CN106680911B - The low oscillation dispersion mirror structure of one kind and its design method - Google Patents
The low oscillation dispersion mirror structure of one kind and its design method Download PDFInfo
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Abstract
A kind of low oscillation dispersion mirror structure design, successively includes substrate, chirp film structure, extra-low refractive index layer from bottom to top.The present invention adds one layer of extra-low refractive index layer at the top of chirp film structure, the extra-low refractive index layer is realized by inclined deposition technology, it can control the refractive index and thickness of extra-low refractive index layer by the rate and angle that adjust inclined deposition, so that the refractive index of chirp film structure can be good at matching with air layer, so as to which dispersion oscillation is greatly reduced.This design structure can make the dispersion mirror of different bandwidth and dispersion measure dispersion vibrate all substantially reduce, very well satisfy in ultrafast laser system for pulse compression low-loss, it is low oscillation, big chromatic dispersion compensation quantity dispersion mirror design requirement.It can be applied in ultrafast laser system (such as chirped pulse amplification technique and optical fiber laser), be essential dispersive compensation element in ultrafast laser system.
Description
Technical field
The invention belongs to ultrafast laser field, optical element is compressed for pulse in specifically a kind of ultrashort pulse laser
The surface inclined deposition SiO with extra-low refractive index2The low oscillation dispersion mirror structure of layer.
Background technique
Dispersion mirror is a kind of dispersive compensation element, can provide certain dispersion compensation while keeping high reflectance,
Can replace in ultrafast laser system prism to and grating for pulse compress.Dispersion mirror be divided into high dispersion mirror, low dispersion mirror and
Broadband chirped mirror.Bigger dispersion oscillation may be introduced when the bandwidth of dispersion mirror increases or dispersion measure increases.This be because
To have serious impedance mismatch between chirp membrane system and extraneous medium (mainly air), light can be made in dispersion mirror structure
Wave transmits formation interference between film layer finally makes dispersion curve form oscillation.In order to eliminate these oscillations, current double chirped mirrors, back
Portion's plated film chirped mirror, inclined surface chirped mirror and Brewster angle chirped mirror, chirped mirror can be good to these design philosophys
Inhibit the oscillation of chirped mirror dispersion curve.
Dispersion mirror is to being the current commercial most common dispersive compensation element, and dispersion mirror is to being reference by changing dispersion mirror
Wavelength uses under different incidence angles, makes the cycle of oscillation offset half period of one of dispersion mirror, two such
The ripple positive and negative values of mirror offset, although the oscillation ripple of each mirror is very big, two mirrors are used together, group delay
Dispersion curve is just relatively smooth.But since dispersion mirror to that will design and prepare in pairs, not only design engineering quality is big, but also
Preparation cost is also relatively high.
One layer of extra-low refractive index layer is added at the top of dispersion mirror, the dispersion oscillation of dispersion mirror can be greatly lowered, this
Kind extra-low refractive index layer can be realized by inclined deposition technology.Inclined deposition is a kind of novel film deposition techniques.It is logical
The rotation and inclination for crossing substrate in preparation process can prepare sculptured thin film of various shapes, and these sculptured thin films can
To realize optical property that many conventional films cannot achieve, new approach is opened for the design and preparation of optical thin film.It is logical
Single low oscillation dispersion mirror can be prepared by crossing inclined deposition technology, can not only realize the function that chirped mirror vibrates reduction,
Cost can also be substantially reduced.In addition to this, single low oscillation dispersion mirror also have be lost low, flexibility ratio is high, integrability and
The advantages that simple is adjusted, extraordinary can be applied in ultrafast laser system.
By proposing a kind of initial designs of novel low oscillation dispersion mirror, one layer is added again on the chirp membrane system on basis
Extra-low refractive index layer obtains the SiO of different extra-low refractive index by inclined deposition technology2Material layer, theoretically can be real
The low oscillation dispersion mirror of existing different bandwidth range and different chromatic dispersion compensation quantities, for pushing dispersion mirror in ultrafast laser system
Application be of great significance.
Summary of the invention
Present invention solves the technical problem that being to propose a kind of dispersion mirror structure of low dispersion oscillation, inclined deposition skill is utilized
Art makes the refractive index of surface layer film reach very low (refractive index n=1.05-1.25 or so, close to air), can be good at matching
Refractive index between different medium, so that dispersion mirror will not generate very big oscillation while providing certain dispersion measure again,
To obtain the low oscillation dispersion mirror for meeting design requirement of different bandwidth and different dispersion measures.
Technical solution of the invention is as follows:
A kind of dispersion mirror structure of low dispersion oscillation, it is characterized in that, it from bottom to top successively include substrate, chirp membrane system knot
Structure and extra-low refractive index layer；The chirp film structure is by high low-index material alternate group at the extra-low refractive index
Layer is by refractive index and the controllable SiO of thickness2Material composition, through inclined deposition on the chirp film structure.
The refractive index and thickness of the extra-low refractive index layer can be controlled by adjusting rate and the angle of inclined deposition,
Through the angle of adjusting inclined deposition within the scope of 70 ° to 87 °, the refractive index of extra-low refractive index layer can be controlled in 1.05-1.25
In range, which refers to the single-point refractive index at 550nm.
The dispersion mirror structure expression is G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, and wherein G is base
Bottom, H are the high-index material that optical thickness is λ/4, and L is the low-index material that optical thickness is λ/4, and n and m are high reflection
The periodicity of film layer, x are the thickness of symmetric cavity, and k is the periodicity of symmetric cavity, and M is extra-low refractive index layer, and A is air layer.
High reflectance film layer periodicity n and the m range of choice is 8~14, and the thickness x of the symmetric cavity exists
Between 1.25-4, the periodicity k of the symmetric cavity is between 6-18.
The design method of the low oscillation dispersion mirror of the present invention, the specific steps are as follows:
Step 1 is required according to required design dispersion mirror, including dispersion measure, reflectivity and bandwidth, selects suitable height
Refraction materials, wherein high-index material has Nb2O5、Ta2O5、HfO2Equal oxide materials, low-index material select SiO2,
The refractive index n of high low-index materialH、nLIt is obtained for inverting in the experiment of practical plated film.
Step 2, the suitable parameter of selection, because that can be controlled the refractive index of extra-low refractive index layer using inclined deposition technology
1.05-1.25 in section, therefore extra-low refractive index SiO is arranged2(refractive index is 550nm to the refractive index of layer between 1.05-1.25
The single-point refractive index at place), the thickness x of high reflectance film layer periodicity n and m range of choice 8~14, G-T chamber and symmetric cavity exists
Between 1.25-4, the periodicity k of symmetric cavity is between 6-18.
Step 3 after tentatively selecting the low parameter for vibrating dispersion mirror, according to designed low oscillation dispersion mirror requirement, sets phase
The target value answered, including group delay dispersion value, reflectivity and covered wave-length coverage, first optimization chirp film structure, warp
Mutative scale optimization algorithm repeatedly optimizes, and obtains the optimization final result based on this parameter.
On the basis of step 4, the optimum results obtained in step 3, increase M layers of extra-low refractive index layer, and set M layer material
Refractive index, and it is same, set corresponding target value, including group delay dispersion value, reflectivity and covered wave-length coverage, warp
Mutative scale optimization algorithm repeatedly optimizes, and obtains the optimization final result based on this parameter.
Index request needed for whether step 5, observation final result meet low oscillation dispersion mirror.If failing low vibration needed for reaching
M layers of extra-low refractive index layer of refractive index is then changed in the group delay dispersion requirement for swinging dispersion mirror, is repeated step 4 and is repeatedly optimized,
Until finally meeting low oscillation dispersion mirror requirement, final low oscillation dispersion mirror film structure is obtained.
Compared with prior art, the technology of the present invention effect
1, a kind of low oscillation dispersion mirror initial designs are proposed, chirp film structure and extra-low refractive index layer series connection shape are utilized
Formula can adjust the parameter of chirp film structure and the refractive index of extra-low refractive index layer, be met for different designs requirement
The low oscillation dispersion mirror of design requirement.
2, it is based on this initial designs, the dispersion mirror of the very low oscillation of different bandwidth and different dispersion measures may be implemented.
Detailed description of the invention
Fig. 1 is the low oscillation dispersion mirror structural schematic diagram of the present invention.
Fig. 2 is the film structure figure of the low oscillation dispersion mirror of the present invention.
Fig. 3 is one -200fs of embodiment2Remove the final film structure of the chirp film structure of extra-low refractive index layer.
Fig. 4 is one -200fs of embodiment2Remove group delay dispersion and the reflection of the chirp film structure of extra-low refractive index layer
Rate curve graph.
Fig. 5 is one -200fs of embodiment2Low oscillation dispersion mirror removes extra-low refractive index layer and plus extra-low refractive index layer
Group delay dispersion curve comparison figure.
Fig. 6 is one -200fs of embodiment2The final film structure of low oscillation dispersion mirror (extra-low refractive index layer n=1.1).
Fig. 7 is one -200fs of embodiment2The group delay dispersion of low oscillation dispersion mirror (extra-low refractive index layer n=1.1) and anti-
Penetrate rate curve graph.
Specific embodiment
The specific embodiment of the invention is described in detail with reference to the accompanying drawing.
Referring to Fig. 1, Fig. 1 is the low oscillation dispersion mirror structural schematic diagram of the present invention, as shown, from bottom to top including substrate
1, chirp film structure 2, extra-low refractive index layer 3.The chirp film structure is by high low-index material alternate group at ultralow
Index layer is by low-refraction SiO2(n=1.05-1.25, refractive index are the single-point refractive index at 550nm) material composition.It is described
Extra-low refractive index layer refractive index and thickness can be controlled by the rate and angle for adjusting inclined deposition, for example, pass through tune
The angle of inclined deposition is saved within the scope of 70 ° to 87 °, the refractive index of extra-low refractive index layer is can be controlled within the scope of 1.05-1.25,
The refractive index refers to the single-point refractive index at 550nm.When the refractive index of extra-low refractive index layer controls the color in this interval range
The oscillation for dissipating mirror can significantly be inhibited.
The dispersion mirror structure expression is G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, and wherein G is base
Bottom, H are the high-index material that optical thickness is λ/4, and L is the low-index material that optical thickness is λ/4, and n and m are high reflection
The periodicity of film layer, x are the thickness of symmetric cavity, and k is the periodicity of symmetric cavity, and M is extra-low refractive index layer, and A is air layer.
Low oscillation dispersion mirror index required by embodiment one are as follows: group delay dispersion value -200fs2, reflectivity >
99.8%, respective bandwidth is 800nm central wavelength 200nm bandwidth.
Design procedure is as follows:
1, according to group delay dispersion and bandwidth requirement, dispersion measure is relatively large, broader bandwidth, so selective refraction rate is higher
High-index material Nb2O5, low-index material SiO2, the refractive index parameter of high low-index material is by Cauchy FormulaIt determines.
2, it is required according to low oscillation dispersion mirror, selects suitable parameter, substitute into the film structure expression of low oscillation dispersion mirror
Formula G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, it is as described in Figure 2 to obtain film structure.
3, based on the initial designs in 2, reference wavelength 800nm selects 0 degree of incidence angle lower p-polarization light, sets and optimize
Target value group delay dispersion (groupdelaydispersion, GDD) is -200fs2, optimize remove extra-low refractive index layer first
Chirp film structure, by variable metric algorithm, chirp film structure after being optimized as shown in figure 3, group delay dispersion and
Reflectance curve is as shown in Figure 4.
4, such as Fig. 4 is the dispersion specular reflectivity and group delay dispersion curve met the requirements, and wherein reflectivity is in 700-900nm
Greater than 99.8%, group delay dispersion GDD reaches -200fs in 700-900nm2, but the dispersion oscillation of entire curve is bigger,
So in this structure basis, then add one layer of extra-low refractive index layer, that is, low-refraction SiO2Layer.According to inclined deposition skill
Art can control the refractive index of extra-low refractive index layer within the scope of 1.05-1.25, therefore first set SiO2The refractive index of layer is 1.2
(for the single-point refractive index at 550nm), by variable metric algorithm, obtains optimum results.
5, change extra-low refractive index layer SiO again2The refractive index of layer is set separately refractive index and optimizes for 1.15 and 1.1,
By variable metric algorithm, optimum results are obtained.
6, the group delay dispersion curve after optimization is compared together, as shown in Figure 5.
7, by the group delay dispersion curve in comparison diagram 5 it is found that the oscillation of dispersion mirror can pass through the inclination of addition surface
Sedimentary is inhibited；Based on the initial designs of G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, -200fs is obtained2
Low oscillation dispersion mirror, as extra-low refractive index layer SiO2When the refractive index of material reaches 1.1, there is optimal inclined deposition layer
With refractive index, final best low oscillation dispersion mirror structure is as shown in fig. 6, group delay dispersion and reflectance curve are as shown in Figure 7.
The present invention helps to push dispersion mirror in ultrafast laser system for the great significance for design of low oscillation dispersion mirror
It is applied in system.
Claims (4)
1. a kind of dispersion mirror structure of low dispersion oscillation, which is characterized in that from bottom to top successively include substrate (1), chirp membrane system
Structure (2) and extra-low refractive index layer (3)；The chirp film structure (2) is by high low-index material alternate group at described
Extra-low refractive index layer (3) is by refractive index and the controllable SiO of thickness2Material composition, by inclined deposition in the chirp film
In architecture (2), the dispersion mirror structure expression is G/ (HL) ^n (HL) ^m (HxLH) ^k (LxHL) ^kM/A, and wherein G is
Substrate, H are the high-index material that optical thickness is λ/4, and L is the low-index material that optical thickness is λ/4, and n and m are high anti-
The periodicity of film layer is penetrated, x is the thickness of symmetric cavity, and k is the periodicity of symmetric cavity, and M is extra-low refractive index layer, and A is air layer.
2. the dispersion mirror structure of low dispersion oscillation as described in claim 1, which is characterized in that the extra-low refractive index layer
Refractive index and thickness can be controlled by adjusting rate and the angle of inclined deposition, and refractive index can be controlled in 1.05-1.25 range
Interior, which refers to the single-point refractive index at 550nm.
3. the dispersion mirror structure of low dispersion oscillation as claimed in claim 2, which is characterized in that the high reflectance film layer week
Issue n and m range of choice is 8~14, and the thickness x of the symmetric cavity is between 1.25-4, the period of the symmetric cavity
Number k is between 6-18.
4. the design method of the dispersion mirror structure of low dispersion oscillation a method according to any one of claims 1-3, which is characterized in that including
Following steps:
Step 1 is required according to required design dispersion mirror, including dispersion measure, reflectivity and bandwidth, selects high low-index material
Nb2O5、Ta2O5Or HfO2, low-index material selection SiO2, the refractive index n of high low-index materialH、nLFor the experiment of practical plated film
Middle inverting obtains；
Step 2, setting extra-low refractive index SiO2The refractive index of layer is between 1.05-1.25, high reflectance film layer periodicity n and m choosing
Range 8~14 is selected, the thickness x of symmetric cavity is between 1.25-4, and the periodicity k of symmetric cavity is between 6-18；
Step 3 after tentatively selecting the low parameter for vibrating dispersion mirror, according to designed low oscillation dispersion mirror requirement, is set corresponding
Target value, including group delay dispersion value, reflectivity and covered wave-length coverage, first optimization chirp film structure, through becoming ruler
Degree optimization algorithm repeatedly optimizes, and obtains optimization final result；
Step 4 increases extra-low refractive index layer M, and sets the refractive index of extra-low refractive index layer material, and same, and setting is corresponding
Target value, including group delay dispersion value, reflectivity and covered wave-length coverage, repeatedly optimize through mutative scale optimization algorithm, obtain
To the optimization final result based on this parameter；
Whether step 5, observation final result meet low oscillation dispersion mirror index request, if failing low oscillation dispersion mirror needed for reaching
Group delay dispersion requirement, then change M layer of extra-low refractive index layer of refractive index, repeatedly step 4 is repeatedly optimized, until final
Meet low oscillation dispersion mirror requirement, obtains final low oscillation dispersion mirror film structure.
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Families Citing this family (8)
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| CN108254816A (en) * | 2018-01-10 | 2018-07-06 | 中国科学院上海光学精密机械研究所 | Double centre wavelength dispersion mirrors to and preparation method thereof |
| CN112946796B (en) * | 2019-12-11 | 2022-05-31 | 中国科学院上海光学精密机械研究所 | Broadband high-reflection high-threshold low-dispersion mirror and design method thereof |
| CN111208591B (en) * | 2020-01-13 | 2021-03-30 | 中国科学院上海光学精密机械研究所 | Broadband high-threshold combined medium low-dispersion mirror structure and design method thereof |
| CN111722311B (en) * | 2020-07-27 | 2021-05-04 | 中国科学院上海光学精密机械研究所 | Composite function dispersion mirror structure |
| CN112327478B (en) * | 2020-11-23 | 2022-04-05 | 中国科学院上海光学精密机械研究所 | Multi-parameter comprehensive optimization membrane system design method for improving performance of ultrafast laser thin film |
| CN112666641B (en) * | 2021-01-18 | 2022-06-28 | 中国科学院上海光学精密机械研究所 | Design method of broadband low-dispersion chirped mirror |
| CN113946005B (en) * | 2021-11-04 | 2023-09-15 | 温州大学 | Broadband high-laser damage threshold dispersion mirror structure |
| CN115097556B (en) * | 2022-06-21 | 2023-06-23 | 厦门大学 | Dispersive thin film, optical fiber core insert, dispersive cavity mirror, resonant cavity device and laser |
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