CN105908149B - 卷对卷石墨烯薄膜连续生长设备 - Google Patents
卷对卷石墨烯薄膜连续生长设备 Download PDFInfo
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- CN105908149B CN105908149B CN201610506736.5A CN201610506736A CN105908149B CN 105908149 B CN105908149 B CN 105908149B CN 201610506736 A CN201610506736 A CN 201610506736A CN 105908149 B CN105908149 B CN 105908149B
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- vacuum chamber
- roll
- heating
- graphene film
- chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610506736.5A CN105908149B (zh) | 2016-06-30 | 2016-06-30 | 卷对卷石墨烯薄膜连续生长设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610506736.5A CN105908149B (zh) | 2016-06-30 | 2016-06-30 | 卷对卷石墨烯薄膜连续生长设备 |
Publications (2)
Publication Number | Publication Date |
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CN105908149A CN105908149A (zh) | 2016-08-31 |
CN105908149B true CN105908149B (zh) | 2018-12-14 |
Family
ID=56753819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201610506736.5A Active CN105908149B (zh) | 2016-06-30 | 2016-06-30 | 卷对卷石墨烯薄膜连续生长设备 |
Country Status (1)
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CN (1) | CN105908149B (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106480423B (zh) * | 2016-10-31 | 2019-01-11 | 山东赛帝格新材料有限责任公司 | 一种沉积石墨烯薄膜的设备及其沉积方法 |
CN106829935B (zh) * | 2017-03-27 | 2023-03-24 | 重庆墨希科技有限公司 | 横向布置的多腔室石墨烯连续生长设备 |
CN106829936B (zh) * | 2017-03-27 | 2020-06-19 | 重庆墨希科技有限公司 | 卧式石墨烯卷对卷连续生长设备 |
CN106702483B (zh) * | 2017-03-27 | 2020-01-03 | 重庆墨希科技有限公司 | 高温工艺腔竖向布置的石墨烯连续生长设备 |
CN106756896A (zh) * | 2017-03-27 | 2017-05-31 | 重庆墨希科技有限公司 | 立式石墨烯卷对卷连续生长设备 |
CN106835068B (zh) * | 2017-03-27 | 2020-03-31 | 重庆墨希科技有限公司 | 卷式石墨烯连续生长设备 |
CN107236938A (zh) * | 2017-07-11 | 2017-10-10 | 江苏星特亮科技有限公司 | 一种连续式薄膜生产设备 |
CN107399733B (zh) * | 2017-07-25 | 2019-10-08 | 长飞光纤光缆股份有限公司 | 一种卷对卷的石墨烯薄膜制备装置 |
CN111675210B (zh) * | 2020-07-07 | 2024-03-29 | 北京石墨烯技术研究院有限公司 | 石墨烯生产系统 |
CN115465858B (zh) * | 2022-10-12 | 2023-12-12 | 重庆石墨烯研究院有限公司 | 一种卷对卷石墨烯薄膜生产设备及方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120234240A1 (en) * | 2011-03-17 | 2012-09-20 | Nps Corporation | Graphene synthesis chamber and method of synthesizing graphene by using the same |
CN104060240A (zh) * | 2014-07-11 | 2014-09-24 | 无锡格菲电子薄膜科技有限公司 | 一种生产二维纳米材料的水平式卷对卷装置 |
CN204490990U (zh) * | 2014-12-31 | 2015-07-22 | 深圳市捷佳伟创新能源装备股份有限公司 | 一种pecvd设备的炉门结构 |
CN205856601U (zh) * | 2016-06-30 | 2017-01-04 | 青岛赛瑞达电子科技有限公司 | 卷对卷石墨烯薄膜连续生长设备 |
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- 2016-06-30 CN CN201610506736.5A patent/CN105908149B/zh active Active
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TR01 | Transfer of patent right |
Effective date of registration: 20200915 Address after: 266000 F Building, 1022 Beilao Road, Licang District, Qingdao City, Shandong Province Patentee after: QINGDAO SUNRED ELECTRONIC EQUIPMENT Co.,Ltd. Address before: High tech Zone East Road 266000 Shandong city of Qingdao province No. 826 Patentee before: QINGDAO SUNRED ELECTRONIC TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20211117 Address after: 214000 three comma maker spaces in the east of 1 / F, building 6, Ruiyun, No. 99, Furong Zhongsan Road, Xishan District, Wuxi City, Jiangsu Province Patentee after: Sairuida intelligent electronic equipment (Wuxi) Co.,Ltd. Address before: 266000 f / F, 1022 Beilao Road, Licang District, Qingdao City, Shandong Province Patentee before: QINGDAO SUNRED ELECTRONIC EQUIPMENT Co.,Ltd. |
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CP03 | Change of name, title or address |
Address after: 214000 workshop and office space on the south side of the first floor of Plant No. 4, precision machinery industrial park, Xishan District, Wuxi City, Jiangsu Province Patentee after: Sairuida Intelligent Electronic Equipment (Wuxi) Co.,Ltd. Address before: 214000 three comma maker spaces in the east of 1 / F, building 6, Ruiyun, No. 99, Furong Zhongsan Road, Xishan District, Wuxi City, Jiangsu Province Patentee before: Sairuida intelligent electronic equipment (Wuxi) Co.,Ltd. |
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CP03 | Change of name, title or address |