CN106746735A - 一种绿色基调的低辐射镀膜玻璃及其制备方法 - Google Patents
一种绿色基调的低辐射镀膜玻璃及其制备方法 Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 70
- 230000005855 radiation Effects 0.000 title claims abstract description 27
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 8
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 36
- 230000001681 protective effect Effects 0.000 claims description 14
- 238000004544 sputter deposition Methods 0.000 claims description 13
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 239000010955 niobium Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 239000005329 float glass Substances 0.000 claims description 4
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 4
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 8
- 239000011787 zinc oxide Substances 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 230000002262 irrigation Effects 0.000 abstract 1
- 238000003973 irrigation Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 52
- 239000010408 film Substances 0.000 description 9
- 238000005546 reactive sputtering Methods 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000021384 green leafy vegetables Nutrition 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000005344 low-emissivity glass Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
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- C03C2218/10—Deposition methods
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Abstract
本发明公开了一种绿色基调的低辐射镀膜玻璃及其制备方法,包括第一玻璃基板,其技术方案要点是:所述第一玻璃基板上依次设有ITO层、Nb2O5层、第一AZO层、Ag层、第二AZO层、TIOx层和Si3N4层。本发明的一种绿色基调的低辐射镀膜玻璃,传热系数低,遮阳效果好,有效阻止热能透过玻璃进入室内,降低了生产成本。本发明提供一种绿色基调的低辐射镀膜玻璃的制备方法。
Description
【技术领域】
本发明涉及一种镀膜玻璃,具体涉及一种绿色基调的低辐射镀膜玻璃及其制备方法。
【背景技术】
镀膜玻璃具有节能减排及装饰幕墙的双重功效,推出市场后,深受人们喜爱,目前市场上的绿色基调的低辐射镀膜玻璃,多用绿玻基片镀膜,用绿色基片镀膜,一方面成本高,另一方面绿色玻璃本身会吸热,不利于节能降温。
【发明内容】
本发明的一种绿色基调的低辐射镀膜玻璃,传热系数低,遮阳效果好,有效阻止热能透过玻璃进入室内,降低了生产成本。
本发明另一目的是提供一种绿色基调的低辐射镀膜玻璃的制备方法。
本发明是通过以下技术方案实现的:
一种绿色基调的低辐射镀膜玻璃,包括第一玻璃基板,所述第一玻璃基板上依次设有ITO层、Nb2O5层、第一AZO层、Ag层、第二AZO层、TIOx层和Si3N4层。
优选的,所述ITO层为磁控溅射氧化铟锡靶(In2O3:SnO2=90:10(wt%)),交流电源溅射,用Ar气作为溅射气体,气体流量800SCCM,膜厚120~135nm,方阻<15欧。
优选的,所述Nb2O5层为磁控溅射铌靶,交流电源反应溅射,用Ar气、O2作为溅射气体,气体流量400SCCM:800SCCM,膜厚20~50nm。
优选的,所述第一AZO层和第二AZO层,均为磁控溅射掺铝氧化锌靶(ZnO:Al=92:8(wt%)),交流电源反应溅射,用Ar气、O2作为溅射气体,气体流量1000SCCM:40SCCM,膜厚300~500nm。
优选的,所述Ag层,磁控溅射Ag层,直流电源溅射,用Ar气作为溅射气体,气体流量500~550SCCM,膜厚3~5nm。
优选的,所述TIOx层,磁控溅射氧化钛靶,交流电源溅射,用Ar气、O2作为溅射气体,气体流量1000SCCM:40SCCM,膜厚20-35nm。
优选的,所述Si3N4层,磁控溅射硅铝靶(Si:Al=92:8(wt%)),交流电源溅射,用Ar气、O2作为溅射气体,气体流量400SCCM:600SCCM,膜厚50~85nm。
优选的,所述第一玻璃基板为厚度为4-8mm的浮法玻璃。
一种制备绿色基调的低辐射镀膜玻璃的方法,包括以下步骤:
A:选择4~8mm玻璃基片,按预定尺寸用切割机进行切割,用清洗机对玻璃基片进行清洗;
B:将玻璃基片送入镀膜室磁控溅射ITO层,用交流电源、Ar气作为保护气体,磁控溅射氧化铟锡靶(In2O3:SnO2=90:10(wt%)),用Ar气流量800SCCM,在玻璃基片上溅射120~135nm的ITO层;
C:继续磁控溅射Nb2O5层,用交流电源,Ar气、O2作为保护气体,磁控溅射铌靶,用Ar和O2气体流量400SCCM:800SCCM,溅射20~50nm的Nb2O5层;
D:继续磁控溅射第一AZO层,用交流电源,Ar气、O2作为保护气体,磁控溅射铝氧化锌靶(ZnO:Al=92:8(wt%)),用Ar和O2气体流量1000SCCM:40SCCM,溅射300~500nm的第一AZO层;
E:继续磁控溅射Ag层,用直流电源,Ar气作为保护气体,磁控溅射,用Ar气体流量500~550SCCM,溅射3~5nm的Ag层;
F:继续磁控溅射第二AZO层,用交流电源,Ar气、O2作为保护气体,磁控溅射铝氧化锌靶(ZnO:Al=92:8(wt%)),用Ar和O2气体流量1000SCCM:40SCCM,溅射300~500nm的第二AZO层;
G:继续磁控溅射TIOx层,用交流电源,Ar气、O2作为保护气体,磁控溅射氧化钛靶,用Ar和O2气体流量1000SCCM:40SCCM,溅射20~35nm的TIOx层;
H:继续磁控溅射Si3N4层,用交流电源,Ar气、O2作为保护气体,磁控溅射硅铝靶(Si:Al=92:8(wt%)),用Ar和O2气体流量400SCCM:600SCCM,溅射50~85nm的Si3N4层。
与现有技术相比,本发明具有如下优点:
1、本发明的一种绿色基调的低辐射镀膜玻璃,辐射率可至0.08,a*=-8~-9,b*=+3~+1,为一种翡翠绿色镀膜玻璃,克服了现有绿色低辐射镀膜玻璃通常采用大量绿色本体着色浮法玻璃基片,生产成本昂贵,生产效率低的缺陷,生产成本低廉,利于低辐射玻璃的推广使用;
2、本发明的绿色基调的低辐射镀膜玻璃制备方法,功能膜层依次沉积在玻璃基片上,膜层具有耐候性和耐腐蚀性能优秀、辐射率低、表面电阻小、均匀性好、结合力强的优点。
【附图说明】
图1是本发明结构示意图。
【具体实施方式】
如附图1所示的一种高红外反射镀膜玻璃,包括玻璃基片1,所述玻璃基片1上依次设有ITO层2、Nb2O5层3、第一AZO层4、Ag层5、第二AZO层6、TIOx层7和Si3N4层8。本发明的玻璃由一块玻璃基片及多层镀层复合而成,呈现一种翡翠绿色镀膜玻璃,辐射率可至0.08,a*=-8~-9,b*=+3~+1,每边的玻璃基板均由多个膜层构成,成本低廉,有效隔绝热源透过玻璃进入室内,实现节能的效果。
所述ITO层2膜厚120~135nm,方阻<15欧,为磁控溅射氧化铟锡靶In2O3:SnO2=90:10(wt%),交流电源溅射,用Ar气作为溅射气体,气体流量800SCCM。
所述Nb2O5层3膜厚20~50nm,为磁控溅射铌靶,交流电源反应溅射,用Ar气、O2作为溅射气体,气体流量400SCCM:800SCCM。用以提高膜层折射率,提高透过率。
所述第一AZO层4和第二AZO层6,均为膜厚300~500nm,磁控溅射掺铝氧化锌靶ZnO:Al=92:8(wt%),交流电源反应溅射,用Ar气、O2作为溅射气体,气体流量1000SCCM:40SCCM。用以降低红外的透过率。
所述Ag层5膜厚3~5nm,磁控溅射Ag层,直流电源溅射,用Ar气作为溅射气体,气体流量500~550SCCM。作为功能层,有效反射红外线。
所述TIOx层7膜厚20~35nm,磁控溅射氧化钛靶,交流电源溅射,用Ar气、O2作为溅射气体,气体流量1000SCCM:40SCCM。使外层具有高折射率,从而实现高的透过率,并且使膜层具有耐磨、耐腐蚀。
所述Si3N4层8,磁控溅射硅铝靶Si:Al=92:8(wt%),交流电源溅射,用Ar气、O2作为溅射气体,气体流量400SCCM:600SCCM,膜厚50~85nm。该层使镀膜层具有较高的机械性能。
所述玻璃基片1为厚度为4~8mm的浮法玻璃。
结合实施例具体说明本发明的一种制备绿色基调的低辐射镀膜玻璃的方法:
实施例1-4
一种制备绿色基调的低辐射镀膜玻璃的方法,包括以下步骤:
A:选择玻璃基片,按预定尺寸用切割机进行切割,用清洗机对玻璃基片进行清洗;
B:将玻璃基片送入镀膜室磁控溅射各镀层,具体参数如表1:
表1:
上述实施例所得的绿色基调的低辐射镀膜玻璃,按照GB/T18915.2-2002《镀膜玻璃第2部分:低辐射镀膜玻璃》标准对实施例1-4制得的玻璃进行光学性能的测定,测试结果如表2所示:
表2:
实施例1 | 实施例2 | 实施例3 | 实施例4 | |
可见光透过率(%) | 65 | 68 | 70 | 70 |
玻璃面反射亮度L*值 | 73 | 70 | 69 | 72 |
玻璃面反射颜色a*值 | -8.02 | -7.8 | -8.5 | -9.0 |
玻璃面反射颜色b*值 | +3 | +2.5 | +2 | +1 |
辐射率% | 0.07 | 0.08 | 0.09 | 0.1 |
功能膜层依次沉积在玻璃基片上,膜层具有耐磨性和耐腐蚀性能,较高折射率和透过率,产品成本低廉。
Claims (9)
1.一种绿色基调的低辐射镀膜玻璃,其特征在于:包括玻璃基片(1),所述玻璃基片(1)上依次设有ITO层(2)、Nb2O5层(3)、第一AZO层(4)、Ag层(5)、第二AZO层(6)、TIOx层(7)和Si3N4层(8)。
2.根据权利要求1所述的一种绿色基调的低辐射镀膜玻璃,其特征在于:所述ITO层(2)膜厚120~135nm,方阻<15欧。
3.根据权利要求1所述的一种绿色基调的低辐射镀膜玻璃,其特征在于:所述Nb2O5层(3)膜厚20~50nm。
4.根据权利要求1所述的一种绿色基调的低辐射镀膜玻璃,其特征在于:所述第一AZO层(4)和第二AZO层(6)膜厚均为300~500nm。
5.根据权利要求1所述的一种绿色基调的低辐射镀膜玻璃,其特征在于:所述Ag层(5)膜厚3~5nm。
6.根据权利要求1所述的一种绿色基调的低辐射镀膜玻璃,其特征在于:所述TIOx层(7)膜厚20~35nm。
7.根据权利要求1所述的一种绿色基调的低辐射镀膜玻璃,其特征在于:所述Si3N4层(8)膜厚50~85nm。
8.根据权利要求1所述的一种绿色基调的低辐射镀膜玻璃,其特征在于:所述玻璃基片(1)为厚度为4~8mm的浮法玻璃。
9.一种制备绿色基调的低辐射镀膜玻璃的方法,其特征在于包括以下步骤:
A:选择4~8mm玻璃基片,按预定尺寸用切割机进行切割,用清洗机对玻璃基片进行清洗;
B:将玻璃基片送入镀膜室磁控溅射ITO层,用交流电源、Ar气作为保护气体,磁控溅射氧化铟锡靶(In2O3:SnO2=90:10(wt%)),用Ar气流量800SCCM,在玻璃基片上溅射120~135nm的ITO层;
C:继续磁控溅射Nb2O5层,用交流电源,Ar气、O2作为保护气体,磁控溅射铌靶,用Ar和O2气体流量400SCCM:800SCCM,溅射20~50nm的Nb2O5层;
D:继续磁控溅射第一AZO层,用交流电源,Ar气、O2作为保护气体,磁控溅射铝氧化锌靶(ZnO:Al=92:8(wt%)),用Ar和O2气体流量1000SCCM:40SCCM,溅射300~500nm的第一AZO层;
E:继续磁控溅射Ag层,用直流电源,Ar气作为保护气体,磁控溅射,用Ar气体流量500~550SCCM,溅射3~5nm的Ag层;
F:继续磁控溅射第二AZO层,用交流电源,Ar气、O2作为保护气体,磁控溅射铝氧化锌靶(ZnO:Al=92:8(wt%)),用Ar和O2气体流量1000SCCM:40SCCM,溅射300~500nm的第二AZO层;
G:继续磁控溅射TIOx层,用交流电源,Ar气、O2作为保护气体,磁控溅射氧化钛靶,用Ar和O2气体流量1000SCCM:40SCCM,溅射20~35nm的TIOx层;
H:继续磁控溅射Si3N4层,用交流电源,Ar气、O2作为保护气体,磁控溅射硅铝靶(Si:Al=92:8(wt%)),用Ar和O2气体流量400SCCM:600SCCM,溅射50~85nm的Si3N4层。
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