CN111694226B - Levelness measuring method and direct imaging device - Google Patents
Levelness measuring method and direct imaging device Download PDFInfo
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- CN111694226B CN111694226B CN202010449731.XA CN202010449731A CN111694226B CN 111694226 B CN111694226 B CN 111694226B CN 202010449731 A CN202010449731 A CN 202010449731A CN 111694226 B CN111694226 B CN 111694226B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Abstract
The invention provides a levelness measuring method and a direct imaging device, wherein the method comprises the following steps: controlling a mobile platform of the direct imaging equipment to move along the vertical direction, focusing the mobile platform into a clear image at the position of an origin of the mobile platform, and acquiring a first focal plane height value of the mobile platform corresponding to the position of the origin; controlling the mobile platform to move at least one measuring position on a horizontal plane vertical to the vertical direction, and acquiring a second focal plane height value of the mobile platform corresponding to each measuring position when the mobile platform is focused into a clear image at the at least one measuring position; and determining the levelness of the mobile platform according to the second focal plane height value and the first focal plane height value. The levelness measuring method of the invention realizes the levelness measurement of the mobile platform by controlling the movement of the mobile platform, acquiring the vertical moving distance of the mobile platform and determining the height of the first focal plane and the height of the second focal plane.
Description
Technical Field
The invention relates to the technical field of imaging, in particular to a levelness measuring method and a direct-writing type imaging device.
Background
For the field of chip processing, especially for the manufacture of high precision chips, an imaging device is particularly important, the currently common imaging device is mainly a projection exposure device, the pattern of the projection exposure device is printed on a circuit board, the pattern is transferred onto a wafer with a surface covered with a photosensitive material such as photoresist by irradiating a reticle with ultraviolet light, a positive photoresist dissolves the photoresist of an exposed part through a chemical solution after exposure is completed, a negative photoresist dissolves the photoresist of an unexposed part through the chemical solution after exposure is completed, and the remaining photoresist which is not dissolved by the chemical solution is an image to be manufactured,
in the direct imaging equipment of laser, the ultraviolet light that the laser beam sent passes through spatial light modulator direct scan formation of image on photosensitive material with the exposure figure, again by exposure platform exposure processing, if exposure platform's levelness difference is great, then can influence the exposure effect, in order to prevent this kind of condition be usually fixed a micrometer on platform top crossbeam, moving platform to every measurement position, use the micrometer to measure the level of this position, the realization is to the measurement of platform levelness.
However, the micrometer has low measurement precision, large error and complex operation, and is difficult to meet the process requirements of a semiconductor equipment platform, thereby seriously affecting the process quality of products.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. To this end, an object of the present invention is to provide a levelness measuring method, which can improve the levelness measuring accuracy and measuring efficiency of a mobile platform of a direct imaging device.
A second object of the present invention is to provide a direct type image forming apparatus.
In order to achieve the above object, a first embodiment of the present invention provides a levelness measuring method for a direct imaging apparatus, the method including: controlling a moving platform of the direct imaging equipment to move along the vertical direction so as to focus an original point position of the moving platform into a clear image, and acquiring a first focal plane height value of the moving platform corresponding to the original point position; controlling the mobile platform to move at least one measuring position on a horizontal plane vertical to the vertical direction, focusing the mobile platform into a clear image at the at least one measuring position of the mobile platform, and acquiring a second focal plane height value of the mobile platform corresponding to each measuring position; and determining the levelness of the mobile platform according to the second focal plane height value and the first focal plane height value.
According to the levelness measuring method provided by the embodiment of the invention, the first focal plane height value of the mobile platform is obtained when the original point position of the mobile platform is focused, the mobile platform is controlled to move on the horizontal plane to determine at least one measuring position, the second focal plane height value of the mobile platform corresponding to the measuring position when the mobile platform is focused into a clear image at the measuring position is obtained, and the levelness of the mobile platform is determined according to the first focal plane height value and the second focal plane height value.
In some embodiments, before the moving platform controlling the direct imaging apparatus moves in the vertical direction, the levelness measuring method further includes: and controlling a pattern generator to project raster images at intervals of black and white squares onto the mobile platform.
In some embodiments, controlling the moving platform to move at least one measurement location in a horizontal plane comprises: and controlling the moving platforms to respectively move at a set 3 × 3 array position on a horizontal plane, wherein the origin position corresponds to a central position in the 3 × 3 array position, and the positions except the central position in the 3 × 3 array position are the measurement positions. The array-type movement can ensure that the measuring position is distributed all over the mobile platform, and the levelness detection accuracy is improved.
In some embodiments, said determining the levelness of the mobile platform from the second focal plane height value and the first focal plane height value comprises: calculating a height difference between the second focal plane height value and the first focal plane height value; the height difference value is a positive value, and the measurement position corresponding to the second focal plane height value is determined to be higher than the origin position; and determining that the measurement position corresponding to the second focal plane height value is lower than the origin position when the height difference value is a negative value.
In some embodiments, a substrate is placed on the moving platform, and the levelness of the substrate is less than or equal to 5 um. When the levelness of the substrate is less than or equal to 5mm for focusing, the camera can obtain a clear image on the surface of the substrate, so that the requirement is met.
In some embodiments, before controlling the moving platform of the direct imaging apparatus to move in the vertical direction, the levelness measuring method further includes: and controlling the adsorption device to start so as to adsorb and fix the substrate on the moving platform. The fixed substrate can prevent the position of the substrate from shifting when the mobile platform moves, and is favorable for ensuring the accuracy of the measurement result.
In order to achieve the above object, a second aspect of embodiments of the present invention proposes a direct type image forming apparatus including: the image light emitted by the pattern generator is projected on the mobile platform through the projection light path to form an image; the image acquisition device is used for acquiring image information formed on the mobile platform; and the controller is respectively connected with the mobile platform, the pattern generator and the image acquisition device and is used for executing the levelness measuring method in any one of the above embodiments.
According to the direct imaging device provided by the embodiment of the invention, the controller controls the mobile platform to move, when the image emitter emits image light to form images at the corresponding original point position and the measuring position through the projection light path, the image acquisition device acquires the image information, when the images are clear, the controller acquires the focal plane distance corresponding to each position, and the levelness of the mobile platform is automatically measured according to the deviation of the distance between the measuring position and the original point position.
In some embodiments, the mobile platform comprises: a platform; the horizontal driving mechanism is used for driving the platform to move on a horizontal plane vertical to the vertical direction; and the vertical driving mechanism is used for driving the platform to move along the vertical direction.
In some embodiments, the mobile platform further comprises: and the adsorption device is used for starting according to the adsorption instruction to adsorb and fix the substrate on the platform.
In some embodiments, the image generator includes a light source and a microlens array.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a flow chart of a levelness measurement method according to one embodiment of the present invention;
FIG. 2 is a schematic illustration of a mobile platform focus position according to one embodiment of the present invention;
FIG. 3 is a flow chart of a levelness measurement method according to another embodiment of the present invention;
fig. 4 is a schematic diagram of a direct type image forming apparatus according to an embodiment of the present invention.
Detailed Description
Embodiments of the present invention will be described in detail below, the embodiments described with reference to the drawings being illustrative, and the embodiments of the present invention will be described in detail below.
For the direct imaging device, the levelness of the moving platform has a great influence on the information of the projected image, for example, in the exposure process, because the focal depth of the exposure lens is very small, 20 times of the focal depth of the lens is about 5um, at this time, if the difference of the levelness of the moving platform is great, the exposure surface may not be in the focal depth range of the exposure lens, so that the phenomenon of exposure defocusing occurs, and the process quality of the product prepared by the direct imaging device is influenced.
In order to solve the above-described problems, a levelness measuring method according to an embodiment of the first aspect of the present invention is described below with reference to fig. 1 to 3. As shown in fig. 1, the levelness measuring method of the embodiment of the present invention includes at least step S1, step S2, and step S3.
And step S1, controlling the moving platform of the direct imaging device to move along the vertical direction, and acquiring a first focal plane height value when the moving platform is focused into a clear image at the position of the origin of the moving platform.
In an embodiment, the pattern generator emits imaging light, and projects the imaging light onto the moving platform or the substrate on the moving platform through the projection light path and the objective lens, for example, the imaging light is projected onto an origin position of the moving platform, for example, a position with coordinates of (0,0), at this time, the moving platform is controlled to move in the vertical direction, that is, the imaging focal length is adjusted, so as to project a clear image at the origin position of the moving platform, for example, projection image information on the moving platform may be collected by an image collection device, it is determined whether the image is focused clearly according to the image information, and when the image is focused clearly at the origin position of the platform, a moving distance of the moving platform in the vertical direction, that is, a Z-axis moving distance, that is, a height value of the first focal plane, is obtained. In the embodiment, the device projection lens is used as a reference, so that the debugging efficiency is greatly improved.
And step S2, controlling the mobile platform to move at least one measuring position on a horizontal plane vertical to the vertical direction, focusing the mobile platform into a clear image at the at least one measuring position of the mobile platform, and acquiring a second focal plane height value corresponding to each measuring position.
As shown in fig. 2, a horizontal plane perpendicular to the vertical direction may be a horizontal plane formed by an X axis and a Y axis, after determining the first focal plane height value, the moving platform is controlled to move on the horizontal plane, at least one measurement position, for example, a circle position in fig. 2, is determined, at this time, the projection light may be projected to the measurement position, the moving platform is controlled to move along the vertical direction, the image acquisition device acquires projection image information of the moving platform corresponding to the measurement position, and determines that the measurement position is focused into a clear image according to the acquired projection image information, a distance that the moving platform moves along the vertical direction, that is, a second focal plane height value of the moving platform corresponding to the measurement position is obtained, and the second focal plane height value of the moving platform corresponding to each measurement position is obtained with reference to the above measurement process.
And step S3, determining the levelness of the mobile platform according to the second focal plane height value and the first focal plane height value.
In the embodiment of the invention, the first focal plane height value and the second focal plane height value are both the moving height value of the mobile platform in the vertical direction, namely the Z axis, the first focal plane height value is taken as the reference focal plane height value, and when the platform levelness is measured, the height difference value between the second focal plane height value and the first focal plane height value is calculated, namely the levelness relation between the measurement position and the original position can be known, so that the height difference of the mobile platform at different positions can be measured, and the levelness of the mobile platform can be determined.
According to the levelness measuring method provided by the embodiment of the invention, the first focal plane height value of the mobile platform is obtained when the original point position of the mobile platform is focused, the mobile platform is controlled to move on the horizontal plane to determine at least one measuring position, the second focal plane height value of the mobile platform corresponding to the measuring position when the mobile platform is focused into a clear image at the measuring position is obtained, and the levelness of the mobile platform is determined according to the first focal plane height value and the second focal plane height value.
In some embodiments, before controlling the moving platform of the direct type image forming apparatus to move in the vertical direction, the levelness measuring method further includes: the control pattern generator projects the grid images at intervals of black and white grids onto the moving platform, the grid images at intervals of black and white grids are adopted, the moving platform is controlled to move, the measurement position can be determined conveniently, and the identification degree of the projected images can be improved.
In some embodiments, controlling the mobile platform to move the at least one measurement location in the horizontal plane comprises: and controlling the moving platforms to move at the set 3 x 3 array positions respectively on the horizontal plane, wherein the origin position corresponds to the central position in the 3 x 3 array positions, and the positions except the central position in the 3 x 3 array positions are measurement positions.
For example, as shown in fig. 2, a large circle in the figure is a moving platform, a square is a substrate, positions of small circles in the figure are focus position distributions, a position of a small circle at a central position in the figure is an origin position of the moving platform, positions of the remaining small circles are measurement positions, in a yellow light environment, positions near to an edge of the platform at the upper left, such as (75, -75) are taken as starting points, and focus at preset intervals along a horizontal plane where X-axis and Y-axis are located, as the data amount is large, a 3 × 3 array in fig. 2 is taken as an example, wherein, initially, the central position of the substrate corresponds to a projection light path projection position, the central position of the substrate can be determined as a coordinate representation (0,0) such as a coordinate representation, and the interval of 75mm is taken as an example, a 3 × 3 array position as shown in fig. 2 is obtained, and the measurement position coordinates correspond to (75, -75), (0, -75), (-75 ), (75, 0), (-75, 0), (75, 75), (0, 75), (-75, 75), and (75, 75), respectively, at each position of the 3 × 3 array, at which time the measurement is performed, the focusing is performed at the position of the origin to form a sharp image, the first focal plane distance is obtained, and further, the moving distance of the mobile platform in the vertical direction corresponding to each measurement position is obtained by positioning the measurement position and focusing the sharp image at each measurement position, and the second focal plane height value is determined. For example, the moving distance of the moving platform in the vertical direction corresponding to each measurement position is obtained, i.e. the second focal plane height values are 1.876mm, 1.852mm, 1.825mm, 1.85mm, 1.795mm, 1.826mm, 1.801mm and 1.775mm respectively.
In some embodiments, determining the levelness of the mobile platform from the second focal plane height value and the first focal plane height value comprises: calculating a height difference value between the second focal plane height value and the first focal plane height value; the height difference value is a positive value, and the measurement position corresponding to the second focal plane height value is determined to be higher than the original position; and determining that the measurement position corresponding to the second focal plane height value is lower than the origin position when the height difference value is a negative value.
In an embodiment, the moving distance of the moving platform in the vertical direction at the origin position, for example (0,0) point, is obtained as a first focal plane height value, for example 1.82mm, and the height difference values of the second focal plane height value and the first focal plane height value are respectively 0.056mm, 0.032mm, 0.005mm, 0.03mm, -0.025mm, 0.006mm, -0.019mm, -0.045mm, wherein when the height difference value is a positive value, it is indicated that the measurement position is higher than the origin position; when the height difference value is negative, the measurement position is lower than the original point position, the height difference of different positions of the platform is measured by calculating the difference value of the first focal plane height value and the second focal plane height value, and the levelness measurement of the mobile platform is realized.
In an embodiment, the image may be focused directly on the moving platform, for example, at a position without a groove or a concave hole on the surface of the moving platform; substrate focusing can also be used, the substrate flatness ≦ 5um and an image capture device such as a camera can capture a sharp image on the substrate surface while focusing. In some embodiments, a substrate is placed on the moving platform, and the levelness of the substrate is less than or equal to 5 um.
Further, for the case of employing substrate focusing, in some embodiments, the adsorption device is controlled to be activated to adsorb and fix the substrate on the moving platform of the direct type imaging apparatus before the moving platform is controlled to move in the vertical direction. The fixed substrate can prevent the substrate from shifting when the mobile platform moves, and is favorable for ensuring the accuracy of the measuring result.
The method for measuring levelness according to an embodiment of the present invention is described in detail below with reference to fig. 3, which is a flowchart of a method for measuring levelness according to another embodiment of the present invention, as shown in fig. 3.
Step S21, placing the substrate on the moving platform.
And step S22, absorbing and fixing the substrate on the movable platform.
Step S23, focus into sharp image at the origin position.
And step S24, controlling the moving platforms to move to the set 3 × 3 array positions on the horizontal plane respectively.
In step S25, the moving distance of the moving platform in the vertical direction each time it is focused into a clear image is recorded.
And step S26, determining the levelness of the mobile platform according to the difference of the moving distances.
In summary, according to the levelness measuring method of the embodiment of the present invention, when the mobile platform is located at the origin position, the mobile platform is controlled to move in the vertical direction to obtain a clear image gathered at the origin position of the mobile platform, the moving distance of the mobile platform in the vertical direction is used as a first focal plane height value, the mobile platform is continuously controlled to move in the horizontal plane to determine at least one measuring position, the measuring position is obtained to be focused into a clear image, the moving distance of the mobile platform in the vertical direction at the measuring position is used as a second focal plane height value, the levelness of the mobile platform can be determined by the first focal plane height value and the second focal plane height value, and the above processes can be automatically implemented, compared with the measurement of a micrometer, the measuring method does not need human reading, has higher measuring result precision, smaller error, and is simple to operate, and is beneficial to improving the measuring efficiency, through the measurement of the levelness of the movable platform, the phenomenon of defocusing during exposure due to the fact that the exposure surface is not in the focal depth range can be avoided.
A direct type image forming apparatus according to an embodiment of the second aspect of the present invention is described below with reference to the drawings.
Fig. 4 is a schematic diagram of a direct imaging apparatus according to an embodiment of the present invention, and as shown in fig. 4, a direct imaging apparatus 10 according to an embodiment of the present invention includes a movable platform 11, a pattern generator 12, a projection optical path 13, and a projection objective lens 14, wherein an image emitted from the pattern generator 12 is projected on the movable platform 11 via the projection optical path 13 to form an image; the image acquisition device 15 is used for acquiring image information formed on the mobile platform 11; the controller is connected to the mobile platform 11, the pattern generator 12 and the image acquisition device 15, respectively, for performing any of the levelness measuring methods mentioned in the above embodiments.
In this embodiment, the pattern generator 12 emits imaging light, the imaging light passes through the projection light path 13 and the projection objective 14 to form a projection pattern on the mobile platform 11, the controller controls the mobile platform 11 to move in the vertical direction, the projection pattern is focused into a clear image at the position of the origin, the image acquisition device 15 acquires the focused clear image, and the distance of the mobile platform 11 in the vertical direction obtained at this time is the first focal plane height value; and then the controller is used for controlling the moving platform 11 to move on a horizontal plane vertical to the vertical direction, at least one measuring position is moved, the moving platform 11 is controlled to move along the vertical direction at the measuring position, the image acquisition device 15 obtains clear imaging at the measuring position, the distance of the moving platform 11 along the vertical direction is a second focal plane height value, and the levelness of the moving platform is determined by comparing the heights of the first focal plane height value and the second focal plane height value along the vertical direction of the platform. According to the direct imaging device 10 of the embodiment of the invention, the controller controls the moving platform 11 to move, when the image emitter 12 emits image light to form images at the corresponding original point position and the measuring position through the projection light path 13, the image acquisition device 15 acquires the image information, when the images are clear, the controller acquires the focal plane distance corresponding to each position, and the levelness of the moving platform 11 is automatically measured according to the deviation of the distance between the measuring position and the original point position.
In some embodiments, the mobile platform 11 includes a platform, a horizontal driving mechanism for driving the platform to move in a horizontal plane perpendicular to the vertical direction, and a vertical driving mechanism; the vertical driving mechanism is used for driving the platform to move along the vertical direction. The controller is connected with the mobile platform, and is used for driving the platform to move and position the measuring position in the horizontal direction and controlling the mobile platform to move in the vertical direction at the measuring position by controlling the horizontal driving mechanism and the vertical driving mechanism to move so as to acquire the height value of the focal plane.
In some embodiments, the movable platform 11 further comprises a suction device, which is activated according to the suction instruction to suck and fix the substrate on the platform. The substrate is fixed on the movable platform 11 through the adsorption device, so that the position of the substrate can be prevented from deviating when the movable platform moves, and the accuracy of a measuring result can be ensured.
In some embodiments, image generator 12 includes a light source and a microlens array. And turning on a light source, and turning on the micro-lens array to enable the image light to be projected on the mobile platform through the projection light path.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example.
While embodiments of the invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (10)
1. A levelness measuring method for a direct type imaging apparatus, characterized by comprising:
controlling a moving platform of the direct imaging equipment to move along the vertical direction, focusing the moving platform at the position of an origin of the moving platform into a clear image, and acquiring a first focal plane height value of the moving platform corresponding to the position of the origin;
controlling the mobile platform to move at least one measuring position on a horizontal plane vertical to the vertical direction, and acquiring a second focal plane height value of the mobile platform corresponding to each measuring position when the mobile platform is focused into a clear image at the at least one measuring position;
and determining the levelness of the mobile platform according to the second focal plane height value and the first focal plane height value.
2. The levelness measuring method according to claim 1, wherein before the moving platform that controls the direct type imaging apparatus moves in the vertical direction, the levelness measuring method further comprises:
and controlling a pattern generator to project raster images at intervals of black and white squares onto the mobile platform.
3. The levelness measuring method of claim 2, wherein controlling the moving platform to move at least one measuring position in a horizontal plane comprises:
and controlling the moving platforms to respectively move at a set 3 × 3 array position on a horizontal plane, wherein the origin position corresponds to a central position in the 3 × 3 array position, and the positions except the central position in the 3 × 3 array position are the measurement positions.
4. The method of claim 1, wherein determining the levelness of the mobile platform from the second focal plane height value and the first focal plane height value comprises:
calculating a height difference between the second focal plane height value and the first focal plane height value;
the height difference value is a positive value, and the measurement position corresponding to the second focal plane height value is determined to be higher than the origin position;
and determining that the measurement position corresponding to the second focal plane height value is lower than the origin position when the height difference value is a negative value.
5. The levelness measuring method according to claim 1, wherein a substrate is placed on the moving platform, and the levelness of the substrate is less than or equal to 5 um.
6. The levelness measuring method according to claim 5, wherein before controlling the moving platform of the direct type imaging apparatus to move in the vertical direction, the levelness measuring method further comprises:
and controlling the adsorption device to start so as to adsorb and fix the substrate on the moving platform.
7. A direct type image forming apparatus, characterized by comprising:
the image light emitted by the pattern generator is projected on the mobile platform through the projection light path to form an image;
the image acquisition device is used for acquiring image information formed on the mobile platform;
a controller connected to the mobile platform, the pattern generator and the image acquisition device, respectively, for performing the levelness measuring method of any one of claims 1 to 6.
8. The direct imaging apparatus of claim 7, wherein the mobile platform comprises:
a platform;
the horizontal driving mechanism is used for driving the platform to move on a horizontal plane vertical to the vertical direction;
and the vertical driving mechanism is used for driving the platform to move along the vertical direction.
9. The direct imaging apparatus of claim 8, wherein the mobile platform further comprises:
and the adsorption device is used for starting according to the adsorption instruction to adsorb and fix the substrate on the platform.
10. Direct imaging device according to any of claims 7 to 9, characterized in that the pattern generator comprises a light source and a micro lens array.
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| US5991007A (en) * | 1997-05-23 | 1999-11-23 | Mitsubishi Denki Kabushiki Kaisha | Step and scan exposure system and semiconductor device manufactured using said system |
| TW401587B (en) * | 1998-10-02 | 2000-08-11 | United Microelectronics Corp | Method for monitoring the dosage/focus/leveling |
| CN1434932A (en) * | 2000-10-19 | 2003-08-06 | 克雷奥以色列有限公司 | Nonlinear image distortion correction in printed circuit board manufacturing |
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