CN106661725A - 一种真空镀膜设备 - Google Patents

一种真空镀膜设备 Download PDF

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Publication number
CN106661725A
CN106661725A CN201480079978.XA CN201480079978A CN106661725A CN 106661725 A CN106661725 A CN 106661725A CN 201480079978 A CN201480079978 A CN 201480079978A CN 106661725 A CN106661725 A CN 106661725A
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China
Prior art keywords
vapor deposition
support
deposition chamber
post
exhaust column
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CN201480079978.XA
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CN106661725B (zh
Inventor
文洁
何自坚
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Shenzhen Dafu Mingren Technology Co ltd
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Shenzhen Tatfook Quaintfab Co ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明公开了一种真空镀膜设备，该真空镀膜设备包括气相沉积室、支架以及与支架连接的磁性转动组件，支架设置于气相沉积室内且用于放置待镀膜工件，磁性转动组件包括设置于气相沉积室外侧的第一旋转磁体以及设置于气相沉积室内侧的第二旋转磁体，第一旋转磁体与所述第二旋转磁体磁性耦合，第一旋转磁体在同步电机带动下转动，并能够带动第二旋转磁体转动，进而带动支架转动。通过这样的设计，能够避免漏气现象，而且能够对待镀膜工件进行批量真空纳米镀膜，有效提高待镀膜工件真空纳米镀膜的效率以及镀膜效果。

Description

PCT国内申请，说明书已公开。

Claims (14)

  1. PCT国内申请，权利要求书已公开。
CN201480079978.XA 2014-06-12 2014-06-12 一种真空镀膜设备 Active CN106661725B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2014/079754 WO2015188353A1 (zh) 2014-06-12 2014-06-12 一种真空镀膜设备

Publications (2)

Publication Number Publication Date
CN106661725A true CN106661725A (zh) 2017-05-10
CN106661725B CN106661725B (zh) 2019-05-21

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ID=54832730

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CN (1) CN106661725B (zh)
WO (1) WO2015188353A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110724926A (zh) * 2019-11-28 2020-01-24 宁波涂冠镀膜科技有限公司 真空镀膜夹具
CN113774352B (zh) * 2021-11-11 2022-03-08 上海陛通半导体能源科技股份有限公司 一种往复旋转升降的气相沉积设备
CN114574829B (zh) * 2022-03-08 2023-10-27 松山湖材料实验室 一种微深孔内镀膜工艺及镀膜装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1046336A (ja) * 1996-07-29 1998-02-17 Hitachi Metals Ltd 成膜装置
JP2012132055A (ja) * 2010-12-21 2012-07-12 Canon Anelva Corp 真空回転駆動装置及び真空処理装置
CN202482430U (zh) * 2011-12-22 2012-10-10 安徽省蚌埠华益导电膜玻璃有限公司 用于环线旋转室的旋转机构
CN204022934U (zh) * 2014-06-12 2014-12-17 深圳市大富精工有限公司 一种真空镀膜设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2290608Y (zh) * 1996-08-09 1998-09-09 王福贞 旋转磁控柱状弧源多弧离子镀膜机
US6911671B2 (en) * 2002-09-23 2005-06-28 Eastman Kodak Company Device for depositing patterned layers in OLED displays
CN201169621Y (zh) * 2008-01-09 2008-12-24 金梁 真空电镀炉用支架
KR101132605B1 (ko) * 2009-03-13 2012-04-06 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 트랩 장치, 기판 처리 장치의 제어 방법 및 트랩 장치의 제어 방법
JP5437395B2 (ja) * 2009-12-28 2014-03-12 株式会社アルバック 真空蒸着装置及び真空蒸着方法
CN202297756U (zh) * 2011-06-15 2012-07-04 香港生产力促进局 真空式物理、化学混合气相沉积设备
CN202201960U (zh) * 2011-07-29 2012-04-25 安徽金色环境治理股份有限公司 一种真空镀膜机用定位架
CN102653855B (zh) * 2012-05-05 2013-09-11 马胜利 耐磨损和抗氧化的TiAlSiN纳米复合超硬涂层制备方法
CN202865322U (zh) * 2012-05-15 2013-04-10 北京中奥汇成生物材料科技有限公司 一种磁控溅射镀膜装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1046336A (ja) * 1996-07-29 1998-02-17 Hitachi Metals Ltd 成膜装置
JP2012132055A (ja) * 2010-12-21 2012-07-12 Canon Anelva Corp 真空回転駆動装置及び真空処理装置
CN202482430U (zh) * 2011-12-22 2012-10-10 安徽省蚌埠华益导电膜玻璃有限公司 用于环线旋转室的旋转机构
CN204022934U (zh) * 2014-06-12 2014-12-17 深圳市大富精工有限公司 一种真空镀膜设备

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Publication number Publication date
CN106661725B (zh) 2019-05-21
WO2015188353A1 (zh) 2015-12-17

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Address before: 518000 Building 9 and building 10, Shayi West Industrial Zone, Shajing street, Bao'an District, Shenzhen City, Guangdong Province

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Address before: 233090 no.6525 Donghai Avenue, Bengbu City, Anhui Province (in Anhui Tianxin Heavy Industry Technology Co., Ltd.)

Patentee before: Dafu Fangyuan (Anhui) Technology Co.,Ltd.

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