CN106480418A - Cleaning plant, magnetron sputtering coater and process for coating glass - Google Patents
Cleaning plant, magnetron sputtering coater and process for coating glass Download PDFInfo
- Publication number
- CN106480418A CN106480418A CN201610856369.1A CN201610856369A CN106480418A CN 106480418 A CN106480418 A CN 106480418A CN 201610856369 A CN201610856369 A CN 201610856369A CN 106480418 A CN106480418 A CN 106480418A
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- CN
- China
- Prior art keywords
- conveyer
- cleaning plant
- magnetron sputtering
- main body
- baffle plate
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention is applied to off-line coated equipment technical field, there is provided a kind of cleaning plant, for clearing up magnetron sputtering coater, the cleaning plant includes on conveyer and the transmission main body that moves with respect to baffle plate of direction of transfer along conveyer and is fixed in transmission main body and is swelled to peel off the elastic component of the accumulation sputtering thing on cleaning magnetron sputtering coater upwards.The cleaning plant that the present invention is provided is when sputtering thing is piled up in cleaning; only need to be during coating film on glass by cleaning plant on conveyer; when device for clearance is sent to outlet by magnetron sputtering coater entrance; cleaning can be completed; without the need for shutting down; more machine need not be torn open, greatly reduce disposal costs.
Description
Technical field
The invention belongs to off-line coated equipment technical field, more particularly to a kind of cleaning plant, using the cleaning plant
Magnetron sputtering coater and the process for coating glass of coating film on glass is carried out using the magnetron sputtering coater.
Background technology
In recent years, building is more and more diversified to aspects such as energy-conservation, styles, and use of the coated glass in building field is got over
Come more universal.At present, magnetron sputtering film forming has become as a kind of new physical vapor thin film-forming method, and magnetron sputtering coater exists
Apply in the production of coating film on glass also more and more extensive.
Magnetron sputtering plating is referred under vacuum, by coating material as target cathode, using argon ion bombardment target,
Cathodic sputtering is produced, target atom is splashed on workpiece a kind of coating technique for forming sedimentary.
But, during equipment carries out coating film on glass, it may appear that sputtering thing is piled up, and will sputter channel blockage, and cause
Part cathode glow is kept off can not be sputtered on product, cause glass color channel occur and cause to scrap.Side plate is also resulted in sometimes
Lower section sputtering thing is piled up, and extends downwardly, and after certain length is extended up to, when glass is by plated film passage, can cause glass
Glass face scratch, causes product rejection.
Traditional method is to be passed through air to equipment, and equipment is taken apart, side plate is taken out and is cleared up, and whole scale removal process is needed
1～3 day is taken, off-line coated machine belongs to valuable high investment equipment, the caused time cost of shutdown cleaning is higher, therefore, it is necessary to
Reduce return-air number of times as far as possible, shorten clearance time.
Content of the invention
It is an object of the invention to provide a kind of cleaning plant, it is intended to solve in cleaning magnetron sputtering plating in prior art
In machine during sputtering thing, as downtime is long, cause the technical problem that disposal costs are higher.
The present invention is realized in：A kind of cleaning plant, for clearing up magnetron sputtering coater, the magnetron sputtering
Film machine include for launch sputtered atom target cathode, the conveyer for transporting glass and be arranged on the target cathode and
Between the conveyer and a pair of baffle plate of the sputtering passage passed through for the sputtered atom is formed with, the sputtered atom exists
The baffle plate is formed near the conveyer side piles up sputtering thing, and the cleaning plant is included installed in the conveyer
Transmission main body and be fixed on the transmission master that upper and along the conveyer direction of transfer is moved with respect to the baffle plate
On body and to peel off the elastic component for piling up sputtering thing between the transmission main body and the baffle plate.
Further, the quantity of the elastic component is at least 2 pieces, and each elastic component is along the transmission of the conveyer
Direction interval setting, described in the direction of transfer spaced adjacent two along the conveyer, elastic component is in the conveyer
Width stagger setting.
Further, the elastic component is in long strip-board shape, and the two ends of the elastic component are installed in the transmission main body, institute
The distance for elastic component two ends being stated with the transmission main body link position is less than the length of the elastic component so that in the elastic component
Between position swell towards the baffle plate side.
Further, the elastic component includes fixing end and the regulation being distributed along the direction of transfer of the transmission main body
End, is fixedly installed in the fixing end in the transmission main body using the first securing member, adjusts the second securing member in the biography
Send the position of main body and the adjustable side is fixed in the transmission main body the elastic component is adjusted towards the baffle plate one
The height of side protuberance.
Further, the transmission main body be provided with along the transmission main body direction of transfer extend and with the adjustable side phase
Corresponding elongated hole, second securing member through the adjustable side and are lock onto in the elongated hole.
Further, the thickness of the transmission main body is 5～15mm, the maximum waveform offsets of the transmission body upper surface
And arch deviation is not more than 2mm, the maximum waveform offsets of the transmission body lower surface and arch deviation are not more than 2mm.
Present invention also offers a kind of magnetron sputtering coater, the magnetron sputtering coater includes former for launching sputtering
Son target cathode, for transporting glass conveyer, be arranged between the target cathode and the conveyer and be formed with
A pair of baffle plate of the sputtering passage passed through for the sputtered atom, the sputtered atom is in the baffle plate near the conveyer
Side is formed piles up sputtering thing, and the magnetron sputtering coater also includes above-mentioned cleaning plant.
Further, each baffle plate includes to be fixed on the fixed part of the coating machine inwall and along the fixed part court
To the extension extended between the target cathode and the conveyer.
Further, the extension has the inclined-plane towards the conveyer away from one end of the fixed part.
Present invention also offers a kind of process for coating glass, the process for coating glass is comprised the following steps：
Magnetron sputtering coater is provided, the magnetron sputtering coater is above-mentioned magnetron sputtering coater；
In the plated film stage, on the conveyer of the magnetron sputtering coater porch, glass is placed, start described
Conveyer and the magnetron sputtering coater；
The target cathode launches the sputtered atom, and a part of sputtered atom through the sputtering passage and is attached to
The glass surface, forms film layer in glass surface, and sputtered atom described in another part is attached on the baffle plate near described
The side of conveyer is formed piles up sputtering thing；
Clean-up phase, the cleaning plant is installed on the conveyer of the magnetron sputtering coater porch
On, when the cleaning plant is sent to the magnetron sputtering coater exit by the conveyer, complete cleaning.
The present invention having the technical effect that with respect to prior art：The cleaning plant that the present invention is provided is by pacifying cleaning plant
It is mounted on conveyer, cleaning plant is entered inside magnetron sputtering coater with the operating of conveyer, and cleaning plant is in warp
When crossing between baffle plate and conveyer, the accumulation sputtering thing on baffle plate can be peeled off by elastic component with the movement of cleaning plant,
Cleaning plant only need to be arranged on conveyer when sputtering thing is piled up in cleaning during coating film on glass by the cleaning plant
On, when device for clearance is sent to outlet by magnetron sputtering coater entrance, you can complete cleaning, without the need for shutting down, more it is not required to
Machine to be torn open, greatly reduces disposal costs.
Description of the drawings
In order to be illustrated more clearly that the technical scheme of the embodiment of the present invention, below will be to the embodiment of the present invention or prior art
Needed for description, accompanying drawing to be used is briefly described, it should be apparent that, drawings described below is only the present invention's
Some embodiments, for those of ordinary skill in the art, on the premise of not paying creative work, can also be according to this
A little accompanying drawings obtain other accompanying drawings.
Fig. 1 is the front view of cleaning plant provided in an embodiment of the present invention；
Fig. 2 is the top view of cleaning plant provided in an embodiment of the present invention；
Fig. 3 is the first state figure of magnetron sputtering coater provided in an embodiment of the present invention；
Fig. 4 is the second state diagram of magnetron sputtering coater provided in an embodiment of the present invention.
Description of reference numerals：
| 10 | Cleaning plant | 20 | Conveyer |
| 11 | Transmission main body | 30 | Sputtering passage |
| 111 | Elongated hole | 40 | Baffle plate |
| 12 | Elastic component | 41 | Fixed part |
| 121 | Fixing end | 42 | Extension |
| 122 | Adjustable side | 421 | Inclined-plane |
| 13 | First securing member | 50 | Pile up sputtering thing |
| 14 | Second securing member | 60 | Target cathode |
Specific embodiment
Embodiments of the invention are described below in detail, the example of the embodiment is shown in the drawings, wherein from start to finish
Same or similar label represents same or similar element or the element with same or like function.Below with reference to attached
The embodiment of figure description is exemplary, it is intended to for explaining the present invention, and be not considered as limiting the invention.
In describing the invention, it is to be understood that term " length ", " width ", " on ", D score, "front", "rear",
The orientation of instruction such as "left", "right", " vertical ", " level ", " top ", " bottom " " interior ", " outward " or position relationship be based on accompanying drawing institute
The orientation for showing or position relationship, are for only for ease of the description present invention and simplify description, rather than the dress of instruction or hint indication
Put or element must be with specific orientation, with specific azimuth configuration and operation, therefore it is not intended that limit to the present invention
System.
Additionally, term " first ", " second " are only used for describing purpose, and it is not intended that indicating or hint relative importance
Or the implicit quantity for indicating indicated technical characteristic.Thus, define " first ", the feature of " second " can express or
Implicitly include one or more this feature.In describing the invention, " multiple " are meant that two or more,
Unless otherwise expressly limited specifically.
In the present invention, unless otherwise clearly defined and limited, term " installation ", " being connected ", " connection ", " fixation " etc.
Term should be interpreted broadly, for example, it may be fixedly connected, or be detachably connected, or integral；Can be that machinery connects
Connect, or electrically connect；Can be joined directly together, it is also possible to be indirectly connected to by intermediary, can be in two elements
The connection in portion or the interaction relationship of two elements.For the ordinary skill in the art, can be according to concrete feelings
Condition understands above-mentioned term concrete meaning in the present invention.
In order that the objects, technical solutions and advantages of the present invention become more apparent, below in conjunction with drawings and Examples, right
The present invention is further elaborated.
Fig. 1 to Fig. 4 is referred to, cleaning plant provided in an embodiment of the present invention 10 is used for magnetron sputtering coater to be cleared up, institute
State magnetron sputtering coater include for launch sputtered atom target cathode 60, the conveyer 20 for transporting glass and set
Put between the target cathode 60 and the conveyer 20 and be formed with the sputtering passage 30 passed through for the sputtered atom
A pair of baffle plate 40, the sputtered atom is formed near 20 side of the conveyer in the baffle plate 40 piles up sputtering thing 50, institute
State cleaning plant 10 include on the conveyer 20 and along the conveyer 20 direction of transfer with respect to described
Transmission main body 11 and be fixed in the transmission main body 11 and be located at the transmission main body 11 and the gear that baffle plate 40 is moved
To peel off the elastic component 12 for piling up sputtering thing 50 between plate 40.The elastic component 12 is by hard refractory elastomeric material system
Become, the material of the transmission main body 11 is the one kind in plate glass, sheet metal or engineering plastics, and the conveyer 20 can
To be V belt translation, Chain conveyer or a plurality of roller transmission arranged side by side etc., as long as glass and cleaning plant 10 can be splashed by magnetic control
The entrance for penetrating coating machine is sent to outlet.The cleaning plant 10 can be logical with the mounting means of the conveyer 20
Cross the mode of the securing members such as screw, bolt fixation, it is also possible to securing member is not used, directly cleaning plant 10 is placed on transmission dress
Put on 20, drive cleaning plant 10 to move by frictional force.
The embodiment of the present invention passes through by cleaning plant 10 on conveyer 20, and cleaning plant 10 is with conveyer
20 operating is entered inside magnetron sputtering coater, and cleaning plant 10 is when between baffle plate 40 and conveyer 20, elastic
Accumulation sputtering thing 50 on baffle plate 40 can be peeled off by part 12 with the movement of cleaning plant 10, and the cleaning plant 10 is in cleaning
When piling up sputtering thing 50, only need to be during coating film on glass by cleaning plant 10 on conveyer 20, dress for clearance
When putting 10 and outlet is sent to by magnetron sputtering coater entrance, you can complete cleaning, without the need for shutting down, need not more tear machine open, greatly
Disposal costs are reduced greatly.
Fig. 1 and Fig. 2 is referred to, further, the quantity of the elastic component 12 is at least 2 pieces, and each elastic component 12
Along the direction of transfer interval setting of the conveyer 20, along the direction of transfer of the conveyer 20 spaced adjacent two
The elastic component 12 staggers setting in the width of the conveyer 20.Specifically, each elastic component 12 is in the biography
Send in multiple rows of arrangement on the moving direction of main body 11, and the elastic component 12 of adjacent two row is in the width of the transmission main body 11
Stagger setting, arrangement mode of each elastic component 12 in transmission main body 11 in the embodiment of the present invention so that each elastic component 12 is clear
When accumulation sputtering thing 50 is managed, baffle plate 40 can't be contacted simultaneously, but the elastic component 12 of different rows contacts baffle plate 40 simultaneously clearly in batches
The accumulation sputtering thing 50 of corresponding region on reason baffle plate 40, due to reducing while contact 12 quantity of elastic component of baffle plate 40, therefore,
Also reduce the resistance of the movement of cleaning plant 10, it is to avoid in scale removal process, as resistance is excessive, cleaning plant 10 is kept off
Between baffle plate 40 and conveyer 20, it is impossible to move ahead.
Fig. 1 and Fig. 2 is referred to, further, the elastic component 12 is in long strip-board shape, and the two ends of the elastic component 12 are installed
In the transmission main body 11,12 two ends of the elastic component are less than the elasticity with the distance of transmission 11 link position of main body
The length of part 12 is so that 12 middle part of the elastic component is swelled towards 40 side of the baffle plate.Due to 12 two ends of elastic component and biography
Less than the length of elastic component 12, therefore, the middle part of elastic component 12 can be subject to from two ends the distance for sending main body 11 to install
Extruding force and swell upwards, specifically, the fixed range at the two ends of elastic component 12 should cause 12 middle part of elastic component protuberance
Height can be arrived on baffle plate 40 piles up sputtering 50 location of thing.
Fig. 1 and Fig. 2 is referred to, further, the elastic component 12 is included along the direction of transfer of the transmission main body 11
The fixing end 121 is fixedly installed in the transmission using the first securing member 13 by the fixing end 121 of distribution and adjustable side 122
In main body 11, the second securing member 14 is adjusted in the position of the transmission main body 11 and the biography is fixed in the adjustable side 122
Send to adjust the height that the elastic component 12 swells towards 40 side of the baffle plate in main body 11.As the magnetic control of different model splashes
Penetrate the distance between baffle plate 40 and conveyer 20 in coating machine different, accordingly, it is considered to the versatility of cleaning plant 10, by bullet
Property part 12 swell height be set to can adjust so that a cleaning plant 10 goes for the magnetron sputtering of different model
Film machine.It should be understood that the distance that fixing end 121 and adjustable side 122 are installed in transmission main body 11 is nearer, in the middle of elastic component 12
The height of position protuberance is higher.
Fig. 1 and Fig. 2 is referred to, further, the transmission main body 11 is provided with along transmission 11 direction of transfer of main body
Extend and the elongated hole 111 corresponding with the adjustable side 122, second securing member 14 through the adjustable side 122 and is locked
In the elongated hole 111.Specifically, second securing member 14 is to arrange through the elongated hole 111 and by the adjustable side 122
Be pressed on described transmission main body 11 on bolt, in the present embodiment, by adjust position of the securing member in the elongated hole 111 come
Adjustment the distance between fixing end 121 and adjustable side 122, and then adjust the height of 12 middle part of elastic component protuberance.
Fig. 1 and Fig. 2 is referred to, further, the thickness of the transmission main body 11 is 5～15mm, the transmission main body 11
The maximum waveform offsets of upper surface and arch deviation are not more than 2mm, the maximum waveform offsets of 11 lower surface of transmission main body and
Arch deviation is not more than 2mm.The waveform offsets are the difference in height of peak and minimum point on wavy surfaces, and the arch is inclined
Difference is the difference in height of curved surfaces highs and lows, as, during magnetron sputtering coater long-term production, transmission is filled
Put 20 surfaces and a number of accumulation sputtering thing 50 is also had, the height of cleaning plant 10 can be caused to increase, and generally baffle plate 40
19mm is less than with the maximum height of the connecting gear, therefore, in order to avoid due to the excessive height of cleaning plant 10 so that
The thickness for transmitting main body 11 cannot be designed as 5 by gap between baffle plate 40 and conveyer 20 by cleaning plant 10～
15mm, transmits the maximum waveform offsets of 11 upper surface of main body and arch Deviation Design is not more than 2mm, 11 following table of transmission main body
The maximum waveform offsets in face and arch Deviation Design are not more than 2mm, can pass through baffle plate with the height that this ensures cleaning plant 10
Gap between 40 and conveyer 20.
Fig. 3 and Fig. 4 is referred to, the magnetron sputtering coater that the embodiment of the present invention is also provided is included for launching sputtered atom
Target cathode 60, for transporting glass conveyer 20, be arranged between the target cathode 60 and the conveyer 20 simultaneously
A pair of baffle plate 40 of the sputtering passage 30 passed through for the sputtered atom is formed with, the sputtered atom is close in the baffle plate 40
20 side of the conveyer is formed piles up sputtering thing 50, and the magnetron sputtering coater also includes above-mentioned cleaning plant 10.
Magnetron sputtering coater provided in an embodiment of the present invention includes the cleaning plant 10 in the various embodiments described above, the cleaning
Cleaning plant 10 in device 10 and the various embodiments described above is with identical structure, and role is also identical, does not repeat herein.
The embodiment of the present invention passes through by cleaning plant 10 on conveyer 20, and cleaning plant 10 is with conveyer
20 operating is entered inside magnetron sputtering coater, and cleaning plant 10 is when between baffle plate 40 and conveyer 20, elastic
Accumulation sputtering thing 50 on baffle plate 40 can be peeled off by part 12 with the movement of cleaning plant 10, and the cleaning plant 10 is in cleaning
When piling up sputtering thing 50, only need to be during coating film on glass by cleaning plant 10 on conveyer 20, dress for clearance
When putting 10 and outlet is sent to by magnetron sputtering coater entrance, you can complete cleaning, without the need for shutting down, need not more tear machine open, contracting
Short clearance time, reduces disposal costs.
Fig. 3 and Fig. 4 is referred to, further, each baffle plate 40 includes the fixed part for being fixed on the coating machine inwall
41 and along the fixed part 41 towards between the target cathode 60 and the conveyer 20 extend extension 42.Due to target
The sputtered atom launched by negative electrode 60 is irregular splashes, and therefore, baffle plate 40 is fixed on plated film by the embodiment of the present invention
Machine inwall so that be not attached on baffle plate 40, after certain time by sputtering the sputtered atom of passage 30, only baffle plate 40 need to be torn open
Unload and clear up.It should be understood that the cleaning of the cleaning plant 10 is only close 20 side of conveyer on baffle plate 40
Accumulation sputtering thing 50, and the embodiment of the present invention by dismantle the accumulation cleared up of baffle plate 40 sputter thing be on baffle plate 40 remote
Accumulation from 20 side of conveyer sputters thing.
Fig. 4 is referred to, further, the extension 42 has towards the transmission away from one end of the fixed part 41
The inclined-plane 421 of device 20.Generally in coating film on glass, the quantity of the sputtered atom that sputtering passage 30 passes through to be accurately controlled,
The thicknesses of layers of glass surface is controlled with this, specifically controlling sputtered atom by controlling the size of sputtering passage 30
Throughput, the embodiment of the present invention pass through to arrange inclined-plane 421 in extension 42, in the size of control sputtering passage 30, can not
Affected by 40 thickness of baffle plate, the throughput of sputtered atom is more accurately controlled, so as to ensure glass film layers thickness.
Present invention also offers a kind of process for coating glass, the process for coating glass is comprised the following steps：
Magnetron sputtering coater is provided, the magnetron sputtering coater is above-mentioned magnetron sputtering coater；
In the plated film stage, on the conveyer 20 of the magnetron sputtering coater porch, glass is placed, start institute
State conveyer 20 and the magnetron sputtering coater；
The target cathode 60 launches the sputtered atom, and a part of sputtered atom is through the sputtering passage 30 and attached
In the glass surface, film layer being formed in glass surface, sputtered atom described in another part is attached on the baffle plate 40 and leans on
The side of closely described conveyer 20 is formed piles up sputtering thing 50；
Clean-up phase, the cleaning plant 10 is installed on the conveyer of the magnetron sputtering coater porch
On 20, when the cleaning plant 10 is sent to the magnetron sputtering coater exit by the conveyer 20, complete clear
Reason.
During coating film on glass, it may appear that sputtering thing is piled up, sputtering passage 30 is blocked, causes part sputtered atom
Can not be sputtered on product by gear, cause glass color channel occur and cause to scrap.Sputtering thing heap below side plate is also resulted in sometimes
Product, and extend downwardly, after certain length is extended up to, when glass is by plated film passage, glass face scratch can be caused, is made
Become product rejection.Therefore the embodiment of the present invention arranges accumulation sputtering 50 cleanup step of thing after coating film on glass, is avoided the occurrence of with this
The problems referred to above, when sputtering thing 50 is piled up in cleaning, the embodiment of the present invention only need to be by cleaning plant 10 during coating film on glass
On conveyer 20, when device for clearance 10 is sent to outlet by magnetron sputtering coater entrance, you can complete clear
Reason, without the need for shutting down, more need not tear machine open, shorten clearance time, reduce disposal costs.
Presently preferred embodiments of the present invention is the foregoing is only, not in order to limit the present invention, all essences in the present invention
Any modification, equivalent and improvement that is made within god and principle etc., should be included within the scope of the present invention.
Claims (10)
1. a kind of cleaning plant, for clearing up magnetron sputtering coater, the magnetron sputtering coater is included for launching sputtering
The target cathode of atom, for the conveyer of transporting glass and it is arranged between the target cathode and the conveyer and shape
Becoming has a pair of baffle plate of the sputtering passage passed through for the sputtered atom, and the sputtered atom is in the baffle plate near the transmission
Device side is formed piles up sputtering thing, it is characterised in that the cleaning plant is included on the conveyer and along institute
Transmission main body and be fixed in the transmission main body and position that the direction of transfer of conveyer moves is stated with respect to the baffle plate
To peel off the elastic component for piling up sputtering thing between the transmission main body and the baffle plate.
2. cleaning plant as claimed in claim 1, it is characterised in that the quantity of the elastic component is at least 2 pieces, and each described
Elastic component is along the direction of transfer interval setting of the conveyer, spaced adjacent along the direction of transfer of the conveyer
Elastic component described in two staggers setting in the width of the conveyer.
3. cleaning plant as claimed in claim 1, it is characterised in that the elastic component is in long strip-board shape, the elastic component
Two ends are installed in the transmission main body, and the elastic component two ends are less than the bullet with the distance of the transmission main body link position
The length of property part is so that the elastic component middle part is swelled towards the baffle plate side.
4. cleaning plant as claimed in claim 3, it is characterised in that the elastic component includes the transmission along the transmission main body
The fixing end is fixedly installed in the transmission main body using the first securing member by the fixing end being distributed on direction and adjustable side
On, the second securing member is adjusted in the position of the transmission main body and the adjustable side is fixed in the transmission main body to adjust
The height that the elastic component is swelled towards the baffle plate side.
5. cleaning plant as claimed in claim 4, it is characterised in that the transmission main body is provided with and passes along the transmission main body
Direction is sent to extend and the elongated hole corresponding with the adjustable side, second securing member through the adjustable side and lock onto described
In elongated hole.
6. cleaning plant as claimed in claim 1, it is characterised in that the thickness of the transmission main body is 5～15mm, the biography
The maximum waveform offsets of body upper surface and arch deviation is sent to be not more than 2mm, the maximum waveform of the transmission body lower surface is inclined
Difference and arch deviation are not more than 2mm.
7. a kind of magnetron sputtering coater, including the target cathode for launching sputtered atom, the conveyer for transporting glass,
It is arranged between the target cathode and the conveyer and is formed with a pair of the sputtering passage passed through for the sputtered atom
Baffle plate, the sputtered atom is formed near the conveyer side in the baffle plate piles up sputtering thing, it is characterised in that described
Magnetron sputtering coater also includes the cleaning plant as described in claim 1-6 any one.
8. magnetron sputtering coater as claimed in claim 7, it is characterised in that each baffle plate includes to be fixed on the plated film
The fixed part of machine inwall and along the fixed part towards between the target cathode and the conveyer extend extension.
9. magnetron sputtering coater as claimed in claim 8, it is characterised in that the extension is away from the one of the fixed part
End has the inclined-plane towards the conveyer.
10. a kind of process for coating glass, it is characterised in that comprise the following steps：
Magnetron sputtering coater is provided, the magnetron sputtering coater is that the magnetic control as described in claim 7 to 9 any one splashes
Penetrate coating machine；
In the plated film stage, on the conveyer of the magnetron sputtering coater porch, glass is placed, start the transmission
Device and the magnetron sputtering coater；
The target cathode launches the sputtered atom, and a part of sputtered atom through the sputtering passage and is attached to described
Glass surface, forms film layer in glass surface, and sputtered atom described in another part is attached on the baffle plate near the transmission
The side of device is formed piles up sputtering thing；
Clean-up phase, the cleaning plant is installed on the conveyer of the magnetron sputtering coater porch, is treated
When the cleaning plant is sent to the magnetron sputtering coater exit by the conveyer, cleaning is completed.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108863096A (en) * | 2018-08-16 | 2018-11-23 | 重庆市渝大节能玻璃有限公司 | The cathode bottom plate of coating film on glass Anti-splash |
| CN109778128A (en) * | 2017-11-15 | 2019-05-21 | 佳能特机株式会社 | Sputtering equipment |
| CN111285613A (en) * | 2020-03-31 | 2020-06-16 | 台玻安徽玻璃有限公司 | Float glass coating system |
| CN112458426A (en) * | 2020-11-16 | 2021-03-09 | 凯盛科技集团有限公司 | Vacuum magnetron sputtering coating equipment dross removal mechanism |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204824614U (en) * | 2015-06-30 | 2015-12-02 | 中山市格兰特实业有限公司 | Magnetron sputtering glass coating device capable of adjusting baffle gap width |
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204824614U (en) * | 2015-06-30 | 2015-12-02 | 中山市格兰特实业有限公司 | Magnetron sputtering glass coating device capable of adjusting baffle gap width |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109778128A (en) * | 2017-11-15 | 2019-05-21 | 佳能特机株式会社 | Sputtering equipment |
| CN109778128B (en) * | 2017-11-15 | 2022-08-23 | 佳能特机株式会社 | Sputtering device |
| CN108863096A (en) * | 2018-08-16 | 2018-11-23 | 重庆市渝大节能玻璃有限公司 | The cathode bottom plate of coating film on glass Anti-splash |
| CN108863096B (en) * | 2018-08-16 | 2021-02-26 | 重庆市渝大节能玻璃有限公司 | Anti-sputtering cathode base plate for glass coating |
| CN111285613A (en) * | 2020-03-31 | 2020-06-16 | 台玻安徽玻璃有限公司 | Float glass coating system |
| CN111285613B (en) * | 2020-03-31 | 2022-05-27 | 台玻安徽玻璃有限公司 | Float glass coating system |
| CN112458426A (en) * | 2020-11-16 | 2021-03-09 | 凯盛科技集团有限公司 | Vacuum magnetron sputtering coating equipment dross removal mechanism |
| CN112458426B (en) * | 2020-11-16 | 2022-07-08 | 凯盛信息显示材料(洛阳)有限公司 | Vacuum magnetron sputtering coating equipment dross removal mechanism |
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