CN106277812A - A kind of curved surface cover-plate glass etching solution - Google Patents
A kind of curved surface cover-plate glass etching solution Download PDFInfo
- Publication number
- CN106277812A CN106277812A CN201610748935.7A CN201610748935A CN106277812A CN 106277812 A CN106277812 A CN 106277812A CN 201610748935 A CN201610748935 A CN 201610748935A CN 106277812 A CN106277812 A CN 106277812A
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- Prior art keywords
- acid
- content
- analytical pure
- water
- surfactant
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
The open a kind of curved surface cover-plate glass etching solution of the present invention, including the aliphatic alcohol polyethenoxy mystery surfactant of the oxalic acid of the nitric acid of the Fluohydric acid. of hydrochloric acid, 4.0%～5.5%, 10.0%～15.0%, 0.2%～0.6%, 0.03%～0.1% of mass percent 0.5%～1.0%, remaining component is water；Described hydrochloric acid is the analytical pure of content 36%～38%, Fluohydric acid. is the analytical pure of content >=55%, and nitric acid is the analytical pure of content 65%～68%, and oxalic acid is the analytical pure of content 99.5%, aliphatic alcohol polyethenoxy mystery surfactant is the analytical pure of content 99%, and water is DI water；The Fluohydric acid. using high level can reduce coming off of in etching process antiacid ink, reduce the acid solution impact on antiacid ink, it is simultaneously introduced hydrochloric acid, nitric acid, oxalic acid and surfactant to remove the insoluble matter that in etching process, glass substrate surface generates, reach to improve etching yield, increase the purpose of production capacity.
Description
Technical field
The present invention relates to glass thinning technical field, specifically a kind of curved surface cover-plate glass etching solution.
Background technology
Curved touch screen has mellow and full edge effect, comfortable hand-held experience and the most three-dimensional sensorial effects, more
Meet the aesthetic experience of consumer, be the main trend of future touchscreens production development.But curved surface cover-plate glass manufacture difficulty is relatively
Greatly, needing special equipment, special process processes, and the most only uses in a few high-end product.The one of curved surface cover-plate glass
Manufacture method be the mode that glass substrate is carried out finishing impression polishing to obtain radian, this method obtain curved surface cover-plate glass good
Rate is low, use duration, and efficiency is low.
Summary of the invention
It is an object of the invention to provide a kind of curved surface cover-plate glass etching solution, glass substrate can be etched by this etching solution
Go out curved surface, reduce the thinning time of curved surface cover-plate glass, improve etching yield, increase production capacity.
The technical solution adopted for the present invention to solve the technical problems is:
A kind of curved surface cover-plate glass etching solution, including mass percent 0.5%～the hydrochloric acid of 1.0 %, 4.0%～5.5 hydrogen fluorine of %
Acid, 10.0%～15.0 aliphatic alcohol polyethenoxy mystery surface activitys of the oxalic acid of nitric acid, 0.2%～0.6%, 0.03%～0.1% of %
Agent, remaining component is water；Described hydrochloric acid is the analytical pure of content 36%～38%, and Fluohydric acid. is the analytical pure of content >=55%, nitric acid
For the analytical pure of content 65%～68%, oxalic acid is the analytical pure of content 99.5%, and aliphatic alcohol polyethenoxy mystery surfactant is for containing
The analytical pure of amount 99%, water is DI water.
The invention has the beneficial effects as follows, use the Fluohydric acid. of high level can reduce antiacid ink in etching process
Come off, reduce the acid solution impact on antiacid ink, be simultaneously introduced hydrochloric acid, nitric acid, oxalic acid and surfactant etched to remove
The insoluble matter that in journey, glass substrate surface generates, reaches to improve etching yield, increases the purpose of production capacity.
Detailed description of the invention
Embodiment one
The present invention provides a kind of curved surface cover-plate glass etching solution, including the hydrochloric acid of mass percent 0.5%, the Fluohydric acid. of 4.0%,
The nitric acid of 10.0%, the oxalic acid of 0.2%, the aliphatic alcohol polyethenoxy mystery surfactant of 0.03%, remaining component is water；Described salt
Acid is the analytical pure of content 36%～38%, and Fluohydric acid. is the analytical pure of content >=55%, and nitric acid is the analysis of content 65%～68%
Pure, oxalic acid is the analytical pure of content 99.5%, and aliphatic alcohol polyethenoxy mystery surfactant is the analytical pure of content 99%, and water is DI
Water.
Choose large stretch of soda-lime glass 10 of a size of 650mm*550mm*0.6 mm, by 4.7 cun of granule dimensional standards, use
Antiacid ink carries out silk-screen to large stretch of soda-lime glass.Again 2 large stretch of soda-lime glass non-ink faces are fit together, glass surrounding
Edge carries out UV and solidifies adhesive edge, and edge glue puts in etching machine after UV lamp solidifies, and uses the etching solution of the present invention to carry out
Thinning；Circulation heats up, and controls etch temperature 33 DEG C～35 DEG C；Being thinned to 0.3 mm from original thickness 0.6 mm, final etching is good
Rate is 93.21%.
Embodiment two
The present invention provides a kind of curved surface cover-plate glass etching solution, including the hydrochloric acid of mass percent 0.65%, the Fluohydric acid. of 4.95%,
The nitric acid of 12.32%, the oxalic acid of 0.4%, the aliphatic alcohol polyethenoxy mystery surfactant of 0.06%, remaining component is water；Described salt
Acid is the analytical pure of content 36%～38%, and Fluohydric acid. is the analytical pure of content >=55%, and nitric acid is the analysis of content 65%～68%
Pure, oxalic acid is the analytical pure of content 99.5%, and aliphatic alcohol polyethenoxy mystery surfactant is the analytical pure of content 99%, and water is DI
Water.
According to the process of the test identical with embodiment one, thinning etching yield is 93.89%.
Embodiment three
The present invention provides a kind of curved surface cover-plate glass etching solution, including the hydrochloric acid of mass percent 1.0%, the Fluohydric acid. of 5.5%,
The nitric acid of 15%, the oxalic acid of 0.6%, the aliphatic alcohol polyethenoxy mystery surfactant of 0.1%, remaining component is water；Described hydrochloric acid is
The analytical pure of content 36%～38%, Fluohydric acid. is the analytical pure of content >=55%, and nitric acid is the analytical pure of content 65%～68%, grass
Acid is the analytical pure of content 99.5%, and aliphatic alcohol polyethenoxy mystery surfactant is the analytical pure of content 99%, and water is DI water.
According to the process of the test identical with embodiment one, thinning etching yield is 91.68%.
The above, be only presently preferred embodiments of the present invention, and the present invention not makees any pro forma restriction；Appoint
What those of ordinary skill in the art, without departing under technical solution of the present invention ambit, may utilize the side of the disclosure above
Technical solution of the present invention is made many possible variations and modification by method and technology contents, or the equivalence being revised as equivalent variations is real
Execute example.Therefore, every content without departing from technical solution of the present invention, according to the technical spirit of the present invention, above example is done
Any simple modification, equivalent, equivalence change and modify, all still fall within technical solution of the present invention protection in the range of.
Claims (1)
1. a curved surface cover-plate glass etching solution, it is characterised in that include mass percent 0.5%～the hydrochloric acid of 1.0 %, 4.0%
～5.5 Fluohydric acid., 10.0%～15.0 fatty alcohol polyoxies of the oxalic acid of nitric acid, 0.2%～0.6%, 0.03%～0.1% of % of %
Ethylene mystery surfactant, remaining component is water；Described hydrochloric acid is the analytical pure of content 36%～38%, Fluohydric acid. be content >=
The analytical pure of 55%, nitric acid is the analytical pure of content 65%～68%, and oxalic acid is the analytical pure of content 99.5%, aliphatic alcohol polyethenoxy
Mystery surfactant is the analytical pure of content 99%, and water is DI water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610748935.7A CN106277812A (en) | 2016-08-30 | 2016-08-30 | A kind of curved surface cover-plate glass etching solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610748935.7A CN106277812A (en) | 2016-08-30 | 2016-08-30 | A kind of curved surface cover-plate glass etching solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106277812A true CN106277812A (en) | 2017-01-04 |
Family
ID=57677621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610748935.7A Pending CN106277812A (en) | 2016-08-30 | 2016-08-30 | A kind of curved surface cover-plate glass etching solution |
Country Status (1)
| Country | Link |
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| CN (1) | CN106277812A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107793038A (en) * | 2017-10-24 | 2018-03-13 | 天津美泰真空技术有限公司 | A kind of glass substrate thinning technique pretreatment fluid |
| CN110156338A (en) * | 2019-04-17 | 2019-08-23 | 蚌埠国显科技有限公司 | A kind of glass microlithography processes |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1672468A (en) * | 2002-07-31 | 2005-09-21 | 日本板硝子株式会社 | Sealing plate for electroluminecense element and mother glass substrate for taking a large number of sealing plates |
| CN101131546A (en) * | 2006-08-21 | 2008-02-27 | 第一毛织株式会社 | Wet etching solution |
| CN101643648A (en) * | 2008-08-08 | 2010-02-10 | 第一毛织株式会社 | Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device |
| CN102923963A (en) * | 2012-11-15 | 2013-02-13 | 杭州格林达化学有限公司 | Replenishing liquor for glass thinning etching liquid |
| CN105293934A (en) * | 2014-07-11 | 2016-02-03 | 东京应化工业株式会社 | Glass working method, glass etching liquid and glass substrate |
-
2016
- 2016-08-30 CN CN201610748935.7A patent/CN106277812A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1672468A (en) * | 2002-07-31 | 2005-09-21 | 日本板硝子株式会社 | Sealing plate for electroluminecense element and mother glass substrate for taking a large number of sealing plates |
| CN101131546A (en) * | 2006-08-21 | 2008-02-27 | 第一毛织株式会社 | Wet etching solution |
| CN101643648A (en) * | 2008-08-08 | 2010-02-10 | 第一毛织株式会社 | Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device |
| CN102923963A (en) * | 2012-11-15 | 2013-02-13 | 杭州格林达化学有限公司 | Replenishing liquor for glass thinning etching liquid |
| CN105293934A (en) * | 2014-07-11 | 2016-02-03 | 东京应化工业株式会社 | Glass working method, glass etching liquid and glass substrate |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107793038A (en) * | 2017-10-24 | 2018-03-13 | 天津美泰真空技术有限公司 | A kind of glass substrate thinning technique pretreatment fluid |
| CN110156338A (en) * | 2019-04-17 | 2019-08-23 | 蚌埠国显科技有限公司 | A kind of glass microlithography processes |
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170104 |
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| WD01 | Invention patent application deemed withdrawn after publication |