CN106269626A - Anti-splash guard shield - Google Patents
Anti-splash guard shield Download PDFInfo
- Publication number
- CN106269626A CN106269626A CN201510242511.9A CN201510242511A CN106269626A CN 106269626 A CN106269626 A CN 106269626A CN 201510242511 A CN201510242511 A CN 201510242511A CN 106269626 A CN106269626 A CN 106269626A
- Authority
- CN
- China
- Prior art keywords
- guard shield
- aperture
- splash guard
- fluid
- splash
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Prevention Of Fouling (AREA)
Abstract
Present invention is disclosed a kind of Anti-splash guard shield, including: cover body, the front of cover body is Anti-splash face, and Anti-splash is provided with aperture on face；Fluid passage, fluid passage is positioned at the back side of cover body, and fluid passage includes runner pipe and collapsible tube, and runner pipe connects with collapsible tube, and another fluid passage is directly or indirectly connected with aperture by collapsible tube；Wherein, fluid passage is passed through for fluid, and fluid, by the entrance fluid passage, one end of runner pipe, is flowed out fluid passage by the other end of runner pipe, and the pressure of fluid forms negative pressure at aperture.The Anti-splash guard shield that the present invention provides, has not only acted as Anti-splash effect, additionally it is possible to region in need is carried out key protection, has drips, thus eliminate the risk polluting wafer in preventing respective regions.
Description
Technical field
The present invention relates to semiconductor machining and manufacture field, set more particularly, it relates to quasiconductor cleans
Standby field.
Background technology
Some product or equipment are often carried out by commercial production, in order to prevent the splashing of cleanout fluid,
It is the most necessary that corresponding Anti-splash guard shield is set, can stop that cleanout fluid falls in some sensitizing range, make
Become to pollute.
Semicon industry also has special cleaning, is interspersed between some other processing technique.
As a example by the grinding technics of wafer, after grinding technics terminates, wafer can be carried out, cleaning
Including mega sonic wave clean, hairbrush clean, deionized water clean and be dried etc. processing step.Normally,
Clean at last deionized water and in drying process step, can use as shown in Fig. 1-Fig. 2
Wafer is carried out and is dried by cleaning equipment.Tradition splashproof it is provided with during wherein Fig. 1 is prior art
Penetrating the front view cleaning chamber of guard shield, Fig. 2 is the side view cleaning chamber shown in Fig. 1.Concrete and
Speech, in cleaning chamber 101, wafer 103 is clamped and high speed rotating by fixture 105, and deionized water sprays
106 spray deionized water about 15 to 20 seconds to carry out wafer 103 to the wafer 103 rotated
Rinse；Stopping injection deionized water afterwards, wafer 103 rotates with higher speed, at centrifugal force
Under effect, the deionized water being attached to wafer 103 is thrown out of to Anti-splash guard shield 102.Due to anti-
Sputtering guard shield 102 is generally disposed at the surface of wafer 103, so the deionized water major part thrown away
First concentrate and the middle part of Anti-splash guard shield 102, understand landing afterwards to the both sides of Anti-splash guard shield 102,
Finally dripped by both sides.It addition, cleaning chamber also can assist use gas nozzle 104 and heating lamp 107
Accelerate to be dried.
But, after drying steps terminates, need to remove to facilitate mechanical hand by Anti-splash guard shield 102
Take out wafer 103, owing to the fortuitous event such as rocking during this, if on Anti-splash guard shield 102
Deionized water is dried the most completely or dries, and the deionized water of residual likely continues drippage.If
The deionized water of drippage just falls on wafer 103 and streaks along wafer 103 1 tunnel, will be at wafer
Leave washmarking on 103, wafer is polluted, affect subsequent technique.
As can be seen here, although traditional Anti-splash guard shield can stop that cleanout fluid splashes, but can not
Highly desirable prevent the drippage of cleanout fluid, more cannot guarantee that some key areas do not have cleanout fluid and drip
Fall, it is therefore desirable to improve.
Summary of the invention
In order to solve the deficiencies in the prior art, present inventor discloses a kind of new Anti-splash and protects
Cover, utilizes Venturi effect, is transformed tradition guard shield.Improved Anti-splash guard shield is stopped
The phenomenon of unexpected dropping liquid, thus avoid and wafer is polluted.
Technical scheme is as follows:
According to one embodiment of the invention, a kind of Anti-splash guard shield is proposed, including:
Cover body, the front of cover body is Anti-splash face, and Anti-splash is provided with aperture on face；
Fluid passage, fluid passage is positioned at the back side of cover body, and fluid passage includes runner pipe and collapsible tube,
Runner pipe connects with collapsible tube, and another fluid passage is directly or indirectly connected with aperture by collapsible tube；Its
In, fluid passage is passed through for fluid, and fluid is by the entrance fluid passage, one end of runner pipe, by runner pipe
The other end flow out fluid passage, the pressure of fluid forms negative pressure at aperture.
Further, the caliber of collapsible tube is less than the caliber of runner pipe.
Collapsible tube is perpendicular to runner pipe and arranges.
Alternatively, fluid is compressed air, nitrogen or deionized water.
Further, fluid is compressed air or nitrogen, and the pressure of fluid is 30～90psi.
Aperture is arranged in middle part and the sidepiece in Anti-splash face linearly.
Further, the minimum spacing between aperture and aperture is less than 20mm.
Alternatively, cover body is solid slab, and collapsible tube directly connects runner pipe and aperture.
Alternatively, cover body is hollow cavity, and collapsible tube makes runner pipe and aperture indirect communication by hollow cavity.
Cover body is made up of hydrophobic material.
Technical scheme provided by the present invention, utilizes the principles of science, protects tradition by designing cleverly
Cover is improved, and the Anti-splash guard shield after improvement can not only prevent the splashing of cleanout fluid, also avoids
In moving process, the situation of unexpected dropping liquid occurs, and especially can also accomplish to drip key area
The protection of phenomenon, makes thus the quality of wafer has obtained more preferable guarantee.
Accompanying drawing explanation
Fig. 1 discloses the front view cleaning chamber being provided with tradition Anti-splash guard shield in prior art；
Fig. 2 is the side view cleaning chamber shown in Fig. 1；
Fig. 3 discloses the structural representation of the first embodiment of the Anti-splash guard shield of the present invention；
Fig. 4 discloses the structural representation of the second embodiment of the Anti-splash guard shield of the present invention.
Detailed description of the invention
In order to make that those skilled in the art is apparent, be clearly understood that the mentality of designing of the present invention and send out
Bright intention, following multiple specific embodiments are illustrated by and illustrate by applicant, and combine accompanying drawing and notify:
Fig. 3 discloses the first embodiment of Anti-splash guard shield of the present invention.The splashproof that first embodiment discloses
Penetrate the solid slab that guard shield is a bending, including cover body 301 and fluid passage 302.Cover body 301
Front is Anti-splash face 3011, and this Anti-splash face 3011, for the splashing of barrier liquid, therefore makes
During with this Anti-splash guard shield, Anti-splash face 3011 will face the source of sputtering directly, and the liquid splashed will
Directly beat on Anti-splash face 3011.The middle part in Anti-splash face 3011 offers row's circular hole linearly
303, because the middle part of Anti-splash guard shield is the most just to wafer, need key protection, with
Deionized water is avoided just to drop on wafer, and owing to wafer is upright placement, Anti-splash face
Even if the place beyond in the middle part of in the of 3011 has water droplet to fall also and will not fall on wafer, therefore can not beat or few
Spile 303.Fluid passage 302 is arranged at the back side of cover body 301, and it includes the stream being interconnected
Siphunculus 3021 and collapsible tube 3022.Collapsible tube 3022 therein connects with aperture 303, due to cover
Body 301 is plank frame, so fluid passage 302 is provided with multiple collapsible tube 3022, with aperture
303 connect correspondingly.And runner pipe 3021 passes through for fluid, fluid is through runner pipe 3021
One end enters, then is flowed out by the other end, and fluid is directed flow in runner pipe 3021.First implements
In example, cover body is solid slab, and collapsible tube directly connects aperture and runner pipe.
According to Venturi effect, when the fluid high-speed in runner pipe 3021 flows, collapsible tube 3022
Corresponding position will produce negative pressure, and the highest then negative pressure of speed of fluid is the biggest, due to collapsible tube 3022
Connect with the aperture 303 on Anti-splash face 3011, thus beat on Anti-splash face 3011, be positioned at
The water droplet not dropped of aperture 303 periphery will be due to the effect gram of the negative pressure in collapsible tube 3022
Take gravity, it is impossible to drop.In order to preferably play the effect of Venturi effect, collapsible tube 3022
Caliber should less than the caliber of runner pipe 3021 to form negative pressure, and collapsible tube 3022 preferably with circulate
Pipe 3021 is vertically arranged.Fluid in runner pipe 3021 can select compressed air, nitrogen or go from
Sub-water, from the point of view of cost and simplification equipment, preferably gas, because gas can directly discharge,
Without circulation.The fluid selected in the present embodiment is compressed air.Although it addition, theoretically, stream
As long as having fluid to flow in siphunculus 3021, negative pressure at collapsible tube 3022, will be produced, but the most such as
Really the flow velocity of fluid is the slowest, and the negative pressure of generation is by too small, it is possible to cause water droplet to drip.Therefore,
Fluid should have certain pressure in runner pipe 3021, this pressure typically 30～90psi,
Compressed-air actuated pressure in runner pipe 3021 is controlled at 30psi by the present embodiment, to ensure pressure
Contracting air is with higher flow rate, from without making drips.
The aperture 303 being positioned on Anti-splash face 3011 at the middle part in Anti-splash face 3011 along between a line
Minimum range (i.e. two spacing at a distance of between nearest aperture) between arrangement, aperture and aperture
20mm should be less than, this is because, if two spacing at a distance of between nearest aperture are excessive,
Then being likely to result in aperture 303 and cannot draw the moisture that periphery is whole completely, unabsorbed moisture still has
Crystal column surface may be dropped to.
It addition, the cover body 301 of Anti-splash guard shield preferably selects hydrophobic material to make, such cover body
301 when touching the cleanout fluid such as deionized water, and the moisture not absorbed by aperture 303 will be at gravity
Effect under flow to other positions in Anti-splash face 3011 smoothly, without absorption in Anti-splash face
On 3011, cause accumulation.The present embodiment has been selected the cover body 301 that quartz cover makes.
Fig. 4 is the second embodiment of the present invention.Anti-splash guard shield in this embodiment includes cover body equally
401 and fluid passage 402.With first embodiment differently, the cover body 401 in this embodiment is constituted
The small size air chambers of the heart of one bending, the bottom surface of hollow cavity and end face be respectively cover body 401 front and
The back side, the front of cover body 401 is Anti-splash face 4011, will face the liquid of splashing during use directly.
At middle part and the edge in Anti-splash face 4011, as preventing the key area dripped, if respectively having offered
The aperture 403 of main line shape arrangement.It practice, the position of aperture 403 arrangement and the tool of cover body 401
Shape can be designed according to real needs, to meet the requirement of anti-drippage and Anti-splash.
In second embodiment, fluid passage 402 is similarly disposed at the back side of cover body 401, and is also classified into
Runner pipe 4021 and collapsible tube 4022, the two is interconnected.It addition, the collapsible tube 4022 in this example
Also be interconnected with aperture 403, but between collapsible tube 4022 and aperture 403 be by by
Cover body 401 constitute hollow cavity and connect.Owing to cover body 401 have employed the design of hollow cavate,
Collapsible tube 4022 is no longer necessary to and aperture 403 one_to_one corresponding, use only a collapsible tube in this example
4022 and this collapsible tube 4022 is directly turned on the back side of cover body 401, it is achieved that and overcomes water droplet
Gravity, prevents the purpose that water droplet drips.Its principles of science utilized remains Venturi effect, because
In runner pipe 4021, swiftly flowing fluid creates negative pressure to whole hollow cavity, and Anti-splash face
4011 as the bottom surface of hollow cavity, is positioned at around each aperture 403 thereon all with the presence of negative pressure, from
And create absorption drop, prevent the effect that drops.In second embodiment, cover body is hollow cavity, shrinks
Pipe is by hollow cavity indirect communication aperture and runner pipe.
Runner pipe 4021 and collapsible tube 4022 in second embodiment are vertically arranged equally, and collapsible tube
The caliber of 4022 is less than the caliber of runner pipe 4021.Fluid in fluid hose 4021 selects nitrogen,
The pressure of the nitrogen in control runner pipe 4021 is at 90psi, so that nitrogen is circulating with higher flow velocity
Pipe 4021 interior orientation flows, and ensures the generation of Venturi effect, and the arrow in figure designates nitrogen
The direction of flowing in runner pipe 4021.Meanwhile, between aperture and the aperture on Anti-splash face 4011
Minimum range also should control at below 20mm, to prevent aperture 403 from leaving the blind area of absorption, lead
Water droplet in blinding district drops to crystal column surface.Cover body 401 preferably selects hydrophobic material to be made.
Above example and embodiment show the progressive of the present invention, are also highly convenient for this area skill
Art personnel understand, but it should be noted that they and nonrestrictive.It will be apparent that the present invention
Claims of application the most more have wide in range protection domain, define the desired acquirement of invention
Boundary of Rights.
Claims (10)
1. an Anti-splash guard shield, it is characterised in that including:
Cover body, the front of described cover body is Anti-splash face, and described Anti-splash face is provided with aperture；
Fluid passage, described fluid passage is positioned at the back side of described cover body, and described fluid passage includes stream
Siphunculus and collapsible tube, described runner pipe connects with described collapsible tube, and another described fluid passage is by described
Collapsible tube directly or indirectly connects with described aperture；Wherein, described fluid passage is passed through for fluid, institute
State fluid by the entrance fluid passage, one end of described runner pipe, the other end of described runner pipe flow out stream
Body passage, the pressure of described fluid forms negative pressure at described aperture.
Anti-splash guard shield the most according to claim 1, it is characterised in that the pipe of described collapsible tube
Footpath is less than the caliber of described runner pipe.
Anti-splash guard shield the most according to claim 1, it is characterised in that described collapsible tube is vertical
Arrange in described runner pipe.
Anti-splash guard shield the most according to claim 1, it is characterised in that described fluid is compression
Air, nitrogen or deionized water.
Anti-splash guard shield the most according to claim 4, it is characterised in that described fluid is compression
Air or nitrogen, the pressure of described fluid is 30～90psi.
Anti-splash guard shield the most according to claim 1, it is characterised in that described aperture is linearly
It is arranged in middle part and the sidepiece in described Anti-splash face.
Anti-splash guard shield the most according to claim 1, it is characterised in that described aperture and aperture
Between minimum spacing less than 20mm.
Anti-splash guard shield the most according to claim 1, it is characterised in that described cover body is solid
Plate, collapsible tube directly connects runner pipe and aperture.
Anti-splash guard shield the most according to claim 1, it is characterised in that described cover body is hollow
Chamber, collapsible tube makes runner pipe and aperture indirect communication by hollow cavity.
Anti-splash guard shield the most according to claim 1, it is characterised in that described cover body is by dredging
Water-based material is made.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510242511.9A CN106269626A (en) | 2015-05-13 | 2015-05-13 | Anti-splash guard shield |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510242511.9A CN106269626A (en) | 2015-05-13 | 2015-05-13 | Anti-splash guard shield |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106269626A true CN106269626A (en) | 2017-01-04 |
Family
ID=57630880
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510242511.9A Pending CN106269626A (en) | 2015-05-13 | 2015-05-13 | Anti-splash guard shield |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106269626A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108216697A (en) * | 2018-01-12 | 2018-06-29 | 北京航空航天大学 | Cylindrical shape splashproof is shot at the target |
| CN109702412A (en) * | 2019-03-04 | 2019-05-03 | 国网河南省电力公司电力科学研究院 | A kind of exothermic welding mould |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2495385Y (en) * | 2001-08-31 | 2002-06-19 | 扬博科技股份有限公司 | Apparatus for washing electric circuit plate |
| JP2008274664A (en) * | 2007-04-27 | 2008-11-13 | Taikisha Ltd | Processing apparatus and processing method |
| CN202003963U (en) * | 2010-12-30 | 2011-10-05 | 中芯国际集成电路制造(上海)有限公司 | Wafer cleaning device |
| CN202238724U (en) * | 2011-10-11 | 2012-05-30 | 大久制作(大连)有限公司 | Automatic substrate cleaning machine with liquid splashing prevention effect |
| CN102912406A (en) * | 2012-11-12 | 2013-02-06 | 上海华力微电子有限公司 | Protecting cover for process cavity |
| CN203304237U (en) * | 2013-06-03 | 2013-11-27 | 苏州工业职业技术学院 | Scrap absorption device |
| CN204194407U (en) * | 2014-09-09 | 2015-03-11 | 南京健友生化制药股份有限公司 | A kind of centrifuge air draft system and centrifuge suspended hood |
-
2015
- 2015-05-13 CN CN201510242511.9A patent/CN106269626A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2495385Y (en) * | 2001-08-31 | 2002-06-19 | 扬博科技股份有限公司 | Apparatus for washing electric circuit plate |
| JP2008274664A (en) * | 2007-04-27 | 2008-11-13 | Taikisha Ltd | Processing apparatus and processing method |
| CN202003963U (en) * | 2010-12-30 | 2011-10-05 | 中芯国际集成电路制造(上海)有限公司 | Wafer cleaning device |
| CN202238724U (en) * | 2011-10-11 | 2012-05-30 | 大久制作(大连)有限公司 | Automatic substrate cleaning machine with liquid splashing prevention effect |
| CN102912406A (en) * | 2012-11-12 | 2013-02-06 | 上海华力微电子有限公司 | Protecting cover for process cavity |
| CN203304237U (en) * | 2013-06-03 | 2013-11-27 | 苏州工业职业技术学院 | Scrap absorption device |
| CN204194407U (en) * | 2014-09-09 | 2015-03-11 | 南京健友生化制药股份有限公司 | A kind of centrifuge air draft system and centrifuge suspended hood |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108216697A (en) * | 2018-01-12 | 2018-06-29 | 北京航空航天大学 | Cylindrical shape splashproof is shot at the target |
| CN109702412A (en) * | 2019-03-04 | 2019-05-03 | 国网河南省电力公司电力科学研究院 | A kind of exothermic welding mould |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information |
Address after: 201203 building 4, No. 1690, Cailun Road, free trade zone, Pudong New Area, Shanghai Applicant after: Shengmei semiconductor equipment (Shanghai) Co., Ltd Address before: 201203 Shanghai city Pudong New Area Zhangjiang High Tech Park of Shanghai Cailun Road No. fourth 1690 Applicant before: ACM (SHANGHAI) Inc. |
|
| CB02 | Change of applicant information | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170104 |
|
| RJ01 | Rejection of invention patent application after publication |