CN106507572A - A kind of baseplate carrier and base plate processing device - Google Patents
A kind of baseplate carrier and base plate processing device Download PDFInfo
- Publication number
- CN106507572A CN106507572A CN201610931813.1A CN201610931813A CN106507572A CN 106507572 A CN106507572 A CN 106507572A CN 201610931813 A CN201610931813 A CN 201610931813A CN 106507572 A CN106507572 A CN 106507572A
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- CN
- China
- Prior art keywords
- ion wind
- ion
- baseplate carrier
- venthole
- substrate
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
- H05F3/00—Carrying-off electrostatic charges
- H05F3/06—Carrying-off electrostatic charges by means of ionising radiation
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- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Elimination Of Static Electricity (AREA)
Abstract
The present invention provides a kind of baseplate carrier and base plate processing device.The baseplate carrier, for bearing substrate, including：In order to the support bar of supporting substrate, the supporting surface of the support bar is provided with multiple first ventholes, and the support bar is internally provided with the escape pipe connected with the plurality of first venthole, in order to the plurality of first venthole conveying gas with supporting substrate；For conveying the ion wind structure for conveying of ion wind to substrate；For the ion wind of ion wind is provided to the ion wind structure for conveying provide structure.The base plate processing device, including the baseplate carrier provided by any one embodiment of the present invention.Baseplate carrier provided by the present invention and base plate processing device, can reduce the electrostatic that substrate is produced in process.
Description
Technical field
The present invention relates to the field of manufacturing, more particularly to a kind of baseplate carrier and base plate processing device.
Background technology
In the course of processing of display base plate, due to the time interval of the glass substrate access arrangement of adjacent shorter, position
It is shorter that ion bar above the board in equipment destatics coverage.In frequent generation equipment, glass substrate and board are due to quiet
Electro-adsorption, the situation for causing to carry out normal para-position occur, or even glass breakage occurs, occur this issue handling time compared with
Long.Coat at present to prevent electrostatic from producing using anti-static liquid, but the method effect duration is shorter, during primary coating equipment out of use
Between long, and still not can prove that at present whether the course of processing can make anti-static liquid that degeneration occurs.
Content of the invention
In view of this, the present invention provides a kind of baseplate carrier and base plate processing device, can reduce substrate in the course of processing
The electrostatic of middle generation.
Based on the baseplate carrier that the above-mentioned purpose present invention is provided, for bearing substrate, including：
In order to the support bar of supporting substrate, the supporting surface of the support bar is provided with multiple first ventholes, the support
Bar is internally provided with the escape pipe connected with the plurality of first venthole, in order to convey gas to the plurality of first venthole
Body is with supporting substrate；
For conveying the ion wind structure for conveying of ion wind to substrate；
For the ion wind of ion wind is provided to the ion wind structure for conveying provide structure.
Optionally, the ion wind structure for conveying includes：
Multiple second ventholes being arranged on the supporting surface of the support bar；
The ion wind transfer pipeline connected with the plurality of second venthole.
Optionally, the ion wind transfer pipeline is multiplexed the escape pipe, and the second venthole multiplexing described first goes out
Pore.
Optionally, the ion wind transfer pipeline is arranged at the escape pipe at least side.
Optionally, the ion wind conveyance conduit is arranged at the escape pipe both sides.
Optionally, the support sliver transvers section is " convex " font, including positioned at middle lobe and being located at both sides and height
Extension of the degree less than lobe；The ion wind transfer pipeline is arranged in the extension, and the escape pipe is arranged at institute
State in lobe.
Optionally, the ion wind offer device includes：
Clean dry air provides mechanism：For providing cleaning dry air；
Ion generating mechanism：For producing ion, and ion is made to be mixed in the dry air of the cleaning；
Administration of power supply：For powering to ion generating mechanism so that ion generating mechanism produces ion.
Optionally, the ion generating mechanism is needle-like metal part.
Optionally, the needle-like metal part is arranged at the second venthole.
Optionally, the quantity of first venthole is equal with the quantity of second venthole.
Meanwhile, the present invention provides a kind of base plate processing device, including the substrate provided by any one embodiment of the present invention
Microscope carrier.
From the above it can be seen that the baseplate carrier that provides of the present invention and base plate processing device, except can be to glass
Substrate is provided beyond air supporting function, additionally it is possible to is provided ion wind to substrate while bearing substrate, can be removed substrate in base
The electrostatic produced on onboard platform, it is to avoid accumulate excessive electrostatic on substrate and be adsorbed, causes the follow-up alignment operation cannot be just
Often para-position, it is ensured that the quality of substrate processing；Eliminostatic and substrate processing can be carried out simultaneously, need not expend the unnecessary time,
Ensure that production and processing efficiency.Meanwhile, the embodiment of the present invention carries out simple transformation on the basis of original baseplate carrier and just can
Realize its bearing substrate and reduce or eliminate the function of electrostatic.
Description of the drawings
Support bar cross-sectional structure schematic diagrams of the Fig. 1 for the embodiment of the present invention；
Support bar overlook direction structural representations of the Fig. 2 for the embodiment of the present invention.
Specific embodiment
For making the technical problem to be solved in the present invention, technical scheme and advantage clearer, below in conjunction with accompanying drawing and tool
Body embodiment is described in detail.
Present invention firstly provides a kind of baseplate carrier, for bearing substrate, as shown in figure 1, including：
In order to the support bar 101 of supporting substrate, the supporting surface of the support bar 101 is provided with multiple first ventholes 102,
The support bar is internally provided with the escape pipe 103 connected with the plurality of first venthole 102, in order to the plurality of
One venthole 102 conveys gas with supporting substrate；
For conveying the ion wind structure for conveying of ion wind to substrate；
For the ion wind of ion wind is provided to the ion wind structure for conveying provide structure.
In the course of processing of substrate, due to the time interval of the glass substrate access arrangement of adjacent shorter, positioned at setting
It is shorter that ion bar above standby interior board destatics coverage.In frequent generation equipment, glass substrate and board are due to electrostatic suction
Attached, cause to carry out normal alignment situation generation, or even glass breakage occurs, it is longer that this issue handling time occurs, to whole
Individual technological process causes serious harmful effect.Coat at present to prevent electrostatic from producing using anti-static liquid, but the method has
The effect phase is shorter, primary coating equipment out of use overlong time, and still not can prove that whether the course of processing sends out can anti-static liquid at present
Changing property.
The baseplate carrier that the present invention is provided, on the basis of existing baseplate carrier, sets up static removing structure (i.e. ion
Wind structure for conveying), ion wind can be provided to the substrate for being supported while supporting substrate enables substrate to be processed,
So as to utilize ion wind to remove the electrostatic that substrate is produced on microscope carrier, so as to reach the purpose for eliminating substrate electrostatic.Meanwhile,
The present invention can provide the ion wind when substrate is supported on microscope carrier to substrate, can either eliminate electrostatic, can strengthen again
Support force of the microscope carrier to substrate, improves stability of strutting system, will not stop substrate manufacturing procedure because electrostatic is eliminated, not interfere with
The execution efficiency of whole technique.
In the specific embodiment of the invention, the ion wind structure for conveying can be multiplexed the escape pipe and described first and go out
Pore.
Specifically, the ion wind is the gas with a certain amount of electric charge, when this ion wind is blown on substrate, energy
The electrostatic for enough producing on neutralization substrate, so that reach the purpose for reducing or removing substrate electrostatic.
In some embodiments of the invention, referring still to Fig. 1, the ion wind structure for conveying includes：
Multiple second ventholes 105 being arranged on the supporting surface of the support bar；
The ion wind transfer pipeline connected with the plurality of second venthole 105.
In the specific embodiment of the invention, the ion wind transfer pipeline can be multiplexed the escape pipe.The plurality of
The air supply direction of two ventholes can be with identical, it is also possible to differs.
In some embodiments of the invention, the ion wind transfer pipeline is multiplexed the escape pipe, second venthole
It is multiplexed first venthole.
In some embodiments of the invention, the ion wind transfer pipeline is arranged at the escape pipe at least side, it is ensured that
There is the effect for reducing at least part of region electrostatic.Meanwhile, the ion wind transfer pipeline has the gas for supplementing baseplate carrier
Floating function.
In some embodiments of the invention, the ion wind conveyance conduit is arranged at the escape pipe both sides, further protects
The electrostatic in each region of card substrate can be reduced or eliminate, and strengthen electrostatic removal effect.
In the specific embodiment of the invention, the ion wind includes CDA (clean dry air, Clean Dry Air), examines
Consider CDA gas flows limited, be to ensure air flotation effect and destatic effect, two-way ion wind conveyance conduit is set.
In some embodiments of the invention, referring still to Fig. 1,101 cross section of the support bar is " convex " font, including position
In middle lobe 1011 and positioned at both sides and highly less than the extension 1012 of lobe 1011；The ion wind delivery pipe
Road is arranged in the extension 1012, and the escape pipe 103 is arranged in the lobe.
By above-mentioned this structure, on the basis of the original air supporting function of microscope carrier, the width of support bar lower end, shape is increased
Into " convex " font structure, it is used as ion wind transfer pipeline by adding two tracheas on the support bar of glass microscope carrier substrate, reaches
To the technique effect for eliminating glass substrate back side electrostatic, cause glass substrate mutually to adsorb with baseplate carrier so as to solve electrostatic, make
Obtaining glass substrate cannot the para-position even damaged technical problem of generation.Ion wind transfer pipeline connects the second venthole, is arranged at
The both sides of escape pipe, will not cause significantly to change to the structure of microscope carrier, and the laying of pipeline is also easier.Ion wind is conveyed
Pipeline is symmetrical arranged the stability for being conducive to substrate to support on microscope carrier.Support bar is changed to cross section "convex" shaped structure, energy
Enough strengthen assemble stable of the support bar during gas being provided to substrate.The sphere of action for increasing ion wind is considered,
Second venthole needs there is a certain distance and between glass substrate, and ionic wind nozzle need to be installed on below glass microscope carrier, therefore will
Support bar is designed as " convex " font, while the design is easy to the installation of ionic wind nozzle, dismounting, is changed.
In some embodiments of the invention, the ion wind offer device includes：
Clean dry air provides mechanism：For providing cleaning dry air；
Ion generating mechanism：For producing ion, and ion is made to be mixed in the dry air of the cleaning；
Administration of power supply：For powering to ion generating mechanism so that ion generating mechanism produces ion.
In a particular embodiment, ion generating mechanism can be arranged on the initiating terminal of ion wind conveying circuit, that is, clean dry
Dry air is provided in mechanism, can so simplify circuit design.
Using clean dry air as ion wind air-flow main body when, can reduce the cost of ion wind, clean drying
Air there is untoward reaction essentially without the substrate carried with baseplate carrier.
In some embodiments of the invention, referring still to Fig. 1, ion generating mechanism described in Fig. 1 is needle-like metal part
106.
The needle-like metal part, is elongated metal；Needle-like metal part stretches out second venthole, and the pin
Shape metal parts stretches out the top surface of the height less than the support bar of second venthole, can be in clean dry air
Effectively produce ion and be easily mounted on baseplate carrier.
In some embodiments of the invention, referring still to Fig. 1, the needle-like metal part 106 is arranged at the second venthole
At 105.
In the specific embodiment of the invention, needle-like metal part can be bent, to expand the range of scatter of ion.
Needle-like metal part is arranged at the second venthole, the ion for enabling to produce is effectively utilized, from
Son can be immediately provided to substrate after producing, it is to avoid ion produces loss in the course of conveying of relatively long distance, affect electrostatic to subtract
Less or eradicating efficacy.
In some embodiments of the invention, the quantity of first venthole is equal with the quantity of second venthole.
During processing, the baseplate carrier conveys gas to substrate to substrate, for supporting substrate, gas with base
Plate surface produces electrostatic during rubbing, as shown in Fig. 2 quantity and the second venthole of every side when the first venthole 201
202 quantity is of substantially equal, when the second venthole 202 is arranged at the first 201 both sides of venthole, can efficiently reduce or eliminate
The electrostatic that the gas of each conveying of the first venthole 201 is produced on substrate, while do not interfere with the balance of substrate support.
When the first venthole both sides are provided with the second venthole, corresponding two ion wind of the second venthole of both sides
Transfer pipeline can be separately controlled, such that it is able to adjust the conveying capacity of ion wind as needed.Can also pass through to control power supply machine
The electric energy size that structure is provided, such that it is able to adjust the ionic weight in ion wind.
Meanwhile, the present invention also provides a kind of base plate processing device, including the base provided by any one embodiment of the present invention
Onboard.
From the above it can be seen that the baseplate carrier that provides of the present invention and base plate processing device, except can be to glass
Substrate is provided beyond air supporting function, additionally it is possible to is provided ion wind to substrate while bearing substrate, can be removed substrate in base
The electrostatic produced on onboard platform, it is to avoid accumulate excessive electrostatic on substrate and be adsorbed, causes the follow-up alignment operation cannot be just
Often para-position, it is ensured that the quality of substrate processing；Eliminostatic and substrate processing can be carried out simultaneously, need not expend the unnecessary time,
Ensure that production and processing efficiency.Meanwhile, the embodiment of the present invention carries out simple transformation on the basis of original baseplate carrier and just can
Realize its bearing substrate and reduce or eliminate the function of electrostatic.
It should be appreciated that the multiple embodiments described by this specification are merely to illustrate and explain the present invention, it is not used to limit
The fixed present invention.And in the case where not conflicting, the feature in embodiment and embodiment in the application can be mutually combined.
Obviously, those skilled in the art can carry out the essence of various changes and modification without deviating from the present invention to the present invention
God and scope.So, if these modifications of the present invention and modification belong to the scope of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to comprising these changes and modification.
Claims (11)
1. a kind of baseplate carrier, for bearing substrate, it is characterised in that include：
In order to the support bar of supporting substrate, the supporting surface of the support bar is provided with multiple first ventholes, the support bar
Be internally provided with the escape pipe connected with the plurality of first venthole, in order to the plurality of first venthole conveying gas with
Supporting substrate；
For conveying the ion wind structure for conveying of ion wind to substrate；
For the ion wind of ion wind is provided to the ion wind structure for conveying provide structure.
2. baseplate carrier according to claim 1, it is characterised in that the ion wind structure for conveying includes：
Multiple second ventholes being arranged on the supporting surface of the support bar；
The ion wind transfer pipeline connected with the plurality of second venthole.
3. baseplate carrier according to claim 2, it is characterised in that the ion wind transfer pipeline is multiplexed the outlet
Pipe, second venthole are multiplexed first venthole.
4. baseplate carrier according to claim 2, it is characterised in that the ion wind transfer pipeline is arranged at the outlet
Pipe at least side.
5. baseplate carrier according to claim 4, it is characterised in that the ion wind conveyance conduit is arranged at the outlet
Pipe both sides.
6. baseplate carrier according to claim 5, it is characterised in that the support sliver transvers section is " convex " font, including
It is located at middle lobe and positioned at both sides and highly less than the extension of lobe；The ion wind transfer pipeline is arranged at institute
State in extension, the escape pipe is arranged in the lobe.
7. the baseplate carrier according to any one in claim 1-6, it is characterised in that the ion wind offer device bag
Include：
Clean dry air provides mechanism：For providing cleaning dry air；
Ion generating mechanism：For producing ion, and ion is made to be mixed in the dry air of the cleaning；
Administration of power supply：For powering to ion generating mechanism so that ion generating mechanism produces ion.
8. baseplate carrier according to claim 7, it is characterised in that the ion generating mechanism is needle-like metal part.
9. baseplate carrier according to claim 8, it is characterised in that the needle-like metal part is arranged at the second venthole
Place.
10. baseplate carrier according to claim 2, it is characterised in that the quantity of first venthole and described second
The quantity of venthole is equal.
11. a kind of base plate processing devices, it is characterised in that including the baseplate carrier described in any one in claim 1-10.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610931813.1A CN106507572B (en) | 2016-10-31 | 2016-10-31 | A kind of baseplate carrier and base plate processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610931813.1A CN106507572B (en) | 2016-10-31 | 2016-10-31 | A kind of baseplate carrier and base plate processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106507572A true CN106507572A (en) | 2017-03-15 |
| CN106507572B CN106507572B (en) | 2018-06-08 |
Family
ID=58319671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610931813.1A Expired - Fee Related CN106507572B (en) | 2016-10-31 | 2016-10-31 | A kind of baseplate carrier and base plate processing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106507572B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108633155A (en) * | 2018-06-19 | 2018-10-09 | 深圳市华星光电半导体显示技术有限公司 | Destatic support construction, substrate vehicle equipment |
| WO2018205339A1 (en) * | 2017-05-09 | 2018-11-15 | 深圳市华星光电半导体显示技术有限公司 | Method and device for releasing film stress of array substrate |
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| CN202107331U (en) * | 2011-02-09 | 2012-01-11 | 威驰股份有限公司 | Conveying device provided with static electricity eliminating device |
| WO2012056985A1 (en) * | 2010-10-27 | 2012-05-03 | シャープ株式会社 | Substrate transfer device and substrate processing system provided with same |
| JP2012195362A (en) * | 2011-03-15 | 2012-10-11 | Tokyo Electron Ltd | Substrate transfer device |
| CN103824792A (en) * | 2014-02-28 | 2014-05-28 | 上海和辉光电有限公司 | Storage cabinet and control method thereof |
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2016
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Patent Citations (7)
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|---|---|---|---|---|
| JP2002026110A (en) * | 2000-07-07 | 2002-01-25 | Dainippon Printing Co Ltd | Substrate-carrying arm with destaticizing function |
| CN1891647A (en) * | 2005-07-08 | 2007-01-10 | 株式会社太星技研 | Plate glass transferring device |
| CN101299899A (en) * | 2007-05-01 | 2008-11-05 | 株式会社未来视野 | Charge eliminating and conveying apparatus and charge eliminating method when conveying |
| WO2012056985A1 (en) * | 2010-10-27 | 2012-05-03 | シャープ株式会社 | Substrate transfer device and substrate processing system provided with same |
| CN202107331U (en) * | 2011-02-09 | 2012-01-11 | 威驰股份有限公司 | Conveying device provided with static electricity eliminating device |
| JP2012195362A (en) * | 2011-03-15 | 2012-10-11 | Tokyo Electron Ltd | Substrate transfer device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2018205339A1 (en) * | 2017-05-09 | 2018-11-15 | 深圳市华星光电半导体显示技术有限公司 | Method and device for releasing film stress of array substrate |
| CN108633155A (en) * | 2018-06-19 | 2018-10-09 | 深圳市华星光电半导体显示技术有限公司 | Destatic support construction, substrate vehicle equipment |
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| Publication number | Publication date |
|---|---|
| CN106507572B (en) | 2018-06-08 |
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Granted publication date: 20180608 Termination date: 20201031 |
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