CN106082699B - 一种蓝灰低辐射low-e玻璃 - Google Patents
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Abstract
本发明公开了一种蓝灰低辐射low‑e玻璃，包括玻璃基片，在玻璃基片的复合面上由内到外依次相邻地复合有十四个膜层，第一层为ZnAlOx层，第二层为TiOx层，第三层为NbNx层，第四层为AZO层，第五层为Ag层，第六层为SSTZrOx层，第七层为SiAlNx层，第八层为SiO2层，第九层为AZO层，第十层为Co‑Ni‑Cr‑Al‑Y层，第十一层为ZnSnO2层,第十二层为ZrNbOx层，第十三层为SiO2层，第十四层为C层。本发明的有益效果是：1、本发明采用新型膜系结构，可见光透过率高；2、色泽均匀鲜艳，更明显呈现蓝灰色；3、双层SiO2层起到增透和保护的作用，膜层平整，辐射率低。
Description
技术领域
本发明涉及low-e玻璃领域，具体是涉及一种蓝灰低辐射low-e玻璃。
背景技术
据统计，我国建筑物能耗已经占到全国年能源消耗总量的27.8％，经由门窗流失的热量更是占到了建筑物总能耗的一半以上。近年来社会各界对可持续发展以及节能减排工作的愈发关注，建筑业对门窗玻璃的性能要求也大幅提高。LOW-E玻璃因为有着优异的热性能和良好的光学性能，在社会生活中的运用越来越广泛，品种也越来越多。
而在LOW-E玻璃发展近30年的历程中，从最初的单银LOW-E玻璃，发展成为双银LOW-E玻璃，近些年又开发出了三银LOW-E玻璃产品，三银LOW-E玻璃具有较高的可见光透射比，可保证室内足够的自然采光，有更低的太阳红外线透射比和更低的传热系数，是目前世界建筑领域公认的最节能、最符合人性需求的建筑玻璃。
在热学方面，三银LOW-E玻璃保持了较低的U值，夜晚通过限制对流传导传热阻止室内的远红外辐射泄出室外，且具有较高的遮阳系数和G值，使三银玻璃的节能效果大幅度提升，同比普通玻璃的节能水平提高80％。这一方面是现代建筑对能耗节约的需求驱动，更是人们节能、环保、低碳生活意识的提高所致。
在现有技术中，合理的膜层结构设计对Low-E玻璃的透过率、可加工性影响至关重要，膜层厚度和厚度均匀性是决定镀膜玻璃颜色及其均匀性的关键因素，这些也都是目前Low-E玻璃设计和生产的瓶颈和难点。
发明内容
本发明的目的在于提供一种蓝灰低辐射low-e玻璃。
本发明采用的技术方案为：一种蓝灰低辐射low-e玻璃，包括玻璃基片，在玻璃基片的复合面上由内到外依次相邻地复合有十四个膜层，第一层为ZnAlOx层，第二层为TiOx层，第三层为NbNx层，第四层为AZO层，第五层为Ag层，第六层为SSTZrOx层，第七层为SiAlNx层，第八层为SiO2层，第九层为AZO层，第十层为Co-Ni-Cr-Al-Y层，第十一层为ZnSnO2层,第十二层为ZrNbOx层，第十三层为SiO2层，第十四层为C层。
作为优选方案，所述第一层ZnAlOx层、第六层SSTZrOx层的厚度为20-30nm。
作为优选方案，所述第二层TiOx层、第四层AZO层、第九层AZO层的厚度为20-20nm。
作为优选方案，所述第三层NbNx层、第五层Ag层、第十层Co-Ni-Cr-Al-Y层的厚度为10-30nm。
作为优选方案，所述第七层SiAlNx层、第十一层ZnSnO2层,第十二层ZrNbOx层的厚度为20-35nm。
作为优选方案，所述第八层SiO2层的厚度为20-30nm。
作为优选方案，所述第十三层SiO2层的厚度为30-40nm。
作为优选方案，所述第十四层C层的厚度为50-80nm。
本发明的有益效果是：
1、本发明采用新型膜系结构，可见光透过率高。
2、色泽均匀鲜艳，更明显呈现蓝灰色。
3、双层SiO2层起到增透和保护的作用，膜层平整，辐射率低。
附图说明
图1是本发明的结构示意图。
图中：
玻璃基片-1第一层ZnAlOx层-21，第二层TiOx层-22，第三层NbNx层-23，第四层AZO层-24，第五层为Ag层-25，第六层SSTZrOx层-26，第七层SiAlNx层-27，第八层SiO2层-28，第九层AZO层-29，第十层Co-Ni-Cr-Al-Y层-210，第十一层ZnSnO2层-211，第十二层ZrNbOx层-212，第十三层SiO2层-213，第十四层C层-214。
具体实施方式
下面结合附图与实施例对本发明的技术方案进行说明。
参照图1所示，一种蓝灰低辐射low-e玻璃，包括玻璃基片，在玻璃基片1的复合面上由内到外依次相邻地复合有十四个膜层，第一层为ZnAlOx层21，第二层为TiOx层22，第三层为NbNx层23，第四层为AZO层24，第五层为Ag层25，第六层为SSTZrOx层26，第七层为SiAlNx层27，第八层为SiO2层28，第九层为AZO层29，第十层为Co-Ni-Cr-Al-Y层210，第十一层为ZnSnO2层211,第十二层为ZrNbOx层212，第十三层为SiO2层213，第十四层为C层214。
第一层ZnAlOx层21减少膜层的光衰减，使得膜系产品有较高的透光率，其厚度为20-30nm，优选25nm。
第二层TiOx层22即钛的氧化物，采用高折射率n＝2.5的TiOx是为了提高玻璃的透光率，降低银层的面电阻，减少银的消耗，可以减少Low-e热处理后产生光散射，其厚度为10-20nm，优选15nm。
第三层NbNx层23即氮化铌层，为灰色提供层，其厚度为10-30nm，优选20nm。
第四层AZO层24，即铝掺杂的氧化锌层，平整层，为AG层作铺垫，降低辐射率，其厚度为10-20nm，优选为15nm。
第五层Ag层25，即金属银层，为功能层，金属银层提供了较低的辐射率，起环保的作用，其厚度为10-30nm，优选20nm。
第六层SSTZrOx层26，即掺锆氧化不锈钢层，在反应溅射时提高膜层的折射率，从而提升膜系的通过率，色泽鲜艳，透光率高达80％以上。SSTZrOx层的厚度为20-30nm，优选25nm。
第七层SiAlNx层27，为复合电介质层，起到玻璃与膜层的粘结过渡作用，其厚度为20-35nm，优选28nm。
第八层SiO2层28，保护层，降低辐射的功能，其厚度为20-30nm，优选25nm。
第九层为AZO层29，即铝掺杂的氧化锌层，平整层，为AG层作铺垫，降低辐射率，其厚度为10-20nm，优选为15nm。
第十层Co-Ni-Cr-Al-Y层210，使得膜层具有低辐射节能环保性能，为蓝色提供层，其厚度为10-30nm，优选15nm。
第十一层ZnSnO2层211,即氧化锌锡层，为中间介质层，保护层，增加玻璃的透光率，其厚度为20-35nm，优选27nm。
第十二层ZrNbOx层212，电介质层，起到保护膜层的作用，提高膜层的加工性能，其厚度为10-35nm，优选23nm。
第十三层SiO2层213，降低辐射的功能，其厚度为30-40nm，优选35nm。
第十四层C层214，即石墨层，C是一种具有耐高温、抗热震性且有润滑性的材料，作为保护层，防止在转运过程中被擦伤，其厚度为50-80nm，优选65nm。
本发明的制备方法包括如下步骤：
(1)磁控溅射ZnAlOx层21，用交流中频电源，功率为18KW-25KW,纯氮气、纯氧气或者氮气和氧气混合气体溅射的合金圆靶。
(2)磁控溅射第二层TiOx层22，用中频交流电源溅射陶瓷钛靶，用氩气作为溅射气体，掺入少量O2，氩氧比为400SCCM-420SCCM:20SCCM-40SCCM。
(3)磁控溅射第三层NbNx层23。
(4)磁控溅射第四层AZO层24，直流电源溅射，用氩气作为工艺气体，气体流量500SCCM-550SCCM。
(5)磁控溅射第五层Ag层25，直流电源溅射，用氩气作为工艺气体，气体流量500SCCM-550SCCM。
(6)磁控溅射第六层SSTZrOx层26，用交流中频电源，氧气作反应气体溅射掺锆的不锈钢靶Fe:Zr＝80:20，氩氧比为400SCCM-420SCCM:450SCCM-500SCCM,本步骤中氩氧比决定成膜的质量。
(7)磁控溅射第七层SiAlNx层27，用交流中频电源，纯氮气、纯氧气或者氮气和氧气混合气体溅射的合金圆靶。
(8)磁控溅射第八层SiO2层28，用直流电源，氩气作为反应气体溅射硅靶。
(9)磁控溅射第九层AZO层29，直流电源溅射，用氩气作为工艺气体，气体流量500SCCM-550SCCM。
(10)磁控溅射第十层Co-Ni-Cr-Al-Y层210，用交流中频电源，纯氮气或者纯氧气作为反应气体。
(11)磁控溅射第十一层ZnSnO2层211，用中频交流电源，氧气作为反应气体溅射Sn靶，氩氧比为400SCCM-420SCCM:450SCCM-500SCCM,本步骤中氩氧比决定成膜的质量。
(12)磁控溅射第十二层ZrNbOx层212，用中频交流电源，纯氧气、纯氮气或者氮气和氧气混合气体作为反应气体溅射合金圆靶。
(13)磁控溅射第十三层SiO2层213，用直流电源，氩气作为反应气体溅射硅靶。
(14)磁控溅射第十四层C层214，用直流电源，氩气作为反应气体溅射掺铝石墨靶，铝石墨质量百分比90:10。
上述实施例仅是显示和描述了本发明的基本原理、主要特征和优点。本行业的技术人员应该了解，本发明不受上述实施例的限制，上述实施例和说明书中描述的只是说明本发明的原理，在不脱离本发明精神和范围的前提下，本发明还会有各种变化和改进，这些变化和改进都落入要求保护的本发明范围内。
Claims (8)
1.一种蓝灰低辐射low-e玻璃，包括玻璃基片，其特征在于：在玻璃基片(1)的复合面上由内到外依次相邻地复合有十四个膜层，第一层为ZnAlOx层(21)，第二层为TiOx层(22)，第三层为NbNx层(23)，第四层为AZO层(24)，第五层为Ag层(25)，第六层为SSTZrOx层(26)，第七层为SiAlNx层(27)，第八层为SiO2层(28)，第九层为AZO层(29)，第十层为Co-Ni-Cr-Al-Y层(210)，第十一层为ZnSnO2层(211),第十二层为ZrNbOx层(212)，第十三层为SiO2层(213)，第十四层为C层(214)。
2.根据权利要求1所述的一种蓝灰低辐射low-e玻璃，其特征在于：所述第一层ZnAlOx层(21)、第六层SSTZrOx层(26)的厚度为20-30nm。
3.根据权利要求1所述的一种蓝灰低辐射low-e玻璃，其特征在于：所述第二层TiOx层(22)、第四层AZO层(24)、第九层AZO层(29)的厚度为20-20nm。
4.根据权利要求1所述的一种蓝灰低辐射low-e玻璃，其特征在于：所述第三层NbNx层(23)、第五层Ag层(25)、第十层Co-Ni-Cr-Al-Y层(210)的厚度为10-30nm。
5.根据权利要求1所述的一种蓝灰低辐射low-e玻璃，其特征在于：所述第七层SiAlNx层(27)、第十一层ZnSnO2层(211),第十二层ZrNbOx层(212)的厚度为20-35nm。
6.根据权利要求1所述的一种蓝灰低辐射low-e玻璃，其特征在于：所述第八层SiO2层(28)的厚度为20-30nm。
7.根据权利要求1所述的一种蓝灰低辐射low-e玻璃，其特征在于：所述第十三层SiO2层(213)的厚度为30-40nm。
8.根据权利要求1所述的一种蓝灰低辐射low-e玻璃，其特征在于：所述第十四层C层(214)的厚度为50-80nm。
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