CN106533406B - Metal-oxide-semiconductor parameter degradation circuit, test circuit and early warning circuit - Google Patents

Metal-oxide-semiconductor parameter degradation circuit, test circuit and early warning circuit Download PDF

Info

Publication number
CN106533406B
CN106533406B CN201610989542.5A CN201610989542A CN106533406B CN 106533406 B CN106533406 B CN 106533406B CN 201610989542 A CN201610989542 A CN 201610989542A CN 106533406 B CN106533406 B CN 106533406B
Authority
CN
China
Prior art keywords
circuit
oxide
metal
semiconductor parameter
parameter degradation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610989542.5A
Other languages
Chinese (zh)
Other versions
CN106533406A (en
Inventor
雷登云
恩云飞
陈义强
何春华
黄云
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
China Electronic Product Reliability and Environmental Testing Research Institute
Original Assignee
China Electronic Product Reliability and Environmental Testing Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by China Electronic Product Reliability and Environmental Testing Research Institute filed Critical China Electronic Product Reliability and Environmental Testing Research Institute
Priority to CN201610989542.5A priority Critical patent/CN106533406B/en
Publication of CN106533406A publication Critical patent/CN106533406A/en
Application granted granted Critical
Publication of CN106533406B publication Critical patent/CN106533406B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/16Modifications for eliminating interference voltages or currents
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2607Circuits therefor
    • G01R31/2621Circuits therefor for testing field effect transistors, i.e. FET's

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Tests Of Electronic Circuits (AREA)

Abstract

The present invention relates to a kind of metal-oxide-semiconductor parameter degradation circuits, including NMOS tube and PMOS tube;The grid of NMOS tube and the grid of PMOS tube connect, and the drain electrode of NMOS tube and the drain electrode of PMOS tube connect;The grid of PMOS tube connects power supply;The source electrode of NMOS tube receives control signal;When control signal is high level signal, the channel of NMOS tube generates hot carrier;The grid of NMOS tube and the grid of PMOS tube receive input signal, the output signal of the drain electrode output and the input signal reverse phase of the drain electrode and PMOS tube of NMOS tube.The accuracy of output signal can be improved in above-mentioned metal-oxide-semiconductor parameter degradation circuit.Test result accuracy can be improved the invention further relates to a kind of metal-oxide-semiconductor parameter degradation test circuit, another metal-oxide-semiconductor parameter degradation test circuit that test result accuracy can be improved, it is a kind of can accurate early warning metal-oxide-semiconductor parameter degradation early warning circuit and it is another can accurate early warning metal-oxide-semiconductor parameter degradation early warning circuit.

Description

Metal-oxide-semiconductor parameter degradation circuit, test circuit and early warning circuit
Technical field
The present invention relates to monitoring technical fields, more particularly to a kind of metal-oxide-semiconductor parameter degradation circuit, a kind of metal-oxide-semiconductor parameter Degradation testing circuit, another metal-oxide-semiconductor parameter degradation test circuit, a kind of metal-oxide-semiconductor parameter degradation early warning circuit and another kind Metal-oxide-semiconductor parameter degradation early warning circuit.
Background technique
As super large-scale integration manufacturing technology develops to nanometer direction, each device size of integrated circuit subtracts therewith It is small, correspondingly, metal-oxide-semiconductor (metal oxide semiconductor, metal-oxide-half as each device main element Conductor field effect transistor), characteristic size is also smaller and smaller, however the normal working voltage of metal-oxide-semiconductor does not wait ratios therewith Example reduces, and it is increasing will so to will lead to the internal field inside metal-oxide-semiconductor channel.With internal field inside metal-oxide-semiconductor channel Increase, the carrier in channel is easy to get biggish energy in strong electrical field to form hot carrier.Since heat carries The energy for flowing son is higher, and is present in channel again, and therefore, which, which is easy to pass through interface potential barrier, is injected into grid oxygen Change layer, finally interfacial state is generated by the charge trap capture in gate oxide or at the interface Si-SiO2, so as to cause metal-oxide-semiconductor Related parameter (such as threshold voltage, mutual conductance and saturation region drain current) changes, that is, forms so-called hot carrier note Enter (Hot Carriers Injection, HCI) effect.
As described above, HCI effect can cause metal-oxide-semiconductor in relation to the variation of parameter, particularly, when because of gate oxide stored charge When threshold voltage and transconductance degradation being caused to be more than a threshold value, it will metal-oxide-semiconductor is caused to fail.Therefore, hot carrier injection effect An important factor for being influence metal-oxide-semiconductor performance parameter, while being also to lead to one of higher failure mechanism of component failure rate.
At this stage, in metal-oxide-semiconductor parameter degradation circuit caused by HCI effect, due to will receive HCI effect when circuit work It answers, NBTI (Negative Bias Temperature Instability, Negative Bias Temperature Instability) effect and TDDB The shadow of many factors such as (time dependent dielectric breakdown, with time correlation dielectric breakdown) effect It rings, therefore the output signal of above-mentioned metal-oxide-semiconductor parameter degradation circuit will receive the influence of a variety of effects, make the accuracy of output signal It reduces.And when the output signal to metal-oxide-semiconductor parameter degradation circuit is tested, test result will not be accurate, thus nothing Method carries out accurate early warning to the failure of metal-oxide-semiconductor caused by HCI effect.
Summary of the invention
Based on this, it is necessary in view of the above-mentioned problems, provide a kind of metal-oxide-semiconductor parameter degradation circuit, by make the circuit only by HCI effects, so as to improve the accuracy of output signal.
A kind of metal-oxide-semiconductor parameter degradation circuit, comprising: NMOS tube and PMOS tube;
The grid of the NMOS tube is connect with the grid of the PMOS tube, drain electrode and the PMOS tube of the NMOS tube Drain electrode connection;The grid of the PMOS tube connects power supply;
The source electrode of the NMOS tube receives control signal, and the control signal uses level signal;
When the control signal is high level signal, the channel of the NMOS tube generates hot carrier;
Wherein, interfacial state is generated during the hot carrier in jection to gate oxide and oxide layer subsides charge, from And the damage of oxide layer is caused, so that the device parameters of NMOS tube is degenerated;
The grid of the grid of the NMOS tube and the PMOS tube receives input signal, the drain electrode of the NMOS tube with it is described The output signal of the drain electrode output and the input signal reverse phase of PMOS tube;The NMOS tube and the PMOS tube connect into reverse phase Device;
When the input signal is low level signal, the PMOS tube conducting, the NMOS tube cut-off, the output signal For high level signal;When the input signal is high level signal, the PMOS tube is ended, and the NMOS transistor conduction is described defeated Signal is low level signal out.
Above-mentioned metal-oxide-semiconductor parameter degradation circuit, by making the NMOS tube and the PMOS tube connect into the phase inverter, And the source electrode of the NMOS tube is made to receive high level signal, in this way, the NMOS tube in the phase inverter can be made only by HCI Effects, and the PMOS tube is not by HCI effects.
Under the control of the high level signal, internal field increases inside the channel of the NMOS tube, so that described Hot carrier is generated in the channel of NMOS tube, the hot carrier can be injected into gate oxide, arrive in the hot carrier in jection Interfacial state is generated during gate oxide and oxide layer subsides charge, to cause the damage of oxide layer, makes the device of NMOS tube Part parameter degradation;Since the NMOS tube device parameters of phase inverter are degenerated, it is connected by the NMOS tube and the PMOS tube The phase inverter, output signal only will receive the influence of HCI effect, the accuracy of the output signal can be improved.
In addition, further relating to a kind of metal-oxide-semiconductor parameter degradation test circuit.
A kind of metal-oxide-semiconductor parameter degradation test circuit, comprising: parameter measurement circuit and above-mentioned metal-oxide-semiconductor parameter degradation circuit;
The input terminal of the metal-oxide-semiconductor parameter degradation circuit is that the grid of the NMOS tube is connect with the grid of the PMOS tube It is formed, the output end of the metal-oxide-semiconductor parameter degradation circuit is that the drain electrode of the NMOS tube connect shape with the drain electrode of the PMOS tube At;
The input terminal of the metal-oxide-semiconductor parameter degradation circuit is connect with output end, the input terminal of the parameter measurement circuit with The output end of the metal-oxide-semiconductor parameter degradation circuit connects;
The source electrode of the NMOS tube receives the high level signal, and the device parameters of the NMOS tube are degenerated;
The input terminal of the metal-oxide-semiconductor parameter degradation circuit receives the input signal, the metal-oxide-semiconductor parameter degradation circuit Output end exports oscillator signal;The input terminal of the parameter measurement circuit receives the oscillator signal, and measures the concussion letter Number frequency, MOS transistor device parameter can be calculated according to the change rate of the frequency of the oscillator signal and reference frequency ratio Degree of degeneration;
Wherein, the oscillator signal frequency when reference frequency is not degenerated for the device parameters of the NMOS tube.
Above-mentioned metal-oxide-semiconductor parameter degradation test circuit makes the metal-oxide-semiconductor due to using the metal-oxide-semiconductor parameter degradation circuit The input terminal of parameter degradation circuit is connect with output end, therefore can make the parameter measurement circuit test object, i.e., the described MOS The accuracy of the oscillator signal of pipe parameter degradation circuit output, so as to so that the parameter measurement circuit to the concussion The oscillator signal frequency obtained after signal testing can only influence of the reaction HCI effect to MOS transistor device parameter, and by by institute Oscillator signal frequency is stated compared with the reference frequency, accurate MOS transistor device parameter degradation degree can be obtained, to improve State the accuracy of the test result of metal-oxide-semiconductor parameter degradation test circuit.
Additionally relate to a kind of metal-oxide-semiconductor parameter degradation early warning circuit.
A kind of metal-oxide-semiconductor parameter degradation early warning circuit, comprising: the first metal-oxide-semiconductor parameter degradation circuit, the second metal-oxide-semiconductor parameter are moved back Change circuit, selector and parameter measurement circuit;The first metal-oxide-semiconductor parameter degradation circuit uses the metal-oxide-semiconductor parameter degradation Circuit, the second metal-oxide-semiconductor parameter degradation circuit use the metal-oxide-semiconductor parameter degradation circuit;
The grid of the NMOS tube and the grid of the PMOS tube in first metal-oxide-semiconductor parameter degradation circuit connect into described The input terminal of first metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube in the first metal-oxide-semiconductor parameter degradation circuit with it is described The drain electrode of PMOS tube connects into the output end of the first metal-oxide-semiconductor parameter degradation circuit;The first metal-oxide-semiconductor parameter degradation circuit Input terminal connect with output end;
The grid of the NMOS tube and the grid of the PMOS tube in second metal-oxide-semiconductor parameter degradation circuit connect into described The input terminal of second metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube in the second metal-oxide-semiconductor parameter degradation circuit with it is described The drain electrode of PMOS tube connects into the output end of the second metal-oxide-semiconductor parameter degradation circuit;The second metal-oxide-semiconductor parameter degradation circuit Input terminal connect with output end;
The output end of the first metal-oxide-semiconductor parameter degradation circuit is connect with the first input end of the selector, and described The output end of two metal-oxide-semiconductor parameter degradation circuits is connect with the second input terminal of the selector;The output end of the selector with The input terminal of the parameter measurement circuit connects;
The source electrode reception high level signal of NMOS tube in the first metal-oxide-semiconductor parameter degradation circuit, described second The source electrode of NMOS tube in metal-oxide-semiconductor parameter degradation circuit receives the low level signal;The second metal-oxide-semiconductor parameter degradation circuit For the reference circuit of the first metal-oxide-semiconductor parameter degradation circuit;
The enable end of the selector receives the first enable signal, and the selector connects under the control of the first enable signal Lead to the first metal-oxide-semiconductor parameter degradation circuit and the parameter measurement circuit;The input of the first metal-oxide-semiconductor parameter degradation circuit End receives the input signal, and exports the first oscillator signal to the parameter measurement circuit, the parameter measurement circuit measurement The first oscillator signal frequency;
The enable end of the selector receives the first enable signal, and the selector connects under the control of the first enable signal Lead to the second metal-oxide-semiconductor parameter degradation circuit and the parameter measurement circuit;The input of the second metal-oxide-semiconductor parameter degradation circuit End receives the input signal, and exports the second oscillator signal to the parameter measurement circuit, the parameter measurement circuit measurement The second oscillator signal frequency;
Change rate by calculating the ratio of the first oscillator signal frequency and the second oscillator signal frequency can be with The degree of degeneration for reacting metal-oxide-semiconductor parameter is issued warning signal when the degree of degeneration of metal-oxide-semiconductor parameter is more than preset value.
Above-mentioned metal-oxide-semiconductor parameter degradation early warning circuit is by being arranged the first metal-oxide-semiconductor parameter degradation circuit and described the Two metal-oxide-semiconductor parameter degradation circuits, and make the first metal-oxide-semiconductor parameter degradation circuit and the second metal-oxide-semiconductor parameter degradation circuit It include the identical metal-oxide-semiconductor parameter degradation circuit, and the input terminal and output end of the first metal-oxide-semiconductor parameter degradation circuit Connection, the input terminal of the second metal-oxide-semiconductor parameter degradation circuit is connect with output end, and the first metal-oxide-semiconductor parameter degradation is electric The source electrode of the NMOS tube in road receives high level signal, the NMOS tube in the second metal-oxide-semiconductor parameter degradation circuit Source electrode receive low level signal, in this way, the second oscillator signal parameter of the second metal-oxide-semiconductor parameter degradation circuit can be by To the influence of HCI effect, and the first oscillator signal parameter of the first metal-oxide-semiconductor parameter degradation circuit not will receive HCI The influence of effect, thus when selector gates first output end and the second output terminal respectively, the parameter measurement Circuit can measure the frequency of first oscillator signal Yu second oscillator signal respectively, and by calculating first shake Swing the ratio of signal frequency and the second oscillator signal frequency change rate can accurate response metal-oxide-semiconductor parameter degeneration journey Degree issues accurate pre-warning signal when the degree of degeneration of metal-oxide-semiconductor parameter is more than preset value.
In addition, further relating to a kind of metal-oxide-semiconductor parameter degradation test circuit.
A kind of metal-oxide-semiconductor parameter degradation test circuit, comprising: parameter measurement circuit and 2N+1 above-mentioned metal-oxide-semiconductor parameters are moved back Change circuit, wherein N is positive integer;
The grid of the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit connect shape with the grid of the PMOS tube At the input terminal of each metal-oxide-semiconductor parameter degradation circuit, the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit Drain electrode forms the output end of each metal-oxide-semiconductor parameter degradation circuit with the drain electrode connection of the PMOS tube;
The output end of the previous metal-oxide-semiconductor parameter degradation circuit is defeated with next metal-oxide-semiconductor parameter degradation circuit Enter end connection;The input terminal of the parameter measurement circuit is connect with the output end of metal-oxide-semiconductor parameter degradation circuit described in one of them;
The source electrode of each NMOS tube in the metal-oxide-semiconductor parameter degradation circuit receives the identical high level letter Number;
The input terminal of one of them metal-oxide-semiconductor parameter degradation circuit receives the input signal, one of them described MOS The output end of pipe parameter degradation circuit exports oscillator signal, and the input terminal of the parameter measurement circuit receives the oscillator signal, And measure the oscillator signal frequency;
Moving back for MOS transistor device parameter can be calculated according to the frequency of the oscillator signal and the change rate of reference frequency ratio Change degree;
Wherein, the oscillator signal frequency when reference frequency is not degenerated for the device parameters of the NMOS tube.
Above-mentioned metal-oxide-semiconductor parameter degradation test circuit makes previous by using the 2N+1 metal-oxide-semiconductor parameter degradation circuits The output end of metal-oxide-semiconductor parameter degradation circuit described in the output end and the latter of the metal-oxide-semiconductor parameter degradation circuit connects, and makes The source electrode of the NMOS tube of each metal-oxide-semiconductor parameter degradation circuit receives the identical high level signal, in this way, can Influence each metal-oxide-semiconductor parameter degradation circuit only by HCI effect, to guarantee the parameter measurement circuit test pair As the i.e. accuracy of the oscillator signal of one of them metal-oxide-semiconductor parameter degradation circuit output, so that the parameter The oscillator signal frequency that measuring circuit obtains after testing the oscillator signal can only reaction HCI effect join MOS transistor device Several influences, and joined by the way that the oscillator signal frequency compared with the reference frequency, can be obtained to accurate MOS transistor device Number degree of degeneration, to improve the accuracy of the test result of the metal-oxide-semiconductor parameter degradation test circuit.
In addition, further relating to a kind of metal-oxide-semiconductor parameter degradation early warning circuit.
A kind of metal-oxide-semiconductor parameter degradation early warning circuit, comprising: stress annular oscillation circuit, benchmark annular oscillation circuit, selector and parameter Measuring circuit;The stress annular oscillation circuit and the benchmark annular oscillation circuit include 2N+1 above-mentioned metal-oxide-semiconductor parameter degradation electricity Road, wherein N is positive integer;
The grid of NMOS tube and the grid of PMOS tube in each metal-oxide-semiconductor parameter degradation circuit connect into each described The input terminal of metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit and PMOS tube Drain electrode connects into the output end of each metal-oxide-semiconductor parameter degradation circuit;
The output end of the previous metal-oxide-semiconductor parameter degradation circuit in the stress annular oscillation circuit with it is next described The input terminal of metal-oxide-semiconductor parameter degradation circuit connects;The previous metal-oxide-semiconductor parameter degradation circuit in the benchmark annular oscillation circuit Output end connect with the input terminal of next metal-oxide-semiconductor parameter degradation circuit;
The output end and the selector of one of them metal-oxide-semiconductor parameter degradation circuit in the stress annular oscillation circuit First input end connection, the output end of one of them metal-oxide-semiconductor parameter degradation circuit in the benchmark annular oscillation circuit with Second input terminal of the selector connects, and the output end of the selector is connect with the input terminal of the parameter measurement circuit;
The source electrode of the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit in the stress annular oscillation circuit connects Receive the identical high level signal;It is described in each metal-oxide-semiconductor parameter degradation circuit in the benchmark annular oscillation circuit The source electrode of NMOS tube receives the identical low level signal;
The enable end of the selector receives the first enable signal, and the selector connects under the control of the first enable signal Lead to one of them described metal-oxide-semiconductor parameter degradation circuit in the parameter measurement circuit and the stress annular oscillation circuit;It is described to answer The input terminal of one of them metal-oxide-semiconductor parameter degradation circuit in power annular oscillation circuit receives the input signal, and exports the One oscillator signal to the parameter measurement circuit, the parameter measurement circuit measures the first oscillator signal frequency;
The enable end of the selector receives the first enable signal, and the selector connects under the control of the first enable signal Lead to one of them described metal-oxide-semiconductor parameter degradation circuit in the parameter measurement circuit and the benchmark annular oscillation circuit;The base The input terminal of one of them metal-oxide-semiconductor parameter degradation circuit in quasi- annular oscillation circuit receives the input signal, and exports the Two oscillator signals to the parameter measurement circuit, the parameter measurement circuit measures the second oscillator signal frequency;
Change rate by calculating the ratio of the first oscillator signal frequency and the second oscillator signal frequency can be with The degree of degeneration for reacting metal-oxide-semiconductor parameter is issued warning signal when the degree of degeneration of metal-oxide-semiconductor parameter is more than preset value.
Above-mentioned metal-oxide-semiconductor parameter degradation early warning circuit by the way that the stress circuit and the reference circuit is arranged, and makes institute It states stress circuit and the reference circuit includes the 2N+1 metal-oxide-semiconductor parameter degradation circuits, and in the stress circuit The input terminal of metal-oxide-semiconductor parameter degradation circuit described in the output end and the latter of the previous metal-oxide-semiconductor parameter degradation circuit connects, Metal-oxide-semiconductor parameter degradation described in the output end and the latter of the previous metal-oxide-semiconductor parameter degradation circuit in the reference circuit The input terminal of circuit connects, and the source of the NMOS tube in the stress circuit in each metal-oxide-semiconductor parameter degradation circuit Extremely receive identical high level signal, the NMOS in the reference circuit in each metal-oxide-semiconductor parameter degradation circuit The source electrode of pipe receives identical low level signal, in this way, the second oscillator signal parameter of the reference circuit will receive The influence of HCI effect, and the first oscillator signal parameter of the stress circuit not will receive the influence of HCI effect, thus When selector gates first output end and the second output terminal respectively, the parameter measurement circuit can measure respectively The frequency of first oscillator signal and second oscillator signal, and by calculate the first oscillator signal frequency with it is described The change rate of the ratio of second oscillator signal frequency can accurate response metal-oxide-semiconductor parameter degree of degeneration, when metal-oxide-semiconductor parameter When degree of degeneration is more than preset value, accurate pre-warning signal is issued.
Detailed description of the invention
Fig. 1 is metal-oxide-semiconductor parameter degradation electrical block diagram in one embodiment;
Fig. 2 is the simplified structure diagram of metal-oxide-semiconductor parameter degradation circuit in Fig. 1;
Fig. 3 is the structural schematic diagram that metal-oxide-semiconductor parameter degradation tests circuit in one embodiment;
Fig. 4 is that stress annular oscillation circuit or this benchmark annular oscillation circuit contain 5 metal-oxide-semiconductor parameter degradation circuits in one embodiment Structural schematic diagram;
Fig. 5 is that stress annular oscillation circuit or this benchmark annular oscillation circuit contain 2N+1 metal-oxide-semiconductor parameter degradation in one embodiment The structural schematic diagram of circuit;
Fig. 6 is the structural schematic diagram of metal-oxide-semiconductor parameter degradation early warning circuit in one embodiment.
Specific embodiment
It is with reference to the accompanying drawing and preferably real for the effect for further illustrating technological means adopted by the present invention and acquirement Example is applied, to the technical solution of the embodiment of the present invention, carries out clear and complete description.
Referring to Figure 1 and Fig. 2, a kind of metal-oxide-semiconductor parameter degradation circuit, including NMOS tube M1 and PMOS tube M2;The NMOS The grid of pipe M1 is connect with the grid of the PMOS tube M2, and the drain electrode of the NMOS tube M1 connects with the drain electrode of the PMOS tube M2 It connects;The grid of the PMOS tube M2 meets power vd D;The source electrode of the NMOS tube M1 receives control signal Col, the control signal Col uses level signal.When the control signal Col is high level signal, the channel of the NMOS tube M1 generates hot current-carrying Son;Wherein, interfacial state is generated during the hot carrier in jection to gate oxide and oxide layer subsides charge, to cause The damage of oxide layer makes the device parameters of NMOS tube M1 degenerate;The grid of the grid of the NMOS tube M1 and the PMOS tube M2 Receive input signal In, the drain electrode of the NMOS tube M1 and the drain electrode output of the PMOS tube M2 and the input signal In reverse phase Output signal Out.The NMOS tube M1 and the PMOS tube M2 connect into phase inverter, i.e., when the input signal In is low electricity When ordinary mail, the PMOS tube M2 conducting, the NMOS tube M1 cut-off, the output signal Out is high level signal;When described When input signal In is high level signal, the PMOS tube M2 cut-off, the NMOS tube M1 is connected, and the output signal Out is Low level signal.
Above-mentioned metal-oxide-semiconductor parameter degradation circuit, it is described anti-by connecting into the NMOS tube M1 and the PMOS tube M2 Phase device.Influence due to HCI effect to NMOS tube M1 is significant, in the circuit, also connects the source electrode of the NMOS tube M1 High level signal is received, so that the MOS transistor device parameter is only by HCI effects.
Specifically, internal field increases inside the channel of the NMOS tube M1 under the control of the high level signal, make It obtains and generates hot carrier in the channel of the NMOS tube M1, the hot carrier can be injected into gate oxide, in the hot current-carrying Son generates interfacial state during being injected into gate oxide and oxide layer subsides charge, to cause the damage of oxide layer, makes The device parameters of NMOS tube M1 are degenerated;Due to phase inverter NMOS tube M1 device parameters degenerate, by the NMOS tube M1 with The phase inverter that the PMOS tube M2 is connected into, output signal Out only will receive the influence of HCI effect, and institute can be improved State the accuracy of output signal Out.
In order to allow the control signal Col to be stably transmitted to the source electrode of the NMOS tube M1, in one embodiment In, it is also additionally arranged buffer, and connect the output end of the buffer and the source electrode of the NMOS tube M1.In this way, described slow After rushing the input terminal reception control signal Col of device, it can keep and restore the control signal Col, and steadily by it It is transmitted to the source electrode of the NMOS tube M1.Further, in one embodiment, the buffer includes the first CMOS inverter With the second CMOS inverter, the output end of first CMOS inverter is connect with the input terminal of second CMOS inverter, The output end of second CMOS inverter is connect with the source electrode of the NMOS tube M1.Illustratively, the first CMOS reverse phase Device is connected and is formed by the first N-channel MOS pipe M4 and the first P-channel metal-oxide-semiconductor M3, and second CMOS inverter is by the second N-channel Metal-oxide-semiconductor M6 connect to be formed with the second P-channel metal-oxide-semiconductor M5.
Fig. 3 is referred to, in one embodiment, also discloses a kind of metal-oxide-semiconductor parameter degradation test circuit, including parameter is surveyed Amount circuit and above-mentioned metal-oxide-semiconductor parameter degradation circuit, the input terminal of the metal-oxide-semiconductor parameter degradation circuit are connect with output end, institute The input terminal for stating parameter measurement circuit is connect with the output end of the metal-oxide-semiconductor parameter degradation circuit, wherein the metal-oxide-semiconductor parameter The input terminal of degenerative circuit is that the grid of the NMOS tube M1 connect to be formed with the grid of the PMOS tube M2, the metal-oxide-semiconductor ginseng The drain electrode that the output end of number degenerative circuit is the NMOS tube M1 connect to be formed with the drain electrode of the PMOS tube M2.
When test, so that the metal-oxide-semiconductor parameter degradation test circuit is in stress and apply state, that is, control the NMOS tube The source electrode of M1 receives the high level signal, and the NMOS tube M1 is by HCI effects, and device parameters can degenerate.Later The metal-oxide-semiconductor parameter degradation test circuit is set to be in parameter measurement state, even if the input terminal of the metal-oxide-semiconductor parameter degradation circuit The input signal In is received, and the output end of the metal-oxide-semiconductor parameter degradation circuit can export oscillator signal to the parameter and survey Circuit is measured, the parameter measurement circuit measures the frequency of the oscillator signal, and according to the frequency of the oscillator signal The degree of degeneration of MOS transistor device parameter is calculated with the change rate of reference frequency ratio;Wherein, the reference frequency is described Oscillator signal frequency when the device parameters of NMOS tube M1 are not degenerated.
Above-mentioned metal-oxide-semiconductor parameter degradation test circuit makes the metal-oxide-semiconductor due to using the metal-oxide-semiconductor parameter degradation circuit The input terminal of parameter degradation circuit is connect with output end, therefore can make the parameter measurement circuit test object, i.e., the described MOS The accuracy of the oscillator signal of pipe parameter degradation circuit output, so as to so that the parameter measurement circuit to the concussion The oscillator signal frequency obtained after signal testing can only influence of the reaction HCI effect to MOS transistor device parameter, and by by institute Oscillator signal frequency is stated compared with the reference frequency, accurate MOS transistor device parameter degradation degree can be obtained, to improve State the accuracy of the test result of metal-oxide-semiconductor parameter degradation test circuit.
Refer to Fig. 6, in one embodiment, additionally provide it is a kind of can accurate early warning metal-oxide-semiconductor parameter degradation early warning Circuit.
A kind of metal-oxide-semiconductor parameter degradation early warning circuit, including the first metal-oxide-semiconductor parameter degradation circuit, the second metal-oxide-semiconductor parameter degradation Circuit, selector and parameter measurement circuit, the first metal-oxide-semiconductor parameter degradation circuit is using the metal-oxide-semiconductor parameter degradation electricity Road, the second metal-oxide-semiconductor parameter degradation circuit use the metal-oxide-semiconductor parameter degradation circuit.
Wherein, the input terminal of the first metal-oxide-semiconductor parameter degradation circuit is connect with output end, as stress annular oscillation circuit; The grid of the NMOS tube M1 in first metal-oxide-semiconductor parameter degradation circuit and the grid of the PMOS tube M2 connect into described first The input terminal of metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube M1 in the first metal-oxide-semiconductor parameter degradation circuit with it is described The drain electrode of PMOS tube M2 connects into the output end of the first metal-oxide-semiconductor parameter degradation circuit.And the second metal-oxide-semiconductor parameter degradation The input terminal of circuit is connect with output end, as benchmark annular oscillation circuit;The NMOS tube in second metal-oxide-semiconductor parameter degradation circuit The grid of the grid of M1 and the PMOS tube M2 connect into the input terminal of the second metal-oxide-semiconductor parameter degradation circuit, the second metal-oxide-semiconductor The drain electrode of the NMOS tube M1 in parameter degradation circuit and the drain electrode of the PMOS tube M2 connect into the second metal-oxide-semiconductor parameter The output end of degenerative circuit.
The output end of the first metal-oxide-semiconductor parameter degradation circuit is connect with the first input end of the selector, and described The output end of two metal-oxide-semiconductor parameter degradation circuits is connect with the second input terminal of the selector;The output end of the selector with The input terminal of the parameter measurement circuit connects.
In use, so that the metal-oxide-semiconductor parameter degradation early warning circuit is in stress applies state, it is in the selector Off-state, and the source electrode of the NMOS tube M1 in the first metal-oxide-semiconductor parameter degradation circuit is made to receive the high level signal (i.e. First control signal Col_0), and the source electrode of the NMOS tube M1 in the second metal-oxide-semiconductor parameter degradation circuit receives the low electricity Ordinary mail number (i.e. second control signal Col_1), in this way, the first of the first metal-oxide-semiconductor parameter degradation circuit output can be made to shake Signal is by HCI effects, and the second oscillator signal of the second metal-oxide-semiconductor parameter degradation circuit output is not by HCI effect shadow It rings, i.e., the described second metal-oxide-semiconductor parameter degradation circuit can be used as the reference circuit of the first metal-oxide-semiconductor parameter degradation circuit, right Second oscillator signal answered can be used as the reference signal of first oscillator signal.
The metal-oxide-semiconductor parameter degradation early warning circuit is set to be in parameter measurement state later, even if the selector is in work Make state.
Specifically, the enable end of the selector receives the first enable signal En, the selector is in the first enable signal The first metal-oxide-semiconductor parameter degradation circuit and the parameter measurement circuit are connected under the control of En;The first metal-oxide-semiconductor parameter is moved back The input terminal for changing circuit receives the input signal In, and exports the first oscillator signal to the parameter measurement circuit, the ginseng Number measuring circuit measures the first oscillator signal frequency.The enable end of the selector receives the first enable signal En, described Selector is connected to the second metal-oxide-semiconductor parameter degradation circuit and parameter measurement electricity under the control of the first enable signal En Road;The input terminal of the second metal-oxide-semiconductor parameter degradation circuit receives the input signal In, and exports the second oscillator signal to institute Parameter measurement circuit is stated, the parameter measurement circuit measures the second oscillator signal frequency;By calculating first concussion Signal frequency can react the degree of degeneration of metal-oxide-semiconductor parameter with the change rate of the ratio of the second oscillator signal frequency, work as MOS When the degree of degeneration of pipe parameter is more than preset value, the pre-warning signal of sending.
Above-mentioned metal-oxide-semiconductor parameter degradation early warning circuit is by being arranged the first metal-oxide-semiconductor parameter degradation circuit and described the Two metal-oxide-semiconductor parameter degradation circuits, and make the first metal-oxide-semiconductor parameter degradation circuit and the second metal-oxide-semiconductor parameter degradation circuit It include the identical metal-oxide-semiconductor parameter degradation circuit, and the input terminal and output end of the first metal-oxide-semiconductor parameter degradation circuit Connection, the input terminal of the second metal-oxide-semiconductor parameter degradation circuit is connect with output end, and the first metal-oxide-semiconductor parameter degradation is electric The source electrode of the NMOS tube M1 in road receives high level signal, the NMOS in the second metal-oxide-semiconductor parameter degradation circuit The source electrode of pipe M1 receives low level signal, in this way, the second oscillator signal parameter of the second metal-oxide-semiconductor parameter degradation circuit It will receive the influence of HCI effect, and the first oscillator signal parameter of the first metal-oxide-semiconductor parameter degradation circuit not will receive The influence of HCI effect, so that the parameter is surveyed when selector gates first output end and the second output terminal respectively Amount circuit can measure the frequency of first oscillator signal Yu second oscillator signal respectively, and by calculating described first The change rate of the ratio of oscillator signal frequency and the second oscillator signal frequency can accurate response metal-oxide-semiconductor parameter degeneration Degree issues accurate pre-warning signal when the degree of degeneration of metal-oxide-semiconductor parameter is more than preset value.
In addition, the metal-oxide-semiconductor parameter degradation early warning circuit is realized since all units are all made of standard block, it can Different process conditions are adapted to, the transplanting of circuit is conducive to.And the circuit hardware realizes that simply, cost of implementation is lower, therefore, It can also be widely used in digital integrated electronic circuit, the advantage with performance and cost.At the same time, since the metal-oxide-semiconductor is joined Number degeneration early warning circuit can convert metal-oxide-semiconductor parameter degradation caused by HCI effect to the frequency letter that chip can be detected independently Number, it is therefore not necessary to which external equipment assists, the requirement of on-line monitoring can be met.
In order to allow first oscillator signal and second oscillator signal it is stable be transferred to the parameter measurement Circuit is also additionally arranged output buffer circuit in one embodiment, and makes the input terminal for exporting buffer circuit and the choosing The output end connection of device is selected, the output end of the output buffer circuit is connect with the input terminal of the parameter measurement circuit.Specifically , the selector receives first oscillator signal or second oscillator signal, and by first oscillator signal or Second oscillator signal described in person is forwarded to the output buffer circuit, and the output buffer circuit is for keeping and restoring described the First oscillator signal or second oscillator signal perhaps second oscillator signal and are transmitted to by one oscillator signal The parameter measurement circuit.
It can also make the parameter measurement circuit in one embodiment in order to facilitate the parameter measurement circuit is controlled Enable end receive the second enable signal En_C, and the parameter measurement circuit under the control of the second enable signal En_C to institute The frequency for stating the first oscillator signal or the second oscillator signal measures.Further, in one embodiment, it can also add For issuing the first control signal Col_0, the second control signal Col_1, the first enable signal En and institute State the control circuit of the second enable signal En_C.
Fig. 5 is referred to, in one embodiment, additionally provides a kind of metal-oxide-semiconductor parameter degradation test circuit.
A kind of metal-oxide-semiconductor parameter degradation test circuit, comprising: parameter measurement circuit and the 2N+1 metal-oxide-semiconductor parameter degradations Circuit, wherein N is positive integer.Wherein, the output end of the previous metal-oxide-semiconductor parameter degradation circuit and next metal-oxide-semiconductor The input terminal of parameter degradation circuit connects, so that the 2N+1 metal-oxide-semiconductor parameter degradation circuits are sequentially connected and circularize shake Circuit is swung, illustratively, the quantity of the metal-oxide-semiconductor parameter degradation circuit can be set as needed, as shown in Figure 4.And it is described The input terminal of parameter measurement circuit is connect with the output end of metal-oxide-semiconductor parameter degradation circuit described in one of them, wherein each described The grid of the NMOS tube M1 in metal-oxide-semiconductor parameter degradation circuit connect with the grid of the PMOS tube M2 to be formed it is each described The input terminal of metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube M1 in each metal-oxide-semiconductor parameter degradation circuit and institute The drain electrode connection for stating PMOS tube M2 forms the output end of each metal-oxide-semiconductor parameter degradation circuit.
When test, so that the metal-oxide-semiconductor parameter degradation test circuit is in stress and apply state, that is, control each described The source electrode of the NMOS tube M1 in metal-oxide-semiconductor parameter degradation circuit receives the identical high level signal, and each described By HCI effects, device parameters can degenerate the NMOS tube M1 in metal-oxide-semiconductor parameter degradation circuit.Make the MOS later Pipe parameter degradation test circuit is in parameter measurement state, even if the input terminal of one of them metal-oxide-semiconductor parameter degradation circuit Receive the input signal In, and the output end of one of them metal-oxide-semiconductor parameter degradation circuit exports oscillator signal to described Parameter measurement circuit, the parameter measurement circuit measure the frequency of the oscillator signal, and according to the oscillator signal Frequency and the change rate of reference frequency ratio calculate the degree of degeneration of MOS transistor device parameter;Wherein, the reference frequency is Oscillator signal frequency when the device parameters of the NMOS tube M1 are not degenerated.
Above-mentioned metal-oxide-semiconductor parameter degradation test circuit makes previous by using the 2N+1 metal-oxide-semiconductor parameter degradation circuits The output end of metal-oxide-semiconductor parameter degradation circuit described in the output end and the latter of the metal-oxide-semiconductor parameter degradation circuit connects, and makes The source electrode of the NMOS tube M1 of each metal-oxide-semiconductor parameter degradation circuit receives the identical high level signal, in this way, Each metal-oxide-semiconductor parameter degradation circuit can be made only to be influenced by HCI effect, to guarantee the parameter measurement circuit test pair As the i.e. accuracy of the oscillator signal of one of them metal-oxide-semiconductor parameter degradation circuit output, so that the parameter The oscillator signal frequency that measuring circuit obtains after testing the oscillator signal can only reaction HCI effect join MOS transistor device Several influences, and joined by the way that the oscillator signal frequency compared with the reference frequency, can be obtained to accurate MOS transistor device Number degree of degeneration, to improve the accuracy of the test result of the metal-oxide-semiconductor parameter degradation test circuit.
Refer to Fig. 6, in another embodiment, additionally provide it is a kind of can accurate early warning metal-oxide-semiconductor parameter degradation Early warning circuit.
A kind of metal-oxide-semiconductor parameter degradation early warning circuit, comprising: stress annular oscillation circuit, benchmark annular oscillation circuit, selector and parameter Measuring circuit;As shown in figure 5, the stress annular oscillation circuit includes that 2N+1 metal-oxide-semiconductor parameter is moved back with the benchmark annular oscillation circuit Change circuit, wherein N is positive integer.It illustratively, can be according to specific measurement needs, to the stress annular oscillation circuit and the base The number of the metal-oxide-semiconductor parameter degradation circuit in quasi- annular oscillation circuit is set, 5 cascade MOS as shown in Figure 4 Pipe parameter degradation circuit.
Wherein, the grid of the NMOS tube M1 in each metal-oxide-semiconductor parameter degradation circuit is connect with the grid of PMOS tube M2 At the input terminal of each metal-oxide-semiconductor parameter degradation circuit, the leakage of the NMOS tube M1 in each metal-oxide-semiconductor parameter degradation circuit The drain electrode of pole and PMOS tube M2 connect into the output end of each metal-oxide-semiconductor parameter degradation circuit;In the stress annular oscillation circuit The previous metal-oxide-semiconductor parameter degradation circuit output end and next metal-oxide-semiconductor parameter degradation circuit input terminal connect It connects;The output end of the previous metal-oxide-semiconductor parameter degradation circuit in the benchmark annular oscillation circuit and next metal-oxide-semiconductor are joined The input terminal connection of number degenerative circuit;One of them metal-oxide-semiconductor parameter degradation circuit in the stress annular oscillation circuit it is defeated Outlet and is connect as concussion output OutPut with the first input end of the selector, its in the benchmark annular oscillation circuit In metal-oxide-semiconductor parameter degradation circuit output end as concussion output OutPut, and it is defeated with the second of the selector Enter end connection, the output end of the selector is connect with the input terminal of the parameter measurement circuit.
In use, so that the metal-oxide-semiconductor parameter degradation early warning circuit is in stress applies state, even if the NOL ring shakes The source electrode of the NMOS tube M1 in each metal-oxide-semiconductor parameter degradation circuit in circuit receives the identical high level Signal (i.e. first control signal Col_0), and in each metal-oxide-semiconductor parameter degradation circuit in the benchmark annular oscillation circuit The source electrode of the NMOS tube M1 receives the identical low level signal (i.e. second control signal Col_1).In this way, institute can be made The first oscillator signal of the first metal-oxide-semiconductor parameter degradation circuit output is stated by HCI effects, and the second metal-oxide-semiconductor parameter is moved back Change the second oscillator signal of circuit output not by HCI effects, i.e., the described second metal-oxide-semiconductor parameter degradation circuit can be used as institute The reference circuit of the first metal-oxide-semiconductor parameter degradation circuit is stated, corresponding second oscillator signal can be used as first concussion The reference signal of signal.
The metal-oxide-semiconductor parameter degradation early warning circuit is set to be in parameter measurement state later, even if the selector is in work Make state.
Specifically, the enable end of the selector receives the first enable signal En, the selector is in the first enable signal One of them the described metal-oxide-semiconductor parameter degradation being connected under the control of En in the parameter measurement circuit and the stress annular oscillation circuit Circuit;The input terminal of one of them metal-oxide-semiconductor parameter degradation circuit in the stress annular oscillation circuit receives the input letter Number In, and the first oscillator signal is exported to the parameter measurement circuit, parameter measurement circuit measurement the first concussion letter Number frequency.The enable end of the selector receives the first enable signal En, control of the selector in the first enable signal En One of them described metal-oxide-semiconductor parameter degradation circuit in the lower connection parameter measurement circuit and the benchmark annular oscillation circuit;Institute The input terminal for stating one of them metal-oxide-semiconductor parameter degradation circuit in benchmark annular oscillation circuit receives the input signal In, and The second oscillator signal is exported to the parameter measurement circuit, the parameter measurement circuit measures the second oscillator signal frequency; Metal-oxide-semiconductor can be reacted with the change rate of the ratio of the second oscillator signal frequency by calculating the first oscillator signal frequency The degree of degeneration of parameter is issued warning signal when the degree of degeneration of metal-oxide-semiconductor parameter is more than preset value.
Above-mentioned metal-oxide-semiconductor parameter degradation early warning circuit by the way that the stress circuit and the reference circuit is arranged, and makes institute It states stress circuit and the reference circuit includes the 2N+1 metal-oxide-semiconductor parameter degradation circuits, and in the stress circuit The input terminal of metal-oxide-semiconductor parameter degradation circuit described in the output end and the latter of the previous metal-oxide-semiconductor parameter degradation circuit connects, Metal-oxide-semiconductor parameter degradation described in the output end and the latter of the previous metal-oxide-semiconductor parameter degradation circuit in the reference circuit The input terminal of circuit connects, and the NMOS tube M1 in the stress circuit in each metal-oxide-semiconductor parameter degradation circuit Source electrode receives identical high level signal, described in each metal-oxide-semiconductor parameter degradation circuit in the reference circuit The source electrode of NMOS tube M1 receives identical low level signal, in this way, the second oscillator signal parameter of the reference circuit It will receive the influence of HCI effect, and the first oscillator signal parameter of the stress circuit not will receive the shadow of HCI effect It rings, thus when selector gates first output end and the second output terminal respectively, the parameter measurement circuit can be with The frequency of first oscillator signal Yu second oscillator signal is measured respectively, and by calculating the first oscillator signal frequency The change rate of the ratio of rate and the second oscillator signal frequency can accurate response metal-oxide-semiconductor parameter degree of degeneration, work as MOS When the degree of degeneration of pipe parameter is more than preset value, accurate pre-warning signal is issued.
In addition, the metal-oxide-semiconductor parameter degradation early warning circuit is realized since all units are all made of standard block, it can Different process conditions are adapted to, the transplanting of circuit is conducive to.And the circuit hardware realizes that simply, cost of implementation is lower, therefore, It can also be widely used in digital integrated electronic circuit, the advantage with performance and cost.At the same time, since the metal-oxide-semiconductor is joined Number degeneration early warning circuit can convert metal-oxide-semiconductor parameter degradation caused by HCI effect to the frequency letter that chip can be detected independently Number, it is therefore not necessary to which external equipment assists, the requirement of on-line monitoring can be met.
In order to allow first oscillator signal and second oscillator signal it is stable be transferred to the parameter measurement Circuit is also additionally arranged output buffer circuit in one embodiment, and makes the input terminal for exporting buffer circuit and the choosing The output end connection of device is selected, the output end of the output buffer circuit is connect with the input terminal of the parameter measurement circuit.Specifically , the selector receives first oscillator signal or second oscillator signal, and by first oscillator signal or Second oscillator signal described in person is forwarded to the output buffer circuit, and the output buffer circuit is for keeping and restoring described the First oscillator signal or second oscillator signal perhaps second oscillator signal and are transmitted to by one oscillator signal The parameter measurement circuit.
It can also make the parameter measurement circuit in one embodiment in order to facilitate the parameter measurement circuit is controlled Enable end receive the second enable signal En_C, and the parameter measurement circuit under the control of the second enable signal En_C to institute The frequency for stating the first oscillator signal or the second oscillator signal measures.Further, in one embodiment, it can also add For issuing the first control signal Col_0, the second control signal Col_1, the first enable signal En and institute State the control circuit of the second enable signal En_C.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not present Contradiction all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.

Claims (10)

1. a kind of metal-oxide-semiconductor parameter degradation circuit characterized by comprising NMOS tube and PMOS tube;
The grid of the NMOS tube is connect with the grid of the PMOS tube, the drain electrode and the drain electrode of the PMOS tube of the NMOS tube Connection;The source electrode of the PMOS tube connects power supply;
The source electrode of the NMOS tube receives control signal, and the control signal uses level signal;
When the control signal is high level signal, the channel of the NMOS tube generates hot carrier;
Wherein, interfacial state is generated during the hot carrier in jection to gate oxide and oxide layer subsides charge, to make At the damage of oxide layer, the device parameters of NMOS tube is made to degenerate;
The grid of the NMOS tube and the grid of the PMOS tube receive input signal, the drain electrode of the NMOS tube and the PMOS The output signal of the drain electrode output and the input signal reverse phase of pipe;The NMOS tube and the PMOS tube connect into phase inverter;
When the input signal is low level signal, the PMOS tube conducting, the NMOS tube cut-off, the output signal is height Level signal;When the input signal is high level signal, the PMOS tube cut-off, the NMOS transistor conduction, the output letter Number be low level signal.
2. metal-oxide-semiconductor parameter degradation circuit according to claim 1, which is characterized in that further include: buffer;
The output end of the buffer is connect with the source electrode of the NMOS tube;
The input terminal of the buffer receives the control signal, and the control signal is transmitted to the source of the NMOS tube Pole.
3. a kind of metal-oxide-semiconductor parameter degradation tests circuit characterized by comprising parameter measurement circuit and claims 1 or 2 institute The metal-oxide-semiconductor parameter degradation circuit stated;
The input terminal of the metal-oxide-semiconductor parameter degradation circuit is that the grid of the NMOS tube connect shape with the grid of the PMOS tube At the output end of the metal-oxide-semiconductor parameter degradation circuit is that the drain electrode of the NMOS tube connect to be formed with the drain electrode of the PMOS tube;
The input terminal of the metal-oxide-semiconductor parameter degradation circuit is connect with output end, the input terminal of the parameter measurement circuit with it is described The output end of metal-oxide-semiconductor parameter degradation circuit connects;
The source electrode of the NMOS tube receives the high level signal, and the device parameters of the NMOS tube are degenerated;
The input terminal of the metal-oxide-semiconductor parameter degradation circuit receives the input signal, the output of the metal-oxide-semiconductor parameter degradation circuit End output oscillator signal;The input terminal of the parameter measurement circuit receives the oscillator signal, and measures the oscillator signal Frequency calculates the degree of degeneration of MOS transistor device parameter according to the change rate of the frequency of the oscillator signal and reference frequency ratio;
Wherein, the oscillator signal frequency when reference frequency is not degenerated for the device parameters of the NMOS tube.
4. a kind of metal-oxide-semiconductor parameter degradation early warning circuit characterized by comprising the first metal-oxide-semiconductor parameter degradation circuit, the 2nd MOS Pipe parameter degradation circuit, selector and parameter measurement circuit;The first metal-oxide-semiconductor parameter degradation circuit uses claim 1 Or metal-oxide-semiconductor parameter degradation circuit described in 2, the second metal-oxide-semiconductor parameter degradation circuit use MOS of any of claims 1 or 2 Pipe parameter degradation circuit;
The grid of the NMOS tube and the grid of the PMOS tube in first metal-oxide-semiconductor parameter degradation circuit connect into described first The input terminal of metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube in the first metal-oxide-semiconductor parameter degradation circuit and the PMOS The drain electrode of pipe connects into the output end of the first metal-oxide-semiconductor parameter degradation circuit;The first metal-oxide-semiconductor parameter degradation circuit it is defeated Enter end to connect with output end;
The grid of the NMOS tube and the grid of the PMOS tube in second metal-oxide-semiconductor parameter degradation circuit connect into described second The input terminal of metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube in the second metal-oxide-semiconductor parameter degradation circuit and the PMOS The drain electrode of pipe connects into the output end of the second metal-oxide-semiconductor parameter degradation circuit;The second metal-oxide-semiconductor parameter degradation circuit it is defeated Enter end to connect with output end;
The output end of the first metal-oxide-semiconductor parameter degradation circuit is connect with the first input end of the selector, the 2nd MOS The output end of pipe parameter degradation circuit is connect with the second input terminal of the selector;The output end of the selector and the ginseng The input terminal connection of number measuring circuit;
The source electrode reception high level signal of the NMOS tube in the first metal-oxide-semiconductor parameter degradation circuit, described second The source electrode of the NMOS tube in metal-oxide-semiconductor parameter degradation circuit receives the low level signal;The second metal-oxide-semiconductor parameter degradation Circuit is the reference circuit of the first metal-oxide-semiconductor parameter degradation circuit;
The enable end of the selector receives the first enable signal, and the selector is connected to institute under the control of the first enable signal State the first metal-oxide-semiconductor parameter degradation circuit and the parameter measurement circuit;The input of the first metal-oxide-semiconductor parameter degradation circuit terminates It receives the input signal, and exports the first oscillator signal to the parameter measurement circuit, described in the parameter measurement circuit measurement First oscillator signal frequency;
The enable end of the selector receives the first enable signal, and the selector is connected to institute under the control of the first enable signal State the second metal-oxide-semiconductor parameter degradation circuit and the parameter measurement circuit;The input of the second metal-oxide-semiconductor parameter degradation circuit terminates It receives the input signal, and exports the second oscillator signal to the parameter measurement circuit, described in the parameter measurement circuit measurement Second oscillator signal frequency;
Metal-oxide-semiconductor is reacted with the change rate of the ratio of the second oscillator signal frequency by calculating the first oscillator signal frequency The degree of degeneration of parameter is issued warning signal when the degree of degeneration of metal-oxide-semiconductor parameter is more than preset value.
5. metal-oxide-semiconductor parameter degradation early warning circuit according to claim 4, which is characterized in that further include: output caching electricity Road;
The input terminal of the output buffer circuit is connect with the output end of the selector, the output end of the output buffer circuit It is connect with the input terminal of the parameter measurement circuit;
The selector receives first oscillator signal or second oscillator signal, and by first oscillator signal or Second oscillator signal described in person is forwarded to the output buffer circuit, and the output buffer circuit is for keeping and restoring described the First oscillator signal or second oscillator signal perhaps second oscillator signal and are transmitted to by one oscillator signal The parameter measurement circuit.
6. metal-oxide-semiconductor parameter degradation early warning circuit according to claim 4 or 5, which is characterized in that the parameter measurement circuit Enable end receive the second enable signal, the parameter measurement circuit under the control of the second enable signal to it is described first concussion The frequency of signal or the second oscillator signal measures.
7. a kind of metal-oxide-semiconductor parameter degradation tests circuit characterized by comprising parameter measurement circuit and 2N+1 claim 1 or Metal-oxide-semiconductor parameter degradation circuit described in 2, wherein N is positive integer;
The grid of the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit connect to be formed often with the grid of the PMOS tube The input terminal of a metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit The output end of each metal-oxide-semiconductor parameter degradation circuit is formed with the drain electrode connection of the PMOS tube;
The input terminal of the output end of the previous metal-oxide-semiconductor parameter degradation circuit and next metal-oxide-semiconductor parameter degradation circuit Connection;The input terminal of the parameter measurement circuit is connect with the output end of metal-oxide-semiconductor parameter degradation circuit described in one of them;
The source electrode of the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit receives the identical high level signal;
The input terminal of one of them metal-oxide-semiconductor parameter degradation circuit receives the input signal, one of them described metal-oxide-semiconductor ginseng The output end of number degenerative circuit exports oscillator signal, and the input terminal of the parameter measurement circuit receives the oscillator signal, and surveys Measure the oscillator signal frequency;
The degree of degeneration of MOS transistor device parameter is calculated according to the change rate of the frequency of the oscillator signal and reference frequency ratio;
Wherein, the oscillator signal frequency when reference frequency is not degenerated for the device parameters of the NMOS tube.
8. a kind of metal-oxide-semiconductor parameter degradation early warning circuit characterized by comprising stress annular oscillation circuit, benchmark annular oscillation circuit, choosing Select device and parameter measurement circuit;The stress annular oscillation circuit and the benchmark annular oscillation circuit include 2N+1 claims 1 or 2 institute The metal-oxide-semiconductor parameter degradation circuit stated, wherein N is positive integer;
The grid of the NMOS tube and the grid of the PMOS tube in each metal-oxide-semiconductor parameter degradation circuit connect into each The input terminal of the metal-oxide-semiconductor parameter degradation circuit, the drain electrode of the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit with The drain electrode of the PMOS tube connects into the output end of each metal-oxide-semiconductor parameter degradation circuit;
The output end and next metal-oxide-semiconductor of the previous metal-oxide-semiconductor parameter degradation circuit in the stress annular oscillation circuit The input terminal of parameter degradation circuit connects;The previous metal-oxide-semiconductor parameter degradation circuit in the benchmark annular oscillation circuit it is defeated Outlet is connect with the input terminal of next metal-oxide-semiconductor parameter degradation circuit;
The of the output end of one of them metal-oxide-semiconductor parameter degradation circuit in the stress annular oscillation circuit and the selector The connection of one input terminal, the output end of one of them metal-oxide-semiconductor parameter degradation circuit in the benchmark annular oscillation circuit with it is described Second input terminal of selector connects, and the output end of the selector is connect with the input terminal of the parameter measurement circuit;
The source electrode of the NMOS tube in each metal-oxide-semiconductor parameter degradation circuit in the stress annular oscillation circuit receives phase The same high level signal;The NMOS in each metal-oxide-semiconductor parameter degradation circuit in the benchmark annular oscillation circuit The source electrode of pipe receives the identical low level signal;
The enable end of the selector receives the first enable signal, and the selector is connected to institute under the control of the first enable signal State one of them described metal-oxide-semiconductor parameter degradation circuit in parameter measurement circuit and the stress annular oscillation circuit;The NOL ring The input terminal of one of them metal-oxide-semiconductor parameter degradation circuit in vibration circuit receives the input signal, and exports the first shake Signal is swung to the parameter measurement circuit, and the parameter measurement circuit measures the first oscillator signal frequency;
The enable end of the selector receives the first enable signal, and the selector is connected to institute under the control of the first enable signal State one of them described metal-oxide-semiconductor parameter degradation circuit in parameter measurement circuit and the benchmark annular oscillation circuit;The reference rings The input terminal of one of them metal-oxide-semiconductor parameter degradation circuit in vibration circuit receives the input signal, and exports the second shake Signal is swung to the parameter measurement circuit, and the parameter measurement circuit measures the second oscillator signal frequency;
Metal-oxide-semiconductor is reacted with the change rate of the ratio of the second oscillator signal frequency by calculating the first oscillator signal frequency The degree of degeneration of parameter is issued warning signal when the degree of degeneration of metal-oxide-semiconductor parameter is more than preset value.
9. metal-oxide-semiconductor parameter degradation early warning circuit according to claim 8, which is characterized in that further include: output caching electricity Road;
The input terminal of the output buffer circuit is connect with the output end of the selector, the output end of the output buffer circuit It is connect with the input terminal of the parameter measurement circuit;
The selector receives first oscillator signal or second oscillator signal, and by first oscillator signal or Second oscillator signal described in person is forwarded to the output buffer circuit, and the output buffer circuit is for keeping and restoring described the First oscillator signal or second oscillator signal perhaps second oscillator signal and are transmitted to by one oscillator signal The parameter measurement circuit.
10. metal-oxide-semiconductor parameter degradation early warning circuit according to claim 8 or claim 9, which is characterized in that the parameter measurement electricity The enable end on road receives the second enable signal, and the parameter measurement circuit is under the control of the second enable signal to first shake The frequency for swinging signal or the second oscillator signal measures.
CN201610989542.5A 2016-11-10 2016-11-10 Metal-oxide-semiconductor parameter degradation circuit, test circuit and early warning circuit Active CN106533406B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610989542.5A CN106533406B (en) 2016-11-10 2016-11-10 Metal-oxide-semiconductor parameter degradation circuit, test circuit and early warning circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610989542.5A CN106533406B (en) 2016-11-10 2016-11-10 Metal-oxide-semiconductor parameter degradation circuit, test circuit and early warning circuit

Publications (2)

Publication Number Publication Date
CN106533406A CN106533406A (en) 2017-03-22
CN106533406B true CN106533406B (en) 2019-06-07

Family

ID=58350927

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610989542.5A Active CN106533406B (en) 2016-11-10 2016-11-10 Metal-oxide-semiconductor parameter degradation circuit, test circuit and early warning circuit

Country Status (1)

Country Link
CN (1) CN106533406B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107229008B (en) * 2017-05-22 2019-05-21 西安电子科技大学 A kind of measurement method of CMOS inverter MOS threshold voltage
CN112560380A (en) * 2019-09-25 2021-03-26 天津大学 Radio frequency parameter degradation model of MOS transistor using knowledge-based neural network
CN110780178B (en) * 2019-11-25 2022-03-18 珠海复旦创新研究院 Alternating current reliability test circuit and test method for broadband device
CN113835007B (en) * 2020-06-08 2022-09-20 长鑫存储技术有限公司 Method for testing tolerance of hot carrier effect

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6963215B1 (en) * 2004-07-26 2005-11-08 Agere Systems Inc. Operation of semiconductor devices subject to hot carrier injection
CN101089642A (en) * 2006-06-13 2007-12-19 中芯国际集成电路制造(上海)有限公司 Method of accelerating hot carrier injection investigating
CN101271143A (en) * 2008-03-25 2008-09-24 上海集成电路研发中心有限公司 Method for hot carrier injection into test MOS device
CN101303390A (en) * 2008-06-23 2008-11-12 上海集成电路研发中心有限公司 Method for judging MOS device performance degeneration
CN102054839A (en) * 2009-10-28 2011-05-11 无锡华润上华半导体有限公司 Metal oxide semiconductor (MOS) field effect transistor (FET) structure and preparation method thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7567891B1 (en) * 2000-09-29 2009-07-28 Cadence Design Systems, Inc. Hot-carrier device degradation modeling and extraction methodologies

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6963215B1 (en) * 2004-07-26 2005-11-08 Agere Systems Inc. Operation of semiconductor devices subject to hot carrier injection
CN101089642A (en) * 2006-06-13 2007-12-19 中芯国际集成电路制造(上海)有限公司 Method of accelerating hot carrier injection investigating
CN101271143A (en) * 2008-03-25 2008-09-24 上海集成电路研发中心有限公司 Method for hot carrier injection into test MOS device
CN101303390A (en) * 2008-06-23 2008-11-12 上海集成电路研发中心有限公司 Method for judging MOS device performance degeneration
CN102054839A (en) * 2009-10-28 2011-05-11 无锡华润上华半导体有限公司 Metal oxide semiconductor (MOS) field effect transistor (FET) structure and preparation method thereof

Also Published As

Publication number Publication date
CN106533406A (en) 2017-03-22

Similar Documents

Publication Publication Date Title
CN106533406B (en) Metal-oxide-semiconductor parameter degradation circuit, test circuit and early warning circuit
CN102004218B (en) Chip acceptability testing method
CN102522386B (en) Gate-oxidizing-layer interface-trap density-testing structure and testing method
CN102590735B (en) Circuit and method for testing reliability of integrated circuit
CN107450010A (en) IC, which degenerates, manages circuit, system and method
CN102621473B (en) Test method generated by monitoring negative bias temperature instability (NBTI) effect interface states in real time
CN102495352A (en) Multifunctional test circuit of integrated circuit stress degradation and test method thereof
CN102262206A (en) Method for predicting negative bias temperature instability (NBTI) service life of pMOSFET (P-channel Metal Oxide Semiconductor Field Effect Transistor) device
US9933802B1 (en) Systems and methods for built-in self test of low dropout regulators
CN106482829B (en) The dynamic of single-photon detector and static combined test system and its test method
Lemmon et al. Analysis of packaging impedance on performance of SiC MOSFETs
CN102435817B (en) Grid voltage-1/f noise curved measurement method of MOS transistor
Blaum et al. A new robust on-wafer 1/f noise measurement and characterization system
CN206348429U (en) A kind of MOS device HCI reliability testing structures
US6614251B2 (en) Electromigration evaluation circuit
Chowdhury et al. Aging analysis of low dropout regulator for universal recycled ic detection
CN105759190A (en) MOS tube parameter degradation detection circuit
JPS59182535A (en) On-chip voltage monitor and method of using same
CN106960802B (en) A kind of the test device and test method of semiconductor static electric current
Farhadi et al. Gate-oxide degradation monitoring of SiC MOSFETs based on transfer characteristic with temperature compensation
CN103837809A (en) IC layout for testing MOSFET matching and test method
Arnaboldi et al. The design of the input stage for the very front-end of the CUORE experiment
CN108319324A (en) A kind of current mirroring circuit that power supply noise is non-sensitive, chip and communication terminal
CN107991543A (en) The gate charge measurement circuit and its measuring method of insulated gate bipolar transistor
CN108051622A (en) Waveform mitotic apparatus

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant