CN106814546A - Focal plane detection device, focal plane scaling method and silicon wafer exposure method - Google Patents
Focal plane detection device, focal plane scaling method and silicon wafer exposure method Download PDFInfo
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- CN106814546A CN106814546A CN201510856628.6A CN201510856628A CN106814546A CN 106814546 A CN106814546 A CN 106814546A CN 201510856628 A CN201510856628 A CN 201510856628A CN 106814546 A CN106814546 A CN 106814546A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Abstract
The invention discloses a kind of focal plane detection device, focal plane scaling method and silicon wafer exposure method, the device includes light source cell, for being irradiated generation imaging beam to mask plate；Imaging unit, for by the focusing pattern imaging on mask plate in focusing image sensor；Focusing driver element, for vertical regulation projection objective or sports platform unit completing focusing；Sports platform unit, is provided with the reflection unit with reflecrtive mark, and the sports platform unit is used to be moved to the reflection unit underface of projection objective；Control unit, is analyzed and processes for the graph data to focusing imageing sensor collection, and feedback control focusing driver element.The present invention fast and accurately can be demarcated and compensated to optimal focal plane side-play amount.
Description
Technical field
The present invention relates to IC manufacturing field, more particularly to a kind of focal plane detection device, focal plane demarcation side
Method and silicon wafer exposure method.
Background technology
During photo-etching machine exposal, in order to obtain optimum exposure quality, silicon chip upper surface must be always positioned at
In the optimal focal plane of projection objective.As shown in figure 1, existing technological means is typically by litho machine
Focusing and leveling subsystem (FLS, English full name：Focusing and leveling system) in photo-detector
The position of 4 pairs of upper surfaces of silicon chip 2 measures, and using governor motion be sports platform 3 drive silicon chip 2 by its
It is adjusted at the optimal focal plane position of projection objective 1 demarcated.
But above-mentioned metering system faces following problem：It is subject to processing due to projection objective 1, is assembled also or temperature
The influence of the external environments such as degree, air pressure, makes actual focal plane drift about, so projection objective 1 is optimal burnt flat
Face is constantly present certain height and dip deviation relative to FLS zero planes.It is thus typically necessary to pass through to adopt
With FEM (focus exposure matrix, English spelling：Focus-Exposure-Matrix) mode of exposure is to Jiao
Face side-play amount is measured to determine optimal focal plane position, as shown in Figure 2 a, in FEM exposure process, is covered
Mould remains at fixed position, and under nominal exposure dosage, work stage is controlled at certain intervals by FLS
Vertically step motion；After silicon chip 2 is exposed at the certain altitude, step to when being exposed at next height,
For the exposure for avoiding current exposure mark covering last time is marked, work stage also moves a spacing in Y-direction simultaneously
From exposure matrix pattern 6 as shown in Figure 2 a is just formd after exposure on silicon chip 2；After developed, by
Mask in the micro- sem observation exposure matrix pattern 6 marks the image quality of pattern 7, as shown in Figure 2 b,
Obtain the optimal imaging position under the mark.
It follows that this kind of metering system for finding optimal focal plane, operation and to perform step more and must
Must could complete to survey school by multiple technological experiment, therefore how fast and accurately optimal focal plane to be offset
Amount is demarcated and compensated, and is those skilled in the art's technical problem urgently to be resolved hurrily.
The content of the invention
The present invention provides a kind of focal plane detection device, focal plane scaling method and silicon wafer exposure method, can be quick
And accurately optimal focal plane side-play amount is demarcated and compensated.
In order to solve the above technical problems, the present invention provides a kind of focal plane detection device, including：Light source cell,
For being irradiated generation imaging beam to mask plate, with focusing figure on the mask plate；Imaging unit,
For the pattern imaging that will focus in reflection unit and focusing image sensor；Focusing driver element, for hanging down
Complete to focus to projection objective or sports platform unit is adjusted；Sports platform unit, is provided with anti-
The reflection unit of mark is penetrated, the underface for the reflection unit to be moved to projection objective；Control unit,
It is analyzed and processes for the graph data to focusing imageing sensor collection, and feedback control focusing drives
Unit.
Preferably, the mask plate use can generate the digital mask of focusing figure or come with focusing
The entity mask plate of figure.
Preferably, the light source cell uses semiconductor laser, solid state laser or LED light source.
Preferably, the imaging unit includes：Collimation lens set, beam splitter, projection objective and focus into
As camera lens；The light source cell is irradiated generation imaging beam to mask plate, after collimated lens group collimation
To be focused through beam splitter and projection objective, light beam reflects pattern imaging simultaneously on reflection unit, the light after reflection
Beam reflexes to the focusing imaging lens through beam splitter, by the reflection mark on the picture and reflection unit of figure of focusing
Note is imaged on the focusing image sensor.
Preferably, the focusing image sensor uses area array CCD or CMOS.
Preferably, the reflection unit is level crossing or naked silicon chip with reflecrtive mark.
Preferably, the focusing driver element is for controlling the piezoelectric ceramics of the vertical movement of projection objective to pass
The vertical deviation regulating platform of sensor or carrying reflection unit.
A kind of method that focal plane is demarcated, using described focal plane detection device, including：Regulation sports platform unit
With focusing driver element to reflecrtive mark the blur-free imaging on focusing image sensor, record now reflection unit
The first vertical position；Reflection unit is moved down up to focusing figure blur-free imaging on focusing image sensor,
Record the second vertical position of now reflection unit；According to principle of reflection, optimum exposure position is determined.
Preferably, it is d to set the spacing between first, second vertical position, then optimum exposure position is the
At the d of two vertical positions lower section.
Preferably, the imaging non-overlapping copies of the reflecrtive mark and focusing figure on focusing image sensor.
A kind of silicon wafer exposure method, including：Step 1：By the focal plane described in claim any one of 8-10
Scaling method, carries out the measure of focal plane deviation, obtains first, second vertical position Z0、Z1Between spacing
The value of d；Step 2：Upper piece, light source cell is opened, carry out 3 points or more of global focusing and leveling in full sheet
And tilt quantity is determined；Step 3：Tilt quantity is substituted into the position coordinates of each exposure field on silicon chip, is calculated each
The theoretical defocusing amount Fi (i=0,1,2 ...) of exposure field；Step 4：I-th exposure field is stepped to, with Fi
It is scanning center, carries out continuous defocus and draw scanning curve, fits peak intensity positions as initially most
Good position of focal plane Za, step 5：Actual exposure optimum position under the visual field is Zb=Za+2d；Step 6：
Focus control is enabled, Z is stepped tobPosition, performs exposure process；Step 7：Make i=i+1, repeat step 4-6.
Compared with prior art, the present invention has advantages below：
1st, the present invention generates focusing figure by digitizing mask technique, and is installed by sports platform unit
Reflex reflector with reflecrtive mark, can focusing figure direct imaging on the focusing image detector；
2nd, the reflex reflector by being provided with reflecrtive mark of the invention, can be same on focusing image detector
When detect the focus plane information of system and the optimal focal plane information of projection objective；
3rd, the present invention is obtained by detector of focusing and can quickly measure silicon chip face position (i.e. reflection unit institute
In position) deviate the deviation of exposure optimal focal plane position, and with certainty of measurement well and measure weight
Renaturation.
Brief description of the drawings
Fig. 1 is FLS principle schematics in the prior art；
Fig. 2 a are the schematic diagram of silicon chip in the prior art；
Fig. 2 b are A portions enlarged drawing in Fig. 2 a；
Fig. 3 is the structural representation of focal plane detection device in the embodiment of the present invention 1；
Fig. 4 is the schematic diagram of focusing figure in the embodiment of the present invention 1；
Fig. 5 is focusing figure and imaging of the reflecrtive mark on projected image sensor in the embodiment of the present invention 1
Schematic diagram；
Fig. 6 is the imaging schematic diagram of reflecrtive mark in the embodiment of the present invention 1；
Fig. 7 is the imaging schematic diagram of focusing figure in the embodiment of the present invention 1；
Fig. 8 is focusing curve schematic diagram in the embodiment of the present invention 1；
Fig. 9 is the structural representation of focal plane detection device in the embodiment of the present invention 2；
Figure 10 is the structural representation of focal plane detection device in the embodiment of the present invention 3.
Specific embodiment
It is right below in conjunction with the accompanying drawings to enable the above objects, features and advantages of the present invention more obvious understandable
Specific embodiment of the invention is described in detail.It should be noted that, accompanying drawing of the present invention is using simplification
Form and use non-accurately ratio, be only used to conveniently, lucidly aid in illustrating the embodiment of the present invention mesh
's.
Embodiment 1
As shown in figure 3, the present embodiment provides a kind of focal plane detection device, including：Light source cell is (in figure not
Show), imaging unit, focusing driver element 109, sports platform unit 107 and control unit 110, wherein,
The light source cell is used to be irradiated mask plate 101 generation imaging beam, the upper band of the mask plate 101
There is focusing figure 101a；The imaging unit is used to for focusing figure 101a to be imaged on reflection unit 108 and adjusts
On burnt imageing sensor 106；The focusing driver element 109 is used for vertical regulation projection objective 104 with complete
Into focusing；The reflection unit 108 with reflecrtive mark 108a is provided with the sports platform unit 107, is used
In by the level of the reflection unit 108 to the underface for being moved to vertical direction projection objective 104；It is described
Control unit 110 is used to that the graph data of the focusing collection of imageing sensor 106 to be analyzed and processed, and
Feedback control focusing driver element 109.
Specifically, the use of the mask plate 101 can produce the digital mask of focusing figure 101a, the focusing
Figure 101a as shown in figure 3, including it is some focusing point 1011, it is described focusing point 1011 along X to and Y-direction
It is evenly distributed in the focusing graphic limit i.e. exposure field border 1012, is equal to but not office in the present embodiment
It is limited to 5 × 5 focusing points 1011, specifically can be according to actual conditions using the suitable focusing figure of digital mask generation
Shape 101a.
With continued reference to Fig. 3, the imaging unit includes：For collimate collimation lens set 102, beam splitter 103,
Projection objective 104 that numerical aperture and exposure resolution ratio match and with good optical property and suitable
The focusing imaging lens 105 of enlargement ratio.The light source cell is irradiated generation imaging to mask plate 101
Imaging beam with certain numerical value aperture is converted into directional light by beam, collimated lens group 102, and this is parallel
After light is through beam splitter 103 and projection objective 104, focusing figure 101a is imaged on reflection unit 108 simultaneously
Reflect, the light beam after reflection reflexes to the focusing imaging lens 105, the focusing through beam splitter 103
Focusing figure 101a and reflecrtive mark 108a is imaged on the focusing image sensor 106 by imaging lens 105
On.
Preferably, the reflection unit 108 has high reflectance, it can be the plane with reflecrtive mark
Mirror or naked silicon chip.The focusing driver element 109 is the pressure for controlling the vertical movement of projection objective 104
Electroceramics sensor.
The receiving terminal of the focusing image sensor 106 is conjugated with reflection unit 108, specifically, the tune
Burnt imageing sensor 106 uses area array CCD or CMOS, shows that numeral is covered simultaneously in focussing process
The picture and the picture of reflecrtive mark 108a of the focusing figure 101a on mould.
Described control unit 110 is used for the reception and treatment of imaging data, and generally using PC, it is integrated with
Data processing software, for calling specific focusing algorithm.Further, the focusing image sensor 106
After being collected into figure, in importing data to control unit 110 by Fast Ethernet, by control unit 110
Focussing signals are passed into focusing driver element 109 after data are analyzed with treatment, driver element 109 of focusing
Focusing task is moved and then completed according to focussing signals.
It should be noted that the figure of the reflecrtive mark 108a can be identical with the focusing figure 101a,
But picture non-overlapping copies of both pictures on the focusing image sensor 106.It is specific as shown in figure 5, its
In, thin shade focus 22 is the reflecrtive mark 108a of the upper surface of reflection unit 108 in focusing image sensor
Picture point on 106, shade focus 21 is the focusing point on focusing figure 101a in focusing image sensor
Picture point on 106, both of which is in the field range 23 of focusing image sensor 106.By respectively will be shallow
The half-tone information of tone focus 22 and shade focus 21 imports control unit 110, carries out Algorithm Analysis and controls
System focusing driver element 109 carries out vertical movement, and successively makes thin shade focus 22 and shade focus 21
The position of optimum image plane is adjusted to, the vertical amount of movement according to driver element 109 of being focused during this can be counted
Calculate optimal focal plane position.
The present invention also provides a kind of focal plane scaling method, and using above-mentioned focal plane detection device, it is specifically included：
As shown in Figure 6：Regulation sports platform unit 107 and focusing driver element 109 to reflecrtive mark 108a exist
Blur-free imaging on focusing image sensor 106, records the first vertical position Z of now reflection unit 1080；
As shown in Figure 7：Reflection unit 108 is moved down until focusing figure 101a is in focusing image sensor 106
Upper blur-free imaging, records the second vertical position Z of now reflection unit 1081；Specifically, reflection unit is worked as
108 are displaced downwardly to the second vertical position Z1When, focusing figure 101a be able to blur-free imaging, if now second vertical
Position Z1With the first vertical position Z0Spacing be d, the theoretical conjugate image institute of the figure 101a of now focusing is in place
Put same in the first vertical position Z0Place, but according to the principle of reflection of light, the actual conjugation of focusing figure 101a
The position of picture should be in the second vertical position Z1At the d distances of lower section, i.e. Z2It is optimum exposure position at position.
Therefore, after this focusing is completed, according to principle of reflection, it may be determined that optimum exposure position Z2It is focusing
During figure 101a blur-free imagings at the position of lower section d distances.
The present invention is by twice for the focusing of different object planes (mask plate 101 and reflection unit 108), you can
The purpose of demarcation measurement periodically to drift value Δ f is completed, this is with to carry out the target of FEM exposure experiments be consistent
, but the survey school time is substantially reduced, it is more feasible in maskless lithography system, in addition drift value
The stated accuracy of Δ f can be ensured that error is less than 300nm by focusing arithmetic accuracy completely.
Therefore, based on above-mentioned focal plane scaling method, the present invention also provides a kind of silicon wafer exposure method, specific bag
Include following steps：
Step 1：By above-mentioned focal plane scaling method, the measure of focal plane deviation is carried out, obtain first, second and hang down
To position Z0、Z1Between spacing d value, usually um magnitudes；
Step 2：Upper piece, open light source cell, full sheet carry out 3 points or more global focusing and leveling and
Tilt quantity Rx, Ry measure；
Step 3：Tilt quantity Rx, Ry are substituted into the position coordinates of each exposure field on silicon chip, calculate each exposure
The theoretical defocusing amount Fi (i=0,1,2 ...) of field；
Step 4：I-th exposure field is stepped to, with Fi as scanning center, continuous defocus is carried out and is drawn as schemed
Scanning curve shown in 8, fits peak intensity positions as initial optimal focal plane position Za,
Step 5：Actual exposure optimum position under the visual field is Zb=Za+2d；
Step 6：Focus control is enabled, Z is stepped tobPosition, performs exposure process；
Step 7：Make i=i+1, repeat step 4-6.
Embodiment 2
As shown in figure 9, the focusing driver element 109 in the present embodiment is using hanging down with vertical focusing action
To displacement regulating platform, described control unit 110 is connected directly to the vertical deviation regulating platform, and output is adjusted
Burnt controlled quentity controlled variable directly assigns vertical deviation regulating platform, and completing silicon chip as executive component with vertical deviation regulating platform hangs down
Acted to the precise displacement of position, in other words, the sports platform unit 107 in the present embodiment only fills reflection
108 water are put to move flat.
Embodiment 3
As shown in Figure 10, the digital mask in embodiment 1 is replaced using entity mask plate in the present embodiment, should
Entity mask plate selects transmission-type or reflection type mask plate 101, is carried by mask platform 101b.The reality
Focusing figure 101a on body mask plate is the IC integrated circuit technology figures of development to be exposed, and this figure can
Treatment is analyzed using the focusing algorithm and image processing system of specific control unit 110.
In sum, focal plane detection device of the invention, including：Light source cell, for mask plate 101
It is irradiated generation imaging beam；Imaging unit, for the focusing figure 101a on mask plate 101 to be imaged
On focusing image sensor 106；Focusing driver element 109, for vertical regulation projection objective 104 or
Sports platform unit 107 with complete focusing；Sports platform unit 107, is provided with reflecrtive mark 108a
Reflection unit 108, the sports platform unit 107 be used for the reflection unit 108 is moved to projection objective
104 underface；Control unit 110, is carried out for the graph data to the focusing collection of imageing sensor 106
Analysis and treatment, and feedback control focusing driver element 109.The present invention can fast and accurately to optimal burnt
Face side-play amount is demarcated and compensated.
Obviously, those skilled in the art can carry out various changes and modification without deviating from the present invention to invention
Spirit and scope.So, if it is of the invention these modification and modification belong to the claims in the present invention and its
Within the scope of equivalent technologies, then the present invention is also intended to including including these changes and modification.
Claims (11)
1. a kind of focal plane detection device, it is characterised in that including：
Light source cell, for being irradiated generation imaging beam to mask plate, with focusing on the mask plate
Figure；
Imaging unit, for the pattern imaging that will focus in reflection unit and focusing image sensor；
Focusing driver element, for vertical regulation projection objective or sports platform unit completing focusing；
Sports platform unit, is provided with the reflection unit with reflecrtive mark, for by the reflection unit
It is moved to the underface of projection objective；
Control unit, is analyzed and processes for the graph data to focusing imageing sensor collection, and instead
Feedback control focusing driver element.
2. focal plane detection device as claimed in claim 1, it is characterised in that the mask plate is using can
The digital mask for generating focusing figure or the entity mask plate for coming with focusing figure.
3. focal plane detection device as claimed in claim 1, it is characterised in that the light source cell is using half
Conductor laser, solid state laser or LED light source.
4. focal plane detection device as claimed in claim 1, it is characterised in that the imaging unit includes：
Collimation lens set, beam splitter, projection objective and focusing imaging lens；The light source cell is carried out to mask plate
Irradiation produces imaging beam, will be focused pattern imaging through beam splitter and projection objective after collimated lens group collimation
The light beam reflection simultaneously on reflection unit, the light beam after reflection reflexes to the focusing imaging lens through beam splitter,
Reflecrtive mark on the picture and reflection unit of figure of focusing is imaged on the focusing image sensor.
5. focal plane detection device as claimed in claim 1, it is characterised in that the focusing image sensor
Using area array CCD or CMOS.
6. focal plane detection device as claimed in claim 1, it is characterised in that the reflection unit be with
The level crossing of reflecrtive mark or naked silicon chip.
7. focal plane detection device as claimed in claim 1, it is characterised in that the focusing driver element is
For controlling the piezoceramic transducer of the vertical movement of projection objective or carrying the vertical deviation of reflection unit
Regulating platform.
8. a kind of method that focal plane is demarcated, using the focal plane as described in claim 1 to 7 any one
Device, it is characterised in that including：
Regulation sports platform unit and focusing driver element to reflecrtive mark on focusing image sensor it is clear into
Picture, records the first vertical position of now reflection unit；
Reflection unit is moved down until focusing figure blur-free imaging on focusing image sensor, records and now reflect
Second vertical position of device；
According to principle of reflection, optimum exposure position is determined.
9. focal plane scaling method as claimed in claim 8, it is characterised in that setting first, second is vertical
Spacing between position is d, then optimum exposure position is at the d of the second vertical position lower section.
10. focal plane scaling method as claimed in claim 8, it is characterised in that the reflecrtive mark and tune
Imaging non-overlapping copies of the burnt figure on focusing image sensor.
A kind of 11. silicon wafer exposure methods, it is characterised in that：Including
Step 1：By the focal plane scaling method described in claim any one of 8-10, focal plane deviation is carried out
Determine, obtain first, second vertical position Z0、Z1Between spacing d value；
Step 2：Upper piece, open light source cell, full sheet carry out 3 points or more global focusing and leveling and
Tilt quantity is determined；
Step 3：Tilt quantity is substituted into the position coordinates of each exposure field on silicon chip, the theory of each exposure field is calculated
Defocusing amount Fi (i=0,1,2 ...)；
Step 4：I-th exposure field is stepped to, with Fi as scanning center, continuous defocus is carried out and is drawn scanning
Curve, fits peak intensity positions as initial optimal focal plane position Za,
Step 5：Actual exposure optimum position under the visual field is Zb=Za+2d；
Step 6：Focus control is enabled, Z is stepped tobPosition, performs exposure process；
Step 7：Make i=i+1, repeat step 4-6.
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| CN112731773B (en) * | 2020-12-31 | 2024-04-16 | 中国科学院微电子研究所 | Electron beam exposure machine, focusing method and device |
| CN114518221A (en) * | 2022-03-16 | 2022-05-20 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Objective focal plane tilt value detection method and device based on exposure system |
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