CN106680911A - Low-oscillation dispersion mirror structure and design method thereof - Google Patents
Low-oscillation dispersion mirror structure and design method thereof Download PDFInfo
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Abstract
The invention discloses a design for a low-oscillation dispersion mirror structure. The structure comprises a substrate, a chirped film system structure and an ultralow-refractive-index layer. The structure is characterized in that the ultralow-refractive-index layer is additionally arranged on the top part of the chirped film system structure and is realized by an inclined deposition technology, the refractive index and thickness of the ultralow-refractive-index layer can be controlled by adjusting the rate and angle of inclined deposition, and the refractive index of the chirped film system structure can be well matched with an air layer, so that the dispersion oscillation can be greatly reduced. Due to the designed structure, the dispersion oscillations of dispersion mirrors with different bandwidths and dispersion amounts can be greatly reduced, and the dispersion mirror design needs for low loss, low oscillation and large dispersion compensation amount for pulse compression in an ultrafast laser system are well met. The low-oscillation dispersion mirror structure can be applied in the ultrafast laser system (such as a chirped pulse amplification technology and an optical-fiber laser), and is an essential dispersion compensation element in the ultrafast laser system.
Description
Technical field
The invention belongs to ultrafast laser field, pulse compression optical element to be used in specifically a kind of ultrashort pulse laser
The surface inclined deposition SiO with extra-low refractive index2The low vibration dispersion mirror structure of layer.
Background technology
Dispersion mirror is a kind of dispersive compensation element, and certain dispersion compensation can be provided while high reflectance is kept,
Prism pair and grating can be replaced in ultrafast laser system is used for pulse compression.Dispersion mirror be divided into dispersion mirror high, low dispersion mirror and
Broadband chirped mirror.The bandwidth increase of dispersion mirror or dispersion measure may be introduced when increasing and vibrated than larger dispersion.This be because
It is in dispersion mirror structure, have serious impedance mismatch between chirp membrane system and extraneous medium (mainly air), light can be made
Ripple transmits formation interference between film layer finally makes dispersion curve form vibration.In order to eliminate these vibrations, current double chirped mirrors, the back of the body
Portion plated film chirped mirror, inclined surface chirped mirror and Brewster angle chirped mirror, chirped mirror can be good to these design philosophys
Suppress the vibration of chirped mirror dispersion curve.
, to being current commercial most common dispersive compensation element, dispersion mirror is to being the reference by changing dispersion mirror for dispersion mirror
Wavelength is used under different incidence angles, makes the cycle of oscillation offset half period of one of dispersion mirror, two such
The ripple positive and negative values of mirror are offseted, although the vibration ripple of each mirror is very big, but two mirrors are used together, group delay
Dispersion curve is just relatively smoothed.But because dispersion mirror is to will in pairs design and prepare, not only design engineering quality is big, and
Preparation cost is also higher.
One layer of extra-low refractive index layer is added at the top of dispersion mirror, the dispersion vibration of dispersion mirror can be greatly lowered, this
Planting extra-low refractive index layer can be realized by inclined deposition technology.Inclined deposition is a kind of new film deposition techniques.It is logical
The rotation and inclination of substrate in preparation process are crossed, variously-shaped sculptured thin film can be prepared, and these sculptured thin films can
It is that the design of optical thin film and preparation open new approach to realize the optical property that many conventional films cannot be realized.It is logical
Crossing inclined deposition technology can prepare single low vibration dispersion mirror, can not only realize chirped mirror to reducing the function of vibration,
Cost can also be substantially reduced.In addition, single low vibration dispersion mirror also have be lost low, flexibility ratio high, integrability and
The advantages of adjusting simple, in extraordinary can applying to ultrafast laser system.
By proposing a kind of initial designs of new low vibration dispersion mirror, one layer is added again on the chirp membrane system on basis
Extra-low refractive index layer, the SiO of different extra-low refractive index is obtained by inclined deposition technology2Material layer, in theory can be real
The low vibration dispersion mirror of existing different bandwidth scope and different chromatic dispersion compensation quantities, for promotion dispersion mirror in ultrafast laser system
Application it is significant.
The content of the invention
Present invention solves the technical problem that be to propose a kind of dispersion mirror structure of low dispersion vibration, using inclined deposition skill
Art makes the refractive index of top layer film reach very low (refractive index n=1.05-1.25 or so, close to air), can be good at matching
Refractive index between different medium so that dispersion mirror will not produce very big vibration again while certain dispersion measure is provided,
So as to obtain the low vibration dispersion mirror for meeting design requirement of different bandwidth and different dispersion measures.
Technical solution of the invention is as follows：
A kind of dispersion mirror structure of low dispersion vibration, its feature is to include substrate, chirp membrane system knot successively from down to up
Structure and extra-low refractive index layer；Described chirp film structure is by low-index material alternate group high into described extra-low refractive index
Layer is by refractive index and the controllable SiO of thickness2Material is constituted, by inclined deposition on described chirp film structure.
The refractive index and thickness of described extra-low refractive index layer can be controlled by adjusting the speed and angle of inclined deposition,
By adjusting the angle of inclined deposition in the range of 70 ° to 87 °, the refractive index of extra-low refractive index layer can be controlled in 1.05-1.25
In the range of, the refractive index refers to the single-point refractive index at 550nm.
Described dispersion mirror structure expression is G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, and wherein G is base
Bottom, H is that optical thickness is the high-index material of λ/4, and L is that optical thickness is the low-index material of λ/4, and n and m is high reflection
The periodicity of film layer, x is the thickness of symmetric cavity, and k is the periodicity of symmetric cavity, and M is extra-low refractive index layer, and A is air layer.
Described high reflectance film layer periodicity n and m range of choice is 8~14, and the thickness x of described symmetric cavity exists
Between 1.25-4, the periodicity k of described symmetric cavity is between 6-18.
The method for designing of the low vibration dispersion mirror of the present invention, comprises the following steps that：
Step 1, the design dispersion mirror requirement according to needed for, including dispersion measure, reflectivity and bandwidth, the suitable height of selection
Refraction materials, wherein high-index material have Nb2O5、Ta2O5、HfO2Deng oxide material, low-index material selection SiO2,
The refractive index n of low-index material highH、nLFor inverting is obtained in the experiment of actual plated film.
Step 2, the suitable parameter of selection, because the refractive index control of extra-low refractive index layer can be existed using inclined deposition technology
1.05-1.25 in interval, therefore extra-low refractive index SiO is set2(refractive index is 550nm to the refractive index of layer between 1.05-1.25
The single-point refractive index at place), high reflectance film layer periodicity n and m range of choice 8~14, the thickness x of G-T chambers and symmetric cavity exists
Between 1.25-4, the periodicity k of symmetric cavity is between 6-18.
After step 3, the parameter of tentatively selected low vibration dispersion mirror, according to designed low vibration dispersion mirror requirement, phase is set
The desired value answered, including group delay dispersion value, reflectivity and covered wave-length coverage, optimize chirp film structure, warp first
The many suboptimization of mutative scale optimized algorithm, obtain the optimization final result based on this parameter.
On the basis of step 4, the optimum results for obtaining in step 3, increase M layers of extra-low refractive index layer, and set M layer materials
Refractive index, and equally, set corresponding desired value, including group delay dispersion value, reflectivity and covered wave-length coverage, pass through
The many suboptimization of mutative scale optimized algorithm, obtain the optimization final result based on this parameter.
Whether step 5, observation final result meet index request needed for low vibration dispersion mirror.If low needed for failing to reach shake
The group delay dispersion requirement of dispersion mirror is swung, then changes the refractive index of M layers of extra-low refractive index layer, repeat step 4 carries out many suboptimization,
Until finally meeting low vibration dispersion mirror requirement, final low vibration dispersion mirror film structure is obtained.
Compared with prior art, the technology of the present invention effect
1st, a kind of low vibration dispersion mirror initial designs are proposed, using chirp film structure and extra-low refractive index layer series connection shape
Formula, can require for different designs, adjust the refractive index of parameter and the extra-low refractive index layer of chirp film structure, be met
The low vibration dispersion mirror of design requirement.
2nd, based on this initial designs, it is possible to achieve the dispersion mirror of the very low vibration of different bandwidth and different dispersion measures.
Brief description of the drawings
Fig. 1 is the low vibration dispersion mirror structural representation of the present invention.
Fig. 2 is the film structure figure of the low vibration dispersion mirror of the present invention.
Fig. 3 is the -200fs of embodiment one2Remove the final film structure of the chirp film structure of extra-low refractive index layer.
Fig. 4 is the -200fs of embodiment one2Remove group delay dispersion and the reflection of the chirp film structure of extra-low refractive index layer
Rate curve map.
Fig. 5 is the -200fs of embodiment one2Low vibration dispersion mirror removes extra-low refractive index layer and plus extra-low refractive index layer
Group delay dispersion curve comparison figure.
Fig. 6 is the -200fs of embodiment one2The final film structure of low vibration dispersion mirror (extra-low refractive index layer n=1.1).
Fig. 7 is the -200fs of embodiment one2The group delay dispersion of low vibration dispersion mirror (extra-low refractive index layer n=1.1) and anti-
Penetrate rate curve map.
Specific embodiment
The specific embodiment of the invention is described in detail below in conjunction with the accompanying drawings.
Fig. 1 is referred to, Fig. 1 is the low vibration dispersion mirror structural representation of the present invention, as illustrated, including substrate from down to up
1st, chirp film structure 2, extra-low refractive index layer 3.Described chirp film structure is by low-index material alternate group high into ultralow
Index layer is by low-refraction SiO2(n=1.05-1.25, refractive index is the single-point refractive index at 550nm) material composition.It is described
Extra-low refractive index layer refractive index and thickness can be controlled by adjusting the speed and angle of inclined deposition, such as, and by adjust
The angle of inclined deposition is saved in the range of 70 ° to 87 °, the refractive index of extra-low refractive index layer is can be controlled in the range of 1.05-1.25,
The refractive index refers to the single-point refractive index at 550nm.When the refractive index of extra-low refractive index layer is controlled in this interval range, color
The vibration for dissipating mirror can significantly be suppressed.
Described dispersion mirror structure expression is G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, and wherein G is base
Bottom, H is that optical thickness is the high-index material of λ/4, and L is that optical thickness is the low-index material of λ/4, and n and m is high reflection
The periodicity of film layer, x is the thickness of symmetric cavity, and k is the periodicity of symmetric cavity, and M is extra-low refractive index layer, and A is air layer.
Low vibration dispersion mirror index required by embodiment one is：Group delay dispersion value -200fs2, reflectivity ＞
99.8%, respective bandwidth is 800nm centre wavelength 200nm bandwidth.
Design procedure is as follows：
1st, according to group delay dispersion and bandwidth requirement, dispersion measure is relatively large, broader bandwidth, so selective refraction rate is higher
High-index material Nb2O5, low-index material is SiO2, the refractive index parameter of low-index material high is by Cauchy FormulaIt is determined that.
2nd, according to low vibration dispersion mirror requirement, suitable parameter is selected, substitutes into the film structure expression of low vibration dispersion mirror
Formula G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, obtains film structure as described in Figure 2.
3rd, based on the initial designs in 2, reference wavelength is 800nm, the lower p-polarization light of 0 degree of incidence angle of selection, sets and optimizes
Desired value group delay dispersion (groupdelaydispersion, GDD) is -200fs2, optimize remove extra-low refractive index layer first
Chirp film structure, by variable metric algorithm, chirp film structure after being optimized as shown in figure 3, group delay dispersion and
Reflectance curve is as shown in Figure 4.
4th, such as Fig. 4 is to meet desired dispersion specular reflectivity and group delay dispersion curve, and wherein reflectivity is in 700-900nm
More than 99.8%, group delay dispersion GDD reaches -200fs in 700-900nm2But, the dispersion vibration of whole curve than larger,
So on this architecture basics, then add one layer of extra-low refractive index layer, that is, low-refraction SiO2Layer.According to inclined deposition skill
Art can be controlled in the range of 1.05-1.25 the refractive index of extra-low refractive index layer, therefore first sets SiO2The refractive index of layer is 1.2
(being the single-point refractive index at 550nm), by variable metric algorithm, obtains optimum results.
5th, extra-low refractive index layer SiO is changed again2The refractive index of layer, it is that 1.15 and 1.1 optimize that refractive index is set respectively,
By variable metric algorithm, optimum results are obtained.
6th, the group delay dispersion curve after optimization is together compared, as shown in Figure 5.
7th, by the group delay dispersion curve in comparison diagram 5, the vibration of dispersion mirror can be inclined by adding surface
Sedimentary is suppressed；Based on the initial designs of G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, -200fs is obtained2
Low vibration dispersion mirror, when extra-low refractive index layer SiO2When the refractive index of material reaches 1.1, with optimal inclined deposition layer
With refractive index, final optimal low vibration dispersion mirror structure is as shown in fig. 6, group delay dispersion and reflectance curve are as shown in Figure 7.
The present invention helps to promote dispersion mirror in ultrafast laser system for the great significance for design of low vibration dispersion mirror
Applied in system.
Claims (5)
1. the dispersion mirror structure that a kind of low dispersion is vibrated, it is characterised in that include substrate (1), chirp membrane system successively from down to up
Structure (2) and extra-low refractive index layer (3)；Described chirp film structure (2) is by low-index material alternate group high into described
Extra-low refractive index layer (3) is by refractive index and the controllable SiO of thickness2Material is constituted, by inclined deposition in described chirp film
In architecture (2).
2. the dispersion mirror structure that low dispersion as claimed in claim 1 is vibrated, it is characterised in that described extra-low refractive index layer
Refractive index and thickness can be controlled by adjusting the speed and angle of inclined deposition, and refractive index can be controlled in 1.05-1.25 scopes
Interior, the refractive index refers to the single-point refractive index at 550nm.
3. the dispersion mirror structure that low dispersion as claimed in claim 1 is vibrated, it is characterised in that described dispersion mirror structure representation
Formula is G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, and wherein G is substrate, and H is that optical thickness is the high index of refraction of λ/4
Material, L is that optical thickness is the low-index material of λ/4, and n and m is the periodicity of high reflection film layer, and x is the thickness of symmetric cavity,
K is the periodicity of symmetric cavity, and M is extra-low refractive index layer, and A is air layer.
4. the dispersion mirror structure that low dispersion as claimed in claim 3 is vibrated, it is characterised in that described high reflectance film layer week
Issue n and m range of choice is 8~14, the thickness x of described symmetric cavity between 1.25-4, the cycle of described symmetric cavity
Number k is between 6-18.
5. as described in claim 1-4 is any low dispersion vibration dispersion mirror structure method for designing, it is characterised in that including
Following steps：
Step 1, the design dispersion mirror requirement according to needed for, including dispersion measure, reflectivity and bandwidth, select low-index material high
Nb2O5、Ta2O5Or HfO2, low-index material selection SiO2, the refractive index n of low-index material highH、nLFor actual plated film is tested
Middle inverting is obtained；
Step 2, setting extra-low refractive index SiO2Between 1.05-1.25, high reflectance film layer periodicity n and m are selected the refractive index of layer
Scope 8~14 is selected, between 1.25-4, the periodicity k of symmetric cavity is between 6-18 for the thickness x of symmetric cavity；
After step 3, the parameter of tentatively selected low vibration dispersion mirror, according to designed low vibration dispersion mirror requirement, setting is accordingly
Desired value, including group delay dispersion value, reflectivity and covered wave-length coverage, optimize chirp film structure first, through becoming chi
The degree many suboptimization of optimized algorithm, obtain optimizing final result；
Step 4, increase extra-low refractive index layer M, and the refractive index of extra-low refractive index layer material is set, and equally, setting is corresponding
Desired value, including group delay dispersion value, reflectivity and covered wave-length coverage, through many suboptimization of mutative scale optimized algorithm, obtain
To the optimization final result based on this parameter；
Whether step 5, observation final result meet low vibration dispersion mirror index request, if low vibration dispersion mirror needed for failing to reach
Group delay dispersion requirement, then change extra-low refractive index M layers of refractive index of layer, repeat step 4 carries out many suboptimization, until final
Meet low vibration dispersion mirror requirement, obtain final low vibration dispersion mirror film structure.
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108254816A (en) * | 2018-01-10 | 2018-07-06 | 中国科学院上海光学精密机械研究所 | Double centre wavelength dispersion mirrors to and preparation method thereof |
| CN111208591A (en) * | 2020-01-13 | 2020-05-29 | 中国科学院上海光学精密机械研究所 | Broadband high-threshold combined medium low-dispersion mirror structure and design method thereof |
| CN111722311A (en) * | 2020-07-27 | 2020-09-29 | 中国科学院上海光学精密机械研究所 | Composite function dispersion mirror structure |
| CN112327478A (en) * | 2020-11-23 | 2021-02-05 | 中国科学院上海光学精密机械研究所 | Multi-parameter comprehensive optimization membrane system design method for improving performance of ultrafast laser thin film |
| CN112666641A (en) * | 2021-01-18 | 2021-04-16 | 中国科学院上海光学精密机械研究所 | Design method of broadband low-dispersion chirped mirror |
| CN112946796A (en) * | 2019-12-11 | 2021-06-11 | 中国科学院上海光学精密机械研究所 | Broadband high-reflection high-threshold low-dispersion mirror and design method thereof |
| CN113946005A (en) * | 2021-11-04 | 2022-01-18 | 温州大学 | Broadband high-laser damage threshold dispersion mirror structure |
| CN115097556A (en) * | 2022-06-21 | 2022-09-23 | 厦门大学 | Dispersion film, optical fiber ferrule, dispersion cavity mirror, resonant cavity device and laser |
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| CN108254816A (en) * | 2018-01-10 | 2018-07-06 | 中国科学院上海光学精密机械研究所 | Double centre wavelength dispersion mirrors to and preparation method thereof |
| CN112946796A (en) * | 2019-12-11 | 2021-06-11 | 中国科学院上海光学精密机械研究所 | Broadband high-reflection high-threshold low-dispersion mirror and design method thereof |
| CN111208591A (en) * | 2020-01-13 | 2020-05-29 | 中国科学院上海光学精密机械研究所 | Broadband high-threshold combined medium low-dispersion mirror structure and design method thereof |
| CN111208591B (en) * | 2020-01-13 | 2021-03-30 | 中国科学院上海光学精密机械研究所 | Broadband high-threshold combined medium low-dispersion mirror structure and design method thereof |
| CN111722311A (en) * | 2020-07-27 | 2020-09-29 | 中国科学院上海光学精密机械研究所 | Composite function dispersion mirror structure |
| CN111722311B (en) * | 2020-07-27 | 2021-05-04 | 中国科学院上海光学精密机械研究所 | Composite function dispersion mirror structure |
| CN112327478A (en) * | 2020-11-23 | 2021-02-05 | 中国科学院上海光学精密机械研究所 | Multi-parameter comprehensive optimization membrane system design method for improving performance of ultrafast laser thin film |
| CN112666641A (en) * | 2021-01-18 | 2021-04-16 | 中国科学院上海光学精密机械研究所 | Design method of broadband low-dispersion chirped mirror |
| CN112666641B (en) * | 2021-01-18 | 2022-06-28 | 中国科学院上海光学精密机械研究所 | Design method of broadband low-dispersion chirped mirror |
| CN113946005A (en) * | 2021-11-04 | 2022-01-18 | 温州大学 | Broadband high-laser damage threshold dispersion mirror structure |
| CN113946005B (en) * | 2021-11-04 | 2023-09-15 | 温州大学 | Broadband high-laser damage threshold dispersion mirror structure |
| CN115097556A (en) * | 2022-06-21 | 2022-09-23 | 厦门大学 | Dispersion film, optical fiber ferrule, dispersion cavity mirror, resonant cavity device and laser |
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