CN106289336B - 双通干涉测量编码器系统 - Google Patents
双通干涉测量编码器系统 Download PDFInfo
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- CN106289336B CN106289336B CN201610602780.6A CN201610602780A CN106289336B CN 106289336 B CN106289336 B CN 106289336B CN 201610602780 A CN201610602780 A CN 201610602780A CN 106289336 B CN106289336 B CN 106289336B
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/266—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light by interferometric means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Transform (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161557755P | 2011-11-09 | 2011-11-09 | |
| US61/557,755 | 2011-11-09 | ||
| CN201280066526.9A CN104040296B (zh) | 2011-11-09 | 2012-11-08 | 双通干涉测量编码器系统 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201280066526.9A Division CN104040296B (zh) | 2011-11-09 | 2012-11-08 | 双通干涉测量编码器系统 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106289336A CN106289336A (zh) | 2017-01-04 |
| CN106289336B true CN106289336B (zh) | 2019-07-09 |
Family
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610602780.6A Active CN106289336B (zh) | 2011-11-09 | 2012-11-08 | 双通干涉测量编码器系统 |
| CN201280066526.9A Active CN104040296B (zh) | 2011-11-09 | 2012-11-08 | 双通干涉测量编码器系统 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201280066526.9A Active CN104040296B (zh) | 2011-11-09 | 2012-11-08 | 双通干涉测量编码器系统 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9025161B2 (ja) |
| EP (1) | EP2776792B1 (ja) |
| JP (2) | JP5714780B2 (ja) |
| KR (1) | KR101521146B1 (ja) |
| CN (2) | CN106289336B (ja) |
| TW (1) | TWI476376B (ja) |
| WO (1) | WO2013070871A1 (ja) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106289336B (zh) * | 2011-11-09 | 2019-07-09 | 齐戈股份有限公司 | 双通干涉测量编码器系统 |
| JP6156147B2 (ja) | 2011-11-17 | 2017-07-05 | 株式会社ニコン | エンコーダ装置、光学装置、露光装置、及びデバイス製造方法 |
| JP6222480B2 (ja) | 2012-04-26 | 2017-11-01 | 株式会社ニコン | 光学系、エンコーダ装置、露光装置、及びデバイス製造方法 |
| CN107924132B (zh) | 2014-08-28 | 2021-02-12 | Asml荷兰有限公司 | 检查设备、检查方法和制造方法 |
| WO2016030227A1 (en) * | 2014-08-29 | 2016-03-03 | Asml Netherlands B.V. | Method for controlling a distance between two objects, inspection apparatus and method |
| CN107003155B (zh) * | 2014-10-13 | 2019-07-09 | 齐戈股份有限公司 | 干涉式编码器系统 |
| DE102015203188A1 (de) * | 2015-02-23 | 2016-08-25 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| US9739644B2 (en) * | 2015-05-28 | 2017-08-22 | The Boeing Company | Interferometric rotary encoder |
| WO2016204878A1 (en) | 2015-06-15 | 2016-12-22 | Zygo Corporation | Displacement measurement of deformable bodies |
| CN105606033B (zh) * | 2016-03-18 | 2018-04-20 | 清华大学深圳研究生院 | 绝对式光栅尺、其主光栅及其测量方法 |
| US10591826B2 (en) * | 2016-04-11 | 2020-03-17 | Nikon Corporation | Encoder head with a birefringent lens element and exposure system utilizing the same |
| US10162087B2 (en) * | 2016-04-11 | 2018-12-25 | Nikon Research Corporation Of America | Optical system with a frustrated isotropic block |
| US10488228B2 (en) * | 2016-04-11 | 2019-11-26 | Nikon Corporation | Transparent-block encoder head with isotropic wedged elements |
| US10483107B2 (en) * | 2016-04-11 | 2019-11-19 | Nikon Corporation | Encoder head with birefringent elements for forming imperfect retroreflection and exposure system utilizing the same |
| CN105758435B (zh) * | 2016-04-14 | 2018-02-09 | 清华大学深圳研究生院 | 一种绝对式光栅尺 |
| EP3467591A4 (en) * | 2016-05-31 | 2020-02-12 | Nikon Corporation | MARKING DETECTION DEVICE, MARKING DETECTION METHOD, MEASURING DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD |
| DE102016210434A1 (de) * | 2016-06-13 | 2017-12-14 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| JP6643199B2 (ja) * | 2016-07-15 | 2020-02-12 | Dmg森精機株式会社 | 変位検出装置 |
| CN110337580A (zh) * | 2016-11-07 | 2019-10-15 | 加州理工学院 | 反射空间外差光谱仪的整体式组件 |
| CN107167081B (zh) * | 2017-06-02 | 2021-06-15 | 哈尔滨师范大学 | 一种野外鸟卵测量装置 |
| CN107144298A (zh) * | 2017-06-27 | 2017-09-08 | 常州瑞丰特科技有限公司 | 高容差光栅读数头 |
| US10921718B2 (en) * | 2017-12-15 | 2021-02-16 | Nikon Corporation | Two-dimensional position encoder |
| CA3173997A1 (en) * | 2018-11-13 | 2020-05-22 | Blackmore Sensors & Analytics, Llc | Method and system for laser phase tracking for internal reflection subtraction in phase-encoded lidar |
| JP7233305B2 (ja) * | 2019-05-30 | 2023-03-06 | Dmg森精機株式会社 | 光学式変位測定装置 |
| TWI721719B (zh) | 2019-12-19 | 2021-03-11 | 財團法人工業技術研究院 | 量測裝置 |
| US11598629B2 (en) * | 2020-04-14 | 2023-03-07 | Mitutoyo Corporation | Optical displacement sensor |
| NL2028788A (en) * | 2020-08-27 | 2022-04-29 | Asml Netherlands Bv | Compact dual pass interferometer for a plane mirror interferometer |
| CN112097651B (zh) * | 2020-09-11 | 2022-07-22 | 中国科学院长春光学精密机械与物理研究所 | 外差二维光栅位移测量系统及测量方法 |
| US11802796B2 (en) | 2020-12-07 | 2023-10-31 | California Institute Of Technology | Monolithic assembly of miniature reflective cyclical spatial heterodyne spectrometer interferometry systems |
| US11821791B1 (en) * | 2022-06-27 | 2023-11-21 | Viavi Solutions Inc. | Techniques for reducing optical ghosts in a gratings-based optical spectrum analyzer (OSA) |
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| EP0589477A2 (en) * | 1992-09-25 | 1994-03-30 | Canon Kabushiki Kaisha | Rotation information detection apparatus |
| JP3219349B2 (ja) * | 1993-06-30 | 2001-10-15 | キヤノン株式会社 | 波長コンペンセータ、該波長コンペンセータを用いたレーザ干渉測定装置、該レーザ干渉測定装置を有するステージ装置、該ステージ装置を有する露光システム、および該露光システムを用いたデバイスの製造方法 |
| CN1435675A (zh) * | 2002-01-30 | 2003-08-13 | 富士施乐株式会社 | 光学式编码器和编码器用标尺 |
| CN101676692A (zh) * | 2008-09-19 | 2010-03-24 | 株式会社三丰 | 光电式编码器 |
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| JP6156147B2 (ja) | 2011-11-17 | 2017-07-05 | 株式会社ニコン | エンコーダ装置、光学装置、露光装置、及びデバイス製造方法 |
-
2012
- 2012-11-08 CN CN201610602780.6A patent/CN106289336B/zh active Active
- 2012-11-08 EP EP12847106.7A patent/EP2776792B1/en active Active
- 2012-11-08 CN CN201280066526.9A patent/CN104040296B/zh active Active
- 2012-11-08 US US13/671,920 patent/US9025161B2/en active Active
- 2012-11-08 JP JP2014541253A patent/JP5714780B2/ja active Active
- 2012-11-08 TW TW101141505A patent/TWI476376B/zh active
- 2012-11-08 KR KR1020147015505A patent/KR101521146B1/ko active IP Right Grant
- 2012-11-08 WO PCT/US2012/064086 patent/WO2013070871A1/en active Application Filing
-
2015
- 2015-03-11 JP JP2015048528A patent/JP6224019B2/ja active Active
- 2015-03-24 US US14/666,782 patent/US9746348B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0589477A2 (en) * | 1992-09-25 | 1994-03-30 | Canon Kabushiki Kaisha | Rotation information detection apparatus |
| JP3219349B2 (ja) * | 1993-06-30 | 2001-10-15 | キヤノン株式会社 | 波長コンペンセータ、該波長コンペンセータを用いたレーザ干渉測定装置、該レーザ干渉測定装置を有するステージ装置、該ステージ装置を有する露光システム、および該露光システムを用いたデバイスの製造方法 |
| CN1435675A (zh) * | 2002-01-30 | 2003-08-13 | 富士施乐株式会社 | 光学式编码器和编码器用标尺 |
| CN101676692A (zh) * | 2008-09-19 | 2010-03-24 | 株式会社三丰 | 光电式编码器 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104040296B (zh) | 2016-08-24 |
| EP2776792A1 (en) | 2014-09-17 |
| JP5714780B2 (ja) | 2015-05-07 |
| EP2776792A4 (en) | 2015-08-12 |
| JP2015111157A (ja) | 2015-06-18 |
| CN104040296A (zh) | 2014-09-10 |
| WO2013070871A1 (en) | 2013-05-16 |
| US20150292913A1 (en) | 2015-10-15 |
| US9746348B2 (en) | 2017-08-29 |
| KR20140097326A (ko) | 2014-08-06 |
| TW201333432A (zh) | 2013-08-16 |
| US9025161B2 (en) | 2015-05-05 |
| JP6224019B2 (ja) | 2017-11-01 |
| KR101521146B1 (ko) | 2015-05-18 |
| JP2015501921A (ja) | 2015-01-19 |
| CN106289336A (zh) | 2017-01-04 |
| TWI476376B (zh) | 2015-03-11 |
| EP2776792B1 (en) | 2016-08-10 |
| US20130114061A1 (en) | 2013-05-09 |
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