A kind of light etching ground glass and preparation method thereof
Technical field
The invention belongs to field of light industry technology, more particularly, to a kind of light etching ground glass and preparation method thereof.
Background technique
Ground glass is called frosted glass, dark glass, is usually used in bathroom, the door and window of office and partition.The one of ground glass
A important feature is dim sense, and surface is fine and smooth, light transmission is opaque, has good beautifying and decorating effect and artistic effect, due to
It can not have an X-rayed, and can protect individual privacy to a certain extent.Ground glass is manually to be ground with ordinary plate glass, is mechanical
The methods of sandblasting or hydrofluoric acid etch will be surface-treated and be made at even roughness surface.Ground glass table obtained by hand lapping
Face is relatively rough.Though mechanical sandblasting can get more fine and smooth surface, the glass is set to be in since glass surface crystalline solid is destroyed
The glass effects of existing white.In addition, mechanical sandblasting will also tend to generate impression of the hand, it is difficult to adapt to high-grade house decoration and high-grade office
The requirement of furniture.
Glass is etched using hydrofluoric acid and is to try to retain glass surface crystalline solid, realizes a kind of light etching frosted
The important method of glass, however since etching of the hydrofluoric acid to glass is excessively strong, glass is etched using hydrofluoric acid
It is still the technical barrier for failing to break through always that method, which prepares light etching ground glass,.In addition, the by-product that hydrofluoric acid loses glass
Object, i.e. silicon tetrafluoride gas still fail effectively to be recycled.
Summary of the invention
Aiming at the problem that current light etching ground glass is difficult to prepare, silicon tetrafluoride gas fails effectively to recycle, this hair
It is bright to provide a kind of light etching ground glass and preparation method thereof.
The present invention is realized by the following technologies:
The reflecting rate of a kind of light etching ground glass, the light etching ground glass is 30%~80%, described bright
Ground glass is etched by light with the etching layer with a thickness of 50~200nm.
According to different purposes, the ground glass of 50~200nm thickness etching layer can be made in the present invention, and matte surface is fine and smooth,
Its reflecting rate is 30%~80%, and a large amount of crystalline solid is distributed in glass surface, forms a kind of light effect.Obtained by the present invention
Light etching ground glass give out the gloss of diamond under sunlight irradiation.
A kind of preparation method of light etching ground glass, this method comprises the following steps:
1) glass cleaning and drying: glassware to be etched is cleaned and dried, for use;
2) it pre-processes: the resulting glassware to be etched of step 1) being immersed in alkaline aqueous solution, dipping finishes, and takes out simultaneously
To wash the alkaline aqueous solution for removing the glass article surface, dry;
3) etching process: glassware to be etched obtained by step 2) is immersed in etching solution, and etching finishes, take out to get
Etch glassware first product;
4) it post-processes: etching glassware first product obtained by step 3) being immersed in cleaning solution and carries out acid-base neutralization, in soda acid
With finish, after being eluted with water to the glass article surface, dry to get light etch ground glass.
Or not that glass article surface is clean clean in the present invention, it will affect pretreatment, the etching process in the road Zhe Hou.Hair
Bright people cleans under industrial cleaning agent auxiliary, and the sundries such as oil, the wax of glass surface is enable to remove.
Traditionally preparing ground glass using etching layer is to be directly immersed in plate glass in hydrofluoric acid etch liquid to complete, erosion
Quarter process does not have directionality, it is difficult to form the crystalline solid of larger amt and regular arrangement on the surface of glass.With traditional glass
Glass hydrofluoric acid etching process is different, and invention increases one of pretreating process, the effect of the pretreating process is to utilize alkaline agent
Microcorrosion is carried out to the silica of glass surface, microcorrosion point is largely distributed in glass surface, in the effect of rear road etching solution
Under, microcorrosion point has obtained further reinforcement, forms the knot of larger amt and regular arrangement on the surface of glass to realize
Crystal.A large amount of formation of glass surface crystalline solid, make its reflecting rate be greatly improved, and form a kind of light effect.
Preferably, the temperature of the step 2) alkaline aqueous solution is 50~60 DEG C, and dip time is 5~30min.
Preferably, the alkaline aqueous solution be sodium hydrate aqueous solution that concentration is 200~400g/L or concentration be 150~
The potassium hydroxide aqueous solution of 400g/L.
Preferably, the etching solution is mixed and is aged by the raw material of following parts by weight: 3~5 parts of hydrogen fluoride ammonia, sulfuric acid
3~5 parts of barium, 15~20 parts of hydrochloric acid, 10~15 parts of sulfuric acid, 80~120 parts of water, 10~30 parts of industrial alcohol, b-butyl ether 5~15
Part, 3~5 parts of tetrahydrofuran.
Traditionally, etching solution generally comprises the raw material of following parts by weight: 8.5~12 parts of ammonium acid fluoride, ammonium sulfate 2.5~3
Part, 2.5~3 parts of potassium sulfate, 2.5~3 parts of calcirm-fluoride, 8.5~12 parts of sulfuric acid, 60~75 parts of water, in the above raw material, hydrogen fluoride
Ammonium is main active ingredient.In the present invention, the ratio that inventor reduces ammonium acid fluoride carries out pretreated glassware
Etching forms biggish crystalline solid in glass surface by reducing etching speed.Ammonium acid fluoride is one to the etching reaction of glass
A nonequilibrium reaction.Along with etching reaction, there is a large amount of silicon tetrafluoride gas to generate and discharge.Silicon tetrafluoride gas is nothing
The gas of color, toxic, irritant stink easily deliquesces, can produce dense smoke mist in humid air, have to environment, human body great
Influence.In the present invention, inventor is tested repeatedly, and industrial alcohol, b-butyl ether and tetrahydro furan are added especially in etching solution
It mutters the recycling realized to most of ocratation, reduces the release of silicon tetrafluoride gas.In addition, ocratation is in etching solution
Presence also reduce ammonium acid fluoride to the etch-rate of glass, be also beneficial to the formation of glass surface crystalline solid.
Preferably, the time of ageing is 6~12 hours.
Preferably, hundred parts of specific concentrations of the quality of the hydrochloric acid are 31%~33%.
Preferably, the temperature of the etching solution is 10~35 DEG C, and the time of etching is 10~20min.
Preferably, the cleaning solution is the sodium hydrate aqueous solution that concentration is 20~50g/L.
A kind of light etching ground glass disclosed by the invention and preparation method thereof, the beneficial effect is that:
(1) light etching ground glass matte surface of the present invention is fine and smooth, and reflecting rate is 30%~80%, irradiates in sunlight
Under give out the gloss of diamond;
(2) microcorrosion being carried out using silica of the alkaline agent to glass surface, microcorrosion point is largely distributed in glass surface,
Under the action of rear road etching solution, microcorrosion point has obtained further reinforcement, thus realize formed on the surface of glass it is larger
Quantity and the crystalline solid of regular arrangement.A large amount of formation of glass surface crystalline solid, mention glass surface reflecting rate significantly
Height forms a kind of light effect;
(3) industrial alcohol, b-butyl ether and tetrahydrofuran are added in etching solution realizes the recycling to most of ocratation,
The release for reducing silicon tetrafluoride gas reduces the influence to environment, human body;
(4) production high yield rate, quality stabilization, saving of work and time, the simple process of light etching ground glass of the present invention are easy
It operates, have granular sensation, tack-free print.
Detailed description of the invention
Fig. 1 is light etching frosted glass effects figure of the invention.
Specific embodiment
For the substantive content that the present invention is further explained, a specific embodiment of the invention is described in detail below,
Described herein specific examples are only used to explain the present invention, is not intended to limit the present invention.
Embodiment 1
A kind of light of the present embodiment etches ground glass, and reflecting rate is about 80%, and etching layer thickness is about 200nm.This
The light etching ground glass preparation step of embodiment is as follows:
1) glass cleaning and drying: a length of 1m, the rectangle that width is 1m are waited losing using industry cleaning link agent solution (5wt%)
Carved glass product is cleaned, and then the glassware to be etched after cleaning is placed under the conditions of 60 DEG C and is dried, for use;
2) it pre-processes: the resulting glassware to be etched of step 1) is immersed into the sodium hydrate aqueous solution that temperature is 60 DEG C
In, the concentration of sodium hydrate aqueous solution is 400g/L, dip time 30min, and dipping finishes, takes out and simultaneously remove the glass with washing
The sodium hydrate aqueous solution of product surface, dries;
3) configuration of etching solution: weighing and mixed fluoride hydrogen ammonia 5g, barium sulfate 5g, hydrochloric acid (hundred parts of specific concentrations of quality are
33%) 20g, sulfuric acid 15g, water 120g, industrial alcohol 30g, b-butyl ether 15g and tetrahydrofuran 5g are aged after mixing in room temperature
It is used after 12 hours;
4) etching process: glassware to be etched obtained by step 2) is immersed in the etching solution that step 3) is configured, etching
The temperature of liquid is 35 DEG C, and the time of etching is 20min, and etching finishes, and is taken out to get etching glassware first product;
5) it post-processes: etching glassware first product obtained by step 4) is immersed into the sodium hydrate aqueous solution that concentration is 50g/L
Middle carry out acid-base neutralization, acid-base neutralization finishes, and after being eluted with water to the glass article surface, dries to get light etching
Ground glass.
A kind of light etching ground glass obtained by the present embodiment is as shown in Figure 1, light etching ground glass surface
The uniform and smooth exquisiteness of frosted has granular sensation, tack-free print, and the gloss of diamond is given out under sunlight irradiation.
Embodiment 2
A kind of light of the present embodiment etches ground glass, and reflecting rate is about 30%, and etching layer thickness is about 50nm.This reality
The light etching ground glass preparation step for applying example is as follows:
1) glass cleaning and drying: a length of 1m, the rectangle that width is 1m are waited losing using industry cleaning link agent solution (5wt%)
Carved glass product is cleaned, and then the glassware to be etched after cleaning is placed under the conditions of 60 DEG C and is dried, for use;
2) it pre-processes: the resulting glassware to be etched of step 1) is immersed into the potassium hydroxide aqueous solution that temperature is 50 DEG C
In, the concentration of potassium hydroxide aqueous solution is 150g/L, dip time 5min, and dipping finishes, takes out and simultaneously remove the glass with washing
The potassium hydroxide aqueous solution of product surface, dries;
3) configuration of etching solution: weighing and mixed fluoride hydrogen ammonia 3g, barium sulfate 3g, hydrochloric acid (hundred parts of specific concentrations of quality are
31%) 15g, sulfuric acid 10g, water 80g, industrial alcohol 10g, b-butyl ether 5g and tetrahydrofuran 3g are small in room temperature ageing 6 after mixing
When after use;
4) etching process: glassware to be etched obtained by step 2) is immersed in the etching solution that step 3) is configured, etching
The temperature of liquid is 10 DEG C, and the time of etching is 10min, and etching finishes, and is taken out to get etching glassware first product;
5) it post-processes: etching glassware first product obtained by step 4) is immersed into the sodium hydrate aqueous solution that concentration is 20g/L
Middle carry out acid-base neutralization, acid-base neutralization finishes, and after being eluted with water to the glass article surface, dries to get light etching
Ground glass.
Embodiment 3
A kind of light of the present embodiment etches ground glass, and reflecting rate is about 55%, and etching layer thickness is about 121nm.This
The light etching ground glass preparation step of embodiment is as follows:
1) glass cleaning and drying: a length of 1m, the rectangle that width is 1m are waited losing using industry cleaning link agent solution (5wt%)
Carved glass product is cleaned, and then the glassware to be etched after cleaning is placed under the conditions of 60 DEG C and is dried, for use;
2) it pre-processes: the resulting glassware to be etched of step 1) is immersed into the potassium hydroxide aqueous solution that temperature is 55 DEG C
In, the concentration of potassium hydroxide aqueous solution is 250g/L, dip time 15min, and dipping finishes, takes out and simultaneously remove the glass with washing
The potassium hydroxide aqueous solution of product surface, dries;
3) configuration of etching solution: weighing and mixed fluoride hydrogen ammonia 4g, barium sulfate 4g, hydrochloric acid (hundred parts of specific concentrations of quality are
32%) 17g, sulfuric acid 12g, water 100g, industrial alcohol 20g, b-butyl ether 10g and tetrahydrofuran 4g are aged 8 in room temperature after mixing
It is used after hour;
4) etching process: glassware to be etched obtained by step 2) is immersed in the etching solution that step 3) is configured, etching
The temperature of liquid is 20 DEG C, and the time of etching is 15min, and etching finishes, and is taken out to get etching glassware first product;
5) it post-processes: etching glassware first product obtained by step 4) is immersed into the sodium hydrate aqueous solution that concentration is 40g/L
Middle carry out acid-base neutralization, acid-base neutralization finishes, and after being eluted with water to the glass article surface, dries to get light etching
Ground glass.
Embodiment 4
A kind of light of the present embodiment etches ground glass, and reflecting rate is about 74%, and etching layer thickness is about 153nm.This
The light etching ground glass preparation step of embodiment is as follows:
1) glass cleaning and drying: a length of 1m, the rectangle that width is 1m are waited losing using industry cleaning link agent solution (5wt%)
Carved glass product is cleaned, and then the glassware to be etched after cleaning is placed under the conditions of 60 DEG C and is dried, for use;
2) it pre-processes: the resulting glassware to be etched of step 1) is immersed into the sodium hydrate aqueous solution that temperature is 58 DEG C
In, the concentration of sodium hydrate aqueous solution is 350g/L, dip time 25min, and dipping finishes, takes out and simultaneously remove the glass with washing
The sodium hydrate aqueous solution of product surface, dries;
3) configuration of etching solution: weighing and mixed fluoride hydrogen ammonia 4g, barium sulfate 4g, hydrochloric acid (hundred parts of specific concentrations of quality are
32%) 18g, sulfuric acid 14g, water 110g, industrial alcohol 25g, b-butyl ether 12g and tetrahydrofuran 4g are aged after mixing in room temperature
It is used after 10 hours;
4) etching process: glassware to be etched obtained by step 2) is immersed in the etching solution that step 3) is configured, etching
The temperature of liquid is 25 DEG C, and the time of etching is 18min, and etching finishes, and is taken out to get etching glassware first product;
5) it post-processes: etching glassware first product obtained by step 4) is immersed into the sodium hydrate aqueous solution that concentration is 35g/L
Middle carry out acid-base neutralization, acid-base neutralization finishes, and after being eluted with water to the glass article surface, dries to get light etching
Ground glass.