CN106222660B - 一种cvd法制备石墨烯的低温衬底刻蚀液及其低温刻蚀方法 - Google Patents
一种cvd法制备石墨烯的低温衬底刻蚀液及其低温刻蚀方法 Download PDFInfo
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- CN106222660B CN106222660B CN201610463014.6A CN201610463014A CN106222660B CN 106222660 B CN106222660 B CN 106222660B CN 201610463014 A CN201610463014 A CN 201610463014A CN 106222660 B CN106222660 B CN 106222660B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
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- Engineering & Computer Science (AREA)
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Abstract
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Priority Applications (1)
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CN201610463014.6A CN106222660B (zh) | 2016-06-23 | 2016-06-23 | 一种cvd法制备石墨烯的低温衬底刻蚀液及其低温刻蚀方法 |
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CN201610463014.6A CN106222660B (zh) | 2016-06-23 | 2016-06-23 | 一种cvd法制备石墨烯的低温衬底刻蚀液及其低温刻蚀方法 |
Publications (2)
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CN106222660A CN106222660A (zh) | 2016-12-14 |
CN106222660B true CN106222660B (zh) | 2018-11-02 |
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CN201610463014.6A Active CN106222660B (zh) | 2016-06-23 | 2016-06-23 | 一种cvd法制备石墨烯的低温衬底刻蚀液及其低温刻蚀方法 |
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Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN109536962B (zh) * | 2018-11-20 | 2023-06-16 | 无锡格菲电子薄膜科技有限公司 | 一种cvd石墨烯生长衬底铜箔酸性刻蚀液 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103922327A (zh) * | 2014-04-17 | 2014-07-16 | 江南石墨烯研究院 | 一种大面积无损转移石墨烯薄膜的方法 |
CN104045079A (zh) * | 2014-06-25 | 2014-09-17 | 无锡格菲电子薄膜科技有限公司 | 在蓝宝石与外延金属界面外延生长石墨烯的方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10251876A (ja) * | 1997-03-14 | 1998-09-22 | Ebara Densan Kk | エッチング液 |
WO2014120162A1 (en) * | 2013-01-30 | 2014-08-07 | Empire Technology Development, Llc | Carbon nanotube-graphene composite |
CN104278273A (zh) * | 2014-06-13 | 2015-01-14 | 叶涛 | 线路板低酸高效型酸性氯化铜蚀刻液 |
CN104118871B (zh) * | 2014-07-31 | 2017-02-15 | 无锡格菲电子薄膜科技有限公司 | 一种石墨烯生长衬底的复合刻蚀液及其刻蚀方法 |
CN104528698B (zh) * | 2014-12-22 | 2016-06-08 | 重庆墨希科技有限公司 | 一种石墨烯的稳定掺杂方法 |
CN104528700B (zh) * | 2014-12-22 | 2016-05-11 | 中国科学院重庆绿色智能技术研究院 | 一种制备稳定掺杂的石墨烯的方法 |
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2016
- 2016-06-23 CN CN201610463014.6A patent/CN106222660B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103922327A (zh) * | 2014-04-17 | 2014-07-16 | 江南石墨烯研究院 | 一种大面积无损转移石墨烯薄膜的方法 |
CN104045079A (zh) * | 2014-06-25 | 2014-09-17 | 无锡格菲电子薄膜科技有限公司 | 在蓝宝石与外延金属界面外延生长石墨烯的方法 |
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Effective date of registration: 20190315 Address after: 214174 No. 518-5 Zhonghui Road, Chang'an Industrial Park, Wuxi Huishan Economic Development Zone, Wuxi City, Jiangsu Province Co-patentee after: Wuxi Sixth Element Electronic Film Technology Co., Ltd. Patentee after: Wuxi Gefei Electronic Film Technology Co.,Ltd. Address before: 214174 No. 518-5 Zhonghui Road, Chang'an Industrial Park, Wuxi Huishan Economic Development Zone, Wuxi City, Jiangsu Province Patentee before: Wuxi Gefei Electronic Film Technology Co.,Ltd. |
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Address after: No. 518-5 Zhonghui Road, Standard Factory Building of Chang'an Industrial Park, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Patentee after: WUXI GRAPHENE FILM Co.,Ltd. Patentee after: Changzhou sixth element Semiconductor Co., Ltd Address before: 214174 No. 518-5 Zhonghui Road, Chang'an Industrial Park, Wuxi Huishan Economic Development Zone, Wuxi City, Jiangsu Province Patentee before: WUXI GRAPHENE FILM Co.,Ltd. Patentee before: Wuxi sixth element electronic film technology Co., Ltd |