CN112851133A - Alkaline anti-glare glass etching liquid medicine and etching process - Google Patents
Alkaline anti-glare glass etching liquid medicine and etching process Download PDFInfo
- Publication number
- CN112851133A CN112851133A CN202011505748.9A CN202011505748A CN112851133A CN 112851133 A CN112851133 A CN 112851133A CN 202011505748 A CN202011505748 A CN 202011505748A CN 112851133 A CN112851133 A CN 112851133A
- Authority
- CN
- China
- Prior art keywords
- glass
- parts
- etching
- liquid medicine
- alkaline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 68
- 238000005530 etching Methods 0.000 title claims abstract description 62
- 239000007788 liquid Substances 0.000 title claims abstract description 30
- 239000003814 drug Substances 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims abstract description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 33
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims abstract description 12
- 239000000654 additive Substances 0.000 claims abstract description 11
- 230000000996 additive effect Effects 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000011698 potassium fluoride Substances 0.000 claims abstract description 6
- 235000003270 potassium fluoride Nutrition 0.000 claims abstract description 6
- 239000002994 raw material Substances 0.000 claims abstract description 6
- 239000001509 sodium citrate Substances 0.000 claims abstract description 6
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims abstract description 6
- 239000000176 sodium gluconate Substances 0.000 claims abstract description 6
- 235000012207 sodium gluconate Nutrition 0.000 claims abstract description 6
- 229940005574 sodium gluconate Drugs 0.000 claims abstract description 6
- 238000004140 cleaning Methods 0.000 claims description 16
- 230000001681 protective effect Effects 0.000 claims description 10
- 229920002134 Carboxymethyl cellulose Polymers 0.000 claims description 5
- 239000001768 carboxy methyl cellulose Substances 0.000 claims description 5
- 235000010948 carboxy methyl cellulose Nutrition 0.000 claims description 5
- 239000008112 carboxymethyl-cellulose Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000002360 preparation method Methods 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000002912 waste gas Substances 0.000 abstract description 4
- 239000002351 wastewater Substances 0.000 abstract description 4
- 239000002253 acid Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910004014 SiF4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910003638 H2SiF6 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- ZEFWRWWINDLIIV-UHFFFAOYSA-N tetrafluorosilane;dihydrofluoride Chemical compound F.F.F[Si](F)(F)F ZEFWRWWINDLIIV-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
Abstract
The invention provides an alkaline anti-glare glass etching liquid medicine and an etching process, wherein the etching liquid medicine comprises the following raw materials in parts by weight: 10-25 parts of potassium fluoride, 1-6 parts of a surface active additive, 3-20 parts of sodium gluconate, 1-10 parts of sodium citrate, 20-50 parts of sodium hydroxide and the balance of water. The alkaline etching solution provided by the invention is more environment-friendly, compared with the acidic etching solution, no waste gas is generated in the alkaline etching production process, less waste water is generated, the safety risk of operators is greatly reduced, and the alkaline etching solution can replace the traditional acidic etching solution and etching process.
Description
Technical Field
The invention relates to the technical field of anti-glare glass etching liquid medicines, in particular to an alkaline anti-glare glass etching liquid medicine and an etching process.
Background
The prior anti-dazzle glass etching liquid medicine is mainly acid etching, for example, the Chinese patent publication No. 2011102930815, the publication date is 09/10/2014, the invention discloses anti-dazzle glass product etching liquid and an etching process, the application scheme discloses the etching liquid mainly containing fluoride, hydrofluoric acid and other substances which are configured according to a certain proportion, SiF4 in the solution can not volatilize when the etching liquid etches a glass substrate, the SiF4 reacts with HF in the solution to generate H2SiF6, harmful acid waste gas and acid waste water are generated, the treatment process is complex, and the leakage is easy to cause potential safety hazards.
Disclosure of Invention
In view of the above, one or more embodiments of the present disclosure are directed to an alkaline anti-glare glass etching solution and an etching process, so as to solve the problem that a large amount of harmful acidic waste gas and acidic waste water is generated during the production of an acidic anti-glare glass etching solution.
In view of the above, one or more embodiments of the present disclosure provide an alkaline anti-glare glass etching solution, which comprises the following raw materials in parts by weight: 10-25 parts of potassium fluoride, 1-6 parts of a surface active additive, 3-20 parts of sodium gluconate, 1-10 parts of sodium citrate, 20-50 parts of sodium hydroxide and the balance of water.
Preferably, the surface active additive is carboxymethyl cellulose.
The etching process of the alkaline anti-glare glass comprises the following steps:
step 1, cleaning glass to be etched, and then protecting one surface which does not need to be etched;
step 2, pretreating the glass after protection treatment;
step 3, heating the etching liquid medicine of claim 1 to 60-70 ℃, putting the pretreated glass into the etching liquid medicine, reacting for 90-120 minutes, taking out the glass every 20-40 minutes, cleaning the glass by using clear water, and putting the glass into the etching liquid medicine;
and 4, taking out and cleaning, and tearing off the protective film to obtain the finished product of the anti-glare glass.
Preferably, the protection treatment in step 1 is to cover a PE protective film on one side of the glass which is not required to be etched after cleaning.
Preferably, the pretreatment in step 2 is to soak the glass after the protection treatment in a sodium hydroxide solution with a concentration of 30% and a temperature of 50 ℃ for 5 minutes.
From the above, the alkaline etching solution provided by the invention is more environment-friendly, compared with the acidic etching solution, no waste gas is generated in the alkaline etching production process, less waste water is generated, the safety risk of operators is greatly reduced, and the alkaline etching solution can replace the traditional acidic etching solution and etching process.
Detailed Description
The first embodiment is as follows:
the formula of the etching liquid medicine used by the invention is that the raw materials are weighed according to the following weight ratio: 15 parts of potassium fluoride, 2 parts of a surface active additive, 7 parts of sodium gluconate, 6 parts of sodium citrate, 36 parts of sodium hydroxide and 34 parts of water.
The surface active additive is carboxymethyl cellulose.
The etching principle of the alkaline etching solution is 2NaOH + SiO2 ═ Na2SiO3+ H2O
The etching process for preparing the alkaline anti-glare glass by using the etching liquid medicine comprises the following steps:
step 1, cleaning glass to be etched, and then protecting one surface which does not need to be etched;
step 2, pretreating the glass after protection treatment;
step 3, heating the etching liquid medicine of claim 1 to 65 ℃, putting the pretreated glass into the etching liquid medicine, reacting for 100 minutes, taking out the glass every 30 minutes, cleaning the glass by using clear water, and putting the glass into the etching liquid medicine;
and 4, taking out and cleaning, and tearing off the protective film to obtain the finished product of the anti-glare glass.
The protection treatment in the step 1 is to cover a PE protective film on one side of the cleaned glass which does not need to be etched.
The pretreatment in the step 2 is to soak the glass after the protection treatment in a sodium hydroxide solution with the temperature of 50 ℃ and the concentration of 30 percent for 5 minutes.
The anti-glare glass prepared by the method is detected to have the transmission haze of 3.6%, the glossiness (when the incident angle is 60 degrees) of 103 and the distinctness of image (DOI) of 94 through optical characteristic detection, the surface of the anti-glare glass generates an uneven surface under the display of a microscope image, the arithmetic average roughness (Ra) of the surface is 0.06 micron, and the anti-glare glass does not fall off after being rubbed back and forth for 4000 times by steel wool with the diameter of 20.0mm0000# and the pressure of 500 g under the friction resistance test.
Example two:
the formula of the etching liquid medicine used by the invention is that the raw materials are weighed according to the following weight ratio: 10 parts of potassium fluoride, 1 part of a surface active additive, 3 parts of sodium gluconate, 10 parts of sodium citrate, 20 parts of sodium hydroxide and 40 parts of water.
The surface active additive is carboxymethyl cellulose.
The etching process of the alkaline anti-glare glass comprises the following steps:
step 1, cleaning glass to be etched, and then protecting one surface which does not need to be etched;
step 2, pretreating the glass after protection treatment;
step 3, heating the etching liquid medicine of claim 1 to 60 ℃, putting the pretreated glass into the etching liquid medicine, reacting for 120 minutes, taking out the glass every 20 minutes, cleaning the glass by using clear water, and putting the glass into the etching liquid medicine;
and 4, taking out and cleaning, and tearing off the protective film to obtain the finished product of the anti-glare glass.
The protection treatment in the step 1 is to cover a PE protective film on one side of the cleaned glass which does not need to be etched.
The pretreatment in the step 2 is to soak the glass after the protection treatment in a sodium hydroxide solution with the temperature of 50 ℃ and the concentration of 30 percent for 5 minutes.
Example three:
the formula of the etching liquid medicine used by the invention is that the raw materials are weighed according to the following weight ratio: 25 parts of potassium fluoride, 6 parts of a surface active additive, 20 parts of sodium gluconate, 1 part of sodium citrate, 50 parts of sodium hydroxide and 60 parts of water.
The surface active additive is carboxymethyl cellulose.
The etching process of the alkaline anti-glare glass comprises the following steps:
step 1, cleaning glass to be etched, and then protecting one surface which does not need to be etched;
step 2, pretreating the glass after protection treatment;
step 3, heating the etching liquid medicine of claim 1 to 70 ℃, putting the pretreated glass into the etching liquid medicine, reacting for 120 minutes, taking out the glass every 40 minutes, cleaning the glass by using clear water, and putting the glass into the etching liquid medicine;
and 4, taking out and cleaning, and tearing off the protective film to obtain the finished product of the anti-glare glass.
The protection treatment in the step 1 is to cover a PE protective film on one side of the cleaned glass which does not need to be etched.
The pretreatment in the step 2 is to soak the glass after the protection treatment in a sodium hydroxide solution with the temperature of 50 ℃ and the concentration of 30 percent for 5 minutes.
The above examples are preferred embodiments of the present invention, but the embodiments of the present invention are not limited by the above examples, and any other modifications without departing from the present invention should be replaced by equivalents, and all such modifications are included in the scope of the present invention.
Claims (5)
1. An alkaline anti-glare glass etching liquid medicine is characterized by comprising the following raw materials in parts by weight: 10-25 parts of potassium fluoride, 1-6 parts of a surface active additive, 3-20 parts of sodium gluconate, 1-10 parts of sodium citrate, 20-50 parts of sodium hydroxide and the balance of water.
2. The alkaline anti-glare glass etching solution according to claim 1, wherein the surface active additive is carboxymethyl cellulose.
3. An etching process of alkaline anti-glare glass comprises the following steps: it is characterized in that the preparation method is characterized in that,
step 1, cleaning glass to be etched, and then protecting one surface which does not need to be etched;
step 2, pretreating the glass after protection treatment;
step 3, heating the etching liquid medicine of claim 1 to 60-70 ℃, putting the pretreated glass into the etching liquid medicine, reacting for 90-120 minutes, taking out the glass every 20-40 minutes, cleaning the glass by using clear water, and putting the glass into the etching liquid medicine;
and 4, taking out and cleaning, and tearing off the protective film to obtain the finished product of the anti-glare glass.
4. The etching process of alkaline anti-glare glass according to claim 3, wherein the protection treatment in the step 1 is to cover the cleaned glass which does not need to be etched with a PE protective film on one side.
5. The etching process of alkaline anti-glare glass according to claim 3, wherein the pretreatment in the step 2 is to soak the glass after the protection treatment in a sodium hydroxide solution with a concentration of 30% and a temperature of 50 ℃ for 5 minutes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011505748.9A CN112851133A (en) | 2020-12-18 | 2020-12-18 | Alkaline anti-glare glass etching liquid medicine and etching process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011505748.9A CN112851133A (en) | 2020-12-18 | 2020-12-18 | Alkaline anti-glare glass etching liquid medicine and etching process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112851133A true CN112851133A (en) | 2021-05-28 |
Family
ID=75997599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011505748.9A Pending CN112851133A (en) | 2020-12-18 | 2020-12-18 | Alkaline anti-glare glass etching liquid medicine and etching process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112851133A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116040952A (en) * | 2021-10-28 | 2023-05-02 | 比亚迪股份有限公司 | Glass etching liquid, glass with crystal-shining pattern and production method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2067958A (en) * | 1980-01-24 | 1981-08-05 | Albright & Wilson | Etching composition |
| US20060124590A1 (en) * | 2004-12-10 | 2006-06-15 | Sumco Corporation | Alkali etching liquid for silicon wafer and etching method using same |
| US20100246016A1 (en) * | 2009-03-31 | 2010-09-30 | Carlson Krista L | Glass having anti-glare surface and method of making |
| JP2014222330A (en) * | 2013-05-14 | 2014-11-27 | 株式会社ニコン | Method for surface-treating glass substrate and method for regenerating photomask |
| CN106977109A (en) * | 2017-04-01 | 2017-07-25 | 华鸿控股集团有限公司 | A kind of light etching ground glass and preparation method thereof |
-
2020
- 2020-12-18 CN CN202011505748.9A patent/CN112851133A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2067958A (en) * | 1980-01-24 | 1981-08-05 | Albright & Wilson | Etching composition |
| US20060124590A1 (en) * | 2004-12-10 | 2006-06-15 | Sumco Corporation | Alkali etching liquid for silicon wafer and etching method using same |
| US20100246016A1 (en) * | 2009-03-31 | 2010-09-30 | Carlson Krista L | Glass having anti-glare surface and method of making |
| JP2014222330A (en) * | 2013-05-14 | 2014-11-27 | 株式会社ニコン | Method for surface-treating glass substrate and method for regenerating photomask |
| CN106977109A (en) * | 2017-04-01 | 2017-07-25 | 华鸿控股集团有限公司 | A kind of light etching ground glass and preparation method thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116040952A (en) * | 2021-10-28 | 2023-05-02 | 比亚迪股份有限公司 | Glass etching liquid, glass with crystal-shining pattern and production method thereof |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210528 |
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| RJ01 | Rejection of invention patent application after publication |