CN106282934A - Surface treatment method - Google Patents
Surface treatment method Download PDFInfo
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- CN106282934A CN106282934A CN201610784762.4A CN201610784762A CN106282934A CN 106282934 A CN106282934 A CN 106282934A CN 201610784762 A CN201610784762 A CN 201610784762A CN 106282934 A CN106282934 A CN 106282934A
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- surface treatment
- layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
Abstract
The invention provides surface treatment method, the method includes: workpiece is cleaned processing by (1)；(2) workpiece obtaining step (1) carries out the pre-heat treatment；(3) surface of the work obtaining step (2) carries out ion beam cleaning；(4) surface of the work obtained in step (3) by vacuum vapour deposition forms wearing layer；(5) surface of the work obtained in step (4) by vacuum vapour deposition forms anti-fingerprint layer.The method can effectively make surface of the work form the film layer that adhesive force is strong, purity is high, consistency is high, is greatly improved wearability and the service life of anti-fingerprint layer.
Description
Technical field
The present invention relates to coating technique field, in particular it relates to surface treatment method.
Background technology
It is currently used for the ceramic part of mobile phone, such as ceramic cover plate on fingerprint recognition module, mobile phone battery cover ceramic cover plate etc., its
The most anti-fingerprint in surface, not stain resistance；Or its surface is by one layer of anti-fingerprint layer (AF) of plating, though anti-fingerprint, anti-dirty；But the AF film longevity
Ordering limited, consumer is in use easy to wear away；For ceramic cover plate on fingerprint recognition module, anti-fingerprint layer (AF)
Once wearing and tearing, its surface is the most dirty, fingerprint recognition can be caused to make mistakes, affect consumer experience.For mobile phone battery cover ceramic cap
Plate, anti-fingerprint layer (AF) once weares and teares, and its surface is the most dirty, affects outward appearance.
Thus, the anti-fingerprint layer being currently used for the electronic equipment parts such as mobile phone still haves much room for improvement.
Summary of the invention
It is contemplated that one of technical problem solved the most to a certain extent in correlation technique.To this end, the present invention
One purpose is to propose that the cladding wearability of a kind of acquisition is good or the surface treatment method of length in service life (or claims vacuum to steam
Plating method).
The invention provides a kind of surface treatment method.According to embodiments of the invention, the method includes: (1) is to workpiece
It is cleaned processing；(2) workpiece obtaining step (1) carries out the pre-heat treatment；(3) surface of the work obtaining step (2) enters
Row ion beam cleans；(4) surface of the work obtained in step (3) by vacuum vapour deposition forms wearing layer；(5) steamed by vacuum
The surface of the work that plating method obtains in step (4) forms anti-fingerprint layer.Inventor finds, the method is by surface of the work plated underlayer
Last layer wearing layer, the electron beam heating evaporation that this wearing layer material is produced by electron gun, the high-abrasive material molecule after evaporation
Produce plasmaassisted by ion source ionization noble gas again to promote, adsorb at surface of the work with higher kinetic energy, thus
Produce finer and close wearing layer, and there is stronger adhesive force；Then form anti-fingerprint layer on wearing layer surface, have between the two
There is stronger adhesion, so that surface of the work forms the film layer that adhesive force is strong, purity is high, consistency is high, be greatly improved
The wearability of anti-fingerprint layer and service life.
According to embodiments of the invention, in step (1), described workpiece is ceramic workpiece.
According to embodiments of the invention, in step (1), it is to be carried out by ultrasonic waves for cleaning or wiping that described cleaning processes
's.
According to embodiments of the invention, in step (2), the temperature of described the pre-heat treatment is 80-120 degree Celsius, and the time is
5-15 minute.
According to embodiments of the invention, in step (3), described ion beam cleaning is in vacuum equipment, indifferent gas bromhidrosis
Carrying out under atmosphere, wherein, ion source voltage is 100V, and electric current is 9-10A.
According to embodiments of the invention, in step (3), the time that described ion beam cleaning is carried out is 5-15 minute.
According to embodiments of the invention, in step (4), described vacuum vapour deposition is 5 × 10 in vacuum-3To 2 × 10- 3Carrying out under conditions of Pa, evaporation rate is 1-10 angstroms per second, and the plated film time is 3-8 minute.
According to embodiments of the invention, in step (4), the electron gun voltage of described vacuum vapour deposition is 4-8KV, and electric current is
150-200mA。
According to embodiments of the invention, in step (4), described wearing layer is silicon dioxide layer, the thickness of described wearing layer
For 10-15 nanometer.
According to embodiments of the invention, in step (5), described vacuum vapour deposition is 5 × 10 in vacuum-3To 2 × 10- 3Carrying out under conditions of Pa, evaporation rate is 1-10 angstroms per second, and the plated film time is 5-10 minute.
According to embodiments of the invention, in step (5), the electron gun voltage of described vacuum vapour deposition is 380V, and electric current is
120-180A。
According to embodiments of the invention, in step (5), described anti-fingerprint layer is formed by PFPE, described anti-fingerprint layer
Thickness be 15-25 nanometer.
According to embodiments of the invention, step (3) is carried out under being formed 80-120 degree Celsius to (5) by PFPE.
According to embodiments of the invention, between described wearing layer and described anti-fingerprint layer, form chemical bonding.
Accompanying drawing explanation
Fig. 1 shows the schematic flow sheet of surface treatment method according to embodiments of the present invention.
Fig. 2 shows the generalized section of the workpiece after the surface treatment method process utilized according to embodiments of the present invention.
Reference:
1: workpiece
2: wearing layer
3: anti-fingerprint layer
Detailed description of the invention
Embodiments of the invention are described below in detail.The embodiments described below is exemplary, is only used for explaining this
Bright, and be not considered as limiting the invention.Unreceipted concrete technology or condition in embodiment, according to the literary composition in this area
Offer described technology or condition or carry out according to product description.Agents useful for same or instrument unreceipted production firm person, all
For can by city available from conventional products.
The invention provides a kind of surface treatment method.According to embodiments of the invention, with reference to Fig. 1, the method include with
Lower step:
S100: be cleaned workpiece processing.
According to embodiments of the invention, in this step, the method being cleaned workpiece processing is not particularly limited, only
Want can effectively remove the impurity such as the dust of surface of the work, greasy dirt.In some embodiments of the invention, can be by super
Sound cleans or the method for manual wipping is cleaned processing.Thus, simple, convenient fast, and cleaning effect is preferable, favorably
Carrying out in subsequent step.
According to some embodiments of the present invention, the workpiece that this step uses is ceramic workpiece, and the concrete kind of workpiece is not
Be particularly limited, include but not limited to the fingerprint recognition module for the electronic equipment such as mobile phone, panel computer ceramic cover plate, after
Shell ceramic cover plate etc..Inventor finds, the method for the present invention is particularly suitable for carrying out plated film on ceramic workpiece surface, formation resistance to
Mill layer consistency, purity are the highest, while having good anti-fingerprint, anti-dirty performance, it is possible to significantly improve anti-fingerprint
The wearability of film.
S200: the workpiece obtained in step S100 is carried out the pre-heat treatment.
According to embodiments of the invention, can carry out in vacuum equipment (such as vacuum drying oven) in this step, specifically, permissible
The workpiece dress processed through cleaning in upper step is hung in vacuum equipment, then the workpiece processed through cleaning is carried out at preheating
Reason.The pre-heat treatment is so that the foreign gas in workpiece discharges, and foreign gas is discharged by follow-up vacuum step, keeps away
Exempt from release in coating process and affect the purity of film plating layer, affect film layer and the adhesion of workpiece and wearability.In the present invention
Embodiment in, the temperature carrying out the pre-heat treatment is chosen as 80-120 degree Celsius, and the time can be 5-15 minute.In this temperature and
Time range, substantially can be with the wearability of the raising anti-fingerprint layer of maximum possible and service life, and will not be too high because of temperature
Or overlong time and the foreign gas amount of clamping material and workpiece discharge itself in stove is increased, affect and subsequent step is taken out very
Altitude, and then cause film plating layer adhesive force to be deteriorated.
S300: the surface of the work obtained in step S200 is carried out ion beam cleaning.
According to embodiments of the invention, ion beam cleaning typically requires and carries out under vacuum conditions, therefore, carrying out ion
Before Shu Qingxi, needing vacuum equipment is carried out evacuation process, vacuum can be 5 × 10-3To 2 × 10-3Pa, evacuation
Time can be 30-40 minute.In this vacuum ranges, the purity of film plating layer is higher, the good bonding strength of film layer, wearability
Preferably, and this vacuum is easily achieved, and is easily controlled, and is to produce feasible preferably vacuum environment.
According to embodiments of the invention, ion beam cleaning typically requires and carries out under atmosphere of inert gases, specifically, and ion
Shu Qingxi can operate according to following steps: is passed through noble gas (including but not limited to argon) in vacuum equipment, at ion
The two poles of the earth, source make it ionize generation plasma (such as Ar plus certain voltage+), ion beam bombardment surface of the work, plays cleaning surface
And activating surface chemical bond, make the wearing layer being subsequently formed can be firmly bonded to surface of the work.Wherein, ion source voltage can
Thinking 100V, electric current can be 9-10A, and the ion beam cleaning time can be 5-15 minute.The present invention uses above-mentioned voltage and
Electric current, it is possible to achieve preferably cleaning effect, significantly improves the adhesive force of the wearing layer being subsequently formed, and then improves anti-fingerprint layer
Wearability and service life, if voltage and current is too high, then may affect ion source service life and easily cause produce dash forward
Send out abnormal.Above-mentioned scavenging period is also the preferably time that inventor obtains through great many of experiments, in the range of this scavenging period,
Cleaning performance is preferable, and the adhesive force of the wearing layer being subsequently formed significantly improves, if scavenging period is too short, and the adhesive force of wearing layer
The most undesirable, if scavenging period is long, affect ion source service life, be unfavorable for producing.
S400: the surface of the work obtained in step S300 by vacuum vapour deposition forms wearing layer.
According to embodiments of the invention, in this step, can be 5 × 10 in vacuum-3To 2 × 10-3Pa and 80-120 takes the photograph
Under conditions of family name's degree, the electron beam heating evaporation produced by electron gun, the high-abrasive material molecule after evaporation passes through ion source again
Ionization noble gas (including but not limited to argon) produces plasma (such as Ar+) auxiliary pushing so that it is inhale with higher kinetic energy
It is attached to surface of the work, thus produces finer and close wearing layer, have higher adhesive force.Carry out wear-resisting under above-mentioned vacuum degree condition
The preparation of layer, it is possible to obtain the wearing layer that purity is higher, and wearing layer and workpiece good bonding strength；Said temperature is used to increase
Add the activity of high-abrasive material molecule, increase the adhesion of wearing layer, it is thus achieved that wearability and adhesion the most preferably wearing layer, if
Temperature is too low, and wearing layer is undesirable with the adhesion of workpiece, and the wearability of anti-fingerprint layer is the best, if temperature is too high, vacuum sets
The foreign gas amount of standby interior clamping material and workpiece discharge itself increases, and affects vacuum environment, can cause wearing layer adhesive force with
Anti-fingerprint layer wearability is deteriorated.During above-mentioned vacuum evaporation, electron gun voltage can be 4-8KV, and electric current is 150-200mA
(such as voltage can be 6KV, and electric current can be 180mA), uses above-mentioned voltage and current, is conducive to obtaining serviceability preferable
Wearing layer；The plated film time can be 3-8 minute, and the wearing layer thickness of formation can be 10-15 nanometer, and this time range is permissible
Obtaining the wearing layer that thickness is suitable, this thickness range, will not be because of thickness mistake so that wearing layer has preferably serviceability
Thin and cause wearability to be deteriorated, also will not cause unnecessary waste because thickness is blocked up, better economy；Evaporation rate is permissible
For 1-10 angstroms per second (can be such as 3-7 angstroms per second, or 3-5 angstroms per second), thus anti-wear performance can be obtained the most wear-resisting
Layer.
According to embodiments of the invention, in this step, silicon dioxide can be used to form this wearing layer, thus, titanium dioxide
Silicon layer all has good bond strength, and two formed by the method for the present invention with workpiece and the anti-fingerprint layer being subsequently formed
Silicon oxide layer has higher compactness, can significantly improve wearability and the service life of anti-fingerprint layer.
S500: the surface of the work obtained in step S400 by vacuum vapour deposition forms anti-fingerprint layer.
According to embodiments of the invention, can be 5 × 10 in vacuum-3To 2 × 10-3The bar of Pa and 80-120 degree Celsius
Carry out under part.The preparation of anti-fingerprint layer is carried out, it is possible to obtain the anti-fingerprint layer that purity is higher under above-mentioned vacuum degree condition, and anti-
Finger print layer and wearing layer good bonding strength；Use said temperature can obtain adhesive force and serviceability preferably anti-fingerprint layer,
If temperature is too low, anti-fingerprint layer is undesirable with the adhesion of wearing layer, if temperature is too high, in vacuum equipment clamping material and
The foreign gas amount of workpiece discharge itself increases, and affects vacuum environment, wearing layer adhesive force can be caused to be deteriorated.Steam in above-mentioned vacuum
During plating, evaporation rate can be 1-10 angstroms per second (can be such as 3-7 angstroms per second, or 3-5 angstroms per second), this evaporation rate
The anti-fingerprint layer anti-wear performance obtained in sending out significantly improves；The plated film time can be 5-10 minute, and the thickness of anti-fingerprint layer is 15-
25 nanometers, above-mentioned time range can obtain thickness suitable anti-fingerprint layer, the anti-fingerprint layer of above-mentioned thickness range have good
While the function of good anti-dirty, anti-fingerprint, there is good wearability, will not because mistake is the thinnest, wearability is poor, also will not
Material is wasted because of blocked up；Electron gun voltage can be 380V, and electric current can be that (such as voltage is 380V to 120-180A, electric current
For 150A), in above-mentioned electric current and voltage range, it is thus achieved that anti-fingerprint layer wearability and anti-dirty, anti-fingerprint performance is preferable.
According to embodiments of the invention, PFPE can be used to form anti-fingerprint layer, thus, raw material sources are extensive, become
This is relatively low and antifouling, anti-fingerprint is satisfactory for result, and serviceability is preferable.
According to embodiments of the invention, the anti-fingerprint layer formed in this step can form chemical bonding with wearing layer and divide
Sublink；Form low-surface-energy, the surface at high water droplet angle, make the feel that surface tool silk is sliding, anti-dirty, high abrasion characteristic.
Inventor finds, the method is by surface of the work plated underlayer last layer wearing layer, and this wearing layer material is by electricity
The electron beam heating evaporation that sub-rifle produces, the high-abrasive material molecule after evaporation again by ion source ionization noble gas generation etc. from
Daughter auxiliary pushing, with the absorption of higher kinetic energy at surface of the work, thus produces finer and close wearing layer, and has stronger attached
Put forth effort；Then form anti-fingerprint layer on wearing layer surface, there is stronger adhesion, the relevant plated film ginseng of regulation simultaneously between the two
Number so that surface of the work forms the film layer that adhesive force is strong, purity is high, consistency is high, is greatly improved the wearability of anti-fingerprint layer
And service life.The profile of the workpiece after the method plated film is shown in Fig. 2.
Embodiments of the invention are described below in detail.
Embodiment 1
Preparation technology flow process is as follows: workpiece (pottery hung by workpiece to be plated (ceramic) ultrasonic waves for cleaning or manual wipping dress
Porcelain) in vacuum drying oven preheating evacuation ion beam to workpiece (ceramic) surface cleaning applying silicon oxide
(SiO2) plating PFPE (AF) goes pickup workpiece (ceramic) surface and oil contaminant process after vacuum.Concrete operations walk
Rapid as follows:
1, it is cleaned to workpiece to be handled by ultrasound wave processing；
2, preheating in vacuum drying oven: the workpiece processed through cleaning is filled and hangs in vacuum drying oven, be then heated to 80 DEG C, 100
DEG C or 120 DEG C, carry out the pre-heat treatment；
3, evacuation: 30-40 minute pumpdown time, in making stove, vacuum reaches 2 × 10-5Pa；
4, ion beam is to workpiece (ceramic) surface cleaning: be passed through noble gas (argon Ar) in a vacuum furnace, at ion source
The two poles of the earth make it ionize generation plasma (Ar plus 100V voltage+), ion beam bombardment workpiece (ceramic) surface, play cleaning table
Face and activating surface chemical bond, make coating silicon dioxide (SiO2) workpiece (ceramic) surface can be firmly bonded to.Ion source
Energy sets electric current 10A, cleaning time 5 minutes.
5, applying silicon oxide (SiO2): the electron beam heating evaporation produced by electron gun, the silicon dioxide after evaporation
(SiO2) molecule again by ion source ionization noble gas (argon Ar) produce plasma (Ar+) auxiliary pushing so that it is with higher
Kinetic energy absorption at ceramic surface, thus produce finer and close silicon dioxide (SiO2) film layer, have higher adhesive force.Wherein,
Electron gun voltage is 6KV, and electric current is 180mA, 5 minutes plated film time, evaporation rate 5 angstroms per second, thicknesses of layers 12 nanometer.
5, plating PFPE (AF): operational approach is similar with applying silicon oxide, and difference is: electron gun voltage is 380V,
Electric current is 150A, 8 minutes plated film time, thicknesses of layers 20 nanometer, evaporation rate 5 angstroms per second.
6, after going vacuum, workpiece is taken out, and carry out the process of workpiece (ceramic) surface and oil contaminant.
Performance test:
Choose the workpiece prepared according to above-mentioned steps of varying number, carry out film plating layer (anti-fingerprint layer and wearing layer)
Wear-resisting experiment, specifically, is loaded into steel wool on friction wear testing machine, and drips artificial perspiration, in the loading condition of 1Kgf
Under carry out fricting movement, measure the water droplet angle of surface of the work, result time before test, fricting movement 500 times and 1000 times
As shown in table 1.
Table 1
The above results shows: along with furnace temperature raises, wearability has the trend of enhancing, but temperature is the highest, clamping material in stove
And the foreign gas amount of workpiece discharge itself increases, affect evacuation environment, film adhesion can be caused to be deteriorated, the present invention adopts
The wearability that all can make film plating layer with 80-120 degree Celsius is preferable, sets furnace temperature comparatively speaking the most preferable as 100 degrees Celsius.
Embodiment 2
According to method same as in Example 1 with this surface of the work is cleaned process, the pre-heat treatment, evacuation and from
Sub-Shu Qingxi, wherein, furnace temperature is set as 100 degrees Celsius, and the ion beam cleaning time is respectively 5,10,15,20,25 and 30 minutes,
At once measure the workpiece water droplet angle through the surface of ion beam cleaning after ion beam cleaning, the results are shown in Table 2.
Water droplet angle is the least, and surface can be the highest, and wearing layer adhesive force is the best, and as seen from the results in Table 2, scavenging period is that 5-30 divides
The water droplet angle of clock surface of the work is the least, wherein 5 minutes, 20 minutes scavenging periods the most preferable, but scavenging period oversize (20
Minute), affect ion source service life, be unfavorable for producing, therefore, in the present invention, scavenging period selects 5-15 minute.Thus, both
Preferably cleaning performance can be obtained, and ion source or production process will not be had a negative impact, and energy efficient.
Embodiment 3
According to method in the same manner as in Example 1 surface of the work carried out coating film treatment and film plating layer that mensuration prepares
Anti-wear performance, difference is, furnace temperature is set as 100 degrees Celsius, and evaporation rate is respectively 1,3,5,7 or 10 angstroms per second, test knot
Fruit is shown in Table 3.
Table 3
As shown in Table 3, above-mentioned different evaporation rates do not have notable difference to the impact of anti-wear performance, all can obtain
Wearability preferably film plating layer.
Embodiment 5:
Surface treatment method:
1, it is cleaned to workpiece to be handled by ultrasound wave processing；
2, preheating in vacuum drying oven: the workpiece processed through cleaning dress is hung in vacuum drying oven, is then heated to 100 DEG C, enters
Row the pre-heat treatment 15 minutes；
3, evacuation: 30-40 minute pumpdown time, in making stove, vacuum reaches 2 × 10-5Pa；
4, ion beam is to workpiece (ceramic) surface cleaning: be passed through noble gas (argon Ar) in a vacuum furnace, at ion source
The two poles of the earth make it ionize generation plasma (Ar plus 100V voltage+), ion beam bombardment workpiece (ceramic) surface, play cleaning table
Face and activating surface chemical bond, make coating silicon dioxide (SiO2) workpiece (ceramic) surface can be firmly bonded to.Ion source
Energy sets electric current 10A, cleaning time 5 minutes.
5, applying silicon oxide (SiO2): the electron beam heating evaporation produced by electron gun, the silicon dioxide after evaporation
(SiO2) molecule again by ion source ionization noble gas (argon Ar) produce plasma (Ar+) auxiliary pushing so that it is with higher
Kinetic energy absorption at ceramic surface, thus produce finer and close silicon dioxide (SiO2) film layer, have higher adhesive force.Wherein,
Electron gun voltage is 6KV, and electric current is 180mA, 5 minutes plated film time, evaporation rate 5 angstroms per second, thicknesses of layers 12 nanometer.
5, plating PFPE (AF): operational approach is similar with applying silicon oxide, and difference is: electron gun voltage is 380V,
Electric current is 150A, 8 minutes plated film time, thicknesses of layers 20 nanometer, evaporation rate 5 angstroms per second.
6, after going vacuum, workpiece is taken out, and carry out the process of workpiece (ceramic) surface and oil contaminant.
Embodiment 6
According to the method for embodiment 5, workpiece being carried out surface process, difference is: use manual wipping to carry out workpiece clearly
Clean, preheating temperature is 100 degrees Celsius, and preheating time is 10 minutes, is evacuated to 3 × 10-5Pa, the electric current that Ion Cleaning uses is
9.5A, the Ion Cleaning time is 10 minutes, and the temperature of applying silicon oxide is 100 degrees Celsius, and the voltage of employing is 8kV, and electric current is
200mA, the plated film time is 5 minutes, evaporation rate be 1 angstrom per second, silicon dioxide layer thickness is 10 nanometers, plating anti-fingerprint layer temperature
Degree is 100 degrees Celsius, and the time is 10 minutes, evaporation rate be 1 angstrom per second, the voltage of employing is 380V, and electric current is 180A, anti-finger
Lamina thickness is 15 nanometers.
Embodiment 7
According to the method for embodiment 5, workpiece being carried out surface process, difference is: preheating temperature is 120 degrees Celsius, preheating
Time is 5 minutes, is evacuated to 5 × 10-5Pa, the electric current that Ion Cleaning uses is 9A, and the Ion Cleaning time is 15 minutes, plates two
The temperature of silicon oxide is 120 degrees Celsius, and the voltage of employing is 4kV, and electric current is 150mA, and the plated film time is 3 minutes, evaporation rate
Be 10 angstroms per second, silicon dioxide layer thickness is 15 nanometers, plating anti-fingerprint layer temperature be 120 degrees Celsius, the time is 5 minutes, steam
Send out speed be 10 angstroms per second, the voltage of employing is 380V, and electric current is 120A, and anti-fingerprint layer thickness is 25 nanometers.
Embodiment 8
According to the method in embodiment 1, the surface treated workpiece obtained in embodiment 5-7 is carried out performance test,
Difference is that load is 300gf, test result indicate that, before not improving this surface treatment method, the workpiece after process exists
After fricting movement 1000 times and 1500 times, water droplet angle respectively reaches 86 and 74 degree, 1500 rear defence finger print layer of fricting movement it is believed that
Losing efficacy, the workpiece obtained in embodiment of the present invention 5-7 water droplet angle after fricting movement 1000 times, 1500 times and 2000 times is respectively
96.5,84 and 72.5 degree, wearability significantly improves.
In the description of this specification, reference term " embodiment ", " some embodiments ", " example ", " specifically show
Example " or the description of " some examples " etc. means to combine this embodiment or example describes specific features, structure, material or spy
Point is contained at least one embodiment or the example of the present invention.In this manual, to the schematic representation of above-mentioned term not
Identical embodiment or example must be directed to.And, the specific features of description, structure, material or feature can be in office
One or more embodiments or example combine in an appropriate manner.Additionally, in the case of the most conflicting, the skill of this area
The feature of the different embodiments described in this specification or example and different embodiment or example can be tied by art personnel
Close and combination.
Although above it has been shown and described that embodiments of the invention, it is to be understood that above-described embodiment is example
Property, it is impossible to being interpreted as limitation of the present invention, those of ordinary skill in the art within the scope of the invention can be to above-mentioned
Embodiment is changed, revises, replaces and modification.
Claims (14)
1. a surface treatment method, it is characterised in that including:
(1) it is cleaned workpiece processing；
(2) workpiece obtaining step (1) carries out the pre-heat treatment；
(3) surface of the work obtaining step (2) carries out ion beam cleaning；
(4) surface of the work obtained in step (3) by vacuum vapour deposition forms wearing layer；
(5) surface of the work obtained in step (4) by vacuum vapour deposition forms anti-fingerprint layer.
Surface treatment method the most according to claim 1, it is characterised in that in step (1), described workpiece is potter
Part.
Surface treatment method the most according to claim 1, it is characterised in that in step (1), it is to pass through that described cleaning processes
Ultrasonic waves for cleaning or wiping are carried out.
Surface treatment method the most according to claim 1, it is characterised in that in step (2), the temperature of described the pre-heat treatment
For 80-120 degree Celsius, the time is 5-15 minute.
Surface treatment method the most according to claim 1, it is characterised in that in step (3), described ion beam cleaning be
Carrying out in vacuum equipment, under inert gas atmosphere, wherein, ion source voltage is 100V, and electric current is 9-10A.
Surface treatment method the most according to claim 1, it is characterised in that in step (3), described ion beam cleaning is carried out
Time be 5-15 minute.
Surface treatment method the most according to claim 1, it is characterised in that in step (4), described vacuum vapour deposition is very
Reciprocal of duty cycle is 5 × 10-3To 2 × 10-3Carrying out under conditions of Pa, evaporation rate is 1-10 angstroms per second, and the plated film time is 3-8 minute.
Surface treatment method the most according to claim 1, it is characterised in that in step (4), the electricity of described vacuum vapour deposition
Sub-rifle voltage is 4-8KV, and electric current is 150-200mA.
Surface treatment method the most according to claim 1, it is characterised in that in step (4), described wearing layer is titanium dioxide
Silicon layer, the thickness of described wearing layer is 10-15 nanometer.
Surface treatment method the most according to claim 1, it is characterised in that in step (5), described vacuum vapour deposition exists
Vacuum is 5 × 10-3To 2 × 10-3Carrying out under conditions of Pa, evaporation rate is 1-10 angstroms per second, and the plated film time is 5-10 minute.
11. surface treatment methods according to claim 1, it is characterised in that in step (5), described vacuum vapour deposition
Electron gun voltage is 380V, and electric current is 120-180A.
12. surface treatment methods according to claim 1, it is characterised in that in step (5), described anti-fingerprint layer is by entirely
Perfluoroalkyl polyether is formed, and the thickness of described anti-fingerprint layer is 15-25 nanometer.
13. surface treatment methods according to claim 1, it is characterised in that step (3) to (5) is independently of one another at 80-
Carry out under 120 degrees Celsius.
14. surface treatment methods according to claim 1, it is characterised in that described wearing layer and described anti-fingerprint layer it
Between formed chemical bonding.
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