CN106441126A - Method and system for measuring optical film thicknesses based on reflectivity spectra - Google Patents
Method and system for measuring optical film thicknesses based on reflectivity spectra Download PDFInfo
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- CN106441126A CN106441126A CN201610948968.6A CN201610948968A CN106441126A CN 106441126 A CN106441126 A CN 106441126A CN 201610948968 A CN201610948968 A CN 201610948968A CN 106441126 A CN106441126 A CN 106441126A
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- film thickness
- optical film
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
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Abstract
The invention relates to the technical field of films, in particular to a method and a system for measuring the optical film thicknesses based on reflectivity spectra. The method for measuring the optical film thicknesses based on the reflectivity spectra includes the steps: providing a plurality of standard samples with known optical film thicknesses to obtain the corresponding relationship among the optical film thicknesses of the standard samples and color space coordinates of the optical film reflectivity spectra; acquiring the color space coordinates corresponding to the reflectivity spectra based on the measured reflectivity spectra of the samples to be measured, and acquiring the optical film thicknesses of the samples to be tested according to the corresponding relationship. When the reflectivity spectra of the samples to be tested are measured, optical films on surfaces of the samples to be tested cannot be damaged, testing time is short, so that the method has the advantages of no damage to the optical films and high measuring speed. The system for measuring the optical film thicknesses based on the reflectivity spectra has the advantages of no damage to the optical films and high measuring speed.
Description
【Technical field】
The present invention relates to thin film technique field and in particular to a kind of based on reflectance spectrum measure optical film thickness side
Method and system.
【Background technology】
Optical thin film is the attached dielectric film writing in optical element surface, is changed based on interference of light effect in thin film
Penetrate light intensity, polarization state and the phase place change of light or reflected light, thus reaching the effect of the optical characteristics improving material moreover it is possible to excellent
Change the surface property of optical element, such as improve wearability etc..Utilization on optical element for the optical thin film, can improve optical element
Quality, therefore optical thin film can be widely applied to precision optics equipment, display apparatus to glasses used in daily life,
In the specific products such as digital product.
The thickness of optical thin film has very big impact, existing optically thin thickness to itself performance and application effect
The measuring method of degree is mainly step instrument and Ellipsometric.The test equipment of wherein Ellipsometric is complicated and expensive, and sharp
When being measured with step instrument, optical thin film can be caused damage.Therefore need a kind of quick, lossless measuring method badly to light
Learn film thickness to be tested.
【Content of the invention】
For overcoming existing technical problem, the present invention provides a kind of side measuring optical film thickness based on reflectance spectrum
Method and system, have harmless to optical thin film, and measure quick advantage.
The present invention is to provide one kind optically thin based on reflectance spectrum measurement for solving the technical scheme of above-mentioned technical problem
The method of film thickness, provides the standard sample of multigroup known optical film thickness, obtains optically thin thickness in multigroup standard sample
Corresponding relation between degree and the colour space coordinate of reflection index in optics film spectrum；Reflectance spectrum based on measurement testing sample
And obtain its corresponding colour space coordinate, and obtain the optical film thickness of testing sample according to described corresponding relation.
Preferably, described colour space coordinate is CIELAB color space coordinate.
Preferably, described colour space coordinate is (a*, b*).
Preferably, described based on reflectance spectrum measure optical film thickness method further include：Based on described right
Should be related to, set up data base, described data base includes multigroup one-to-one optical film thickness and reflection index in optics film light
The colour space coordinate data of spectrum.
Preferably, described based on reflectance spectrum measure optical film thickness method further include：Based on described right
Should be related to, obtain the functional relation between optical film thickness and the colour space coordinate of reflection index in optics film spectrum.
Preferably, described standard sample and testing sample include a substrate and the covering optical thin film in substrate surface,
Being measured as of the reflectance spectrum of standard sample and testing sample：It is coated with the base of optical thin film to standard sample and testing sample
Plate surface provides an incident illumination, and receives the reflected light that this incident illumination is formed after the reflection of optical thin film, and then is marked
The colour space coordinate of the reflectance spectrum of quasi- sample and testing sample.
A kind of system measuring optical film thickness based on reflectance spectrum, including measurement module and processing module；Described
Measurement module is used for the reflectance spectrum of measurement standard sample and testing sample and obtains its corresponding colour space coordinate；Described place
Manage between the colour space coordinate that module is used for obtaining optical film thickness and reflection index in optics film spectrum in multigroup standard sample
Corresponding relation, and based on the measurement reflectance spectrum of testing sample and obtain its corresponding colour space coordinate, and according to institute
State the optical film thickness that corresponding relation obtains testing sample.
Preferably, described processing module further includes Database Unit, and described Database Unit includes multigroup 1 a pair
The optical film thickness answered and the colour space coordinate data of reflection index in optics film spectrum.
Preferably, described processing module further includes computing unit, described computing unit include optical film thickness with
Functional relation between the colour space coordinate of reflection index in optics film spectrum.
Preferably, described measurement module includes the optical fiber light of the reflectance spectrum for measurement standard sample and testing sample
Spectrometer；Described fiber spectrometer includes fibre-optical probe, and described fibre-optical probe is in coaxial-type arrangement mode.
With respect to prior art, a kind of method that optical film thickness is measured based on reflectance spectrum that the present invention provides,
The standard sample of multigroup known optical film thickness is provided, obtains optical film thickness in multigroup standard sample anti-with optical thin film
Penetrate the corresponding relation between the colour space coordinate of rate spectrum.Using described corresponding relation, testing sample only need to be measured in measurement
Reflectance spectrum, thus obtaining described reflectance spectrum corresponding colour space coordinate.According to described corresponding relation, using acquisition
Colour space coordinate can get the optical film thickness of testing sample.When measuring the reflectance spectrum of testing sample, for
The optical thin film on testing sample surface does not result in infringement, and the testing time is short, and it is right that method therefore provided by the present invention has
Optical thin film is harmless, and measures quick advantage.Additionally, when the area of testing sample is larger, accompanying optical thin film
Thickness evenness has important impact, using method provided by the present invention, multiple positions of testing sample can be surveyed
Amount, thus obtaining the optical film thickness of multiple positions on testing sample, grasp testing sample optical film thickness uniform
Property, thus the method has good application prospect.
The present invention also offer a kind of based on reflectance spectrum measure optical film thickness system, include measurement module with
Processing module；Described measurement module is used for the reflectance spectrum of measurement standard sample and testing sample and obtains its corresponding color sky
Between coordinate；Described processing module is used for obtaining the color of optical film thickness and reflection index in optics film spectrum in multigroup standard sample
Corresponding relation between space coordinatess, and based on the reflectance spectrum measuring testing sample and obtain its corresponding colour space seat
Mark, and the optical film thickness of testing sample is obtained according to described corresponding relation.Using described corresponding relation, only need in measurement
The reflectance spectrum of measurement testing sample, thus obtain described reflectance spectrum corresponding colour space coordinate.According to described correspondence
Relation, can get the optical film thickness of testing sample using the colour space coordinate obtaining.Reflection in measurement testing sample
Rate light time spectrum, the optical thin film for testing sample surface does not result in infringement, and the testing time is short, therefore provided by the present invention
System have harmless to optical thin film, and measure quick advantage.And, it is when the area of testing sample is larger, appended
The optical film thickness uniformity has important impact, using system provided by the present invention, can be many to testing sample
Individual position measures, thus obtaining the optical film thickness of multiple positions on testing sample, grasps the optically thin of testing sample
The uniformity of film thickness, thus this system has good application prospect.Additionally, by by system modular, effectively improving
The efficiency of measurement and stability.
【Brief description】
Fig. 1 is the schematic flow sheet of the method that the present invention measures optical film thickness based on reflectance spectrum.
Fig. 2 is the schematic flow sheet of step S1 in some preferred embodiments of the present invention.
Fig. 3 is the schematic flow sheet of step S1 in other preferred embodiments of the present invention.
Fig. 4 is the structural representation of the system that the present invention measures optical film thickness based on reflectance spectrum.
Fig. 5 is the structural representation of the variant embodiment of system that the present invention measures optical film thickness based on reflectance spectrum
Figure.
Fig. 6 is the structural representation of the fibre-optical probe of fiber spectrometer in the present invention.
Fig. 7 is different SiO in the present invention first specific embodiment2The position of the colour space coordinate (a*, b*) of film thickness.
Fig. 8 is SiO in the present invention first specific embodiment2Film thickness and the corresponding relation of colour space coordinate (a*, b*)
Figure.
【Specific embodiment】
In order that the purpose of the present invention, technical scheme and advantage become more apparent, below in conjunction with accompanying drawing and embodiment,
The present invention will be described in further detail.It should be appreciated that specific embodiment described herein is only in order to explain the present invention,
It is not intended to limit the present invention.
The invention provides a kind of method that optical film thickness is measured based on reflectance spectrum, provide multigroup known optical
The standard sample of film thickness, obtains the colour space of optical film thickness and reflection index in optics film spectrum in multigroup standard sample
Corresponding relation between coordinate；Based on the measurement reflectance spectrum of testing sample and obtain its corresponding colour space coordinate, and according to
Obtain the optical film thickness of testing sample according to described corresponding relation.Here, it should be noted that the colour space is based on luminosity
Learn, with trichromatic mixing thus describing institute's colored of nature, thus institute's colored of nature all can be sat with the colour space
Mark represents.
Method provided by the present invention utilizes described corresponding relation, only need to measure the reflectance light of testing sample in measurement
Spectrum, thus obtain described reflectance spectrum corresponding colour space coordinate.According to described corresponding relation, sat using the colour space obtaining
Mark can get the optical film thickness of testing sample.When measuring the reflectance spectrum of testing sample, for testing sample table
The optical thin film in face does not result in infringement, and the testing time is short, and method therefore provided by the present invention has to optical thin film no
Infringement, and measure quick advantage.Additionally, when the area of testing sample is larger, accompanying optical film thickness uniformity
There is important impact, using method provided by the present invention, multiple positions of testing sample being measured, thus obtaining
The optical film thickness of multiple positions on testing sample, grasps the uniformity of the optical film thickness of testing sample, thus the party
Method has good application prospect.
The colour space has multiple, and CIELAB color space that such as International Commission on Illumination (CIE) is provided, CIEYxy color are empty
Between, the CIELUV colour space, in addition with HunterLab colour space etc..It is based on reflectance spectrum in one kind provided by the present invention
Measurement optical film thickness method in, described colour space coordinate be CIELAB color space coordinate, CIEYxy colour space coordinate,
One of CIELUV colour space coordinate, HunterLab colour space coordinate, all can obtain described corresponding relation, thus be based on should
Corresponding relation, obtains the optical film thickness of testing sample using the colour space coordinate obtaining.
Wherein it is preferred to, described colour space coordinate be CIELAB color space coordinate, due to CIELAB color space colour gamut relatively
Extensively, precision is higher, can improve the accuracy of the method measurement further.In CIELAB color space its coordinate definition be (L*,
A*, b*), in certain embodiments, can be by L*, tri- coordinate figures of a*, b* are all counted, and set up optical film thickness and light
Learn the corresponding relation between the colour space coordinate of reflectivity of optical thin film spectrum, its accuracy is higher, but needs to count more data.
In some preferred embodiments, by a*, two coordinate figures of b* are all counted, and set up optical film thickness anti-with optical thin film
Penetrate the corresponding relation between the colour space coordinate of rate spectrum, that is, described colour space coordinate is (a*, b*).Using two coordinates
Value can obtain the one-to-one relation between optical film thickness and the colour space coordinate of reflection index in optics film spectrum, energy
Ensure the accuracy of the method；And two coordinate figures, compared to three coordinate figures, effectively reduce the quantity of statistical data, save number
According to the time processing and measure, thus more quick.
Refer to Fig. 1, described included based on the method that reflectance spectrum measures optical film thickness：
Step S1:The standard sample of multigroup known optical film thickness is provided, obtains optical thin film in multigroup standard sample
Corresponding relation between the colour space coordinate of thickness and reflection index in optics film spectrum；
Step S2：The reflectance spectrum of measurement testing sample simultaneously obtains its corresponding colour space coordinate；
Step S3：The chromaticity coordinates space of the reflectance spectrum based on the testing sample obtaining in step S2, and according to step
Corresponding relation described in S1 obtains the optical film thickness of testing sample.
Preferably, the reflectance spectrum of described standard sample and testing sample is measured by fiber spectrometer, that is,
Described step S3 is specially the colour space coordinate of the reflectance spectrum providing a fiber spectrometer to record testing sample, based on described
Functional relation obtains the optical film thickness of testing sample using the colour space coordinate recording.Can be quick using fiber spectrometer
Accurately obtain desired data, the i.e. colour space coordinate of the reflectance spectrum of testing sample, improve the measurement of the method further
Speed and accuracy.When being measured using fiber spectrometer, its speed can reach per second measurement five times, that is, measure once when
Between be 0.2 second, can be good at meeting the requirement of On-line sampling system.
In some preferred embodiments of the present invention, based on described corresponding relation, set up data base, described data base's bag
Include the colour space coordinate data of multigroup one-to-one optical film thickness and reflection index in optics film spectrum.
See also Fig. 2, set up the measuring system of optical film thickness, that is, described step S1 further includes：
Step S11：The standard sample of some known optical film thicknesses is provided, obtains some described standard sample corresponding
The colour space coordinate of reflection index in optics film spectrum；
Step S12：Set up data base, described data base includes some groups of optical film thicknesses and the light of step S11 acquisition
Learn the one-to-one data of colour space coordinate of reflectivity of optical thin film spectrum.
In this embodiment, after recording the colour space coordinate of testing sample, can be obtained by carrying out extraction in data base
Obtain the optical film thickness of testing sample, and because it adopts real statistical data, can guarantee that the accuracy of the method.It is based on
Described previously it is appreciated that described data base in regard to reflection index in optics film spectrum colour space coordinate, can be CIELAB
One of colour space coordinate, CIEYxy colour space coordinate, CIELUV colour space coordinate, HunterLab colour space coordinate, and more
Good, described colour space coordinate is CIELAB color space coordinate, is further, and described colour space coordinate is (a*, b*).
In other preferred embodiments of the present invention, based on described corresponding relation, obtain optical film thickness and light
Learn the functional relation between the colour space coordinate of reflectivity of optical thin film spectrum.
In conjunction with the measuring system shown in Fig. 1 and Fig. 3, setting up optical film thickness, that is, described step S1 further includes：Step
Rapid S11:The standard sample of some known optical film thicknesses is provided, obtains the corresponding optical thin film of some described standard sample anti-
Penetrate the colour space coordinate of rate spectrum；
Step S12：The some groups of optical film thicknesses being obtained using step S11 and its corresponding reflection index in optics film light
The data of the colour space coordinate of spectrum, matching obtains between optical film thickness and the colour space coordinate of reflection index in optics film spectrum
Functional relation.
In this embodiment, after recording the colour space coordinate of testing sample, the functional relation set up, meter can directly be passed through
Calculation obtains optical film thickness, more convenient.It is appreciated that in described functional relation with regard to optics based on described previously
The colour space coordinate of reflectivity of optical thin film spectrum, can be CIELAB color space coordinate, CIEYxy colour space coordinate, CIELUV color sky
Between one of coordinate, HunterLab colour space coordinate, and it is preferred that described colour space coordinate be CIELAB color space sit
Mark, is further that described colour space coordinate is (a*, b*).
, compared with the mode setting up functional relation, setting up data base need not be some to record for the mode setting up data base
The data of the colour space coordinate of group optical film thickness and its corresponding reflection index in optics film spectrum is processed, and sets up data
The process in storehouse is relatively simple, but is the disappearance avoiding intermediate data, needs when setting up data base to test more data；Build
Vertical functional relation needs the color to some groups of optical film thicknesses recording and its corresponding reflection index in optics film spectrum empty
Between the data of coordinate processed, the process setting up functional relation is complex, but it needs when setting up functional relation
Data to be tested is less.In the present invention, because the data of colour space coordinate is complex, by the way of setting up data base
More convenient.
Described standard sample and testing sample include a substrate and cover optical thin film in substrate surface it is preferable that
Being measured as of the reflectance spectrum of standard sample and testing sample：It is coated with the base of optical thin film to standard sample and testing sample
Plate surface provides an incident illumination, and receives the reflected light that this incident illumination is formed after the reflection of optical thin film, and then is marked
The colour space coordinate of the reflectance spectrum of quasi- sample and testing sample.Preferably, measure again after being demarcated, that is, through demarcating
The substrate surface being coated with optical thin film to standard sample and testing sample more afterwards provides an incident illumination.Described incident illumination is radiated at
Testing sample surface, and when measuring to multiple positions on testing sample surface, that is, refer to be radiated at multiple institutes rheme
Put.Preferably wherein that the angle of incidence of described incident illumination is 0-5 degree, the angle of incidence of described incident illumination refer to incident illumination with
Angle between testing sample normal to a surface；Optimum, the angle of incidence of described incident illumination is 0 degree, that is, incident illumination hangs down
Directly it is radiated at testing sample surface.And the angle between reflected light and described normal, that is, angle of reflection is also 0-5 degree, and it depends on
The size of angle of incidence.Likewise, the measurement for standard sample is also such.
It is appreciated that for the reflectance spectrum carrying out standard sample and testing sample measurement when, measuring condition is identical.
Described measuring condition identical i.e. refer to provide incident illumination and receive reflected light condition identical, wherein receive incident illumination bar
Part refers to angle and light intensity of incident illumination etc., and the condition receiving reflected light refers to receive mode and the scope of incident illumination.In reality
Carry out the measurement of the reflectance spectrum of standard sample and testing sample frequently with fiber spectrometer, by described optical fiber in operation
Spectrogrph carries out setting and can ensure that measuring condition is identical.
As shown in figure 4, the present invention also provides a kind of system measuring optical film thickness based on reflectance spectrum, it includes
Measurement module 1 and processing module 2；Described measurement module 1 is used for the reflectance spectrum of measurement standard sample and testing sample and obtains
Take its corresponding colour space coordinate；Described processing module 2 be used for obtaining in multigroup standard sample optical film thickness with optically thin
Corresponding relation between the colour space coordinate of film reflectance spectrum, and based on the reflectance spectrum measuring testing sample and obtain
Its corresponding colour space coordinate, and the optical film thickness of testing sample is obtained according to described corresponding relation.
A kind of system measuring optical film thickness based on reflectance spectrum provided by the present invention, using described corresponding pass
System, only need to measure the reflectance spectrum of testing sample in measurement, thus obtain the corresponding colour space of described reflectance spectrum sitting
Mark.According to described corresponding relation, can get the optical film thickness of testing sample using the colour space coordinate obtaining.In measurement
During the reflectance spectrum of testing sample, the optical thin film for testing sample surface does not result in infringement, and the testing time is short, because
This system provided by the present invention have harmless to optical thin film, and measure quick advantage.And, the face when testing sample
When long-pending larger, accompanying optical film thickness uniformity has important impact, using system provided by the present invention, can be right
Multiple positions of testing sample measure, thus obtaining the optical film thickness of multiple positions on testing sample, grasp to be measured
The uniformity of the optical film thickness of sample, thus this system has good application prospect.Additionally, passing through system module
Change, efficiency and the stability of measurement can be effectively improved.
In some preferred embodiments, described processing module 2 further includes Database Unit 21, and described data base is single
Unit 21 includes the colour space coordinate data of multigroup one-to-one optical film thickness and reflection index in optics film spectrum.So exist
After recording the colour space coordinate of testing sample, carry out extracting the optical thin film that can obtain testing sample by Database Unit 21
Thickness, and because it adopts real statistical data, can guarantee that the accuracy of the method.
As variant embodiment, as shown in figure 5, described processing module 2 further includes computing unit 22, described calculating is single
Unit 22 includes the functional relation between optical film thickness and the colour space coordinate of reflection index in optics film spectrum.So surveying
After obtaining the colour space coordinate of testing sample, optical film thickness directly can be calculated by computing unit 22, more convenient fast
Prompt.
Carry out the mode of extraction of data and the mode phase directly calculating using computing unit 22 using Database Unit 21
Than, because the data in Database Unit 21 is the data of direct measurement gained, need not be processed, but for avoiding mediant
According to disappearance, in Database Unit 21 storage data more；And the functional relation in computing unit 22 is during setting up
Complex, but its data needing is less.In the present invention, because the data of colour space coordinate is complex, using data
The mode of the extraction that library unit 21 carries out data is more convenient.
Preferably, as shown in Figures 4 and 5, described measurement module 1 is included for measurement standard sample and testing sample
The fiber spectrometer 10 of reflectance spectrum.Desired data, i.e. testing sample can fast and accurately be obtained using fiber spectrometer 10
Reflectance spectrum colour space coordinate, improve the measuring speed of the method and accuracy further.Using fiber spectrometer 10
When measuring, its speed can reach measurement per second five times, that is, the time once of measuring is 0.2 second, can be good at meeting and exists
The requirement of line measurement in real time.It is appreciated that for the reflectance spectrum carrying out standard sample and testing sample measurement when, measurement
Condition is identical.Therefore, can ensure that measuring condition is identical in practical operation by described fiber spectrometer is carried out with setting.
Preferably, as shown in fig. 6, described fiber spectrometer 10 includes fibre-optical probe 11, described fibre-optical probe 11 includes using
In the luminous source optical fiber 12 providing incident illumination with for receiving the reflected light that this incident illumination is formed after the reflection of optical thin film
Sensor fiber 13, and then the colour space coordinate with the reflectance spectrum of testing sample that gets standard samples.Preferably, enter rower
Measure again after fixed, passing through described fibre-optical probe 11 after demarcating again provides incident illumination.
Described incident illumination is radiated at testing sample surface, and works as and multiple positions on testing sample surface need to be measured
When, that is, refer to be radiated on multiple described positions.It is preferably wherein that the angle of incidence of described incident illumination is 0-5 degree, described incidence
The angle of incidence of light refers to the angle between incident illumination and testing sample normal to a surface；Optimum, the entering of described incident illumination
Firing angle is 0 degree, that is, incident illumination vertical irradiation is on testing sample surface.And the angle between reflected light and described normal, that is,
Angle of reflection is also 0-5 degree, and it depends on the size of angle of incidence.Likewise, the measurement for standard sample is also such.
Measure described standard sample and testing sample reflectance spectrum when, described fibre-optical probe 11 against standard sample and
Testing sample is coated with the surface of optical thin film, and vertical with this surface.So can guarantee that the incident optical energy that luminous source optical fiber 12 provides
Vertical irradiation is on the surface of standard sample and testing sample, and ensures that sensor fiber 13 can receive reflected light well, protects
Demonstrate,prove the accurate of measurement data.
The arrangement mode of described fibre-optical probe 11 can be run-in index, coaxial-type, random mode or semi-circular.Preferably,
Described fibre-optical probe 11 is in coaxial-type arrangement mode, and that is, as shown in Figure 6, luminous source optical fiber 12 is located at center, described sensing
Device optical fiber 13 is ringwise evenly distributed on luminous source optical fiber 12 around.The light source of so luminous source optical fiber 12 transmitting is sent out from the central position
Go out, the ambient sensors optical fiber 13 being distributed in luminous source optical fiber 12 can preferably receive the reflected light after testing sample reflection.Institute
Stating fibre-optical probe 11 can be for individual pen coaxial-type arrangement mode it is also possible to be multi-turn coaxial-type arrangement mode.Preferably, described
Fibre-optical probe 11 is in individual pen coaxial-type arrangement mode, and the quantity of described luminous source optical fiber 12 is 1, the quantity of described sensor fiber 13
For 4-8.By optimizing arrangement mode further, and determine the quantity of luminous source optical fiber 12 and sensor fiber 13 it is ensured that measurement is accurate
While exactness, simplify the structure of fibre-optical probe 11 as far as possible.
A kind of method and system measuring optical film thickness based on reflectance spectrum provided by the present invention, can test
Several samples.Its reason is, testing sample is the optically thin thin film covering in substrate layer surface including a substrate layer and one
Structure, the refractive index-function of light wavelength due to substrate layer and optically thin thin film fixes, the therefore reflectance spectrum of testing sample
Only relevant with optical film thickness.Specifically, testing sample can be substrate layer be glass or silicon chip, optics bag thin film be SiO2
Thin film, SiC thin film or SiCO thin film.
First specific embodiment
In this specific embodiment, testing sample is to be coated with SiO2The glass of thin film.SiO known to some groups is provided first2Thin
The standard sample of film thickness, measurement obtains SiO2The related data of reflectivity of optical thin film spectrum, the data recording is as shown in table 1.
Table 1SiO2Film thickness and visible reflectance (R), CIELAB color space coordinate (L*, a*, b*) corresponding relation
As shown in Table 1, different SiO2The different CIELAB color space coordinate (L*, a*, b*) of film thickness correspondence, at this
It is with the SiO at interval of 5nm in table2Film thickness measures it will be understood that in practical application it is also possible to less
Interval such as 3nm, 1nm etc. measures.Additionally due to colour space coordinate, that is, the CIELAB color as mentioned in aforementioned herein is empty
Between, the CIEYxy colour space, the CIELUV colour space, the HunterLab colour space be three-dimensional coordinate, therefore all can obtain SiO2Thin film
Thickness and the one-to-one data of colour space coordinate.
Wherein preferably, can get SiO using colour space coordinate for (a*, b*)2Film thickness and colour space coordinate one
One-to-one correspondence.As shown in Figure 7, this in figure is using the data in table 1, collated after the different SiO that obtain2Thin film is thick
The position of the colour space coordinate (a*, b*) of degree；And as shown in Figure 8, this in figure is using the data in table 1, collated after
The SiO obtaining2Film thickness and the corresponding relation figure of colour space coordinate (a*, b*).As shown in Figure 7, different SiO2Film thickness
Colour space coordinate (a*, b*) is not in overlap it is possible to understand that SiO2The thickness of thin film once it is determined that, colour space coordinate (a*,
B*) also determine that.Can be clear that by Fig. 6, different SiO2Film thickness corresponding difference colour space coordinate (a*, b*).Cause
This, all can illustrate method provided by the present invention from Fig. 7 and Fig. 8, can guarantee that and obtain colour space coordinate (a*, b*) and SiO2Thin film
The one-to-one relationship of thickness, thus carry out accurate measurement to optical film thickness.
Specifically, after obtaining above-mentioned data, when carrying out testing sample measurement, by the colour space coordinate that records (a*,
B*), you can quickly obtain SiO2Film thickness.For example, when the colour space that we obtain is (- 0.509, -0.411), permissible
Corresponding obtain SiO2Film thickness is 25nm；When the colour space that we obtain is (- 0.410,0.321), can be corresponding
Obtain SiO2Film thickness is 60nm；When the colour space that we obtain is (- 0.189, -1.289), can corresponding obtain
SiO2Film thickness is 95nm.
Compared with prior art, a kind of side measuring optical film thickness based on reflectance spectrum provided by the present invention
Method, provides the standard sample of multigroup known optical film thickness, obtain in multigroup standard sample optical film thickness with optically thin
Corresponding relation between the colour space coordinate of film reflectance spectrum.Using described corresponding relation, only need to measure to be measured in measurement
The reflectance spectrum of sample, thus obtain described reflectance spectrum corresponding colour space coordinate.According to described corresponding relation, utilize
The colour space coordinate obtaining can get the optical film thickness of testing sample.When measuring the reflectance spectrum of testing sample,
Optical thin film for testing sample surface does not result in infringement, and the testing time is short, method tool therefore provided by the present invention
Have harmless to optical thin film, and measure quick advantage.Additionally, when the area of testing sample is larger, accompanying optics
Film gauge uniformity has important impact, using method provided by the present invention, multiple positions of testing sample can be entered
Row measurement, thus obtaining the optical film thickness of multiple positions on testing sample, grasps the optical film thickness of testing sample
Uniformity, thus the method has good application prospect.
It is further that described colour space coordinate is CIELAB color space coordinate, the colour gamut of CIELAB color space is wider, essence
Degree is higher, can improve the accuracy of the method measurement further.
It is further that described colour space coordinate is (a*, b*), can obtain optical film thickness using two coordinate figures
One-to-one relation and the colour space coordinate of reflection index in optics film spectrum between, can guarantee that the accuracy of the method；And
Two coordinate figures, compared to three coordinate figures, effectively reduce the quantity of statistical data, save the time of data processing and measurement,
Thus it is more quick.
Be further, described based on reflectance spectrum measure optical film thickness method further include：Based on institute
State corresponding relation, set up data base, described data base is included multigroup one-to-one optical film thickness and reflected with optical thin film
The colour space coordinate data of rate spectrum.After recording the colour space coordinate of testing sample, by carrying out extracting in data base
Obtain the optical film thickness of testing sample, and because it adopts real statistical data, can guarantee that the accuracy of the method.
Be further, described based on reflectance spectrum measure optical film thickness method further include：Based on institute
State corresponding relation, obtain the functional relation between optical film thickness and the colour space coordinate of reflection index in optics film spectrum.
After recording the colour space coordinate of testing sample, can directly pass through the functional relation set up, be calculated optical film thickness, more
For convenience of quick.
Be further, described standard sample and testing sample include a substrate and cover optically thin in substrate surface
Being measured as of the reflectance spectrum of film, standard sample and testing sample：It is coated with optical thin film to standard sample and testing sample
Substrate surface one incident illumination is provided, and receive the reflected light that this incident illumination is formed after the reflection of optical thin film, so
Colour space coordinate to standard sample and the reflectance spectrum of testing sample.
The present invention also provides a kind of system measuring optical film thickness based on reflectance spectrum, including measurement module and place
Reason module；Described measurement module is used for the reflectance spectrum of measurement standard sample and testing sample and obtains its corresponding colour space
Coordinate；The color that described processing module is used for obtaining optical film thickness and reflection index in optics film spectrum in multigroup standard sample is empty
Between corresponding relation between coordinate, and the reflectance spectrum based on measurement testing sample obtain its corresponding colour space and sit
Mark, and the optical film thickness of testing sample is obtained according to described corresponding relation.Using described corresponding relation, only need in measurement
The reflectance spectrum of measurement testing sample, thus obtain described reflectance spectrum corresponding colour space coordinate.According to described correspondence
Relation, can get the optical film thickness of testing sample using the colour space coordinate obtaining.Reflection in measurement testing sample
Rate light time spectrum, the optical thin film for testing sample surface does not result in infringement, and the testing time is short, therefore provided by the present invention
System have harmless to optical thin film, and measure quick advantage.And, it is when the area of testing sample is larger, appended
The optical film thickness uniformity has important impact, using system provided by the present invention, can be many to testing sample
Individual position measures, thus obtaining the optical film thickness of multiple positions on testing sample, grasps the optically thin of testing sample
The uniformity of film thickness, thus this system has good application prospect.Additionally, by by system modular, effectively improving
The efficiency of measurement and stability.
It is further that described processing module further includes Database Unit, described Database Unit includes multigroup one
One corresponding optical film thickness and the colour space coordinate data of reflection index in optics film spectrum.So recording testing sample
After colour space coordinate, carry out extracting the optical film thickness that can obtain testing sample by Database Unit, and because it is adopted
Use real statistical data, can guarantee that the accuracy of the method.
It is further that described processing module further includes computing unit, described computing unit includes optically thin thickness
Functional relation between degree and the colour space coordinate of reflection index in optics film spectrum.So recording the colour space of testing sample
After coordinate, optical film thickness directly can be calculated by computing unit, more convenient.
It is further that described measurement module includes the light of the reflectance spectrum for measurement standard sample and testing sample
Optical fiber spectrograph；Described fiber spectrometer includes fibre-optical probe, and described fibre-optical probe is in coaxial-type arrangement mode.Using fiber spectrum
Instrument can fast and accurately obtain desired data, i.e. the colour space coordinate of the reflectance spectrum of testing sample, improves the party further
The measuring speed of method and accuracy.When being measured using fiber spectrometer, its speed can reach per second measurement five times, that is, measure
Time once is 0.2 second, can be good at meeting the requirement of On-line sampling system.Described fibre-optical probe is in coaxial-type arrangement side
Formula, luminous source optical fiber is located at center, and sensor fiber is ringwise evenly distributed on around luminous source optical fiber.So luminous source optical fiber
The light source of transmitting sends from the central position, and the ambient sensors optical fiber being distributed in luminous source optical fiber can preferably receive through testing sample
Reflected light after reflection.
The foregoing is only presently preferred embodiments of the present invention, not in order to limit the present invention, all former in the present invention
Any modification made within then, equivalent and improvement etc. all should comprise within protection scope of the present invention.
Claims (10)
1. a kind of based on reflectance spectrum measure optical film thickness method it is characterised in that：There is provided multigroup known optical thin
The standard sample of film thickness, the colour space obtaining optical film thickness and reflection index in optics film spectrum in multigroup standard sample is sat
Corresponding relation between mark；Based on the measurement reflectance spectrum of testing sample and obtain its corresponding colour space coordinate, and foundation
Described corresponding relation obtains the optical film thickness of testing sample.
2. as described in the appended claim 1 based on reflectance spectrum measure optical film thickness method it is characterised in that：Described color
Space coordinatess are CIELAB color space coordinate.
3. as stated in claim 2 based on reflectance spectrum measure optical film thickness method it is characterised in that：Described color
Space coordinatess are (a*, b*).
4. as described in the appended claim 1 based on reflectance spectrum measure optical film thickness method it is characterised in that：Further
Including：Based on described corresponding relation, set up data base, described data base includes multigroup one-to-one optical film thickness and light
Learn the colour space coordinate data of reflectivity of optical thin film spectrum.
5. as described in the appended claim 1 based on reflectance spectrum measure optical film thickness method it is characterised in that：Described base
Further include in the method that reflectance spectrum measures optical film thickness：Based on described corresponding relation, obtain optically thin thickness
Functional relation between degree and the colour space coordinate of reflection index in optics film spectrum.
6. the method measuring optical film thickness based on reflectance spectrum as any one of claim 1-5, its feature exists
In：Described standard sample and testing sample include a substrate and and cover optical thin film in substrate surface, standard sample and treating
Being measured as of the reflectance spectrum of test sample product：The substrate surface being coated with optical thin film to standard sample and testing sample provides one
Incident illumination, and receive the reflected light that this incident illumination is formed after the reflection of optical thin film, and then get standard samples and to be measured
The colour space coordinate of the reflectance spectrum of sample.
7. a kind of based on reflectance spectrum measure optical film thickness system it is characterised in that：Including measurement module and process
Module；Described measurement module is used for the reflectance spectrum of measurement standard sample and testing sample and obtains its corresponding colour space seat
Mark；Described processing module is used for obtaining the colour space of optical film thickness and reflection index in optics film spectrum in multigroup standard sample
Corresponding relation between coordinate, and based on the reflectance spectrum measuring testing sample and obtain its corresponding colour space coordinate,
And the optical film thickness of testing sample is obtained according to described corresponding relation.
8. as recited in claim 7 based on reflectance spectrum measure optical film thickness method it is characterised in that：Described place
Reason module further includes Database Unit, and described Database Unit includes multigroup one-to-one optical film thickness and optics
The colour space coordinate data of reflectivity of optical thin film spectrum.
9. as recited in claim 7 based on reflectance spectrum measure optical film thickness method it is characterised in that：Described place
Reason module further includes computing unit, and described computing unit includes the color of optical film thickness and reflection index in optics film spectrum
Functional relation between space coordinatess.
10. the method measuring optical film thickness based on reflectance spectrum as any one of claim 7-9, its feature exists
In：Described measurement module includes the fiber spectrometer of the reflectance spectrum for measurement standard sample and testing sample；Described light
Optical fiber spectrograph includes fibre-optical probe, and described fibre-optical probe is in coaxial-type arrangement mode.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107121080A (en) * | 2017-06-16 | 2017-09-01 | 东南大学 | A kind of method for measuring ordered porous nano film thickness |
| CN107462176A (en) * | 2017-08-17 | 2017-12-12 | 中国计量大学 | White light reflection dynamic measurement film thickness method based on Mallat algorithms |
| CN108180846A (en) * | 2017-11-30 | 2018-06-19 | 广州兴森快捷电路科技有限公司 | Organic guarantor welds the process control method of film and film thickness acquisition methods |
| CN109373918A (en) * | 2018-12-18 | 2019-02-22 | 哈尔滨工业大学 | A kind of high effective optical measurement method for two-dimensional material measured film thickness |
| CN110567385A (en) * | 2019-09-19 | 2019-12-13 | 廊坊师范学院 | Hyperspectral technology-based construction thickness detection method for building reflective insulation coating |
| CN111121652A (en) * | 2019-12-26 | 2020-05-08 | 武汉颐光科技有限公司 | Optical microscopic film thickness meter capable of realizing local measurement |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4785336A (en) * | 1986-12-04 | 1988-11-15 | Libbey-Owens-Ford Co. | Device for monitoring characteristics of a film on a substrate |
| JP2008205188A (en) * | 2007-02-20 | 2008-09-04 | Mitsubishi Heavy Ind Ltd | Film thickness measuring method and device thereof, and thin film producing system |
| CN103018902A (en) * | 2013-01-21 | 2013-04-03 | 天津南玻节能玻璃有限公司 | Method for designing optical thin film systems |
| JPWO2013140811A1 (en) * | 2012-03-23 | 2015-08-03 | 凸版印刷株式会社 | Antireflection film |
| CN105675511A (en) * | 2014-11-20 | 2016-06-15 | 中国建筑材料科学研究总院 | Online measurement method for film layer uniformity of transparent medium and apparatus therefor |
-
2016
- 2016-10-26 CN CN201610948968.6A patent/CN106441126A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4785336A (en) * | 1986-12-04 | 1988-11-15 | Libbey-Owens-Ford Co. | Device for monitoring characteristics of a film on a substrate |
| JP2008205188A (en) * | 2007-02-20 | 2008-09-04 | Mitsubishi Heavy Ind Ltd | Film thickness measuring method and device thereof, and thin film producing system |
| JPWO2013140811A1 (en) * | 2012-03-23 | 2015-08-03 | 凸版印刷株式会社 | Antireflection film |
| CN103018902A (en) * | 2013-01-21 | 2013-04-03 | 天津南玻节能玻璃有限公司 | Method for designing optical thin film systems |
| CN105675511A (en) * | 2014-11-20 | 2016-06-15 | 中国建筑材料科学研究总院 | Online measurement method for film layer uniformity of transparent medium and apparatus therefor |
Non-Patent Citations (1)
| Title |
|---|
| 谭力: "《基于快速扫描的光谱测量技术研究及其应用》", 《中国优秀硕士学位论文全文数据库 基础科学辑》 * |
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| CN107462176A (en) * | 2017-08-17 | 2017-12-12 | 中国计量大学 | White light reflection dynamic measurement film thickness method based on Mallat algorithms |
| CN108180846A (en) * | 2017-11-30 | 2018-06-19 | 广州兴森快捷电路科技有限公司 | Organic guarantor welds the process control method of film and film thickness acquisition methods |
| CN108180846B (en) * | 2017-11-30 | 2020-11-17 | 广州兴森快捷电路科技有限公司 | Process control method and film thickness obtaining method of organic solderability preservative film |
| CN109373918A (en) * | 2018-12-18 | 2019-02-22 | 哈尔滨工业大学 | A kind of high effective optical measurement method for two-dimensional material measured film thickness |
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| FR3097314A1 (en) * | 2019-06-14 | 2020-12-18 | Safran Aircraft Engines | Determination of a thickness by colorimetry. |
| CN110567385A (en) * | 2019-09-19 | 2019-12-13 | 廊坊师范学院 | Hyperspectral technology-based construction thickness detection method for building reflective insulation coating |
| CN111121652A (en) * | 2019-12-26 | 2020-05-08 | 武汉颐光科技有限公司 | Optical microscopic film thickness meter capable of realizing local measurement |
| CN111121652B (en) * | 2019-12-26 | 2022-04-19 | 武汉颐光科技有限公司 | Optical microscopic film thickness meter capable of realizing local measurement |
| CN111207686A (en) * | 2020-01-08 | 2020-05-29 | 中国工程物理研究院材料研究所 | Detection device and system for measuring inner surface appearance and film thickness of workpiece |
| CN111276414A (en) * | 2020-02-03 | 2020-06-12 | 长江存储科技有限责任公司 | Detection method and device |
| CN112595241A (en) * | 2020-11-03 | 2021-04-02 | 北京航天控制仪器研究所 | Method for measuring thickness of rubidium hydride anti-relaxation film layer on inner wall of atomic gas chamber |
| CN112833801A (en) * | 2021-02-05 | 2021-05-25 | 长鑫存储技术有限公司 | Thin film thickness test method, test system, storage medium, and electronic device |
| CN112833801B (en) * | 2021-02-05 | 2022-04-05 | 长鑫存储技术有限公司 | Thin film thickness test method, test system, storage medium, and electronic device |
| CN114184569A (en) * | 2021-12-03 | 2022-03-15 | 渤海大学 | Calibration method of emissivity measuring device |
| CN114184569B (en) * | 2021-12-03 | 2023-08-29 | 渤海大学 | Calibration method of emissivity measuring device |
| CN114739300A (en) * | 2022-03-29 | 2022-07-12 | 上海优睿谱半导体设备有限公司 | Method for measuring epitaxial layer thickness of epitaxial wafer |
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