CN106338258B - A kind of device and method for the alignment of point-diffraction interferometer pin hole - Google Patents
A kind of device and method for the alignment of point-diffraction interferometer pin hole Download PDFInfo
- Publication number
- CN106338258B CN106338258B CN201510962486.1A CN201510962486A CN106338258B CN 106338258 B CN106338258 B CN 106338258B CN 201510962486 A CN201510962486 A CN 201510962486A CN 106338258 B CN106338258 B CN 106338258B
- Authority
- CN
- China
- Prior art keywords
- laser
- adjusting mechanism
- plate
- power meter
- pinhole plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Laser Beam Processing (AREA)
Abstract
The present invention organizes camera lens, CMOS camera and computer after providing a kind of device for the alignment of point-diffraction interferometer pin hole, including first laser device, laser beam expanding lens, the first Amici prism, half wave plate, the second Amici prism, quarter-wave plate, focus lamp, pinhole plate, three-dimension adjusting mechanism, second laser, second laser power meter, first laser power meter, imaging use.The present invention also provides a kind of method for the alignment of point-diffraction interferometer pin hole, including quick coarse alignment and fine registration, coarse alignment process is intuitive and convenient quickly, the fine registration that fine registration process only needs two wheel scans to can be achieved with 0.1 μm, and time-consuming short precision is high.
Description
[technical field]
The invention belongs to technical field of optical precise adjustment, and in particular to it is a kind of for point-diffraction interferometer pin hole alignment
Device and method.
[background technique]
In order to improve the resolution ratio and critical dimension of light projection photoetching objective lens, optical system wavefront aberration is increasingly intended to reach
Diffraction limit.Extreme ultraviolet is engraved in the extreme ultraviolet waveband that wavelength is 13~14nm and works, it is desirable that the wave aberration of optical system is less than
1nmRMS, and EUVL projection objective is even more to have extremely harsh wave aberration requirement, for the surface form deviation of single mirror mirror
It needs to reach 0.25nmRMS, unprecedented requirement, i.e. EUVL projection objective optical element is proposed to optical manufacturing and detection
Processing need the detection accuracy of optical surface detection device to reach deep Subnano-class.
Point-diffraction interferometer (Point Diffraction Interferometer, PDI) is generated using pin hole diffraction
The spherical wave of near ideal, which is used as, refers to corrugated, eliminates the influence of the plane of reference in conventional dry interferometer, high inspection may be implemented
Precision is surveyed, therefore, point-diffraction interferometer can be applied to optical element and system wave aberration in extreme ultraviolet lithography projection objective
Detection.
A kind of existing technology using point-diffraction interferometer detection projection objective wave aberration, and in particular to detection optical system
The phase shift point-diffraction interferometer for wave aberration of uniting, including object plane pinhole plate, transmission grating, practise physiognomy pinhole plate and spot detector.
Ideal spherical wave is generated by the pin hole diffraction on object plane pinhole plate, diffraction occurs through transmission grating, divides amplitude at multiorder diffractive
Light, multi-level diffraction light converge on pinhole plate after examining system, multiple hot spots that spatial distribution is not overlapped are formed, to make
0 grade of diffraction light generates ideal spherical face wave as reference light through diffraction by a pin hole practising physiognomy on pinhole plate ,+1 grade (or -1
Grade) diffraction light is as test light after a window on pinhole plate of practising physiognomy, and the diffraction light of other levels is by impermeable on pinhole plate
Bright partial occlusion, test light and reference light form interference fringe on spot detector.
A kind of existing technology using point-diffraction interferometer detection optical component surface shape, and in particular to detecting element face type
Point-diffraction interferometer, including convergence lighting system, pinhole plate and spot detector.The near ideal generated by pin hole diffraction
Spherical wave is divided into two parts, and a part after tested optical element reflection, carries the face of tested optical element as test light
Shape information, then traveled on spot detector after pinhole plate reflects by relay optical system;Another part is as reference light
Direct relayed optical system travels on spot detector.The two-way interference of light obtains interference pattern, is subject to phase shift technology appropriate,
The face shape information that can obtain tested spherical surface afterwards is processed to collected interference pattern.
More than, optical component surface shape is still either detected using the wave aberration of point-diffraction interferometer detection projection objective,
It is directed to the fine registration of convergence light wave and pin hole, and the imbalance of the axially and radially position of pin hole will reduce diffraction intensity
Degree, and increase the spherical wave wave surface error of pin hole diffraction generation, and then influence the detection accuracy of point-diffraction interferometer.
Currently, interferometer area of computer aided alignment methods based on real time fourier processing and based on fringe contrast
Point-diffraction interferometer technique of alignment is only applicable to alignment when detection system wave aberration, since point-diffraction interferometer is in detection system
Wave aberration of uniting is different with structure when detecting element surface form deviation, which is not suitable for the pin hole when shape of detecting element face
Alignment.And it is existing precisely aligned by pinhole plate scanning with the realization of three energy-probes and long term monitoring, need pinhole plate
Sweep mechanism has the scanning range of millimeter magnitude and the scanning resolution of hundred nano-scale, and development cost is higher, scans simultaneously
Step number is more, and time-consuming.
[summary of the invention]
In order to solve the problems, such as the fine registration of point-diffraction interferometer pin hole, time-consuming and at high cost, and the present invention provides one
Device and method of the kind for the alignment of point-diffraction interferometer pin hole.
The technical solution adopted in the present invention is as follows:
A kind of device for the alignment of point-diffraction interferometer pin hole, including first laser device, laser beam expanding lens, the first light splitting
Prism, half wave plate, the second Amici prism, quarter-wave plate, focus lamp, pinhole plate, three-dimension adjusting mechanism, second swash
Light device, second laser power meter, first laser power meter, imaging organize camera lens, CMOS camera and computer after using;
The first laser device issues linearly polarized laser, by laser beam expanding lens beam-expanding collimation, using the first light splitting rib
After mirror, a part of laser is transmitted, on the target surface of another part laser reflection to first laser power meter;
The laser transmitted after half wave plate and the second Amici prism, all penetrate and be incident on four/
One wave plate, converges on pinhole plate by focus lamp;
Pinhole plate is placed on three-dimension adjusting mechanism and is driven by the three-dimension adjusting mechanism and moved, by swashing for pinhole plate
It is received after a part of diffraction of light by second laser power meter, another part is reflected into condenser, by quarter-wave plate, second
After Amici prism and imaging organize camera lens after using, converge on CMOS camera;
The second laser is set to the back side of pinhole plate, for issuing high power laser light, and from the back side of pinhole plate
The pinhole plate is illuminated, to assist pin hole to carry out coarse alignment.
Specifically, the transmitting laser beam of the second laser is millimeter magnitude, power 100mW.
Specifically, the circle that laser is changed into circularly polarized light, and will reflect back by the quarter-wave plate by linearly polarized light
Polarised light is changed into linearly polarized light, the vibration of the direction of vibration of the linearly polarized light changed again and initial linearly polarized light again
Dynamic direction, which is compared, to be rotated by 90 °.
A method of it is aligned for point-diffraction interferometer pin hole, comprising the following steps:
S1.1, it opens second laser and emits laser beam, through over-focusing mirror, four after laser beam direct illumination pinhole plate
Group camera lens reaches CMOS camera after/mono- wave plate, the second Amici prism and imaging are used, and observes and records in CMOS camera
The position P1 of the first luminous point arrived;
S1.2, opening first laser device transmitting laser beam, laser beam successively pass through laser beam expanding lens, the first light splitting rib
It is converged on pinhole plate after mirror, half wave plate, the second Amici prism, quarter-wave plate and focus lamp, pinhole plate reflection
Light beam by condenser, converge in CMOS phase after group camera lens after withing by quarter-wave plate, the second Amici prism and imaging
On machine, the position for second luminous point seen on CMOS camera is observed, pinhole plate and focus lamp are adjusted by three-dimension adjusting mechanism
The distance between make the hot spot of second luminous point minimum, the position for recording second luminous point is P2;
S1.3, drive pinhole plate mobile in two-dimensional surface by three-dimension adjusting mechanism, so that being located at the on CMOS camera
One luminous point and the second light spot position are overlapped.
Further, the method also includes following steps:
S2.1, second laser is closed, second laser power meter is placed in the back side of pinhole plate with detecting pinhole diffraction
The power of light;
S2.2, the scanning range and resolution ratio for setting three-dimension adjusting mechanism;
S2.3, control 3-D scanning mechanism scan a step in the scanning range;
S2.4, record it is every scanning one step when second laser power meter and first laser power meter measurement numerical value and its ratio
Value;
S2.5, judge whether the scanning of 3-D scanning mechanism is completed, if it is not complete, S2.3-S2.4 is repeated, if complete
At continuing next S2.6;
S2.6, according to the measurement numerical value and its ratio of second laser power meter and first laser power meter, find and by needle
Orifice plate is moved to scan position when ratio maximum;
S2.7, it resets three-dimension adjusting mechanism and reduces the scanning range and scanning resolution of the three-dimension adjusting mechanism
Rate;
S2.8, step S2.3-S2.6 is repeated.
Further, the method also includes following steps:
S3.1, it removes to be imaged and organizes camera lens after, so that the laser of pinhole plate reflection passes sequentially through focus lamp, quarter-wave
After piece and the second Amici prism, shine directly on CMOS camera;
S3.2, computer real-time detection and record luminous point on CMOS camera gray level first laser power meter measurement number
Value adjusts the movement of three-dimension adjusting mechanism by the measured value ratio of the two.
Preferably, for the scanning range of the three-dimension adjusting mechanism set in step S2.2 as 10 μm of 10 μ m, resolution ratio is 1 μ
M, scanning total points is 100.
Preferably, for the scanning range of the three-dimension adjusting mechanism set in step S2.7 as 1 μm of 1 μ m, resolution ratio is 0.1 μ
M, scanning total points is 100.
Compared with prior art, the beneficial effects of the present invention are:
Pin hole alignment of the invention includes two processes of quick coarse alignment and fine registration, in coarse alignment stage, by poly-
After second laser is illuminated pin hole and first laser device line focus mirror by the imaging system that group camera lens is constituted after burnt mirror and imaging are used
Convergence luminous point be imaged on CMOS camera respectively, using the whole institutional adjustment pin hole Board position of three-dimensional fine-tuning, may be implemented quickly
Coarse alignment, whole process are intuitive and convenient;In the fine registration stage, flat scanning is carried out using three-dimension adjusting mechanism, and remember in real time
The measurement numerical value and its ratio of second laser power meter and first laser power meter when recording the scanning of every step, to find optimum position,
The fine registration for only two wheel scans being needed to can be achieved with 0.1 μm, whole process time-consuming short precision are high.
[Detailed description of the invention]
Fig. 1 is the structural schematic diagram that point-diffraction interferometer pin hole alignment device is used in the embodiment of the present invention 1;
Fig. 2 is the flow chart of the realization pin hole fine registration in the embodiment of the present invention 3.
Wherein, 1- first laser device;2- laser beam expanding lens;The first Amici prism of 3-;4- half wave plate;5- second divides
Light prism;6- quarter-wave plate;7- focus lamp;8- pinhole plate;9- three-dimension adjusting mechanism;10- second laser;11- second
Laser power meter;12- first laser power meter;Camera lens is organized in 13- imaging after;14-CMOS camera;15- computer.
[specific embodiment]
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further elaborated.It should be appreciated that described herein, specific examples are only used to explain the present invention, not
For limiting the present invention.
In addition, as long as technical characteristic involved in the various embodiments of the present invention described below is each other not
Constituting conflict can be combined with each other.
Embodiment 1
As shown in Figure 1, to be used for the structural schematic diagram of point-diffraction interferometer pin hole alignment device in embodiment 1.The device
Including first laser device 1, laser beam expanding lens 2, the first Amici prism 3, half wave plate 4, the second Amici prism 5, four/
One wave plate 6, focus lamp 7, pinhole plate 8, three-dimension adjusting mechanism 9, second laser 10, second laser power meter 11, first laser
Power meter 12, imaging organize camera lens 13, CMOS camera 14 and computer 15 after using.
In the present embodiment, the working principle for point-diffraction interferometer pin hole alignment device is specific as follows:
First laser device 1 carries out beam-expanding collimation to linearly polarized laser for issuing linearly polarized laser, laser beam expanding lens 2, the
The splitting ratio of one Amici prism 3 make most of laser transmit and small part laser reflection to first laser power meter 11 target surface
On;
Half wave plate 4 can change the polarization direction of laser, and the second Amici prism 5 is polarization splitting prism, it with
Half wave plate 4 allows through the polarization laser of half wave plate 4 all by the second light splitting rib
Mirror 5;
The circularly polarized light that laser can be changed into circularly polarized light, and will reflect back by quarter-wave plate 6 by linearly polarized light
The direction of vibration of the direction of vibration for the linearly polarized light for being changed into linearly polarized light again, but changing again and initial linearly polarized light
Compared to having rotated 90 degree;
Focus lamp 7 is used to laser converging to pinhole plate 8, is provided with pin hole on pinhole plate 8;
Three-dimension adjusting mechanism 9 is fixedly connected with pinhole plate 8, and for driving pinhole plate 8 mounted thereto in three-dimensional space
Between do accurate movement;
Second laser 10 is for issuing high power laser light, and from the back lighting pin hole of pinhole plate 8, illumination spot reaches
To millimeter magnitude, power is about 100mW, to assist pin hole to carry out coarse alignment;
After completing coarse alignment, second laser 10, and spreading out with 11 detecting pinhole diffraction of second laser power meter are removed
Light intensity is penetrated, the fine registration for pin hole;
First laser power meter 12 is used to detect the power swing situation that first laser device 1 issues laser, due to first point
The splitting ratio of light prism 3 is fixed value, therefore the laser power fluctuation that detects of first laser power meter 12 and first laser device 1
Fluctuation it is consistent;
Group camera lens 13 and focus lamp 7 constitute imaging system and by pin-hole imaging on CMOS camera 14 after imaging is used, CMOS
Camera 14 is for quick coarse alignment and the alignment of long term monitoring pin hole, and computer 15 is then for recording first laser power
Meter 12 and first laser power meter 11 detect power simultaneously the data of acquisition are handled, with control three-dimension adjusting mechanism 9 into
Row movement.
Specifically, the laser being irradiated on first laser power meter 12 is issued by first laser device 1, successively pass through laser
The transmission of beam expanding lens 2, the reflection of the first Amici prism 3, the performance number detected change the only power waves with first laser device 1
It moves related;The laser being irradiated on second laser power meter 11 is issued by first laser device 1, successively by laser beam expanding lens 2,
First Amici prism 3, half wave plate 4, the second Amici prism 5, quarter-wave plate 6, focus lamp 7 and pinhole plate 8
Transmission, the performance number variation detected is related with the diffraction efficiency of the power swing of first laser device 1 and pinhole plate 8, by the
The combined influence of the alignment of the power swing and pinhole plate 8 of one laser 1.
Embodiment 2
The present embodiment provides a kind of methods for realizing pin hole micron dimension coarse alignment:
S1.1, it is first turned on second laser 10, laser beam direct illumination and the pin hole by being located on pinhole plate 8,
Illumination spot is larger at this time, can easily illuminate pin hole, and laser beam passes through focus lamp 7, quarter-wave plate 6, second
Amici prism 5 and imaging reach CMOS camera 14 after organizing camera lens 13 after using, and observe first light that can be seen on CMOS camera 14
Point O1, and the position for recording luminous point O1 is P1;
S1.2, first laser device 1 is opened, the laser of transmitting passes sequentially through laser beam expanding lens 2,3, two points of the first Amici prism
One of wave plate 4, the second Amici prism 5, quarter-wave plate 6 and the illumination of 7 post-concentration of focus lamp on pinhole plate 8, pinhole plate 8 is anti-
The light beam penetrated is passed sequentially through after focus lamp 7, quarter-wave plate 6, the second Amici prism 5 and imaging organize camera lens 13 after and is converged in
On CMOS camera 14, the second luminous point O2 that can be seen on CMOS camera 14 is observed, is moved by the transverse direction of three-dimension adjusting mechanism 9
It is dynamic, the distance between pinhole plate 8 and focus lamp 7 are adjusted, so that the hot spot of luminous point O2 is minimum, and records the position of luminous point O2
For P2;
S1.3, it is moved in two-dimensional surface by three-dimension adjusting mechanism 9, the planar movement of pinhole plate 8 is driven, so that being located at
Two luminous points O1 and O2 on CMOS camera 14 are overlapped, and tentatively realize 1 focus illumination of first laser device on pin hole, according to poly-
The vertical axis enlargement ratio for the imaging system that camera lens 13 is constituted is organized in burnt mirror 7 and imaging after using, the alignment precision in the present embodiment is micro-
Rice magnitude.
Embodiment 3
As shown in Fig. 2, for the flow chart provided in this embodiment for realizing pin hole fine registration:
S2.1, second laser 10 is closed, second laser power meter 11 is placed in behind pinhole plate 8, and detect needle
The power of diffraction by aperture light;
S2.2, the scanning range for setting three-dimension adjusting mechanism 9 are 1 μm, scan total point as 10 μm of 10 μ m, scanning resolution
Number is 100;
S2.3, control three-dimension adjusting mechanism 9 scan a step in 10 μm of 10 μ m of two-dimensional surface;
S2.4, when recording one step of every scanning the measurement numerical value of second laser power meter 11 and first laser power meter 12 and its
Ratio;
S2.5, judge whether the scanning of three-dimension adjusting mechanism 9 is completed, if it is not complete, repeating step 2.3-2.4, such as
Fruit is completed, and following step 2.6 is continued, this setting procedure 2.3-2.4 needs to repeat 100 times;
S2.6, according to the measurement numerical value and its ratio of second laser power meter 11 and first laser power meter 12, find ratio
Scan position when value is maximum, and it is mobile by the two-dimensional surface of three-dimension adjusting mechanism 9, it is adjusted to the position;
S2.7, the scanning range for resetting three-dimension adjusting mechanism 9 are 1 μm of 1 μ m, scanning resolution is 0.1 μm, scanning
Total points are 100;
S2.8, control three-dimension adjusting mechanism 9 scan a step in 1 μm of 1 μ m of two-dimensional surface;
S2.9, step S2.4-S2.6 is repeated, the fine registration of pin hole is completed.
In the present embodiment, pin hole fine registration process is completed under the control of computer 15, and computer 15 controls
Three-dimension adjusting mechanism 9 carries out the scanning in three-dimensional space, and records second laser power meter 11 and the spy of first laser power meter 12
The performance number and its ratio of survey, to describe the positional relationship of performance number ratio and pin hole.Second laser power meter 11 and first swashs
The diffraction efficiency of the power ratio reflection needle outlet of light power meter 11, the ratio is bigger, illustrates that the diffraction efficiency of pin hole is higher, needle
The alignment in hole is also more accurate.
Embodiment 4
The present embodiment provides a kind of method of real-time monitoring pin hole alignment, it is shown that specific step is as follows:
S3.1, remove imaging use after organize camera lens 13 so that pinhole plate 8 reflect laser pass sequentially through focus lamp 7, four/
After one wave plate 6 and the second Amici prism 5, shine directly on CMOS camera 14;
S3.2,15 real-time detection of computer simultaneously record the gray scale of luminous point and first laser power meter 12 on CMOS camera 14
Long-term real-time monitoring pin hole alignment may be implemented by the two measured value ratio for power.
The above content is specific embodiment is combined, further detailed description of the invention, and it cannot be said that this hair
Bright specific implementation is confined to above description.For the those of ordinary skill of technical field of the present invention, do not taking off
Under the premise of from present inventive concept, a number of simple deductions or replacements can also be made, all within the spirits and principles of the present invention
Made any modifications, equivalent replacements, and improvements etc., should all be included in the protection scope of the present invention.
Claims (8)
1. a kind of device for the alignment of point-diffraction interferometer pin hole, which is characterized in that expand including first laser device (1), laser
Shu Jing (2), it the first Amici prism (3), half wave plate (4), the second Amici prism (5), quarter-wave plate (6), focuses
Mirror (7), pinhole plate (8), three-dimension adjusting mechanism (9), second laser (10), second laser power meter (11), first laser function
Rate meter (12), imaging organize camera lens (13), CMOS camera (14) and computer (15) after using;
The first laser device (1) issues linearly polarized laser, by laser beam expanding lens (2) beam-expanding collimation, using the first light splitting
After prism (3), a part of laser is transmitted, on the target surface of another part laser reflection to first laser power meter (12);
The laser transmitted all penetrates after half wave plate (4) and the second Amici prism (5) and is incident on four points
One of wave plate (6), converged on pinhole plate (8) by focus lamp (7);Pinhole plate is provided with pin hole on (8);
Pinhole plate (8) is placed on three-dimension adjusting mechanism (9) and is driven by the three-dimension adjusting mechanism (9) and moved, through needle passing hole
It is received after a part of diffraction of laser of plate (8) by second laser power meter (11), another part is reflected into condenser (7), is passed through
After quarter-wave plate (6), the second Amici prism (5) and imaging organize camera lens (13) after using, converge on CMOS camera (14);
The second laser (10) is set to the back side of pinhole plate (8), for issuing high power laser light, and from pinhole plate (8)
Back lighting described in pinhole plate (8), with assist pin hole carry out coarse alignment.
2. the apparatus according to claim 1, which is characterized in that the transmitting laser beam of the second laser (10) is milli
Rice magnitude, power 100mW.
3. the apparatus according to claim 1, which is characterized in that the quarter-wave plate (6) is by laser by linearly polarized light
The circularly polarized light that is changed into circularly polarized light, and will reflect back into is changed into linearly polarized light, the linearly polarized light changed again again
Direction of vibration be rotated by 90 ° compared with the direction of vibration of initial linearly polarized light.
4. a method of it is aligned for point-diffraction interferometer pin hole, which comprises the following steps:
S1.1, second laser (10) transmitting laser beam is opened, laser beam direct illumination pinhole plate (8) is by over-focusing mirror
(7), group camera lens (13) reaches CMOS camera (14) after quarter-wave plate (6), the second Amici prism (5) and imaging are used, observation
And it is recorded in the position P1 for the first luminous point seen on CMOS camera (14);
S1.2, opening first laser device (1) transmitting laser beam, laser beam successively pass through laser beam expanding lens (2), the first light splitting
Needle is converged to after prism (3), half wave plate (4), the second Amici prism (5), quarter-wave plate (6) and focus lamp (7)
On orifice plate (8), the light beam of pinhole plate (8) reflection is by condenser (7), by quarter-wave plate (6), the second Amici prism
(5) it is converged on CMOS camera (14) after group camera lens (13) after with imaging, second seen in observation CMOS camera (14)
The position of luminous point adjusts the distance between pinhole plate (8) and focus lamp (7) by three-dimension adjusting mechanism (9) and makes described second
The hot spot of luminous point is minimum, and the position for recording second luminous point is P2;
S1.3, drive pinhole plate (8) mobile in two-dimensional surface by three-dimension adjusting mechanism (9), so that being located at CMOS camera (14)
On the first luminous point and the second light spot position be overlapped;
S1.4, it removes after imaging is used and organizes camera lens (13), so that the laser of pinhole plate (8) reflection passes sequentially through focus lamp (7), four points
One of after wave plate (6) and the second Amici prism (5), shine directly on CMOS camera (14).
5. according to the method described in claim 4, it is characterized in that, the method also includes following steps:
S2.1, second laser (10) are closed, second laser power meter (11) is placed in the back side of pinhole plate (8) to detect needle
The power of diffraction by aperture light;
S2.2, the scanning range and resolution ratio for setting three-dimension adjusting mechanism (9);
S2.3, control 3-D scanning mechanism (9) scan a step in the scanning range;
S2.4, record it is every scanning one step when second laser power meter (11) and first laser power meter (12) measurement numerical value and its
Ratio;
S2.5, judge whether the scanning of 3-D scanning mechanism (9) is completed, if it is not complete, S2.3-S2.4 is repeated, if complete
At continuing next S2.6;
S2.6, according to the measurement numerical value and its ratio of second laser power meter (11) and first laser power meter (12), find simultaneously
Pinhole plate (8) is moved to scan position when ratio maximum;
S2.7, three-dimension adjusting mechanism (9) are reset and reduce the scanning range and scanning resolution of the three-dimension adjusting mechanism (9)
Rate;
S2.8, step S2.3-S2.6 is repeated.
6. according to the method described in claim 4, it is characterized in that, the method also includes following steps:
S3.1, computer (15) real-time detection and the gray level first laser power meter (12) for recording luminous point on CMOS camera (14)
Measurement numerical value, pass through the movement of the measured value ratio of the two adjustment three-dimension adjusting mechanism (9).
7. according to the method described in claim 5, it is characterized in that, three-dimension adjusting mechanism (9) that set in step S2.2 are swept
Retouching range is 10 μm of 10 μ m, and resolution ratio is 1 μm, and scanning total points is 100.
8. according to the method described in claim 5, it is characterized in that, three-dimension adjusting mechanism (9) that set in step S2.7 are swept
Retouching range is 1 μm of 1 μ m, and resolution ratio is 0.1 μm, and scanning total points is 100.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510962486.1A CN106338258B (en) | 2015-12-21 | 2015-12-21 | A kind of device and method for the alignment of point-diffraction interferometer pin hole |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510962486.1A CN106338258B (en) | 2015-12-21 | 2015-12-21 | A kind of device and method for the alignment of point-diffraction interferometer pin hole |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106338258A CN106338258A (en) | 2017-01-18 |
CN106338258B true CN106338258B (en) | 2019-06-28 |
Family
ID=57827228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510962486.1A Active CN106338258B (en) | 2015-12-21 | 2015-12-21 | A kind of device and method for the alignment of point-diffraction interferometer pin hole |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106338258B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109182966B (en) * | 2018-10-10 | 2020-09-29 | 江苏集萃有机光电技术研究所有限公司 | Mask plate alignment system, method and device |
CN109556531B (en) * | 2018-11-07 | 2019-12-20 | 西安交通大学 | Accurate calibration system and method for point diffraction interferometer light path based on image information |
CN110672216B (en) * | 2019-09-23 | 2021-03-26 | 南京理工大学 | Pinhole alignment device and method for reflective point diffraction interferometer |
CN115200474B (en) * | 2022-07-14 | 2023-12-05 | 西安工业大学 | Device and method for positioning center axis of small hole diffraction light spot based on photosensitive detection array |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1431477A (en) * | 2003-02-14 | 2003-07-23 | 中国科学院上海光学精密机械研究所 | Spot diffraction interferometer for measuring surface shape |
CN101183042A (en) * | 2007-12-13 | 2008-05-21 | 上海微电子装备有限公司 | Point diffraction interferometer |
CN101865670A (en) * | 2010-06-08 | 2010-10-20 | 北京理工大学 | Plane surface shape measurement method of optical fiber point-diffraction phase-shifting interferometer |
CN102095504A (en) * | 2010-12-07 | 2011-06-15 | 四川大学 | Ring common-path point diffraction interferometer based on spatial phase modulation |
CN102297725A (en) * | 2011-05-18 | 2011-12-28 | 中国科学院长春光学精密机械与物理研究所 | Device and method for detecting reference spherical wave deviation in visible point diffraction interferometer |
CN202101764U (en) * | 2011-06-18 | 2012-01-04 | 四川大学 | Mach-Zehnder point diffraction interferometer |
CN102564301A (en) * | 2011-12-29 | 2012-07-11 | 中国科学院长春光学精密机械与物理研究所 | Device and method for aligning pinhole of point-diffraction interferometer |
-
2015
- 2015-12-21 CN CN201510962486.1A patent/CN106338258B/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1431477A (en) * | 2003-02-14 | 2003-07-23 | 中国科学院上海光学精密机械研究所 | Spot diffraction interferometer for measuring surface shape |
CN101183042A (en) * | 2007-12-13 | 2008-05-21 | 上海微电子装备有限公司 | Point diffraction interferometer |
CN101865670A (en) * | 2010-06-08 | 2010-10-20 | 北京理工大学 | Plane surface shape measurement method of optical fiber point-diffraction phase-shifting interferometer |
CN102095504A (en) * | 2010-12-07 | 2011-06-15 | 四川大学 | Ring common-path point diffraction interferometer based on spatial phase modulation |
CN102297725A (en) * | 2011-05-18 | 2011-12-28 | 中国科学院长春光学精密机械与物理研究所 | Device and method for detecting reference spherical wave deviation in visible point diffraction interferometer |
CN202101764U (en) * | 2011-06-18 | 2012-01-04 | 四川大学 | Mach-Zehnder point diffraction interferometer |
CN102564301A (en) * | 2011-12-29 | 2012-07-11 | 中国科学院长春光学精密机械与物理研究所 | Device and method for aligning pinhole of point-diffraction interferometer |
Also Published As
Publication number | Publication date |
---|---|
CN106338258A (en) | 2017-01-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102519358B (en) | Phase-shift diffraction/interference measuring instrument and method for detecting three-dimensional shape of microsphere | |
US9250059B2 (en) | Detection devices and methods using diffraction wavefront of a pinhole stitching measurement of surface shape | |
CN103439254B (en) | A kind of point pupil confocal laser Raman spectra test method and device | |
US7821647B2 (en) | Apparatus and method for measuring surface topography of an object | |
CN102564301B (en) | Device and method for aligning pinhole of point-diffraction interferometer | |
CN106338258B (en) | A kind of device and method for the alignment of point-diffraction interferometer pin hole | |
CN109975820B (en) | Linnik type interference microscope-based synchronous polarization phase shift focus detection system | |
CN105181298B (en) | Multiple reflections formula confocal laser Long focal length measurement method and apparatus | |
CN1323309C (en) | Reflection multilight bean confocal interference microscope having several tens nanometer lateral discriminability | |
CN101868320A (en) | Laser beam machining | |
CN103105143A (en) | Differential motion confocal microscopic measurement device based on fluorescence excitation of surface to be detected | |
CN101469972B (en) | Long-focus depth super-resolution secondary confocal measuring apparatus | |
CN104296685A (en) | Device and method for measuring smooth free-form surface sample based on differential STED | |
CN103292690A (en) | Synthetic aperture microscopy method and device on basis of light field selection | |
CN104913733B (en) | The normal tracking mode non-spherical measuring method and system interfered based on multiwavelength laser | |
CN102759328A (en) | Two-way lighting differential confocal measurement device and method based on ellipsoid reflection | |
CN108562241B (en) | Digital holographic flexible measurement device and method based on optical fiber bundle | |
CN103115583B (en) | Based on the Mirau fluorescence interference micro-measurement apparatus of stimulated radiation | |
CN100535760C (en) | On-line testing apparatus of projection objective | |
CN111610150A (en) | Full-field structured light coherent coding tomography device and method | |
CN108088368A (en) | Reflective off-axis digital holography apparatus and method based on light splitting pupil | |
WO2016004550A1 (en) | Large-numerical-aperture phase-shifting double-pinhole diffraction interferometer and testing method thereof | |
CN104534980A (en) | Reflection type lens-free digital holography measuring device | |
CN106770335A (en) | A kind of position phase defect detecting system and method based on reflection type point diffraction interferometer | |
CN108180833A (en) | Reflective synchronous phase-shifted digital holographic apparatus and method based on light splitting pupil |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |