CN106430991B - Flat glass substrate pickling solution and its reduction process - Google Patents
Flat glass substrate pickling solution and its reduction process Download PDFInfo
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- CN106430991B CN106430991B CN201610789093.XA CN201610789093A CN106430991B CN 106430991 B CN106430991 B CN 106430991B CN 201610789093 A CN201610789093 A CN 201610789093A CN 106430991 B CN106430991 B CN 106430991B
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- glass substrate
- flat glass
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- urea
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
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- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Cleaning By Liquid Or Steam (AREA)
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Abstract
The present invention relates to a kind of flat glass substrate pickling solution and its reduction process, the pickling solution includes the concentrated sulfuric acid, hydrofluoric acid, hydrochloric acid, urea；Plate glass base reduction process are as follows: prepare pickling solution；Visual examination is carried out to glass sheet substrate；Point adhesive edge；Glass sheet substrate surface is cleaned；Glass is etched；It is cleaned after etching, checks, packs.Present invention reduces the toxicity of etching solution, it operates more safe and reliable, and etching solution can be recycled after filtration, it is greatly improved to the quality requirements tool of flat glass substrate, especially has to glass surface scuffing amplification, concave point and the salient point that borosilicate substrate glass occurs in process of production and be obviously improved.
Description
Technical field
The present invention relates to flat glass substrate attenuation technical field, especially a kind of flat glass substrate pickling solution and its subtract
Thin technique.
Background technique
The lightening requirement of mobile terminal at present grows to even greater heights, the emerging consumer electronics product such as smart phone, tablet computer
Display screen often only have 0.4mm~0.6mm thickness.TFT equipment is difficult to handle 0.3mm base plate glass below, and traditional
It is frivolous generally to meet display device in addition central filler liquid crystal commonly reaches 1.0mm~1.4mm or so in 0.5mm or so by TFT
The method of the most economical material benefit of change demand can only carry out glass thinning by chemically or physically method.The TFT glass used in industry
Substrate thinning liquid main component is HF (hydrofluoric acid) and pure water, concentration between 8%~15%, and glass surface etch effect is not
Good, surface scratching is amplified, concave point and salient point are relatively difficult to control, and waste water, offal treatment are difficult, is taken second place using one to two
Afterwards, a large amount of sticky body of powder can be generated in etching solution, influence the utilization rate of etching solution, and hydrofluoric acid has severe toxicity, produces
Journey is larger to operating staff harmfulness.
Summary of the invention
Rate that is reliable, reducing the corrosion of concave point position that the purpose of the present invention is to provide a kind of safe operations, inhibits acid solution
The flat glass substrate pickling solution and its reduction process that concave point amplifies in corrosion process.
The technical solution adopted by the present invention to solve the technical problems is:
A kind of flat glass substrate pickling solution, including the concentrated sulfuric acid, hydrofluoric acid, hydrochloric acid, urea；The component object weight percent
Than are as follows: the concentrated sulfuric acid 70~80%, hydrofluoric acid 10~15%, hydrochloric acid 5~10%, urea 2~7%.
Preferably, the hydrofluoric acid is readily soluble water solid-state fluoride.
A kind of flat glass substrate attenuation technique, the following steps are included:
Step 1: prepare flat glass substrate pickling solution, by weight percentage by the concentrated sulfuric acid 70~80%, hydrofluoric acid 10~
15%, hydrochloric acid 5~10%, the mixing of urea 2~7% are placed in etching groove, are heated to 30~35 DEG C；
Step 2: carrying out visual examination to thinned flat glass substrate is prepared；
Step 3: point adhesive edge carries out edge sealing processing to four side of flat glass substrate with UV glue, is solidified with UV curing
UV glue cleans and removes edge excessive glue；
Step 4: flat glass substrate surface is cleaned, is put into slot, is that 30 DEG C of pure water impregnate 5 minutes with temperature,
Remove glass surface foreign matter；
Step 5: flat glass substrate being put into the above-mentioned slot for preparing pickling solution with fixture, temperature is heated to 30~35
DEG C, glass is etched 1.5~2.5 hours；
Step 6: the flat glass substrate etched being put into rinse bath with fixture, is cleaned with pure water, is put into
In one slot, it is that 30 degree of pure water impregnate 10 minutes with temperature, places into the second slot and impregnated 5 minutes with temperature for 30 DEG C of pure water, then
QC is checked, physics polishes, final inspection packaging.
Preferably, the UV curing energy is 5000~7000mJ/cm2。
It is stirred preferably, the bottom pure air of the etching groove recycles solution.
This programme has the advantages that compared with prior art
1, flat glass substrate pickling solution of the present invention volatilization less, small toxicity, pickling solution utilization rate it is high, it is pre- by adjusting acid etching
Treatment fluid proportion, during making acid liquid corrosion, concave point position corrosion rate is reduced, so that concave point during acid liquid corrosion be inhibited to put
Greatly, it is with a wide range of applications.
2, etching solution of the present invention can be recycled after filtration, be greatly improved to TFT quality requirements tool, especially
Have to glass surface scuffing amplification, concave point and the salient point that borosilicate substrate glass occurs in process of production and is obviously improved.
Detailed description of the invention
Fig. 1 is a kind of process flow chart of specific embodiment according to the present invention.
Specific embodiment
In order to keep the purposes, technical schemes and advantages of the embodiment of the present invention clearer, implement below in conjunction with the present invention
Technical solution in example carries out clear, complete description, it is clear that and described embodiment is section Example of the invention, and
It is not all of embodiment.Based on the embodiment of the present invention, those of ordinary skill in the art are not before making the creative labor
Every other embodiment obtained is put, protection scope of the present invention is belonged to.
The embodiment of the present invention provides a kind of flat glass substrate pickling solution, including the concentrated sulfuric acid, hydrofluoric acid, hydrochloric acid, urea；Institute
State component object weight percent are as follows: the concentrated sulfuric acid 70~80%, hydrofluoric acid 10~15%, hydrochloric acid 5~10%, urea 2~7%, institute
Stating hydrofluoric acid is readily soluble water solid-state fluoride.
It is as shown in Figure 1: to the technique of flat glass substrate attenuation using above-mentioned flat glass substrate pickling solution
Step 1: prepare flat glass substrate pickling solution, by weight percentage by the concentrated sulfuric acid 70~80%, hydrofluoric acid 10~
15%, hydrochloric acid 5~10%, the mixing of urea 2~7% are placed in etching groove, are heated to 30~35 DEG C；
Step 2: carrying out visual examination to thinned flat glass substrate is prepared；
Step 3: point adhesive edge carries out edge sealing processing to four side of flat glass substrate with UV glue, is solidified with UV curing
UV glue cleans and removes edge excessive glue；
Step 4: flat glass substrate surface is cleaned, is put into slot, is that 30 DEG C of pure water impregnate 5 minutes with temperature,
Remove glass surface foreign matter；
Step 5: flat glass substrate being put into the above-mentioned slot for preparing pickling solution with fixture, temperature is heated to 30~35
DEG C, glass is etched 1.5~2.5 hours；
Step 6: the flat glass substrate etched being put into rinse bath with fixture, is cleaned with pure water, is put into
In one slot, it is that 30 degree of pure water impregnate 10 minutes with temperature, places into the second slot and impregnated 5 minutes with temperature for 30 DEG C of pure water, then
QC is checked, physics polishes, final inspection packaging.
As the preferred of the present embodiment, the UV curing energy is 5000~7000mJ/cm2, the bottom of the etching groove
Solution is recycled and is stirred by portion's pure air.
According to above-mentioned processing step, the embodiment and effect of etching solution component object ratio are adjusted:
Embodiment one: the concentrated sulfuric acid 70.5%~71.5%, hydrofluoric acid 10.5%~11.5%, hydrochloric acid 5.5%~6.5%,
Urea 2%~3.5%.
Embodiment two: the concentrated sulfuric acid 72.5%~74.5%, hydrofluoric acid 11%~12.5%, hydrochloric acid 5.5%~6.5%, urine
Element 2.5%~4%.
Embodiment three: the concentrated sulfuric acid 75.5%~77.5%, hydrofluoric acid 11.5%~12.5%, hydrochloric acid 7%~9%, urea
3%~4.5%.
Example IV: the concentrated sulfuric acid 78%~80%, hydrofluoric acid 13%~15%, hydrochloric acid 7%~9%, urea 5~6.5%.
Embodiment five: fluoride 20%, acetic acid 11%, hydrochloric acid 8%, dehydrated alcohol 3%, pure water: 58%.The concentrated sulfuric acid
80%, hydrofluoric acid 15%, hydrochloric acid 10%, urea 7%.
The increase with the concentrated sulfuric acid and hydrofluoric acid ratio is found out from above-mentioned five embodiments, etching solution reacts speed with glass
Degree increases, the concentrated sulfuric acid and the hydrofluoric acid ratio concentrated sulfuric acid 70~80%, hydrofluoric acid 10~15%, etching solution and glass reaction speed from
3.5um/min to 6.3um/min, actual effect are that glass surface has no that concave point, scuffing notch have no obvious amplification, are all stable
's.Urea is catalyst, and the effect of hydrochloric acid makes adjustments acidity, and the effect of urea and hydrochloric acid is that glass surface is promoted to react uniform
It works as a buffer, can make reaction rate and variation in the range of can control.Waste water after use of the present invention, uses filter press
It can be recycled after filtering, fluoride emission can be effectively reduced, waste water is used in NAOH and discharged.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in type of the present invention
Within spirit and principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (4)
1. a kind of flat glass substrate pickling solution, it is characterised in that: including the concentrated sulfuric acid, hydrofluoric acid, hydrochloric acid, urea；The component
Object weight percent are as follows: the concentrated sulfuric acid 70~80%, hydrofluoric acid 10~15%, hydrochloric acid 5~10%, urea 2~7%.
2. a kind of flat glass substrate attenuation technique, which comprises the following steps:
Step 1: prepare flat glass substrate pickling solution, by weight percentage by the concentrated sulfuric acid 70~80%, hydrofluoric acid 10~15%,
Hydrochloric acid 5~10%, the mixing of urea 2~7% are placed in etching groove, are heated to 30~35 DEG C；
Step 2: carrying out visual examination to thinned flat glass substrate is prepared；
Step 3: point adhesive edge carries out edge sealing processing to four side of flat glass substrate with UV glue, with UV curing UV curing glue
Water cleans and removes edge excessive glue；
Step 4: flat glass substrate surface is cleaned, is put into slot, is that 30 DEG C of pure water impregnate 5 minutes with temperature, removal
Glass surface foreign matter；
Step 5: flat glass substrate being put into the above-mentioned slot for preparing pickling solution with fixture, temperature is heated to 30~35 DEG C, right
Glass is etched 1.5~2.5 hours；
Step 6: the flat glass substrate etched being put into rinse bath with fixture, is cleaned with pure water, is put into the first slot
It is interior, it is that 30 DEG C of pure water impregnate 10 minutes with temperature, places into the second slot and impregnated 5 minutes with temperature for 30 DEG C of pure water, then QC inspection
It looks into, physics polishing, final inspection packaging.
3. flat glass substrate attenuation technique according to claim 2, it is characterised in that: the UV curing energy is 5000
~7000mJ/cm2。
4. flat glass substrate attenuation technique according to claim 2, it is characterised in that: the bottom of the etching groove is clean
Solution is recycled and is stirred by air.
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| CN201610789093.XA CN106430991B (en) | 2016-08-31 | 2016-08-31 | Flat glass substrate pickling solution and its reduction process |
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| CN106430991B true CN106430991B (en) | 2019-10-25 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106816096B (en) * | 2017-04-14 | 2019-07-30 | 京东方科技集团股份有限公司 | The thining method of substrate and the thining method of display panel |
| CN107324662A (en) * | 2017-06-02 | 2017-11-07 | 合肥市惠科精密模具有限公司 | A kind of TFT thinning glass substrates handling process |
| CN107244811A (en) * | 2017-06-30 | 2017-10-13 | 安徽新创智能科技有限公司 | The thining method and device of a kind of liquid-crystalline glasses |
| CN111558248A (en) * | 2020-04-28 | 2020-08-21 | 苏州晋昌胶粘制品有限公司 | Cleaning device of high-efficiency filter recovery system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102219387A (en) * | 2011-05-18 | 2011-10-19 | 上海易殖电子技术有限公司 | Etching method for liquid crystal glass panel |
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| JP3995146B2 (en) * | 2002-02-01 | 2007-10-24 | 西山ステンレスケミカル株式会社 | Manufacturing method of glass substrate for liquid crystal display |
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102219387A (en) * | 2011-05-18 | 2011-10-19 | 上海易殖电子技术有限公司 | Etching method for liquid crystal glass panel |
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