CN104369444B - 一种高透光率的金色单银low-e玻璃及制备方法 - Google Patents
一种高透光率的金色单银low-e玻璃及制备方法 Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 43
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 29
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 239000004332 silver Substances 0.000 title claims abstract description 28
- 230000005540 biological transmission Effects 0.000 title claims abstract description 27
- 238000002360 preparation method Methods 0.000 title description 2
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 24
- XOLBLPGZBRYERU-UHFFFAOYSA-N SnO2 Inorganic materials O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 239000002131 composite material Substances 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 39
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 18
- 238000004544 sputter deposition Methods 0.000 claims description 16
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 claims description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 239000000376 reactant Substances 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
- 239000010935 stainless steel Substances 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 8
- 239000010931 gold Substances 0.000 abstract description 8
- 229910052737 gold Inorganic materials 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 230000007812 deficiency Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 88
- 239000002346 layers by function Substances 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- WVWBIKZXCXPPIR-UHFFFAOYSA-M N.[O-2].[OH-].O.[Cr+3] Chemical compound N.[O-2].[OH-].O.[Cr+3] WVWBIKZXCXPPIR-UHFFFAOYSA-M 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- VRVAZSINCAZFLH-UHFFFAOYSA-N oxygen(2-) tin(4+) titanium(4+) Chemical compound [O--].[O--].[Ti+4].[Sn+4] VRVAZSINCAZFLH-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 239000010930 yellow gold Substances 0.000 description 1
- 229910001097 yellow gold Inorganic materials 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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Abstract
本发明公开了一种高透光率的金色单银LOW-E玻璃，包括有玻璃基片，其特征在于：在玻璃基片的复合面上由内到外依次相邻地复合有七个膜层，其中第一膜层即最内层为SSTZrOX层，第二层为AZO层，第三层为Si层，第四层为AZO层，第五层为Ag层，第六层为CrNxOy，最外层为SnO2层。本发明目的是克服了现有技术的不足，提供一种透过率高，色泽鲜艳，辐射率低，节能效果显著，生产成本低的高透光率的金色单银LOW-E玻璃，本发明还提供一种磁控溅射法制备高透光率的金色单银LOW-E玻璃的方法。
Description
【技术领域】
本发明涉及一种高透光率的金色单银LOW-E玻璃，本发明还涉及一种磁控溅射法制备高透光率的金色单银LOW-E玻璃的方法。
【背景技术】
镀膜玻璃具有节能减排及装饰幕墙的双重功效。而金色玻璃作为镀膜玻璃的一个非常规品种，深受人们喜爱。但由于市场上现有的金色镀膜玻璃产品，色调暗淡且生产成本高，且大多数为阳光控制镀膜玻璃。
【发明内容】
本发明目的是克服了现有技术的不足，提供一种透过率高，色泽鲜艳，辐射率低，节能效果显著，生产成本低的高透光率的金色单银LOW-E玻璃，本发明还提供一种磁控溅射法制备高透光率的金色单银LOW-E玻璃的方法。
本发明是通过以下技术方案实现的：
一种高透光率的金色单银LOW-E玻璃，包括有玻璃基片1，其特征在于：在玻璃基片的复合面上由内到外依次相邻地复合有七个膜层，其中第一膜层即最内层为SSTZrOX层21，第二层为AZO层22，第三层为Si层23，第四层为AZO层24，第五层为Ag层25，第六层为CrNxOy26，最外层为SnO2层27。
如上所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第一膜层SSTZrOX层21的厚度为30～40nm。
如上所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第二层AZO层22的厚度为10～15nm，第四层AZO层24的厚度10～20nm。
如上所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第三层Si层23的厚度为3～5nm。
如上所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第五层Ag层25的厚度为10～15nm。
如上所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第六层CrNxOy26的厚度均为3nm。
如上所述的高透光率的金色单银LOW-E玻璃，其特征在于所述最外层SnO2层27的厚度为60nm。
一种制备上述的高透光率的金色单银LOW-E玻璃的方法，其特征在于包括如下步骤：
(1)磁控溅射SSTZrOX层，用交流中频电源、氧气作反应气体溅射掺锆的不锈钢靶Fe：Zr＝80:20，氩氧比为400SCCM～420SCCM：450SCCM～500SCCM；
(2)磁控溅射氧AZO层，用中频交流电源溅射陶瓷Zn靶，用氩气作为溅射气体，掺入少量O2,氩氧比为：400SCCM-420SCCM：20～40SCCM，为Si层作铺垫；
(3)磁控溅射Si层，交流电源溅射，用Ar气作为溅射气体，气体流量500～550SCCM；
(4)磁控溅射AZO层，用中频交流电源溅射陶瓷Zn靶，用氩气作为溅射气体，掺入少量O2,氩氧比为400SCCM-420SCCM：20～40SCCM，为Ag层作铺垫；
(5)磁控溅射Ag层，直流电源溅射，用氩气作工艺气体，气体流量500～550SCCM；
(6)磁控溅射CrNxOy层，用直流电源溅射，用氮气做反应气体，渗少量氧气；
(7)磁控溅射SnO2层，用交流中频电源、氧气作反应气体溅射Sn靶，氩氧比为400SCCM～420SCCM：450SCCM～500SCCM。
与现有技术相比，本发明有如下优点：
1、本发明特殊膜系的金色单银LOW-E玻璃，色泽鲜艳，而且透光率高，达到70％以上；。
2、本发明与采用金作为功能层生产的金色相比较，Si作为功能层的成本不到用金的千分之一，且产品的辐射率仅0.02，节能效果显著。
3、本发明采用硅作为功能层，在保证了金色效果的同时比普通的LOW-E玻璃成本更低。
【附图说明】
图1是本发明结构示意图。
【具体实施方式】
一种高透光率的金色单银LOW-E玻璃，包括有玻璃基片1，在玻璃基片的复合面上由内到外依次相邻地复合有七个膜层，其中第一膜层即最内层为SSTZrOX层21，第二层为AZO层22，第三层为Si层23，第四层为AZO层24，第五层为Ag层25，第六层为CrNxOy26，最外层为SnO2层27。
所述第一膜层即最内层为SSTZrOX层21，即掺锆氧化不锈钢层，通过在不锈钢内掺锆，在反应溅射时提高膜层的折射率，达到2.0左右，从而提升复合膜系的透过率。作调节金色颜色层，可得到较黄的金色效果。SSTZrOX层21的厚度为30～40nm，优选35nm，nm是纳米，1m＝109nm。
所述第二层AZO层22，即铝掺杂的氧化锌层，平整层，平滑Si层，为Si、Ag层作铺垫，降低辐射率。AZO层的厚度为10～15nm。优选12nm。
所述第三层Si层23，即硅层，为功能层，用来作为金色提供层。Si层的厚度为3～5nm，优选4nm。
所述第四层AZO层24，即铝掺杂的氧化锌层，平整层，由于Si溅射后成簇状结构，通过用AZO层平滑Si层，为下层镀Ag起打底作用。为Ag层作铺垫，降低辐射率。AZO层的厚度为10～20nm。优选15nm。
所述第五层Ag层25，即金属银层，为功能层，金属银层提供了较低的辐射率，起环保节能的作用。Ag层的厚度为10～15nm，优选12nm。
所述第六层CrNxOy层26，即氮氧化铬层，提高膜层耐磨性、提高透光率、提高钢化时抗高温氧化性。CrNxOy层26的厚度为3nm。
所述第七层SnO2层27，即二氧化锡层，为中间介质层，保护层。SnO2层27的厚度为60nm。
Low-E玻璃也叫做低辐射镀膜玻璃。
一种制备高透光率的金色单银LOW-E玻璃的方法，包括如下步骤：
(1)磁控溅射SSTZrOX层，用交流中频电源、氧气作反应气体溅射掺锆的不锈钢靶Fe：Zr＝80:20，氩氧比为400SCCM～420SCCM：450SCCM～500SCCM，本步骤中氩氧比决定了成膜的质量；
(2)磁控溅射氧AZO层，用中频交流电源溅射陶瓷Zn靶，即AZO靶，用氩气作为溅射气体，掺入少量O2,氩氧比为：400SCCM-420SCCM：20～40SCCM，为Si层作铺垫；
(3)磁控溅射Si层，交流电源溅射，用Ar气作为溅射气体，气体流量500～550SCCM；
(4)磁控溅射AZO层，用中频交流电源溅射陶瓷ZnAZO靶，用氩气作为溅射气体，掺入少量O2,氩氧比为400SCCM-420SCCM：20～40SCCM，为Ag层作铺垫；
(5)磁控溅射Ag层，直流电源溅射，用氩气作反应气体，气体流量500～550SCCM；
(6)磁控溅射CrNxOy层，用直流电源溅射，用氮气做反应气体，渗少量氧气；
(7)磁控溅射SnO2层，用交流中频电源、氧气作反应气体溅射Sn靶，氩氧比为400SCCM～420SCCM：450SCCM～500SCCM，本步骤中氩氧比决定了成膜的质量。
Claims (8)
1.一种高透光率的金色单银LOW-E玻璃，包括有玻璃基片(1)，其特征在于：在玻璃基片的复合面上由内到外依次相邻地复合有七个膜层，其中第一膜层即最内层为SSTZrOX层(21)，第二层为AZO层(22)，第三层为Si层(23)，第四层为AZO层(24)，第五层为Ag层(25)，第六层为CrNxOy(26)，最外层为SnO2层(27)。
2.根据权利要求1所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第一膜层SSTZrOX层(21)的厚度为30～40nm。
3.根据权利要求1所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第二层AZO层(22)的厚度为10～15nm，第四层AZO层(24)的厚度10～20nm。
4.根据权利要求1所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第三层Si层(23)的厚度为3～5nm。
5.根据权利要求1所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第五层Ag层(25)的厚度为10～15nm。
6.根据权利要求1所述的高透光率的金色单银LOW-E玻璃，其特征在于所述第六层CrNxOy(26)的厚度为3nm。
7.根据权利要求1所述的高透光率的金色单银LOW-E玻璃，其特征在于所述最外层SnO2层(27)的厚度为60nm。
8.一种制备权利要求1～7任意一项所述的高透光率的金色单银LOW-E玻璃的方法，其特征在于包括如下步骤：
(1)磁控溅射SSTZrOX层，用交流中频电源、氧气作反应气体溅射掺锆的不锈钢靶Fe：Zr＝80:20，氩氧比为400SCCM～420SCCM：450SCCM～500SCCM；
(2)磁控溅射氧AZO层，用中频交流电源溅射陶瓷Zn靶，用氩气作为溅射气体，掺入少量O2,氩氧比为：400SCCM-420SCCM：20～40SCCM，为Si层作铺垫；
(3)磁控溅射Si层，交流电源溅射，用Ar气作为溅射气体，气体流量500～550SCCM；
(4)磁控溅射AZO层，用中频交流电源溅射陶瓷Zn靶，用氩气作为溅射气体，掺入少量O2,氩氧比为400SCCM-420SCCM：20～40SCCM，为Ag层作铺垫；
(5)磁控溅射Ag层，直流电源溅射，用氩气作工艺气体，气体流量500～550SCCM；
(6)磁控溅射CrNxOy层，用直流电源溅射，用氮气做反应气体，渗少量氧气；
(7)磁控溅射SnO2层，用交流中频电源、氧气作反应气体溅射Sn靶，氩氧比为400SCCM～420SCCM：450SCCM～500SCCM。
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