CN106535454B - A kind of method of atmos low-temperature plasma activation water process seed - Google Patents
A kind of method of atmos low-temperature plasma activation water process seed Download PDFInfo
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- CN106535454B CN106535454B CN201610864639.3A CN201610864639A CN106535454B CN 106535454 B CN106535454 B CN 106535454B CN 201610864639 A CN201610864639 A CN 201610864639A CN 106535454 B CN106535454 B CN 106535454B
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- dielectric
- activated water
- temperature plasma
- seed
- quartz ampoule
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01C—PLANTING; SOWING; FERTILISING
- A01C1/00—Apparatus, or methods of use thereof, for testing or treating seed, roots, or the like, prior to sowing or planting
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/48—Treatment of water, waste water, or sewage with magnetic or electric fields
- C02F1/484—Treatment of water, waste water, or sewage with magnetic or electric fields using electromagnets
- C02F1/485—Treatment of water, waste water, or sewage with magnetic or electric fields using electromagnets located on the outer wall of the treatment device, i.e. not in contact with the liquid to be treated, e.g. detachable
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- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Water Supply & Treatment (AREA)
- Environmental & Geological Engineering (AREA)
- Hydrology & Water Resources (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Soil Sciences (AREA)
- Environmental Sciences (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Pretreatment Of Seeds And Plants (AREA)
Abstract
A kind of method of atmos low-temperature plasma activation water process seed, atmos low-temperature plasma activated water apparatus includes upper dielectric, ground electrode, PCB circuit board, quartz ampoule, high-field electrode and lower dielectric；The high-field electrode of atmos low-temperature plasma activated water apparatus is connected by high-voltage line and high voltage power supply, is placed water into dielectric, is imported working gas by tracheae, is opened high voltage power supply, discharge 10 minutes or more, prepared by activated water completes；Pending seed is immersed in activated water, impregnate 5 minutes or more, it takes out for use.The present invention has many advantages, such as that the germination percentage of seed, raising crop yield can be effectively improved compared with prior art.
Description
The present invention relates to a kind of processing methods of seed for technical field.
As large agricultural country, the requirement of quality and germination percentage to crop seeds is higher and higher in background technology China, kind
Sub- germination percentage seriously affects grain and the yield of other crops, influences many because being known as of the germination of seed, such as environment temperature
Degree, soil property, microorganism etc. are influenced the factor of percentage of seedgermination by change, can improve the germination percentage of seed, are improved
Yield.
With the development of plasma technique, the application of plasma technique is also more and more.The concept of plasma water
The visual field of people is progressed into, the research of atmos low-temperature plasma activated water in recent years becomes the heat of plasma field
Point, the report in relation to low-temperature plasma activation water are more and more.Atmos low-temperature plasma activated water is passed through by aqueous solution
The activated water of a kind of low pH values, high redox potential that atmos low-temperature plasma device is handled, preparation process
It is easy to operate, at low cost, small-sized, portable, can produce in times of requiring, avoid the trouble of transporting, storing and keeping, prepared by activated water
A series of chemical reaction occurs in the process, it is living containing hydrogen peroxide, superoxide anion, hydroxyl free radical etc. in the water after reaction
Property particle, can be used for the surface of the seed sterilization, nitro free radical etc. also contained in activated water, provided for the sprouting and growth of seed
Nutrient.
The purpose of the present invention is to provide a kind of germination percentages that can effectively improve seed for invention content, improve crop
The method of the atmos low-temperature plasma activation water process seed of yield.
The method of atmos low-temperature plasma activation water process seed proposed by the present invention, specific technical solution are as follows：
(1) atmos low-temperature plasma activated water apparatus：The present apparatus mainly includes dielectric, ground electrode, support
Plate, PCB circuit board, quartz ampoule, high-field electrode and lower dielectric, wherein upper dielectric is the hollow shell made of insulating materials
The bottom of body, upper dielectric sets central through hole, and ground electrode made of metal is set at the central through hole, which is in net
The lower part of plate, the upper dielectric is set on insulation extension the part A, extension component A of annular and the support plate of its bottom
Annular extension part B connects；The extension component B still connects with lower dielectric, which is made of insulating materials
Upper open slot shape shell, thereon opening portion connect with extension component B, the support plate and extension component B are by isolation material
It is made；There is the quartz ampoule in ranks setting, the lower part that quartz ampoule is to have opening, the top tool of quartz ampoule in the support plate
There are preformed hole, high-field electrode made of metal to stretch into the inside of quartz ampoule, high-field electrode is with setting in lower dielectric
PCB circuit board electrical connection；There is the tracheae that is communicated with inside it on the lower dielectric, still have on the lower dielectric with
The spool communicated inside it, to access high-voltage line corresponding with high-field electrode.
(2) prepared by activated water：The high-field electrode of above-mentioned atmos low-temperature plasma activated water apparatus by high-voltage line with
High voltage power supply is connected, and is placed water into dielectric, is imported working gas by tracheae, is opened high voltage power supply, discharges 10 minutes
More than, prepared by activated water completes.
(3) pending seed is impregnated in the activated water that upper step (2) obtains, impregnate 5 minutes or more, it takes out for use i.e.
It can.
The method that the present invention proposes processing seed is the characteristic based on activated water, because of activated water low ph value itself and largely
Oxygen radical etc. can effectively inhibit the growth of the surface of the seed bacterium, avoid seed during sprouting by bacterium
The influence of microorganism and lesion, while being carried for the growth of seed containing elements such as nitrogen in atmos low-temperature plasma activated water
Nutriment has been supplied, the germination percentage of seed can be improved in this way, has improved the yield of crops；The atmos low-temperature that the present invention uses
It is the porose quartz ampoule of upper end closed band that plasma-activated water installations, which take the meson part of high-field electrode outer wrapping, and advantage is
Reduce hydraulic pressure, the generating region for causing water to enter in electrode, while increasing plasma improves plasma-activated water
Generation efficiency.
Illustrate the device main view diagrammatic cross-section that Fig. 1 is the embodiment of the present invention 1.
Fig. 2 is the A-A views of Fig. 1.
Fig. 3 is the seed growth comparison diagram of the embodiment of the present invention 2.
Next specific implementation mode just elaborates to the present invention in conjunction with attached drawing
Embodiment 1
A kind of method of atmos low-temperature plasma activation water process seed, steps are as follows：
(1) atmos low-temperature plasma activated water apparatus：As depicted in figs. 1 and 2, upper dielectric 1 is by insulating materials
Manufactured upper open hollow shell, the bottom of upper dielectric set central through hole, are set at the central through hole made of metal
Ground electrode 2, the ground electrode are in web plate shape, and the lower part of the main dielectric sets the insulation extension part 3 of annular, the extension component 3
Connect with the annular extension part 5 in the support plate 4 of its bottom；The extension component 5 still connects with lower dielectric 6, lower Jie
Plastid is the upper open slot shape shell made of insulating materials, and opening portion connects with extension component 5 thereon；The support plate
It is made of isolation material with extension component 5；There is the quartz ampoule 7 in ranks setting, quartz ampoule to have 8 rows, 8 in the support plate
There is opening, the top of quartz ampoule to have preformed hole 8, high-voltage electricity made of metal for row, the lower part that each quartz ampoule is
The inside of quartz ampoule is stretched into pole 9, and high-field electrode is electrically connected with the PCB circuit board 12 being arranged inside lower dielectric；Lower Jie
There is the tracheae 10 communicated with inside it on plastid, still there is the spool 11 communicated with inside it on the lower dielectric, to connect
Enter high-voltage line corresponding with high-field electrode；
(2) prepared by activated water：The high-field electrode of above-mentioned atmos low-temperature plasma activated water apparatus by high-voltage line with
High voltage power supply is connected, and is placed water into dielectric, is imported working gas by tracheae, is opened high voltage power supply, discharges 30 minutes,
Prepared by activated water completes.
(3) pending seed is impregnated in the activated water that upper step (2) obtains, is impregnated 5 minutes, taken out for use.
Embodiment 2 (application example)
The activated water that above-described embodiment 1 obtains is taken to deal with seed experiment with common water：Seed is randomly divided into two first
Big group, first group of seed sample is immersed in 5min in activated water by every group of 4 samples, and second group of seed sample is impregnated
The 5min in common water, observes the growing state of seed, as shown in Figure 3, the growth of first group of seed sample is obviously compared after taking-up
Second group of seed sample growth is more preferable；In addition, having carried out germination percentage and bactericidal effect to first group of sample and second group of sample
Experiment, is shown experimentally that：The germination percentage of first group of seed sample is apparently higher than second group of seed sample；First group of seed sample
Mushroom be considerably less than second group of seed sample.
Claims (1)
1. a kind of method of atmos low-temperature plasma activation water process seed, it is characterized in that：
(1) atmos low-temperature plasma activated water apparatus：The present apparatus mainly include dielectric, ground electrode, support plate,
PCB circuit board, quartz ampoule, high-field electrode and lower dielectric, wherein upper dielectric is the hollow housing made of insulating materials,
The bottom of upper dielectric sets central through hole, and ground electrode made of metal is set at the central through hole, which is in web plate
Shape, the lower part of the upper dielectric set the ring on insulation extension the part A, extension component A of annular and the support plate of its bottom
Shape extension component B connects；The extension component B still connects with lower dielectric, which is made of insulating materials
Upper open slot shape shell, thereon opening portion connect with extension component B, the support plate and extension component B are by isolation material system
At；There is the quartz ampoule in ranks setting, the lower part that quartz ampoule is to have opening, the top of quartz ampoule has in the support plate
Preformed hole, high-field electrode made of metal stretch into the inside of quartz ampoule, high-field electrode and are arranged in lower dielectric
PCB circuit board is electrically connected；There is the tracheae that is communicated with inside it on the lower dielectric, still have on the lower dielectric and its
The spool that inside communicates, to access high-voltage line corresponding with high-field electrode；
(2) prepared by activated water：The high-field electrode of above-mentioned atmos low-temperature plasma activated water apparatus passes through high-voltage line and high pressure
Power supply is connected, and is placed water into dielectric, is imported working gas by tracheae, is opened high voltage power supply, discharge 10 minutes or more,
Prepared by activated water completes；
(3) pending seed is impregnated in the activated water that upper step (2) obtains, impregnate 5 minutes or more, it takes out for use.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610864639.3A CN106535454B (en) | 2016-09-30 | 2016-09-30 | A kind of method of atmos low-temperature plasma activation water process seed |
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| CN201610864639.3A CN106535454B (en) | 2016-09-30 | 2016-09-30 | A kind of method of atmos low-temperature plasma activation water process seed |
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| CN106535454B true CN106535454B (en) | 2018-09-21 |
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108408843B (en) * | 2018-03-14 | 2021-06-01 | 大连民族大学 | Plasma activated water generating device |
| CN108496959A (en) * | 2018-05-11 | 2018-09-07 | 杭州德祎科技有限公司 | Room temperature atmospheric pressure Seed sterilization and the method and seed for improving seed activity |
| CN108675860B (en) * | 2018-06-21 | 2021-08-24 | 大连民族大学 | Application of discharge activated water in preparation of improved nutrient solution |
| CN108623383A (en) * | 2018-06-21 | 2018-10-09 | 大连民族大学 | A kind of nutrient solution for preparing improvement using discharge activation water |
| CN109121278A (en) * | 2018-09-20 | 2019-01-01 | 华中科技大学 | A kind of plasma-activated oil treatment provisions |
| CN109600902A (en) * | 2018-12-10 | 2019-04-09 | 杨春俊 | Low-temperature plasma activation liquid excitation apparatus and its application method |
| CN113261496B (en) * | 2021-06-16 | 2023-04-11 | 湖南萌芽蔬菜产业股份有限公司 | Organic mung bean seedling and production method thereof |
| CN113683162B (en) * | 2021-08-31 | 2022-08-19 | 南京工业大学 | Integrated rechargeable monitorable portable plasma activated water generation device |
| CN114735784A (en) * | 2022-04-21 | 2022-07-12 | 西安交通大学 | Low-temperature plasma activated water preparation device and method for seed treatment |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5281315A (en) * | 1992-10-13 | 1994-01-25 | Plasma Plus | Gas plasma treatment of plant seeds |
| CN202717615U (en) * | 2012-08-20 | 2013-02-06 | 日照日纳功能材料科技有限公司 | Tubular water body activation sterilizer |
| CN103922457A (en) * | 2014-04-21 | 2014-07-16 | 厦门大学 | Plasma discharging device |
| JP2014172004A (en) * | 2013-03-11 | 2014-09-22 | Kanazawa Univ | Salt water treatment method |
| CN204508893U (en) * | 2015-01-15 | 2015-07-29 | 大连民族学院 | A kind of plasma body cleaning device |
| CN205294926U (en) * | 2015-10-26 | 2016-06-08 | 上海渊泉集币收藏品有限公司 | Constant voltage electrolysis silver ion purifies rivers device |
| CN105858814A (en) * | 2016-03-28 | 2016-08-17 | 大连民族大学 | Array-type medium-preventing-discharge wastewater treatment device for high-density water |
-
2016
- 2016-09-30 CN CN201610864639.3A patent/CN106535454B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5281315A (en) * | 1992-10-13 | 1994-01-25 | Plasma Plus | Gas plasma treatment of plant seeds |
| CN202717615U (en) * | 2012-08-20 | 2013-02-06 | 日照日纳功能材料科技有限公司 | Tubular water body activation sterilizer |
| JP2014172004A (en) * | 2013-03-11 | 2014-09-22 | Kanazawa Univ | Salt water treatment method |
| CN103922457A (en) * | 2014-04-21 | 2014-07-16 | 厦门大学 | Plasma discharging device |
| CN204508893U (en) * | 2015-01-15 | 2015-07-29 | 大连民族学院 | A kind of plasma body cleaning device |
| CN205294926U (en) * | 2015-10-26 | 2016-06-08 | 上海渊泉集币收藏品有限公司 | Constant voltage electrolysis silver ion purifies rivers device |
| CN105858814A (en) * | 2016-03-28 | 2016-08-17 | 大连民族大学 | Array-type medium-preventing-discharge wastewater treatment device for high-density water |
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