CN105236754B - A kind of harsh front surface processing method of liquid crystal display panel glass - Google Patents
A kind of harsh front surface processing method of liquid crystal display panel glass Download PDFInfo
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- CN105236754B CN105236754B CN201510531274.8A CN201510531274A CN105236754B CN 105236754 B CN105236754 B CN 105236754B CN 201510531274 A CN201510531274 A CN 201510531274A CN 105236754 B CN105236754 B CN 105236754B
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Abstract
The invention discloses a kind of harsh front surface processing methods of liquid crystal display panel glass, and its step are as follows：A. pure water is squeezed by pump into container, then squeezes into the dense hydrofluoric acid of 50% 55% concentration, then added in fluosilicate, add fluoride salt, be eventually adding surfactant；Mixed liquor each component weight accounting is as follows：Dense hydrofluoric acid is 5 15%, pure water 55 70%, and fluosilicate is 1 15%, and fluoride salt is 1 15%, and surfactant is 0.1 1%；B. 28 35 DEG C are heated in closed container while bubbling stirs evenly；C. mixed liquor is squeezed into etching machines storage tank, continues agitation cycle and be uniformly mixed for 30 60 minutes；D. harsh liquid crystal display glass is needed to continue 15 80 minutes in mixed liquor spray, go to liquid crystal display glass surface 5 200 microns double-deck, clean moisturizing with pure water afterwards, in case into hydrofluoric acid and mixing harsh in acid etching liquid.This method can be promoted liquid crystal display glass it is harsh after surface effect, inhibit the harsh rear surface pit of glass size and depth.
Description
Technical field
The present invention relates to a kind of harsh front surface processing methods of liquid crystal display panel glass.
Background technology
For liquid crystal display at present mainly using the method for the harsh thinning of chemistry, it is short to be mainly characterized by the harsh thinning time,
It is high to produce yields, manufacture craft is simple.Thinning producers all at present is all directly other using hydrofluoric acid or addition
Nitration mixture and organic active agent are etched.With the development of industry, liquid crystal display increasingly develops or even goes out towards ultra-thin direction
Now be thinned to two-sided 0.2mm thickness, harsh thinning process needs the time of chemical etching longer, this way gradually show with
Lower shortcoming：1. pit, which occurs, in glass etching rear surface to be needed to polish for a long time；2. polishing material causes cost to increase inefficiency,
And the exception that product occurs in polishing is uncontrollable.
The content of the invention
The technical problems to be solved by the invention are：There is provided it is a kind of promoted liquid crystal display glass it is harsh after surface effect
Fruit, inhibit the harsh rear surface pit of glass size and depth the harsh front surface processing method of liquid crystal display panel glass.
In order to solve the above technical problems, the technical solution adopted in the present invention is：A kind of liquid crystal display panel glass is harsh
Front surface processing method, its step are as follows：
A. pure water is squeezed by pump into a closed container, then squeezes into the dense hydrofluoric acid of 50%-55% concentration, then
Fluosilicate is added in, fluoride salt is added, is eventually adding surfactant；Mixed liquor each component weight accounting is as follows：Dense hydrogen fluorine
Acid is 5-15%, pure water 55-70%, fluosilicate 1-15%, fluoride salt 1-15%, surfactant 0.1-1%；
B. 28-35 DEG C is heated in closed container while bubbling stirs evenly；
C. mixed liquor is squeezed into etching machines storage tank, continues agitation cycle and be uniformly mixed for 30-60 minutes；
D. harsh liquid crystal display glass is needed to continue 15-80 minutes in mixed liquor spray, liquid crystal display glass table is removed
Bilayer 5-200 microns of face, cleans moisturizing with pure water afterwards, in case into hydrofluoric acid and mixing harsh in acid etching liquid.
As a preferred solution, pure water used is two level RO high purity waters.
As a preferred solution, fluosilicate used for prodan, potassium fluosilicate, one kind in ammonium fluosilicate or
The a variety of mixtures of person.
As a preferred solution, fluoride salt used be dissolved in water fluorination receive, one kind in potassium fluoride, ammonium fluoride or
The a variety of mixtures of person.
As a preferred solution, surfactant used is alkyl polyoxyethylene ether class, non-ionic acid and alkali-resistance is lived
One or more in property agent.
The beneficial effects of the invention are as follows：It lives due to adding fluosilicate and fluoride salt and surface in a solution of hydrofluoric acid
Property agent, harsh liquid crystal display glass is needed to remove bilayer 5-200 microns of surface in mixed liquor, the fluosilicate in solution
With the fluosilicate that reaction generates since viscosity conference is stayed in the pit of glass surface, staying in pit can hinder to react,
Play the role of filling up, so processed glass, when being etched, pit will not continue to become larger, so as to effectively control glass
The flatness on surface.
By above method treated liquid crystal display glass it is harsh after glass surface pit be inhibited, pit depth
Apparent, size more shallow than the glass not after processing etches is obviously reduced；Identical board, the same terms polishing are shown as indirectly
Time is shortened up to 50-80%, it might even be possible to achieve the effect that not having to polishing.
Since pure water used is two level RO high purity waters, quality can be influenced to avoid the impurity in water and metal ion.
Specific embodiment
Specific embodiments of the present invention are described below in detail.
【Embodiment 1】
Equipment：South Korea's top spray etching machine, polishing machine is created in Hunan forever
Concrete operation step：
Take 10 raw material for Asahi Glass AN100, identical producer with a batch of liquid crystal display panel, thickness is
1.000mm, size 730mm*920mm, process treats that further contrast test is used before completion.
A. by weight, 70 parts of pure water is squeezed by pump into a closed container, then squeezes into 55% dense hydrofluoric acid 11
Part, 7.5 parts of prodan is then added in, 11 parts of ammonium fluoride is added, is eventually adding 0.5 part of alkyl polyoxyethylene ether class；2.
28 DEG C are heated in closed container while bubbling stirs evenly；3. a mixed liquor is squeezed into etching machines storage tank, lasting stirring follows
Ring is uniformly mixed for 30 minutes；4. harsh 5 liquid crystal display glass of liquid crystal display glass A, B, C, D, E of needs are in mixed liquor
Spray continues 40 minutes, removes double-deck 60 microns of glass surface, cleans moisturizing with pure water afterwards, in case into hydrofluoric acid and mixed acid
It is harsh to 0.4mm in etching solution.
B. it is directly entered hydrofluoric acid after another 5 liquid crystal display glass a, b, c, d, e clear water being cleaned and nitration mixture etching solution is thin
Change to 0.4mm thickness.
It is created forever on polishing machine 1300-A6# at same, pressure 60g/cm2, lower disk rotating speed 50, upper disk wobble frequency 40 is ground
Mill pad is global LP-66 models, and polishing powder is happy 101 model of scholar of moral, and absorption layer is FUJIBO BPE211 models, often grinds 5 points
Clock examines one-time surface effect, is examined after record grinding and does not have dimpled accumulative milling time.
| Number | A | B | C | D | E | a | b | c | d | e |
| The CF mirror polish times | 10min | 5min | 5min | 10min | 10min | 25min | 30min | 25min | 25min | 25min |
| The TFT mirror polish times | 10min | 10min | 15min | 15min | 15min | 30min | 35min | 40min | 35min | 35min |
【Embodiment 2】
Equipment：South Korea's top spray etching machine, polishing machine is created in Hunan forever
Concrete operation step：
Take 10 raw material for the identical producer of healthy and free from worry EXG glass with a batch of liquid crystal display panel, thickness is
1.000mm, size 730mm*920mm, process treats that further contrast test is used before completion.
A. by weight, 70 parts of pure water is squeezed by pump into a closed container, then squeezes into 55% dense hydrofluoric acid 11
Part, 7.5 parts of prodan is then added in, 11 parts of ammonium fluoride is added, is eventually adding 0.5 part of alkyl polyoxyethylene ether class；2.
30 DEG C are heated in closed container while bubbling stirs evenly；3. a mixed liquor is squeezed into etching machines storage tank, lasting stirring follows
Ring is uniformly mixed for 40 minutes；4. harsh 5 liquid crystal display glass of liquid crystal display glass A, B, C, D, E of needs are in mixed liquor
Spray continues 40 minutes, removes double-deck 80 microns of glass surface, cleans moisturizing with pure water afterwards, in case into hydrofluoric acid and mixed acid
It is harsh to 0.4mm in etching solution.
B. it is directly entered hydrofluoric acid after another 5 liquid crystal display glass a, b, c, d, e clear water being cleaned and nitration mixture etching solution is thin
Change to 0.4mm thickness.
It is created forever on polishing machine 1300-A6# at same, pressure 60g/cm2, lower disk rotating speed 50, upper disk wobble frequency 40 is ground
Mill pad is global LP-66 models, and polishing powder is happy 101 model of scholar of moral, and absorption layer is FUJIBO BPE211 models, often grinds 5 points
Clock examines one-time surface effect, is examined after record grinding and does not have dimpled accumulative milling time.
| Number | A | B | C | D | E | a | b | c | d | e |
| The CF mirror polish times | 5min | 10min | 10min | 10min | 15min | 30min | 30min | 35min | 35min | 30min |
| The TFT mirror polish times | 10min | 15min | 10min | 15min | 10min | 45min | 40min | 40min | 45min | 35min |
【Embodiment 3】
Equipment：South Korea's top spray etching machine, polishing machine is created in Hunan forever
Concrete operation step：
Take 10 raw material for the identical producers of Asahi Glass AN100 with a batch of liquid crystal display panel, thickness is
1.000mm, size 730mm*920mm, process treats that further contrast test is used before completion.
A. by weight, 67 parts of pure water is squeezed by pump into a closed container, then squeezes into 55% dense hydrofluoric acid 13
Part, it then adds in ammonium fluosilicate and fluosilicic acid and receives 4.8 parts, add 14 parts of ammonium fluoride, be eventually adding alkyl polyoxyethylene ether class
1.2 part；2. 32 DEG C are heated in closed container while bubbling stirs evenly；3. a mixed liquor is squeezed into etching machines storage tank,
Continue agitation cycle to be uniformly mixed for 50 minutes；4. harsh 5 liquid crystal display glass of liquid crystal display glass A, B, C, D, E of needs
Glass continues 40 minutes in mixed liquor spray, removes double-deck 80 microns of glass surface, cleans moisturizing with pure water afterwards, in case into hydrogen fluorine
It is harsh to 0.4mm in acid and mixing acid etching liquid.
B. it is directly entered hydrofluoric acid after another 5 liquid crystal display glass a, b, c, d, e clear water being cleaned and nitration mixture etching solution is thin
Change to 0.4mm thickness.
It is created forever on polishing machine 1300-A6# at same, pressure 60g/cm2, lower disk rotating speed 50, upper disk wobble frequency 40 is ground
Mill pad is global LP-66 models, and polishing powder is happy 101 model of scholar of moral, and absorption layer is FUJIBO BPE211 models, often grinds 5 points
Clock examines one-time surface effect, is examined after record grinding and does not have dimpled accumulative milling time.
| Number | A | B | C | D | E | a | b | c | d | e |
| The CF mirror polish times | 5min | 5min | 5min | 5min | 10min | 25min | 25min | 25min | 25min | 25min |
| The TFT mirror polish times | 10min | 10min | 10min | 10min | 10min | 30min | 35min | 40min | 35min | 35min |
【Embodiment 4】
Equipment：South Korea's top spray etching machine, polishing machine is created in Hunan forever
Concrete operation step：
Take 10 raw material for the identical producer of healthy and free from worry EXG glass with a batch of liquid crystal display panel, thickness is
1.000mm, size 730mm*920mm, process treats that further contrast test is used before completion.
A. by weight, 67 parts of pure water is squeezed by pump into a closed container, then squeezes into 55% dense hydrofluoric acid
It 13% part, then adds in ammonium fluosilicate and fluosilicic acid and receives 4.8 parts, add 14 parts of ammonium fluoride, be eventually adding alkyl polyoxyethylene
1.2 parts of ethers；2. 35 DEG C are heated in closed container while bubbling stirs evenly；3. a mixed liquor squeezes into etching machines storage tank
In, continue agitation cycle and be uniformly mixed for 60 minutes；4. harsh 5 liquid crystal displays of liquid crystal display glass A, B, C, D, E of needs
Glass continues 40 minutes in mixed liquor spray, removes double-deck 95 microns of glass surface, cleans moisturizing with pure water afterwards, in case into hydrogen
It is harsh to 0.4mm in fluoric acid and mixing acid etching liquid.
B. it is directly entered hydrofluoric acid after another 5 liquid crystal display glass a, b, c, d, e clear water being cleaned and nitration mixture etching solution is thin
Change to 0.4mm thickness.
It is created forever on polishing machine 1300-A6# at same, pressure 60g/cm2, lower disk rotating speed 50, upper disk wobble frequency 40 is ground
Mill pad is global LP-66 models, and polishing powder is happy 101 model of scholar of moral, and absorption layer is FUJIBO BPE211 models, often grinds 5 points
Clock examines one-time surface effect, is examined after record grinding and does not have dimpled accumulative milling time.
| Number | A | B | C | D | E | a | b | c | d | e |
| The CF mirror polish times | 5min | 5min | 5min | 5min | 5min | 25min | 25min | 20min | 25min | 25min |
| The TFT mirror polish times | 10min | 5min | 10min | 10min | 10min | 30min | 35min | 40min | 35min | 35min |
The implementation that the principles and effects of the invention is only illustrated in the above embodiments and part uses
Example, and is not intended to limit the present invention；It should be pointed out that for those of ordinary skill in the art, wound of the present invention is not being departed from
On the premise of making design, various modifications and improvements can be made, these belong to protection scope of the present invention.
Claims (5)
1. a kind of harsh front surface processing method of liquid crystal display panel glass, its step are as follows：
A. pure water is squeezed by pump into a closed container, then squeezes into the dense hydrofluoric acid of 50%-55% concentration, then added in
Fluosilicate adds fluoride salt, is eventually adding surfactant；Mixed liquor each component weight accounting is as follows：Dense hydrofluoric acid is
5-15%, pure water 55-70%, fluosilicate 1-15%, fluoride salt 1-15%, surfactant 0.1-1%；
B. 28-35 DEG C is heated in closed container while bubbling stirs evenly；
C. mixed liquor is squeezed into etching machines storage tank, continues agitation cycle and be uniformly mixed for 30-60 minutes；
D. harsh liquid crystal display glass is needed to continue 15-80 minutes in mixed liquor spray, go to liquid crystal display glass surface double
5-200 microns of layer, cleans moisturizing with pure water afterwards, in case into hydrofluoric acid and mixing harsh in acid etching liquid.
2. a kind of harsh front surface processing method of liquid crystal display panel glass as described in claim 1, it is characterised in that：It is used
Pure water is two level RO high purity waters.
3. a kind of harsh front surface processing method of liquid crystal display panel glass as claimed in claim 2, it is characterised in that：It is used
Fluosilicate is prodan, one or more kinds of mixtures in potassium fluosilicate, ammonium fluosilicate.
4. a kind of harsh front surface processing method of liquid crystal display panel glass as claimed in claim 2, it is characterised in that：It is used
Fluoride salt be dissolved in water fluorination receive, one or more kinds of mixtures in potassium fluoride, ammonium fluoride.
5. a kind of harsh front surface processing method of liquid crystal display panel glass as claimed in claim 2, it is characterised in that：It is used
Surfactant is alkyl polyoxyethylene ether class, the one or more in non-ionic acid and alkali-resistance activating agent.
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| CN201510531274.8A CN105236754B (en) | 2015-08-27 | 2015-08-27 | A kind of harsh front surface processing method of liquid crystal display panel glass |
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| CN201510531274.8A CN105236754B (en) | 2015-08-27 | 2015-08-27 | A kind of harsh front surface processing method of liquid crystal display panel glass |
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| CN105236754A CN105236754A (en) | 2016-01-13 |
| CN105236754B true CN105236754B (en) | 2018-05-18 |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6323695B2 (en) * | 2016-09-30 | 2018-05-16 | パナソニックＩｐマネジメント株式会社 | Polishing liquid for glass and polishing method |
| CN107793038A (en) * | 2017-10-24 | 2018-03-13 | 天津美泰真空技术有限公司 | A kind of glass substrate thinning technique pretreatment fluid |
| CN108840577B (en) * | 2018-08-20 | 2021-05-14 | 郑州恒昊光学科技有限公司 | Glass etching solution, preparation method thereof and method for preparing anti-glare glass by using glass etching solution |
| CN110803869A (en) * | 2019-11-25 | 2020-02-18 | 苏州博洋化学股份有限公司 | Glass thinning liquid |
| CN113789230A (en) * | 2021-08-26 | 2021-12-14 | 安徽四季电子科技有限公司 | Glass pretreatment liquid, preparation method and application thereof |
| CN115784623A (en) * | 2022-11-18 | 2023-03-14 | 江西沃格光电股份有限公司 | Glass thinning pretreatment liquid, glass thinning method and application thereof |
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| CN1608037A (en) * | 2001-08-24 | 2005-04-20 | 斯特拉化学株式会社 | Surface treating solution for fine processing of glass base plate having a plurality of components |
| JP2008145621A (en) * | 2006-12-08 | 2008-06-26 | Hitachi Displays Ltd | Liquid crystal display device and its manufacturing method |
| CN101560058A (en) * | 2008-04-15 | 2009-10-21 | 株式会社东进世美肯 | Cleaning and etching composition for glass substrate for liquid crystal display device and method for etching glass substrate using the same |
| CN103241957A (en) * | 2013-05-28 | 2013-08-14 | 湖北优尼科光电技术有限公司 | Method for thinning and etching glass substrate |
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2015
- 2015-08-27 CN CN201510531274.8A patent/CN105236754B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1608037A (en) * | 2001-08-24 | 2005-04-20 | 斯特拉化学株式会社 | Surface treating solution for fine processing of glass base plate having a plurality of components |
| JP2008145621A (en) * | 2006-12-08 | 2008-06-26 | Hitachi Displays Ltd | Liquid crystal display device and its manufacturing method |
| CN101560058A (en) * | 2008-04-15 | 2009-10-21 | 株式会社东进世美肯 | Cleaning and etching composition for glass substrate for liquid crystal display device and method for etching glass substrate using the same |
| CN103241957A (en) * | 2013-05-28 | 2013-08-14 | 湖北优尼科光电技术有限公司 | Method for thinning and etching glass substrate |
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