TWM481772U - Fluid nozzle - Google Patents

Fluid nozzle Download PDF

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Publication number
TWM481772U
TWM481772U TW103205096U TW103205096U TWM481772U TW M481772 U TWM481772 U TW M481772U TW 103205096 U TW103205096 U TW 103205096U TW 103205096 U TW103205096 U TW 103205096U TW M481772 U TWM481772 U TW M481772U
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TW
Taiwan
Prior art keywords
chamber
inlet
fluid
jet
jet flow
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Application number
TW103205096U
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Chinese (zh)
Inventor
Chih-Ming Teng
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Els System Technology Co Ltd
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Application filed by Els System Technology Co Ltd filed Critical Els System Technology Co Ltd
Priority to TW103205096U priority Critical patent/TWM481772U/en
Publication of TWM481772U publication Critical patent/TWM481772U/en

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  • Cleaning Or Drying Semiconductors (AREA)

Description

流體噴頭Fluid nozzle

本新型是有關於一種流體噴頭,特別是指一種能保持半導體晶圓或顯示器用基板等基板清潔的流體噴頭。The present invention relates to a fluid nozzle, and more particularly to a fluid nozzle capable of cleaning a substrate such as a semiconductor wafer or a substrate for a display.

半導體晶圓是經過多個製程步驟。由於每道晶圓製程步驟都有潛在性的污染源,晶圓表面會有殘留物,會導致缺陷生成及元件特性失效。在清洗製程中,而利流體噴頭對晶圓進行處理,清除顆粒及污染物,而保持晶圓表面的清潔。Semiconductor wafers are subjected to multiple process steps. Since each wafer process step has a potential source of contamination, there are residues on the wafer surface that can cause defect formation and component failure. In the cleaning process, the fluid nozzle processes the wafer to remove particles and contaminants while keeping the wafer surface clean.

參閱圖1與圖2,為習知流體噴頭包括一具有一腔室111的噴頭本體11、一設置於該噴頭本體11上方並連通腔室111且供水流入的進氣管12,及一設置於該噴頭本體11後側並連通該腔室111且供空氣流入的進液管13。該噴頭本體11還具有兩個位於該腔室111左右兩側的側面112(圖1中僅示意該等側面112的其中一側面112)、一縱向延伸且兩相反端分別連接於該等側面112的分隔柱113,及多數個彼此相間隔並連通該腔室111與外界之間,且相反於該進氣管12一側的流道114。該分隔柱113供空氣流入時分成兩股,當水流入該腔室111時,因該分隔柱113 及該腔室111的設計使水在腔室111中,產生擾流。接著,水與空氣從該流道114流出。因此,使用流體噴頭清洗晶圓表面,導致清洗效果不佳,而影響後續製程的良率。Referring to FIG. 1 and FIG. 2, a conventional fluid nozzle includes a nozzle body 11 having a chamber 111, an air inlet tube 12 disposed above the nozzle body 11 and communicating with the chamber 111, and a water supply flow therein, and a The head side of the head body 11 communicates with the chamber 111 and the inlet pipe 13 through which air flows. The head body 11 further has two sides 112 on the left and right sides of the chamber 111 (only one side 112 of the side faces 112 are shown in FIG. 1 ), a longitudinal extension and opposite ends are respectively connected to the sides 112 . The partition column 113, and a plurality of flow paths 114 spaced apart from each other and communicating between the chamber 111 and the outside, and opposite to the side of the intake pipe 12. The partition column 113 is divided into two when the air flows in, and when the water flows into the chamber 111, the partition column 113 And the design of the chamber 111 causes water to flow in the chamber 111, creating a turbulence. Then, water and air flow out from the flow path 114. Therefore, the use of a fluid jet to clean the surface of the wafer results in poor cleaning and affects the yield of subsequent processes.

因此,本新型之目的,即在提供一種提升清潔效果的流體噴頭。Therefore, the object of the present invention is to provide a fluid nozzle that enhances the cleaning effect.

於是,本新型流體噴頭,包含:一噴頭本體,包括一沿一第一方向延伸的容室,及至少一連通該容室的噴射流道,該噴射流道具有一連通該容室的入口,及一相反於該入口且連通外界的出口;一進氣管,設置於該噴頭本體的上方並連通該容室的頂側,且位於相反該噴射流道一側;及一進液管,沿該第一方向延伸進入該容室,該進液管具有數量對應該噴射流道的入口數量且位於該入口位置上方的出液口。Therefore, the fluid nozzle of the present invention comprises: a nozzle body including a chamber extending in a first direction, and at least one jet flow passage communicating with the chamber, the jet prop having an inlet connecting the chamber, And an outlet opposite to the inlet and communicating with the outside; an intake pipe disposed above the nozzle body and communicating with the top side of the chamber and located on the opposite side of the jet flow path; and a liquid inlet tube The first direction extends into the chamber, the inlet tube having a number of outlets corresponding to the number of inlets of the injection channel and located above the inlet location.

較佳地,該流體噴頭包含多數個噴射流道,彼此沿該第一方向相間隔地形成於該噴頭本體,該進液管具有數量對應該噴射流道的入口數量且位於該等入口上方的出液口。Preferably, the fluid jet head comprises a plurality of jet flow channels formed on the nozzle body at intervals in the first direction, the inlet pipe having a number of inlets corresponding to the jet flow channels and located above the inlets Liquid outlet.

較佳地,其中,該容室具有一連通該進氣管的上段,及一連通該上段與該等噴射流道的入口的下段,該下段的寬度是朝鄰近該等入口方向漸縮。Preferably, the chamber has an upper portion that communicates with the intake pipe, and a lower portion that communicates with the upper portion and the inlet of the injection flow passages, the width of the lower portion being tapered toward the inlet direction.

較佳地,其中,該等噴射流道呈狹長狀。Preferably, wherein the jet channels are elongated.

本新型之功效在於:透過流體噴頭的設計,以 及供應處理液及氣體至流體噴頭,使處理液流出噴射流道能加速,從而增加清洗或去除基板表面的塗佈物質或汙染物質的能力和效率,有助於後續製程處理,進而提升產品良率。The effect of the novel is: through the design of the fluid nozzle, And supplying the treatment liquid and the gas to the fluid nozzle, so that the treatment liquid can be accelerated out of the injection flow channel, thereby increasing the ability and efficiency of cleaning or removing the coating material or the pollutant substance on the surface of the substrate, and facilitating the subsequent process treatment, thereby improving the product quality. rate.

2‧‧‧基板2‧‧‧Substrate

3‧‧‧噴頭本體3‧‧‧ sprinkler body

31‧‧‧容室31‧‧ ‧ room

311‧‧‧上段311‧‧‧上段

312‧‧‧下段312‧‧‧ lower section

32‧‧‧噴射流道32‧‧‧Spray runner

321‧‧‧入口321‧‧‧ entrance

322‧‧‧出口322‧‧‧Export

4‧‧‧氣體4‧‧‧ gas

5‧‧‧進氣管5‧‧‧Intake pipe

6‧‧‧處理液6‧‧‧Processing fluid

7‧‧‧進液管7‧‧‧Inlet pipe

71‧‧‧出液口71‧‧‧liquid outlet

D1‧‧‧第一方向D1‧‧‧ first direction

本新型之其他的特徵及功效,將於參照圖式的較佳實施例詳細說明中清楚地呈現,其中:圖1與圖2是說明習知技術的剖視示意圖;圖3是一剖視示意圖,說明本新型流體噴頭的一第一較佳實施例;圖4與圖6是說明利用雙流體通過流體噴頭的清洗基板過程的示意圖;圖5是一局部放大圖,說明一容室;圖7是一剖視示意圖,說明本新型流體噴頭的一第二較佳實施例;及圖8是說明利用雙流體通過流體噴頭的清洗基板過程的示意圖。Other features and advantages of the present invention will be apparent from the detailed description of the preferred embodiments illustrated in the accompanying drawings. FIG. 1 and FIG. 2 are schematic cross-sectional views illustrating the prior art; FIG. 3 is a schematic cross-sectional view A first preferred embodiment of the fluid nozzle of the present invention is illustrated; FIGS. 4 and 6 are schematic views illustrating a process of cleaning a substrate by using a fluid jet through a fluid jet; FIG. 5 is a partially enlarged view showing a chamber; FIG. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 8 is a schematic cross-sectional view showing a second preferred embodiment of the fluid nozzle of the present invention; and FIG. 8 is a schematic view showing the process of cleaning a substrate by using a dual fluid through a fluid nozzle.

在本新型被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.

下列較佳實施例的說明是參考附加的圖式,用以例示本新型可用以實施之特定實施例。本新型所提到的方向用語,例如「上」、「下」、「前」、「後」、「左」、「右」 等,僅是參考附加圖式的方向。因此,使用的方向用語是用來說明,而非用來限制本新型。The following description of the preferred embodiments is intended to be illustrative of the specific embodiments Directional terms mentioned in this new model, such as "upper", "lower", "before", "after", "left", "right" Etc. Just refer to the direction of the additional schema. Therefore, the directional terminology used is intended to be illustrative, and not to limit the invention.

參閱圖3至圖5,本新型流體噴頭之第一較佳實施例適用對一基板2清洗。該流體噴頭包含一噴頭本體3、一供氣體4流入的進氣管5,及一供處理液6流入的進液管7。在本實施例中,該處理液6為水。Referring to Figures 3 through 5, the first preferred embodiment of the novel fluid ejection head is suitable for cleaning a substrate 2. The fluid jet head comprises a head body 3, an intake pipe 5 through which the gas 4 flows, and an inlet pipe 7 through which the treatment liquid 6 flows. In the present embodiment, the treatment liquid 6 is water.

該噴頭本體3包括一沿該第一方向D1延伸的容室31,及多數個彼此沿該第一方向D1相間隔且連通該容室31的噴射流道32。各該噴射流道32位於相反於該進氣管5一側,並具有一連通該容室31的入口321,及一相反於該入口321且連通外界的出口322。較佳地,該容室31具有一連通該進氣管5的上段311,及一連通該上段311與該等噴射流道32的入口321的下段312。該上段311是寬度相同,而該下段312的寬度是朝鄰近該等入口321方向漸縮,且該等噴射流道32的管徑與長度設計呈狹長狀,有助於處理液6流經該容室31及該等噴射流道32,使流體速度提升。The head body 3 includes a chamber 31 extending in the first direction D1, and a plurality of jet channels 32 spaced apart from each other in the first direction D1 and communicating with the chamber 31. Each of the injection flow passages 32 is located on the side opposite to the intake pipe 5, and has an inlet 321 that communicates with the chamber 31, and an outlet 322 that is opposite to the inlet 321 and communicates with the outside. Preferably, the chamber 31 has an upper section 311 that communicates with the intake duct 5, and a lower section 312 that communicates the upper section 311 with the inlets 321 of the jet channels 32. The upper section 311 has the same width, and the width of the lower section 312 is tapered toward the inlets 321 , and the diameters and lengths of the jet channels 32 are narrowly designed to facilitate the flow of the treatment liquid 6 through the The chamber 31 and the jet channels 32 increase the fluid velocity.

該進氣管5設置於該噴頭本體3的上方,並連通該容室31的頂側。The intake pipe 5 is disposed above the shower head body 3 and communicates with the top side of the chamber 31.

該進液管7由沿該第一方向D1延伸進入該容室31。該進液管7具有數量對應該等噴射流道32的入口321數量且對應該等入口321位置上方的出液口71。The inlet pipe 7 extends into the chamber 31 in the first direction D1. The inlet pipe 7 has a number of inlet ports 321 corresponding to the number of inlets 321 of the injection flow path 32 and corresponding to the outlet port 71 above the inlet 321 position.

須說明的是圖3是採用剖視圖的方式,而該噴頭本體3的容室31沿該第一方向D1的兩相反側應該是封 閉狀態,該進液管7應該是連通外界且沿該第一方向D1穿伸該噴頭本體3的容室31。It should be noted that FIG. 3 is a cross-sectional view, and the opposite sides of the chamber 31 of the head body 3 along the first direction D1 should be sealed. In the closed state, the inlet pipe 7 should be a chamber 31 that communicates with the outside and penetrates the head body 3 in the first direction D1.

以下說明利用本實施例是利用雙流體通過流體噴頭的清洗基板2過程。The following description uses the present embodiment to clean the substrate 2 by using a two-fluid fluid nozzle.

氣體4藉由該進氣管5進入該容室31時,因該進液管7位於該進氣管5下方的設置方式,使得該氣體4流經該進液管7起到了阻礙而分成兩股,再使該氣體4往下流,避免該氣體4直接向下衝擊,而能達到平均推力;同時,由於是大量該處理液6通入該進液管7後,先往該第一方向D1流,接著透過該出液口71,而使該處理液6更易擴散向下流至該容室31,由於該進液管7的出液口71與各個噴射流道32的入口321位置相對應,因此自該出液口71流出的處理液6會快速的流入各個噴射流道32的入口321,此時該氣體4平均推進該處理液6流經對應的噴射流道32而加速從出口322噴出。When the gas 4 enters the chamber 31 by the intake pipe 5, the gas inlet pipe 4 is disposed under the intake pipe 5, so that the gas 4 flows through the inlet pipe 7 to block and divide into two. The gas is further caused to flow down the gas 4 to prevent the gas 4 from directly impacting downward, and the average thrust can be achieved. Meanwhile, since a large amount of the treatment liquid 6 is introduced into the liquid inlet pipe 7, the first direction is D1. Flow, and then through the liquid outlet 71, the treatment liquid 6 is more easily diffused downward to the chamber 31, and since the liquid outlet 71 of the inlet pipe 7 corresponds to the position of the inlet 321 of each of the injection channels 32, Therefore, the treatment liquid 6 flowing out from the liquid outlet 71 quickly flows into the inlet 321 of each of the injection passages 32, and at this time, the gas 4 advances the treatment liquid 6 to flow through the corresponding injection flow path 32 to accelerate the discharge from the outlet 322. .

若是大量的該處理液6湧入該進液管7時,該處理液6會平均蓄積在該容室31,該氣體4平均推進該處理液6流經對應的該噴射流道32而加速噴出,且透過前述設計可使各個噴射流道32的噴出處理液6速率相同,大幅提升噴射均勻度。如圖6所示,由於該基板2表面並非平整,而是有起伏突起的區塊,而透過該噴頭本體3的該等噴射流道32設置更可清潔因地形上難以伸入的區域。When a large amount of the treatment liquid 6 is poured into the liquid inlet pipe 7, the treatment liquid 6 is uniformly accumulated in the chamber 31, and the gas 4 is uniformly advanced to flow through the corresponding injection flow path 32 to accelerate the discharge. Through the foregoing design, the ejection processing liquid 6 of each of the ejection channels 32 can be made to have the same rate, and the ejection uniformity can be greatly improved. As shown in Fig. 6, since the surface of the substrate 2 is not flat, there are blocks having undulating protrusions, and the ejection channels 32 passing through the head body 3 are provided to be cleaned by areas which are difficult to protrude in the terrain.

參閱圖7與圖8,是本新型流體噴頭之第二較佳實施例與第一較佳實施例大致相同,其差異在於該噴頭本 體3僅包括一噴射流道32,該進液管7僅具有一個對應該入口321位置上方的出液口71。在本實施例中,該噴射流道32的細部結構與第一實施例的各該噴射流道32的細部結構相同。第二實施例利用雙流體通過流體噴頭的清洗基板2過程與第一實施例雙流體通過流體噴頭的清洗基板2過程相同,在此不詳細說明。Referring to FIG. 7 and FIG. 8, a second preferred embodiment of the fluid nozzle of the present invention is substantially the same as the first preferred embodiment, and the difference lies in the nozzle. The body 3 includes only a jet flow path 32 having only one liquid outlet 71 corresponding to the position above the inlet 321 . In the present embodiment, the detailed structure of the jet flow path 32 is the same as the detailed structure of each of the jet flow paths 32 of the first embodiment. The second embodiment uses the two-fluid cleaning of the substrate 2 through the fluid ejection head. The process of cleaning the substrate 2 through the fluid ejection head of the first embodiment is the same, and will not be described in detail herein.

綜上所述,透過該流體噴頭的設計,以及供應該處理液6及該氣體4至流該容室31,使該氣體4平均推進處理液6流出所述噴射流道32後能加速,從而增加清洗或去除該基板2表面的塗佈物質或汙染物質的能力和效率,有助於後續製程處理,進而提升產品良率,故確實能達成本新型之目的。In summary, through the design of the fluid nozzle, and the supply of the treatment liquid 6 and the gas 4 to the chamber 31, the gas 4 can be accelerated by the average propelling treatment liquid 6 flowing out of the injection channel 32. Increasing the ability and efficiency of cleaning or removing the coating material or pollutants on the surface of the substrate 2 contributes to the subsequent process processing, thereby improving the yield of the product, so that the object of the present invention can be achieved.

惟以上所述者,僅為本新型之較佳實施例而已,當不能以此限定本新型實施之範圍,即大凡依本新型申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本新型專利涵蓋之範圍內。However, the above is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, that is, the simple equivalent changes and modifications made in accordance with the scope of the present patent application and the contents of the patent specification, All remain within the scope of this new patent.

3‧‧‧噴頭本體3‧‧‧ sprinkler body

31‧‧‧容室31‧‧ ‧ room

32‧‧‧噴射流道32‧‧‧Spray runner

321‧‧‧入口321‧‧‧ entrance

322‧‧‧出口322‧‧‧Export

5‧‧‧進氣管5‧‧‧Intake pipe

7‧‧‧進液管7‧‧‧Inlet pipe

71‧‧‧出液口71‧‧‧liquid outlet

D1‧‧‧第一方向D1‧‧‧ first direction

Claims (4)

一種流體噴頭,包含:一噴頭本體,包括一沿一第一方向延伸的容室,及至少一連通該容室的噴射流道,該噴射流道具有一連通該容室的入口,及一相反於該入口且連通外界的出口;一進氣管,設置於該噴頭本體的上方並連通該容室的頂側,且位於相反該噴射流道一側;及一進液管,沿該第一方向延伸進入該容室,該進液管具有數量對應該噴射流道的入口數量且對應該入口位置上方的出液口。A fluid nozzle includes: a nozzle body including a chamber extending in a first direction, and at least one jet flow passage communicating with the chamber, the jet prop having an inlet communicating with the chamber, and a reverse An inlet pipe connected to the outside; an intake pipe disposed above the nozzle body and communicating with the top side of the chamber and located on the opposite side of the jet flow channel; and a liquid inlet pipe along the first The direction extends into the chamber, the inlet tube having a number of inlets corresponding to the injection passage and corresponding to the outlet above the inlet position. 如請求項1所述流體噴頭,包含多數個噴射流道,彼此沿該第一方向相間隔地形成於該噴頭本體,該進液管具有數量對應該噴射流道的入口數量且位於該等入口上方的出液口。The fluid jet head according to claim 1, comprising a plurality of jet flow passages formed on the nozzle body at intervals in the first direction, the inlet pipe having a number of inlets corresponding to the jet flow passages and located at the inlets Above the liquid outlet. 如請求項2所述流體噴頭,其中,該容室具有一連通該進氣管的上段,及一連通該上段與該等噴射流道的入口的下段,該下段的寬度是朝鄰近該等入口方向漸縮。The fluid jet head according to claim 2, wherein the chamber has an upper portion communicating with the intake pipe, and a lower portion connecting the upper portion and the inlet of the jet flow passages, the width of the lower portion being adjacent to the inlets The direction is shrinking. 如請求項2所述流體噴頭,其中,該等噴射流道呈狹長狀。The fluid jet head according to claim 2, wherein the jet flow paths are elongated.
TW103205096U 2014-03-25 2014-03-25 Fluid nozzle TWM481772U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI690990B (en) * 2014-09-29 2020-04-11 日商思可林集團股份有限公司 Substrate processing method and substrate processing apparatus
CN117855112A (en) * 2024-03-08 2024-04-09 江苏京创先进电子科技有限公司 Jet block, jet device and dicing saw

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI690990B (en) * 2014-09-29 2020-04-11 日商思可林集團股份有限公司 Substrate processing method and substrate processing apparatus
CN117855112A (en) * 2024-03-08 2024-04-09 江苏京创先进电子科技有限公司 Jet block, jet device and dicing saw
CN117855112B (en) * 2024-03-08 2024-05-10 江苏京创先进电子科技有限公司 Jet block, jet device and dicing saw

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