CN106707392B - Colored filter and its thicknesses of layers measurement method - Google Patents
Colored filter and its thicknesses of layers measurement method Download PDFInfo
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- CN106707392B CN106707392B CN201611112185.0A CN201611112185A CN106707392B CN 106707392 B CN106707392 B CN 106707392B CN 201611112185 A CN201611112185 A CN 201611112185A CN 106707392 B CN106707392 B CN 106707392B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Filters (AREA)
Abstract
A kind of colored filter and its thicknesses of layers measurement method, colored filter have viewing area and the non-display area around display area, further includes: substrate；Transparent organic thin film layer, the transparent organic thin film layer whole face are covered on the first surface of the substrate；And film thickness detection structure, it is set to the non-display area, at least one measured hole is provided in the film thickness detection structure, the part of the substrate first surface is exposed from least one measured hole, part first surface to expose measures the second surface of the transparent organic layer to the thickness of the first surface as benchmark.By film thickness measuring structure setting in the designated position of substrate, and at least one measured hole is formed by laser aid, realize the purpose of automatic measurement, improves the accuracy and measurement efficiency of measurement result.
Description
Technical field
The present invention relates to the manufacturing methods of colored filter, especially in regard to a kind of thicknesses of layers measurement side of colored filter
Method.
Background technique
With becoming increasingly popular for LCD products, liquid crystal display device, which has become, occupies weight in information and electronics industry
The basic device of status is wanted, liquid crystal display has evolved into a huge industry, and colored filter is liquid crystal display
Important a part in structure, to realize colored display.
The colored filter used in the flat-panel monitors such as liquid crystal display, usually by being printed on transparent substrate
Brush, coating or photoetching process form candy strip, and candy strip and each pixel of liquid crystal display correspond, wherein striped
Pattern includes: red (R), green (G) and blue (B) ink.
Fig. 1 is the top view of existing colored filter；Fig. 2 is region A in Fig. 1 along dotted line a diagrammatic cross-section.Such as Fig. 1
Shown, colored filter 10 includes transparent substrate 11, chromatic filter layer 13 and black matrix" 14, wherein black matrix" 14 is to draw
Divide each pixel；Chromatic filter layer 13 includes being arranged successively and forming the red filter area 13R of strip pattern, green filter area 13G
And blue filter 13B.
After red filter area 13R, green filter area 13G and blue filter 13B form candy strip, all certainly due to ink
The surface tension of body when so that it being formed as striped, be easy to cause two end sides high, and the shape low in central portion, therefore, as
The rough surface that the surface of the ink layer of above-mentioned candy strip aggregate occurs.And rough surface is in the presence of as follows
Problem: 1) causing the diffusing reflection of light, and the contrast of display reduces；2) response of liquid crystal occurs not in liquid crystal display-driving
, display is abnormal.
As the trial for the height for reducing rough surface portion, formed in the whole surface of colored filter saturating
Bright organic thin film layer 12.In order to which whether the surface for accurately obtaining colored filter 10 is flat, need to measure colored filter 10
On thicknesses of layers.
Existing thicknesses of layers measurement method illustrates colored filter by taking the thickness of surface profiler (profiler) measurement film as an example
Thicknesses of layers measurement process on photopolymer substrate 10.As shown in Fig. 1 and Fig. 2, firstly, in selection region on colored optical filtering substrates 10
A, and remove the partially transparent organic thin film layer 12 in the A of region and form measured hole 15, wherein substrate 11 can reveal in measurement hole 15
Out；Secondly, by the surface of substrate 11 in the probe contact measurement hole 15 of surface profiler (profiler)；Then, so that surface
The probe of contourgraph (profiler) is moved to the surface of transparent organic thin film layer 12, and along the longitudinal direction of substrate 11, to
The standardized straight line in the edge of substrate 11 measures transparent organic film on the basis of the surface for exposing substrate 11 in measurement hole 15
The thickness and TR, transparent organic thin film layer 12 and black of the thickness T1 of floor 12, transparent organic thin film layer 12 and red filter area 13R
The thickness TB of matrix 14.Wherein, the mode of formation measured hole 15 is directly struck off partially transparent organic on substrate 11 by operator
Film layer 12, however, usually will cause during operator strikes off partially transparent organic thin film layer 12, it is transparent organic thin
The scratch of the chromatic filter layer 13, black matrix" 14 and substrate 11 of the lower section of film layer 12, in turn result in colored filter 10 scrap or
Person needs complementary color.Further, since the individual difference of operator, is unable to control the forming position (no fixed position) and power of measured hole
Road causes the unstable of measurement.Therefore, the method for measuring the thicknesses of layers of colorized optical filtering on piece needs to improve.
Summary of the invention
The present invention provides a kind of new colored filter and its thicknesses of layers measurement method, in the prior art can not with overcoming
The problem of thicknesses of layers of automatic measurement colorized optical filtering on piece.Colored filter of the invention has viewing area and around aobvious
Show the non-display area in region, the colored filter further include: substrate；Transparent organic thin film layer, the transparent organic thin film layer whole face
It is covered on the first surface of the substrate；And film thickness detection structure, it is set to the non-display area, in the film thickness detection structure
It is provided at least one measured hole, the part of the substrate first surface is exposed from least one measured hole, with exposure
The first surface of part out measures the second surface of the transparent organic layer to the thickness of the first surface as benchmark.
Optionally, which includes auxiliary chromatic filter layer, which includes the first color blocking
Unit and the second color blocking unit, the first color blocking unit include the first red color resistance, the first green color blocking and the first blue color blocking, the
Two color blocking units include the white space of not set color blocking.
Optionally, which fills the transparent organic thin film layer.
Optionally, which is set to the white space.
Optionally, which further includes black matrix", the black matrix" position auxiliary chromatic filter layer with should
Between substrate, at least one measured hole be using the laser irradiation colored filter remove part the transparent organic thin film layer,
Partially the auxiliary chromatic filter layer, the part black matrix" or combinations thereof are formed.
Optionally, the film thickness detection structure is after forming at least one measured hole, and the auxiliary chromatic filter layer is at least
The color blocking unit constituted including red, green and blue color blocking.
Optionally, which is the surface of the transparent organic thin film layer far from the first surface.
Optionally, which is flatness layer, and the colored filter is made to have flat surface.
The present invention also provides a kind of measurement method of the thicknesses of layers of colorized optical filtering on piece, which includes following step
It is rapid: to provide colored filter, the first surface whole face of the substrate of the colored filter covers transparent organic thin film layer, film thickness measuring
Structure forms the non-display area of the colored filter and between the transparent organic thin film layer and the substrate, the film thickness measuring knot
Structure has white space；In forming at least one measured hole on the white space, so that the first surface of the part substrate certainly should
It is exposed at least one measured hole；The contact type probe of controlling profile measuring instrument contacts the first surface；And control contact
Formula probe is moved to the second surface of the transparent organic thin film layer and maintains to contact with the second surface, along the long side of the substrate
Direction draw straight line, with measure obtain the transparent organic thin film layer the second surface to the substrate first surface thickness.
Optionally, which further includes the auxiliary coloured silk being set between the substrate and the transparent organic thin film layer
Color filtering optical layer and black matrix", at least one measured hole irradiate the colored filter by laser aid, and removing part should
Transparent organic thin film layer, the part auxiliary chromatic filter layer, the part black matrix" or combinations thereof are formed.
Compared with prior art, the present invention passes through film thickness measuring structure setting is (non-display in the designated position of substrate
Area), and at least one measured hole of film thickness measuring structure is formed by laser aid, it avoids in the prior art, because operator's
The problem of measurement inaccuracy, realizes automatic measurement, improves the accuracy and measurement efficiency of measurement result caused by individual difference.
Detailed description of the invention
Fig. 1 is the top view of existing colored filter.
Fig. 2 is region A in Fig. 1 along dotted line a diagrammatic cross-section.
Fig. 3 is the top view of the colored filter of one embodiment of the invention.
Fig. 4 is that the color blocking of colored filter film thickness detection structure in Fig. 3 arranges schematic diagram.
Fig. 5 is the diagrammatic cross-section of colored filter film thickness detection structure in Fig. 3.
Fig. 6 is the diagrammatic cross-section of the colored filter film thickness detection structure formation measured hole in Fig. 3.
Specific embodiment
The contents of the present invention are become apparent to make and are more accurately understood, will be described in detail with reference to the accompanying drawings now, are said
Bright book attached drawing shows the example of the embodiment of the present invention, wherein identical label indicates identical element.It is understood that
The ratio of ratio and non-present invention actual implementation shown in Figure of description, for the purpose of being only schematically illustrate, and not according to original
Size mapping.
Fig. 3 is the top view of the colored filter of one embodiment of the invention.As shown in figure 3, colored filter 20 includes base
Plate 21, chromatic filter layer, black matrix" and transparent organic thin film layer 25, transparent 25 whole face of organic thin film layer are covered in substrate 21
On first surface 211 (as shown in Figure 6), transparent organic thin film layer 25 makes 20 face of colored filter applied to liquid crystal display
There is flat surface to the surface of liquid crystal layer, flat surface facilitates the promotion of liquid crystal display display quality.
Colored filter 20 further includes viewing area 22 and the non-display area around display area 22, film thickness detection structure 24
It is set to non-display area and is located at the edge of substrate 21, be additionally provided with element area 23, film thickness detection structure 24 in non-display area
In element region 23, at least one measured hole is set, for example including the first measured hole 291 and second in film thickness detection structure 24
Measured hole 292 (as shown in Figure 6), the part first surface 211 of substrate 21 is from first measured hole 291 and the second measured hole 292
In expose, using from first measured hole 291 and the second measured hole 292 exposure first surface 211 be used as datum level, measurement thoroughly
The thickness of the second surface 251 of bright organic thin film layer 25 first surface 211 (as shown in Figure 6) to substrate 21.
Fig. 4 is that the color blocking of colored filter film thickness detection structure in Fig. 3 arranges schematic diagram, and Fig. 5 is colored filter in Fig. 3
The diagrammatic cross-section of film thickness detection structure.
Referring to Fig. 4 and Fig. 5, film thickness detection structure 24 has auxiliary chromatic filter layer, assists chromatic filter layer packet
Include: the first color blocking unit 26 and the second color blocking unit 27 being arranged successively, the first color blocking unit 26 include first be arranged successively
Red color resistance 261, the first green color blocking 262 and the first blue color blocking 263；Second color blocking unit 27 includes the second red color resistance
271, white space 272 and the second blue color blocking 273, white space 272 are set to the second red color resistance 271 and the second blue
Between color blocking 273.White space 272 is to refer to, not set any color blocking (as shown in Figure 5) on corresponding position on substrate 21,
When transparent 25 whole face of organic thin film layer is covered in the first surface of substrate 21, white space 272 is by transparent organic thin film layer 25
Filling.The present embodiment, white space 272 are set between the second red color resistance 271 and the second blue color blocking 273, but not with this
It is limited.In other embodiments of the invention, the position of white space can be set according to actual needs.In addition, in the present invention
In other embodiments, the second color blocking unit can also only include white space, when in the second color blocking unit only include white space
When, at least one measured hole being set in film thickness detection structure is then formed in white space.
Black matrix" 28 is formed on the first surface 211 of substrate 21, and black matrix" 28 covers the viewing area on substrate 21
22 with part non-display area, and in black matrix" 28 in viewing area 22 hollowed out area and viewing area 22 in main color filter
Red, green and the blue color blocking of layer correspond.In the present embodiment, black matrix" 28 is located at chromatic filter layer (colorized optical filtering
Layer include viewing area 22 main color filter layer and film thickness test structure 24 in assists chromatic filter layer, auxiliary chromatic filter layer with
Main color filter layer is collectively formed in identical processing procedure) and substrate 21 between, but not limited to this.In other embodiments
In, black matrix" can with chromatic filter layer can same layer be arranged.
As shown in figure 5, the height of each color blocking is equal in the first color blocking unit 26 and the second color blocking unit 27 in the present embodiment
Close, but not limited to this.In other embodiments of the invention, the first color blocking unit 26 with it is every in the second color blocking unit 27
The height of one color blocking can be different each other.
Fig. 6 is the diagrammatic cross-section of the colored filter film thickness detection structure formation measured hole in Fig. 3.
As shown in fig. 6, removing partially transparent organic thin film layer 25, color blocking in film thickness detection structure 24 by laser aid 30
Layer, part black matrix" 28 or combinations thereof are to obtain the first measured hole 291 and the second measured hole 292.Specifically, laser aid
Transparent thin film layer 25 on 30 irradiation substrates 21, it is blue by removing the partially transparent organic thin film layer 25, second in first area
Color color blocking 273 and part black matrix" 28 are to obtain the first measured hole 291；By removing partially transparent having in second area
Machine film layer 25, the first red color resistance 261 and part black matrix" 28 are to obtain the second measured hole 292.Wherein, first area
Both ends opposite in film thickness detection structure 24 are located at second area, system that but not limited to this.In other realities of the invention
It applies in example, if the second color blocking unit 27 only includes white space, laser aid 30, which only needs to remove, to be filled in white space
Transparent organic thin film layer form at least one measured hole.
With continued reference to Fig. 4 and Fig. 6, after obtaining the first measured hole 291 and the second measured hole 292, in the first color blocking unit 26
Second red color resistance 271 is used as third color blocking in first green color blocking 262, the first blue color blocking 263 and the second color blocking unit 27
Unit 26 '.It is worth noting that, in order to ensure the accuracy of measurement structure, film thickness detection structure 24 is forming the in the present invention
After one measured hole 291 and the second measured hole 292, it is necessary to which having one includes red, green and blue color blocking third color
Hinder unit 26 '.Preferably, the first color blocking unit 26 and the second color blocking unit 27 in film thickness detection structure 24 can be with substrates 21
Red, green and the blue color blocking of main color filter layer in viewing area 22 are formed together.At this time, it is only necessary to viewing area will be formed
The fringe region of the light shield of chromatic filter layer in 22 increases pattern compatible with 24 shape of film thickness detection structure, therefore, no
Fabrication steps can be increased because of film thickness detection structure 24.
Referring to Fig. 6, the second surface 251 of the transparent organic thin film layer 25 of measurement of colored optical filtering substrates 20 of the invention arrives base
Detailed process is as follows for the thickness of the first surface 211 of plate 21.
Firstly, the contact type probe 40 (shown in dotted line) for controlling mobile profile measurer contact respectively from contact hole 291,
The first surface 211 of the substrate 21 exposed in 292；Secondly, control moving contact formula probe 40 (shown in dotted line) is moved to
On the second surface 251 of transparent organic thin film layer 25, and contact type probe 40 and second surface 251 is made to maintain contact condition；
Then, continue to control contact type probe 40 along the longitudinal direction F (as shown by the arrows in Figure 3) of substrate 21 towards the side of substrate 21
Edge draws straight line；Finally, collecting the transparent organic thin film layer 25 that contact type probe 40 measures by the control unit of profile measurer
Second surface 251 to 211 surface of first surface of substrate 21 spacing, such as according to need, using first surface 211 as base
Quasi- face can get the thickness T2 (corresponding transparent herein the thickness of organic thin film layer 25 itself) of transparent organic thin film layer 25, transparent have
The thickness Tg, transparent of the thickness Tb of machine film layer 25 and black matrix" 28, transparent organic thin film layer 25 and the first green color blocking 262
Organic thin film layer 25, the thickness Tgb of black matrix" 28 and the first green color blocking 262, transparent organic thin film layer 25 and the first blue
The thickness Tr of the thickness Tb of color blocking 263, transparent organic thin film layer 25 and the second red color resistance 271.
Further, it is also possible to above-mentioned different thickness value be analyzed by another control element, to judge transparent organic thin film layer
Whether 25 surface flat, and judging result is fed back to the apparatus for coating of transparent organic thin film layer 25 so that apparatus for coating according to
According to the judging result of feedback timely to adjust painting parameter, it is ensured that the second surface 251 of transparent organic thin film layer 25 it is flat
Degree.
Further, since film thickness measuring structure 24 is set to the non-display area at 21 edge of substrate in above-described embodiment, because
This can benefit after the completion of the second surface 251 to the thickness measure of the first surface 211 of substrate 21 of transparent organic thin film layer 25
It will be cut off in 24 self-reference substrate 21 of film thickness measuring structure with laser or cutter.That is, in can be in the finished goods of colored filter 20
Do not occur film thickness measuring structure 24.
As can be seen from the above embodiments, the present invention is in order to realize that profile measurer being capable of whole face in automatic measurement colored filter
The transparent organic thin film layer of substrate surface is covered in the thickness of substrate surface, film thickness measuring structure is set in colored filter
Non-display area, and partially transparent organic thin film layer, color blocking layer, part black square in film thickness measuring structure are removed by laser aid
Battle array or combinations thereof on the basis of the substrate surface that at least one measured hole exposes, utilizes wheel to obtain at least one measured hole
The contact type probe of profile measuring apparatus draws straight line on the surface of transparent organic thin film layer, to obtain transparent organic thin film layer to substrate table
The thickness in face.Due to by film thickness measuring structure setting in the designated position of substrate, and forming at least one survey by laser aid
Metering-orifice, avoid in the prior art, because operator individual difference caused by measure inaccuracy problem, realize automation survey
Amount, improves the accuracy and measurement efficiency of measurement result.
The present invention also provides a kind of colorized optical filtering on piece thicknesses of layers measurement methods.
Firstly, providing a colored filter, colored filter has viewing area and the non-display area around viewing area, non-aobvious
Show that area has film thickness measuring structure, film thickness measuring structure has white space；Colored filter includes substrate, black matrix", coloured silk
Color filtering optical layer and transparent organic thin film layer, transparent organic thin film layer whole face is covered on the first surface of substrate, and film thickness measuring
Structure, black matrix" and chromatic filter layer are between substrate and transparent organic thin film layer.
Secondly, using laser aid in forming at least one measured hole on white space, and the first surface of substrate is from extremely
It is exposed in a few measured hole；Wherein, at least one measured hole can be by removing partially transparent organic thin film layer, colorized optical filtering
Layer, black matrix" or combinations thereof are formed.
Then, the contact type probe contact of controlling profile measuring instrument exposes the first of substrate from least one measured hole
Surface.
Then, control contact type probe is moved to the second surface of transparent organic thin film layer and maintains and transparent organic film
The second surface contact of layer draws straight line along the longitudinal direction of substrate.
Finally, the control mould group of profile measurer obtains the second surface of transparent organic thin film layer to the first surface of substrate
Thickness.
Wherein, in the present embodiment, transparent organic thin film layer is with the flatness layer of colorized optical filtering on piece.In other realities of the invention
It applies in example, transparent organic thin film layer is also possible to passivation layer or protective layer.
Certainly, the invention may also have other embodiments, without deviating from the spirit and substance of the present invention, ripe
Various corresponding changes and modifications, but these corresponding changes and modifications can be made according to the present invention by knowing those skilled in the art
All it should fall within the scope of protection of the appended claims of the present invention.
Claims (8)
1. a kind of colored filter has viewing area and the non-display area around display area, which is characterized in that the colorized optical filtering
Piece further include:
Substrate；
Transparent organic thin film layer, the transparent organic thin film layer whole face are covered on the first surface of the substrate；And
Film thickness detection structure is set to the non-display area, is provided at least one measured hole in the film thickness detection structure, the base
The part of the plate first surface is exposed from least one measured hole, using part first surface for exposing as base
Standard measures the second surface of the transparent organic layer to the thickness of the first surface；
Wherein, the film thickness detection structure include auxiliary chromatic filter layer, the auxiliary chromatic filter layer include the first color blocking unit with
Second color blocking unit, the first color blocking unit include the first red color resistance, the first green color blocking and the first blue color blocking, this second
Color blocking unit includes the white space of not set color blocking；The film thickness detection structure, should after forming at least one measured hole
Chromatic filter layer is assisted to include at least the color blocking unit that red, green and blue color blocking are constituted.
2. colored filter as described in claim 1, which is characterized in that the white space fills the transparent organic thin film layer.
3. colored filter as claimed in claim 2, which is characterized in that at least one measured hole is set to the blank area
Domain.
4. colored filter as described in claim 1, which is characterized in that the film thickness detection structure further includes black matrix", should
Black matrix" is located between the auxiliary chromatic filter layer and the substrate, which is to utilize the laser irradiation colour
Optical filter remove the part transparent organic thin film layer, the part auxiliary chromatic filter layer, the part black matrix" or combinations thereof and
It is formed.
5. colored filter as described in claim 1, feature exist, which, which is that the transparent organic thin film layer is separate, is somebody's turn to do
The surface of first surface.
6. colored filter as described in claim 1, which is characterized in that the transparent organic thin film layer is flatness layer, so that should
Colored filter has flat surface.
7. a kind of measurement method of the thicknesses of layers of colorized optical filtering on piece, which is characterized in that the measurement method the following steps are included:
Colored filter is provided, the first surface whole face of the substrate of the colored filter covers transparent organic thin film layer, and film thickness is surveyed
Amount structure forms the non-display area of the colored filter and between the transparent organic thin film layer and the substrate, the film thickness measuring
Structure has white space, which includes auxiliary chromatic filter layer, which includes the first color
Unit and the second color blocking unit are hindered, which includes the first red color resistance, the first green color blocking and the first blue color
Resistance, which includes the white space of not set color blocking；
In forming at least one measured hole on the white space, so that the first surface of the part substrate is from this, at least one is measured
It is exposed in hole, after forming at least one measured hole, which includes at least the film thickness detection structure
The color blocking unit that red, green and blue color blocking are constituted；
The contact type probe of controlling profile measuring instrument contacts the first surface；And
Control contact type probe is moved to the second surface of the transparent organic thin film layer and maintains to contact with the second surface, along
The longitudinal direction of the substrate draws straight line, to measure first table of the second surface for obtaining the transparent organic thin film layer to the substrate
The thickness in face.
8. measurement method as claimed in claim 7, which is characterized in that the film thickness measuring structure further include be set to the substrate with
Auxiliary chromatic filter layer and black matrix" between the transparent organic thin film layer, at least one measured hole pass through laser aid
The colored filter is irradiated, the part transparent organic thin film layer, the part auxiliary chromatic filter layer, the part black matrix" are removed
Or combinations thereof formed.
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| CN201611112185.0A CN106707392B (en) | 2016-12-07 | 2016-12-07 | Colored filter and its thicknesses of layers measurement method |
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| CN107300733A (en) * | 2017-08-11 | 2017-10-27 | 深圳市华星光电技术有限公司 | COA substrates and COA substrate color blocking layer thickness detection methods |
| TWI644298B (en) | 2017-11-29 | 2018-12-11 | 友達光電股份有限公司 | Substrate of pixel structures and display panel thereof |
| CN109239981B (en) * | 2018-08-24 | 2021-07-02 | Tcl华星光电技术有限公司 | Preparation method of liquid crystal display panel |
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| CN105806205A (en) * | 2016-03-16 | 2016-07-27 | 武汉华星光电技术有限公司 | Method for measuring membrane thicknesses of light resistors |
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