CN106125515A - 直写式光刻机扫描采用不等距触发进行图形校正的方法 - Google Patents
直写式光刻机扫描采用不等距触发进行图形校正的方法 Download PDFInfo
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- CN106125515A CN106125515A CN201610679761.3A CN201610679761A CN106125515A CN 106125515 A CN106125515 A CN 106125515A CN 201610679761 A CN201610679761 A CN 201610679761A CN 106125515 A CN106125515 A CN 106125515A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610679761.3A CN106125515B (zh) | 2016-08-17 | 2016-08-17 | 直写式光刻机扫描采用不等距触发进行图形校正的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610679761.3A CN106125515B (zh) | 2016-08-17 | 2016-08-17 | 直写式光刻机扫描采用不等距触发进行图形校正的方法 |
Publications (2)
Publication Number | Publication Date |
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CN106125515A true CN106125515A (zh) | 2016-11-16 |
CN106125515B CN106125515B (zh) | 2017-12-12 |
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CN201610679761.3A Active CN106125515B (zh) | 2016-08-17 | 2016-08-17 | 直写式光刻机扫描采用不等距触发进行图形校正的方法 |
Country Status (1)
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CN (1) | CN106125515B (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050030500A1 (en) * | 2003-05-08 | 2005-02-10 | Pentax Corporation | Apparatus for forming pattern |
CN101135862A (zh) * | 2006-09-01 | 2008-03-05 | 富士胶片株式会社 | 绘制装置和绘制方法 |
US20110134406A1 (en) * | 2009-12-08 | 2011-06-09 | Samsung Electronics Co., Ltd. | Maskless exposure apparatus and control method thereof |
CN106647180A (zh) * | 2016-11-28 | 2017-05-10 | 湖北凯昌光电科技有限公司 | 直写曝光机中基于标定板的误差校正和补偿方法及其装置 |
-
2016
- 2016-08-17 CN CN201610679761.3A patent/CN106125515B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050030500A1 (en) * | 2003-05-08 | 2005-02-10 | Pentax Corporation | Apparatus for forming pattern |
CN101135862A (zh) * | 2006-09-01 | 2008-03-05 | 富士胶片株式会社 | 绘制装置和绘制方法 |
US20110134406A1 (en) * | 2009-12-08 | 2011-06-09 | Samsung Electronics Co., Ltd. | Maskless exposure apparatus and control method thereof |
CN106647180A (zh) * | 2016-11-28 | 2017-05-10 | 湖北凯昌光电科技有限公司 | 直写曝光机中基于标定板的误差校正和补偿方法及其装置 |
Non-Patent Citations (1)
Title |
---|
杜惊雷等: "激光直写邻近效应的校正", 《光学学报》 * |
Also Published As
Publication number | Publication date |
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CN106125515B (zh) | 2017-12-12 |
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Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
CB03 | Change of inventor or designer information |
Inventor after: Li Xianjie Inventor before: Chen Haiwei |
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COR | Change of bibliographic data | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20170106 Address after: 221300 Huashan Road, Pizhou Economic Development Zone, Jiangsu, China, Xuzhou Applicant after: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY CO., LTD. Address before: 214028 Jiangsu New District of Wuxi City Linghu Road No. 200 China Sensor Network International Innovation Park building F3 Applicant before: Wuxi speed semiconductor technology Co., Ltd. |
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GR01 | Patent grant | ||
CP03 | Change of name, title or address |
Address after: 221000 west side of Hengshan Road, Pizhou City, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Yingsu integrated circuit equipment Co., Ltd Address before: 221300 Huashan Road, Pizhou Economic Development Zone, Jiangsu, China, Xuzhou Patentee before: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |
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CP03 | Change of name, title or address |