CN105896258A - Two-dimensional semiconductor saturable absorber mirror and preparation method thereof, and pulse fiber laser - Google Patents

Two-dimensional semiconductor saturable absorber mirror and preparation method thereof, and pulse fiber laser Download PDF

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Publication number
CN105896258A
CN105896258A CN201610429328.4A CN201610429328A CN105896258A CN 105896258 A CN105896258 A CN 105896258A CN 201610429328 A CN201610429328 A CN 201610429328A CN 105896258 A CN105896258 A CN 105896258A
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China
Prior art keywords
dimensional semiconductor
optical fiber
laser
pulse
saturable absorbing
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CN201610429328.4A
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Chinese (zh)
Inventor
闫培光
陈浩
邢凤飞
丁金妃
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Shenzhen University
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Shenzhen University
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Priority to CN201610429328.4A priority Critical patent/CN105896258A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1106Mode locking
    • H01S3/1112Passive mode locking
    • H01S3/1115Passive mode locking using intracavity saturable absorbers
    • H01S3/1118Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/063Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067Fibre lasers
    • H01S3/06708Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering

Abstract

The invention relates to the technical field of lasers, and provides a two-dimensional semiconductor saturable absorber mirror. The two-dimensional semiconductor saturable absorber mirror comprises an optical fiber, a two-dimensional semiconductor film attached to the optical fiber end face and a gold film attached to the two-dimensional semiconductor film. The invention further provides a preparation method of the two-dimensional semiconductor saturable absorber mirror. The preparation method comprises the steps of: cutting the optical fiber; placing the cut optical fiber and a two-dimensional semiconductor target material in a vacuum chamber, depositing two-dimensional semiconductor plasma on the optical fiber end face, forming the two-dimensional semiconductor film, and enabling the two-dimensional semiconductor film to reach the required thickness by controlling the deposition time and/or the deposition temperature; and plating the gold film on the obtained two-dimensional semiconductor film. The novel two-dimensional semiconductor saturable absorber mirror provided by the invention is composed of the optical fiber end face, the two-dimensional semiconductor film and the gold film, and has the advantages of being high in damage threshold, simple in structure, low in cost, and high in reliability.

Description

Two-dimensional semiconductor saturable absorbing mirror and preparation method thereof, pulse optical fiber
Technical field
The invention belongs to field of laser device technology, particularly relate to a kind of two-dimensional semiconductor saturable absorbing mirror and Preparation method and a kind of pulse optical fiber.
Background technology
Utilizing passive mode-locking technology is a kind of effective way that optical fiber laser realizes ultrafast pulse output, and quilt The key technology of dynamic locked mode is to need possess saturable absorption effect in resonant cavity of fibre-optical laser.This area is ground Studying carefully personnel, to have utilized multiple saturable absorption effect to obtain passive mode-locking ultrafast pulse in optical fiber laser defeated Go out.In general, in order to overcome the shortcoming of optical-fiber laser locked mode environment instability, research worker generally uses Semiconductor saturable absorbing mirror (SESAM) realizes the output of optical fiber laser locked mode ultrafast pulse.But, Owing to commercial SESAM is expensive, complex manufacturing technology, saturable absorption narrow bandwidth, normally only support The other pulse of picosecond exports, and damage threshold is relatively low, so it is ultrafast not also to be suitable for comprehensive research The dynamics of optical fiber laser.Therefore, develop with low cost, technique is simple, high performance satisfy It is always the target that ultrafast laser physical field is pursued with absorber.
Summary of the invention
For solving above-mentioned technical problem, the invention provides a kind of two-dimensional semiconductor saturable absorbing mirror and system thereof Preparation Method and a kind of pulse optical fiber, to solve that existing commercial SESAM is expensive, to make Complex process, reliability are low, the defect of work strip width.
The present invention is achieved in that a kind of two-dimensional semiconductor saturable absorbing mirror, including optical fiber, is attached to institute The two-dimensional semiconductor thin film stating fiber end face, the golden film being attached on described two-dimensional semiconductor thin film.
Present invention also offers the preparation method of a kind of described two-dimensional semiconductor saturable absorbing mirror, including with Lower step:
Optical fiber is cut, forms fiber end face;
Optical fiber after cutting and two-dimensional semiconductor target are placed in vacuum chamber, by two-dimensional semiconductor target material surface Ionization, produces two-dimensional semiconductor plasma, and described two-dimensional semiconductor is plasma-deposited at fiber end face On, form two-dimensional semiconductor thin film, by controlling sedimentation time and/or depositing temperature, make described two dimension partly lead Body thin film reaches desired thickness;
Gold-plated film on gained two-dimensional semiconductor thin film.
Present invention also offers a kind of pulse optical fiber, including semiconductor pump laser, optical coupled Device, resonator cavity;The pump light that described semiconductor pump laser produces is coupled into through described optical coupler Described resonator cavity, two-dimensional semiconductor saturable absorbing mirror described above in described resonator cavity, described two dimension half The flashlight entered in described resonator cavity is modulated by conductor saturable absorbing mirror, produces pulse laser.
Beneficial effect: the two-dimensional semiconductor saturable absorbing mirror that the present invention provides partly is led by fiber end face, two dimension Body thin film and gold film composition, have high damage threshold, be conveniently mounted and dismounted and is difficult to be damaged in use;In the preparation can batch Preparation, and with low cost, replicability is strong;Simultaneously because being integrated on fiber end face, in use only Need to be easy to use and to have high reliability high by directly fused for this device in fiber laser system.This A little features make the pulse optical fiber using this two-dimensional semiconductor saturable absorbing mirror to be prepared from, tool The advantage having all-fiber, high reliability.Described pulse optical fiber can through pulse amplifying device, It is suitably applied the seed source as amplifier, and easily prepared one-tenth product, and carry out achievements conversion.
Accompanying drawing explanation
Fig. 1 is the structural representation of the two-dimensional semiconductor saturable absorbing mirror 1 that the embodiment of the present invention provides;
Fig. 2 is that the preparation method flow process of the two-dimensional semiconductor saturable absorbing mirror 1 that the embodiment of the present invention provides is shown It is intended to;
Fig. 3 is the structural representation of the pulse optical fiber that the embodiment of the present invention provides;
Fig. 4 is the knot that the another kind that the embodiment of the present invention provides has the pulse optical fiber from enlarging function Structure schematic diagram.
Detailed description of the invention
In order to make the purpose of the present invention, technical scheme and advantage clearer, below in conjunction with accompanying drawing and reality Execute example, the present invention is further elaborated.
As it is shown in figure 1, the invention provides a kind of two-dimensional semiconductor saturable absorbing mirror 10, including optical fiber 100, It is attached to the two-dimensional semiconductor thin film 101 of fiber end face and is attached to the highly reflecting films on two-dimensional semiconductor thin film 101 102.Wherein, optical fiber can use single-mode fiber, polarization maintaining optical fibre, high-gain Active Optical Fiber (as Er-doped fiber, Yb dosed optical fiber, thulium doped fiber, mix holmium optical fiber, mix praseodymium optical fiber, mix bismuth optical fiber) or active ZBLAN optical fiber.
The material of two-dimensional semiconductor thin film 101 can use copper sulfide, black phosphorus, gallium selenide, telluride gallium, sulfuration Gallium, Germanium selenide, two telluride tungsten, two telluride molybdenums, curing hafnium, two selenizing hafniums, two cobaltous selenides, two telluride Cobalt, two selenizing rheniums, two telluride rheniums, stannic disulfide, two Tin diselenide .s, curing niobium, two selenizing niobiums, two sulfur Change titanium, two selenizing titaniums, tantalum disulfide, two selenizing tantalums, curing zirconium, two telluride zirconiums, bismuth sulfide, selenizing Any one in bismuth, Tellurobismuthite., or the hetero-junctions superlattices that any bi-material of alternating growth is constituted.
Highly reflecting films 102 use the golden film with high reflectance, the thickness of described gold film to be not less than 500nm, Preferably 500-1000nm.Highly reflecting films 102 are equivalent to a high reflection mirror, can prevent two-dimensional semiconductor simultaneously Thin film is by the dioxygen oxidation in air and water vapor encroachment, thus plays a protective role.
The operation principle of this two-dimensional semiconductor saturable absorbing mirror 10 is, one as laser instrument carries High reflection mirror for modulation.When the laser in resonator cavity is reflected by this two-dimensional semiconductor saturable absorbing mirror 1, Laser can be modulated by two-dimensional semiconductor saturable absorbing mirror 10, it is achieved adjusts Q or locked mode.This two dimension is partly led Body saturable absorbing mirror 10 has high damage threshold, can be as the reflection of light while light carries out wide-band modulation Mirror, can be used for the Primary Component that in laser system, pulse laser produces.
As in figure 2 it is shown, the embodiment of the present invention additionally provides the preparation of a kind of two-dimensional semiconductor saturable absorbing mirror Method, comprises the steps:
S1: optical fiber is carried out perpendicular cuts, obtains smooth clean fiber end face;
S2: the optical fiber after cutting and two-dimensional semiconductor target are placed in vacuum chamber, by two-dimensional semiconductor target Surface ionization, to produce two-dimensional semiconductor plasma, described two-dimensional semiconductor is plasma-deposited at light On fine end face, form two-dimensional semiconductor thin film;Control sedimentation time and/or depositing temperature, make described two dimension half Conductor thin film reaches desired thickness.
S3: gold-plated film on gained two-dimensional semiconductor thin film.
Specifically, step S1 can be cut by optical fiber cutter, during cutting, care is taken to ensure that optical fiber end Face is smooth.
Specifically, step S2 plates on described optical fiber the process of two-dimensional semiconductor thin film particularly as follows: will cut Optical fiber after cutting exchanges in target position with what two-dimensional semiconductor target was placed in vacuum chamber.Optical fiber and two dimension are partly led It should be noted that keep fiber end face to be directed at two-dimensional semiconductor target, after guaranteeing when body target is placed in vacuum chamber In continuous step, the two-dimensional semiconductor plasma of ionization can be deposited on fiber end face well.By two dimension half Conductor target material surface ionization is to produce two-dimensional semiconductor plasma, and is sunk by two-dimensional semiconductor plasma Amass on fiber end face, formed two-dimensional semiconductor thin film.
Specifically, in step S3 on gained two-dimensional semiconductor thin film during gold-plated film, gold target material is positioned over very In the direct current target position of empty room.
When being embodied as, magnetron sputtering method or pulse radiation frequency sedimentation can be used in step s 2 two dimension partly to be led Form plasma after the ionization of body target material surface, and make plasma-deposited on fiber end face, form two dimension Semiconductive thin film.In deposition process, can control to sink by controlling the parameter such as sedimentation time or depositing temperature Long-pending two-dimensional semiconductor film thickness;Also may select any bi-material alternating growth, constitute hetero-junctions super brilliant Lattice.
The preparation method of the two-dimensional semiconductor saturable absorbing mirror that the present invention provides, utilizes magnetron sputtering method or arteries and veins Rushing radio frequency sedimentation, preparation process is simple, can be mass-produced.Simultaneously in deposition process, by controlling The temperature of deposition, time etc. can control thickness and the uniformity of the two-dimensional semiconductor thin film of deposition, thus can Produce in enormous quantities, and make the two-dimensional semiconductor saturable absorbing mirror specification of making consistent;The two dimension prepared half Conductor saturable absorbing mirror bandwidth can be extended to infrared light from visible ray.Prepared two-dimensional semiconductor saturable Absorbing mirror is made up of fiber end face, two-dimensional semiconductor thin film and gold film, has high damage threshold, and makes Used time is hardly damaged;Can prepare in batches in the preparation, and with low cost, replicability is strong;Simultaneously because of collection Become on fiber end face, in use only need to by directly fused for this device in fiber laser system, The most easy to use and to have high reliability high.These features make to use this two-dimensional semiconductor saturable to inhale Receive the pulse optical fiber that mirror is prepared from, the advantage with all-fiber, high reliability, developed Pulse optical fiber can be suitably applied the seed source as amplifier through pulse amplifying device.Easily In being prepared as product, and carry out achievements conversion.
As it is shown on figure 3, embodiments provide a kind of pulse optical fiber, for linear cavity structure, Its structure includes semiconductor pump laser 1, optical coupling assembly 2, resonator cavity.Wherein, resonator cavity includes High-gain Active Optical Fiber 3, fiber grating 4, the two-dimensional semiconductor saturable absorbing mirror 5 prepared by said method And optoisolator 6.Wherein optical coupling assembly 2 can use wavelength division multiplexer.
The principle of this pulse optical fiber is, the pump light that semiconductor pump laser 1 produces is through optics Coupling assembly 2 is coupled into resonator cavity, and provides gain for Active Optical Fiber 3, and the vibration through resonator cavity is entered And produce laser.Two-dimensional semiconductor saturable absorbing mirror 5 is to Laser Modulation, and then produces laser pulse.Tool Body ground, saturable absorbing mirror 5 can provide saturable by two-dimensional semiconductor thin film 101 or 102 to resonator cavity Absorption modulation, it is achieved the self-starting of pulse laser.The optically coupled device of pulse laser 2 and optoisolator 6 are defeated Go out.
Specifically, fiber grating 5 can be bragg grating or chirped fiber grating, described optical fiber light Grid have high permeability to pump light, but have certain reflectance, the span of described reflectance to laser For 10-99%.Described fiber grating is equivalent to the reflecting mirror of an optical-fiber type, it is possible to provide feedback, light to light Fine grating and saturable absorbing mirror constitute the resonator cavity of laser instrument.Active Optical Fiber is the gain media of laser instrument.
As shown in Figure 4, present invention also offers another kind and there is the pulse optical fiber from enlarging function, Including: semiconductor pump laser 1, optical coupling assembly 2, resonator cavity, amplifier 7.This resonator cavity is Linear cavity structure, including high-gain Active Optical Fiber 3, two-dimensional semiconductor saturable absorbing mirror 4 as above, Fiber grating 5.The assembly of described amplifier 7 is high-gain Active Optical Fiber.Specifically, fiber grating 5 can For bragg grating or chirped fiber grating, described fiber grating pair pump light has high permeability, But have certain reflectance (span is 10% to 99%) to laser, fiber grating 5 is directly write system and is existed On high-gain Active Optical Fiber 3, its side is that opposite side is as the high-gain Active Optical Fiber 3 in resonator cavity The high-gain Active Optical Fiber 7 of amplifier.Optoisolator 6 can prevent the feedback of pulse laser.
Described pulse optical fiber has the advantage such as all-fiber, high reliability, has both been suitable to achievements conversion, It is with a wide range of applications again.
The foregoing is only presently preferred embodiments of the present invention, not in order to limit the present invention, all at this Any amendment, equivalent and the improvement etc. made within bright spirit and principle, should be included in the present invention Protection domain within.

Claims (10)

1. a two-dimensional semiconductor saturable absorbing mirror, it is characterised in that include optical fiber, be attached to described optical fiber The two-dimensional semiconductor thin film of end face and be attached to the golden film on described two-dimensional semiconductor thin film.
2. two-dimensional semiconductor saturable absorbing mirror as claimed in claim 1, it is characterised in that described optical fiber For single-mode fiber, polarization maintaining optical fibre, high-gain Active Optical Fiber or active ZBLAN optical fiber.
3. two-dimensional semiconductor saturable absorbing mirror as claimed in claim 1, it is characterised in that described two dimension The material of semiconductive thin film is: copper sulfide, gallium selenide, telluride gallium, sulfuration gallium, Germanium selenide, two telluride tungsten, Two telluride molybdenums, curing hafnium, two selenizing hafniums, two cobaltous selenides, two cobaltous tellurides, two selenizing rheniums, two telluride rheniums, Stannic disulfide, two Tin diselenide .s, curing niobium, two selenizing niobiums, the titanium sulfide in two, two selenizing titaniums, two sulfur That changes in tantalum, two selenizing tantalums, curing zirconium, two telluride zirconiums, bismuth sulfide, bismuth selenide, Tellurobismuthite. is any one Plant or two kinds.
4. two-dimensional semiconductor saturable absorbing mirror as claimed in claim 3, it is characterised in that described arbitrarily The two-dimensional semiconductor thin film that bi-material is constituted is the hetero-junctions superlattices that bi-material alternating growth is constituted.
5. two-dimensional semiconductor saturable absorbing mirror as claimed in claim 1, it is characterised in that described gold film Thickness be 500-1000nm.
6. the preparation method of two-dimensional semiconductor saturable absorbing mirror as claimed in claim 1, it is characterised in that Comprise the following steps:
Optical fiber is cut;
Optical fiber after cutting and two-dimensional semiconductor target are placed in vacuum chamber, by two-dimensional semiconductor target material surface Ionization is to produce two-dimensional semiconductor plasma so that described two-dimensional semiconductor is plasma-deposited at optical fiber On the end face exposed, form two-dimensional semiconductor thin film, by controlling sedimentation time and/or depositing temperature, make Described two-dimensional semiconductor thin film reaches desired thickness;
Gold-plated film on gained two-dimensional semiconductor thin film.
7. a pulse optical fiber, it is characterised in that include semiconductor pump laser, optical coupled Device, resonator cavity;The pump light that described semiconductor pump laser produces is coupled into through described optical coupler Described resonator cavity, includes in described resonator cavity in Claims 1 to 5 that the two-dimensional semiconductor described in any one can Saturated absorption mirror, the flashlight entered in described resonator cavity is carried out by described two-dimensional semiconductor saturable absorbing mirror Modulation, produces pulse laser.
8. pulse optical fiber as claimed in claim 7, it is characterised in that also wrap in described resonator cavity Include Active Optical Fiber, fiber grating;Described pump light is coupled into described resonator cavity through described optical coupler, There is provided gain for described Active Optical Fiber, make described resonator cavity produce laser;Described laser is partly led through described two dimension Body saturable absorbing mirror is modulated, at described resonator cavity interior resonance and produce pulse laser.
9. pulse optical fiber as claimed in claim 8, it is characterised in that described pulsed optical fibre laser Device also includes amplifier and optoisolator;The pulse laser of described generation enters back into amplifier and is exaggerated, through institute State optical coupler, optoisolator output laser pulse.
10. pulse optical fiber as claimed in claim 8, it is characterised in that described fiber grating is Bragg grating or chirped fiber grating.
CN201610429328.4A 2016-06-16 2016-06-16 Two-dimensional semiconductor saturable absorber mirror and preparation method thereof, and pulse fiber laser Pending CN105896258A (en)

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CN106898940A (en) * 2017-05-08 2017-06-27 深圳大学 A kind of hetero-junctions saturable absorbing mirror and preparation method thereof, pulse optical fiber
CN107204565A (en) * 2017-05-03 2017-09-26 浙江大学 The saturated absorbing body device and purposes of GeSe two-dimensional layers semiconductor and composition
CN107370012A (en) * 2017-08-07 2017-11-21 中国科学院物理研究所 Two-dimension nano materials mode-locked all-fiber laser with end face reflection structure
WO2017214925A1 (en) * 2016-06-16 2017-12-21 深圳大学 Two-dimensional semiconductor saturable absorber mirror and preparation method therefor, and pulse optical fibre laser
CN108123360A (en) * 2018-01-29 2018-06-05 南通大学 A kind of saturable absorption body device applied on optical fiber laser
CN108233158A (en) * 2018-01-29 2018-06-29 南通大学 A kind of optical fiber laser
WO2018205087A1 (en) * 2017-05-08 2018-11-15 深圳大学 Heterojunction saturable absorption mirror and preparation method therefor, and pulse fiber laser
CN108988116A (en) * 2018-07-31 2018-12-11 北京交通大学 A kind of saturable absorbing mirror based on high non-linearity twin-core fiber
CN109149333A (en) * 2018-09-30 2019-01-04 深圳大学 A kind of waveguide integrating optical modulator and preparation method thereof
CN109167239A (en) * 2018-09-27 2019-01-08 电子科技大学 A kind of Gao Zhongying adjustable optic fibre Fa-Po cavity mode-locked laser
CN109487318A (en) * 2018-12-17 2019-03-19 河南师范大学 A method of in untapered optical fiber end face, large area uniformly prepares gold nano disk array
CN109698461A (en) * 2019-03-11 2019-04-30 山东大学 A kind of passive Q-adjusted pulsed is from frequency doubling green light laser
CN111193174A (en) * 2020-01-10 2020-05-22 深圳瀚光科技有限公司 Saturable absorber based on bismuth telluride heterojunction and preparation method and application thereof
CN111552098A (en) * 2020-04-21 2020-08-18 天津大学 Gallium selenide/tin disulfide heterojunction film electric control terahertz intensity modulation device
CN111600184A (en) * 2020-05-20 2020-08-28 华南理工大学 Short cavity laser
CN111961300A (en) * 2020-07-10 2020-11-20 广东工业大学 Tantalum disulfide-based saturable absorber, preparation method thereof and laser mode locking application
CN112421361A (en) * 2020-11-26 2021-02-26 中国林业科学研究院木材工业研究所 Ultraviolet ultrafast laser for wood processing
CN112968346A (en) * 2021-02-03 2021-06-15 西北工业大学 High-damage-threshold film saturable absorber device, preparation method and application
CN113437630A (en) * 2021-06-07 2021-09-24 中国科学院上海光学精密机械研究所 Based on 1T-TaS2And its application in laser
CN116316033A (en) * 2023-05-24 2023-06-23 青岛翼晨镭硕科技有限公司 Semiconductor saturable absorber mirror, preparation method thereof and laser

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010120246A1 (en) * 2009-04-13 2010-10-21 National University Of Singapore Graphene-based saturable absorber devices and methods
CN103247935A (en) * 2013-04-19 2013-08-14 王枫秋 Optical anisotropy saturable absorption device, manufacturing method and pulse laser based on device
CN104218443A (en) * 2014-08-20 2014-12-17 鲍小志 Two-dimensional stratified material based practical saturable absorber and production method thereof
CN104466647A (en) * 2014-12-19 2015-03-25 深圳大学 Topological insulator saturable absorption mirror and manufacturing method thereof
CN105186271A (en) * 2015-10-16 2015-12-23 深圳大学 Transition metal sulfide saturable absorption mirror and mode locking fiber laser
CN205846435U (en) * 2016-06-16 2016-12-28 深圳大学 Two-dimensional semiconductor saturable absorbing mirror, pulse optical fiber

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010120246A1 (en) * 2009-04-13 2010-10-21 National University Of Singapore Graphene-based saturable absorber devices and methods
CN103247935A (en) * 2013-04-19 2013-08-14 王枫秋 Optical anisotropy saturable absorption device, manufacturing method and pulse laser based on device
CN104218443A (en) * 2014-08-20 2014-12-17 鲍小志 Two-dimensional stratified material based practical saturable absorber and production method thereof
CN104466647A (en) * 2014-12-19 2015-03-25 深圳大学 Topological insulator saturable absorption mirror and manufacturing method thereof
CN105186271A (en) * 2015-10-16 2015-12-23 深圳大学 Transition metal sulfide saturable absorption mirror and mode locking fiber laser
CN205846435U (en) * 2016-06-16 2016-12-28 深圳大学 Two-dimensional semiconductor saturable absorbing mirror, pulse optical fiber

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WO2017214925A1 (en) * 2016-06-16 2017-12-21 深圳大学 Two-dimensional semiconductor saturable absorber mirror and preparation method therefor, and pulse optical fibre laser
CN107204565A (en) * 2017-05-03 2017-09-26 浙江大学 The saturated absorbing body device and purposes of GeSe two-dimensional layers semiconductor and composition
CN106898940A (en) * 2017-05-08 2017-06-27 深圳大学 A kind of hetero-junctions saturable absorbing mirror and preparation method thereof, pulse optical fiber
WO2018205087A1 (en) * 2017-05-08 2018-11-15 深圳大学 Heterojunction saturable absorption mirror and preparation method therefor, and pulse fiber laser
CN107370012A (en) * 2017-08-07 2017-11-21 中国科学院物理研究所 Two-dimension nano materials mode-locked all-fiber laser with end face reflection structure
CN108123360A (en) * 2018-01-29 2018-06-05 南通大学 A kind of saturable absorption body device applied on optical fiber laser
CN108233158A (en) * 2018-01-29 2018-06-29 南通大学 A kind of optical fiber laser
CN108123360B (en) * 2018-01-29 2020-05-15 南通大学 Saturable absorber device applied to optical fiber laser
CN108233158B (en) * 2018-01-29 2020-02-04 南通大学 Optical fiber laser
CN108988116A (en) * 2018-07-31 2018-12-11 北京交通大学 A kind of saturable absorbing mirror based on high non-linearity twin-core fiber
CN109167239B (en) * 2018-09-27 2019-10-01 电子科技大学 A kind of Gao Zhongying adjustable optic fibre Fa-Po cavity mode-locked laser
CN109167239A (en) * 2018-09-27 2019-01-08 电子科技大学 A kind of Gao Zhongying adjustable optic fibre Fa-Po cavity mode-locked laser
CN109149333A (en) * 2018-09-30 2019-01-04 深圳大学 A kind of waveguide integrating optical modulator and preparation method thereof
CN109149333B (en) * 2018-09-30 2023-12-12 深圳大学 Waveguide integrated optical modulator and preparation method thereof
CN109487318A (en) * 2018-12-17 2019-03-19 河南师范大学 A method of in untapered optical fiber end face, large area uniformly prepares gold nano disk array
CN109698461A (en) * 2019-03-11 2019-04-30 山东大学 A kind of passive Q-adjusted pulsed is from frequency doubling green light laser
CN111193174B (en) * 2020-01-10 2021-07-30 深圳瀚光科技有限公司 Saturable absorber based on bismuth telluride heterojunction and preparation method and application thereof
CN111193174A (en) * 2020-01-10 2020-05-22 深圳瀚光科技有限公司 Saturable absorber based on bismuth telluride heterojunction and preparation method and application thereof
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CN111552098A (en) * 2020-04-21 2020-08-18 天津大学 Gallium selenide/tin disulfide heterojunction film electric control terahertz intensity modulation device
CN111600184A (en) * 2020-05-20 2020-08-28 华南理工大学 Short cavity laser
CN111961300A (en) * 2020-07-10 2020-11-20 广东工业大学 Tantalum disulfide-based saturable absorber, preparation method thereof and laser mode locking application
CN112421361A (en) * 2020-11-26 2021-02-26 中国林业科学研究院木材工业研究所 Ultraviolet ultrafast laser for wood processing
CN112968346A (en) * 2021-02-03 2021-06-15 西北工业大学 High-damage-threshold film saturable absorber device, preparation method and application
CN113437630A (en) * 2021-06-07 2021-09-24 中国科学院上海光学精密机械研究所 Based on 1T-TaS2And its application in laser
CN116316033A (en) * 2023-05-24 2023-06-23 青岛翼晨镭硕科技有限公司 Semiconductor saturable absorber mirror, preparation method thereof and laser
CN116316033B (en) * 2023-05-24 2023-08-15 青岛翼晨镭硕科技有限公司 Semiconductor saturable absorber mirror, preparation method thereof and laser

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