CN106082699B - 一种蓝灰低辐射low-e玻璃 - Google Patents

一种蓝灰低辐射low-e玻璃 Download PDF

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CN106082699B
CN106082699B CN201610455064.XA CN201610455064A CN106082699B CN 106082699 B CN106082699 B CN 106082699B CN 201610455064 A CN201610455064 A CN 201610455064A CN 106082699 B CN106082699 B CN 106082699B
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曹耀明
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Dongguan Yinjian Glass Engineering Co Ltd
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    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
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Abstract

本发明公开了一种蓝灰低辐射low‑e玻璃,包括玻璃基片,在玻璃基片的复合面上由内到外依次相邻地复合有十四个膜层,第一层为ZnAlOx层,第二层为TiOx层,第三层为NbNx层,第四层为AZO层,第五层为Ag层,第六层为SSTZrOx层,第七层为SiAlNx层,第八层为SiO2层,第九层为AZO层,第十层为Co‑Ni‑Cr‑Al‑Y层,第十一层为ZnSnO2层,第十二层为ZrNbOx层,第十三层为SiO2层,第十四层为C层。本发明的有益效果是:1、本发明采用新型膜系结构,可见光透过率高;2、色泽均匀鲜艳,更明显呈现蓝灰色;3、双层SiO2层起到增透和保护的作用,膜层平整,辐射率低。

Description

一种蓝灰低辐射low-e玻璃
技术领域
本发明涉及low-e玻璃领域,具体是涉及一种蓝灰低辐射low-e玻璃。
背景技术
据统计,我国建筑物能耗已经占到全国年能源消耗总量的27.8%,经由门窗流失的热量更是占到了建筑物总能耗的一半以上。近年来社会各界对可持续发展以及节能减排工作的愈发关注,建筑业对门窗玻璃的性能要求也大幅提高。LOW-E玻璃因为有着优异的热性能和良好的光学性能,在社会生活中的运用越来越广泛,品种也越来越多。
而在LOW-E玻璃发展近30年的历程中,从最初的单银LOW-E玻璃,发展成为双银LOW-E玻璃,近些年又开发出了三银LOW-E玻璃产品,三银LOW-E玻璃具有较高的可见光透射比,可保证室内足够的自然采光,有更低的太阳红外线透射比和更低的传热系数,是目前世界建筑领域公认的最节能、最符合人性需求的建筑玻璃。
在热学方面,三银LOW-E玻璃保持了较低的U值,夜晚通过限制对流传导传热阻止室内的远红外辐射泄出室外,且具有较高的遮阳系数和G值,使三银玻璃的节能效果大幅度提升,同比普通玻璃的节能水平提高80%。这一方面是现代建筑对能耗节约的需求驱动,更是人们节能、环保、低碳生活意识的提高所致。
在现有技术中,合理的膜层结构设计对Low-E玻璃的透过率、可加工性影响至关重要,膜层厚度和厚度均匀性是决定镀膜玻璃颜色及其均匀性的关键因素,这些也都是目前Low-E玻璃设计和生产的瓶颈和难点。
发明内容
本发明的目的在于提供一种蓝灰低辐射low-e玻璃。
本发明采用的技术方案为:一种蓝灰低辐射low-e玻璃,包括玻璃基片,在玻璃基片的复合面上由内到外依次相邻地复合有十四个膜层,第一层为ZnAlOx层,第二层为TiOx层,第三层为NbNx层,第四层为AZO层,第五层为Ag层,第六层为SSTZrOx层,第七层为SiAlNx层,第八层为SiO2层,第九层为AZO层,第十层为Co-Ni-Cr-Al-Y层,第十一层为ZnSnO2层,第十二层为ZrNbOx层,第十三层为SiO2层,第十四层为C层。
作为优选方案,所述第一层ZnAlOx层、第六层SSTZrOx层的厚度为20-30nm。
作为优选方案,所述第二层TiOx层、第四层AZO层、第九层AZO层的厚度为20-20nm。
作为优选方案,所述第三层NbNx层、第五层Ag层、第十层Co-Ni-Cr-Al-Y层的厚度为10-30nm。
作为优选方案,所述第七层SiAlNx层、第十一层ZnSnO2层,第十二层ZrNbOx层的厚度为20-35nm。
作为优选方案,所述第八层SiO2层的厚度为20-30nm。
作为优选方案,所述第十三层SiO2层的厚度为30-40nm。
作为优选方案,所述第十四层C层的厚度为50-80nm。
本发明的有益效果是:
1、本发明采用新型膜系结构,可见光透过率高。
2、色泽均匀鲜艳,更明显呈现蓝灰色。
3、双层SiO2层起到增透和保护的作用,膜层平整,辐射率低。
附图说明
图1是本发明的结构示意图。
图中:
玻璃基片-1第一层ZnAlOx层-21,第二层TiOx层-22,第三层NbNx层-23,第四层AZO层-24,第五层为Ag层-25,第六层SSTZrOx层-26,第七层SiAlNx层-27,第八层SiO2层-28,第九层AZO层-29,第十层Co-Ni-Cr-Al-Y层-210,第十一层ZnSnO2层-211,第十二层ZrNbOx层-212,第十三层SiO2层-213,第十四层C层-214。
具体实施方式
下面结合附图与实施例对本发明的技术方案进行说明。
参照图1所示,一种蓝灰低辐射low-e玻璃,包括玻璃基片,在玻璃基片1的复合面上由内到外依次相邻地复合有十四个膜层,第一层为ZnAlOx层21,第二层为TiOx层22,第三层为NbNx层23,第四层为AZO层24,第五层为Ag层25,第六层为SSTZrOx层26,第七层为SiAlNx层27,第八层为SiO2层28,第九层为AZO层29,第十层为Co-Ni-Cr-Al-Y层210,第十一层为ZnSnO2层211,第十二层为ZrNbOx层212,第十三层为SiO2层213,第十四层为C层214。
第一层ZnAlOx层21减少膜层的光衰减,使得膜系产品有较高的透光率,其厚度为20-30nm,优选25nm。
第二层TiOx层22即钛的氧化物,采用高折射率n=2.5的TiOx是为了提高玻璃的透光率,降低银层的面电阻,减少银的消耗,可以减少Low-e热处理后产生光散射,其厚度为10-20nm,优选15nm。
第三层NbNx层23即氮化铌层,为灰色提供层,其厚度为10-30nm,优选20nm。
第四层AZO层24,即铝掺杂的氧化锌层,平整层,为AG层作铺垫,降低辐射率,其厚度为10-20nm,优选为15nm。
第五层Ag层25,即金属银层,为功能层,金属银层提供了较低的辐射率,起环保的作用,其厚度为10-30nm,优选20nm。
第六层SSTZrOx层26,即掺锆氧化不锈钢层,在反应溅射时提高膜层的折射率,从而提升膜系的通过率,色泽鲜艳,透光率高达80%以上。SSTZrOx层的厚度为20-30nm,优选25nm。
第七层SiAlNx层27,为复合电介质层,起到玻璃与膜层的粘结过渡作用,其厚度为20-35nm,优选28nm。
第八层SiO2层28,保护层,降低辐射的功能,其厚度为20-30nm,优选25nm。
第九层为AZO层29,即铝掺杂的氧化锌层,平整层,为AG层作铺垫,降低辐射率,其厚度为10-20nm,优选为15nm。
第十层Co-Ni-Cr-Al-Y层210,使得膜层具有低辐射节能环保性能,为蓝色提供层,其厚度为10-30nm,优选15nm。
第十一层ZnSnO2层211,即氧化锌锡层,为中间介质层,保护层,增加玻璃的透光率,其厚度为20-35nm,优选27nm。
第十二层ZrNbOx层212,电介质层,起到保护膜层的作用,提高膜层的加工性能,其厚度为10-35nm,优选23nm。
第十三层SiO2层213,降低辐射的功能,其厚度为30-40nm,优选35nm。
第十四层C层214,即石墨层,C是一种具有耐高温、抗热震性且有润滑性的材料,作为保护层,防止在转运过程中被擦伤,其厚度为50-80nm,优选65nm。
本发明的制备方法包括如下步骤:
(1)磁控溅射ZnAlOx层21,用交流中频电源,功率为18KW-25KW,纯氮气、纯氧气或者氮气和氧气混合气体溅射的合金圆靶。
(2)磁控溅射第二层TiOx层22,用中频交流电源溅射陶瓷钛靶,用氩气作为溅射气体,掺入少量O2,氩氧比为400SCCM-420SCCM:20SCCM-40SCCM。
(3)磁控溅射第三层NbNx层23。
(4)磁控溅射第四层AZO层24,直流电源溅射,用氩气作为工艺气体,气体流量500SCCM-550SCCM。
(5)磁控溅射第五层Ag层25,直流电源溅射,用氩气作为工艺气体,气体流量500SCCM-550SCCM。
(6)磁控溅射第六层SSTZrOx层26,用交流中频电源,氧气作反应气体溅射掺锆的不锈钢靶Fe:Zr=80:20,氩氧比为400SCCM-420SCCM:450SCCM-500SCCM,本步骤中氩氧比决定成膜的质量。
(7)磁控溅射第七层SiAlNx层27,用交流中频电源,纯氮气、纯氧气或者氮气和氧气混合气体溅射的合金圆靶。
(8)磁控溅射第八层SiO2层28,用直流电源,氩气作为反应气体溅射硅靶。
(9)磁控溅射第九层AZO层29,直流电源溅射,用氩气作为工艺气体,气体流量500SCCM-550SCCM。
(10)磁控溅射第十层Co-Ni-Cr-Al-Y层210,用交流中频电源,纯氮气或者纯氧气作为反应气体。
(11)磁控溅射第十一层ZnSnO2层211,用中频交流电源,氧气作为反应气体溅射Sn靶,氩氧比为400SCCM-420SCCM:450SCCM-500SCCM,本步骤中氩氧比决定成膜的质量。
(12)磁控溅射第十二层ZrNbOx层212,用中频交流电源,纯氧气、纯氮气或者氮气和氧气混合气体作为反应气体溅射合金圆靶。
(13)磁控溅射第十三层SiO2层213,用直流电源,氩气作为反应气体溅射硅靶。
(14)磁控溅射第十四层C层214,用直流电源,氩气作为反应气体溅射掺铝石墨靶,铝石墨质量百分比90:10。
上述实施例仅是显示和描述了本发明的基本原理、主要特征和优点。本行业的技术人员应该了解,本发明不受上述实施例的限制,上述实施例和说明书中描述的只是说明本发明的原理,在不脱离本发明精神和范围的前提下,本发明还会有各种变化和改进,这些变化和改进都落入要求保护的本发明范围内。

Claims (8)

1.一种蓝灰低辐射low-e玻璃,包括玻璃基片,其特征在于:在玻璃基片(1)的复合面上由内到外依次相邻地复合有十四个膜层,第一层为ZnAlOx层(21),第二层为TiOx层(22),第三层为NbNx层(23),第四层为AZO层(24),第五层为Ag层(25),第六层为SSTZrOx层(26),第七层为SiAlNx层(27),第八层为SiO2层(28),第九层为AZO层(29),第十层为Co-Ni-Cr-Al-Y层(210),第十一层为ZnSnO2层(211),第十二层为ZrNbOx层(212),第十三层为SiO2层(213),第十四层为C层(214)。
2.根据权利要求1所述的一种蓝灰低辐射low-e玻璃,其特征在于:所述第一层ZnAlOx层(21)、第六层SSTZrOx层(26)的厚度为20-30nm。
3.根据权利要求1所述的一种蓝灰低辐射low-e玻璃,其特征在于:所述第二层TiOx层(22)、第四层AZO层(24)、第九层AZO层(29)的厚度为20-20nm。
4.根据权利要求1所述的一种蓝灰低辐射low-e玻璃,其特征在于:所述第三层NbNx层(23)、第五层Ag层(25)、第十层Co-Ni-Cr-Al-Y层(210)的厚度为10-30nm。
5.根据权利要求1所述的一种蓝灰低辐射low-e玻璃,其特征在于:所述第七层SiAlNx层(27)、第十一层ZnSnO2层(211),第十二层ZrNbOx层(212)的厚度为20-35nm。
6.根据权利要求1所述的一种蓝灰低辐射low-e玻璃,其特征在于:所述第八层SiO2层(28)的厚度为20-30nm。
7.根据权利要求1所述的一种蓝灰低辐射low-e玻璃,其特征在于:所述第十三层SiO2层(213)的厚度为30-40nm。
8.根据权利要求1所述的一种蓝灰低辐射low-e玻璃,其特征在于:所述第十四层C层(214)的厚度为50-80nm。
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