CN106959588A - The two-sided automatic-alignment method and apparatus of anti-welding semi-automatic exposure machine - Google Patents
The two-sided automatic-alignment method and apparatus of anti-welding semi-automatic exposure machine Download PDFInfo
- Publication number
- CN106959588A CN106959588A CN201710223295.2A CN201710223295A CN106959588A CN 106959588 A CN106959588 A CN 106959588A CN 201710223295 A CN201710223295 A CN 201710223295A CN 106959588 A CN106959588 A CN 106959588A
- Authority
- CN
- China
- Prior art keywords
- automatic
- movement mechanism
- shaft movement
- pcb board
- vision systems
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
Abstract
The invention discloses a kind of two-sided automatic-alignment method and apparatus of anti-welding semi-automatic exposure machine, by vacuumize by the upper film absorption on the glass surface of upper ledge and the lower film absorption on the glass surface of center, pcb board is put on center, pcb board is supported by the lower film;Upper ledge is mutually closed with lower frame and pressed, each CCD vision systems are moved to specified location by control Multi-shaft movement mechanism, by the CCD vision systems for being arranged at Multi-shaft movement mechanism A tops, calculate the film and the positive position deviation of pcb board, the automatic aligning mechanism B of lower frame bottom is controlled again, the pcb board position placed on regulation center, realizes that pcb board is positive with upper film automatic aligning;By the CCD vision systems being arranged on Multi-shaft movement mechanism B, the position deviation of the lower film and pcb board reverse side is calculated, then the automatic aligning mechanism A that frame bottom is installed in adjusting, realize the reverse side and lower film automatic aligning of pcb board;The present invention realizes that pcb board is positive and exposed with the upper film, reverse side and the contraposition of lower film automatic precision, precision.
Description
Technical field
The present invention relates to a kind of two-sided automatic-alignment method and apparatus of anti-welding semi-automatic exposure machine, it is used to solve at present
Conventional exposure machine can only one side automatic aligning, caused by low production efficiency technical barrier.
Background technology
Recently as the fast development of electronic technology, it is increased sharply for PCB industries for lifting production capacity demand, tradition
Anti-welding semi-automatic exposure machine, the limitation of the design concept based on legacy equipment mechanical structure, using complex positioning mechanism,
Occupy the structure space immediately below lower process box, it is impossible to the layout of double-deck industrial CCD vision system is formed on device structure,
Can only upper process box surface mounting industrial CCD vision systems, be only used for realizing that the front of the film and pcb board is automatic
Contraposition, carries out one side exposure, causes whole work efficiency low.This respect is with French Altix, Japan ORC, Taiwan river treasured CBT, platform
Gulf will sage Csun etc. is the anti-welding semi-automatic exposure machine manufacturing enterprise of representative, carries out one side using 4 industrial CCD vision systems
Contraposition, one side Exposure mode.
Domestic anti-welding semi-automatic exposure machine manufacturing enterprise starts late, basic using external ripe technical scheme, Dongguan
Hai Sheng Electro-optical Technology, INC. (US) 62 Martin Road, Concord, Massachusetts 017 of city has made bold innovation to improve production efficiency of equipment, has invented a kind of semi-automatic anti-
Exposure desk frame module and exposure machine this technical scheme are welded, core technology using thin film dielectrics to realize double-sided exposure, but also
It is that one side contraposition, the complex contraposition platform machine traditional due to continuing to use are carried out using 4, front industrial CCD vision system
Structure, the reverse side contraposition of pcb board can only be using artificial contraposition or Pin nail contrapositions, it is impossible to realize automatic aligning, therefore the invention is only
Part can be used for and expose the positive high precision of plate required precision special demand, i.e. pcb board, the low this occasion of reverse side precision, this
The application of equipment is significantly limit, efficiency and precision problem could not be fundamentally solved.
The content of the invention
In order to solve the deficiencies in the prior art, it is an object of the present invention to provide a kind of anti-welding semi-automatic exposure machine is double
Face automatic aligning method, realizes the two-sided contraposition of high accuracy, double-sided exposure, and whole machine production capacity lifts 1 times or more.The present invention is also provided
A kind of two-sided automatic-alignment equipment of anti-welding semi-automatic exposure machine.
The technical scheme that is used to achieve the above object of the present invention is:
A kind of two-sided automatic-alignment method of automatic exposure machine, comprises the following steps:
(1) set process box, including be sequentially connected upper ledge, center, lower frame;Upper ledge is provided with optical glass A, the optics
Glass A bottom surfaces are adsorbed with the film;Center is provided with optical glass B, and optical glass B fronts are adsorbed with the lower film, and center is embedding
Enter to inside lower frame;
(2) automatic aligning mechanism is set, including is arranged at the automatic aligning mechanism A of middle frame bottom, and is arranged at lower frame
The automatic aligning mechanism B of bottom;
(3) Multi-shaft movement mechanism is set, including is arranged at the Multi-shaft movement mechanism A on process box top, and is arranged at work
Make the Multi-shaft movement mechanism B of frame bottom;
(4) CCD vision systems, including the CCD vision systems being arranged on Multi-shaft movement mechanism A are set, and are arranged at
CCD vision systems on Multi-shaft movement mechanism B;
(5) power up work, by vacuumize by the upper film absorption on the glass surface of upper ledge and the lower film absorption in
On the glass surface of frame, pcb board is put on center, and pcb board is supported by the lower film;Upper ledge is mutually closed with lower frame and pressed, is controlled
Each CCD vision systems are moved to specified location by Multi-shaft movement mechanism, by the CCD for being arranged at Multi-shaft movement mechanism A tops
Vision system, calculates the film and the positive position deviation of pcb board, then controls the automatic aligning mechanism B of lower frame bottom, regulation
The pcb board position placed on center, realizes that pcb board is positive with upper film automatic aligning;By being arranged on Multi-shaft movement mechanism B
CCD vision systems, calculate the position deviation of the lower film and pcb board reverse side, then the automatic aligning that frame bottom is installed in adjusting
Mechanism A, realizes the reverse side and lower film automatic aligning of pcb board;Realize that pcb board is positive automatic with the upper film, reverse side and the lower film
Precision contraposition, realizes two-sided accurate exposure.
Further improved as this method, the mechanical structure of the lower frame is in " returning " character form structure, and the center is embedded into
Lower frame " is returned " on character form structure position.
Further improved as this method, the lower frame is mutually fixed by movable pin with upper ledge.
Further improved as this method, including at least four CCD vision systems for being arranged at Multi-shaft movement mechanism A, with
And the CCD vision systems on Multi-shaft movement mechanism B are arranged at including at least four.
A kind of two-sided automatic-alignment equipment of automatic exposure machine, including:
Process box, process box includes the upper ledge, center, lower frame being sequentially connected;Upper ledge is provided with optical glass A, the optics
Glass A bottom surfaces are adsorbed with the film;Center is provided with optical glass B, and optical glass B fronts are adsorbed with the lower film, and center is embedding
Enter to inside lower frame;
Automatic aligning mechanism, including be arranged at the automatic aligning mechanism A of middle frame bottom, and be arranged at lower frame bottom from
Dynamic positioning mechanism B;
Multi-shaft movement mechanism, including the Multi-shaft movement mechanism A on process box top is arranged at, and it is arranged at work frame bottom
Multi-shaft movement mechanism B;
CCD vision systems, CCD vision systems include the CCD vision systems being arranged on Multi-shaft movement mechanism A, Yi Jishe
The CCD vision systems being placed on Multi-shaft movement mechanism B.
Further improved as this equipment, the mechanical structure of the lower frame is in " returning " character form structure, and the center is embedded into
Lower frame " is returned " on character form structure position.
Further improved as this equipment, the lower frame is mutually fixed by movable pin with upper ledge.
Further improved as this equipment, including at least four CCD vision systems for being arranged at Multi-shaft movement mechanism A, with
And the CCD vision systems on Multi-shaft movement mechanism B are arranged at including at least four.
The advantage of the invention is that:By improvement frame and the layout of positioning mechanism, tradition is solved complex
Positioning mechanism, causes the structure space for occupying process box, it is impossible to while installing multiple industrial CCD vision systems in process box
System;The two-sided automatic-alignment equipment for the anti-welding semi-automatic exposure machine that the present invention is provided, can be realized in same stand-alone device
Two-sided automatic-alignment, double-sided exposure, under conditions of precision is ensured, production capacity lifts one times.
More clearly to illustrate the architectural feature and effect of the present invention, it is entered with specific embodiment below in conjunction with the accompanying drawings
Row is described in detail.
Brief description of the drawings
Fig. 1 is unitary construction schematic diagram of the invention;
Fig. 2 is process box overall structure of the explosion figure of the present invention;
Fig. 3 is pcb board placement location schematic diagram of the present invention;
In figure:1st, multiaxial motion platform A;2nd, industrial CCD vision system;3rd, upper ledge;4th, center;5th, lower frame;6th, industrial CCD
Vision system;7th, multiaxial motion platform B;8th, optical glass A;9th, optical glass;10th, automatic aligning mechanism A;11st, automatic aligning
Mechanism B;12nd, movable pin;13rd, the upper film;14th, the lower film;15th, pcb board.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of protection of the invention.
Accompanying drawing 1 is referred to accompanying drawing 3, a kind of two-sided automatic-alignment method of automatic exposure machine is present embodiments provided, wrapped
Include following steps:
(1) set process box, including be sequentially connected upper ledge 3, center 4, lower frame 5;Upper ledge 3 is provided with optical glass A8,
Optical glass A8 bottom surfaces are adsorbed with the film 13;Center 4 is provided with optical glass B9, and optical glass B9 fronts are adsorbed with down
The film 14, center 4 is embedded into inside lower frame 5;
(2) automatic aligning mechanism is set, including is arranged at the automatic aligning mechanism A10 of the bottom of center 4, and is arranged at down
The automatic aligning mechanism B11 of the bottom of frame 5;
(3) Multi-shaft movement mechanism is set, including is arranged at the Multi-shaft movement mechanism A1 on process box top, and is arranged at work
Make the Multi-shaft movement mechanism B7 of frame bottom;
(4) CCD vision systems, including the CCD vision systems 2 being arranged on Multi-shaft movement mechanism A1 are set, and set
In the CCD vision systems 6 on Multi-shaft movement mechanism B7;
(5) work is powered up, is adsorbed the upper film 13 on the glass surface of upper ledge 3 and the lower film 14 is adsorbed by vacuumizing
On the glass surface of center 4, pcb board 15 is put on center 4, and pcb board 15 is supported by the lower film 14;By upper ledge 3 and the phase of lower frame 5
Closure is pressed, and each CCD vision systems are moved to specified location by control Multi-shaft movement mechanism, by being arranged at multiaxial motion machine
The CCD vision systems 2 on structure A1 tops, calculate the film 13 and the positive position deviation of pcb board 15, then control the bottom of lower frame 5
Automatic aligning mechanism B11, the position of pcb board 15 placed on regulation center 4 realizes that pcb board 15 is positive automatic with the upper film 13
Contraposition;By the CCD vision systems 6 being arranged on Multi-shaft movement mechanism B7, the position of the lower film 14 and pcb board reverse side is calculated
Deviation, then the automatic aligning mechanism A10 of the bottom of center 4 installation is adjusted, realize that the reverse side of pcb board 15 is automatic right with the lower film 14
Position;Realize that pcb board 15 is positive to align with the upper film 13, reverse side and the lower automatic precision of the film 14, realize two-sided accurate exposure.
The mechanical structure of lower frame 5 is in " returning " character form structure, and center 4 is embedded on lower frame 5 " time " character form structure position.Lower frame
5 are mutually fixed by movable pin 12 and upper ledge 3.
It is arranged at including at least four CCD vision systems 2 for being arranged at Multi-shaft movement mechanism A1, and including at least four
CCD vision systems 6 on Multi-shaft movement mechanism B7.
The two-sided automatic-alignment equipment of automatic exposure machine is present embodiments provided, is also included:
Process box, including be sequentially connected upper ledge 3, center 4, lower frame 5;Upper ledge 3 is provided with optical glass A8, the optics glass
Glass A8 bottom surfaces are adsorbed with the film 13;Center 4 is provided with optical glass B9, and optical glass B9 fronts are adsorbed with the lower film 14,
Center 4 is embedded into inside lower frame 5;The mechanical structure of lower frame 5 is in " returning " character form structure, and center 4 is embedded into lower frame 5 " time " font knot
On structure position.Lower frame 5 is mutually fixed by movable pin 12 and upper ledge 3.
Automatic aligning mechanism, including at least four automatic aligning mechanism A10 for being arranged at the bottom of center 4, and at least four
The individual automatic aligning mechanism B11 for being arranged at the bottom of lower frame 5;
Multi-shaft movement mechanism, including the Multi-shaft movement mechanism A1 on process box top is arranged at, and be arranged under process box
The Multi-shaft movement mechanism B7 in portion;
CCD vision systems, including the CCD vision systems 2 being arranged on Multi-shaft movement mechanism A1, and it is arranged at multiaxis fortune
CCD vision systems 6 on motivation structure B7;
By improvement frame and the layout of positioning mechanism, the complex positioning mechanism of tradition is solved, causes to take
The structure space of process box, it is impossible to while install multiple industrial CCD vision systems in process box;It is anti-that the present embodiment is provided
The two-sided automatic-alignment equipment of semi-automatic exposure machine is welded, two-sided automatic-alignment can be realized in same stand-alone device, it is two-sided
Exposure, under conditions of precision is ensured, production capacity lifts one times.
The above, is only presently preferred embodiments of the present invention, not makees any formal limitation to the present invention.Appoint
What those of ordinary skill in the art, in the case where not departing from technical solution of the present invention ambit, all using the side of the disclosure above
Method and technology contents make many possible variations and modification to technical solution of the present invention, or are revised as the equivalent reality of equivalent variations
Apply example.Therefore every content without departing from technical solution of the present invention, the equivalent change that shape, construction and principle according to the present invention are made
Change, all should be covered by protection scope of the present invention.
Claims (8)
1. a kind of two-sided automatic-alignment method of anti-welding semi-automatic exposure machine, it is characterised in that comprise the following steps:
(1) set process box, including be sequentially connected upper ledge, center, lower frame;Upper ledge is provided with optical glass A, the optical glass
A bottom surfaces are adsorbed with the film;Center is provided with optical glass B, and optical glass B fronts are adsorbed with the lower film, and center is embedded into
Inside lower frame;
(2) automatic aligning mechanism is set, including is arranged at the automatic aligning mechanism A of middle frame bottom, and is arranged at lower frame bottom
Automatic aligning mechanism B;
(3) Multi-shaft movement mechanism is set, including is arranged at the Multi-shaft movement mechanism A on process box top, and is arranged at process box
The Multi-shaft movement mechanism B of bottom;
(4) CCD vision systems, including the CCD vision systems being arranged on Multi-shaft movement mechanism A are set, and are arranged at multiaxis
CCD vision systems on motion B;
(5) power up work, by vacuumize by the upper film absorption on the glass surface of upper ledge and the lower film absorption in center
On glass surface, pcb board is put on center, and pcb board is supported by the lower film;Upper ledge is mutually closed with lower frame and pressed, multiaxis is controlled
Each CCD vision systems are moved to specified location by motion, by the CCD visions for being arranged at Multi-shaft movement mechanism A tops
System, calculates the film and the positive position deviation of pcb board, then controls the automatic aligning mechanism B of lower frame bottom, adjusts center
The pcb board position of upper placement, realizes that pcb board is positive with upper film automatic aligning;By being arranged on Multi-shaft movement mechanism B
CCD vision systems, calculate the position deviation of the lower film and pcb board reverse side, then the automatic alignment machine that frame bottom is installed in adjusting
Structure A, realizes the reverse side and lower film automatic aligning of pcb board;Realize positive pcb board and the upper film, reverse side and lower film automatic precision
Close contraposition, accurate exposure.
2. the two-sided automatic-alignment method of anti-welding semi-automatic exposure machine according to claim 1, it is characterised in that the lower frame
Mechanical structure be in " returning " character form structure, the center is embedded into lower frame and " returns " on character form structure position.
3. the two-sided automatic-alignment method of anti-welding semi-automatic exposure machine according to claim 1, it is characterised in that the lower frame
Mutually fixed with upper ledge by movable pin.
4. the two-sided automatic-alignment method of anti-welding semi-automatic exposure machine according to claim 1, it is characterised in that including at least
Four be arranged at Multi-shaft movement mechanism A CCD vision systems, and be arranged at including at least four on Multi-shaft movement mechanism B
CCD vision systems.
5. a kind of two-sided automatic-alignment equipment of anti-welding semi-automatic exposure machine according to one of Claims 1-4 methods described, its
It is characterised by, also includes:
Process box, process box includes the upper ledge, center, lower frame being sequentially connected;Upper ledge is provided with optical glass A, optical glass A
Bottom surface is adsorbed with the film;Center is provided with optical glass B, and optical glass B fronts are adsorbed with the lower film, under center is embedded into
Inframe portion;
Automatic aligning mechanism, including the automatic aligning mechanism A of middle frame bottom is arranged at, and it is arranged at the automatic right of lower frame bottom
Position mechanism B;
Multi-shaft movement mechanism, including the Multi-shaft movement mechanism A on process box top is arranged at, and it is arranged at many of work frame bottom
Shaft movement mechanism B;
CCD vision systems, CCD vision systems include the CCD vision systems being arranged on Multi-shaft movement mechanism A, and are arranged at
CCD vision systems on Multi-shaft movement mechanism B.
6. the two-sided automatic-alignment equipment of anti-welding semi-automatic exposure machine according to claim 5, it is characterised in that the lower frame
Mechanical structure be in " returning " character form structure, the center is embedded into lower frame and " returns " on character form structure position.
7. the two-sided automatic-alignment equipment of anti-welding semi-automatic exposure machine according to claim 5, it is characterised in that the lower frame
Mutually fixed with upper ledge by movable pin.
8. the two-sided automatic-alignment equipment of anti-welding semi-automatic exposure machine according to claim 5, it is characterised in that including at least
Four be arranged at Multi-shaft movement mechanism A CCD vision systems, and be arranged at including at least four on Multi-shaft movement mechanism B
CCD vision systems.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710223295.2A CN106959588B (en) | 2017-04-07 | 2017-04-07 | The two-sided automatic-alignment method and apparatus of anti-welding semi-automatic exposure machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710223295.2A CN106959588B (en) | 2017-04-07 | 2017-04-07 | The two-sided automatic-alignment method and apparatus of anti-welding semi-automatic exposure machine |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106959588A true CN106959588A (en) | 2017-07-18 |
CN106959588B CN106959588B (en) | 2018-10-30 |
Family
ID=59483454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710223295.2A Active CN106959588B (en) | 2017-04-07 | 2017-04-07 | The two-sided automatic-alignment method and apparatus of anti-welding semi-automatic exposure machine |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106959588B (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107329377A (en) * | 2017-07-27 | 2017-11-07 | 深圳市天慧谷科技股份公司 | A kind of full-automatic 3D bend glasses exposure machine |
CN108098622A (en) * | 2017-09-11 | 2018-06-01 | 凯茂科技(深圳)有限公司 | A kind of glass localization tool and glass localization method |
CN108255029A (en) * | 2018-03-09 | 2018-07-06 | 广东华恒智能科技有限公司 | A kind of sided exposure machine and its exposure method |
CN109031898A (en) * | 2018-09-21 | 2018-12-18 | 东莞市多普光电设备有限公司 | A kind of novel anti-welding dual surface LED exposure machine |
CN109688714A (en) * | 2019-02-26 | 2019-04-26 | 东莞科视自动化科技有限公司 | A kind of device and anti-adhesion method for preventing pcb board from gluing the film |
CN109742182A (en) * | 2018-11-28 | 2019-05-10 | 苏州迈为科技股份有限公司 | A kind of vision positioning method before cell piece scribing and printing |
CN110488577A (en) * | 2019-09-06 | 2019-11-22 | 东莞科视自动化科技有限公司 | A kind of free-moving high-precision of bilayer is to bit platform |
CN110737176A (en) * | 2018-07-20 | 2020-01-31 | 深圳市三字自动化设备有限公司 | Automatic alignment exposure machine and working method thereof |
CN110785020A (en) * | 2019-10-08 | 2020-02-11 | 东莞市多普光电设备有限公司 | Semi-automatic PCB board solder mask double-sided LED exposure machine |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101520607A (en) * | 2008-02-25 | 2009-09-02 | 川宝科技股份有限公司 | Double-faced exposure architecture and double-faced exposure method of printed circuit board |
CN203689007U (en) * | 2013-12-30 | 2014-07-02 | 浙江欧视达科技有限公司 | CCD (Charge Coupled Device) optical monitoring system of semiautomatic LED (Light-Emitting Diode) exposure machine |
CN203811985U (en) * | 2014-04-30 | 2014-09-03 | 遂宁市维海电子科技有限公司 | Semi-automatic FPC (Flexible Printed Circuit) board locating and exposing device |
CN105093853A (en) * | 2015-09-02 | 2015-11-25 | 东莞市海圣光电科技有限公司 | Automatic solder-mask exposure table frame module and exposure machine |
CN105278263A (en) * | 2015-11-25 | 2016-01-27 | 四川聚能核技术工程有限公司 | 8CCD double-side simultaneous aligning method for exposure machine |
CN105629670A (en) * | 2014-11-05 | 2016-06-01 | 永天机械设备制造(深圳)有限公司 | Semi-automatic alignment and exposure device of printed circuit board (PCB) |
CN205691938U (en) * | 2016-05-22 | 2016-11-16 | 东莞市友辉光电科技有限公司 | Double-side membrane exposure aligning structure |
-
2017
- 2017-04-07 CN CN201710223295.2A patent/CN106959588B/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101520607A (en) * | 2008-02-25 | 2009-09-02 | 川宝科技股份有限公司 | Double-faced exposure architecture and double-faced exposure method of printed circuit board |
CN203689007U (en) * | 2013-12-30 | 2014-07-02 | 浙江欧视达科技有限公司 | CCD (Charge Coupled Device) optical monitoring system of semiautomatic LED (Light-Emitting Diode) exposure machine |
CN203811985U (en) * | 2014-04-30 | 2014-09-03 | 遂宁市维海电子科技有限公司 | Semi-automatic FPC (Flexible Printed Circuit) board locating and exposing device |
CN105629670A (en) * | 2014-11-05 | 2016-06-01 | 永天机械设备制造(深圳)有限公司 | Semi-automatic alignment and exposure device of printed circuit board (PCB) |
CN105093853A (en) * | 2015-09-02 | 2015-11-25 | 东莞市海圣光电科技有限公司 | Automatic solder-mask exposure table frame module and exposure machine |
CN105278263A (en) * | 2015-11-25 | 2016-01-27 | 四川聚能核技术工程有限公司 | 8CCD double-side simultaneous aligning method for exposure machine |
CN205691938U (en) * | 2016-05-22 | 2016-11-16 | 东莞市友辉光电科技有限公司 | Double-side membrane exposure aligning structure |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107329377A (en) * | 2017-07-27 | 2017-11-07 | 深圳市天慧谷科技股份公司 | A kind of full-automatic 3D bend glasses exposure machine |
CN108098622B (en) * | 2017-09-11 | 2019-11-08 | 凯茂科技(深圳)有限公司 | A kind of glass localization tool and glass localization method |
CN108098622A (en) * | 2017-09-11 | 2018-06-01 | 凯茂科技(深圳)有限公司 | A kind of glass localization tool and glass localization method |
CN108255029A (en) * | 2018-03-09 | 2018-07-06 | 广东华恒智能科技有限公司 | A kind of sided exposure machine and its exposure method |
CN110737176A (en) * | 2018-07-20 | 2020-01-31 | 深圳市三字自动化设备有限公司 | Automatic alignment exposure machine and working method thereof |
CN109031898A (en) * | 2018-09-21 | 2018-12-18 | 东莞市多普光电设备有限公司 | A kind of novel anti-welding dual surface LED exposure machine |
CN109742182A (en) * | 2018-11-28 | 2019-05-10 | 苏州迈为科技股份有限公司 | A kind of vision positioning method before cell piece scribing and printing |
CN109742182B (en) * | 2018-11-28 | 2020-08-11 | 苏州迈为科技股份有限公司 | Battery piece scribing and visual positioning method before printing |
CN109688714A (en) * | 2019-02-26 | 2019-04-26 | 东莞科视自动化科技有限公司 | A kind of device and anti-adhesion method for preventing pcb board from gluing the film |
CN109688714B (en) * | 2019-02-26 | 2024-02-13 | 广东科视光学技术股份有限公司 | Device and anti-sticking method for preventing PCB from sticking film |
CN110488577A (en) * | 2019-09-06 | 2019-11-22 | 东莞科视自动化科技有限公司 | A kind of free-moving high-precision of bilayer is to bit platform |
CN110785020A (en) * | 2019-10-08 | 2020-02-11 | 东莞市多普光电设备有限公司 | Semi-automatic PCB board solder mask double-sided LED exposure machine |
CN110785020B (en) * | 2019-10-08 | 2020-09-08 | 东莞市多普光电设备有限公司 | Semi-automatic PCB board solder mask double-sided LED exposure machine |
Also Published As
Publication number | Publication date |
---|---|
CN106959588B (en) | 2018-10-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106959588A (en) | The two-sided automatic-alignment method and apparatus of anti-welding semi-automatic exposure machine | |
CN206906793U (en) | The two-sided automatic-alignment equipment of anti-welding semi-automatic exposure machine | |
CN206679893U (en) | A kind of bunker lift turning device | |
US10304711B2 (en) | Cassette and substrate transfer device | |
CN104511901A (en) | Intelligent calligraphy mechanical arm | |
CN104469077A (en) | Scanner and scanning method | |
CN209641754U (en) | Laminated cell pole piece adjusts device | |
CN101424517B (en) | Automatic measurement system for natural downslide amount of forklift fork | |
CN203854207U (en) | Touch display screen installation equipment | |
CN105150687A (en) | Calibration method, calibrating device, and calibration method of calico printing machine sprayer head | |
CN207965382U (en) | A kind of eyeglass engagement device and eyeglass kludge | |
CN209340804U (en) | A kind of mural painting high definition microspur digital acquisition device | |
CN208216013U (en) | A kind of high-precision adjustment platform | |
CN203547178U (en) | Control system of lifting stage | |
CN205232590U (en) | CCD aligning device who is fit for accurate replacement processing of circuit board | |
CN205353575U (en) | Lift aligning device for exposure machine | |
CN202837810U (en) | Exposure alignment system | |
CN108437437A (en) | A kind of high-precision adjustment platform | |
CN214475708U (en) | Aerial photogrammetry simulation system | |
CN205745900U (en) | Five revolving stages | |
CN205809815U (en) | A kind of gesture identification controls device | |
CN205318014U (en) | Universal objective table and microscope | |
CN208840872U (en) | A kind of Rapid manufacturing device of high of aluminium alloy extrusions frame | |
CN210214146U (en) | Jacking transplanting device | |
CN111637333B (en) | Three-dimensional shooting track of stop motion animation |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: No. 333, Zhushan Zhenxing Road, Dongcheng District, Dongguan City, Guangdong Province Patentee after: Guangdong Keshi Optical Technology Co.,Ltd. Address before: No. 333, Zhushan Zhenxing Road, Dongcheng District, Dongguan City, Guangdong Province Patentee before: CST AUTOMATION TECHNOLOGY Co.,Ltd. |