amt and the crystalline solid of regular arrangement are formed on the surface of glass.With traditional glass
Glass hydrofluoric acid etching process is different, and invention increases one of pretreating process, the effect of the pretreating process is to utilize alkaline agent
Microcorrosion is carried out to the silica of glass surface, microcorrosion point is largely distributed in glass surface, in the effect of rear road etching solution
Under, microcorrosion point has obtained further reinforcement, and larger amt and the knot of regular arrangement are formed on the surface of glass so as to realize
Crystal.A large amount of formation of glass surface crystalline solid, make its reflecting rate be greatly improved, and form a kind of light effect.
Preferably, step 2) alkaline aqueous solution temperature be 50~60 DEG C, dip time be 5~30min.
Preferably, the alkaline aqueous solution be sodium hydrate aqueous solution that concentration is 200~400g/L or concentration be 150~
400g/L potassium hydroxide aqueous solution.
Preferably, the etching solution is mixed and is aged by the raw material of following parts by weight and formed:3~5 parts of hydrogen fluoride ammonia, sulfuric acid
3~5 parts of barium, 15~20 parts of hydrochloric acid, 10~15 parts of sulfuric acid, 80~120 parts of water, 10~30 parts of industrial alcohol, b-butyl ether 5~15
Part, 3~5 parts of tetrahydrofuran.
Traditionally, etching solution generally comprises the raw material of following parts by weight:8.5~12 parts of ammonium acid fluoride, ammonium sulfate 2.5~3
Part, 2.5~3 parts of potassium sulfate, 2.5~3 parts of calcirm-fluoride, 8.5~12 parts of sulfuric acid, 60~75 parts of water, in above raw material, hydrogen fluoride
Ammonium is main active ingredient.In the present invention, the ratio of inventor's reduction ammonium acid fluoride is carried out to pretreated glassware
Etching, larger crystalline solid is formed in glass surface by reducing etching speed.Ammonium acid fluoride is one to the etching reaction of glass
Individual nonequilibrium reaction.Along with etching reaction, there is substantial amounts of silicon tetrafluoride gas to produce and discharge.Silicon tetrafluoride gas is nothing
The gas of color, poisonous, irritant stink, easy deliquescence, can produce thick smoke mist in humid air, have great to environment, human body
Influence.In the present invention, inventor adds industrial alcohol, b-butyl ether and tetrahydrochysene furan through testing repeatedly especially in etching solution
Muttering realizes the recovery to most of ocratation, reduces the release of silicon tetrafluoride gas.In addition, ocratation is in etching solution
Presence also reduce etch-rate of the ammonium acid fluoride to glass, be also beneficial to the formation of glass surface crystalline solid.
Preferably, the time of ageing is 6~12 hours.
Preferably, hundred parts of specific concentrations of the quality of the hydrochloric acid are 31%~33%.
Preferably, the temperature of the etching solution is 10~35 DEG C, and the time of etching is 10~20min.
Preferably, the cleaning fluid is the sodium hydrate aqueous solution that concentration is 20~50g/L.
A kind of light etching ground glass disclosed by the invention and preparation method thereof, its advantage is:
(1) light etching ground glass matte surface of the present invention is fine and smooth, and its reflecting rate is 30%~80%, is dissipated under sunlight irradiation
Send the gloss of diamond;
(2) microcorrosion is carried out to the silica of glass surface using alkaline agent, microcorrosion point is largely distributed in glass surface, rear
In the presence of road etching solution, microcorrosion point has obtained further reinforcement, and larger amt is formed on the surface of glass so as to realize
And the crystalline solid of regular arrangement.A large amount of formation of glass surface crystalline solid, make glass surface reflecting rate be greatly improved, shape
Into a kind of light effect;
(3) industrial alcohol, b-butyl ether and tetrahydrofuran are added in etching solution realizes the recovery to most of ocratation, reduces
The release of silicon tetrafluoride gas, reduces the influence to environment, human body;
(4) making high yield rate, steady quality, saving of work and time, the technique of light of the present invention etching ground glass it is simple to operation,
There are granular sensation, tack-free print.
Brief description of the drawings
Fig. 1 is the light etching frosted glass effects figure of the present invention.
Embodiment
For the substantive content of the present invention is expanded on further, the embodiment to the present invention is described in detail below,
Specific embodiment described herein only to explain the present invention, is not intended to limit the present invention.
Embodiment 1
A kind of light etching ground glass of the present embodiment, its reflecting rate is about 80%, and etching layer thickness is about 200nm.This implementation
The light etching ground glass preparation process of example is as follows:
1) glass cleaning and drying:Utilize rectangle to be etched glass of the industry cleaning link agent solution (5wt%) to a length of 1m, a width of 1m
Glass product is cleaned, and is dried under the conditions of the glassware to be etched after cleaning then is placed in into 60 DEG C, stand-by;
2) pre-process:By step 1) obtained by glassware to be etched immersion temperature in 60 DEG C of sodium hydrate aqueous solution, hydrogen
The concentration of aqueous solution of sodium oxide is 400g/L, and dip time is 30min, and dipping is finished, and takes out and removes the glassware to wash
The sodium hydrate aqueous solution on surface, dries;
3) configuration of etching solution:Weigh and mixed fluoride hydrogen ammonia 5g, barium sulfate 5g, hydrochloric acid (hundred parts of specific concentrations of quality are 33%)
20g, sulfuric acid 15g, water 120g, industrial alcohol 30g, b-butyl ether 15g and tetrahydrofuran 5g, mixing are aged 12 hours after room temperature
After use;
4) etching process:By step 2) gained glassware to be etched immersion step 3) in the etching solution that is configured, etching solution
Temperature is 35 DEG C, and the time of etching is 20min, and etching is finished, and is taken out, and produces etching glassware first product;
5) post-process:By step 4) gained etching glassware first product immersion concentration is enters in 50g/L sodium hydrate aqueous solution
Row acid-base neutralization, acid-base neutralization is finished, and after being eluted with water to the glass article surface, is dried, and produces light etching frosted
Glass.
A kind of light etching ground glass obtained by the present embodiment is as shown in figure 1, light etching ground glass surface
Frosted it is uniform and smooth it is fine and smooth, have granular sensation, tack-free print, the gloss of diamond is given out under sunlight irradiation.
Embodiment 2
A kind of light etching ground glass of the present embodiment, its reflecting rate is about 30%, and etching layer thickness is about 50nm.The present embodiment
Light etching ground glass preparation process it is as follows:
1) glass cleaning and drying:Utilize rectangle to be etched glass of the industry cleaning link agent solution (5wt%) to a length of 1m, a width of 1m
Glass product is cleaned, and is dried under the conditions of the glassware to be etched after cleaning then is placed in into 60 DEG C, stand-by;
2) pre-process:By step 1) obtained by glassware to be etched immersion temperature in 50 DEG C of potassium hydroxide aqueous solution, hydrogen
The concentration for aoxidizing aqueous solutions of potassium is 150g/L, and dip time is 5min, and dipping is finished, and takes out and removes the glassware table to wash
The potassium hydroxide aqueous solution in face, dries;
3) configuration of etching solution:Weigh and mixed fluoride hydrogen ammonia 3g, barium sulfate 3g, hydrochloric acid (hundred parts of specific concentrations of quality are 31%)
15g, sulfuric acid 10g, water 80g, industrial alcohol 10g, b-butyl ether 5g and tetrahydrofuran 3g, mixing is after room temperature is aged 6 hours
Use;
4) etching process:By step 2) gained glassware to be etched immersion step 3) in the etching solution that is configured, etching solution
Temperature is 10 DEG C, and the time of etching is 10min, and etching is finished, and is taken out, and produces etching glassware first product;
5) post-process:By step 4) gained etching glassware first product immersion concentration is enters in 20g/L sodium hydrate aqueous solution
Row acid-base neutralization, acid-base neutralization is finished, and after being eluted with water to the glass article surface, is dried, and produces light etching frosted
Glass.
Embodiment 3
A kind of light etching ground glass of the present embodiment, its reflecting rate is about 55%, and etching layer thickness is about 121nm.This implementation
The light etching ground glass preparation process of example is as follows:
1) glass cleaning and drying:Utilize rectangle to be etched glass of the industry cleaning link agent solution (5wt%) to a length of 1m, a width of 1m
Glass product is cleaned, and is dried under the conditions of the glassware to be etched after cleaning then is placed in into 60 DEG C, stand-by;
2) pre-process:By step 1) obtained by glassware to be etched immersion temperature in 55 DEG C of potassium hydroxide aqueous solution, hydrogen
The concentration for aoxidizing aqueous solutions of potassium is 250g/L, and dip time is 15min, and dipping is finished, and takes out and removes the glassware to wash
The potassium hydroxide aqueous solution on surface, dries;
3) configuration of etching solution:Weigh and mixed fluoride hydrogen ammonia 4g, barium sulfate 4g, hydrochloric acid (hundred parts of specific concentrations of quality are 32%)
17g, sulfuric acid 12g, water 100g, industrial alcohol 20g, b-butyl ether 10g and tetrahydrofuran 4g, mixing are aged 8 hours after room temperature
After use;
4) etching process:By step 2) gained glassware to be etched immersion step 3) in the etching solution that is configured, etching solution
Temperature is 20 DEG C, and the time of etching is 15min, and etching is finished, and is taken out, and produces etching glassware first product;
5) post-process:By step 4) gained etching glassware first product immersion concentration is enters in 40g/L sodium hydrate aqueous solution
Row acid-base neutralization, acid-base neutralization is finished, and after being eluted with water to the glass article surface, is dried, and produces light etching frosted
Glass.
Embodiment 4
A kind of light etching ground glass of the present embodiment, its reflecting rate is about 74%, and etching layer thickness is about 153nm.This implementation
The light etching ground glass preparation process of example is as follows:
1) glass cleaning and drying:Utilize rectangle to be etched glass of the industry cleaning link agent solution (5wt%) to a length of 1m, a width of 1m
Glass product is cleaned, and is dried under the conditions of the glassware to be etched after cleaning then is placed in into 60 DEG C, stand-by;
2) pre-process:By step 1) obtained by glassware to be etched immersion temperature in 58 DEG C of sodium hydrate aqueous solution, hydrogen
The concentration of aqueous solution of sodium oxide is 350g/L, and dip time is 25min, and dipping is finished, and takes out and removes the glassware to wash
The sodium hydrate aqueous solution on surface, dries;
3) configuration of etching solution:Weigh and mixed fluoride hydrogen ammonia 4g, barium sulfate 4g, hydrochloric acid (hundred parts of specific concentrations of quality are 32%)
18g, sulfuric acid 14g, water 110g, industrial alcohol 25g, b-butyl ether 12g and tetrahydrofuran 4g, mixing are aged 10 hours after room temperature
After use;
4) etching process:By step 2) gained glassware to be etched immersion step 3) in the etching solution that is configured, etching solution
Temperature is 25 DEG C, and the time of etching is 18min, and etching is finished, and is taken out, and produces etching glassware first product;
5) post-process:By step 4) gained etching glassware first product immersion concentration is enters in 35g/L sodium hydrate aqueous solution
Row acid-base neutralization, acid-base neutralization is finished, and after being eluted with water to the glass article surface, is dried, and produces light etching frosted
Glass.