CN105940463A - Electrical contact material and manufacturing method thereof - Google Patents
Electrical contact material and manufacturing method thereof Download PDFInfo
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- CN105940463A CN105940463A CN201480074640.5A CN201480074640A CN105940463A CN 105940463 A CN105940463 A CN 105940463A CN 201480074640 A CN201480074640 A CN 201480074640A CN 105940463 A CN105940463 A CN 105940463A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/04—Co-operating contacts of different material
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/021—Composite material
- H01H1/023—Composite material having a noble metal as the basic material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/06—Contacts characterised by the shape or structure of the contact-making surface, e.g. grooved
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H37/00—Thermally-actuated switches
- H01H37/02—Details
- H01H37/32—Thermally-sensitive members
- H01H37/323—Thermally-sensitive members making use of shape memory materials
Abstract
The subject of the invention is to provide a high long-term reliability electrical contact material, and a manufacturing method thereof, which exhibits excellent abrasion resistance at sliding loads of 50gf or above, even high 100gf loads; which can be used in harsh environments, in particular those involving long-term atmospheric exposure; and which can greatly suppress increases in contact resistance of the electrical contact material even in accelerated tests in corrosive environments, such as H[2]S gas or SO[2] gas environments. The invention relates to an electrical contact material, and a manufacturing method thereof, which comprises a first noble metal layer (2) on the surface of a conductive substrate (1) and comprises a second noble metal layer (3) on the surface of the first noble metal layer (2), wherein it holds of the arithmetic average roughness Ra=A[mu]m of the surface of the first noble metal layer that A<1; the hardness Hv of the first noble metal layer is 150 or greater; the thickness of the second noble metal layer exceeds A[mu]m and is less than or equal to 1[mu]m; and it holds of the arithmetic average roughness Ra=B[mu]m of the surface of the second noble metal layer that B<=0.1.
Description
Technical field
The present invention relates to electric contact material and manufacture method thereof.It is coated with by mutually different expensive more particularly, it relates to a kind of
The electric contact material of 2 layer of precious metal that metal or its alloy are constituted and manufacture method thereof.
Background technology
In the past, electric contact parts make use of copper or the copper alloy of excellent electric conductivity, but, contact characteristic in recent years
Improve constantly, use the situation of naked copper or naked copper alloy to reduce, and utilize on copper or copper alloy, carried out various surface
The material processed.Particularly, as a large amount of materials being used as electric contact material, there are and be plated with expensive in electric contact portion
The electric contact material of metal.Wherein, the noble metal such as gold, silver, palladium, platinum, iridium, rhodium, ruthenium is owing to demonstrating stability
Or the electrical conductivity etc. of excellence, thus be used in various electric contact material.
As nearest electric contact material, for being suitable to automobile mounted indoor and outdoor self-cleaning contact or reed switch (reed
Switch), camera seating (camera mount) contact switch etc., as such as common connecing except based on extruding
Also with the electric contact material repeatedly slided beyond touch, make use of the electric contact material that abrasion performance is good.About resistance to
The raising of abrasivity, in general material, generally uses hard silver or the electric contact material of hard gold.And then also
In research and development dispersion fine-grained plating or covering material etc., in order to improve the sliding properties etc. of electric contact material, just
The electric contact material that various surfaces process at development and implementation.
Such as the present inventor provides a kind of electric contact material in patent documentation 1, and this electric contact material is at electric conductivity base
Being provided with the 1st layer of precious metal and the 2nd layer of precious metal on body, the 1st layer of precious metal is by the arithmetic average roughness on surface
Ra=(A) μm and noble metal that (A) is 0.05～0.5 or the alloy with noble metal as main component are constituted, and the 2nd
Noble metal is arranged at the upper strata of the 1st layer of precious metal, leather film thickness be below more than 0.001 × (A) μm and (A) μm
Noble metal or alloy with noble metal as main component constituted, the noble metal forming above-mentioned 1st layer of precious metal is selected from
Gold, silver, palladium and platinum, relative to forming the noble metal of above-mentioned 1st layer of precious metal or as forming above-mentioned 1st noble metal
The noble metal of the main component of the alloy of layer, forms the noble metal of above-mentioned 2nd layer of precious metal or as forming the above-mentioned 2nd
The noble metal of the main component of the alloy of layer of precious metal is different elements.This electric contact material is sliding properties, abrasion performance
Property excellence, life-span length, can with low cost manufacture electric contact material.
Prior art literature
Patent documentation
Patent documentation 1: No. 5128153 publications of Japanese Patent No.
Summary of the invention
The problem that invention is to be solved
But, make electric contact material according to the composition of patent documentation 1 and evaluated, result is it is recognized that while can
The effect that the sliding properties under load of taking a favourable turn is the most excellent, if but such as load reaches more than 50gf, then, it is seen that slides
The tendency that characteristic is deteriorated, and corrosion resistance after environmental test can be deteriorated sometimes.Understand: carrying out hydrogen sulfide (H2S)
Gas or sulfur dioxide (SO2) gas etc. high capacity environment under test time, from above-mentioned 1st layer of precious metal and the 2nd
The pin hole of 2 layers of layer of precious metal of layer of precious metal or be arranged at the substrate between above-mentioned 1st layer of precious metal and conductive base
The pin hole of metal level can be formed from base metal or the corrosion product of the composition of matrix, sometimes results in contact resistance and becomes
Difference.
The problem of the present invention is to solve the problems referred to above, it is provided that electric contact material that a kind of long-term reliability is high and manufacture thereof
Method, even if this electric contact material is under the high load condition that sliding load is about more than 50gf, such as 100gf
Also show that the abrasion performance of excellence, particularly can also make under the severe rugged environment being exposed to air for a long time simultaneously
With, such as at H2S gas or SO2It also is able to significantly suppress after accelerated test under the inferior corrosive environment of gas atmosphere
The contact resistance of electric contact material rises.
For solving the scheme of problem
The present inventor conducts in-depth research exploitation to above-mentioned problem, found that: for being arranged at conductive base
On the 1st layer of precious metal and each metal level of the 2nd layer of precious metal, by suitably adjusting its surface roughness, layer
Thickness, the hardness etc. of layer, such that it is able to provide the abrasion performance under a kind of not only high capacity and sliding properties excellent, and
And the electric contact material that corrosion resistance is also excellent.The present invention completes based on this opinion.
That is, according to the present invention, it is provided that following technical proposals.
(1) a kind of electric contact material, this electric contact material has the 1st layer of precious metal on the surface of conductive base,
The surface of above-mentioned 1st layer of precious metal has the 2nd layer of precious metal,
This electric contact material is characterised by,
The arithmetic average roughness Ra=A μm on the surface of above-mentioned 1st layer of precious metal and A < 1, and the 1st your gold
Hardness Hv belonging to layer is more than 150,
The thickness of above-mentioned 2nd layer of precious metal is more than A μm and be below 1 μm, and the surface of the 2nd layer of precious metal
Arithmetic average roughness Ra=B μm and B≤0.1.
(2) electric contact material as described in (1) item, wherein, the value of above-mentioned A is 0.001 less than 0.500.
(3) electric contact material as described in (1) or (2) item, wherein, above-mentioned 1st layer of precious metal and the 2nd layer of precious metal divide
Not by gold, billon, silver, silver alloy, platinum, platinum alloy, indium, indium alloy, stannum, ashbury metal, palladium, palldium alloy,
Any one in ruthenium, ruthenium alloy, rhodium, rhodium alloy, osmium, osmium alloy, iridium, iridium alloy is constituted.
(4) electric contact material as according to any one of (1)～(3), wherein, above-mentioned 1st layer of precious metal is closed by palladium, palladium
Any one in gold, ruthenium, ruthenium alloy, rhodium, rhodium alloy, osmium, osmium alloy, iridium, iridium alloy is constituted.
(5) electric contact material as according to any one of (1)～(4), wherein, above-mentioned 2nd layer of precious metal is by gold, Jin He
Any one in gold, silver, silver alloy, platinum, platinum alloy, indium, indium alloy, stannum, ashbury metal is constituted.
(6) electric contact material as according to any one of (1)～(5) item, wherein, at above-mentioned conductive base and above-mentioned the
There is between 1 layer of precious metal at least 1 layer of substrate metal layer.
(7) electric contact material as described in (6) item, wherein, above-mentioned substrate metal layer is closed by nickel, nickel alloy, cobalt, cobalt
Any one in gold is constituted.
(8) electric contact material as described in (6) or (7) item, wherein, the thickness of above-mentioned substrate metal layer be 0.05 μm～
3.00μm。
(9) electric contact material as according to any one of (1)～(8), wherein, above-mentioned conductive base by copper, copper alloy,
Any one in ferrum, ferroalloy, aluminum, aluminium alloy is constituted.
(10) electric contact material as according to any one of (1)～(9), wherein, the parent phase of above-mentioned conductive base average
Crystallite dimension is below 5 μm.
(11) manufacture method of the electric contact material as according to any one of (1)～(10), it is characterised in that utilize plating
Method arranges at least one of which in above-mentioned 1st layer of precious metal and the 2nd layer of precious metal.
Herein, in the present invention, in above-mentioned 1st layer of precious metal or the 2nd layer of precious metal, " noble metal " refers to compare electric conductivity
The metal that the material of matrix is valuable.
Invention effect
According to the present invention it is possible to provide one to demonstrate abrasion performance or sliding properties and corrosion resistance under high load,
And then the electric contact material that contact resistance is little.Although it addition, the electric contact material of the present invention more such as patent documentation 1
Described in the thicker ground plating such as material, but also have the effect that the tone of most surface is not easily deteriorated, outward appearance is the best.
The above and other feature and advantage of the present invention can be the clearest and the most definite by following contents the most referring to the drawings.
Accompanying drawing explanation
Fig. 1 is the sectional view schematically showing an embodiment of the invention.
Fig. 2 is the sectional view schematically showing another embodiment of the invention.
Fig. 3 is the sectional view of the further embodiment schematically showing the present invention.
Fig. 4 is the 1st layer of precious metal and the limit of the 2nd layer of precious metal schematically showing an embodiment of the invention
The enlarged partial sectional figure on boundary.
Fig. 5 is the 1st layer of precious metal and the 2nd layer of precious metal schematically showing another embodiment of the invention
The enlarged partial sectional figure on border.
Detailed description of the invention
The present invention relates to a kind of electric contact material, this electric contact material has the 1st your gold on the surface of conductive base
Belong to layer, the surface of above-mentioned 1st layer of precious metal has the 2nd layer of precious metal, wherein, above-mentioned 1st layer of precious metal
Arithmetic average roughness Ra=(A) μm on surface and (A) < 1, and hardness Hv of the 1st layer of precious metal is 150
Above, the thickness of above-mentioned 2nd layer of precious metal exceedes (A) μm and is below 1 μm, and the 2nd layer of precious metal
Arithmetic average roughness Ra=(B) μm on surface and (B)≤0.1.Herein, arithmetic average roughness Ra refers to basis
The arithmetic average roughness Ra of JIS B 0601:2013.
It should be noted that in the present invention, it is (that is, expensive that the 1st layer of precious metal and the 2nd layer of precious metal are individually its composition
The kind of metallic element) mutually different layer.1st layer of precious metal and the 2nd layer of precious metal each can be by single expensive
Metal species is constituted, it is also possible to be made up of the alloy comprising noble metal.It is being made up of the alloy comprising noble metal
In the case of, the element kind of the mass ratio maximum in this layer is necessary for noble metal.At 1 layer of precious metal by comprising two
In the case of the alloy of the above noble metal of kind is constituted, in this layer, the total mass ratio of whole noble metals needs in this layer
For maximum ratio.Wherein, when the ratio of the alloy of noble metal is exactly 50%, layer of precious metal also it is regarded as.
Herein, in the case of the 1st layer of precious metal and the 2nd layer of precious metal are made up of single noble metal kind respectively,
This precious metal element kind needs mutually different.On the other hand, the 1st layer of precious metal and the 2nd layer of precious metal respectively by
In the case of the alloy comprising noble metal is constituted, constitute the noble metal that the mass ratio in the above-mentioned layer of this alloy-layer is maximum
Element kind needs mutually different.
Utilize accompanying drawing that the electric contact material of the present invention is illustrated.
Fig. 1 is the sectional view schematically showing an embodiment of the invention.In this embodiment, in electric conductivity
The surface of matrix 1 is provided with the 1st layer of precious metal 2, and then is provided with the 2nd layer of precious metal 3 in its surface.
Fig. 2 is the sectional view schematically showing another embodiment of the invention.Herein, at conductive base 1
Surface be provided with the substrate metal layer 4 of the coating being made up of the 1st layer of precious metal the 2 and the 2nd layer of precious metal 3.
Fig. 3 is the sectional view of the further embodiment schematically showing the present invention.Herein, at conductive base 1
Surface be provided with substrate metal layer 4, be provided with by the 1st layer of precious metal 2 and in substrate metal layer 4 upper part
The coating that 2 layer of precious metal 3 are constituted, reduces with the cost that realization is saved under the conditions of noble metal.It should be noted that
Relevant with Fig. 3, the substrate metal layer 4 on conductive base 1 can partially be set, such as, can only arrange
In the position (shape one with coating being provided with the coating being made up of the 1st layer of precious metal the 2 and the 2nd layer of precious metal 3
Cause).
In Fig. 1～Fig. 3, represent the border of the 1st layer of precious metal the 2 and the 2nd layer of precious metal 3 simplifiedly by straight line,
But it practice, as schematically illustrated in the enlarged partial sectional figure of Fig. 4, on the surface of conductive base 1
The surface of the 1st layer of precious metal 2 has the concavo-convex of arithmetic average roughness Ra=(A) μm, the film of the 2nd layer of precious metal 3
Thickness is formed in the way of exceeding below (A) μm and 1 μm.
It should be noted that as schematically illustrated in the enlarged partial sectional figure of Fig. 5, to the 2nd noble metal
When layer 3 uses the situation etc. of such as gloss plating, it is also possible to according to the face side at the 1st layer of precious metal 2 recess relatively
Thick and the 2nd layer of precious metal 3 is set in the mode that protuberance is relatively thin.It addition, the most such as can also be after plating by surface
Polishing lightly and carry out grinding, the only recess in the face side of the 1st layer of precious metal 2 is coated to the 2nd layer of precious metal 3.
Herein, by thicker for the 2nd layer of precious metal 3 being arranged at the recess of face side of the 1st layer of precious metal 2, relatively unfertile land is arranged
When protuberance, the thickness of the 2nd layer of precious metal 3 now is defined by arithmetic average.
It addition, as the conductive base used, preferably copper or copper alloy, ferrum or ferroalloy, aluminum or aluminum alloy
The conductive base of system, copper that the most preferably conductivity is good or the conductive base of copper alloy.
Such as the example of copper alloy, it is possible to use: as CDA (Copper Development Association,
Copper industry development association) published alloy " C14410 (Cu-0.15Sn, The Furakawa Electric Co., Ltd. manufacture, business
The name of an article: EFTEC-3) ", " C19400 (Cu-Fe system alloy material, Cu-2.3Fe-0.03P-0.15Zn) ",
" C18045 (Cu-0.3Cr-0.25Sn-0.5Zn, The Furakawa Electric Co., Ltd.'s manufacture, trade name: EFTEC-64T) ",
" C26800 (Cu-35%Zn) " and " C71500 (Cu-30%Ni) " etc..It should be noted that the numeral before each element
Unit be quality %.The conductive base of these copper alloys is different due to respective conductivity or intensity, thus can fit
Characteristic selects to use the most as requested, and from the viewpoint of improving electric conductivity or thermal diffusivity, being preferably made conductivity is
The bar of the copper alloy of more than 5%IACS (International Annealed Copper Standard, International Annealed Copper Standard)
Material.It should be noted that " matrix composition " when copper or copper alloy are made conductive base represents copper.
It addition, as ferrum or ferroalloy, such as use 42 alloys (Fe-42 mass %Ni) or rustless steel etc..Now
Matrix composition represents ferrum.
The thickness of conductive base is not particularly limited, and usually 0.05～2.00mm, is preferably 0.10～1.00mm.
And then, as the conductive base in the present invention, by using the average brilliant of conductive base mother metal (matrix)
Particle size is the material of below 5 μm, can make precipitation layer thereon plated layer compact separate out, result can form tool
Have the coating of multiple crystal grain to make grain boundary decision disperse, thus significantly postpone matrix composition diffusion arrive top layer time
Between.It is as a result, it is possible to provide and can suppress to have diffused to the burn into of the matrix composition in the top layer of the 2nd layer of precious metal
The suppression rising of contact resistance thus the high electric contact material of reliability.It addition, as being multiplied effect, the most available
The effect that the bendability of the least then conductive base of average grain size of conductive base mother metal is the most excellent.
The average grain size of conductive base mother metal is preferably below 5 μm, in order to improve the densification of plating further
Property, below more preferably 3 μm, more preferably below 1 μm.Its lower limit is not particularly limited, usually
More than 0.001 μm.
In the present invention, as forming the 1st layer of precious metal and the metal of the 2nd layer of precious metal or the example of its alloy, permissible
Enumerate: gold, billon, silver, silver alloy, platinum, platinum alloy, indium, indium alloy, stannum, ashbury metal, palladium, palladium close
Gold, ruthenium, ruthenium alloy, rhodium, rhodium alloy, osmium, osmium alloy, iridium, iridium alloy etc..
Herein, the effect of the 1st layer of precious metal is to improve the abrasion performance of the 2nd layer of precious metal formed in most surface,
And then raising corrosion resistance.Its reason is: by by arithmetic average roughness Ra=(A) μm on the 1st layer of precious metal surface
Be set to (A) < 1, abrasion performance can be improved, and by its hardness Hv is set to more than 150, is preferably set to 200
Above, abrasion performance can be improved further.
Additionally, it is preferred that the value of above-mentioned (A) is set to 0.001 less than 0.500, it is hereby achieved that corrosion resistance is more
Excellent electric contact material.
Particularly, for ease of reaching this abrasion performance and corrosion proof raising, as the 1st layer of precious metal, preferably
It is made up of any one in palladium, palldium alloy, ruthenium, ruthenium alloy, rhodium, rhodium alloy, osmium, osmium alloy, iridium, iridium alloy,
Owing to abrasion performance and contact resistance can be reduced further, the 1st layer of precious metal further preferably by palladium, palldium alloy, rhodium,
Any one in rhodium alloy is constituted.(A) value be preferably 0.001 less than 0.5, more preferably 0.005～
0.1.By the value of (A) is set to this scope, the 2nd layer of precious metal being subsequently formed on the 1st layer of precious metal can be made
Surface be prone to smooth.
It should be noted that the coating thickness about the 1st layer of precious metal is not particularly limited, if considering cost or curved
Bent processability, the most preferably 0.001～3 μm, more preferably 0.05～1 μm.
2nd layer of precious metal is made up of the noble metal different from the noble metal constituting the 1st layer of precious metal.2nd noble metal
Layer is the most surface coating of the electric contact material of the present invention, and the leather film thickness of the 2nd layer of precious metal exceedes as the 1st
(A) μm of the arithmetic average roughness (Ra) on the surface of layer of precious metal and be below 1 μm, and the 2nd layer of precious metal
Arithmetic average roughness Ra=(B) μm on surface and B≤0.1.2nd layer of precious metal is as protection the 1st noble metal
Layer and the different layer of precious metal of 1st layer of precious metal good from conductive characteristic and arrange.The surface of the 2nd layer of precious metal
Become the sliding surface at initial stage, by (A) μm at the arithmetic average roughness (Ra) as the 1st layer of precious metal surface
Bury the 2nd layer of precious metal in concavo-convex, thus can have concurrently connect as electricity as following coating layer exhibiting function, this coating
Low contact resistance characteristic required for some material and as the function i.e. surface lubrication/abrasion performance required for self-cleaning contact
Property.2nd layer of precious metal not only exists with the concavo-convex degree of landfill the 1st layer of precious metal, and by making its thickness surpass
Cross above-mentioned (A) μm and be below 1 μm, such that it is able to make the epithelium that corrosion resistance improves further.And then, pass through
Arithmetic average roughness Ra=(B) μm on the 2nd layer of precious metal surface is set to (B)≤0.1, thus can play suppression by
Concavo-convex caused abrasion, the effect preventing the 1st layer of precious metal even conductive base from exposing.So by the 2nd
Layer of precious metal is set to be thicker than the electric contact material of the present invention of arithmetic average roughness (Ra)=(A) μm of the 1st layer of precious metal
In material, it is more than patent documentation 1 owing to constituting the consumption of the noble metal of coating, thus cost raises, but resistance to from improving
It is excellent from the viewpoint of erosion property, thus the totle drilling cost under life-time service environment can be made to reduce.
As the material of above-mentioned 2nd layer of precious metal, be suitable for use gold, billon, silver, silver alloy, platinum, platinum alloy,
Indium, indium alloy, stannum, ashbury metal etc., particularly in requiring corrosion proof purposes, preferably gold, billon, platinum,
Platinum alloy.On the other hand, if electric contact is through resin moulded and that be exposed in the air few electric contact material of misgivings,
Silver, silver alloy, indium, indium alloy, stannum, ashbury metal then can also be used as the material of the 2nd layer of precious metal.These
Metal or its alloy, thus can be according to purposes or situations owing to demonstrating solder wettability or the contact resistance behavior of excellence
Suitably select.
In the electric contact material (such as sliding contact material) of the present invention, can be at conductive base and the 1st noble metal
Substrate metal layer is set between Ceng, it is also possible to be not provided with.By arranging by such as nickel, nickel alloy, cobalt, cobalt alloy
Any one substrate metal layer constituted, the 1st layer of precious metal and the diffusion of matrix composition can be stopped or improve closely sealed
Property, thus preferably.Particularly processed the metal more valuable than conductive base as the above-mentioned 1st by plating
Layer of precious metal or the 2nd layer of precious metal and in the present invention that formed, in order to improve adaptation or prevent displacement, at this plating
It is effective for pre-setting substrate metal layer by the base treatment such as flash or strike plating before Chu Liing.It addition, substrate
Metal level can be more than two-layer, can according to the coating specification of above-mentioned 1st layer of precious metal or the 2nd layer of precious metal or
Purposes etc., are arranged as various compositions by conventional method.It is made the total thickness of the substrate metal layer of simple layer or multilamellar
Degree is preferably 0.05 μm～3 μm, more preferably 0.5 μm～1 μm.
In order to manufacture the electric contact material of the present invention, it is possible to use plating, covering (clad), be deposited with, sputtering etc. various
Epithelium forms method, as being especially susceptible to the method that forms thin film, arranges the 1st layer of precious metal and the preferably by galvanoplastic
At least one of which in 2 layer of precious metal, more preferably utilizes galvanoplastic to form the 1st layer of precious metal and the two of the 2nd layer of precious metal
Layer.The composition of electroplate liquid and plating condition can determine according to conventional methods and suitably.It addition, in order to suppress required gold
Genus amount, the noble metal coating part of the 1st layer of precious metal or the 2nd layer of precious metal or both is arranged to strip or
Point-like etc. are also useful.
Coating about being made up of above-mentioned 1st layer of precious metal and the 2nd layer of precious metal in the electric contact material of the present invention
Layer, gloss, semi-glossy, lacklustre outward appearance kind are not particularly limited, and all can apply.Even if it addition, only making
The composition of the invention described above, effect is also abundant, in order to improve effect further, be also preferably formed make conventionally used each
Plant additive, dispersant, discrete particles etc. containing in the quilt being made up of above-mentioned 1st layer of precious metal and the 2nd layer of precious metal
Composite coated with the layer of more than 1 in intermediate layer of coating.
Embodiment
Below, illustrate in greater detail the present invention based on embodiment, but the present invention is not limited to these embodiments.
(embodiment 1)
To thickness 0.3mm, width 50mm table 1 shown in conductive base carry out pre-treatment shown below after,
Substrate metal layer shown in table 1, the 1st layer of precious metal, the 2nd layer of precious metal are passed sequentially through galvanoplastic and be arranged at conduction
On property matrix, it is thus achieved that the electric contact material of the example shown in table 1, comparative example and conventional example.
It should be noted that about the coating thickness of each layer, use fluorescent X-ray determining film thickness device (SFT-9400,
Trade name, SII company manufacture), collimator diameter it is set to 0.5mm and is measured at any 10, calculating it
Meansigma methods, as coating thickness.
(Pretreatment)
[catholyte defat]
Degreaser: NaOH 60g/l
Degreasing condition: 2.5A/dm2, temperature 60 C, degreasing time 60 seconds
[pickling]
Pickle: 10% sulphuric acid
Acid washing conditions: 30 seconds dippings, room temperatures
(substrate metal layer plating condition)
[plating Ni]
Plating solution: Ni (SO3NH2)2·4H2O 500g/l、NiCl2 30g/l、H3BO3 30g/l
Plating condition: temperature 50 C
[plating Co]
Plating solution: Co (SO3NH2)2·4H2O 500g/l、CoCl2 30g/l、H3BO3 30g/l
Plating condition: temperature 50 C
(the 1st layer of precious metal plating condition)
[plating Pd 1 (Pd1)]
Plating solution: Pd (NH3)2Cl2 45g/l、NH4OH 90ml/l、(NH4)2SO450g/l, Parasigma polishing material (business
The name of an article, Matsuda Industrial Co., Ltd. manufacture) 10ml/l
Plating condition: electric current density 5A/dm2, temperature 60 C
[plating Pd 2 (Pd2)] additive-free bath: use in comparative example 2
Plating solution: Pd (NH3)2Cl2 45g/l、NH4OH 90ml/l、(NH4)2SO4 50g/l
Plating condition: electric current density 3A/dm2, temperature 60 C
[plating Rh]
Plating solution: RHODEX (trade name, Electroplating Engineers of Japan Ltd. manufacture)
Plating condition: 1.3A/dm2, temperature 50 C
[plating Ru]
Plating solution: RUTHENEX100 (trade name, Electroplating Engineers of Japan Ltd. manufacture)
Plating condition: electric current density 1A/dm2, temperature 65 DEG C
[plating Ir]
Plating solution: IRIDEX100 (trade name, Electroplating Engineers of Japan Ltd. manufacture)
Plating condition: 0.2A/dm2, temperature 85 DEG C
(the 2nd layer of precious metal plating condition)
[plating Au]
Plating solution: KAu (CN)2 14.6g/l、C6H8O7 150g/l、K2C6H4O7 180g/l
Plating condition: temperature 40 DEG C
[plating Pt]
Plating solution: Pt (NO2)(NH3)2 10g/l、NaNO2 10g/l、NH4NO3 100g/l、NH3 50ml/l
Plating condition: temperature 80 DEG C
[plating Ag]
Plating solution: AgCN 50g/l, KCN 100g/l, K2CO3 30g/l
Plating condition: electric current density 1A/dm2, temperature 30 DEG C
[plating Ag-Se alloy]
Plating solution: KCN 150g/l, K2CO3 15g/l、KAg[CN]2 75g/l、Na2O3Se·5H2O 5g/l
Plating condition: electric current density 2A/dm2, temperature 50 C
[plating Sn]
Plating solution: SnSO4 80g/l、H2SO4 80g/l
Plating condition: electric current density 2A/dm2, temperature 30 DEG C
About obtained each electric contact material, under following experimental condition, various characteristics are tested, evaluated.
Show the result in table 2.
(1A) average grain size (GS) of conductive base:
3 visuals field of the cross-section samples of conductive base are made by FIB (Focused Ion Beam, focused ion bundle)
After, carry out SIM image viewing, for 3 Site Determination particle diameters in every 1 visual field, be averaged value and be shown in table 1.
(1B) thickness measurement: the thickness of the 1st layer of precious metal, the 2nd layer of precious metal and substrate metal layer passes through SII
The fluorescent X-ray film thickness gauge (trade name: SFT9400) that NanoTechnology company manufactures is measured.Will collimation
Device diameter is set to 0.5mm, is measured any 10 positions, calculates its meansigma methods, as coating thickness.Will
Result is shown in table 1.
(1C) hardness measurement: according to JIS Z 2244:2009, to measuring the 1st your gold loaded when being set to 0.005N
The Vickers hardness (Hv) belonging to layer is measured.It should be noted that this is the hardness before being coated to the 2nd layer of precious metal.Will
Result is shown in table 1.
(1D) arithmetic average roughness Ra: the arithmetic average roughness Ra table manufactured by little Ban institute Co., Ltd.
Surface roughness meter (trade name: Surfcorder SE3500) is measured.In contact pilotage front-end radius 2 μm, measure power 0.75N
Under following condition determination, measure arithmetic average roughness Ra=(A) μm and the 2nd noble metal of the 1st layer of precious metal
Arithmetic average roughness Ra=(B) μm of layer.Show the result in table 1.
(2A) coefficient of kinetic friction measures: use sliding test device (HEIDON Type:14FW, trade name, Xin Dong
Scientific company manufactures) carry out coefficient of kinetic friction mensuration.Condition determination is as described below.
The steel ball probe (probe) of R=2.0mm, sliding distance 10mm, sliding speed 100mm/ minute, slip time
Number comes and goes 100 times, load 100gf
In above-mentioned sliding test, measure come and go slip number of times be 1 time, 50 times, each coefficient of kinetic friction after 100 times,
And it is shown in table 2.
(2B) the abrasion degree of depth: the abrasion degree of depth after terminating for above-mentioned sliding test, uses microscope (VH8000, business
The name of an article, KEYENCE company manufacture), measure the degree of depth (μm) of slide mark central cross section.Using its bosom as mill
The consumption degree of depth is shown in table 2.
(2C) contact resistance measures: mensuration contact resistance as follows is as corrosion proof index, and is evaluated.?
Formed after top layer (above-mentioned 2nd layer of precious metal), measure contact resistance by four-terminal method.In mensuration, with top layer
(initial stage), sulfurous acid gas test (SO after newly formed210ppm, 40 DEG C, 80%RH, 168 hours) afterwards, hydrogen sulfide
Test (H2S 3ppm, 40 DEG C, 80%RH, 168 hours) after 3 levels carry out.In evaluation, actionradius
10 measuring points are measured contact resistance under conditions of 10mA energising, load 10gf by the Ag probe of 2mm,
Calculate its meansigma methods as contact resistance.As evaluation, below 10m Ω is set to " excellent " and is shown in table 2 with " A ",
More than 10m Ω and " good " will be set to for below 50m Ω and be shown in table 2 with " B ", will be more than 50m Ω and be 100m Ω
Below it is set to "available" and is shown in table 2 with " C ", will be set to more than 100m Ω " can not " and be shown in table 2 with " D ".Will
Practical grade is judged to " C " or " B " or " A ".
(2D) bendability: for each sample, relatively under conditions of bending machining radius 0.9mm (R/t=3)
Implement after V bend test in the direction that rolling striped (prolonging muscle) is right angle, utilize microscope (VH8000, trade name,
KEYENCE company manufacture) with observe multiplying power 200 times observe its spine.Person is set to " excellent " and with " A " will to have no crackle
It is shown in table 2, slight for generation stricture of vagina trace person is set to "available" and is shown in table 2 with " B ", bigger for generation crackle person is set to " no
Can " and be shown in table 2 with " C ".Practicality grade is judged to " B " or " A ".
(2E) solder wettability: use MODEL SAT-5100 (trade name, Rhesca company manufacture), will be by upper
State plating and process each test film of being obtained in Sn-3Ag-0.5Cu solder bath, in bath temperature 245 DEG C, dipping distance
10mm, under conditions of the impregnating speed 25mm/ second, impregnated in isopropanol-25 quality % rosin flux (rosin flux).
Measure from immersion test sheet time (zero cross time, zero-crossing timing) to wetting power zero passage.By its result
Zero-crossing timing (second) is shown in table 2.Zero-crossing timing is set to " excellent ", by person within more than 1 second and 3 seconds less than 1 second person
It is set to "available", will be set to more than 3 seconds persons " can not ", evaluate solder wettability.
[table 1]
Table 1
[table 2]
Table 2
From the above results, in each example, even if also showing that stable under the high sliding load of 100gf
The coefficient of kinetic friction and sliding properties are good, the excellent wear resistance that the abrasion performance degree of depth demonstrates, go out shown by contact resistance
Corrosion resistance excellent, bendability is the best with solder wettability.
In contrast, in each comparative example with conventional example, for the result of any one characteristic difference.
Comparative example 1 is too high due to the surface roughness Ra (B) of the 2nd layer of precious metal, if thus sliding the high of 100gf
Load falling moves number of times and is become 100 times from 50 times, then contact resistance increases, it addition, bendability is poor.Relatively
Example 2 is too low due to the hardness of the 1st layer of precious metal, if thus at the high sliding load lower slider number of times of 100gf by 50
Secondary become 100 times, then contact resistance increases, it addition, abrasion performance is poor.Conventional example 1 is due to the 2nd layer of precious metal
Coating thickness is thinner than arithmetic average roughness Ra=(A) μm on the surface of the 1st layer of precious metal, if thus 100gf's
High sliding load lower slider number of times is become 100 times from 50 times, then contact resistance increases.These comparative examples and conventional example
All not met practicality grades.
Industrial applicibility
As long as the electric contact that the electric contact material of the present invention is common contact, the most no matter which kind of type all can be suitably
Use.Particularly because of abrasion performance and corrosion resistance excellent, thus can be especially suitable for use as being for example suitable for automobile mounted
Indoor and outdoor self-cleaning contact or reed switch, motor diverter (commutator) contact and brush (brush) material, take the photograph
The material of the use in electric contact such as contact switch put by shadow support.
Although describing the present invention already in connection with its embodiment, but it is applicant's understanding that as long as no especially
Statement, then the present invention is all not limited at any details of explanation, it should do not violating shown in claims
Wide in range explanation is carried out under conditions of spirit and scope.
Symbol description
1 conductive base
2 the 1st layer of precious metal
3 the 2nd layer of precious metal
4 substrate metal layers
Claims (11)
1. an electric contact material, this electric contact material has the 1st layer of precious metal on the surface of conductive base,
The surface of described 1st layer of precious metal has the 2nd layer of precious metal,
This electric contact material is characterised by,
The arithmetic average roughness Ra=A μm on the surface of described 1st layer of precious metal and A < 1, and the 1st your gold
Hardness Hv belonging to layer is more than 150,
The thickness of described 2nd layer of precious metal is more than A μm and be below 1 μm, and the surface of the 2nd layer of precious metal
Arithmetic average roughness Ra=B μm and B≤0.1.
2. electric contact material as claimed in claim 1, wherein, the value of described A is 0.001 less than 0.500.
3. electric contact material as claimed in claim 1 or 2, wherein, described 1st layer of precious metal and the 2nd your gold
Belong to layer respectively by gold, billon, silver, silver alloy, platinum, platinum alloy, indium, indium alloy, stannum, ashbury metal, palladium,
Any one in palldium alloy, ruthenium, ruthenium alloy, rhodium, rhodium alloy, osmium, osmium alloy, iridium, iridium alloy is constituted.
4. the electric contact material as according to any one of claims 1 to 3, wherein, described 1st layer of precious metal by palladium,
Any one in palldium alloy, ruthenium, ruthenium alloy, rhodium, rhodium alloy, osmium, osmium alloy, iridium, iridium alloy is constituted.
5. the electric contact material as according to any one of Claims 1 to 4, wherein, described 2nd layer of precious metal by gold,
Any one in billon, silver, silver alloy, platinum, platinum alloy, indium, indium alloy, stannum, ashbury metal is constituted.
6. the electric contact material as according to any one of Claims 1 to 5, wherein, in described conductive base and institute
State, between the 1st layer of precious metal, there is at least 1 layer of substrate metal layer.
7. electric contact material as claimed in claim 6, wherein, described substrate metal layer by nickel, nickel alloy, cobalt,
Any one in cobalt alloy is constituted.
Electric contact material the most as claimed in claims 6 or 7, wherein, the thickness of described substrate metal layer is
0.05 μm～3.00 μm.
9. the electric contact material as according to any one of claim 1～8, wherein, described conductive base by copper,
Any one in copper alloy, ferrum, ferroalloy, aluminum, aluminium alloy is constituted.
10. the electric contact material as according to any one of claim 1～9, wherein, the mother of described conductive base
The average grain size of phase is below 5 μm.
The manufacture method of 11. electric contact materials as according to any one of claim 1～10, it is characterised in that profit
By galvanoplastic, at least one of which in described 1st layer of precious metal and the 2nd layer of precious metal is set.
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|---|---|---|---|
| PCT/JP2014/052628 WO2015118627A1 (en) | 2014-02-05 | 2014-02-05 | Electrical contact material and manufacturing method thereof |
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| CN105940463B CN105940463B (en) | 2018-01-02 |
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| JP (1) | JP5676053B1 (en) |
| KR (1) | KR102102583B1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109672064A (en) * | 2018-11-13 | 2019-04-23 | 云南先导新材料有限公司 | A kind of palldium alloy composite filament brush material and preparation method thereof |
| CN113994439A (en) * | 2019-06-28 | 2022-01-28 | 住友电气工业株式会社 | Copper-clad steel wire, spring, stranded wire, insulated wire, and cable |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2019230736A1 (en) * | 2018-05-29 | 2019-12-05 | 積水ポリマテック株式会社 | Metal contact member and rubber switch member |
| JP7458194B2 (en) * | 2020-01-30 | 2024-03-29 | 古河電気工業株式会社 | Vibration motor substrate and its manufacturing method, and vibration motor |
| JP7108153B1 (en) * | 2021-04-02 | 2022-07-27 | 松田産業株式会社 | conductive material |
| KR102629778B1 (en) | 2021-10-27 | 2024-01-29 | (주)쉴드론 | Switch contact of master controller for railway train |
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Also Published As
| Publication number | Publication date |
|---|---|
| KR20160119141A (en) | 2016-10-12 |
| CN105940463B (en) | 2018-01-02 |
| WO2015118627A1 (en) | 2015-08-13 |
| JPWO2015118627A1 (en) | 2017-03-23 |
| KR102102583B1 (en) | 2020-04-21 |
| JP5676053B1 (en) | 2015-02-25 |
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