CN106115612B - 一种晶圆平坦化方法 - Google Patents
一种晶圆平坦化方法 Download PDFInfo
- Publication number
- CN106115612B CN106115612B CN201610540682.4A CN201610540682A CN106115612B CN 106115612 B CN106115612 B CN 106115612B CN 201610540682 A CN201610540682 A CN 201610540682A CN 106115612 B CN106115612 B CN 106115612B
- Authority
- CN
- China
- Prior art keywords
- wafer
- crystal column
- polishing
- column surface
- abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 42
- 238000005498 polishing Methods 0.000 claims abstract description 77
- 239000013078 crystal Substances 0.000 claims abstract description 40
- 239000012530 fluid Substances 0.000 claims abstract description 24
- 239000003082 abrasive agent Substances 0.000 claims abstract description 16
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 5
- 239000008367 deionised water Substances 0.000 claims abstract description 4
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000006061 abrasive grain Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 230000007797 corrosion Effects 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 claims description 6
- 238000002161 passivation Methods 0.000 claims description 5
- 238000010301 surface-oxidation reaction Methods 0.000 claims description 5
- 230000006835 compression Effects 0.000 claims description 3
- 238000007906 compression Methods 0.000 claims description 3
- 230000007547 defect Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 8
- 239000000463 material Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00206—Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00642—Manufacture or treatment of devices or systems in or on a substrate for improving the physical properties of a device
- B81C1/0065—Mechanical properties
- B81C1/00674—Treatments for improving wear resistance
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610540682.4A CN106115612B (zh) | 2016-07-11 | 2016-07-11 | 一种晶圆平坦化方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610540682.4A CN106115612B (zh) | 2016-07-11 | 2016-07-11 | 一种晶圆平坦化方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106115612A CN106115612A (zh) | 2016-11-16 |
CN106115612B true CN106115612B (zh) | 2017-11-17 |
Family
ID=57282839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610540682.4A Active CN106115612B (zh) | 2016-07-11 | 2016-07-11 | 一种晶圆平坦化方法 |
Country Status (1)
Country | Link |
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CN (1) | CN106115612B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108214260B (zh) * | 2016-12-22 | 2020-03-17 | 蓝思科技(长沙)有限公司 | 一种超薄蓝宝石晶片的抛光工艺 |
CN106878912A (zh) * | 2017-03-03 | 2017-06-20 | 瑞声科技(新加坡)有限公司 | 电容式麦克风半成品的氧化层粗糙面平坦化的方法 |
CN107052984A (zh) * | 2017-06-14 | 2017-08-18 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 化学机械平坦化工艺中晶圆边缘区域平整度优化方法 |
CN107378747B (zh) * | 2017-07-11 | 2019-04-02 | 天津华海清科机电科技有限公司 | 用于mems器件的化学机械抛光工艺 |
US10636673B2 (en) * | 2017-09-28 | 2020-04-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming semiconductor device structure |
CN108747606A (zh) * | 2018-06-16 | 2018-11-06 | 佛山市同鑫智能装备科技有限公司 | 一种不锈钢管加工工艺抛光方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW586157B (en) * | 2000-04-13 | 2004-05-01 | Showa Denko Kk | Slurry composition for polishing semiconductor device, and method for manufacturing semiconductor device using the same |
JP3916375B2 (ja) * | 2000-06-02 | 2007-05-16 | 株式会社荏原製作所 | ポリッシング方法および装置 |
CN100400234C (zh) * | 2006-04-19 | 2008-07-09 | 山东大学 | 大直径高硬度6H-SiC单晶片的表面抛光方法 |
CN101428404A (zh) * | 2008-12-22 | 2009-05-13 | 南京航空航天大学 | 固结磨料研磨抛光垫及其制备方法 |
CN101817172B (zh) * | 2010-04-12 | 2012-01-25 | 南京航空航天大学 | 基于热引发固化的固结磨料研磨抛光垫及其制备方法 |
CN102172859B (zh) * | 2011-02-23 | 2012-10-31 | 南京航空航天大学 | 基于固结磨料的超薄平面玻璃的加工方法 |
CN103252708B (zh) * | 2013-05-29 | 2016-01-06 | 南京航空航天大学 | 基于固结磨料抛光垫的蓝宝石衬底的超精密加工方法 |
CN104157551B (zh) * | 2014-07-31 | 2017-01-25 | 华进半导体封装先导技术研发中心有限公司 | 键合前进行基板表面预处理的方法 |
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2016
- 2016-07-11 CN CN201610540682.4A patent/CN106115612B/zh active Active
Also Published As
Publication number | Publication date |
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CN106115612A (zh) | 2016-11-16 |
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TR01 | Transfer of patent right |
Effective date of registration: 20200813 Address after: 101, 2 / F, building 2, No. 1, third Taihe street, Beijing Economic and Technological Development Zone, Daxing District, Beijing 100176 Patentee after: Beijing ShuoKe precision electronic equipment Co.,Ltd. Address before: 100176, No. 1, Tai Street, Beijing economic and Technological Development Zone, Daxing District, Beijing Patentee before: THE 45TH Research Institute OF CETC |
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TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 100176 101, floor 2, building 2, No. 1, Taihe Third Street, economic and Technological Development Zone, Daxing District, Beijing Patentee after: Beijing Jingyi Precision Technology Co.,Ltd. Address before: 100176 Room 101, floor 2, building 2, No. 1, Taihe 3rd Street, Beijing Economic and Technological Development Zone, Daxing District, Beijing Patentee before: Beijing ShuoKe precision electronic equipment Co.,Ltd. |
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CP03 | Change of name, title or address |