CN106908003B - A kind of Range Measurement System and its application based on the vectorial field after longitudinal polarization - Google Patents

A kind of Range Measurement System and its application based on the vectorial field after longitudinal polarization Download PDF

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Publication number
CN106908003B
CN106908003B CN201710050449.2A CN201710050449A CN106908003B CN 106908003 B CN106908003 B CN 106908003B CN 201710050449 A CN201710050449 A CN 201710050449A CN 106908003 B CN106908003 B CN 106908003B
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photodetector
double
slit
vector
double slit
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CN106908003A (en
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陈瑞品
高腾跃
钱朝阳
张晓雨
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Hangzhou Huicui Intelligent Technology Co ltd
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Zhejiang Sci Tech University ZSTU
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/14Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness

Abstract

The invention discloses a kind of Range Measurement System based on the vectorial field after longitudinal polarization and its applications, including vector light source, reflective mirror, double lens, double slit, convex lens, polarizing film, photodetector and signal processing system;Double slit is arranged in initial point position, photodetector is arranged in tested point position, the vector light source emits vector light to reflective mirror, vector light is after mirror reflection, after double lens adjusts optical path width, double slit is injected, interference light is after polarizing film filters, it is incident upon on photodetector, the distance of the object under test is obtained according to the optical information that photodetector measures.It is high that the system has measurement accuracy, and structure is simple, feature easy for installation, cheap, applied widely.

Description

A kind of Range Measurement System and its application based on the vectorial field after longitudinal polarization
Technical field
The present invention relates to vector flash ranging displacement field more particularly to a kind of distances based on the vectorial field after longitudinal polarization Measuring system and its application.
Background technique
Laser interferance method displacement.This is a kind of relative measurement, it can not measure an absolute distance of the object from instrument, But the relative distance of two testees can be measured.Its principle is a Michelson's interferometer, is become using reflecting mirror distance The variation of interference fringe measures when change, and reflecting mirror moves to object B from object A, and the quantity of interference fringe variation reflects it Distance.This measurement request condition is higher, but can be with precise measurement, it is also most accurate one in current all measurement means Kind.And vectorial field displacement, it is the technological innovation moved to optical location, so that original interference fringe is become from one-dimensional Two dimension greatly improves system sensitivity, so that displacement measurement is more accurate.
Summary of the invention
The purpose of the invention is to provide a kind of Range Measurement System based on the vectorial field after longitudinal polarization and its Using.
The present invention is achieved through the following technical solutions: a kind of range measurement system based on the vectorial field after longitudinal polarization System, including vector light source, reflective mirror, double lens, double slit, convex lens, longitudinal polarizing film, photodetector and signal processing system System;By double slit setting in initial point position, by photodetector setting in tested point position, the vector light source is sent out to reflective mirror Vector light is penetrated, vector light is after mirror reflection, after double lens adjusts optical path width, forms the light beam that radius is ε, then penetrates Enter double slit, generates interference;After interference light planoconvex lens focus, injects longitudinal polarizing film and be filtered, be then incident upon photoelectricity spy It surveys on device, photodetector measures the light intensity I by any point P in the filtered interference pattern of polarizing film, and is input to signal Processing system, signal processing system obtain initial point to the distance between tested point d=2 π bx/ (λ δ) by calculating;
Wherein,IyFor the longitudinal component of light intensity I, m is to open up Lotus number is flutterred, b is slit spacing, and x is horizontal distance of the P point to interference pattern central point, θB=arccos (b/ (2 ε)), λ are arrow Measure optical wavelength.θ0For the initial phase of vector light, l/r0Change speed parameter for the polarization state of vector light radially.
Further, the double slit is micro-structure double slit.
Further, the photodetector is planar array detector or linear array detector, can also be pixilated detectors.
The application of a kind of distance measurement system in straight-line displacement sensing, which is characterized in that the application is, by the photoelectricity Detector is connect with object under test, the double slit is arranged on the extended line of object under test linear motion, according to photodetection The optical information that device measures obtains the real-time displacement of the object under test.
The beneficial effects of the present invention are: it is high that the system has measurement accuracy, and structure is simple, and easy for installation, price is low Honest and clean, applied widely feature.
Detailed description of the invention
Fig. 1 is demonstration of the vector beam by double slit;
Fig. 2 is two-slit interference schematic device;
Fig. 3 is that vector beam projects schematic diagram;
Fig. 4 is when initial phase is 0, and topological charge number 1 regulates and controls interference fringe pattern when parameter l is 1.
In figure, vector light source 1, reflective mirror 2, double lens 3, double slit 4, convex lens 5, cross-polarization piece 6, photodetector 7, Signal processing system 8.
Specific embodiment
Below by taking cross-polarization piece as an example, the calculating of distance is derived.As shown in figure 3, a kind of distance based on vectorial field Detection system, including vector light source 1, reflective mirror 2, double lens 3, double slit 4, convex lens 5, cross-polarization piece, 7 and of photodetector Signal processing system 8;By the setting of double slit 4 in initial point position, photodetector 7 is arranged in tested point position, the vector Light source 1 emits vector light to reflective mirror 2, and vector light is after the reflection of reflective mirror 2, after double lens 3 adjusts optical path width, forms half Diameter is the light beam of ε, then injects double slit 4, generates interference;After interference light planoconvex lens 5 focus, injects cross-polarization piece and filtered Then wave is incident upon on photodetector 7, the generation of interference fringe is realized by the following method:
The distribution of light intensity formula of known any mixed polarization states vectorial field is
Wherein r=(x2+y2)1/2, as through double lens 3 adjust optical path width after beam radius, r=ε, θ=arctan (y/x)、l/r0Change speed parameter for the polarization state of vector light radially.M is topological charge number, θ0For initial phase, exAnd eyPoint Not Wei unit vector on the direction x and the direction y, A0Amplitude is indicated, in next reckoning, it is believed that A is cut positioned at light beam Any point is steady state value on face.R indicates that on the x/y plane where slit, origin is put to investigation in cartesian coordinate system Distance.θ is the azimuth of the polar coordinate system where beam cross-section.As shown in Figure 1, there are two slits of AB on x/y plane, The distance between slit is b, while the distance of AB slit to origin is identical, and is parallel to each other, slit width vertical with x-axis For a.After monochromatic mixed polarization states vectorial field represented by by formula passes through two slits, it can be equivalent to two secondary wires Light source is finally overlapped on the plane of vision being parallel to after x/y plane.It is distance of the slit to plane of vision that we, which take d,. Assuming that the width of slit is sufficiently small and infinite in length, furthermore the scale of slit spacing b be sewn to plane of vision distance d compared to It is sufficiently small.
It decomposes vectorial field and carries out theoretical calculation:
Mixed polarization states vectorial field is decomposed into two component polarization light of x Yu the direction y, it is independent opposite to each other.Expression Formula is write respectively:
Ex(θ)=cos [+2 π l (r/r of m θ0)+θ0]
Ey(θ)=sin [+2 π l (r/r of m θ0)+θ0]
When light beam reaches AB slit, light beam can regard as shown in Figure 1, it can be seen from the figure that only lucky position Light in slit position can just pass through slit.Slit AB is symmetrical about y-axis, therefore is located at y-coordinate value on two slits The azimuth of origin corresponding to identical two points is respectively θAWith θB.We can be found that θAWith θBSupplementary angle relationship each other, i.e. θA =π-θB, θB=arccos (b/ (2 ε));When the polarized light field in the x of decomposition and the direction y passes through AB slit, expression formula can be with It is written as:
The light intensity expression Ix of the direction x polarization state component and the direction y polarization state component after interference can be write out respectively With Iy.We enable first
Then the light intensity expression of Ix and Iy, which can simplify, is written as:
Wherein δ is to pass through the phase difference between two slit beam of AB.In Tomas Young's tow-slit experiment, as shown in Fig. 2, setting The initial phase of incident light source isIt is the amount being randomly generated, received respectively at inspecting position P from (QAP) with (QBP) phase of two optical disturbances is written as respectively:
Then phase difference are as follows:
The π bx/ of δ=2 (λ d)
Wherein d is distance of the plane where double slit to plane where photoelectric sensor, that is, measured required for us Distance.
Similarly, when the polarizing film used is longitudinal polarizing film,
Below by the reliability of following experimental verification the method for the invention:
Test distance 5cm, 20cm, 1m are set, according to arrangement vector light source 1 shown in Fig. 3, reflective mirror 2, double Lens 3, double slit 4, convex lens 5, longitudinal polarizing film, photodetector 7 and signal processing system 8;And double slit 4 is arranged initial Point position, by the setting of photodetector 7 in tested point position, the vector light source 1 emits vector light, vector light to reflective mirror 2 After the reflection of reflective mirror 2, after double lens 3 adjusts optical path width, the light beam that radius is ε is formed, double slit 4 is then injected, is generated Interference;After interference light planoconvex lens 5 focus, injects longitudinal polarizing film and be filtered, be then incident upon on photodetector 7, light Electric explorer 7 measures the light intensity I by any point P in the filtered interference pattern of polarizing film, and is input to signal processing system 8, signal processing system 8 obtains initial point to the distance between tested point d=2 π bx/ (λ δ) by calculating;Wherein,IyFor the longitudinal component of light intensity I, m is topological charge number, and b is narrow Spacing is stitched, x is horizontal distance of the P point to interference pattern central point, θB=arccos (b/ (2 ε)), λ are vector optical wavelength.θ0For The initial phase of vector light, l/r0Change speed parameter for the polarization state of vector light radially.
The result output of three measurement distances is as shown in the table:
Set distance 5cm 20cm 1m
Measurement result 5.006cm 19.998cm 100.045cm
The present invention also provides application of the above-mentioned distance measurement system in straight-line displacement sensing, which is, by the light Electric explorer 7 is connect with object under test, the double slit 4 is arranged on the extended line of object under test linear motion, according to photoelectricity The optical information that detector 7 measures obtains the real-time displacement of the object under test.

Claims (4)

1. a kind of Range Measurement System based on the vectorial field after longitudinal polarization, which is characterized in that including vector light source (1), Reflective mirror (2), double lens (3), double slit (4), convex lens (5), longitudinal polarizing film, photodetector (7) and signal processing system (8);By double slit (4) setting in initial point position, photodetector (7) are arranged in tested point position, the vector light source (1) Emit vector light to reflective mirror (2), vector light is after reflective mirror (2) are reflected, and after double lens (3) adjust optical path width, is formed Radius is the light beam of ε, then injects double slit (4), generates interference;After interference light planoconvex lens (5) focus, longitudinal polarizing film is injected It is filtered, is then incident upon on photodetector (7), photodetector (7) is measured by the filtered interference pattern of polarizing film The light intensity I of any point P in sample, and signal processing system (8) are input to, signal processing system (8) obtains initial point by calculating To the distance between tested point d=2 π bx/ (λ δ);
Wherein,IyFor the longitudinal component of light intensity I, m is topology Lotus number, b are slit spacing, and x is horizontal distance of the P point to interference pattern central point, θB=arccos (b/ (2 ε)), λ is vector Optical wavelength, θ0For the initial phase of vector light, l/r0Change speed parameter for the polarization state of vector light radially;
When detecting straight-line displacement, the photodetector is connect with object under test, the double slit is arranged in object under test On the extended line of linear motion, the real-time displacement of the object under test is obtained according to the optical information that photodetector measures.
2. system according to claim 1, which is characterized in that the double slit (4) is micro-structure double slit.
3. system according to claim 1, which is characterized in that the photodetector (7) is planar array detector or line Array detector or pixilated detectors.
4. a kind of application method of the system described in claim 1 in straight-line displacement sensing, which is characterized in that the application is to be somebody's turn to do Method are as follows: the photodetector (7) is connect with object under test, the double slit (4) setting is moved along a straight line in object under test Extended line on, the real-time displacement of the object under test is obtained according to the optical information that photodetector (7) measures.
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CN109557679B (en) * 2019-01-07 2020-10-27 浙江理工大学 Linear polarization light generation device of vector light beam based on radial polarization change

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CN102607435A (en) * 2012-03-27 2012-07-25 黑龙江工程学院 Device and method for measuring thickness of optical film by adopting double-slit interference method
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CN101846553A (en) * 2010-03-30 2010-09-29 北京理工大学 Device and method for measuring polarization state by two-slit interference method
CN102607435A (en) * 2012-03-27 2012-07-25 黑龙江工程学院 Device and method for measuring thickness of optical film by adopting double-slit interference method
CN203687880U (en) * 2014-01-20 2014-07-02 浙江大学 Optical displacement measuring system
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Effective date of registration: 20231025

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Patentee before: ZHEJIANG SCI-TECH University