CN105693101A - Glass processing method - Google Patents
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- CN105693101A CN105693101A CN201410681838.1A CN201410681838A CN105693101A CN 105693101 A CN105693101 A CN 105693101A CN 201410681838 A CN201410681838 A CN 201410681838A CN 105693101 A CN105693101 A CN 105693101A
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Abstract
The invention discloses a glass processing method. The glass processing method comprises following steps: glass with a need on anti-dazzle processing is obtained; at least one surface of the glass comprises a first zone and a second zone, wherein the first zone is needed to be processed via anti-dazzle processing, and the second zone is not needed to be processed via anti-dazzle processing; the second zone is covered with a protective layer with a first thickness; the whole surface containing the first zone and the second zone is subjected to anti-dazzle processing so as to obtain a glass with an anti-dazzle layer of a second thickness, wherein the second thickness is smaller than the first thickness; the protective layer is removed, and the glass without the protective layer and with the anti-dazzle layer of the second thickness is delivered into a strong acid solution for etching of a first depth, wherein the first depth is smaller than the second thickness. The glass processing method can be used for local anti-dazzle processing of glass surfaces, the areas without a need on anti-dazzle processing possess relatively high transparency, good product yield is increased, and processing cost is reduced.
Description
Technical field
The present invention relates to technical field of surface, particularly relate to a kind of glass processing method。
Background technology
When the surface of glass is excessively smooth, the degree of reflection for light can increase。When there being strong illumination to surfacing and undressed glass, what can produce is strongly reflective, the picture after making human eye cannot see glass。This phenomenon may be generally referred to as dazzle。
In daily life, glare phenomenon usually brings puzzlement to user。Such as, when user is when well-lighted outdoor application mobile phone, the dazzle that mobile phone screen produces；Dazzle that the screen of notebook computer or desktop computer produces under high light etc., these dazzles all can cause the content that user cannot normally watch on screen。
In order to avoid the generation of above-mentioned phenomenon, in prior art, it is possible to adopt technique for grinding that glass is carried out non-glare treated。It is tiny concavo-convex that this technique can make the surface of the glass of processed mistake produce, thus avoiding glare phenomenon。
But, if the surface of glass to be processed has regional area to need have higher transparency and percent of pass, then this regional area can not be carried out above-mentioned process。Such as, the screen area corresponding to front-facing camera on mobile phone, just should not carry out non-glare treated, otherwise the definition of photographic head can be impacted。
And in prior art, the processing mode for this regional area is, first glass surface entirety to be processed is carried out non-glare treated, then this regional area is polished, this regional area is polished flat。Above-mentioned processing mode of the prior art, due to the extra polishing of needs, is limited by process conditions, and the transparency of the glass surface after polishing is relatively low, and fraction defective and processing cost are also higher。
Summary of the invention
It is an object of the invention to provide a kind of glass processing method, it is possible to glass surface is carried out local non-glare treated, and makes the region not needing to carry out non-glare treated have higher transparency, improve yields, reduce processing cost。
For achieving the above object, the invention provides following scheme:
A kind of glass processing method, including:
Obtain and need the glass carrying out non-glare treated；At least one surface of described glass has first area and second area；Described first area is the region needing to carry out non-glare treated, and described second area is the region not needing to carry out non-glare treated；
The overcoat of the first thickness is covered at described second area；
Carrying out non-glare treated to comprising the whole described surface with described second area, the described first area, obtain the glass that antiglare layer is the second thickness, described second thickness is less than described first thickness；
Removing described overcoat, the glass that antiglare layer is the second thickness after the described overcoat of removal is put into strong acid solution and carries out the etching of first degree of depth, described first degree of depth is less than described second thickness。
Optionally, the described whole described surface to comprising described first area and described second area before removing described overcoat, also includes after carrying out non-glare treated:
Adopt mild acid wash through the described surface of described non-glare treated。
Optionally, the described whole described surface to comprising described first area and described second area carries out non-glare treated, specifically includes:
Adopt the silicon carbide sand of 2000 to 10000 orders that described surface carries out polishing sandblasting by sandblasting machine。
Optionally, described put into strong acid solution carry out the etching of first degree of depth by removing the glass that antiglare layer is the second thickness after described overcoat, specifically include:
The glass that antiglare layer is the second thickness after the described overcoat of removal is put into the strong acid solution that concentration is 10%～25% and carries out the etching of first degree of depth。
Optionally, described strong acid solution specifically includes following components:
The Fluohydric acid. of 90%～91%, the sulphuric acid of 1%～2%, the hydrochloric acid of 2%～3%, the phosphoric acid of 1%～2%, the nitric acid of 1%～2%。
Optionally, the described overcoat covering the first thickness at described second area, specifically include:
The acid-proof ink of the first thickness is covered at described second area。
Optionally, described first thickness is more than or equal to 50 microns。
Optionally, described second thickness is 3 to 10 microns。
Optionally, the described overcoat covering the first thickness at described second area, specifically include:
The mode adopting printing or stickup covers the overcoat of the first thickness at described second area。
Optionally, described second area is after the predeterminated position that described glass is installed in electronic equipment, the region corresponding with the photographic head of described electronic equipment；
Or, described second area forms word or figure。
Optionally, described first thickness is more than or equal to 50 microns, and described second thickness is more than or equal to 3 microns and less than or equal to 10 microns。
Optionally, after the etching of described first degree of depth, the thickness of described antiglare layer is more than or equal to 0.06 micron and less than or equal to 0.25 micron。
According to specific embodiment provided by the invention, the invention discloses techniques below effect:
The glass processing method of the embodiment of the present invention, by covering the overcoat of the first thickness at described second area；Non-glare treated is carried out to comprising the whole described surface with described second area, the described first area；Remove described overcoat, the glass after the described overcoat of removal is put into strong acid solution and is etched；Namely first the region without carrying out non-glare treated can be blocked, then carry out non-glare treated, then remove overcoat, whole surface is etched, it is possible to remove the impurity of second area, improve transparency and the light penetration of second area；Therefore, the glass processing method of the embodiment of the present invention, it is possible to glass surface is carried out local non-glare treated, and make the region not needing to carry out non-glare treated have higher transparency, improve yields, owing to being made without secondary polishing, so processing cost can also be reduced。。
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, the accompanying drawing used required in embodiment will be briefly described below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the premise not paying creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings。
Fig. 1 is the flow chart of the glass processing embodiment of the method 1 of the present invention；
Fig. 2 is the flow chart of the glass processing embodiment of the method 2 of the present invention；
Fig. 3 is the flow chart of the glass processing embodiment of the method 3 of the present invention；
Fig. 4 is the schematic diagram of the glass adopting the glass processing method of the embodiment of the present invention 3 to process；
Fig. 5 is the flow chart of the glass processing embodiment of the method 4 of the present invention；
Fig. 6 is the schematic diagram of the glass adopting the glass processing method of the embodiment of the present invention 4 to process。
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, it is clear that described embodiment is only a part of embodiment of the present invention, rather than whole embodiments。Based on the embodiment in the present invention, the every other embodiment that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into the scope of protection of the invention。
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, below in conjunction with the drawings and specific embodiments, the present invention is further detailed explanation。
Fig. 1 is the flow chart of the glass processing embodiment of the method 1 of the present invention。As it is shown in figure 1, the method may include that
Step 101: obtain and need the glass carrying out non-glare treated；At least one surface of described glass has first area and second area；Described first area is the region needing to carry out non-glare treated, and described second area is the region not needing to carry out non-glare treated；
Described glass could be for the glass making on the display screen of display, it is also possible to is for making the glass on the screen of the electronic equipment such as mobile phone or panel computer。
Described second area can be arranged as required to into required shape or pattern。Such as, described second area can be after the predeterminated position that described glass is installed in electronic equipment, the region corresponding with the photographic head of described electronic equipment。Or, described second area can also form some word。
Step 102: cover the overcoat of the first thickness at described second area；
Described overcoat can select the material being prone to cover and be easily removed。Such as, described overcoat can adopt ink。The Main Function of described overcoat is to make described second area from non-glare treated。
It should be noted that in this area, protective action is usually played in overlay area by the main uses of ink in etching process, and utilization is the chemical property of ink。But, in the present embodiment, the effect of described ink is different from above-mentioned effect, and what mainly utilize is the physical property of ink so that described second area is in the process of non-glare treated, it is possible to protection second area will not be polished sandblasting and form antiglare layer。
Step 103: carrying out non-glare treated to comprising the whole described surface with described second area, the described first area, obtain the glass that antiglare layer is the second thickness, described second thickness is less than described first thickness；
Described non-glare treated can adopt the mode of polishing sandblasting to realize。Glass surface after described non-glare treated, can have tiny concavo-convex, be similar to the principle of clouded glass, but trickleer than the granularity of the clouded glass in ordinary meaning。Described second thickness, it is possible to represent the depression on the glass surface after non-glare treated and protruding average height difference。Described second thickness is less than described first thickness, it can be ensured that described overcoat will not be beaten by described non-glare treated process, makes described overcoat really can play protection effect。
Step 104: remove described overcoat, puts into strong acid solution by the glass that antiglare layer is the second thickness after the described overcoat of removal and carries out the etching of first degree of depth, and described first degree of depth is less than described second thickness。
After removing described overcoat, it is possible to adopt strong acid solution that described glass is etched。Etching can make the oxide layer of the glass surface of the second area originally covered by described overcoat and impurity erode, and improves transparency and the light penetration of second area。
It should be noted that what described etching process was more than described second area is carried out, also described first area can be carried out。In order to prevent described etching process from described antiglare layer all being eroded, it is necessary to controlling etch depth, concrete, first degree of depth of described etching process needs less than the second thickness of described antiglare layer。
In practical application, described antiglare layer can be selected the silicon carbide sand of 2000-10000 order, by sandblasting machine, glass surface is carried out polishing sandblasting and be formed for 30 minutes。The strong acid mixed liquor that described etching process can adopt concentration to be 10%～25% etches 30 minutes。Described strong acid solution specifically can include following components: the Fluohydric acid. of 90%～91%, the sulphuric acid of 1%～2%, the hydrochloric acid of 2%～3%, the phosphoric acid of 1%～2%, the nitric acid of 1%～2%。Adopt aforesaid way, it can be ensured that described first degree of depth is less than described second thickness。
In sum, in the present embodiment, by covering the overcoat of the first thickness at described second area；Non-glare treated is carried out to comprising the whole described surface with described second area, the described first area；Remove described overcoat, the glass after the described overcoat of removal is put into strong acid solution and is etched；Namely first the region without carrying out non-glare treated can be blocked, then carry out non-glare treated, then remove overcoat, whole surface is etched, it is possible to remove the impurity of second area, improve transparency and the light penetration of second area；Therefore, the glass processing method of the embodiment of the present invention, it is possible to glass surface is carried out local non-glare treated, and make the region not needing to carry out non-glare treated have higher transparency, improve yields, owing to being made without secondary polishing, so processing cost can also be reduced。
Fig. 2 is the flow chart of the glass processing embodiment of the method 2 of the present invention。As in figure 2 it is shown, the method may include that
Step 201: obtain and need the glass carrying out non-glare treated；At least one surface of described glass has first area and second area；Described first area is the region needing to carry out non-glare treated, and described second area is the region not needing to carry out non-glare treated；
Step 202: cover the acid-proof ink of the first thickness at described second area；
Step 203: carrying out non-glare treated to comprising the whole described surface with described second area, the described first area, obtain the glass that antiglare layer is the second thickness, described second thickness is less than described first thickness；
Step 204: adopt mild acid wash through the described surface of described non-glare treated。
In this step, it is possible to first adopt weak acid to be carried out the glass surface through non-glare treated。Owing to described second area is coated with acid-proof ink, so in this step, described second area will not be corroded by weak acid。It is to say, in the present embodiment, described acid-proof ink had both served the effect preventing second area to be polished sandblasting, serve again the effect preventing second area from being corroded by weak acid。
Step 205: remove described acid-proof ink, puts into strong acid solution by the glass that antiglare layer is the second thickness after the described acid-proof ink of removal and carries out the etching of first degree of depth, and described first degree of depth is less than described second thickness。
In the present embodiment, by adopting mild acid wash through the described surface of described non-glare treated, it is possible to when making follow-up employing strong acid solution that glass to be etched, the glass of process more cleans。
It should be noted that in the embodiment of the present invention, the described whole described surface to comprising described first area and described second area carries out non-glare treated, specifically may include that
Adopt the silicon carbide sand of 2000 to 10000 orders that described surface carries out polishing sandblasting by sandblasting machine。
In practical application, described put into strong acid solution carry out the etching of first degree of depth by removing the glass that antiglare layer is the second thickness after described overcoat, specifically may include that
The glass that antiglare layer is the second thickness after the described overcoat of removal is put into the strong acid solution that concentration is 10%～25% and carries out the etching of first degree of depth。Described concentration refers to the acid in strong acid solution and accounts for the ratio of overall solution；Described overall solution includes acid and water。
In practical application, described strong acid solution specifically can include following components:
The Fluohydric acid. of 90%～91%, the sulphuric acid of 1%～2%, the hydrochloric acid of 2%～3%, the phosphoric acid of 1%～2%, the nitric acid of 1%～2%。
In practical application, the described overcoat covering the first thickness at described second area, specifically may include that
The acid-proof ink of the first thickness is covered at described second area。
In practical application, described first thickness can more than or equal to 50 microns。
In practical application, described second thickness can be 3 to 10 microns。
After the etching of described first degree of depth, the thickness of described antiglare layer can more than or equal to 0.06 micron and less than or equal to 0.25 micron。
In practical application, the described overcoat covering the first thickness at described second area, specifically may include that
The mode adopting printing or stickup covers the overcoat of the first thickness at described second area。
In practical application, described second area can be after the predeterminated position that described glass is installed in electronic equipment, the region corresponding with the photographic head of described electronic equipment；
Or, described second area can form word or figure。
Fig. 3 is the flow chart of the glass processing embodiment of the method 3 of the present invention。As it is shown on figure 3, the method may include that
Step 301: obtain and need the glass carrying out non-glare treated；The first surface of described glass has the first area needing to carry out non-glare treated and does not need to carry out the border circular areas of non-glare treated；
Step 302: cover the acid-proof ink of more than 50 microns at described border circular areas；
Step 303: whole described first surface carries out the polishing sandblasting of about 30 minutes, obtains the glass with antiglare layer；
Step 304: adopt mild acid wash through the first surface of described polishing sandblasting。
Step 305: remove described acid-proof ink, puts into strong acid solution by described glass and is etched, and etches and takes out and clean up for about 30 minutes。
In the present embodiment, it is possible to process major part region and there is antiglare effect, but areas transparent degree corresponding to photographic head is high, the glass that light percent of pass is good。
Fig. 4 is the schematic diagram of the glass adopting the glass processing method of the embodiment of the present invention 3 to process。As shown in Figure 4, this glass includes:
There is the first area 401 of antiglare effect and not there is the second area 402 of antiglare effect。Described second area 402 is circular。When described glass is arranged on an electronic device, becomes screen a part of of described electronic equipment, the region at the exactly photographic head place of electronic equipment below described second area 402。Owing to described second area 402 is without non-glare treated, and the etching through concentrated acid solution, so described second area 402 has higher transparency and light percent of pass, such that it is able to make the light that described camera collection arrives more sufficient, the image of generation is relatively sharp。
Fig. 5 is the flow chart of the glass processing embodiment of the method 4 of the present invention。As it is shown in figure 5, the method may include that
Step 501: obtain and need the glass carrying out non-glare treated；The first surface of described glass has the first area needing to carry out non-glare treated and does not need to carry out the character area with lenovo printed words of non-glare treated；
Step 502: cover the acid-proof ink of more than 50 microns at described character area；
Step 503: whole described first surface carries out the polishing sandblasting of about 30 minutes, obtains the glass with antiglare layer；
Step 504: adopt mild acid wash through the first surface of described polishing sandblasting。
Step 505: remove described acid-proof ink, puts into strong acid solution by described glass and is etched, and etches and takes out and clean up for about 30 minutes。
In the present embodiment, it is possible to process major part region and there is antiglare effect, but the character area transparency with lenovo printed words is high, the glass that light percent of pass is good。
Fig. 6 is the schematic diagram of the glass adopting the glass processing method of the embodiment of the present invention 4 to process。As shown in Figure 6, this glass includes:
There is the first area 601 of antiglare effect and not there is the second area 602 of antiglare effect。Described second area 602 forms Lenovo printed words。Although it should be noted that Lenovo printed words black represents in Fig. 6, but in practical application, the visual effect in Lenovo printed words region is not black, but relative to for the region of non-glare treated, brighter visual effect。When described glass is arranged on an electronic device, when becoming screen a part of of described electronic equipment, described second area 602 is due to without non-glare treated, and the etching through concentrated acid solution, so having higher transparency and light percent of pass, such that it is able to make user see the printed words of lenovo, the trademark information of prompting product from the screen that described glass is constituted。
Finally, it can further be stated that, in this article, the relational terms of such as first and second or the like is used merely to separate an entity or operation with another entity or operating space, and not necessarily requires or imply the relation that there is any this reality between these entities or operation or sequentially。And, term " includes ", " comprising " or its any other variant are intended to comprising of nonexcludability, so that include the process of a series of key element, method, article or equipment not only include those key elements, but also include other key elements being not expressly set out, or also include the key element intrinsic for this process, method, article or equipment。When there is no more restriction, statement " including ... " key element limited, it is not excluded that there is also other identical element in including the process of described key element, method, article or equipment。
Principles of the invention and embodiment are set forth by specific case used herein, and the explanation of above example is only intended to help to understand method and the core concept thereof of the present invention；Simultaneously for one of ordinary skill in the art, according to the thought of the present invention, all will change in specific embodiments and applications。In sum, this specification content should not be construed as limitation of the present invention。
Claims (12)
1. a glass processing method, it is characterised in that including:
Obtain and need the glass carrying out non-glare treated；At least one surface of described glass has first area and second area；Described first area is the region needing to carry out non-glare treated, and described second area is the region not needing to carry out non-glare treated；
The overcoat of the first thickness is covered at described second area；
Carrying out non-glare treated to comprising the whole described surface with described second area, the described first area, obtain the glass that antiglare layer is the second thickness, described second thickness is less than described first thickness；
Removing described overcoat, the glass that antiglare layer is the second thickness after the described overcoat of removal is put into strong acid solution and carries out the etching of first degree of depth, described first degree of depth is less than described second thickness。
2. method according to claim 1, it is characterised in that the described whole described surface to comprising described first area and described second area before removing described overcoat, also includes after carrying out non-glare treated:
Adopt mild acid wash through the described surface of described non-glare treated。
3. method according to claim 1, it is characterised in that the described whole described surface to comprising described first area and described second area carries out non-glare treated, specifically includes:
Adopt the silicon carbide sand of 2000 to 10000 orders that described surface carries out polishing sandblasting by sandblasting machine。
4. method according to claim 1, it is characterised in that described put into strong acid solution carry out the etching of first degree of depth by removing the glass that antiglare layer is the second thickness after described overcoat, specifically includes:
The glass that antiglare layer is the second thickness after the described overcoat of removal is put into the strong acid solution that concentration is 10%～25% and carries out the etching of first degree of depth。
5. method according to claim 1, it is characterised in that described strong acid solution specifically includes following components:
The Fluohydric acid. of 90%～91%, the sulphuric acid of 1%～2%, the hydrochloric acid of 2%～3%, the phosphoric acid of 1%～2%, the nitric acid of 1%～2%。
6. method according to claim 1, it is characterised in that the described overcoat covering the first thickness at described second area, specifically includes:
The acid-proof ink of the first thickness is covered at described second area。
7. method according to claim 1, it is characterised in that described first thickness is more than or equal to 50 microns。
8. method according to claim 1, it is characterised in that described second thickness is 3 to 10 microns。
9. method according to claim 1, it is characterised in that the described overcoat covering the first thickness at described second area, specifically includes:
The mode adopting printing or stickup covers the overcoat of the first thickness at described second area。
10. method according to claim 1, it is characterised in that described second area is after the predeterminated position that described glass is installed in electronic equipment, the region corresponding with the photographic head of described electronic equipment；
Or, described second area forms word or figure。
11. method according to claim 1, it is characterised in that described first thickness is more than or equal to 50 microns, and described second thickness is more than or equal to 3 microns and less than or equal to 10 microns。
12. method according to claim 11, it is characterised in that after the etching of described first degree of depth, the thickness of described antiglare layer is more than or equal to 0.06 micron and less than or equal to 0.25 micron。
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410681838.1A CN105693101A (en) | 2014-11-24 | 2014-11-24 | Glass processing method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410681838.1A CN105693101A (en) | 2014-11-24 | 2014-11-24 | Glass processing method |
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| CN105693101A true CN105693101A (en) | 2016-06-22 |
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| CN106746704A (en) * | 2017-01-16 | 2017-05-31 | 浙江宝泰电子有限公司 | A kind of processing method of the display screen glass of built-in camera computer |
| CN109748513A (en) * | 2019-03-26 | 2019-05-14 | 信利光电股份有限公司 | A kind of local anti-dazzle processing method of cover board |
| CN110253406A (en) * | 2019-06-10 | 2019-09-20 | Oppo广东移动通信有限公司 | Cover board and preparation method thereof and electronic equipment |
| CN112154357A (en) * | 2018-05-21 | 2020-12-29 | Ａｇｃ株式会社 | Anti-glare transparent substrate and display device provided with same |
| CN112174539A (en) * | 2020-09-29 | 2021-01-05 | 台州星星光电科技有限公司 | Processing method for avoiding camera position of display panel |
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| CN106746704A (en) * | 2017-01-16 | 2017-05-31 | 浙江宝泰电子有限公司 | A kind of processing method of the display screen glass of built-in camera computer |
| CN106746704B (en) * | 2017-01-16 | 2019-03-12 | 浙江宝泰电子有限公司 | A kind of processing method of the display screen glass of built-in camera computer |
| CN112154357A (en) * | 2018-05-21 | 2020-12-29 | Ａｇｃ株式会社 | Anti-glare transparent substrate and display device provided with same |
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| CN109748513A (en) * | 2019-03-26 | 2019-05-14 | 信利光电股份有限公司 | A kind of local anti-dazzle processing method of cover board |
| CN110253406A (en) * | 2019-06-10 | 2019-09-20 | Oppo广东移动通信有限公司 | Cover board and preparation method thereof and electronic equipment |
| CN112174539A (en) * | 2020-09-29 | 2021-01-05 | 台州星星光电科技有限公司 | Processing method for avoiding camera position of display panel |
| CN113411430A (en) * | 2021-07-08 | 2021-09-17 | Oppo广东移动通信有限公司 | Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device |
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