CN106527058A - Method of data shift in inclined scanning - Google Patents
Method of data shift in inclined scanning Download PDFInfo
- Publication number
- CN106527058A CN106527058A CN201611262960.0A CN201611262960A CN106527058A CN 106527058 A CN106527058 A CN 106527058A CN 201611262960 A CN201611262960 A CN 201611262960A CN 106527058 A CN106527058 A CN 106527058A
- Authority
- CN
- China
- Prior art keywords
- data
- zero padding
- zero
- exposed
- shifted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Image Processing (AREA)
Abstract
The invention discloses a method of data shift in inclined scanning, and data shift is conducted through a field-programmable gate array. The method comprises the steps of reading graphic data, obtaining total row counts of data of a to-be-exposed graphic, calculating the number of zero fill required by each row of the data of the to-be-exposed graphic, and conducting data shaft. According to the method, the shift times are translated into binary numbers, and then data shift is achieved through a bit-by-bit shift method. Compared with an existing data shift method, the shift mode is simple and is easy to achieve. For data shift operation with the zero filling number being in the range of 0-255, the existing method needs 255 case sentences, however, the method of data shift only needs 8 case sentences, and then data shift can be achieved, and accordingly the implementation difficulty of the FPGA is greatly reduced.
Description
Technical field
The present invention relates to write-through technical field of lithography, and in particular to a kind of method of data displacement in tilting scanning.
Background technology
Direct-write type lithography machine equipment is the key facility in semiconductor device production process, and direct-write type lithography machine equipment is profit
Replace the mask plate of conventional lithography machine as pattern generator with spatial light modulator (SLM), such that it is able to directly by computer
Graph data be exposed on wafer, save mask plate expense.
As the development of modern industry is put forward higher requirement to litho machine, the live width for not requiring nothing more than photoetching is less, and
And require speed faster.Traditional vertical scanning cannot meet industrial requirement well, and tilting scan mode exists
Increase optical power, while improving sweep length, can also improve optical resolution.In tilting direct write exposure machine, need
Necessary shifting function is carried out to view data, to correct in tilting scanning, output image direction is with DMD moving directions not
Consistent problem.This shifting function needs to carry out every two field picture real-time processing, and computationally intensive, requirement of real-time is high, letter
The method for changing shifting function, it is possible to greatly improve the efficiency of shifting function.
Image shift is to carry out corresponding data displacement to realize by each row of view data to bitmap forms.
Data displacement supplemented the zero of corresponding number before start of line row.Data displacement is all generally by field programmable gate array
(FPGA) complete, but the data big for operand, when such as needing zero padding 255,255 points will be produced using case statement
, FPGA processes complexity will be very big.
The content of the invention
The purpose of the present invention is aiming at the deficiency of available data shifting algorithm, there is provided in a kind of tilting scanning, data are moved
The method of position, can effectively reduce the complexity of FPGA process, be greatly enhanced the efficiency of shifting function.
Technical scheme is as follows：
A kind of method of data displacement in tilting scanning, the data are shifted through field programmable gate array and carry out, including
Following steps：
Graph data step is read, graph data to be exposed is read from memory module；
Total line number step of graph data to be exposed is obtained, total line number of the graph data to be exposed is calculated, and is treated exposure
Each row of the graph data of light proceeds by numbering by scanning sequency from 1；
Calculate graph data to be exposed needs the number step of zero padding per a line, to the m rows in graph data to be exposed, uses
M is rounded to result m/N downwards divided by obliquity factor N, is rounded result and is designated as,As m rows need the number of zero padding；
Data shifting steps, willBinary number is converted into, the binary number from low level to a high position is started to compile successively from 0
Number, the binary number is started to judge from low level, if present bit time numeral is 1, by the data being expert in starting row
Front benefitIndividual zero, wherein a are the numberings of present bit, the not zero padding if present bit time numeral is for 0, judge all precedences successively
Numeral simultaneously carries out zero padding, completes data displacement.
Preferably, the memory module is Double Data Rate synchronous DRAM.
Preferably, obliquity factor N is any positive integer more than or equal to 4 and less than or equal to 16.
Preferably, the binary number is 8 bit binary numbers.
Preferably, it is describedIt is the positive integer more than or equal to 0 and less than or equal to 255.When between 0-255, can be with
Satisfaction is less than 8 after changing into binary number.
The present invention has the advantages that：
The present invention relates to a kind of method that data are shifted in dip sweeping, by shift count is converted into binary number, then
The method for shifting by turn realizes that data are shifted.Compared with existing data shift method, the displacement mode of the present invention it is simple and
It is easily achieved.For data shifting function of the zero padding number between 0-255, conventional art then needs 255 case statements,
The data shift method of the present invention only needs 8 case statements to be capable of achieving, and significantly reduces the difficulty of FPGA realizations.
Description of the drawings
Fig. 1 is the position relationship during tilting is scanned between SLM and graph data to be exposed；
Fig. 2 be the embodiment of the present invention 1 dip sweeping in data displacement method flow chart；
Fig. 3 is the schematic diagram of 2 data to be shifted of the embodiment of the present invention；
Fig. 4 is the initial data schematic diagram after 2 zero padding of the embodiment of the present invention；
Fig. 5 is the schematic diagram that the embodiment of the present invention 2 completes data displacement.
Specific embodiment
Technical scheme is clearly fully described by below in conjunction with specific embodiments and the drawings.
Accompanying drawing 1 is the position relationship during tilting is scanned between SLM and graph data to be exposed.It can be seen that SLM phases
For there is angle theta between scanning direction.
The following is the specific embodiment of the present invention.
Embodiment 1
As shown in Figure 2, in the tilting scanning of the present embodiment, the method for data displacement carries out data displacement by FPGA, including
Following steps：
Graph data step is read, graph data to be exposed is read from memory module；
Total line number step of graph data to be exposed is obtained, total line number of the graph data to be exposed is calculated, and is treated exposure
Each row of the graph data of light proceeds by numbering by scanning sequency from 1, be designated as respectively the 1st row, the 2nd row, the 3rd row ...,
M rows ... line n；
Calculate graph data to be exposed needs the number step of zero padding per a line, to the m rows in graph data to be exposed, uses
M is rounded to result m/N downwards divided by obliquity factor N, is rounded result and is designated as,As m rows need the number of zero padding.
Obliquity factor N takes more than or equal to 4 and any positive integer less than or equal to 16.
Data shifting steps, willBe converted into binary number, by the binary number from low level to a high position from 0 start according to
Secondary numbering, be designated as respectively p [0], p [1], p [2], p [3] ..., until p [n].In the method for the present inventionUsually 0-255
Between positive integer, it is 8 bit binary numbers to convert the binary number that obtains, therefore to number be from p [0] to p [7].To this two
System number starts to judge from low level, i.e., starts to judge from p [0], if p [0]=1, the data being expert at are mended before starting is arrangedIndividual zero, that is, mend 10；The not zero padding if p [0]=0.The numeral of all precedences is judged successively and zero padding is carried out, and completes data
Displacement.
WithAs a example by=10, it is 00001010 to be converted into 8 bit binary numbers, starts to judge from p [0]：
P [0]=0, not zero padding；
P [1]=1, the data being expert at are mended before starting is arrangedIndividual zero, that is, mend 2 zero；
P [2]=0, not zero padding；
P [3]=1, the data being expert at are mended before starting is arrangedIndividual zero, that is, mend 8 zero；
P [4]=0, not zero padding；
P [5]=0, not zero padding；
P [6]=0, not zero padding；
P [7]=0, not zero padding.
Zero padding is completed, 2+8=10 zero has been mended altogether, that is, has carried out the movement of 10 secondary datas.
Embodiment 2
This gives the data displacement schematic diagram of a certain concrete graph data.
Fig. 3 is the schematic diagram of the present embodiment data to be shifted, and the present embodiment graph data to be shifted has 40 rows, from first
Row open numbering, is designated as the 1st row, the 2nd row, the 3rd row ... respectively until the 40th row.
Obliquity factor N=4 is taken, from the beginning of the 1st row：
1st row,, it is 00000000 to be converted into 8 bit binary numbers, carries out data displacement：
P [0]=0, not zero padding；
P [1]=0, not zero padding；
P [2]=0, not zero padding；
P [3]=0, not zero padding；
P [4]=0, not zero padding；
P [5]=0, not zero padding；
P [6]=0, not zero padding；
P [7]=0, not zero padding.
Therefore the 1st capable not zero padding.
2nd row,, with the 1st row, not zero padding；
3rd row,, with the 1st row, not zero padding；
4th row,, it is 00000001 to be converted into 8 bit binary numbers, carries out data displacement：
P [0]=1, the data of the 4th row are mended before starting is arrangedIndividual zero, that is, mend 1 zero；
P [1]=0, not zero padding；
P [2]=0, not zero padding；
P [3]=0, not zero padding；
P [4]=0, not zero padding；
P [5]=0, not zero padding；
P [6]=0, not zero padding；
P [7]=0, not zero padding.
Zero padding is completed, 1 zero has been mended altogether, that is, has carried out the movement of 1 secondary data.
5th row,, with the 4th row, the data of the 5th row are mended before starting is arrangedIndividual zero, that is, mend 1
Zero.
6th row,, with the 4th row, the data of the 6th row are mended before starting is arrangedIndividual zero, that is, mend 1
Individual zero.
7th row,, with the 4th row, the data of the 7th row are mended before starting is arrangedIndividual zero, that is, mend 1
Individual zero.
Eighth row,, it is 00000010 to be converted into 8 bit binary numbers, carries out data displacement：
P [0]=0, not zero padding；
P [1]=1, the data of the 4th row are mended before starting is arrangedIndividual zero, that is, mend 2 zero；
P [2]=0, not zero padding；
P [3]=0, not zero padding；
P [4]=0, not zero padding；
P [5]=0, not zero padding；
P [6]=0, not zero padding；
P [7]=0, not zero padding.
Zero padding is completed, 2 zero have been mended altogether, that is, has carried out the movement of 2 secondary datas.
Repeat according to above-mentioned steps, complete zero padding operation to remaining row, during to 40 row,, turn
It is 00001010 to turn to 8 bit binary numbers, carries out data displacement：
P [0]=0, not zero padding；
P [1]=1, the data being expert at are mended before starting is arrangedIndividual zero, that is, mend 2 zero；
P [2]=0, not zero padding；
P [3]=1, the data being expert at are mended before starting is arrangedIndividual zero, that is, mend 8 zero；
P [4]=0, not zero padding；
P [5]=0, not zero padding；
P [6]=0, not zero padding；
P [7]=0, not zero padding.
Zero padding is completed, 2+8=10 zero has been mended altogether, that is, has carried out the movement of 10 secondary datas.
Fig. 4 is the initial data schematic diagram after 2 zero padding of the embodiment of the present invention.The data of Fig. 4 are left out according to the total columns of DMD
Redundance, obtains Fig. 5, and as the present embodiment completes the schematic diagram of data displacement.
Use above specific embodiment is elaborated to technical scheme, it is clear that described enforcement
Example is only a part of embodiment of the invention, rather than the embodiment of whole.Meanwhile, the explanation of above example is only intended to side
The core concept of the assistant solution present invention, for one of ordinary skill in the art, according to the thought of the present invention, in specific embodiment party
Will change in formula and range of application.Therefore, based on the embodiment in the present invention, those of ordinary skill in the art are not having
There is all other embodiment obtained under the premise of making creative work, belong to the scope of protection of the invention.In sum,
This specification content should not be construed as limiting the invention.
Claims (5)
1. a kind of method that data are shifted in tilting scanning, the tilting scanning are sent out as figure using spatial light modulator
Raw device, the data are shifted through field programmable gate array and carry out, it is characterised in that the method for the data displacement include as
Lower step：
Graph data step is read, graph data to be exposed is read from memory module；
Total line number step of graph data to be exposed is obtained, total line number of the graph data to be exposed is calculated, and is treated exposure
Each row of the graph data of light proceeds by numbering by scanning sequency from 1；
Calculate graph data to be exposed needs the number step of zero padding per a line, to the m rows in graph data to be exposed, uses
M is rounded to result m/N downwards divided by obliquity factor N, is rounded result and is designated as,As m rows need the number of zero padding；
Data shifting steps, willBinary number is converted into, the binary number from low level to a high position is started to compile successively from 0
Number, the binary number is started to judge from low level, if present bit time numeral is 1, by the data being expert in starting row
Front benefitIndividual zero, wherein a are the numberings of present bit, the not zero padding if present bit time numeral is for 0, judge all precedences successively
Numeral and carry out zero padding, complete data displacement.
2. the method that data are shifted in a kind of tilting scanning according to claim 1, it is characterised in that：The storage mould
Block is Double Data Rate synchronous DRAM.
3. the method that data are shifted in a kind of tilting scanning according to claim 1 or 3, it is characterised in that：It is described to incline
Tiltedly factor N is any positive integer more than or equal to 4 and less than or equal to 16.
4. the method that data are shifted in a kind of tilting scanning according to claim 1, it is characterised in that：The binary system
Number is 8 bit binary numbers.
5. the method that data are shifted in a kind of tilting scanning according to claim 1, it is characterised in that：It is describedFor
Positive integer more than 0 and less than or equal to 255.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611262960.0A CN106527058B (en) | 2016-12-30 | 2016-12-30 | The method of data displacement in a kind of scanning of tilting |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611262960.0A CN106527058B (en) | 2016-12-30 | 2016-12-30 | The method of data displacement in a kind of scanning of tilting |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106527058A true CN106527058A (en) | 2017-03-22 |
| CN106527058B CN106527058B (en) | 2019-03-15 |
Family
ID=58336101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611262960.0A Active CN106527058B (en) | 2016-12-30 | 2016-12-30 | The method of data displacement in a kind of scanning of tilting |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106527058B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114200784A (en) * | 2021-12-24 | 2022-03-18 | 锡凡半导体无锡有限公司 | Maskless laser direct-writing photoetching scanning method capable of improving resolution |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102778819A (en) * | 2012-07-31 | 2012-11-14 | 中国科学院长春光学精密机械与物理研究所 | Exposure frame data generation method used for dot-matrix maskless photoetching |
| CN102890427A (en) * | 2012-09-18 | 2013-01-23 | 天津芯硕精密机械有限公司 | Method for preparing skewed data in field programmable gate array (FPGA) of direct-writing type photoetching system |
| CN103677731A (en) * | 2013-12-12 | 2014-03-26 | 北京北方烽火科技有限公司 | Binary number two-way shifting method and device |
| CN104216238A (en) * | 2014-09-15 | 2014-12-17 | 江苏影速光电技术有限公司 | Method for realizing data skew of direct writing type lithography machine in FPGA |
| CN104281013A (en) * | 2014-09-29 | 2015-01-14 | 天津津芯微电子科技有限公司 | Inclined scanning stitching method of write-through lithography system |
| CN104536269A (en) * | 2014-10-24 | 2015-04-22 | 江苏影速光电技术有限公司 | Method for carrying out splicing improvement by DMD (Digital Micromirror Device) triangular domains in tilting type scanning |
| CN105376070A (en) * | 2015-10-16 | 2016-03-02 | 盛科网络（苏州）有限公司 | Method and system of power chip for adaptively supplying operating voltage to Ethernet packet switching chip |
| CN106155949A (en) * | 2016-06-30 | 2016-11-23 | 联想(北京)有限公司 | A kind of control method and device |
-
2016
- 2016-12-30 CN CN201611262960.0A patent/CN106527058B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102778819A (en) * | 2012-07-31 | 2012-11-14 | 中国科学院长春光学精密机械与物理研究所 | Exposure frame data generation method used for dot-matrix maskless photoetching |
| CN102890427A (en) * | 2012-09-18 | 2013-01-23 | 天津芯硕精密机械有限公司 | Method for preparing skewed data in field programmable gate array (FPGA) of direct-writing type photoetching system |
| CN103677731A (en) * | 2013-12-12 | 2014-03-26 | 北京北方烽火科技有限公司 | Binary number two-way shifting method and device |
| CN104216238A (en) * | 2014-09-15 | 2014-12-17 | 江苏影速光电技术有限公司 | Method for realizing data skew of direct writing type lithography machine in FPGA |
| CN104281013A (en) * | 2014-09-29 | 2015-01-14 | 天津津芯微电子科技有限公司 | Inclined scanning stitching method of write-through lithography system |
| CN104536269A (en) * | 2014-10-24 | 2015-04-22 | 江苏影速光电技术有限公司 | Method for carrying out splicing improvement by DMD (Digital Micromirror Device) triangular domains in tilting type scanning |
| CN105376070A (en) * | 2015-10-16 | 2016-03-02 | 盛科网络（苏州）有限公司 | Method and system of power chip for adaptively supplying operating voltage to Ethernet packet switching chip |
| CN106155949A (en) * | 2016-06-30 | 2016-11-23 | 联想(北京)有限公司 | A kind of control method and device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114200784A (en) * | 2021-12-24 | 2022-03-18 | 锡凡半导体无锡有限公司 | Maskless laser direct-writing photoetching scanning method capable of improving resolution |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106527058B (en) | 2019-03-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104810232B (en) | Twice sweep | |
| EP0066882B1 (en) | Electron beam exposure system | |
| CN107561876A (en) | A kind of new mask-free photolithography system and its technological process | |
| US20110226970A1 (en) | System and method for generating direct-write pattern | |
| CN103996180A (en) | Paper-shredder broken-document restoration method based on English character characteristics | |
| CN101826127A (en) | Method for converting GDSII file into maskless photoetching machine exposure data | |
| CN105404781A (en) | Buffer region generation algorithm method based on line segment buffer region fusion | |
| KR100608117B1 (en) | Exposing method and apparatus for semiconductor integrated circuits | |
| CN106527058A (en) | Method of data shift in inclined scanning | |
| US7262832B2 (en) | Exposure apparatus and exposure method for performing high-speed and efficient direct exposure | |
| CN102778819B (en) | Exposure frame data generation method used for dot-matrix maskless photoetching | |
| CN110187611A (en) | The arrangement method of exposure area on a kind of wafer | |
| US10410356B2 (en) | Method for processing the LEF diagram of a layout | |
| CN102542528A (en) | Image conversion processing method and system | |
| CN109656101B (en) | Data processing method for digital micromirror tilt scanning | |
| CN117314950A (en) | Start-stop coding acceleration point cloud morphology operation system and method in machine vision system | |
| CN107256556A (en) | A kind of solar cell module unit partioning method based on Gray Level Jump thought | |
| CN107045265A (en) | The recombination method of tilting scan data in direct-write type lithography machine | |
| TWI704591B (en) | Drawing data creation method | |
| CN104216238A (en) | Method for realizing data skew of direct writing type lithography machine in FPGA | |
| JPH0341974B2 (en) | ||
| CN113990777A (en) | Method and device for forming yield wafer map, readable storage medium and terminal | |
| Krecinic et al. | Data path development for multiple electron beam maskless lithography | |
| CN112001867A (en) | Monocular stereo matching and accelerating method based on CUDA | |
| CN102376095B (en) | Method and device for obtaining image closing area |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |