CN111458991A - Focal length adjusting method suitable for photoetching machine - Google Patents

Focal length adjusting method suitable for photoetching machine Download PDF

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Publication number
CN111458991A
CN111458991A CN202010289792.4A CN202010289792A CN111458991A CN 111458991 A CN111458991 A CN 111458991A CN 202010289792 A CN202010289792 A CN 202010289792A CN 111458991 A CN111458991 A CN 111458991A
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CN
China
Prior art keywords
image
capturing device
image capturing
isp
photoetching machine
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010289792.4A
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Chinese (zh)
Inventor
王泽明
朱勤
邓超略
黄文斌
高尊虎
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Hunan Yinzhiming Intelligent Manufacturing Co ltd
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Hunan Yinzhiming Intelligent Manufacturing Co ltd
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Application filed by Hunan Yinzhiming Intelligent Manufacturing Co ltd filed Critical Hunan Yinzhiming Intelligent Manufacturing Co ltd
Priority to CN202010289792.4A priority Critical patent/CN111458991A/en
Publication of CN111458991A publication Critical patent/CN111458991A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026Focusing
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60Control of cameras or camera modules
    • H04N23/67Focus control based on electronic image sensor signals

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  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Studio Devices (AREA)

Abstract

The invention relates to the field of semiconductors, in particular to a focal length adjusting method suitable for a photoetching machine.

Description

Focal length adjusting method suitable for photoetching machine
Technical Field
The present invention relates to the field of semiconductor technology, and is especially focus regulating method for photoetching machine.
Background
As the critical dimensions of integrated circuits are made smaller and smaller, the integrated circuit industry is faced with more and more challenges, one of the important challenges being that the lithographic critical dimensions have approached the limit resolution of the lithography machine.
The control of the exposure parameters of the plate making machine of the photoetching machine to ensure that the optical system and the mechanical system are in good working states is one of the key elements for ensuring the imaging quality of the photoetching machine. A series of light sensitivity tests are required to determine the optimum exposure parameters for a particular litho machine and plate, including laser focus tests, zoom tests, laser power tests, and drum speed tests.
At present, the common focusing mode is that the focal length is roughly adjusted manually within a certain range, and the best focal length is found through plate making and manual testing after plate punching.
However, the low precision of manual operations and many variables result in wasted material and time and effort.
Disclosure of Invention
In order to solve the above problems, the present invention provides a focus adjusting method for a lithography machine, which aims to solve the problem of high material waste caused by low precision in the background art.
In order to achieve the purpose, the invention adopts the technical scheme that: a focus adjusting method for a lithography machine, comprising:
a preparation procedure, namely preparing an image capturing device, a linear module, a photoetching machine and an upper computer;
and a calibration procedure, wherein the image capturing device picks up a laser beam on the photoetching machine, the laser beam is mapped on a plate in the image capturing device and forms an image, and the upper computer receives a data signal of the image capturing device to obtain the image frequency and controls the linear module to finely adjust the position of the image capturing device so as to obtain the image frequency component with the highest image.
Further, the upper computer measures the density difference between adjacent pixels in the image through an ISP algorithm, and therefore the image with the highest image frequency is judged.
Furthermore, the image capturing device is a high-pixel camera.
The invention has the beneficial effects that:
a high-pixel mobile phone camera is adopted to collect an imaging picture formed by irradiating a laser beam on a plate, the image is analyzed by using an ISP algorithm in an upper computer, and a driving command is sent to a linear module according to the density difference between adjacent pixels in the image, so that the position of the mobile phone camera is always adjusted, the automatic focusing effect is realized, and a deviation value is adjusted.
Drawings
FIG. 1 is a flow chart of the use of the present invention.
Fig. 2 is a schematic diagram of the framework of an ISP system.
FIG. 3 is a block diagram of firmware in an ISP system.
Detailed Description
Referring to fig. 1, the present invention relates to a focus adjusting method for a lithography machine, comprising:
step S1: a preparation procedure, namely preparing an image capturing device, a linear module, a photoetching machine and an upper computer;
step S2: and a calibration procedure, wherein the image capturing device picks up a laser beam on the photoetching machine, the laser beam is mapped on a plate in the image capturing device and forms an image, and the upper computer receives a data signal of the image capturing device to obtain the image frequency and controls the linear module to finely adjust the position of the image capturing device so as to obtain the image frequency component with the highest image.
The use principle of the invention is as follows:
a high-pixel mobile phone camera is adopted to collect an imaging picture formed by irradiating a laser beam on a plate, the image is analyzed by using an ISP algorithm in an upper computer, and a driving command is sent to a linear module according to the density difference between adjacent pixels in the image, so that the position of a photoetching machine is always adjusted, the automatic focusing effect is realized, and a deviation value is adjusted.
It should be noted that, the upper computer has an ISP system, and when the viewfinder captures the most original image, the data of the image is transmitted to the ISP system as the original data, and at this time, the ISP system analyzes the original data to check the density difference between adjacent pixels in the image.
When the focusing of the original image is inaccurate, the adjacent pixel density is very close, and at this time, the ISP system appropriately adjusts the image to realize the automatic focusing, namely, the fact that the current mobile phone camera is far or near is known through an ISP algorithm, and then the mobile phone camera motor is adjusted to move forwards and backwards, so that the automatic focusing function is realized.
Referring to fig. 2, the ISP system includes ISP logic and firmware running on the ISP logic, as shown in the figure, after a lens projects a light signal to a photosensitive area of a sensor, the sensor performs photoelectric conversion, sends an original image in a Bayer format to the ISP logic, and the ISP logic performs algorithm processing to output an image in an RGB space domain to a video acquisition unit at a back end.
In the process, the ISP logic controls the ISP logic through firmware running on the ISP logic, so that the lens and the sensor are correspondingly controlled, and further, the functions of automatic aperture, automatic exposure, automatic white balance and the like are completed. Wherein the firmware is driven by the interruption of the video acquisition unit. And the photoetching machine console completes online image quality adjustment on the ISP through the network port or the serial port.
The ISP system consists of ISP logic and Firmware running on the ISP logic, and the logic unit can count the real-time information of the current image besides completing part of algorithm processing. The Firmware can achieve the purpose of automatically adjusting the image quality by acquiring the image statistical information of the ISP logic, recalculating and feedback-controlling the lens, the sensor and the ISP logic.
Referring to FIG. 3, the Firmware of ISP comprises three parts, one part is ISP control unit and basic algorithm library, one part is AE/AWB/AF algorithm library, and one part is sensor library. The basic idea of Firmware design is to provide a 3A algorithm library separately, an ISP control unit schedules a basic algorithm library and the 3A algorithm library, and a sensor library registers function call-back to the ISP basic algorithm library and the 3A algorithm library respectively so as to realize differentiated sensor adaptation.
The different sensors register control functions in the form of callback functions with the ISP algorithm library. When the ISP control unit schedules the basic algorithm library and the 3A algorithm library, the initialization parameters are obtained through the callback functions, the sensor is controlled, and exposure time, analog gain and digital gain are adjusted, and lens stepping focusing is controlled.
The automatic focusing algorithm is that the mobile phone camera is matched with the upper part to ensure that the contrast reaches the maximum.
In general, the autofocus technique obtains the highest image frequency component by adjusting the position of the camera of the focusing mobile phone, and obtains higher image contrast. The optimal focusing point is obtained through a continuous accumulation process, and the maximum contrast point in the mobile phone camera moving range is obtained by comparing the contrast of each frame of image, so that the focusing distance is determined.
And obtaining the highest image frequency component by adjusting the position of the focusing mobile phone camera. In general, a focused picture contains higher frequency components than a focused picture, i.e. the corresponding picture has a higher contrast. The optimal focusing point is obtained in a continuous accumulation process, and the maximum contrast point in the moving range of the mobile phone camera is obtained by comparing the contrast of each frame of image, so that the focusing distance is determined.
In this embodiment, the auto-focusing system uses a hill-climbing algorithm.
Further, the upper computer measures the density difference between adjacent pixels in the image through an ISP algorithm, and therefore the image with the highest image frequency is judged.
Furthermore, the image capturing device is a high-pixel camera.
The above embodiments are merely illustrative of the preferred embodiments of the present invention, and not restrictive, and various changes and modifications to the technical solutions of the present invention may be made by those skilled in the art without departing from the spirit of the present invention, and the technical solutions of the present invention are intended to fall within the scope of the present invention defined by the appended claims.

Claims (3)

1. A focus adjusting method for a lithography machine, comprising:
a preparation procedure, namely preparing an image capturing device, a linear module, a photoetching machine and an upper computer;
and a calibration procedure, wherein the image capturing device picks up a laser beam on the photoetching machine, the laser beam is mapped on a plate in the image capturing device and forms an image, and the upper computer receives a data signal of the image capturing device to obtain the image frequency and controls the linear module to finely adjust the position of the image capturing device so as to obtain the image frequency component with the highest image.
2. A method for adjusting focal length of a lithography machine according to claim 1, wherein: and the upper computer measures the density difference between adjacent pixels in the image through an ISP algorithm so as to judge the image with the highest image frequency.
3. A method of focus adjustment for a lithographic apparatus according to any of claims 1-2, wherein: the image capturing device is a high-pixel camera.
CN202010289792.4A 2020-04-14 2020-04-14 Focal length adjusting method suitable for photoetching machine Pending CN111458991A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010289792.4A CN111458991A (en) 2020-04-14 2020-04-14 Focal length adjusting method suitable for photoetching machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010289792.4A CN111458991A (en) 2020-04-14 2020-04-14 Focal length adjusting method suitable for photoetching machine

Publications (1)

Publication Number Publication Date
CN111458991A true CN111458991A (en) 2020-07-28

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202268957U (en) * 2011-11-04 2012-06-06 王兴国 Automatic focus control system for electric lens of digital video camera
CN106814546A (en) * 2015-11-30 2017-06-09 上海微电子装备有限公司 Focal plane detection device, focal plane scaling method and silicon wafer exposure method
JP6309922B2 (en) * 2009-08-10 2018-04-11 ディーエックスオー・ラボ Imaging system and imaging method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6309922B2 (en) * 2009-08-10 2018-04-11 ディーエックスオー・ラボ Imaging system and imaging method
CN202268957U (en) * 2011-11-04 2012-06-06 王兴国 Automatic focus control system for electric lens of digital video camera
CN106814546A (en) * 2015-11-30 2017-06-09 上海微电子装备有限公司 Focal plane detection device, focal plane scaling method and silicon wafer exposure method

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Application publication date: 20200728

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