CN106170279B - Photo-hardening artificial nail composition - Google Patents
Photo-hardening artificial nail composition Download PDFInfo
- Publication number
- CN106170279B CN106170279B CN201580018459.7A CN201580018459A CN106170279B CN 106170279 B CN106170279 B CN 106170279B CN 201580018459 A CN201580018459 A CN 201580018459A CN 106170279 B CN106170279 B CN 106170279B
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- Prior art keywords
- photo
- methyl
- hardening
- artificial nail
- nail
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- MHCLJIVVJQQNKQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O MHCLJIVVJQQNKQ-UHFFFAOYSA-N 0.000 description 1
- 229960005082 etohexadiol Drugs 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 210000004905 finger nail Anatomy 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- JBFHTYHTHYHCDJ-UHFFFAOYSA-N gamma-caprolactone Chemical compound CCC1CCC(=O)O1 JBFHTYHTHYHCDJ-UHFFFAOYSA-N 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000004054 inflammatory process Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002085 irritant Substances 0.000 description 1
- 231100000021 irritant Toxicity 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229940063557 methacrylate Drugs 0.000 description 1
- 125000005395 methacrylic acid group Chemical class 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- CDQCOZRJMSPIBC-UHFFFAOYSA-N n-(butoxymethyl)-n-methylprop-2-enamide Chemical compound CCCCOCN(C)C(=O)C=C CDQCOZRJMSPIBC-UHFFFAOYSA-N 0.000 description 1
- AUCNMQYOQYTGPE-UHFFFAOYSA-N n-(hydroxymethyl)-n-methylprop-2-enamide Chemical compound OCN(C)C(=O)C=C AUCNMQYOQYTGPE-UHFFFAOYSA-N 0.000 description 1
- QENDLNJWYIFMIM-UHFFFAOYSA-N n-[3-(dimethylamino)propyl]-n-methylprop-2-enamide Chemical compound CN(C)CCCN(C)C(=O)C=C QENDLNJWYIFMIM-UHFFFAOYSA-N 0.000 description 1
- ZOTWHNWBICCBPC-UHFFFAOYSA-N n-ethyl-n-methylprop-2-enamide Chemical compound CCN(C)C(=O)C=C ZOTWHNWBICCBPC-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- HZBAVWLZSLOCFR-UHFFFAOYSA-N oxosilane Chemical compound [SiH2]=O HZBAVWLZSLOCFR-UHFFFAOYSA-N 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 239000001057 purple pigment Substances 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 210000004906 toe nail Anatomy 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Substances CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/55—Phosphorus compounds
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/35—Ketones, e.g. benzophenone
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q3/00—Manicure or pedicure preparations
- A61Q3/02—Nail coatings
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Birds (AREA)
- Epidemiology (AREA)
- Emergency Medicine (AREA)
- Cosmetics (AREA)
Abstract
Problem of the present invention is that obtaining photo-hardening artificial nail composition, it is reduction stink, and the composition low to the irritation of skin, after coating, firm envelope is obtained without notch, it polishes without the nail surface to user itself, and to the adhesiveness of nail height, prevents from generating fold on its surface.As solution, to contain the photo-hardening artificial nail composition by one or more of compound represented by following (A) (changing 1)~(changing 3) and (B) radical polymerization initiator.
Description
Technical field
The present invention relates to photo-hardening artificial nail compositions.
Background technique
In recent years, decoration is applied to the nail of the hand of itself or foot, or pastes artificial nails to apply the finger of decoration to it
The popularity of first art (nail art) is gradually prosperous.In addition, also it is prevailing it is a kind of to decorate or prevent because of external force caused by split, remove
Reinforcement for the purpose of, be referred to as manicure (manicure), pedicure (pedicure), manicure (sculpture) etc. will
Material containing resin is coated on the mode of nail.
Here, having a kind of paint by nitrocellulose class as nail decorative material used in decoration or reinforcement
(lacquer) it is dissolved in organic solvent, and in the substance for the pigment for wherein adding various tones.These are to be coated on nail
Or after artificial nails are upper, organic solvent is set to volatilize, to form the substance of the envelope of excellent gloss.Moreover, the envelope can be used
The organic solvent of acetone etc. is easily wiped.
However, worrying to wave when user is directly sucked in use since such nail decorative material contains organic solvent
The organic solvent of hair.In addition, worrying that tough and tensile envelope can not be become by being formed by envelope, be easy the thorn because rubbing, impacting etc.
Swash and removes.
Especially recently by the gelatinous nail quilt containing polyurethane acrylates oligomer and propylene base class monomer
It covers material to be coated on nail, and irradiates the photo-hardening artificial nails combination for being referred to as gel nails that ultraviolet light hardens it
Object attracts attention.
It is considered as that can be formed due to forming crosslinked macromolecule envelope by Raolical polymerizable
It is difficult to the tough and tensile envelope removed from nail.
However, actually needing to polish (sanding) to nail surface using file etc., thus in nail surface shape
So that photo-hardening artificial nail composition is fully adapted to nail surface with this at tiny bumps and be formed by bumps, thus
It plays anchoring effect (anchor effect) and bonds hardened photo-hardening artificial nail composition in nail surface.
But there is the stink as caused by radical initiator or monomer and skin irritatin or cutaneous sensibility
(sensitizaztion) problem for security such as (allergy).I.e. as manicure shop in the interior space, in an implementation
It may be along with stink.In addition, still having the case where unreacted initiator or monomer residue after ultraviolet light irradiation, it is also possible to
Continue to generate stink.In addition, having the risk for causing inflammation or allergy when it contacts skin.
In turn, since Raolical polymerizable is easy that it is not hard to be become surface by obstruction is polymerize as caused by oxygen
A possibility that change height also become encourage these problems point one of principal element.
Due to needing to form bumps in nail surface, the nail of user itself can be injured, photo-hardening is being removed
The nail of user itself after artificial nail composition can it is thinning, become broken.
In addition, can be polymerize by ultraviolet irradiation as described in patent document 1 with containing in the composition
The above-mentioned artificial nail composition that is characterized of ionic comonomer be it is known that but being defined as ionic as used material
Monomer.
In turn, it describes in patent document 2 containing the acrylic acid hardened by free radical polymerization or cationic polymerization
The nail decorative composition of ester monomer.
In addition, describing the change that intramolecular has at least one free-radical polymerised unsaturated double-bond in patent document 3
Object is closed, intramolecular has the acidic phosphorus compound of at least one free-radical polymerised unsaturated double-bond, and contains radical polymerization
Close artificial nails' compound of initiator.
The lining material of the nail containing unsaturated carboxylic acid is described in patent document 4.
It is described in patent document 5 to contain polyether skeleton urethane methacrylate oligomer, ester ring type (first
Base) acrylate monomer, at 25 DEG C be the acrylamide monomers of liquid, intramolecular has 2 function (first of ethylene oxide
Base) the photo-hardening type gel nails that are characterized of acrylate monomer, polyfunctional monomer more than trifunctional, Photoepolymerizationinitiater initiater use
Substrate.
Existing technical literature
Patent document
1 Japanese Unexamined Patent Publication 2009-126833 bulletin of patent document
2 Japanese Unexamined Patent Publication 2002-225496 bulletin of patent document
3 Japanese Unexamined Patent Publication 2010-053097 bulletin of patent document
4 Japanese Unexamined Patent Publication 02-001779 bulletin of patent document
5 Japanese Unexamined Patent Publication 2013-043853 bulletin of patent document
Summary of the invention
In above-mentioned each patent document, although describing the artificial nail composition of photo-hardening type, it can occur to hinder as follows
Hinder: generating stink when in use and there is irritation to skin, and must actually polish the nail surface of user
To form bumps, although and firm envelope can be obtained after curing, notch can be generated or generate fold, furthermore to nail
Poor adhesion etc..
Problem of the present invention is that photo-hardening artificial nail composition is obtained, to reduce stink, and to the thorn of skin
Swash the low composition of property and obtains firm envelope without notch, without the nail table to user itself after coating
Face is polished, and to the adhesiveness of nail height, prevents from generating fold on its surface.
The present inventors are to solve the above subject and carried out deep research, as a result, it has been found that by with specific composition structure
It is able to solve the above subject at photo-hardening artificial nail composition, thereby completing the present invention.
Specifically, as follows.
1. a kind of photo-hardening artificial nail composition, which is characterized in that containing by following (A) (changing 1)~(changing 3) institute's table
One or more of compound shown and (B) radical polymerization initiator.
2. the photo-hardening artificial nail composition according to 1, which is characterized in that other than as above-mentioned (A)
The polyfunctional compound containing free-radical polymerised unsaturated group of (C) of compound.
3. the photo-hardening artificial nail composition according to 2, which is characterized in that (C) is polyfunctional to contain free radical
The compound of polymerism unsaturated group is polyfunctional urethane acrylate compound.
4. the photo-hardening artificial nail composition according to 3, which is characterized in that polyfunctional urethane acrylate
Compound is urethane acrylate oligomer.
5. the photo-hardening artificial nail composition according to any one of 2~4, which is characterized in that (C) is multifunctional
The compound containing free-radical polymerised unsaturated group be di-epoxy compounds diacrylate compound.
6. the photo-hardening artificial nail composition according to 5, which is characterized in that the diacrylate of di-epoxy compounds
Carboxylate is compound represented by following (changing 4).
According to the present invention, even if not using organic solvent, for decoration or the purpose of reinforcement, still be able to it is long during certainly by
Cover nail surface.Also, it is interrupted due to that will not make to harden because of oxygen, it is artificial with free-radical polymerised photo-hardening
Nail composition is compared, and can not be remained unhardened ingredient and be made its hardening.
In turn, since the nail surface for not needing to user itself carries out polishing to form bumps, will not make
The nail of user itself becomes broken.
In addition, after coating the generation of stink can be prevented by remaining organic solvent or unhardened ingredient etc., and organic
Solvent or unhardened ingredient will not be impregnated into vivo from nail, will not generate stimulation to skin.
Specific embodiment
Photo-hardening artificial nail composition of the invention is such for commonly referred manicure or pedicure
Coating composition is carried out to nail surface, does not need that the nail surface of user itself is carried out to polish etc. and becomes and is formed with
Concave-convex surface is similarly set using with the previous free-radical polymerised manicure hardened by ultraviolet light etc. etc.
Standby, UV cured equipment and carry out the coating of nail surface.In turn, it can prevent surface after curing from generating fold.
Photo-hardening artificial nail composition of the invention can be used as gel nails use.Wherein, it can be directly coated at
The priming coat (base coat) of the nail of user, the coloured coating being coated on the priming coat (color coat), into
And it is all used on any one layer in the top coating (top coat) being coated on it.
Priming coat, it is however generally that, to be transparent, or slightly yellow, occasional cooperate the pigment of micro purple or blue,
To prevent the variation of tone caused by xanthochromia (yellowing) caused by deteriorating because of time dependent.
Coloured coating is with monochromatic (solid color) or lamé (lam ' e) tune, metallic luster tune, dead color or bright
Color etc. is painted to colorful coating.
Top coating be it is same as priming coat, for transparent or slightly yellow, occasional cooperates micro purple or blue
Pigment, to prevent the variation of tone caused by the xanthochromia caused by deteriorating because of time dependent.Since for top layer, having makes gel
The effect that the gloss of nail plays, but after curing, the unpolymerized layer due to hindering to be with the polymerization as caused by oxygen
It is present in top coating, it is therefore desirable to be wiped to expose light using ethyl alcohol, isopropanol, ethyl acetate or acetone equal solvent
Pool.
For any layer must after curing at least 2 weeks not notch, do not remove or relative to lower layer or user
Nail do not generate tilting.
Hereinafter, being illustrated to the concrete composition of photo-hardening artificial nail composition of the invention.
[(A) methacrylic acid propionic acid pentyl, bis- (methacrylic acid propionic acid amyl) phosphates, three (metering systems
Sour propionic acid amyl) phosphate]
(A) used in the present invention with compound represented by (change 1)~(changing 3), be methacrylic acid propionic acid penta
Base phosphate (changing 1), bis- (methacrylic acid propionic acid amyl) phosphates (changing 2), three (methacrylic acid propionic acid amyl) phosphates
(changing 3).
In the present invention, above-mentioned (A) in photo-hardening artificial nail composition is with change represented by (changing 1)~(changing 3)
Close use level preferably 1~30 the weight %, more preferable 1~22 weight % of one or more of object.Use level is less than 1 weight %
When, then the photo-hardening artificial nail composition hardened may reduce the adhesiveness of the nail of user, be greater than 30 weights
When measuring %, then the photo-hardening artificial nail composition hardened can become fragile, so that being difficult to maintain envelope.
[(B) radical polymerization initiator]
As radical initiator used in the present invention, can be used benzoin isobutyl butyl ethers, benzyl ketals,
Alpha-aminoalkyl benzophenone class, acylphosphine oxide (acyl phosphine oxide) class, benzophenone, thioxanthene ketone class, two cyclopentadienyls
Titanium (titanocene) class.
Specifically, being suitable for using: 2,4- diethyl thioxanthones, 2-isopropylthioxanthone, 2,4,6- trimethylbenzoyls
It is base diphenyl phosphine oxide (LUCIRIN TPO), 2- benzyl -2- dimethylamino -1- (4- morpholino phenyl)-butane -1- ketone, double
(2,4,6- Dimethoxybenzoyl) -2,4,4- trimethylpentylphosphine oxide, bis- (2,4,6- trimethylbenzoyl)-phenyl
Phosphine oxide, 2- methyl-1-(4- methylphenyl-sulfanyl)-2- morpholinopropane-1- ketone, oligomeric (2- hydroxy-2-methyl-1- (4- (1-
Methyl ethylene) phenyl) acetone), 4- benzoyl -4 '-methyl-diphenyl sulphur, 1,2- acetyl caproyl, 1- (4- (thiophenyl) -2,
2 (o- benzoyl oximes)) 1- hydroxycyclohexylphenylketone, benzoin ethyl ether, benzyl dimethyl ketal, 2- hydroxyl -2- first
Base -1- phenyl-propane -1- ketone and 1- hydroxy-cyclohexyl-phenyl -one (IRGACURE184), 1- (4- isopropyl phenyl) -2-
Hydroxy-2-methyl propane -1- ketone, 2- hydroxyl -1- { 4- [4- (2- hydroxy-2-methyl propiono)-benzyl]-phenyl } -2- methyl
Propane -1- ketone, 1- [4- (2- hydroxyl-oxethyl) phenyl] -2- hydroxy-2-methyl -1- propane -1- ketone, 2- hydroxyl -1- { 4- [4-
(2- hydroxy-2-methyl propiono)-benzyl] phenyl } -2- methylpropane, benzophenone, 4- phenyl benzophenone, different phthalein benzophenone
(isophthal phenone) etc..These initiators are never interfered because of the light absorption of dyestuff, pigment or polymerizable compound
Free radical generates reaction, in addition, free radical generation efficiency is high, and the indurative of photo-hardening artificial nail composition can be improved
Point sets out preferably.
It, can be by these radical polymerization initiators to become 1~20 in photo-hardening artificial nail composition of the invention
The mode of weight % is cooperated, preferably 3~6 weight %.When due to mixing ratio less than 1 weight %, sufficient amount can not be generated
Free radical, cause Raolical polymerizable to become for a long time, become to harden a possibility that bad height.Further, since match ratio
When example is greater than 20 weight %, excessive free radical is generated, causes Raolical polymerizable since multiple initiation points, as a result,
Polymeric molecular weight after hardening becomes smaller.
[(C) the polyfunctional compound containing free-radical polymerised unsaturated group]
(C) the polyfunctional compound containing free-radical polymerised unsaturated group is that can be carried out freedom with 2 or more
The compound of the unsaturated group of base polymerization.For carrying out the unsaturated group of free radical polymerization, for double bond between carbon-to-carbon
Functional group's (also referred to as polymeric double bond) can enumerate vinyl, (methyl) acryloyl group, (methyl) acrylamido, vinethene
Base, allyl etc..
Also, by using these compounds, the stink of photo-hardening artificial nail composition can be reduced, and is become transparent
And low irritant, and have adhesiveness to the nail of user.
(C) the polyfunctional compound containing free-radical polymerised unsaturated group, to have 2 or more in 1 molecule
The compound of free-radical polymerised unsaturated group can enumerate ethylene glycol two (methyl) acrylate, diethyl two as concrete example
Alcohol two (methyl) acrylate, triethylene glycol two (methyl) acrylate, tetraethylene glycol two (methyl) acrylate, propylene glycol two
(methyl) acrylate, polypropylene two (methyl) acrylate, ethoxyquin polypropylene glycol two (methyl) acrylate, ethoxyquin third
Glycol two (methyl) acrylate, 1,3-BDO two (methyl) acrylate, 1,4-butanediol two (methyl) acrylate, 1,
It is 9- nonanediol two (methyl) acrylate, glycerol two (methyl) acrylate, trimethylolpropane two (methyl) acrylate, new
It is penta tetrol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, 1,6- hexylene glycol two (methyl) acrylate, double
Two (methyl) acrylate compounds such as phenol A ethylene-oxide-modified two (methyl) acrylate；Glycerol three (methyl) acrylate,
Trimethylolpropane tris (methyl) acrylate, trimethylolpropane propylene oxide modified three (methyl) acrylate, three hydroxyl first
Base propane oxireme is modified three (methyl) acrylate, new penta tetrol three (methyl) acrylate, 6-caprolactone modified three (third
Alkene trimethylammonium (acryloxyethyl)) three (methyl) the acrylate chemical combination such as isocyanuric acid ester (isocyanurate)
Object；Four (methyl) acrylate compounds such as new penta tetrol four (methyl) acrylate；In addition to this, two new penta tetrol, five (first
Base) polyalcohols and (methyl) acrylic acid such as acrylate, two new penta tetrol six (methyl) acrylate ester compounds, ethoxyquin
Bisphenol-A two (methyl) acrylate, third oxidation bisphenol-A two (methyl) acrylate, the third oxidation ethoxylated bisphenol A bis- (methyl) third
Olefin(e) acid ester.In turn, can enumerate: polyurethane (methyl) acrylate etc. have (methyl) acryloyl group urethanes or
Epoxy resin with (methyl) acryloyl group, polyester resin, diepoxy chemical combination described as follows with (methyl) acryloyl group
The diether compounds etc. of (methyl) alkyl acrylate of object.
, it is preferable to use bisphenol-A in such (C) polyfunctional compound containing free-radical polymerised unsaturated group
Dimethylacrylate or followingization 4 represented by different pyridine diphenyl bis- (oxygroup hydroxypropyl methacrylate) etc. third
Aoxidize bisphenol a dimethacrylate.When the polyfunctional compound containing free-radical polymerised unsaturated group of use (C)
When, it is 1~80 weight %, preferably 3~60 weight % relative to photo-hardening artificial nail composition as its content.Less than 1
When weight %, photo-hardening artificial nail composition can reduce the adhesiveness of the nail of user, when more than 80 weight %, then
The hardness of the composition hardened may be reduced.
[oligomer for containing (methyl) acrylate]
In photo-hardening artificial nail composition of the invention, contain free-radical polymerised unsaturation (C) is polyfunctional
In the compound of group, it can especially cooperate the oligomer containing (methyl) acrylate.Contain (methyl) propylene for such
The oligomer of acid esters can enumerate polyurethane (methyl) acrylate oligomer or epoxy (methyl) acrylate oligomer, preferably
Enumerate polyurethane (methyl) acrylate oligomer.
Polyurethane (methyl) acrylate oligomer is to add to isocyanate group end polyurethane prepolymer (prepolymer)
After adding (methyl) propenyl compounds with hydroxyl, to 10% or more of the isocyanate group sum in aforementioned polyurethane prepolymer
Isocyanate group, by aforementioned (methyl) propenyl compounds with hydroxyl make its carry out addition reaction and obtain.
By cooperating such oligomer containing (methyl) acrylate, it is few to can be obtained a kind of stink, retractility it is excellent and
Has the envelope of glossiness hardened photo-hardening artificial nail composition.
As the mixing ratio of the oligomer containing (methyl) acrylate in photo-hardening artificial nail composition,
For 0~99 weight %, preferably 0~70 weight %.When cooperation is more than 99 weight %.Then after curing, envelope can become to hold
It is easily peelable.
[compound containing free-radical polymerised unsaturated group of simple function]
The compound containing free-radical polymerised unsaturated group of simple function is to have 1 free radical polymerization in 1 molecule
Property unsaturated group compound, it is sub as its concrete example, methyl (methyl) acrylate, ethyl (methyl) acrylic acid can be enumerated
Ester, n-propyl (methyl) acrylate, isopropyl (methyl) acrylate, n-butyl (methyl) acrylate, isobutyl group (first
Base) acrylate, tert-butyl (methyl) acrylate, neopentyl (methyl) acrylate, cyclohexyl (methyl) acrylate,
Tetrahydrofurfuryl (furfuryl) (methyl) acrylate, isobornyl (isobornyl) (methyl) acrylate, phenyl (methyl)
The monohydric alcohols such as acrylate, benzyl (methyl) acrylate, N- acryloyl group oxygen ethyl hexahydrophthalic phthalimide and (first
Base) acrylic acid carboxylate.
Furthermore, it is possible to use such as 2- ethoxy (methyl) acrylate, 2- hydroxypropyl (methyl) acrylate, hydroxyl butyl
(methyl) acrylate containing hydroxyl such as (methyl) acrylate, glycidyl (meth) acrylate, allyl glycidyl
Glyceryl ether etc. includes the compound of the free-radical polymerised unsaturated group containing glycidyl；Styrene, α-toluene second
The vinyl aromatic compounds such as alkene, vinyltoluene, α-chlorostyrene；N, N- dimethyl amido ethyl (methyl) acrylic acid
Ester, N, N- diethylamino ethyl (methyl) acrylate, N- tert-butyl amino-ethyl (methyl) acrylate etc. contain azanyl
(methyl) acrylate.
In carboxylate of such monohydric alcohol and (methyl) acrylate etc., preferably hydroxyethyl meth acrylate or hydroxyl
Propyl methacrylate can make it in photo-hardening artificial nail composition of the invention containing 1~99 weight %, preferably
3~60 weight %, when less than 1 weight %, then the adhesiveness of the nail of user can drop in photo-hardening artificial nail composition
Low, when being greater than 99 weight %, then the composition hardened can become fragile, so that being difficult to maintain the envelope after coating.
As simple function acrylamide compound, can enumerate acrylamide, acryloyl morpholine, hydroxyethyl acrylamide,
Dimethylacrylamide, acrylamide, Methacrylamide, N- methyl (methyl) acrylamide, N- ethoxy (first
Base) acrylamide, N- ethyl (methyl) acrylamide, N- methylol (methyl) acrylamide, N- methoxy (methyl) third
Acrylamide, N- butoxymethyl (methyl) acrylamide, N, N- dimethyl (methyl) acrylamide, N, N- dimethylaminopropyl
(methyl) acrylamide, N, the polymerizable amide compound etc. of N- dimethyl aminoethyl (methyl) acrylamide etc..
When using the polymerizable amide compound.As its content, relative to photo-hardening artificial nail composition be 1~
40 weight %, preferably 3~30 weight %.When less than 1 weight %, then nail of the photo-hardening artificial nail composition to user
Adhesiveness can reduce, when being greater than 40 weight %, then the composition hardened can become fragile, so that being difficult to maintain the quilt after coating
Film.
[compound with acid free-radical polymerised unsaturated group]
Compound with acid free-radical polymerised unsaturated group, to be contained in containing freely for above-mentioned simple function
In the compound of base polymerism unsaturated group or the polyfunctional compound containing free-radical polymerised unsaturated group
Compound, it is possible to use acrylic acid, methacrylic acid, crotonic acid, itaconic acid (itaconic acid), maleic acid, fumaric acid,
2- carboxy ethyl (methyl) acrylate, 2- carboxypropyl (methyl) acrylate, 5- carboxy pentyl (methyl) acrylate etc.
(methyl) acrylate containing carboxyl.
In the present invention, there is acid free-radical polymerised unsaturation as in photo-hardening artificial nail composition
The use level of the compound of group, preferably 1~30 weight %, more preferable 1~22 weight %.If having acid free radical polymerization
When the use level of the compound of property unsaturated group is less than 1 weight %, the photo-hardening artificial nail composition that has hardened is to using
The adhesiveness of the nail of person may reduce, and if more than 30 weight %, may be difficult to harden, as a result, photo-hardening is artificial
Nail composition can become fragile, so that may be difficult to maintain envelope.
In photo-hardening artificial nail composition of the invention, viscosity or the transparency, indurative range are not being influenced,
Various additives can be cooperated.As such additive, such as polyalcohols, polysiloxane-based or fluorine class defomaing agent can be cooperated
The silane coupling agents such as (defoaming agent), γ-glycidoxypropyl front three oxosilane, filler, polymerization prevent
Agent, fire retardant, antioxidant, ionic adsorption body, colorant, pigment, stress palliative, softening agent (flexibilizer), stone
Wax class, halogen agent for capturing, leveling agent, wetting improver etc. common various additives in composition epoxy resin in the past.
For above-mentioned polyalcohol, in addition to the function as diluent, there are also the bondings that can make composition of the invention
Property promoted effect.Such as alkyl polyols, polyester polyol, polyether polyol, propylene polylol, polybutadiene can be enumerated
Polyalcohol, phenol polyalcohol etc..Wherein, preferably alkyl polyols, polyester polyol and polyether polyol, particularly preferably
Polyether polyol.If promotion adhesiveness in use, to 100 weight of other epoxy resin ingredients after removing polyalcohol
Part, cooperated in the mode of 0.1~40 parts by weight, preferably 2~15 parts by weight.
As alkyl polyols, ethylene glycol, 1,4-butanediol, 1,6- hexylene glycol, 1,8- ethohexadiol, new penta 2 can be enumerated
Alcohol, cyclohexanedimethanol, trimethylol propane, new penta tetrol etc..
It can be enumerated as polyester polyol: condensed type polyester polyol, addition polymerization polyester polyol, polycarbonate polyol
Alcohol etc..As condensed type polyester polyol, for by ethylene glycol, propylene glycol, diethylene glycol, 1,4-butanediol, neopentyl glycol, 1,6-
Hexylene glycol, 3- methyl 1,5-PD, 1,9- nonanediol, Isosorbide-5-Nitrae-hexane dimethanol, dimeric dibasic acid glycol, polyethylene glycol etc. are diolation
Object is closed, with the condensation between the organic multicomponents such as adipic acid, isophthalic acid, terephalic acid, decanedioic acid sour (polybasic acid)
It reacts and obtains, molecular weight is preferably 100~100,000.As addition polymerization polyester polyol, polycaprolactone can be enumerated, point
Son amount preferably 100~100,000.Polycarbonate polyol is to be changed by the direct phosgene (phosgene) of polyalcohol, is utilized
Synthesized by ester-interchange method of diphenyl carbonate etc., molecular weight is preferably 100~100,000.
As colorant, well known pigment, bright material, dyestuff can be used, especially can be used and be used as nail is coating to use
Used inorganic pigment, bright material organic pigment or dyestuff.In addition, not adding the situation of these colorants, or pass through
As transparent degree amount or addition dyestuff come may be alternatively configured the transparency photo-hardening artificial nail composition.In addition,
In photo-hardening artificial nail composition upon hardening, not only pigment etc., can also cooperate resin particle, or can cooperate in advance
Decorative material material etc. in well known photo-hardening artificial nail composition.
As the type and their content of workable pigment and dyestuff, needing to be made into will not hinder by ultraviolet light
Irradiation caused by hardening degree.
[passing through the coating method of photo-hardening artificial nail composition]
Photo-hardening artificial nail composition of the invention, except without polishing the nail surface of user itself,
And do not need to be formed except bumps in nail surface, remaining then can manually be referred to by the photo-hardening with well known ultraviolet ray hardening type
The same method of first composition is coated in nail surface.Therefore, photo-hardening artificial nail composition of the invention, as long as having
The viscosity for the degree that the spreading implements such as pen can be used sufficiently to be coated with.Certainly, light of the invention can also be coated in nail surface
After hardenability artificial nail composition, bibelot or powder etc. is made to be attached to envelope surface upon hardening.
In addition, can also preset in the single side of sheet material by unhardened photo-hardening artificial nail composition of the invention
The layer of the shape of nail is constituted and had, and adheres to this layer in a manner of being overlapped in nail surface, from by photo-hardening people
The layer peeling sheet that work nail composition is constituted, or do not remove and irradiating ultraviolet light makes its hardening.If in such sheet material table
When face presets the layer being made of photo-hardening artificial nail composition, then the coating of devices such as pen can not be used when in use,
And it is coated on the surface of nail by uniform and correct style.Also, it does not need to clean the spreading implement etc. after yet.
The nail being coated can for people finger nail or toenail it is any, can also be the nail of the animals such as dog or cat.
Hardening about the photo-hardening artificial nail composition after coating, it is possible to use well known UV cured
Device carries out.Although can the irradiation energy required for hardening has due to the difference of the ingredient of contained compound or pigment etc.
Institute is different, but it is 5mJ/cm that preferably its light, which irradiates irradiation energy (accumulated light) occurred,2The above 1000mJ/cm2Hereinafter, more
It is preferred that 10mJ/cm2The above 800mJ/cm2Below.As long as irradiation energy is within this range, can get has sufficient adhesiveness
And the nail art product of wearability.
As light source, such as mercury vapor lamp, metal halide lamp, luminescence-utraviolet diode (UV-LED), ultraviolet can be used
The light source of ultraviolet light well known to radium-shine diode of line (UV-LD) etc..
Wherein, from the viewpoint of small-sized, high life, low cost, preferably luminescence-utraviolet diode (UV-LED) and purple
The radium-shine diode of outside line (UV-LD).
Embodiment
In the way of becoming and form shown in following table 1, each ingredient is mixed into the foam that disappears.In following table 1, polyurethane propylene
Acid esters is urethane oligomer.
For resulting photo-hardening artificial nail composition, being confirmed whether by the following method can be from user's itself
Nail removing, and the results are shown in following table 1.
(cross cut (cross-cut) method)
As nail substitute and prepare the 6- nylon sheet material of surface cleaning degreasing, and on its surface to become 100 μ
The mode of the film thickness of m is coated with the photo-hardening artificial nail composition of each embodiment and comparative example, then irradiates the LED with 12W
UV lamp as light source ultraviolet light 30 seconds so that it is hardened.For unhardened part, removed using SOLMIX.
The photo-hardening artificial nail composition that obtained hardening is completed is based on cross cut test method(s), forms 2mm × 2mm
Grid, make adhesive tape attachment removed.The number for counting remaining grid after removing, to judge adhesiveness.
(state after being coated on nail 14 days)
Handle moccasin after, in the natural nail for using the degreasing of SOLMIX institute be coated with photo-hardening artificial nail composition,
And irradiation makes its hardening in ultraviolet light 30 seconds using the UV lamp of the LED of 12W as light source.Thereafter, observation occurs to be used as artificial nails
Beauty, notch, removing, the number of days passed through until any one of xanthochromia.
Table 1
The mixture of phosphate methacrylate is methacrylic acid propionic acid pentyl, bis- (methacrylic acids third
Sour amyl) phosphate and three (methacrylic acid propionic acid amyl) phosphates mixture.
LUCIRIN TPO is 2,4,6- trimethylbenzene acyl group diphenyl phosphine oxides.
IRGACURE184 is 1- hydroxy-cyclohexyl-phenyl -one.
According to the above embodiments and comparative example as a result, the light of the Examples 1 to 9 through cooperating phosphorus compound of the invention
Hardenability artificial nail composition, after being coated on scleronychia, the adhesiveness by nail known to cross cut method is good, not
Peeling-off situation.In addition, even if the photo-hardening people hardened also does not occur after being coated on scleronychia 14 days
The case where work nail composition tilts from nail or generates notch.
From this result, photo-hardening artificial nail composition of the invention will not it is peeling-off in nail surface but
Bonding, and after coating hardening 14 days, still bonded well without change.
In contrast, according to the photo-hardening artificial nail composition of the comparative example of unmated phosphorus compound of the invention,
By by be just coated with the cross cut method after hardening confirm nail adhesiveness experiment it is found that peeling-off situation is more, this
Outside, especially in comparative example 3, although being coated with known to the test of cross cut method relative to nail surface good bonding
Hardening 3 days after but occur from nail surface remove, and can not prolonged adhesion in nail surface.
By such result it is found that in photo-hardening artificial nail composition, closed by the phosphatization in the cooperation present invention
Object forms the effective envelope of photo-hardening artificial nail composition during can growing, certainly in nail surface.
In addition, according to the present invention, due to not using organic solvent, and will not make to harden because of oxygen interrupted.Therefore
Compared with free-radical polymerised photo-hardening artificial nail composition, unhardened component residue is not had, and it can be made hard
Change.
In turn, due to not needing to polish to the nail surface of user itself to make to form bumps
The nail of user itself becomes broken.
In addition, after coating, can prevent as stink caused by remaining organic solvent or unhardened ingredient etc. production
It is raw, and organic solvent or unhardened ingredient will not be impregnated into vivo from nail, thus will not irritating skin the case where.
Claims (5)
1. a kind of photo-hardening artificial nail composition, which is characterized in that contain in the photo-hardening artificial nail composition
1~22 weight % of one or more of compound represented by having by following Aization 1~change 3, in the photo-hardening artificial nails
Contain 1~20 weight % of B radical polymerization initiator in composition and contains C in the photo-hardening artificial nail composition
Polyfunctional 1~80 weight % of compound containing free-radical polymerised unsaturated group,
2. photo-hardening artificial nail composition according to claim 1, which is characterized in that C is polyfunctional to contain freedom
The compound of base polymerism unsaturated group is polyfunctional urethane acrylate compound.
3. photo-hardening artificial nail composition according to claim 2, which is characterized in that polyfunctional polyurethane propylene
Ester compound is urethane acrylate oligomer.
4. photo-hardening artificial nail composition according to claim 1, which is characterized in that C is polyfunctional to contain freedom
The compound of base polymerism unsaturated group is the diacrylate compound of di-epoxy compounds.
5. photo-hardening artificial nail composition according to claim 4, which is characterized in that the dipropyl of di-epoxy compounds
Olefin(e) acid carboxylate is compound represented by followingization 4,
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014-091414 | 2014-04-25 | ||
| JP2014091414A JP6340243B2 (en) | 2014-04-25 | 2014-04-25 | Photocurable artificial nail composition |
| PCT/JP2015/062206 WO2015163353A1 (en) | 2014-04-25 | 2015-04-22 | Photocurable artificial nail composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106170279A CN106170279A (en) | 2016-11-30 |
| CN106170279B true CN106170279B (en) | 2019-11-12 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201580018459.7A Active CN106170279B (en) | 2014-04-25 | 2015-04-22 | Photo-hardening artificial nail composition |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6340243B2 (en) |
| KR (1) | KR20160146690A (en) |
| CN (1) | CN106170279B (en) |
| TW (1) | TW201540763A (en) |
| WO (1) | WO2015163353A1 (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016194730A1 (en) * | 2015-05-29 | 2016-12-08 | 富士フイルム株式会社 | Nail cosmetic and nail art kit |
| JP6673660B2 (en) * | 2015-09-28 | 2020-03-25 | 株式会社サクラクレパス | Beauty nail polish composition |
| WO2017082058A1 (en) * | 2015-11-09 | 2017-05-18 | 株式会社スリーボンド | Photocurable composition to be used on fingernails or artificial nails, and method for coating by using same |
| JP6923782B2 (en) * | 2015-12-02 | 2021-08-25 | 株式会社スリーボンド | Photocurable composition for nail or artificial nail coating |
| JP2017124098A (en) * | 2016-01-15 | 2017-07-20 | 株式会社サクラクレパス | Photocurable artificial nail composition |
| JP6763564B2 (en) * | 2016-05-27 | 2020-09-30 | 株式会社サクラクレパス | Photocurable artificial nail composition for self-nail application containing hydrophobic urethane (meth) acrylate oligomer |
| JP6788260B2 (en) * | 2016-07-27 | 2020-11-25 | ケーエスエム株式会社 | Beautiful nails |
| JP6916512B2 (en) * | 2017-02-27 | 2021-08-11 | ピアス株式会社 | Artificial nail compositions, artificial nails, and artificial nail kits |
| US11096883B2 (en) | 2018-07-31 | 2021-08-24 | Ricoh Company, Ltd. | Composition, artificial nail composition, nail decoration material, artificial nail, stored container, image forming apparatus, and image forming method |
| US11529302B2 (en) | 2018-07-31 | 2022-12-20 | Ricoh Company, Ltd. | Composition, artificial nail composition, nail decoration material, artificial nail, stored container, image forming apparatus, and image forming method |
| JP2020023468A (en) * | 2018-07-31 | 2020-02-13 | 株式会社リコー | Composition, artificial nail composition, nail decorating material, artificial nail, container, image formation device, and image formation method |
| JP2020055772A (en) * | 2018-10-01 | 2020-04-09 | 株式会社サクラクレパス | Curable gel nail composition, gel nail base layer, gel nail, and gel nail composition set |
| JP7321423B2 (en) | 2019-03-19 | 2023-08-07 | 株式会社リコー | Composition, Ink, Artificial Nail Composition, Nail Decorating Material, Artificial Nail, Container, Image Forming Apparatus, and Image Forming Method |
| KR20230124887A (en) * | 2020-12-23 | 2023-08-28 | 덴카 주식회사 | UV curable resin composition |
| CN116348295A (en) * | 2020-12-23 | 2023-06-27 | 电化株式会社 | Ultraviolet curable resin composition |
| KR102384577B1 (en) * | 2021-09-23 | 2022-04-08 | 이미숙 | Composition for Correcting Ingrown Nail |
| WO2024095925A1 (en) * | 2022-11-04 | 2024-05-10 | 株式会社スリーボンド | Photocurable composition for nails or artificial nails |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN106170279A (en) | 2016-11-30 |
| TW201540763A (en) | 2015-11-01 |
| JP6340243B2 (en) | 2018-06-06 |
| KR20160146690A (en) | 2016-12-21 |
| WO2015163353A1 (en) | 2015-10-29 |
| JP2015209390A (en) | 2015-11-24 |
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